JPH0523084B2 - - Google Patents

Info

Publication number
JPH0523084B2
JPH0523084B2 JP59046993A JP4699384A JPH0523084B2 JP H0523084 B2 JPH0523084 B2 JP H0523084B2 JP 59046993 A JP59046993 A JP 59046993A JP 4699384 A JP4699384 A JP 4699384A JP H0523084 B2 JPH0523084 B2 JP H0523084B2
Authority
JP
Japan
Prior art keywords
aluminum nitride
sintered body
acoustic wave
surface acoustic
nitride sintered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59046993A
Other languages
Japanese (ja)
Other versions
JPS60192410A (en
Inventor
Tadashi Shiozaki
Fumio Takeda
Akira Kawabata
Nobuyuki Kuramoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Priority to JP4699384A priority Critical patent/JPS60192410A/en
Publication of JPS60192410A publication Critical patent/JPS60192410A/en
Publication of JPH0523084B2 publication Critical patent/JPH0523084B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02543Characteristics of substrate, e.g. cutting angles
    • H03H9/02574Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate

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  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Description

【発明の詳細な説明】 本発明は新規な弾性表面波素子を提供する。詳
しくは、新規な特定の窒化アルミニウム焼結体よ
りなる板状基板の少なくとも片方の面に圧電性薄
膜及び電極を積層してなる弾性表面波素子に関す
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a novel surface acoustic wave device. More specifically, the present invention relates to a surface acoustic wave element in which a piezoelectric thin film and an electrode are laminated on at least one surface of a plate-shaped substrate made of a new specific aluminum nitride sintered body.

弾性表面波素子は電子機械、機器の一部として
広く使用されている。例えばガラス基板上に酸化
亜鉛の薄膜を形成し、その表面に電極を設けた弾
性表面波素子は電波のフイルター材例えばテレビ
の映像中間周波数用フイルター、FM中間周波数
用フイルターとして使用されている。しかしなが
ら、従来の弾性表面波素子は高周波用として使用
するのに十分にその機能を発揮し得ない欠陥があ
る。そのため、近年に於いては高周波用フイルタ
ーとしても満足の出来る弾性表面波素子の開発が
要求されている。
Surface acoustic wave elements are widely used as part of electronic machines and equipment. For example, a surface acoustic wave element in which a thin film of zinc oxide is formed on a glass substrate and electrodes are provided on the surface thereof is used as a radio wave filter material, such as a filter for video intermediate frequencies of televisions and a filter for FM intermediate frequencies. However, conventional surface acoustic wave elements have a defect that prevents them from fully exhibiting their functions when used for high frequencies. Therefore, in recent years, there has been a demand for the development of surface acoustic wave elements that can be used as high-frequency filters.

本発明者は鋭意弾性表面波素子の開発にたずさ
わつて来たが、新規な窒化アルミニウム基板を使
用する新規な弾性表面波素子が著しくすぐれた特
性を発揮することを見出し、更に研究を続けた結
果、本発明を完成したことに提案するに至つた。
The present inventor has been earnestly involved in the development of surface acoustic wave devices, and discovered that a new surface acoustic wave device using a new aluminum nitride substrate exhibits significantly superior characteristics, and continued research. As a result, the present invention has been completed and proposed.

すなわち、本発明は窒化アルミニウム焼結体よ
りなる板状基板の少なくとも片方の面に圧電性薄
膜及び電極を積層してなる弾性表面波素子で、該
窒化アルミニウム焼結体が機械的な破断面が明瞭
な輪郭によつて互に区別される微細な結晶粒の緊
密な充填状態によつて形成されており、該微細な
結晶粒の該破断面における該明瞭な輪郭は多角形
状であり、該微細な結晶は該明瞭な輪郭によつて
規定される該破断面における平均粒子径をD(μ
m)で定義するとき0.3D〜1.8Dの範囲の粒子径
を持つ結晶粒の個数が少なくとも70%を占めるこ
とによつて構成されているものであることを特徴
とする弾性表面波素子である。
That is, the present invention provides a surface acoustic wave element comprising a piezoelectric thin film and an electrode laminated on at least one surface of a plate-like substrate made of an aluminum nitride sintered body, in which the aluminum nitride sintered body has a mechanically fractured surface. It is formed by a tightly packed state of fine grains that are distinguished from each other by clear contours, and the clear contours at the fracture surface of the fine grains are polygonal, and the fine grains have a polygonal shape. The average particle diameter of the crystal at the fracture surface defined by the clear contour is D(μ
A surface acoustic wave device characterized in that the number of crystal grains having a particle size in the range of 0.3D to 1.8D accounts for at least 70% when defined in (m). .

新規な窒化アルミニウム焼結体であり、下記の
ものが使用される。
This is a new aluminum nitride sintered body, and the following are used.

すなわち、窒化アルミニウム焼結体で、その機
械的に破断した破断面が明瞭な輪郭によつて互い
に区別される微細な結晶粒の緊密な充填状態によ
つて形成されており、該微細な結晶粒の該破断面
における該明瞭な輪郭は多角形状であり、該微細
な結晶は該明瞭な輪郭によつて規定される該破断
面における平均粒子径をD(μm)で定義すると
き、0.3D〜1.8D好ましくは0.5〜1.5Dの範囲の粒
子径を持つ結晶粒が少なくとも70%を占めること
によつて構成されている窒化アルミニウム焼結体
である。また、前記窒化アルミニウム焼結体は密
度が3.20g/cm3以上、好ましくは3.23g/cm3以上
のものが好適に採用される。更にまた、陽イオン
不純物の含有量が0.3重量%以下、好ましくは0.1
重量%以下の上記性状を有する窒化アルミニウム
焼結体は特にすぐれた透明性を示すもので好適に
採用される。
That is, it is an aluminum nitride sintered body whose mechanically fractured fracture surface is formed by a tightly packed state of fine crystal grains that are distinguished from each other by clear contours, and the fine crystal grains are The clear contour on the fracture surface is polygonal, and the fine crystals have an average particle size of 0.3D to 0.3D (μm) when the average particle diameter on the fracture surface defined by the clear contour is defined by D (μm). The aluminum nitride sintered body is composed of at least 70% of crystal grains having a particle diameter of 1.8D, preferably 0.5 to 1.5D. The aluminum nitride sintered body preferably has a density of 3.20 g/cm 3 or more, preferably 3.23 g/cm 3 or more. Furthermore, the content of cationic impurities is 0.3% by weight or less, preferably 0.1% by weight.
An aluminum nitride sintered body having the above-mentioned properties of less than % by weight exhibits particularly excellent transparency and is preferably employed.

前記窒化アルミニウム焼結体は新規なものであ
り、このような焼結体は例えば次ぎのようにして
製造すればよい。すなわち、平均粒子径2μm以
下かつ3μm以下の粒子のものを70容量%以上の
割合で含みかつ酸素含有量が3重量%以下好まし
くは1.5重量%以下及び窒化アルミニウムの純度
が95%以上好ましくは97%以上で、好ましくは陽
イオン不純物を0.3重量%以下好ましくは0.1重量
%以下含有する窒化アルミニウム粉末を、周期律
表第a族金属及び同第a族金属から選ばれた
少なくとも一種の金属酸化物または焼結時に該金
属となりうる金属化合物の存在下または不存在下
に、常圧または30〜500Kg/cm2の加圧下に1600〜
2100℃の温度下に加熱焼結することによつて得ら
れる。なお、上記における窒化アルミニウムはア
ルミニウムと窒素の1:1の化合物であり、これ
以外のものを原則としてすべて不純物として取扱
う。ただし、窒化アルミニウム粉末の表面は空気
中で不可避的に酸化されAL−N結合がAL−O結
合に置代つているので、このAL−O結合してい
るアルミニウムは陽イオン不純物とはみなさな
い。また焼結助剤となる成分についても陽イオン
不純物とはみなさない。更に、下記説明における
平均粒子径とは光透過式の粒度分布測定器による
体積基準の中間粒子径をいう。
The aluminum nitride sintered body is new, and such a sintered body may be manufactured, for example, as follows. That is, it contains particles with an average particle size of 2 μm or less and 3 μm or less in a ratio of 70% by volume or more, an oxygen content of 3% by weight or less, preferably 1.5% by weight or less, and an aluminum nitride purity of 95% or more, preferably 97%. % or more, preferably 0.3% by weight or less, preferably 0.1% by weight or less of cationic impurities, and at least one metal oxide selected from Group A metals and Group A metals of the Periodic Table. Or, in the presence or absence of a metal compound that can become the metal during sintering, at normal pressure or under a pressure of 30 to 500 kg/ cm2 ,
Obtained by heating and sintering at a temperature of 2100°C. Note that the aluminum nitride mentioned above is a 1:1 compound of aluminum and nitrogen, and anything other than this is treated as an impurity in principle. However, since the surface of the aluminum nitride powder is inevitably oxidized in the air and the AL-N bond is replaced by the AL-O bond, the aluminum bonded to the AL-O bond is not considered to be a cationic impurity. Also, components that serve as sintering aids are not considered cationic impurities. Furthermore, the average particle diameter in the following description refers to the volume-based median particle diameter measured by a light transmission type particle size distribution analyzer.

前記のような特性を有する窒化アルミニウム粉
末も新規なものであり、例えば次ぎのようにして
得られたものが好適に使用出来る。すなわち、 (1) 平均粒子径が2μm以下の酸化アルミニウム
微粒子と灰分含量0.2重量%以下で平均粒子径
が1μm以下のカーボン微粉末とを、例えばア
ルコール類、炭化水素類、水などの液体分散媒
体中で緊密に混合し、そのさい該酸化アルミニ
ウム微粉末対該カーボン微粉末の重量比は1:
0.36〜1:1であり; (2) 得られた緊密混合物を、適宜乾燥し、窒素ま
たはアンモニアの雰囲気下で1400〜1700℃の温
度で焼成し; (3) 次いで得られた微粉末を酸素を含む雰囲気下
で600〜900℃の温度で加熱して未反応のカーボ
ンを加熱除去し、窒化アルミニウム含量が少な
くとも95重量%であり、結合酸素の含量が最大
3.0重量%好ましくは1.5重量%であり、かつ不
純物としての金属化合物の含量が金属として最
大0.3重量%である平均粒子径が2μm以下の酸
化アルミニウム粉末を生成せしめる ことによつて製造することができる。
The aluminum nitride powder having the above characteristics is also new, and for example, one obtained as follows can be suitably used. That is, (1) Fine aluminum oxide particles with an average particle size of 2 μm or less and fine carbon powder with an ash content of 0.2% by weight or less and an average particle size of 1 μm or less are mixed in a liquid dispersion medium such as alcohol, hydrocarbons, or water. The weight ratio of the aluminum oxide fine powder to the carbon fine powder is 1:
0.36 to 1:1; (2) The intimate mixture obtained is optionally dried and calcined at a temperature of 1400 to 1700°C under an atmosphere of nitrogen or ammonia; (3) The fine powder obtained is then exposed to oxygen. The unreacted carbon is removed by heating at a temperature of 600-900℃ in an atmosphere containing
3.0% by weight, preferably 1.5% by weight, and can be produced by producing aluminum oxide powder with an average particle size of 2 μm or less, containing a maximum of 0.3% by weight of metal compounds as impurities. .

また上記アルミナ、カーボン等の原料に伴われ
て混入するかあるいは窒化アルミニウム粉末の製
造工程で混入する不純物は極力少なくすべきで、
例えば、不純物として金属化合物の含有量が金属
として0.3重量%以下好ましくは0.2重量%以下更
に好ましくは0.1重量%以下のものを用いるのが
好ましい。特に上記不純物成分の金属のうち、
鉄、クロム、ニツケル、コバルト、銅、亜鉛また
はチタン成分が、これらの不純物の含有量を金属
として全含量が0.1重量%以下のとき、前記窒化
アルミニウム粉末は窒化アルミニウム焼結体に透
光性を付与するので好適である。
In addition, impurities mixed in with raw materials such as alumina and carbon, or mixed in during the manufacturing process of aluminum nitride powder should be minimized.
For example, it is preferable to use a metal compound whose content as an impurity is 0.3% by weight or less, preferably 0.2% by weight or less, more preferably 0.1% by weight or less. Especially among the metals of the above impurity components,
When the total content of iron, chromium, nickel, cobalt, copper, zinc, or titanium components is 0.1% by weight or less, the aluminum nitride powder imparts translucency to the aluminum nitride sintered body. It is suitable because it gives

本発明の弾性表面波素子は前記したように窒化
アルミニウム焼結体よりなる板状基板の少なくと
も片方の面に圧電性薄膜を積層する必要がある。
該圧電性薄膜の材質は弾性表面波素子としての使
用をさまたげない限り公知のものを使用すること
が出来る。例えば、一般には特に酸化亜鉛及び窒
化アルミニウムの材質を選ぶことは好適である。
また、該圧電性薄膜を積層する方法も特に限定さ
れず公知の手段及び装置を使用すればよい。一般
には例えば、圧電性薄膜を与える材料例えば酸化
亜鉛焼結体、窒化アルミニウム焼結体等を用い高
周波マグネトロンスパツタリング法などの手段で
付与すればよい。更には窒化アルミニウム薄膜を
積層形成する方法としては、窒素を含む雰囲気下
に金属アルミニウムを高周波マグネトロンスパツ
タリングして反応性薄膜として析出させる方法も
採用出来る。
As described above, the surface acoustic wave device of the present invention requires a piezoelectric thin film to be laminated on at least one surface of a plate-like substrate made of a sintered aluminum nitride body.
Any known material can be used for the piezoelectric thin film as long as it does not hinder its use as a surface acoustic wave element. For example, it is generally preferable to select materials such as zinc oxide and aluminum nitride.
Further, the method of laminating the piezoelectric thin films is not particularly limited, and any known means and apparatus may be used. Generally, for example, a piezoelectric thin film can be formed using a material such as a zinc oxide sintered body, an aluminum nitride sintered body, etc., and a method such as a high-frequency magnetron sputtering method. Furthermore, as a method for laminating aluminum nitride thin films, a method may be adopted in which metal aluminum is deposited as a reactive thin film by high-frequency magnetron sputtering in an atmosphere containing nitrogen.

また、電極を設ける方法も特に限定されず公知
の方法を採用することが出来る。一般には金やア
ルミニウムなどの櫛形電極を、前記窒化アルミニ
ウム焼結体よりなる板状基板の表面にあるいは該
窒化アルミニウム焼結体よりなる板状基板の表面
に圧電性薄膜を積層した後該薄膜上に設ける方法
が好適に採用出来る。
Furthermore, the method of providing the electrodes is not particularly limited, and any known method can be employed. Generally, a comb-shaped electrode made of gold or aluminum is laminated on the surface of the plate-like substrate made of the aluminum nitride sintered body, or after a piezoelectric thin film is laminated on the surface of the plate-shaped substrate made of the aluminum nitride sintered body. A method of providing this can be suitably adopted.

本発明の弾性表面波素子は後述する実施例でも
明らかなように、高い電気機械結合係数及び低い
温度係数を有する特徴を発揮する。更にまた、窒
化アルミニウム焼結体を基板とするために、伝搬
速度が、従来基板例えばガラス基板に比べて数倍
以上高い利点を有するので、高周波用弾性表面波
素子として極めてすぐれている。
The surface acoustic wave device of the present invention exhibits characteristics of having a high electromechanical coupling coefficient and a low temperature coefficient, as will be clear from the examples described below. Furthermore, since the aluminum nitride sintered body is used as a substrate, the propagation speed is several times higher than that of a conventional substrate, for example, a glass substrate, so it is extremely excellent as a high frequency surface acoustic wave device.

本発明を更に具体的に説明するため以下実施例
を挙げて説明するが、本発明はこれらの実施例に
限定されるものではない。
EXAMPLES In order to explain the present invention more specifically, the present invention will be described below with reference to Examples, but the present invention is not limited to these Examples.

実施例 1 純度99.99%(不純物分析値を表1に示す)で
平均粒子径が0.52μmで3μm以下の粒子の割合が
95vol%のアルミナ100重量部と、灰分0.08wt%で
平均粒子径が0.45μmのカーボンブラツク50重量
部とを、ナイロン製ポツツトとナイロンコーテイ
ングしたボールを用いエタノールを分散媒体とし
て均一にボールミル混合した。得られた混合物を
乾燥後、高純度黒鉛製平皿に入れ電気炉内に窒素
ガスを3/minで連続的に供給しながら1600℃
の温度で6時間加熱した。得られた反応混合物を
空気中で750℃の温度で4時間加熱し、未反応の
カーボンを酸化除去した。得られた白色の粉末は
X線回析分析(Xray diffraction analysis)の
結果、単相(single phase)のAlNでありAl2O3
の回析ピークは無かつた。また該粉末の平均粒子
径を粒度分布測定器(堀場製作所製CAPA−500)
を用いて測定したところ1.31μmであり、3μm以
下が90容量%を占めた。走査型電子顕微鏡による
観察ではこの粉末は平均0.7μm程度の均一な粒子
であつた。また比表面積の測定値は4.0m2/gで
あつた。この粉末の分析値を表2に示す。
Example 1 The purity is 99.99% (impurity analysis values are shown in Table 1), the average particle diameter is 0.52 μm, and the proportion of particles of 3 μm or less is
100 parts by weight of 95 vol% alumina and 50 parts by weight of carbon black having an ash content of 0.08 wt% and an average particle size of 0.45 μm were uniformly mixed in a ball mill using a nylon pot and a nylon-coated ball with ethanol as a dispersion medium. After drying the resulting mixture, it was placed in a flat plate made of high-purity graphite and heated at 1600°C while continuously supplying nitrogen gas at 3/min in an electric furnace.
The mixture was heated at a temperature of 6 hours. The resulting reaction mixture was heated in air at a temperature of 750° C. for 4 hours to oxidize and remove unreacted carbon. As a result of X-ray diffraction analysis, the obtained white powder was found to be single phase AlN, Al 2 O 3
There were no diffraction peaks. In addition, the average particle diameter of the powder was measured using a particle size distribution analyzer (CAPA-500 manufactured by Horiba, Ltd.).
As a result of measurement, it was 1.31 μm, and 90% by volume was 3 μm or less. When observed using a scanning electron microscope, this powder was found to be uniform particles with an average size of about 0.7 μm. Further, the measured value of the specific surface area was 4.0 m 2 /g. The analytical values of this powder are shown in Table 2.

表1 Al2O3粉末分析値 Al2O3含有量 99.99% 元素 含有量(ppm) Mg <5 Cr <10 Si 30 Zn <5 Fe 22 Cu <5 Ca <20 Ni 15 Ti <5 表2 AlN粉末分析値 AlN含有量 97.8% 元 素 含有量 Mg <5(ppm) Cr 21(ppm) Si 125(ppm) Zn 9(ppm) Fe 20(ppm) Cu <5(ppm) Mn 5(ppm) Ni 27(ppm) Ti <5(ppm) Co <5(ppm) Al 64.8(wt%) N 33.4(wt%) O 1.1(wt%) C 0.11(wt%) このようにして得られた窒化アルミニウム粉末
に硝酸カルシウム、Ca(NO82・4H2OをCaO換
算で0.5重量%となるよう添加しエタノールを分
散媒として均一に混合した。混合後撹拌しながら
徐々にエタノールを飛ばして乾燥した。この混合
粉末を内径40mmの黒鉛製モールドに充填し、1気
圧の窒素ガス中、圧力200Kg/cm2,1900℃,1時
間の条件でホツトプレス焼結した。得られた厚さ
約2mmの透光感のある焼結体は密度3.26Kg/cm3
あつた。この焼結体を切断後研磨し、最終的に表
面粗さが約500Åで大きさが13mm×13mmで厚さ0.6
mmの基板を作成した。この基板上に周期100μm
25対、開口4.4mm、中心距離5.5mmのAuの櫛形電極
をフオトエツチング法で設けた。さらにこの基板
上にリチウム入りZnOターゲツトを酸素、アルゴ
ン等量の混合ガスを用い圧力1×10-2中で高周波
マグネトロンスパツタリングにより厚さ5.33〜
42.1μmのC軸配向薄膜を形成した。さらにZnO
表面を短絡するために、ZnO薄膜上に櫛形電極と
同じ面積にAlを蒸着し、上部電極を有する素子
を作成した。この素子の電気機械結合係数(K2
を膜厚(h)と、波長(λ)の比h/λに対して1次
モードを用いて測定したところ、h/λ=0.12の
時K2=6.6%,h/λ=0.19でK2=5.5%,h/λ
=0.33でK2=2.2%であつた。また伝搬速度
(Vp)とh/λとの関係は、h/λ=0.12、0.19、
0.33に対し各々Vp=6550、5540、5020m/秒で
あつた。またh/λ=0.19の場合、中心周波数の
温度依存性は−40ppm/℃であつた。
Table 1 Al 2 O 3 powder analysis values Al 2 O 3 content 99.99% Element Content (ppm) Mg <5 Cr <10 Si 30 Zn <5 Fe 22 Cu <5 Ca <20 Ni 15 Ti <5 Table 2 AlN Powder analysis AlN content 97.8% Element Content Mg <5 (ppm) Cr 21 (ppm) Si 125 (ppm) Zn 9 (ppm) Fe 20 (ppm) Cu <5 (ppm) Mn 5 (ppm) Ni 27 (ppm) Ti <5 (ppm) Co <5 (ppm) Al 64.8 (wt%) N 33.4 (wt%) O 1.1 (wt%) C 0.11 (wt%) Aluminum nitride powder thus obtained Calcium nitrate and Ca(NO 8 ) 2 ·4H 2 O were added to the solution to give a concentration of 0.5% by weight in terms of CaO, and the mixture was uniformly mixed using ethanol as a dispersion medium. After mixing, the mixture was dried by gradually removing ethanol while stirring. This mixed powder was filled into a graphite mold with an inner diameter of 40 mm, and hot press sintered at 1 atm of nitrogen gas at a pressure of 200 Kg/cm 2 at 1900° C. for 1 hour. The resulting translucent sintered body having a thickness of about 2 mm had a density of 3.26 Kg/cm 3 . After cutting and polishing this sintered body, the final surface roughness is approximately 500 Å, the size is 13 mm x 13 mm, and the thickness is 0.6 mm.
A mm board was created. On this substrate, the period is 100μm.
25 pairs of Au comb-shaped electrodes with an opening of 4.4 mm and a center distance of 5.5 mm were provided by photoetching. Furthermore, a lithium-containing ZnO target was deposited on this substrate to a thickness of 5.33~ by high-frequency magnetron sputtering at a pressure of 1 × 10 -2 using a mixed gas of equal amounts of oxygen and argon.
A C-axis oriented thin film of 42.1 μm was formed. Furthermore, ZnO
In order to short-circuit the surface, Al was evaporated onto the ZnO thin film in the same area as the comb-shaped electrode, creating a device with an upper electrode. Electromechanical coupling coefficient (K 2 ) of this element
When measured using the first mode for the ratio h/λ of film thickness (h) and wavelength (λ), K 2 = 6.6% when h/λ = 0.12, and K when h/λ = 0.19. 2 = 5.5%, h/λ
= 0.33 and K 2 = 2.2%. Also, the relationship between propagation velocity (Vp) and h/λ is h/λ=0.12, 0.19,
0.33, Vp=6550, 5540, and 5020 m/sec, respectively. Further, when h/λ=0.19, the temperature dependence of the center frequency was -40 ppm/°C.

また、前記窒化アルミニウム焼結体の機械的破
断面の走査型電子顕微鏡写真をとつた。この写真
は倍率2000倍のもので1cm5μmに相当するもの
で第1図として添付する。この写真(7cm×10
cm)を用いて焼結体を構成する粒子形及び粒径を
測定した。粒子は明瞭な輪郭をもつ多角形状の微
細な結晶粒から形成されており、その平均粒子径
D(長径と短径の平均値)は6.9μmであり、0.3D
〜1.8Dすなわち2.1μm〜12.4μmの範囲の粒子径
をもつ結晶粒子の個数の割合が97%を占めるもの
であつた。
In addition, a scanning electron micrograph of the mechanically fractured surface of the aluminum nitride sintered body was taken. This photograph is 2000x magnification and corresponds to 1cm5μm, and is attached as Figure 1. This photo (7cm x 10
cm) to measure the particle shape and particle size constituting the sintered body. The particles are formed from polygonal fine crystal grains with clear outlines, and the average particle diameter D (average value of major axis and minor axis) is 6.9 μm, and 0.3D.
The proportion of crystal grains having a particle diameter in the range of ~1.8D, that is, 2.1 μm to 12.4 μm, accounted for 97%.

実施例 2 実施例1のZnOターゲツトの代りに金属アルミ
ニウムをターゲツトとして窒素、アルゴン等量の
混合ガスを用い、圧力1×10-2Torr、基板温度
200℃の条件で高周波マグネトロンスパツタリン
グすることによつてC軸配向したAlN薄膜形成
させ、AlN基板とAlN薄膜の界面に櫛形電極を
もつ構造の素子を作成した。実施例1と同様にし
て電気機械係数を測定したところ、h/λ=0.18
でK2=6.0%、Vp=7220m/秒であつた。
Example 2 Metal aluminum was used as a target instead of the ZnO target in Example 1, and a mixed gas of equal amounts of nitrogen and argon was used at a pressure of 1×10 -2 Torr and a substrate temperature.
A C-axis oriented AlN thin film was formed by high-frequency magnetron sputtering at 200°C, and an element with a comb-shaped electrode at the interface between the AlN substrate and the AlN thin film was created. When the electromechanical coefficient was measured in the same manner as in Example 1, h/λ = 0.18.
K 2 = 6.0% and Vp = 7220 m/sec.

【図面の簡単な説明】[Brief explanation of the drawing]

添付図面第1図は、実施例1で得られた窒化ア
ルミニウム焼結体を機械的に破断し、その一部を
顕微鏡でうつした写真である。
FIG. 1 of the accompanying drawings is a photograph of a mechanically fractured aluminum nitride sintered body obtained in Example 1, and a portion thereof taken with a microscope.

Claims (1)

【特許請求の範囲】 1 窒化アルミニウム焼結体よりなる板状基板の
少なくとも片方の面に圧電性薄膜及び電極を積層
してなる弾性表面波素子で、該窒化アルミニウム
焼結体が機械的な破断面が明瞭な輪郭によつて互
に区別される微細な結晶粒の緊密な充填状態によ
つて形成されており、該微細な結晶粒の該破断面
における該明瞭な輪郭は多角形状であり、該微細
な結晶は該明瞭な輪郭によつて規定される該破断
面における平均粒子径をD(μm)で定義すると
き0.3D〜1.8Dの範囲の粒子径を持つ結晶粒の個
数が少なくとも70%を占めることによつて構成さ
れているものであることを特徴とする弾性表面波
素子。 2 窒化アルミニウム焼結体が密度3.20g/cm3
上である特許請求の範囲1記載の弾性表面波素
子。 3 窒化アルミニウム焼結体が陽イオン不純物を
0.3重量%以下含有している特許請求の範囲1記
載の弾性表面波素子。 4 圧電性薄膜が酸化亜鉛または窒化アルミニウ
ムの薄膜である特許請求の範囲1記載の弾性表面
波素子。 5 電極が櫛形電極であ特許請求の範囲1記載の
弾性表面波素子。
[Scope of Claims] 1. A surface acoustic wave element comprising a piezoelectric thin film and an electrode laminated on at least one surface of a plate-like substrate made of an aluminum nitride sintered body, in which the aluminum nitride sintered body is mechanically broken. the cross section is formed by a close packing of fine grains that are distinguished from each other by clear contours, and the distinct contour of the fracture surface of the fine grains is polygonal; The fine crystals have at least 70 crystal grains having a particle size in the range of 0.3D to 1.8D when the average particle size at the fracture surface defined by the clear contour is defined as D (μm). %. 2. The surface acoustic wave device according to claim 1, wherein the aluminum nitride sintered body has a density of 3.20 g/cm 3 or more. 3 Aluminum nitride sintered body removes cation impurities
The surface acoustic wave device according to claim 1, which contains 0.3% by weight or less. 4. The surface acoustic wave device according to claim 1, wherein the piezoelectric thin film is a thin film of zinc oxide or aluminum nitride. 5. The surface acoustic wave device according to claim 1, wherein the electrode is a comb-shaped electrode.
JP4699384A 1984-03-14 1984-03-14 Surface acoustic wave element Granted JPS60192410A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4699384A JPS60192410A (en) 1984-03-14 1984-03-14 Surface acoustic wave element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4699384A JPS60192410A (en) 1984-03-14 1984-03-14 Surface acoustic wave element

Publications (2)

Publication Number Publication Date
JPS60192410A JPS60192410A (en) 1985-09-30
JPH0523084B2 true JPH0523084B2 (en) 1993-03-31

Family

ID=12762717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4699384A Granted JPS60192410A (en) 1984-03-14 1984-03-14 Surface acoustic wave element

Country Status (1)

Country Link
JP (1) JPS60192410A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02248110A (en) * 1989-03-20 1990-10-03 Sanyo Electric Co Ltd Surface acoustic wave device
JPH08130439A (en) * 1994-11-01 1996-05-21 Agency Of Ind Science & Technol High-speed surface acoustic wave element

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5631213A (en) * 1979-08-24 1981-03-30 Matsushita Electric Ind Co Ltd Surface elastic wave element

Also Published As

Publication number Publication date
JPS60192410A (en) 1985-09-30

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