JPH05124867A - Silicon nitride-based sintered body - Google Patents

Silicon nitride-based sintered body

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Publication number
JPH05124867A
JPH05124867A JP3287916A JP28791691A JPH05124867A JP H05124867 A JPH05124867 A JP H05124867A JP 3287916 A JP3287916 A JP 3287916A JP 28791691 A JP28791691 A JP 28791691A JP H05124867 A JPH05124867 A JP H05124867A
Authority
JP
Japan
Prior art keywords
silicon nitride
sintered body
sialon
strength
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3287916A
Other languages
Japanese (ja)
Inventor
Takehisa Yamamoto
剛久 山本
Takao Nishioka
隆夫 西岡
Kenji Matsunuma
健二 松沼
Akira Yamakawa
晃 山川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP3287916A priority Critical patent/JPH05124867A/en
Publication of JPH05124867A publication Critical patent/JPH05124867A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【目的】 特に常温において優れた機械的強度を有し、
生産性、コスト面において優れた窒化ケイ素系焼結体を
提供することを目的とする。 【構成】 α−窒化ケイ素とβ´−サイアロンからなる
窒化ケイ素焼結体であって、α−窒化ケイ素の平均結晶
粒径が0.5μm以下、β´−サイアロンの長軸、短軸
方向の平均結晶粒径がそれぞれ2.0〜5.0μm、
0.5μm以下であることを特徴とし、結晶相のX線回
折によるピーク強度比が20%≦α−窒化ケイ素≦50
%、50%≦β’−サイアロン≦80%であるもの。
(57) [Summary] [Purpose] It has excellent mechanical strength, especially at room temperature.
It is an object of the present invention to provide a silicon nitride-based sintered body which is excellent in productivity and cost. A silicon nitride sintered body composed of α-silicon nitride and β′-sialon, wherein α-silicon nitride has an average crystal grain size of 0.5 μm or less, and β′-sialon has long-axis and short-axis directions. The average crystal grain size is 2.0 to 5.0 μm,
The peak intensity ratio by crystallographic X-ray diffraction is 20% ≦ α-silicon nitride ≦ 50
%, 50% ≦ β′-sialon ≦ 80%.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はとくに常温において優れ
た機械的強度を有し、生産性、コスト面において優れた
窒化ケイ素系焼結体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silicon nitride-based sintered body having excellent mechanical strength at room temperature, and excellent productivity and cost.

【0002】[0002]

【従来の技術】従来、窒化ケイ素系材料の強度向上を目
的として、焼結方法、焼結助剤、含有結晶相の限定など
様々な研究開発が行われてきた。たとえば、焼結法に関
しては、ホットプレス焼結法では、Am.Ceram.
Soc.Bull.,52(1973)pp560で〜
100kg/mm2(曲げ強度)が実現されており、ま
たガラスカプセルによる熱間静水圧プレス法(HIP
法)等も開発されている。こうした手法では焼結体の強
度特性の面では優れた特性が得られているものの、生産
性、コストの面で優れた手法とは言えない。一方、こう
した問題に対して、ガス圧焼結法(例えば、三友、粉体
と工業、12巻、12号、pp27、1989)がある
が、本方法では最終の焼結体の緻密化をβ−窒化ケイ素
結晶の粒成長に伴うため、粗大結晶粒の析出による強度
劣化をまねく可能性が高いことに加え、一般には、10
気圧以上のN2ガス圧をかけ焼結を実施するため、ホッ
トプレス法やHIP法と同様に焼結設備が大型となり、
特性面、生産面で十分優れた手法とは言えない。他方、
焼結助剤に関しては、主たる助剤としてY23を用いた
Si34−Al23−Y23系の窒化ケイ素系焼結体が
特公昭49−21091号、特公昭48−38448号
に開示されている。これらは、該特許明細書中に示され
ているように、β型窒化ケイ素の結晶粒が焼結体中で繊
維状組織を形成し、これがマトリックス中に分散するこ
とから強度、靭性を向上しうるものと考えられている。
すなわちこれは、β型窒化ケイ素の結晶形が六方晶であ
りC軸方向に結晶が異方性成長をすることを積極的に利
用したものであり、とくに特公昭48−38448号や
窯業協会誌、94巻、pp96、1986に示されるよ
うに、繊維状のβ−窒化ケイ素結晶粒がC軸方向に10
数μm以上に成長している場合がある。しかしながら、
本技術においては、やはりこの粒成長が異常成長や気孔
の発生をまねき、強度劣化をまねく可能性があり、また
本方法での焼結助剤だけを用いた焼結体では、焼結温度
を1700〜1900℃に上昇させなければ、緻密化が
十分図れず、大気圧付近のN2ガス圧焼結では、窒化ケ
イ素の昇華分解が生じ、安定した焼結体を得られない場
合がある。このため同じく、焼結体特性と生産性両面で
十分優れているとは言えない。一方、以上で述べてきた
手法では、いずれも得られる焼結体の強度が、例えばJ
IS−R1601に準拠した3点曲げ強度でせいぜい1
00kg/mm2前後であり、様々な窒化ケイ素系材料
の応用を考えた場合、必ずしも十分な特性が得られてい
ない。
2. Description of the Related Art Conventionally, various researches and developments such as a sintering method, a sintering aid, and a limitation of contained crystal phases have been carried out for the purpose of improving the strength of silicon nitride materials. For example, regarding the sintering method, in the hot press sintering method, Am. Ceram.
Soc. Bull. , 52 (1973) pp560-
100 kg / mm 2 (bending strength) has been realized, and the hot isostatic pressing method (HIP
Law) is also being developed. Although such a method has obtained excellent characteristics in terms of strength characteristics of the sintered body, it cannot be said to be an excellent method in terms of productivity and cost. On the other hand, there is a gas pressure sintering method (for example, Sanyu, Powder and Kogyo, Vol. 12, No. 12, pp27, 1989) for such a problem, but in this method, the final densification of the sintered body is β -Since it is accompanied by grain growth of silicon nitride crystals, there is a high possibility that strength deterioration due to the precipitation of coarse crystal grains will occur.
Since sintering is performed by applying N 2 gas pressure of atmospheric pressure or more, the sintering equipment becomes large like the hot press method and the HIP method,
It cannot be said that it is a sufficiently excellent method in terms of characteristics and production. On the other hand,
For the sintering aid, Si 3 N 4 -Al 2 O 3 -Y 2 O 3 system of silicon nitride sintered body is Japanese Patent Publication No. 49-21091 using Y 2 O 3 as a main aid, JP-B No. 48-38448. As shown in the patent specification, these improve the strength and toughness because the β-type silicon nitride crystal grains form a fibrous structure in the sintered body and are dispersed in the matrix. It is considered to be profitable.
That is, this is a positive use of the fact that the crystal form of β-type silicon nitride is hexagonal and that the crystal grows anisotropically in the C-axis direction. In particular, Japanese Patent Publication No. 48-38448 and Journal of Ceramic Industry , 94, pp96, 1986, the fibrous β-silicon nitride crystal grains are 10 in the C-axis direction.
It may grow to several μm or more. However,
In the present technology, this grain growth may lead to abnormal growth and generation of pores, and may lead to strength deterioration.In addition, in the sintered body using only the sintering aid in this method, the sintering temperature is Unless the temperature is raised to 1700 to 1900 ° C., sufficient densification cannot be achieved, and in N 2 gas pressure sintering near atmospheric pressure, sublimation decomposition of silicon nitride occurs, and a stable sintered body may not be obtained in some cases. Therefore, similarly, it cannot be said that the sintered body is sufficiently excellent in both characteristics and productivity. On the other hand, in the methods described above, the strength of the obtained sintered body is, for example, J
Three-point bending strength in accordance with IS-R1601 at most 1
It is around 00 kg / mm 2 , and when considering applications of various silicon nitride materials, sufficient characteristics are not always obtained.

【0003】[0003]

【発明が解決しようとする課題】こうした従来技術にお
ける生産性と焼結体の機械的特性の両立を満足させる手
法を提供するのが本発明の課題である。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a method of satisfying both the productivity and the mechanical properties of the sintered body in the prior art.

【0004】[0004]

【課題を解決するための手段】本発明は、α−窒化ケイ
素とβ´−サイアロンからなり、α−窒化ケイ素の平均
結晶粒径が0.5μm以下、β´−サイアロンの長軸、
短軸方向の平均結晶粒径がそれぞれ2.0〜5.0μ
m、0.5μm以下であることを特徴とする窒化ケイ素
焼結体が、JISR−1601に準拠した3点曲げ強度
が容易に130kg/mm2以上の特性を有する知見を
得たものである。本発明の焼結体が優れた強度特性を得
る効果は、微粒で等軸晶のα−窒化ケイ素と微粒で柱状
化したβ´−サイアロンの両方の結晶相を複合させるこ
とにより、従来の柱状化したβ´−サイアロン(β−窒
化ケイ素を含む)結晶相のみで構成された焼結体に比較
し、ヤング率、硬度が向上する。これは材料の変形抵抗
を示す物性値でありセラミック材料のような脆性材料で
は、この値を向上させることが広義では材料の強度向上
につながるためである。さらに脆性材料の破壊の基本概
念であるGriffithの理論に従えば、焼結体の破
壊強度σfは次式で与えられる。
The present invention comprises α-silicon nitride and β'-sialon, the average crystal grain size of α-silicon nitride is 0.5 μm or less, the major axis of β'-sialon,
The average crystal grain size in the minor axis direction is 2.0 to 5.0 μ, respectively.
It was obtained that the silicon nitride sintered body characterized by m and 0.5 μm or less easily has a three-point bending strength of 130 kg / mm 2 or more in accordance with JISR-1601. The effect of the sintered body of the present invention to obtain excellent strength characteristics is that by combining both crystalline phases of α-silicon nitride of fine grains and equiaxed crystal and β′-sialon finely columnarized, The Young's modulus and hardness are improved as compared with the sintered body composed only of the crystallized β'-sialon (including β-silicon nitride) crystal phase. This is because it is a physical property value indicating the deformation resistance of a material, and in the case of a brittle material such as a ceramic material, improving this value leads to an improvement in the strength of the material in a broad sense. Further, according to Griffith's theory which is the basic concept of fracture of brittle materials, the fracture strength σ f of the sintered body is given by the following equation.

【0005】σf=E・γs/4a、E;ヤング率、γ
s;破壊の表面エネルギー、a;先在亀裂長さ ここでγsは粒界相の組成と厚みに依存すると考えられ
るため、とくに厚みの点で結晶粒の存在密度を向上させ
る結晶粒の微粒化と結晶相の複合化は有利である。また
本式に従えば、破壊強度を向上させるためにはEの増大
とaの減少が重要である。aの値は工程上不可避な欠陥
寸法を排除すれば、結晶粒径に依存するため、微細結晶
粒で充填性を向上させた本発明はE、γsの点で強度向
上に有効である。
Σ f = E · γs / 4a, E; Young's modulus, γ
s: surface energy of fracture, a: pre-existing crack length Since γs is considered to depend on the composition and thickness of the grain boundary phase, grain refinement that improves the existing density of crystal grains particularly in terms of thickness. It is advantageous to combine the crystalline phase with. According to this formula, it is important to increase E and decrease a in order to improve the fracture strength. Since the value of a depends on the crystal grain size if the defect size unavoidable in the process is excluded, the present invention in which the filling property is improved by fine crystal grains is effective in improving the strength in terms of E and γs.

【0006】こうしたα型窒化珪素と柱状化したβ型窒
化珪素の両方の結晶相を複合させる考え方は、例えば特
開昭61−91065号や特開平2−44066号に開
示されているが、いずれもα´−サイアロン(一般式M
X(Si,Al)12(O,N)16、M:Mg,Ca,L
i及び希土類元素)とβ´−サイアロン(β型窒化ケイ
素を含む)との結晶相の組合せであり、組成的にはSi
34−AlN−MO(M;MgO、Y23、CaO等)
の3成分系が主であり、その範囲もAlNとMOの添加
比がモル%で1:9の限定された範囲で、α´−サイア
ロンとβ´−サイアロン(β−窒化ケイ素を含む)の複
合した結晶相を生成させることにより強度等の機械的特
性の向上を示したものであり、またその実施例でも明ら
かなように各焼結体の強度特性が曲げ強度で100kg
/mm2を安定して越える焼結体製法はいずれもホット
プレス法によるものであり、工業的に安定して高い強度
特性を得るまでに至っていない。また、これらの焼結体
はα´−サイアロンとβ´−サイアロン(β−窒化ケイ
素を含む)の間の熱膨張係数の差が大きく、これが原因
となり焼結体中に引張の残留応力を発生させ、強度劣化
を招く可能性がある。本発明はこうした条件の限定がな
く工業的に安定して高強度な焼結体を提供することにあ
る。
The concept of compounding both the crystal phases of α-type silicon nitride and columnar β-type silicon nitride is disclosed in, for example, JP-A-61-191065 and JP-A-2-44066. Also α'-sialon (general formula M
X (Si, Al) 12 (O, N) 16 , M: Mg, Ca, L
i and rare earth elements) and β′-sialon (including β-type silicon nitride) in the combination of crystal phases, and compositionally Si
3 N 4 -AlN-MO (M; MgO, Y 2 O 3 , CaO, etc.)
The three-component system is mainly used, and the range of the addition ratio of AlN and MO is a limited range of 1: 9 in mol%, and α′-sialon and β′-sialon (including β-silicon nitride) are included. This shows that mechanical properties such as strength were improved by producing a composite crystal phase, and as is clear from the examples, the strength properties of each sintered body were 100 kg in terms of bending strength.
All of the methods for producing a sintered body that stably exceed / mm 2 are based on the hot pressing method, and have not reached industrially stable and high strength characteristics. In addition, these sintered bodies have a large difference in thermal expansion coefficient between α'-sialon and β'-sialon (including β-silicon nitride), which causes tensile residual stress in the sintered body. May cause deterioration in strength. The present invention is to provide an industrially stable and high-strength sintered body that is not limited to such conditions.

【0007】本発明の焼結体を得るためには、焼結助剤
は窒化珪素表面に存在するSiO2とできるだけ低温で
液相を生成する助剤、例えばMgO、CeO2、Ca
O、La23を用い焼結温度を1650℃以下で焼結す
ることが望ましい。この低温焼結のため異常粒成長に伴
う焼結体の特性劣化を阻止できる。さらには、窒化ケイ
素は大気圧のN2雰囲気下では1700℃以上の温度域
で昇華分解するため、加圧N2雰囲気下で焼結する必要
があり、設備面でバッチ式焼結炉を用いていた。しか
し、この様な低温での焼結が可能となると焼結方法はプ
ッシャー式あるいはベルト式等の開放型連続焼結炉によ
り、同時に生産性の優れた焼結が可能となる。この詳細
な説明を加えると、一般に強度特性に優れた窒化ケイ素
系材料の焼結法としては、いわゆるバッチ式焼結炉によ
るガス圧焼結が主であるが、この方式では炉内の温度分
布のばらつきやロット間の条件ばらつき等が必ず生じる
ために、量産部品等の用途のセラミック材料を安定して
供給する製法としては十分とは言えない。この点からも
本発明はその生産性を同時に向上させた点で工業的に重
要である。
In order to obtain the sintered body of the present invention, the sintering aid is SiO 2 present on the surface of silicon nitride and an aid which forms a liquid phase at a temperature as low as possible, such as MgO, CeO 2 , Ca.
It is desirable to sinter at a sintering temperature of 1650 ° C. or lower using O and La 2 O 3 . This low-temperature sintering can prevent deterioration of the characteristics of the sintered body due to abnormal grain growth. Further, since silicon nitride is sublimated decomposed at a temperature range of not lower than 1700 ° C. under N 2 atmosphere at atmospheric pressure, must be sintered under pressure N 2 atmosphere, using a batch-type sintering furnace in terms of facilities Was there. However, if it becomes possible to sinter at such a low temperature, it becomes possible at the same time to perform sintering with excellent productivity by using an open continuous sintering furnace such as a pusher type or a belt type. Adding this detailed description, gas pressure sintering in a so-called batch-type sintering furnace is generally the main sintering method for silicon nitride-based materials with excellent strength characteristics. It is not sufficient as a manufacturing method for stably supplying a ceramic material for use in mass-produced parts or the like, because variations in manufacturing conditions, variations in conditions between lots, and the like will always occur. From this point as well, the present invention is industrially important in that the productivity is improved at the same time.

【0008】さらに本発明の効果を顕著にするために
は、焼結体中のα−窒化ケイ素とβ’−サイアロンの結
晶粒の平均粒径が重要となる。すなわち、α−窒化ケイ
素の平均粒径が0.5μm以下、およびβ’−サイアロ
ンの長軸の平均粒径が2.0〜5.0μm、短軸の平均
粒径が0.5μm以下であることが必要である。α−窒
化ケイ素の平均結晶粒径が0.5μmを越えると結晶相
が複合したさい結晶粒の充填密度が低下するため、強度
に及ぼすα−窒化ケイ素結晶相の効果が十分期待できな
い。一方、β’−サイアロンの長軸の平均結晶粒径が
2.0μm未満であるとやはり、柱状のβ’−サイアロ
ン結晶粒が分散することによる強化効果が十分期待でき
ず、強度の劣化につながる。また、5.0μmを越える
と、逆に粗大粒としてこのβ’−サイアロン結晶粒が作
用しやはり強度の劣化につながるとともに結晶粒の充填
密度を低下させるため、やはり強度の劣化につながる。
さらに短軸径については、0.5μmを越えるとやは
り、柱状のβ’−サイアロン結晶粒が分散することによ
る強化効果が十分期待できず、強度の劣化につながる。
また本発明の効果を十分向上させるためには、α−窒化
ケイ素とβ´−サイアロンの結晶相の析出比がX線回析
によるピーク強度比で、20%≦α−窒化ケイ素≦50
%、50%≦β´−窒化ケイ素≦80%であることが好
ましい。このα−窒化ケイ素の析出比が50%を越えて
高α−Si34側へずれるとβ´−サイアロン柱状晶組
織の効果が減少し、結晶相の複合化の効果が十分現れ
ず、20%より少ないとβ’−サイアロンの結晶粒子間
を充填する結晶粒の密度低下と、β’−サイアロンの粒
成長が起り、強度向上の効果が十分ではない。
Further, in order to make the effect of the present invention remarkable, the average grain size of the crystal grains of α-silicon nitride and β'-sialon in the sintered body is important. That is, the average particle size of α-silicon nitride is 0.5 μm or less, and the average particle size of the long axis of β′-sialon is 2.0 to 5.0 μm and the average particle size of the short axis is 0.5 μm or less. It is necessary. If the average crystal grain size of α-silicon nitride exceeds 0.5 μm, the packing density of the crystal grains when the crystal phases are compounded decreases, and the effect of the α-silicon nitride crystal phase on the strength cannot be expected sufficiently. On the other hand, when the average crystal grain size of the long axis of β'-sialon is less than 2.0 μm, the strengthening effect due to the dispersion of the columnar β'-sialon crystal grains cannot be expected sufficiently, which leads to the deterioration of strength. . On the other hand, when the thickness exceeds 5.0 μm, the β′-sialon crystal grains act as coarse grains to cause the deterioration of the strength and also the packing density of the crystal grains to decrease, which also deteriorates the strength.
Further, when the minor axis diameter exceeds 0.5 μm, the strengthening effect due to the dispersion of the columnar β′-sialon crystal grains cannot be sufficiently expected, and the strength is deteriorated.
In order to sufficiently improve the effect of the present invention, the precipitation ratio of the crystal phases of α-silicon nitride and β′-sialon is a peak intensity ratio by X-ray diffraction, and 20% ≦ α-silicon nitride ≦ 50.
%, 50% ≦ β′-silicon nitride ≦ 80%. If the deposition ratio of α-silicon nitride exceeds 50% and shifts to the high α-Si 3 N 4 side, the effect of β'-sialon columnar crystal structure decreases, and the effect of compounding the crystal phase does not sufficiently appear. If it is less than 20%, the density of the crystal grains filling the space between the crystal grains of β'-sialon decreases and the grain growth of β'-sialon occurs, so that the effect of improving the strength is not sufficient.

【0009】また、この組成範囲で焼結体中のβ´−サ
イアロン(一般式 Si6-ZAlZZ8-Z)のZ値を0
<Z<1.0の範囲にして粒界相を制御すると高強度が
安定する。
In this composition range, the Z value of β'-sialon (general formula: Si 6 -Z Al Z O Z N 8-Z ) in the sintered body is 0.
If the grain boundary phase is controlled within the range of <Z <1.0, high strength is stabilized.

【0010】[0010]

【実施例】平均粒径0.5μm、α結晶化率96%、酸
素量1.4重量%の窒化ケイ素原料粉末および、平均粒
径0.8μm、0.4μm、0.5μm、0.2μmの
23、Al23、AlN、MgOの各粉末をエタノー
ル中、100時間、ナイロン製ボールミルにて湿式混合
したのち、乾燥して得られた混合粉末を3000kg/
cm2でCIP成形し、この成形体をN2ガス1気圧中で
〜1650℃で5〜10時間1次焼結した。得られた焼
結体を〜1650℃、1000気圧N2ガス雰囲気中で
1時間、2次焼結した。この焼結体よりJISR160
1に準拠した3mm×4mm×40mm相当の抗折試験
片を切り出し、#800ダイアモンド砥石により研削加
工仕上げした後、引張面については#3000のダイア
モンドペーストによりラッピング仕上げ加工した後、J
ISR1601に準拠して3点曲げ強度を15本ずつ実
施した。表1中には平均結晶粒径、結晶相の比率、及び
曲げ強度を示した。
EXAMPLE A silicon nitride raw material powder having an average particle size of 0.5 μm, an α crystallization rate of 96%, and an oxygen content of 1.4% by weight, and an average particle size of 0.8 μm, 0.4 μm, 0.5 μm, 0.2 μm. Each powder of Y 2 O 3 , Al 2 O 3 , AlN, and MgO was wet-mixed in ethanol for 100 hours in a nylon ball mill, and then dried to obtain a mixed powder of 3000 kg /
and CIP molded at cm 2, the molded body was 5 to 10 hours primary sintering at to 1650 ° C. in a N 2 gas 1 atm. The obtained sintered body was subjected to secondary sintering for 1 hour at ˜1650 ° C. and 1000 atmospheric pressure N 2 gas atmosphere. From this sintered body JIS R160
A bending test piece corresponding to 3 mm × 4 mm × 40 mm according to 1 was cut out and ground by a # 800 diamond grindstone, and then the tensile surface was lapped by a diamond paste of # 3000.
In accordance with ISR1601, 15 3-point bending strengths were carried out. Table 1 shows the average crystal grain size, the ratio of crystal phases, and the bending strength.

【0011】尚、結晶相の比率に関しては図1、図2に
示すX線回折法により求めた各結晶相のピーク高さ比よ
り算出した。
The crystal phase ratio was calculated from the peak height ratio of each crystal phase obtained by the X-ray diffraction method shown in FIGS.

【0012】[0012]

【表1】 [Table 1]

【0013】[0013]

【発明の効果】本発明によれば、特に常温において優れ
た機械的強度を有し、しかも、生産性とコスト面におい
て優れた窒化ケイ素系焼結体を得ることができる。
According to the present invention, it is possible to obtain a silicon nitride-based sintered body which has excellent mechanical strength especially at room temperature and is excellent in productivity and cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例9における焼結体のX線回折図である。FIG. 1 is an X-ray diffraction diagram of a sintered body of Example 9.

【図2】比較例No.13における焼結体のX線回折図で
ある。
FIG. 2 is an X-ray diffraction diagram of a sintered body of Comparative Example No. 13.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 山川 晃 兵庫県伊丹市昆陽北一丁目1番1号 住友 電気工業株式会社伊丹製作所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akira Yamakawa 1-1-1 Kunyo Kita, Itami City, Hyogo Prefecture Sumitomo Electric Industries, Ltd. Itami Works

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 α−窒化ケイ素とβ´−サイアロンから
なる窒化ケイ素焼結体であって、α−窒化ケイ素の平均
結晶粒径が0.5μm以下、β´−サイアロンの長軸、
短軸方向の平均結晶粒径がそれぞれ2.0μm〜5.0
μmおよび0.5μm以下であることを特徴とする窒化
ケイ素系焼結体。
1. A silicon nitride sintered body composed of α-silicon nitride and β′-sialon, wherein α-silicon nitride has an average crystal grain size of 0.5 μm or less, and a long axis of β′-sialon,
The average crystal grain size in the minor axis direction is 2.0 μm to 5.0, respectively.
A silicon nitride-based sintered body characterized by having a size of less than or equal to 0.5 μm.
【請求項2】 焼結体中のα−窒化ケイ素とβ´−サイ
アロンの結晶相はX線回折によるピーク強度比が20%
≦α−窒化ケイ素≦50%、50%≦β´−サイアロン
≦80%である請求項1記載の窒化ケイ素系焼結体。
2. The crystal phase of α-silicon nitride and β'-sialon in the sintered body has a peak intensity ratio by X-ray diffraction of 20%.
The silicon nitride-based sintered body according to claim 1, wherein ≦ α-silicon nitride ≦ 50% and 50% ≦ β′-sialon ≦ 80%.
【請求項3】 焼結体中のβ´−サイアロン(一般式
Si6-ZAlZZ8-Z)は0<Z<1.0の範囲にある
請求項1記載の窒化ケイ素系焼結体。
3. A β'-sialon (general formula:
The silicon nitride-based sintered body according to claim 1, wherein Si 6-Z Al Z O Z N 8-Z ) is in the range of 0 <Z <1.0.
【請求項4】 焼結体中のα−窒化ケイ素は実質的にJ
CPDS(09−0250)のα−窒化ケイ素と同定さ
れることを特徴とする請求項1記載の窒化ケイ素焼結
体。
4. The α-silicon nitride in the sintered body is substantially J
The silicon nitride sintered body according to claim 1, which is identified as α-silicon nitride of CPDS (09-0250).
JP3287916A 1991-11-01 1991-11-01 Silicon nitride-based sintered body Pending JPH05124867A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3287916A JPH05124867A (en) 1991-11-01 1991-11-01 Silicon nitride-based sintered body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3287916A JPH05124867A (en) 1991-11-01 1991-11-01 Silicon nitride-based sintered body

Publications (1)

Publication Number Publication Date
JPH05124867A true JPH05124867A (en) 1993-05-21

Family

ID=17723393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3287916A Pending JPH05124867A (en) 1991-11-01 1991-11-01 Silicon nitride-based sintered body

Country Status (1)

Country Link
JP (1) JPH05124867A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018056210A1 (en) * 2016-09-20 2018-09-20 日本碍子株式会社 Composite substrate, its manufacturing method and electronic device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018056210A1 (en) * 2016-09-20 2018-09-20 日本碍子株式会社 Composite substrate, its manufacturing method and electronic device
US10998881B2 (en) 2016-09-20 2021-05-04 Ngk Insulators, Ltd. Composite substrate, method for producing the same, and electronic device

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