JPH0523010B2 - - Google Patents
Info
- Publication number
- JPH0523010B2 JPH0523010B2 JP59065707A JP6570784A JPH0523010B2 JP H0523010 B2 JPH0523010 B2 JP H0523010B2 JP 59065707 A JP59065707 A JP 59065707A JP 6570784 A JP6570784 A JP 6570784A JP H0523010 B2 JPH0523010 B2 JP H0523010B2
- Authority
- JP
- Japan
- Prior art keywords
- grid
- electron beam
- beam passing
- electron
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010894 electron beam technology Methods 0.000 claims description 65
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 7
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 201000009310 astigmatism Diseases 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
- H01J29/503—Three or more guns, the axes of which lay in a common plane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4844—Electron guns characterised by beam passing apertures or combinations
- H01J2229/4848—Aperture shape as viewed along beam axis
- H01J2229/4858—Aperture shape as viewed along beam axis parallelogram
- H01J2229/4865—Aperture shape as viewed along beam axis parallelogram rectangle
- H01J2229/4868—Aperture shape as viewed along beam axis parallelogram rectangle with rounded end or ends
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4844—Electron guns characterised by beam passing apertures or combinations
- H01J2229/4848—Aperture shape as viewed along beam axis
- H01J2229/4872—Aperture shape as viewed along beam axis circular
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4844—Electron guns characterised by beam passing apertures or combinations
- H01J2229/4848—Aperture shape as viewed along beam axis
- H01J2229/4875—Aperture shape as viewed along beam axis oval
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4844—Electron guns characterised by beam passing apertures or combinations
- H01J2229/4848—Aperture shape as viewed along beam axis
- H01J2229/4879—Aperture shape as viewed along beam axis non-symmetric about field scanning axis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4844—Electron guns characterised by beam passing apertures or combinations
- H01J2229/4848—Aperture shape as viewed along beam axis
- H01J2229/4896—Aperture shape as viewed along beam axis complex and not provided for
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明はカラー受像管用電子銃、特にフオーカ
ス特性を改良したカラー受像管用インライン形電
子銃に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to an electron gun for color picture tubes, and particularly to an in-line electron gun for color picture tubes with improved focus characteristics.
一般にカラー受像管用電子銃の主レンズ口径は
フオーカス特性に大きく影響し、好適なフオーカ
ス特性を得るには主レンズ口径を可能な限り大き
くすることが望ましい。
Generally, the main lens aperture of an electron gun for a color picture tube has a great influence on focus characteristics, and it is desirable to make the main lens aperture as large as possible in order to obtain suitable focus characteristics.
第1図は従来のバイポテンシヤル集束方式のイ
ンライン形電子銃の一例を示す要部断面構成図で
ある。同図において、1A,1B,1Cはそれぞ
れ3本の電子ビームを頂面から放射するカソー
ド、2は電子ビームを制御する第1グリツド、3
は電子ビームを加速させる第2グリツド、4は電
子ビームを集束させる下部第3グリツドであり、
それぞれ2A,2B,2C,3A,3B,3Cお
よび4A,4B,4Cは3本の電子ビームの電子
ビーム通過孔である。5は上部第3グリツド、6
は第4グリツドであり、この上部第3グリツド5
と第4グリツド6とはそれぞれの底面に対向して
設けられた3個の絞り孔5A,5B,5Cと6
A,6B,6Cとで3本の電子ビームに対応する
3個の主レンズを形成している。 FIG. 1 is a cross-sectional configuration diagram of essential parts showing an example of a conventional bipotential focusing type in-line electron gun. In the figure, 1A, 1B, and 1C are cathodes that each emit three electron beams from the top surface, 2 is a first grid that controls the electron beams, and 3 is a cathode that emits three electron beams from the top surface.
4 is a second grid that accelerates the electron beam, and 4 is a lower third grid that focuses the electron beam.
2A, 2B, 2C, 3A, 3B, 3C and 4A, 4B, 4C are electron beam passage holes for three electron beams, respectively. 5 is the upper third grid, 6
is the fourth grid, and this upper third grid 5
and the fourth grid 6 are three aperture holes 5A, 5B, 5C and 6 provided opposite to each other on the bottom surface.
A, 6B, and 6C form three main lenses corresponding to three electron beams.
また、この場合、電子銃の動作電圧は第1グリ
ツド2にはOV、第2グリツド3には約700V、上
部第3グリツド4および下部第3グリツド5には
約7KV、さらに第4グリツド6には約25KVが印
加される。 In this case, the operating voltage of the electron gun is OV for the first grid 2, about 700 V for the second grid 3, about 7 KV for the upper third grid 4 and lower third grid 5, and about 7 KV for the fourth grid 6. Approximately 25KV is applied.
このような電子銃の構成において、3個のカソ
ード1A,1B,1Cに与える信号電位によつて
それぞれの電子ビーム量が制御された3本の電子
ビームA,B,Cは、第2グリツド3と下部第3
グリツド4との対向した各孔間で形成されるブリ
フオーカスレンズで若干の集束作用を受けた後、
上部第3グリツド5と第4グリツド6とで形成さ
れるそれぞれの主レンズによつて、図示しない受
像管の螢光面で結像するように集束作用を受け
る。同時に両側の電子ビームA,Cは第4グリツ
ド6のビーム通過孔6A,6Cを、上部第3グリ
ツド5のビーム通過孔5A,5Cに対して外側に
微小偏心させる公知の手段によつて、角度θの傾
斜を与え、3本の電子ビームA,B,Cを一点に
コンバーゼンスさせる。したがつて、上部第3グ
リツド5と第4グリツド6は同一部分を使用する
ことが不可能であり、部品の種類が増えるという
問題がある。また、組立治具も偏心した芯金が必
要となつて複雑化する。なお、7はコンバーゼン
ス電極である。 In such an electron gun configuration, the three electron beams A, B, and C, each of which has its amount controlled by the signal potential applied to the three cathodes 1A, 1B, and 1C, are connected to the second grid 3. and lower third
After receiving a slight focusing effect by the brief focus lens formed between each hole facing the grid 4,
The respective main lenses formed by the upper third grid 5 and the fourth grid 6 receive a focusing action so that an image is formed on the fluorescent surface of a picture tube (not shown). At the same time, the electron beams A and C on both sides are tilted at an angle by known means to slightly eccentrically eccentrically the beam passing holes 6A and 6C of the fourth grid 6 outward with respect to the beam passing holes 5A and 5C of the upper third grid 5. A tilt of θ is given to make the three electron beams A, B, and C converge to one point. Therefore, it is impossible to use the same part for the upper third grid 5 and the fourth grid 6, and there is a problem that the number of types of parts increases. Furthermore, the assembly jig becomes complicated as it requires an eccentric core metal. Note that 7 is a convergence electrode.
このように構成される電子銃において、受像管
の螢光面上での結像点の大きさ、すなわちフオー
カス特性は、画像の鮮鋭度を左右するため、可能
な限り小さくすることが望ましく、また、フオー
カス特性の向上には一般に主レンズの口径を大き
くすることが行なわれている。 In an electron gun configured in this way, the size of the image point on the fluorescent surface of the picture tube, that is, the focus characteristic, affects the sharpness of the image, so it is desirable to make it as small as possible. In order to improve focus characteristics, the aperture of the main lens is generally increased.
第2図は上部第3グリツド5の上面を示す要部
平面図である。同図において、直径Dの3個の電
子ビーム通過孔5A,5B,5Cはそれぞれ間隔
Sで一直線上にインライン状に配列されている。
そして、フオーカス特性を向上させる手段として
主レンズ口径を拡大するために電子ビーム通過孔
5A,5B,5Cの直径Dを大きくする必要があ
る。しかし、厚さが約0.3mmの非磁性金属、例え
ばステンレス鋼板をプレス加工して形成する上部
第3グリツド5の電子ビーム通過孔5A,5B,
5Cは第1図に示す第4グリツド6との耐電圧特
性改良のため、絞り孔構造とする必要がある。さ
らに主レンズ電界の回転対称性の劣化防止には絞
り深さlを孔の直径Dの1/2以上必要とするため
部品加工上の問題から、直径Dは孔間隔Sよりも
0.8〜1.0mm小さい寸法に制約される。また該孔間
隔Sを大きくすることは、受像管動作時の螢光面
各点でのコンバーゼンス誤差が大きくなることお
よび主レンズを形成する上部第3グリツド5と第
4グリツド6との水平方向の寸法Lが大きくなつ
て電子銃が収容されるバルブネツクの内壁に近接
して耐電圧特性が劣化するという問題があつた。 FIG. 2 is a plan view of essential parts showing the upper surface of the third upper grid 5. As shown in FIG. In the figure, three electron beam passing holes 5A, 5B, and 5C each having a diameter D are arranged in a straight line with an interval S between them.
As a means of improving focus characteristics, it is necessary to increase the diameter D of the electron beam passage holes 5A, 5B, and 5C in order to enlarge the main lens aperture. However, the electron beam passing holes 5A, 5B of the upper third grid 5 are formed by pressing a non-magnetic metal such as a stainless steel plate with a thickness of about 0.3 mm.
5C needs to have an aperture hole structure in order to improve the withstand voltage characteristics with the fourth grid 6 shown in FIG. Furthermore, in order to prevent deterioration of the rotational symmetry of the main lens electric field, the aperture depth l must be at least 1/2 of the diameter D of the hole.
Restricted to 0.8~1.0mm smaller dimensions. In addition, increasing the hole spacing S increases the convergence error at each point on the phosphor surface during operation of the picture tube, and also increases the horizontal direction between the upper third grid 5 and the fourth grid 6 that form the main lens. There was a problem in that as the dimension L increased, the voltage resistance characteristics deteriorated as the electron gun came close to the inner wall of the valve neck in which the electron gun was housed.
また、良好なフオーカス特性を得るには、電子
ビーム通過孔5A,5B,5C等の真円度誤差
(長径−短径)は孔径Dの約0.5%以下が望ましい
とされている。このため、電子銃の組立は、各々
の電子ビーム通過孔を貫通する3本の芯金を備え
た図示しない治具上に各電極部品を保持し、加熱
したマルチフオームガラス8を支持体9に圧着し
て行なわれる。この場合、3本の芯金は各電極部
品の孔ピツチSおよび孔径Dに誤差があるため、
孔径Dよりも0.02〜0.03mm程度細く設定される。
したがつて、各電極部品製作時の誤差およびマル
チフオームガラス8の圧着時の応力によつてカツ
プ状本体の変形が絞り孔で形成される電子ビーム
通過孔5A,5B,5Cに波及して治具から取り
外した状態で測定した真円度誤差は極端な場合に
は約0.05mm、つまり孔径D=3.9mmの場合約1.3%
に達することがある。このように真円度の低下に
より主レンズの電界が歪むことによつて電子ビー
ムに非点収差が生じ、フオーカス特性が損なわれ
るという重大な欠点があつた。 Furthermore, in order to obtain good focus characteristics, it is said that the roundness error (major axis - minor axis) of the electron beam passing holes 5A, 5B, 5C, etc. is desirably about 0.5% or less of the hole diameter D. Therefore, to assemble the electron gun, each electrode component is held on a jig (not shown) equipped with three core metals passing through each electron beam passage hole, and the heated multiform glass 8 is attached to the support 9. It is done by crimping. In this case, the three core metals have errors in the hole pitch S and hole diameter D of each electrode component, so
The hole diameter is set to be approximately 0.02 to 0.03 mm smaller than the hole diameter D.
Therefore, the deformation of the cup-shaped body due to errors in manufacturing each electrode component and stress during pressure bonding of the multiform glass 8 spreads to the electron beam passage holes 5A, 5B, and 5C formed by the aperture holes, and is cured. The roundness error measured when removed from the tool is approximately 0.05 mm in extreme cases, or approximately 1.3% when hole diameter D = 3.9 mm.
may reach. This reduction in roundness distorts the electric field of the main lens, causing astigmatism in the electron beam, resulting in a serious drawback in that focus characteristics are impaired.
したがつて、本発明は、前述した従来の種々の
欠点に鑑みてなされたものであり、その目的とす
るところは、前述した副作用を軽減または解消し
て主レンズ口径を拡大するとともに電子銃の組立
精度を向上させ、フオーカス特性を向上させたカ
ラー受像管用電子銃を提供することにある。
Therefore, the present invention has been made in view of the various drawbacks of the prior art described above, and its purpose is to reduce or eliminate the aforementioned side effects, expand the main lens aperture, and improve the efficiency of electron guns. An object of the present invention is to provide an electron gun for a color picture tube with improved assembly accuracy and improved focus characteristics.
このような目的を達成するために本発明は、長
径方向にインライン状に3個の電子ビーム通過孔
を設けた長円形の厚板を間隔を設けて対向配置す
る電子ビーム集束用主レンズ形成電極は、両側の
電子ビーム通過孔はそれぞれ外側方向を半円、内
側方向は長円形厚板の短径方向を長径とする半楕
円を連接した異形孔とし、中央の電子ビーム通過
孔は長円形厚板の短径方向を長径方向とする楕円
孔とし、それぞれの電子ビーム通過孔が隣接する
電子ビーム通過孔の短径部で長円形厚板の周縁部
を残して対向電極との間隔が広くなるようにそれ
ぞれの電極底面に溝を形成し、電子ビームの集中
は第2グリツドと第3グリツドとの間で構成され
る電子レンズの両側電子ビームに係わる電子レン
ズを偏心させて行なう如く組合せたものである。
In order to achieve such an object, the present invention provides a main lens-forming electrode for electron beam focusing, in which oblong thick plates each having three electron beam passing holes arranged in-line in the major axis direction are arranged facing each other with an interval. , the electron beam passing holes on both sides are semicircular in the outward direction, and the inward direction is an irregularly shaped hole in which semi-ovals are connected with the major axis in the short axis direction of the oval thick plate, and the central electron beam passing hole is in the oval thickness. The short axis direction of the plate is an elliptical hole with the long axis direction, and each electron beam passing hole has a wide gap with the counter electrode, leaving a peripheral edge of the oval thick plate at the short diameter part of the adjacent electron beam passing hole. A groove is formed on the bottom surface of each electrode, and the electron beam is focused on both sides of the electron lens between the second grid and the third grid by decentering the electron lens associated with the electron beam. It is.
次に図面を用いて本発明の実施例を詳細に説明
する。
Next, embodiments of the present invention will be described in detail using the drawings.
第3図aは本発明によるカラー受像管用電子銃
の一実施例を示す主レンズを構成する上部第3グ
リツドの要部平面図である。同図において、上部
第3グリツド50は厚さ約2mmの長円形の板状体
で構成され、中央の電子ビーム通過孔50Bは長
径Dl、短径Dsの楕円孔、両側の電子ビーム通過
孔50Aおよび50Cはそれぞれ外側が半径
Dl/2の半円、内側が中央孔50Bと同じ大き
さの半楕円を連接した孔で、それぞれの中心が間
隔Sで配置されている。このように長円形の上部
第3グリツド50の短径方向を電子ビーム通過孔
の長径方向とすることによつて、長径Dlは孔ピ
ツチSよりも大きくすることが可能となる。ま
た、従来の絞り孔と異なつて長円形厚板をプレス
加工するため、電子ビーム通過孔50A,50
B,50C相互間のブリツジ部の寸法および両側
の孔50A,50Cと外形長径端との寸法も約
0.5mmと小さくすることができるため、水平方向
の寸法Lを大きくする必要はない。また、主レン
ズを形成する電子ビーム通過孔50A,50B,
50Cを楕円形および半円と半楕円とを連接した
異径孔とすることによつて、それぞれの電子ビー
ムは短径方向の集束作用を強く受ける非点収差が
生ずる。この補正のため、第3図bに第3図aの
断面図を示すように中央の電子ビーム通過孔50
Bの中心から両側の電子ビーム通過孔50A,5
0Cの中心の範囲にわたつて長径Dl、短半径h
の楕円状の溝50Dが設けられている。 FIG. 3a is a plan view of a main part of an upper third grid constituting a main lens showing an embodiment of an electron gun for a color picture tube according to the present invention. In the same figure, the upper third grid 50 is composed of an oblong plate with a thickness of about 2 mm, and the central electron beam passage hole 50B is an elliptical hole with a major axis Dl and a minor axis Ds, and electron beam passage holes 50A on both sides. and 50C each have a radius on the outside
The hole is a semicircle of Dl/2, and the inner side is a concatenation of half ellipses of the same size as the central hole 50B, and the centers of each hole are arranged at an interval S. By making the short axis direction of the elliptical upper third grid 50 the long axis direction of the electron beam passage holes, the long axis Dl can be made larger than the hole pitch S. Also, unlike conventional aperture holes, the electron beam passing holes 50A, 50
The dimensions of the bridge between B and 50C and the dimensions of the holes 50A and 50C on both sides and the major diameter end of the outside are also approximately
Since it can be made as small as 0.5 mm, there is no need to increase the horizontal dimension L. Further, electron beam passing holes 50A, 50B forming the main lens,
By forming 50C into an elliptical shape and a hole having different diameters in which a semicircle and a semiellipse are connected, astigmatism occurs in which each electron beam is strongly focused in the minor axis direction. For this correction, as shown in the cross-sectional view of FIG. 3a in FIG. 3b, the central electron beam passing hole 50 is
Electron beam passing holes 50A, 5 on both sides from the center of B
The major axis Dl and the minor axis h over the range of the center of 0C
An elliptical groove 50D is provided.
第4図は上部第3グリツド50と同様な構成に
よる第4グリツド60を対向配置させた本発明に
よる主レンズと第2グリツド30と下部第3グリ
ツド40との間で形成される電子レンズの両側電
子ビームに係わる電子レンズを偏心させて構成し
た電子ビームの集中方式を組合せた電子銃の要部
断面を示すものである。同図において、主レンズ
の口径は、各電子ビーム通過孔50A〜50Cお
よび60A〜60Cの短径側が楕円溝50Dおよ
び60Dによつて間隔が拡がるため、楕円溝50
D,60Dの深さhを適当な値に選ぶことによつ
て、電子ビームが通過する範囲の主レンズ口径は
長径Dlに相当するほぼ回転対称の電界が形成さ
れる。 FIG. 4 shows a main lens according to the present invention in which a fourth grid 60 having the same structure as the upper third grid 50 is disposed opposite to each other, and both sides of an electron lens formed between the second grid 30 and the lower third grid 40. This is a cross-sectional view of a main part of an electron gun that combines an electron beam concentration method in which an electron lens related to the electron beam is decentered. In the figure, the aperture of the main lens is determined by the elliptical grooves 50D and 60D because the distance between the short diameter sides of the electron beam passage holes 50A to 50C and 60A to 60C is widened by the elliptical grooves 50D and 60D.
By selecting the depth h of D and 60D to appropriate values, a substantially rotationally symmetrical electric field is formed in the main lens aperture in the range through which the electron beam passes, corresponding to the major axis Dl.
第4図において、上部第3グリツド50および
第4グリツド60からなる電子銃は、上部第3グ
リツド50および陽極60の電子ビーム通過孔5
0A〜50C,60A〜60Cを高精度で打ち抜
く板厚には約2mmの限界があるため、孔径が約4
mm以上の場合には約1/2以上の厚さを満足できな
いので、長円形厚板に上部第3グリツド50の孔
50A〜50Cおよび第4グリツド60の孔60
A〜60Cと同等の孔のみを打抜いた補助電極5
1および61の背面に支持体52および62を重
ねて構成されている。 In FIG. 4, the electron gun consists of an upper third grid 50 and a fourth grid 60.
There is a limit of approximately 2 mm to the plate thickness for punching 0A to 50C and 60A to 60C with high precision, so the hole diameter is approximately 4 mm.
If the thickness is more than 1/2 mm, the thickness of about 1/2 or more cannot be satisfied, so the holes 50A to 50C of the upper third grid 50 and the holes 60 of the fourth grid 60 are
Auxiliary electrode 5 with only punched holes equivalent to A to 60C
Supports 52 and 62 are stacked on the back surfaces of 1 and 61.
このような構成によれば、主レンズ構成電極の
機械的強度が強化されるため、電子銃組立時のマ
ルチフオームガラス圧着による応力によつても孔
形状が変形することはない。したがつて、主レン
ズ口径が等価的に拡大されるとともに、同一部品
を使用するのでバラツキが極めて小さくなり、組
立精度が向上することによつて、フオーカス特性
の向上した電子銃を得ることができる。 According to such a configuration, the mechanical strength of the main lens constituent electrode is strengthened, so that the shape of the hole will not be deformed even by stress caused by pressure bonding of the multiform glass during assembly of the electron gun. Therefore, the main lens aperture is equivalently enlarged, variations are extremely small because the same parts are used, and assembly accuracy is improved, making it possible to obtain an electron gun with improved focus characteristics. .
なお、両側の電子ビームのコンバーゼンスは、
第5図に第4図の−′断面を示すように主レ
ンズの孔間隔Sよりも若干大きい孔間隔S1とした
第1グリツド20および第2グリツド30に対
し、下部第3グリツド40の両側孔40A,40
Cの孔間隔S2を大きくして電子ビーム通過孔20
A,30Aおよび20C,30Cに対して外側に
偏心させることによつて角度θの傾斜角を与えて
行なう。 In addition, the convergence of the electron beams on both sides is
As shown in FIG. 5, the -' cross section in FIG. Hole 40A, 40
The electron beam passing hole 20 is made by increasing the hole spacing S2 of C.
A, 30A and 20C, 30C are eccentrically set to the outside to give an inclination angle of θ.
第6図は下部第3グリツド40′の両側孔40
A′および40C′を横長孔に形成したものである
が、同様に両側電子ビームをコンバーゼンスさせ
ることができる。 Figure 6 shows the holes 40 on both sides of the lower third grid 40'.
Although A' and 40C' are formed as horizontally elongated holes, electron beams on both sides can be converged similarly.
また、中央電子ビームBと両側電子ビームAお
よびCの形状に差がある場合には、第3図に示す
ように上部第3グリツド50および第4グリツド
60の中央楕円孔50B,60Bの短径Dsおよ
び両側孔50A,50C,60A,60C内側半
楕円の短半径Ds′/2を適正値に選ぶことによつ
て、3本の電子ビームを丸く調整することができ
る。 In addition, if there is a difference in the shape of the central electron beam B and the electron beams A and C on both sides, the short diameter of the central elliptical holes 50B and 60B of the upper third grid 50 and the fourth grid 60, as shown in FIG. The three electron beams can be adjusted to be round by selecting appropriate values for Ds and the minor axis Ds'/2 of the inner half-ellipse of the holes 50A, 50C, 60A, and 60C on both sides.
また、偏向収差により螢光面周辺で電子ビーム
形状が横長に潰れることによつて螢光面周辺の画
質が損なわれることを避けるため、電子ビーム形
状を予め縦長に設定する上部第3グリツド500
の他の実施例を第7図に示す。同図において、両
側孔500Aおよび500Cは長径がDlで外側
が内側と比べ短半径が大きい半楕円を連接した孔
とし、また中央孔500Bは長径Dlの楕円孔と
し、非点収差の補正には第3図bと同様に楕円溝
を設けることによつて、3本の電子ビームを丸く
調整することができる。 In addition, in order to avoid deterioration of the image quality around the fluorescent surface due to the electron beam shape being collapsed into a horizontally long shape around the fluorescent surface due to deflection aberration, the upper third grid 500 sets the electron beam shape to be vertically long in advance.
Another embodiment is shown in FIG. In the same figure, the holes 500A and 500C on both sides have a major axis Dl, and the outside has a larger short axis than the inside.The central hole 500B is an elliptical hole with a major axis Dl. By providing an elliptical groove as in FIG. 3b, the three electron beams can be adjusted to be round.
なお、前述した実施例において、非点収差を補
正する溝の断面形状を半楕円形状としたが、楕円
に近似した複数の曲線および直線で形成しても良
く、第8図に断面で示すような矩形の溝形状50
0D′でもほゞ同様な効果が得られる。 In the above-described embodiment, the cross-sectional shape of the groove for correcting astigmatism is semi-elliptical, but it may also be formed with a plurality of curved lines and straight lines that approximate an ellipse, as shown in the cross-section in FIG. Rectangular groove shape 50
Almost the same effect can be obtained with 0D'.
近年、カラー受像管は偏向電力の低減を目的と
してネツク管の直径が細くなる動向にあり、その
内部に収容される電子銃の縮小化により、主レン
ズ口径が小さくなつてフオーカス特性が低下する
ため、その改良に対する要求度が極めて高い。こ
のため、現在生産されているネツク径が約22.5mm
の電子銃の主レンズ寸法は孔ピツチS=4.75mm、
孔径D=3.9mmとなつているが、本発明の主レン
ズでは上部第3グリツド50および陽極60は孔
ピツチS=4.50mm、長径Dl=5.0mm、短径Ds=4.0
mm、溝の深さh=1.2mmで等価主レンズ口径が5.0
mmと従来電子銃の約1.3倍に拡大されることによ
り、ネツク径が約29mmと大きいカラー受像管と
ほゞ同等のフオーカス特性に改良することができ
た。 In recent years, the diameter of the neck tube of color picture tubes has become smaller in order to reduce the deflection power, and as the electron gun housed inside the tube has become smaller, the diameter of the main lens has become smaller and the focus characteristics have deteriorated. , there is an extremely high demand for its improvement. For this reason, the diameter of the nets currently produced is approximately 22.5 mm.
The main lens dimensions of the electron gun are hole pitch S = 4.75mm,
The hole diameter D = 3.9 mm, but in the main lens of the present invention, the upper third grid 50 and the anode 60 have hole pitch S = 4.50 mm, major axis Dl = 5.0 mm, and minor axis Ds = 4.0.
mm, groove depth h=1.2mm and equivalent main lens aperture is 5.0
mm, which is approximately 1.3 times larger than that of a conventional electron gun, has improved the focus characteristics to approximately the same as a color picture tube with a large net diameter of approximately 29 mm.
なお、前述した実施例においてはバイポテンシ
ヤル集束形電子銃について説明したが、本発明は
これに限定されるものではなく、ユニポテンシヤ
ル形および多段集束形電子銃等の電子銃の主レン
ズ形成電極に適用しても前述と全く同様の効果が
得られることは勿論である。 In the above embodiments, a bipotential focusing electron gun has been described, but the present invention is not limited thereto, and may be applied to the main lens forming electrode of an electron gun such as a unipotential type or a multistage focusing electron gun. Of course, even if applied, the same effect as described above can be obtained.
以上説明したように本発明によるカラー受像管
用電子銃によれば、電極の加工上の問題点、耐電
圧特性などの副作用を伴なうことなく、主レンズ
口径を拡大することができるので、フオーカス特
性が向上し、鮮鋭度の高い画像が得られるという
極めて優れた効果を有する。
As explained above, according to the electron gun for color picture tube according to the present invention, the main lens aperture can be enlarged without problems in electrode processing or side effects such as withstand voltage characteristics, so that the focus can be improved. It has an extremely excellent effect of improving characteristics and producing images with high sharpness.
第1図は従来のインライン形電子銃の構造およ
び動作状態を示す要部断面図、第2図は従来の上
部第3グリツドを示す要部平面図、第3図a,b
は本発明によるカラー受像管用電子銃に係わる上
部第3グリツドを示す要部平面図、その要部断面
図、第4図は本発明によるカラー受像管用電子銃
の一実施例を示す要部断面構成図、第5図および
第6図は本発明による電子銃と組合せる電子ビー
ムの集中方式を説明するための要部平面図、第7
図は本発明による電子銃の上部第3グリツドの他
の実施例を示す要部平面図、第8図は本発明によ
る電子銃の上部第3グリツドの他の実施例を示す
要部断面図である。
20……第1グリツド、20A,20B,20
C……電子ビーム通過孔、30……第2グリツ
ド、30A,30B,30C……電子ビーム通過
孔、40……下部第3グリツド、40A,40
A′,40B,40B′,40C,40C′……電子
ビーム通過孔、50……上部第3グリツド、50
A,50B,50C……電子ビーム通過孔、50
D……溝、500,500′……上部第3グリツ
ド、500A,500B,500C……電子ビー
ム通過孔、500D,500D′……溝。
Figure 1 is a sectional view of the main parts showing the structure and operating state of a conventional in-line electron gun, Figure 2 is a plan view of the main parts showing the conventional upper third grid, and Figures 3a and b.
4 is a plan view of a main part showing the upper third grid of the electron gun for a color picture tube according to the present invention, and a cross-sectional view of the main part thereof. FIG. 5 and 6 are plan views of main parts for explaining the electron beam concentration method combined with the electron gun according to the present invention, and FIG.
FIG. 8 is a plan view of essential parts showing another embodiment of the upper third grid of the electron gun according to the present invention, and FIG. 8 is a sectional view of essential parts showing another embodiment of the upper third grid of the electron gun according to the present invention. be. 20...First grid, 20A, 20B, 20
C... Electron beam passing hole, 30... Second grid, 30A, 30B, 30C... Electron beam passing hole, 40... Lower third grid, 40A, 40
A', 40B, 40B', 40C, 40C'...Electron beam passing hole, 50...Third upper grid, 50
A, 50B, 50C...Electron beam passing hole, 50
D... Groove, 500, 500'... Upper third grid, 500A, 500B, 500C... Electron beam passing hole, 500D, 500D'... Groove.
Claims (1)
通過孔を有するグリツドを管軸方向に複数個配列
して対向するそれぞれの電子ビーム通過孔で電子
レンズを形成させるインライン形電子銃を備えた
カラー受像管において、前記電子レンズを形成す
るグリツドは複数個の長円形厚板状電極を間隔を
設けて対向配置させ、前記長円形厚板状電極の中
央の電子ビーム通過孔は長円形厚板の短径方向を
長径とする楕円状孔とし、両側の電子ビーム通過
孔はそれぞれ内側方向を前記長円形厚板の短径方
向を長径とする半楕円、外側方向を前記半楕円の
短半径より大きくして連接した異形孔として、そ
れぞれの電子ビーム通過孔が隣接する電子ビーム
通過孔の短径部分で長円形厚板の周縁部を残して
対向電極との間隔が広くなるように構成されるイ
ンライン形電子銃を備えることを特徴としたカラ
ー受像管。 2 前記電子レンズ形成グリツドに間隔を設けて
配置された複数個の長円形厚板状電極の対向する
側に溝が形成されていることを特徴とする特許請
求の範囲第1項記載のカラー受像管。 3 前記溝は、前記長円形厚板の短径方向で、そ
の中央部において最も深いことを特徴とする特許
請求の範囲第1項記載のカラー受像管。 4 前記インライン形電子銃は、3個の電子ビー
ム通過孔を有する少なくとも第1グリツド、第2
グリツド、第3グリツドを管軸方向に順次配列
し、第3グリツドの両側の電子ビーム通過孔は、
第2グリツドの両側の電子ビーム通過孔よりも、
外側に偏心させてあることを特徴とする特許請求
の範囲第1項記載のカラー受像管。 5 両側の電子ビームを収束させる主レンズの中
心の、中央の電子ビームを収束させる主レンズの
中心からの距離は、第2グリツドの中央の孔中心
から、両側の孔中心までの距離よりも小さいこと
を特徴とする特許請求の範囲第1項記載のカラー
受像管。[Scope of Claims] 1. An in-line type electronic device in which a plurality of grids each having three electron beam passing holes arranged in-line are arranged in the tube axis direction and an electron lens is formed by each of the opposing electron beam passing holes. In a color picture tube equipped with a gun, the grid forming the electron lens has a plurality of oval thick plate electrodes arranged facing each other at intervals, and the electron beam passing hole in the center of the oval thick plate electrode is An elliptical hole whose major axis is the short axis direction of the oval thick plate, and each of the electron beam passing holes on both sides is a semi-ellipse whose long axis is the short axis direction of the oval thick plate in the inner direction, and the semi-ellipse in the outer direction. The irregularly shaped holes are made larger than the short axis of the adjacent electron beam passing hole and are connected so that the distance between each electron beam passing hole and the opposing electrode is widened by leaving the peripheral edge of the oval thick plate at the short axis of the adjacent electron beam passing hole. A color picture tube characterized by being equipped with an in-line electron gun configured as follows. 2. The color image receiving device according to claim 1, wherein grooves are formed on opposing sides of a plurality of oblong thick plate electrodes arranged at intervals in the electron lens forming grid. tube. 3. The color picture tube according to claim 1, wherein the groove is deepest in the central portion of the oval thick plate in the short axis direction thereof. 4. The in-line electron gun includes at least a first grid and a second grid having three electron beam passing holes.
The grid and the third grid are arranged sequentially in the tube axis direction, and the electron beam passing holes on both sides of the third grid are
From the electron beam passing holes on both sides of the second grid,
2. The color picture tube according to claim 1, wherein the color picture tube is eccentric to the outside. 5 The distance from the center of the main lens that converges the electron beams on both sides to the center of the main lens that converges the central electron beam is smaller than the distance from the center of the hole at the center of the second grid to the center of the holes on both sides. A color picture tube according to claim 1, characterized in that:
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59065707A JPS60211744A (en) | 1984-04-04 | 1984-04-04 | Electron gun for color picture tube |
| US06/718,855 US4833364A (en) | 1984-04-04 | 1985-04-02 | Electron gun for color picture tubes having uniquely formed lens apertures |
| KR1019850002236A KR900001500B1 (en) | 1984-04-04 | 1985-04-03 | Electron gun for color water pipe |
| EP85302370A EP0157648B1 (en) | 1984-04-04 | 1985-04-03 | In-line electron gun for color picture tube |
| DE8585302370T DE3579181D1 (en) | 1984-04-04 | 1985-04-03 | IN-LINE ELECTRONIC CANNON FOR A COLOR TUBE. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59065707A JPS60211744A (en) | 1984-04-04 | 1984-04-04 | Electron gun for color picture tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60211744A JPS60211744A (en) | 1985-10-24 |
| JPH0523010B2 true JPH0523010B2 (en) | 1993-03-31 |
Family
ID=13294758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59065707A Granted JPS60211744A (en) | 1984-04-04 | 1984-04-04 | Electron gun for color picture tube |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS60211744A (en) |
| KR (1) | KR900001500B1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100617212B1 (en) * | 1999-08-13 | 2006-08-30 | 엘지전자 주식회사 | Electron gun for colored cathode ray tube |
-
1984
- 1984-04-04 JP JP59065707A patent/JPS60211744A/en active Granted
-
1985
- 1985-04-03 KR KR1019850002236A patent/KR900001500B1/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| KR900001500B1 (en) | 1990-03-12 |
| JPS60211744A (en) | 1985-10-24 |
| KR850007535A (en) | 1985-12-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |