JPH0520921A - Conductive paste and mounting board using the same - Google Patents
Conductive paste and mounting board using the sameInfo
- Publication number
- JPH0520921A JPH0520921A JP3148479A JP14847991A JPH0520921A JP H0520921 A JPH0520921 A JP H0520921A JP 3148479 A JP3148479 A JP 3148479A JP 14847991 A JP14847991 A JP 14847991A JP H0520921 A JPH0520921 A JP H0520921A
- Authority
- JP
- Japan
- Prior art keywords
- conductive paste
- solid lubricant
- conductive filler
- conductive
- paste according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by conductive adhesives
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
- H10W72/01221—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using local deposition
- H10W72/01225—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using local deposition in solid form, e.g. by using a powder or by stud bumping
Landscapes
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Wire Bonding (AREA)
- Conductive Materials (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
(57)【要約】
【目的】 電子部品の電極パッドと基板上の電極群との
接続に際して熱ストレスによる応力を緩和することが可
能な導電性ペーストを得ること、およびこれを用いて信
頼性の高い実装基板を得ること。
【構成】 導電性フィラーと一般式
【化1】で示されるポリビニルブチラールのバインダ、
溶剤、固体潤滑剤からなる導電性ペースト。および電子
部品の電極パッドと基板上の端子電極群を前記導電性ペ
ーストを介して接続された実装基板。
(57) [Abstract] [Purpose] To obtain a conductive paste capable of relieving the stress due to thermal stress when connecting the electrode pad of an electronic part and the electrode group on the substrate, and to use it for reliability. To get a high mounting board. [Constitution] A conductive filler and a polyvinyl butyral binder represented by the general formula:
Conductive paste consisting of solvent and solid lubricant. And a mounting board in which an electrode pad of an electronic component and a terminal electrode group on the board are connected via the conductive paste.
Description
【0001】[0001]
【産業上の利用分野】本発明は、ICチップに代表され
るチップ状の電子部品を基板上の端子電極に接続するた
めに用いられる導電性ペーストおよびこれを用いた実装
基板に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive paste used for connecting a chip-shaped electronic component represented by an IC chip to a terminal electrode on a substrate, and a mounting substrate using the same.
【0002】[0002]
【従来の技術】従来、電子部品の接続端子と基板上の回
路パターン端子との接続には半田がよく利用されていた
が、近年、たとえばICフラットパッケージ等の小型化
と、接続端子間、いわゆるピッチ間隔が次第に狭くな
り、従来の半田付け技術で対処することが困難になって
きた。2. Description of the Related Art In the past, solder was often used to connect a connection terminal of an electronic component and a circuit pattern terminal on a board. However, in recent years, for example, IC flat packages are downsized and the connection terminals are so-called. The pitch interval has become narrower and it has become difficult to cope with it by the conventional soldering technique.
【0003】また、最近では電卓、電子時計あるいは液
晶ディスプレイなどにあっては、裸のICチップを基板
上の電極に直付けして実装面積の効率的利用を図ろうと
する動きがあり、有効かつ微細な電気的接続手段が強く
望まれている。裸のICチップを基板の電極と電気的に
接続する方法としては、ICチップの電極パッド上に形
成した突出接点(Auバンプ)と基板の端子電極群とを
熱硬化タイプの導電性ペーストを用いて接続する方法が
知られている。Recently, in calculators, electronic timepieces, liquid crystal displays, etc., there is a movement to directly attach a bare IC chip to an electrode on a substrate to efficiently use a mounting area. There is a strong demand for fine electrical connection means. As a method of electrically connecting the bare IC chip to the electrodes of the substrate, a thermosetting conductive paste is used for the protruding contacts (Au bumps) formed on the electrode pads of the IC chip and the terminal electrode group of the substrate. It is known how to connect.
【0004】[0004]
【発明が解決しようとする課題】しかしながら従来の熱
硬化タイプの導電性ペーストではICチップと回路基板
との熱膨張係数が異なるため熱ストレスによる応力によ
って接続部の劣化が生じやすいという問題があった。However, in the conventional thermosetting type conductive paste, since the thermal expansion coefficient of the IC chip and that of the circuit board are different, there is a problem that the connection portion is likely to be deteriorated by the stress due to the thermal stress. .
【0005】本発明は上記問題点に鏡みてなされたもの
であり、その目的とするところは、電子部品の電極パッ
ドと基板上の電極群との接続に際して熱ストレスによる
応力を緩和することが可能な導電性ペーストを得ること
およびこれを用いて信頼性の高い実装基板を得ることに
ある。The present invention has been made in view of the above problems, and an object thereof is to alleviate stress due to thermal stress when connecting an electrode pad of an electronic component and an electrode group on a substrate. Another object is to obtain a highly conductive paste and to obtain a highly reliable mounting board using the same.
【0006】[0006]
【課題を解決するための手段】本発明は上記問題点を解
決するため、一般式が(化1)で示されるポリビニルブ
チラールをバインダとする応力緩和が可能な導電性接着
剤を実現し、ICチップと回路基板の端子電極との電気
的接続において前記導電性ペーストを用いて熱ストレス
による応力の緩和を実現しようとするものである。In order to solve the above-mentioned problems, the present invention realizes a conductive adhesive capable of stress relaxation using polyvinyl butyral represented by the general formula (Chem. 1) as a binder. In the electrical connection between the chip and the terminal electrode of the circuit board, the conductive paste is used to alleviate stress due to thermal stress.
【0007】[0007]
【作用】本発明の上記した方法によれば、一般式が(化
1)で示されるポリビニルブチラールをバインダとする
導電性ペーストを用いることにより冷熱衝撃試験などで
生じる熱ストレスによる応力を緩和し、さらに潤滑剤添
加によって導電性フィラー同士の接触状態を良好に保た
れ信頼性の高い電気的接続を図れる。According to the above-mentioned method of the present invention, by using a conductive paste containing polyvinyl butyral represented by the general formula (Formula 1) as a binder, stress due to thermal stress generated in a thermal shock test or the like is relaxed, Furthermore, by adding a lubricant, the contact state between the conductive fillers can be kept good, and highly reliable electrical connection can be achieved.
【0008】[0008]
【実施例】以下、本発明の一実施例の導電性ペーストと
これを用いた実装基板について図面に基づき詳細に説明
する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A conductive paste according to an embodiment of the present invention and a mounting board using the same will be described below in detail with reference to the drawings.
【0009】(図1)は本発明の導電性ペーストを用い
た実装基板の構造断面図である。(図1)において1は
導電性ペースト、2はICチップ、3はICチップの電
極パッド、4はAuバンプ(突出接点)、5はAu厚膜
電極、6はガラス基板である。FIG. 1 is a structural sectional view of a mounting board using the conductive paste of the present invention. In FIG. 1, 1 is a conductive paste, 2 is an IC chip, 3 is an electrode pad of the IC chip, 4 is an Au bump (protruding contact), 5 is an Au thick film electrode, and 6 is a glass substrate.
【0010】本発明の実施例では、導電性ペースト1と
して導電性フィラーにAg粉体(粒度0.2〜9μm)、A
gPd合金粉体(粒度0.1〜15μm)、Au粉体(粒度
0.5〜1.2μm)、バインダーに一般式(化1)で示され
るポリビニルブチラール(ユニオン・カーバイド(株)
製、数平均分子量約120,000)、溶剤としてジエチレン
グリコールモノブチルエーテル、固体潤滑剤として二硫
化タングステン、二硫化モリブテン、β硫化タンタル、
セレン化チタン、βセレン化ニオブを用いて作製したも
のを使用した。このときの導電フィラーの含有率は固形
分体積に対して85vol%とした。溶剤の量はビヒクル濃度
で10wt%とした。固体潤滑剤は導電性フィラーに対し重
量比で0.02〜0.08の割合で添加した。導電性ペースト1
をAuバンプ4を施されたICチップ2に転写し、Au
バンプ4を導電性ペースト1を介してガラス基板6上の
Au厚膜電極5に接続し試料を作製した。In the embodiment of the present invention, as the conductive paste 1, Ag powder (particle size 0.2 to 9 μm), A
gPd alloy powder (particle size 0.1 to 15 μm), Au powder (particle size
0.5 to 1.2 μm) and polyvinyl butyral represented by the general formula (Chemical Formula 1) as a binder (Union Carbide Co., Ltd.)
Made, number average molecular weight about 120,000), solvent diethylene glycol monobutyl ether, solid lubricant tungsten disulfide, molybdenum disulfide, β tantalum sulfide,
What was produced using titanium selenide and β niobium selenide was used. The content rate of the conductive filler at this time was 85 vol% with respect to the solid content volume. The amount of solvent was 10 wt% in terms of vehicle concentration. The solid lubricant was added to the conductive filler in a weight ratio of 0.02 to 0.08. Conductive paste 1
Is transferred to the IC chip 2 provided with Au bumps 4, and
The bump 4 was connected to the Au thick film electrode 5 on the glass substrate 6 via the conductive paste 1 to prepare a sample.
【0011】このとき接着強度を補うためにICチップ
2を封止剤で覆うことも可能である。以上のようにして
作製した実装基板をー40℃/30分〜+125℃30分の冷熱衝撃
試験を行なった。比較のために固体潤滑剤を添加してい
ない試料についても同様な試験を行なった。ICチップ
2とAu厚膜電極5との間の抵抗値が初期値に対して2
倍以上になる回数を(表1)に示した。At this time, it is possible to cover the IC chip 2 with a sealant in order to supplement the adhesive strength. The mounting board manufactured as described above was subjected to a thermal shock test at −40 ° C./30 minutes to + 125 ° C. for 30 minutes. For comparison, the same test was performed on the sample to which the solid lubricant was not added. The resistance value between the IC chip 2 and the Au thick film electrode 5 is 2 with respect to the initial value.
The number of times of doubling is shown in (Table 1).
【0012】[0012]
【表1】 [Table 1]
【0013】本発明における導電性ペーストは従来の熱
硬化性の導電性ペーストと比較して、かなりの寿命延長
が認められる。特にフィラーがAu、その含有率が80〜
90%のものが良好であった。The conductive paste of the present invention is considerably extended in life as compared with the conventional thermosetting conductive paste. In particular, the filler is Au and its content is 80-
90% was good.
【0014】尚、本実施例では導電性フィラーとしてA
g、AgPd、Au粉体について述べたがその限りでは
なく、AgAu混合粉体の使用も可能である。また、他
の実施例としてチップ状の電子部品についてもICチッ
プと同様の効果が得らる。In this embodiment, A is used as the conductive filler.
Although the g, AgPd, and Au powders have been described, the present invention is not limited thereto, and AgAu mixed powder can be used. Further, as another embodiment, the same effect as that of the IC chip can be obtained for a chip-shaped electronic component.
【0015】ポリビニルブチラールの分子量については
100,000以下のものにつても実施したが100,000〜150,00
0のものほど良好な結果は得られなかった。本実施例で
は固体潤滑剤として二硫化タングステン、二硫化モリブ
テン、β硫化タンタル、セレン化チタン、βセレン化ニ
オブを使用したがその限りではなく、二硫化チタン、二
硫化ニオブ、セレン化タングステン、セレン化モリブテ
ン、セレン化タンタルを使用することも可能である。Regarding the molecular weight of polyvinyl butyral
It was carried out for 100,000 or less, but 100,000 to 150,00
The results were not as good as those of 0. Tungsten disulfide, molybdenum disulfide, β tantalum sulfide, titanium selenide, and β niobium selenide were used as the solid lubricants in this example, but the solid lubricant is not limited thereto. Molybdenum chloride and tantalum selenide can also be used.
【0016】[0016]
【発明の効果】以上に説明したように、本発明の導電性
ペーストを用いれば熱ストレスによる応力の緩和に優れ
たICチップと基板との接続を行なうことが可能であ
る。As described above, by using the conductive paste of the present invention, it is possible to connect the IC chip and the substrate which are excellent in alleviating the stress caused by the thermal stress.
【図1】本発明の第1の実施例を示す構造断面図FIG. 1 is a structural sectional view showing a first embodiment of the present invention.
1 導電性ペースト 2 ICチップ 3 ICチップの電極パッド 4 Auバンプ(突出電極) 5 Au厚膜電極 6 ガラス基板 1 Conductive paste 2 IC chip 3 Electrode pad of IC chip 4 Au bump (protruding electrode) 5 Au thick film electrode 6 glass substrates
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H05K 3/32 B 9154−4E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location H05K 3/32 B 9154-4E
Claims (8)
び固体潤滑剤からなり、前記バインダーが一般式 【化1】 で示されるポリビニルブチラールであることを特徴とす
る導電性ペースト。1. A conductive filler, a binder, a solvent and a solid lubricant, wherein the binder has the general formula: A conductive paste characterized by being polyvinyl butyral represented by.
なくとも1種以上からなり、その粒度分布が15μm以下
であり、かつ体積含有率が固形分体積の80〜90%である
ことを特徴とする請求項1に記載の導電性ペースト。2. The conductive filler is made of at least one of Ag, Pd, and Au, has a particle size distribution of 15 μm or less, and has a volume content of 80 to 90% of the solid content volume. The conductive paste according to claim 1.
なくとも1種以上からなり、その粒度分布が15μm以下
であり、固体潤滑剤がタングステン、モリブテン、チタ
ン、ニオブ、タンタルのそれぞれの硫化物もしくはセレ
ン化物のいずれか1種以上からなり、導電性フィラーと
固体潤滑剤の総体積含有率が80〜90%でありかつ導電性
フィラーに対する固体潤滑剤の重量比が0.02〜0.08であ
ることを特徴とする請求項1に記載の導電性ペースト。3. The conductive filler is made of at least one of Ag, Pd, and Au and has a particle size distribution of 15 μm or less, and the solid lubricant is a sulfide of tungsten, molybdenum, titanium, niobium, or tantalum. Characterized by comprising at least one kind of selenide, the total volume content of the conductive filler and the solid lubricant is 80 to 90%, and the weight ratio of the solid lubricant to the conductive filler is 0.02 to 0.08. The conductive paste according to claim 1.
100,000〜150,000であり、固体潤滑剤がタングステン、
モリブテン、チタン、ニオブ、タンタルのそれぞれの硫
化物もしくはセレン化物のいずれか1種以上からなるこ
とを特徴とする請求項1に記載の導電性ペースト。4. The number average molecular weight of polyvinyl butyral is
100,000-150,000, solid lubricant is tungsten,
The conductive paste according to claim 1, which is made of one or more of sulfides and selenides of molybdenum, titanium, niobium, and tantalum.
形、粒度分布が5μm以下、固体潤滑剤がタングステ
ン、モリブテン、チタン、ニオブ、タンタルのそれぞれ
の硫化物もしくはセレン化物のいずれか1種以上からな
り、導電性フィラーと固体潤滑剤の総体積含有率が80〜
90%でありかつ導電性フィラーに対する固体潤滑剤の重
量比が0.02〜0.08であることを特徴とする請求項1に記
載の導電性ペースト。5. The conductive filler is Au, the shape is spherical, the particle size distribution is 5 μm or less, and the solid lubricant is at least one of sulfides or selenides of tungsten, molybdenum, titanium, niobium, and tantalum. The total volume content of conductive filler and solid lubricant is 80 ~
The conductive paste according to claim 1, which is 90% and the weight ratio of the solid lubricant to the conductive filler is 0.02 to 0.08.
形、粒度分布が5μm以下、体積含有率が固形分体積の8
0〜90%であり、ポリビニルブチラールの数平均分子量
が100,000〜150,000であり、固体潤滑剤がタングステ
ン、モリブテン、チタン、ニオブ、タンタルのそれぞれ
の硫化物もしくはセレン化物のいずれか1種以上からな
ることを特徴とする請求項1に記載の導電性ペースト。6. The conductive filler is Au, the shape is spherical, the particle size distribution is 5 μm or less, and the volume content is 8 of solid content volume.
0 to 90%, the number average molecular weight of polyvinyl butyral is 100,000 to 150,000, and the solid lubricant is one or more of sulfides or selenides of tungsten, molybdenum, titanium, niobium, and tantalum. The conductive paste according to claim 1, characterized in that.
成した突出接点と回路基板上の端子電極とを請求項1、
2、3、4、5、6のいずれかに記載された導電性ペー
ストにより接続することを特徴とする実装基板。7. A protruding contact formed on an electrode pad of a chip-shaped electronic component and a terminal electrode on a circuit board are provided.
A mounting board, which is connected by the conductive paste described in any one of 2, 3, 4, 5, and 6.
基板上の端子電極とを請求項1、2、3、4、5、6い
ずれかに記載された導電性ペーストにより接続すること
を特徴とする実装基板。8. An electrode pad of a chip-shaped electronic component and a terminal electrode on a circuit board are connected by the conductive paste according to any one of claims 1, 2, 3, 4, 5, and 6. And mounting board.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3148479A JPH0520921A (en) | 1991-06-20 | 1991-06-20 | Conductive paste and mounting board using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3148479A JPH0520921A (en) | 1991-06-20 | 1991-06-20 | Conductive paste and mounting board using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0520921A true JPH0520921A (en) | 1993-01-29 |
Family
ID=15453679
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3148479A Pending JPH0520921A (en) | 1991-06-20 | 1991-06-20 | Conductive paste and mounting board using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0520921A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998002919A1 (en) * | 1996-07-12 | 1998-01-22 | Fujitsu Limited | Method and mold for manufacturing semiconductor device, semiconductor device, and method for mounting the device |
| US6215185B1 (en) * | 1998-12-11 | 2001-04-10 | Mitsubishi Denki Kabushiki Kaisha | Power semiconductor module |
| US6881611B1 (en) | 1996-07-12 | 2005-04-19 | Fujitsu Limited | Method and mold for manufacturing semiconductor device, semiconductor device and method for mounting the device |
| US7914885B2 (en) * | 2005-08-31 | 2011-03-29 | Sanyo Electric Co., Ltd. | Conductive paste, photovoltaic apparatus and method of manufacturing photovoltaic apparatus |
| JP2011139019A (en) * | 2009-12-30 | 2011-07-14 | Samsung Electro-Mechanics Co Ltd | Conductive paste composition for internal electrode, and method of manufacturing laminated ceramic capacitor using the same |
-
1991
- 1991-06-20 JP JP3148479A patent/JPH0520921A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998002919A1 (en) * | 1996-07-12 | 1998-01-22 | Fujitsu Limited | Method and mold for manufacturing semiconductor device, semiconductor device, and method for mounting the device |
| US6881611B1 (en) | 1996-07-12 | 2005-04-19 | Fujitsu Limited | Method and mold for manufacturing semiconductor device, semiconductor device and method for mounting the device |
| US6215185B1 (en) * | 1998-12-11 | 2001-04-10 | Mitsubishi Denki Kabushiki Kaisha | Power semiconductor module |
| US7914885B2 (en) * | 2005-08-31 | 2011-03-29 | Sanyo Electric Co., Ltd. | Conductive paste, photovoltaic apparatus and method of manufacturing photovoltaic apparatus |
| JP2011139019A (en) * | 2009-12-30 | 2011-07-14 | Samsung Electro-Mechanics Co Ltd | Conductive paste composition for internal electrode, and method of manufacturing laminated ceramic capacitor using the same |
| US8332996B2 (en) | 2009-12-30 | 2012-12-18 | Samsung Electro-Mechanics Co., Ltd. | Conductive paste composition for inner electrodes and method of manufacturing multilayer capacitor |
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