JPH05223A - Control of flow rate of purified gas of tsa adsorbing tower - Google Patents

Control of flow rate of purified gas of tsa adsorbing tower

Info

Publication number
JPH05223A
JPH05223A JP3152933A JP15293391A JPH05223A JP H05223 A JPH05223 A JP H05223A JP 3152933 A JP3152933 A JP 3152933A JP 15293391 A JP15293391 A JP 15293391A JP H05223 A JPH05223 A JP H05223A
Authority
JP
Japan
Prior art keywords
adsorption tower
flow rate
tsa
purified gas
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3152933A
Other languages
Japanese (ja)
Inventor
Hirohiko Nakamura
裕彦 中村
Yasuo Tasaka
靖夫 田坂
Hiroshi Tsushima
寛 津嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Techno Engineering Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Techno Engineering Co Ltd, Hitachi Ltd filed Critical Hitachi Techno Engineering Co Ltd
Priority to JP3152933A priority Critical patent/JPH05223A/en
Publication of JPH05223A publication Critical patent/JPH05223A/en
Pending legal-status Critical Current

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  • Separation Of Gases By Adsorption (AREA)

Abstract

(57)【要約】 【目的】TSA吸着塔後流側の精製ガス流量の変動を小
さくして、精製ガスの流量および圧力の安定化をはか
る。 【構成】TSA吸着塔2の切替時間に対応して、吸着塔
冷却後の加圧工程に入る前に、あらかじめ吸着塔入口原
料ガス流量を増加させる制御方法。 【効果】TSA吸着塔2の加圧時の精製ガスの流量変動
および圧力変動を小さくして、精製ガスを後流側へ常時
安定して送出することができる。
(57) [Summary] [Purpose] To stabilize the flow rate and pressure of the purified gas by reducing fluctuations in the purified gas flow rate on the downstream side of the TSA adsorption tower. A control method in which the flow rate of the raw material gas at the inlet of the adsorption tower is increased in advance before the pressurizing step after cooling the adsorption tower, corresponding to the switching time of the TSA adsorption tower 2. [Effect] The flow rate fluctuation and pressure fluctuation of the purified gas at the time of pressurizing the TSA adsorption tower 2 can be reduced, and the purified gas can always be stably sent to the downstream side.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はTSA(温度スイング再
生方式)吸着塔の流量制御方法に係り、特に吸着塔後流
側の精製ガス流量の制御に好適なTSA吸着塔の精製ガ
ス流量制御方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flow rate control method for a TSA (temperature swing regeneration system) adsorption tower, and more particularly to a purified gas flow rate control method for a TSA adsorption tower suitable for controlling the flow rate of purified gas on the downstream side of the adsorption tower. It is about.

【0002】[0002]

【従来の技術】図3により従来技術を空気分離装置の前
処理装置として使用したTSA吸着塔を例にとって説明
する。図3において、空気圧縮機1で昇圧された原料空
気は、空気入口切替弁3を通じて一方のTSA吸着塔2
に送られる。ここで水分及び炭酸ガスを除去したのち、
空気出口切替弁4を通じて精製空気が深冷分離用空気分
離装置に送られる。一方、深冷分離用空気分離装置にお
いて、製品ガスを分離した残りのガスが、再生ガスとし
て再生ガス供給元弁7を通じて再生加熱器8で昇温され
たのち、再生ガス入口切替弁6を通じて他方のTSA吸
着塔2に送られる。ここで吸着時吸着した水分及び炭酸
ガスを掃気し、廃ガス放出切替弁5より放出する。次
に、再生工程終了後、再生ガスは冷却ガス供給元弁9を
通じて昇温せずにTSA吸着塔2に送られ、昇温された
TSA吸着塔2を冷却し、廃ガス放出切替弁5より放出
する。
2. Description of the Related Art An example of a TSA adsorption tower using the prior art as a pretreatment device for an air separation device will be described with reference to FIG. In FIG. 3, the raw material air whose pressure is increased by the air compressor 1 is passed through the air inlet switching valve 3 to the one TSA adsorption tower 2
Sent to. After removing water and carbon dioxide here,
Purified air is sent to the deep-separation air separation device through the air outlet switching valve 4. On the other hand, in the deep-separation air separation device, the remaining gas from which the product gas has been separated is heated as regeneration gas by the regeneration heater 8 through the regeneration gas supply valve 7, and then the other through the regeneration gas inlet switching valve 6. Is sent to the TSA adsorption tower 2. Here, the adsorbed moisture and carbon dioxide gas are scavenged and released from the waste gas release switching valve 5. Next, after the completion of the regeneration process, the regenerated gas is sent to the TSA adsorption tower 2 through the cooling gas supply valve 9 without raising the temperature, the heated TSA adsorption tower 2 is cooled, and the waste gas release switching valve 5 is used. discharge.

【0003】一方、冷却工程終了後、次の吸着工程に備
える加圧工程は、加圧ガス入口切替弁10より精製空気
の一部を供給してTSA吸着塔2の加圧を行なってい
た。
On the other hand, after completion of the cooling step, in the pressurizing step for the next adsorption step, a part of the purified air was supplied from the pressurized gas inlet switching valve 10 to pressurize the TSA adsorption tower 2.

【0004】図4に切替弁のタイムチャートと精製空気
の流量変動を示す。なお、この種の装置として関連する
ものには、例えば特開昭51−132180号公報等が
挙げられる。
FIG. 4 shows a time chart of the switching valve and fluctuations in the flow rate of purified air. As a device related to this type, there is, for example, Japanese Patent Application Laid-Open No. 51-132180.

【0005】[0005]

【発明が解決しようとする課題】上記従来技術は、加圧
時原料空気が加圧風量に一部とられるため、精製空気量
が減少する。また、TSA吸着塔は切替時間が数時間で
あるので、精製空気の流量と圧力は数時間ごとに変動す
るという欠点があった。
In the above-mentioned prior art, since the raw material air during pressurization is partly included in the pressurization air volume, the purified air volume is reduced. Moreover, since the switching time of the TSA adsorption tower is several hours, there is a drawback that the flow rate and the pressure of the purified air change every several hours.

【0006】本発明の目的は、精製空気等のTSA吸着
塔後流側の流量変動を小さくして、精製空気流量および
圧力を一定にするTSA吸着塔の精製ガス流量制御方法
を提供することにある。
An object of the present invention is to provide a method for controlling a purified gas flow rate of a TSA adsorption tower which reduces the flow rate fluctuation of purified air or the like on the downstream side of the TSA adsorption tower to make the purified air flow rate and pressure constant. is there.

【0007】[0007]

【課題を解決するための手段】上記目的は、TSA吸着
塔の切替時間に対応して、TSA吸着塔が加圧工程に入
る前に、あらかじめTSA吸着塔入口流量を増加させて
おくことにより、達成される。
The above object is to increase the TSA adsorption tower inlet flow rate in advance before the TSA adsorption tower enters the pressurizing step in accordance with the switching time of the TSA adsorption tower. To be achieved.

【0008】[0008]

【作用】TSA吸着塔の切替時間を検知しておき、TS
A吸着塔が加圧工程に入る一定時間前にTSA吸着塔入
口側に設置した弁の開度を大きくしてTSA吸着塔入口
流量を増加させるか、あるいはTSA吸着塔の切替時間
を検知しておき、TSA吸着塔が加圧工程に入る一定時
間前にTSA吸着塔の上流側に設置してある圧縮機の入
口案内翼の開度を大きくして圧縮機出口流量即ちTSA
吸着塔入口流量を増加させることにより、加圧工程開始
時点において圧縮機の入口案内翼開動作の時間遅れによ
るTSA吸着塔入口流量の増加不足もなく、TSA吸着
塔後流側の流量変動を小さくすることができる。
[Operation] The switching time of the TSA adsorption tower is detected, and the TS
Before a certain time before the A adsorption tower enters the pressurizing step, the opening of the valve installed on the TSA adsorption tower inlet side is increased to increase the TSA adsorption tower inlet flow rate, or the TSA adsorption tower switching time is detected. In addition, the opening of the inlet guide vanes of the compressor installed upstream of the TSA adsorption tower is increased a certain time before the TSA adsorption tower enters the pressurization step to increase the compressor outlet flow rate, that is, TSA.
By increasing the flow rate at the inlet of the adsorption tower, there is no shortage of increase in the flow rate at the inlet of the TSA adsorption tower due to the time delay of the opening operation of the inlet guide vanes of the compressor at the start of the pressurization process, and the fluctuation of the flow rate at the downstream side of the TSA adsorption tower is reduced can do.

【0009】[0009]

【実施例】以下、本発明の一実施例を図1により説明す
る。図1において、図3と同部分は同符号で示し、説明
を省略する。TSA吸着塔2の冷却工程終了時の加圧工
程に入る一定時間前に、あらかじめ制御装置12により
空気圧縮機1の入口案内翼11を操作し、空気圧縮機1
を増量運転する。次に、加圧工程に入り、精製空気の一
部を加圧ガス入口切替弁10を通してTSA吸着塔2に
送っても、精製空気も増量されているため、加圧前の精
製空気と同量送出することができる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIG. In FIG. 1, the same parts as those in FIG. 3 are denoted by the same reference numerals, and the description thereof will be omitted. The controller 12 operates the inlet guide vanes 11 of the air compressor 1 in advance by a predetermined time before entering the pressurizing process at the end of the cooling process of the TSA adsorption tower 2.
To increase the amount. Next, even if a part of the purified air is sent to the TSA adsorption tower 2 through the pressurized gas inlet switching valve 10 in the pressurizing step, the amount of the purified air is also increased. Can be sent out.

【0010】図2にTSA吸着塔の切替弁のタイムチャ
ートと精製空気の流量変動を示す。
FIG. 2 shows a time chart of the switching valve of the TSA adsorption tower and fluctuations in the flow rate of purified air.

【0011】上述した実施例によれば、TSA吸着塔の
加圧時の精製空気の流量変動を小さくして精製空気流量
を一定に保つことができ、また、精製空気の圧力変動も
小さくすることができる。更にまた、TSA吸着塔の後
流側に深冷分離用空気分離装置がある場合、空気分離装
置内の精留塔の流量変動及び圧力変動が小さくなり、精
留塔で精留分離される酸素、窒素、アルゴン等の製品純
度の変動も小さくなるため、空気分離装置の運転性を向
上させることができると共に、特に精留塔内の変動によ
って大きな影響を受ける製品アルゴンの収率を大幅に向
上させることができる。
According to the above-described embodiment, the flow rate of purified air during pressurization of the TSA adsorption tower can be reduced to keep the purified air flow rate constant, and the pressure variation of the purified air can also be reduced. You can Furthermore, when a cryogenic separation air separation device is provided on the downstream side of the TSA adsorption tower, fluctuations in flow rate and pressure in the rectification tower in the air separation apparatus are reduced, and oxygen rectified and separated in the rectification tower is reduced. Since the fluctuations in the product purity of nitrogen, argon, etc. are also small, the operability of the air separation device can be improved, and the yield of product argon, which is greatly affected by fluctuations in the rectification column, is greatly improved. Can be made.

【0012】[0012]

【発明の効果】本発明によれば、TSA吸着塔の精製ガ
ス流量を常に一定に保つことができ、また精製ガス圧力
もほぼ一定に保つことができ、常時安定した運転を行な
うことができる。
According to the present invention, the purified gas flow rate in the TSA adsorption tower can be always kept constant, and the purified gas pressure can be kept almost constant, so that stable operation can be always performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明によるTSA吸着塔の精製ガス流量制御
方法の一実施例を示す系統図である。
FIG. 1 is a system diagram showing an embodiment of a method for controlling a purified gas flow rate of a TSA adsorption tower according to the present invention.

【図2】本発明によるTSA吸着塔の切替弁タイムチャ
ートおよび精製ガス流量を示す線図である。
FIG. 2 is a diagram showing a switching valve time chart and a purified gas flow rate of the TSA adsorption tower according to the present invention.

【図3】従来技術によるTSA吸着塔の系統図である。FIG. 3 is a system diagram of a TSA adsorption tower according to the related art.

【図4】従来技術によるTSA吸着塔の切替弁タイムチ
ャートおよび精製ガス流量を示す線図である。
FIG. 4 is a diagram showing a switching valve time chart and a purified gas flow rate of a TSA adsorption tower according to a conventional technique.

【符号の説明】[Explanation of symbols]

1…空気圧縮機、2…TSA吸着塔、3…空気入口切替
弁、4…空気出口切替弁、5…廃ガス放出切替弁、6…
再生ガス入口切替弁、7…再生ガス供給元弁、8…再生
加熱器、9…冷却ガス供給元弁、10…加圧ガス入口切
替弁、11…入口案内翼、12…制御装置。
1 ... Air compressor, 2 ... TSA adsorption tower, 3 ... Air inlet switching valve, 4 ... Air outlet switching valve, 5 ... Waste gas discharge switching valve, 6 ...
Regeneration gas inlet switching valve, 7 ... Regeneration gas supply source valve, 8 ... Regeneration heater, 9 ... Cooling gas supply source valve, 10 ... Pressurized gas inlet switching valve, 11 ... Inlet guide vanes, 12 ... Control device.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 田坂 靖夫 山口県下松市大字東豊井794番地 株式会 社日立製作所笠戸工場内 (72)発明者 津嶋 寛 山口県下松市大字東豊井794番地 日立テ クノエンジニアリング株式会社笠戸事業所 内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yasuo Tasaka, Higashitoyoi 794, Daimo, Shimomatsu, Yamaguchi Prefecture Inside the Kasado Plant, Hitachi, Ltd. Kuno Engineering Co., Ltd. Kasado Office

Claims (1)

【特許請求の範囲】 【請求項1】圧縮機で昇圧された原料ガスをTSA吸着
塔で不純物を吸着除去し、精製ガスとして取出すと共
に、該精製ガスの一部を前記吸着塔の昇温再生・冷却完
了後の加圧ガスとして用いるTSA吸着塔において、前
記吸着塔の切替時間に対応して、吸着塔冷却完了後の加
圧工程に入る前に、あらかじめ吸着塔入口原料ガス流量
を増加させることを特徴とするTSA吸着塔の精製ガス
流量制御方法。
Claim: What is claimed is: 1. A TSA adsorption tower is used to adsorb and remove impurities from a raw material gas whose pressure has been boosted by a compressor, and a purified gas is taken out, and a part of the purified gas is heated and regenerated in the adsorption tower. In the TSA adsorption tower used as the pressurized gas after completion of cooling, the flow rate of the raw material gas at the inlet of the adsorption tower is increased in advance before the pressurization step after completion of cooling of the adsorption tower, corresponding to the switching time of the adsorption tower. A method for controlling a purified gas flow rate in a TSA adsorption tower, comprising:
JP3152933A 1991-06-25 1991-06-25 Control of flow rate of purified gas of tsa adsorbing tower Pending JPH05223A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3152933A JPH05223A (en) 1991-06-25 1991-06-25 Control of flow rate of purified gas of tsa adsorbing tower

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3152933A JPH05223A (en) 1991-06-25 1991-06-25 Control of flow rate of purified gas of tsa adsorbing tower

Publications (1)

Publication Number Publication Date
JPH05223A true JPH05223A (en) 1993-01-08

Family

ID=15551319

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3152933A Pending JPH05223A (en) 1991-06-25 1991-06-25 Control of flow rate of purified gas of tsa adsorbing tower

Country Status (1)

Country Link
JP (1) JPH05223A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4947570U (en) * 1972-08-02 1974-04-25

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4947570U (en) * 1972-08-02 1974-04-25

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