JPH052721B2 - - Google Patents
Info
- Publication number
- JPH052721B2 JPH052721B2 JP62028182A JP2818287A JPH052721B2 JP H052721 B2 JPH052721 B2 JP H052721B2 JP 62028182 A JP62028182 A JP 62028182A JP 2818287 A JP2818287 A JP 2818287A JP H052721 B2 JPH052721 B2 JP H052721B2
- Authority
- JP
- Japan
- Prior art keywords
- container
- metal
- metal powder
- hot isostatic
- sintered body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Powder Metallurgy (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はHIP法により希土類金属含有のFe系
あるいはCo系金属粉末の緻密焼結体を製造する
方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing a dense sintered body of rare earth metal-containing Fe-based or Co-based metal powder by the HIP method.
近年光磁気記録の技術進歩はめざましく、光磁
気デイスクの開発は光磁気記録媒体の性能向上等
を主体に活発に行なわれている。記録媒体の材料
としては、TbFeGdTbFe、TbFeCo、
GdDyFeCo等の組成を有する薄膜媒体が用いら
れ、アクリル系又はエポキシ系基板上へスパツタ
ー法などにて形成される。このスパツター法で形
成される光磁気記録薄膜媒体には成分の均一性、
高純度化低酸素含有率などが要求される。そのた
め、スパツターターゲツト基板としては、高密度
で高純度、低酸素含有率の基板材料が要求され
る。さらに量産性上の問題から、スパツターター
ゲツト基板はφ4インチ、φ6インチ等から大型の
5インチ×12インチ等の大型角形基板へと移行し
ている。
In recent years, the technological progress of magneto-optical recording has been remarkable, and the development of magneto-optical disks is being actively carried out mainly to improve the performance of magneto-optical recording media. Materials for recording media include TbFeGdTbFe, TbFeCo,
A thin film medium having a composition such as GdDyFeCo is used and is formed on an acrylic or epoxy substrate by sputtering or the like. The magneto-optical recording thin film medium formed by this sputtering method has uniformity of components,
High purity and low oxygen content are required. Therefore, substrate materials with high density, high purity, and low oxygen content are required as sputter target substrates. Furthermore, due to problems in mass production, sputter target substrates are shifting from φ4 inches, φ6 inches, etc. to large rectangular substrates such as 5 inches×12 inches.
従来、スパツターターゲツト基板を製造する方
法として、鋳造法や粉砕粉末を用いてホツトプレ
ス法にてターゲツト基板を作製する方法等は古く
から知られている。しかし、鋳造法は大型基板は
作製できるが、材料内部に巣等の内部欠陥が存在
しやすく、又ホツトプレス法は、押し型を使用し
作製するために圧力に限界があり、緻密化と大口
径の基板が作製しにくく、かつ大量生産に不適と
いう問題点を有している。 Conventionally, as methods for manufacturing sputter target substrates, methods such as casting and hot pressing using pulverized powder have been known for a long time. However, although the casting method can produce large substrates, internal defects such as cavities are likely to exist inside the material, and the hot pressing method uses a pressing mold, so there is a limit to the pressure, and it is difficult to achieve high density and large diameter substrates. The problem is that the substrate is difficult to fabricate and is unsuitable for mass production.
このような致命的欠陥を克服する方法として、
コンテナを用いたHIP法が知られている。これを
簡単に説明すると、第2図において角型のコン
テナ1に金属粉末2を充填してHIP処理し、第2
図に示すようなHIP処理後の高密度焼結体3を
得、さらにこの焼結体3の6面全てを切断、切
削、研磨等により第2図に破線で示すように平
面化し、これによりターゲツト基板4を得る。 As a way to overcome this fatal flaw,
The HIP method using containers is known. To explain this simply, in Fig. 2, a rectangular container 1 is filled with metal powder 2 and subjected to HIP treatment.
A high-density sintered body 3 after HIP treatment as shown in the figure is obtained, and all six sides of this sintered body 3 are flattened by cutting, cutting, polishing, etc. as shown by the broken line in Figure 2. A target substrate 4 is obtained.
光磁気記録用スパツターターゲツトに含まれる
希土類金属は希少金属でありかなり高価であり、
製品価格の材料費の占める割合が大部分である。
従来から知られているコンテナを用いたHIP法を
単純に用いた場合材料歩留が非常に悪い。よつて
材料歩留を上げ、効率よく製品を製造することが
必修である。
The rare earth metals contained in sputter targets for magneto-optical recording are rare metals and quite expensive.
Material costs account for the majority of the product price.
If the conventional HIP method using a container is simply used, the material yield is very poor. Therefore, it is essential to increase material yield and manufacture products efficiently.
本発明は特に大型角形基板を歩留よく製品を製
造できる方法を提供することを目的とする。 It is an object of the present invention to provide a method for manufacturing products with a high yield, particularly from large rectangular substrates.
さらに本発明は、希土類金属含有のFe系ある
いはCo系合金の大型の角型高密度焼結体、特に
スパツターターゲツト基板をHIP法を用いて容易
に、かつ歩留良く製造できる方法を提供すること
をも目的とする。 Furthermore, the present invention provides a method for easily producing large prismatic high-density sintered bodies of Fe-based or Co-based alloys containing rare earth metals, particularly sputter target substrates, using the HIP method with good yield. The purpose is also to
本発明によれば、中心軸を有する円筒形状の金
属コンテナに金属粉末を充填し、該コンテナを脱
気密封し、しかる後に、該コンテナに高温高圧の
熱間静水圧プレス処理を施す方法において、前記
金属粉末の両側に前記円筒形状の金属コンテナの
中心軸に沿う対向面を有する一対の金属製ダミー
をスペーサとして用いサンドイツチ状に構成し、
角型高密度焼結体を製造することを特徴とする熱
間静水圧プレス成形方法が得られる。
According to the present invention, in the method of filling a cylindrical metal container having a central axis with metal powder, deaerating and sealing the container, and then subjecting the container to hot isostatic pressing at high temperature and pressure, A pair of metal dummies having opposing surfaces along the central axis of the cylindrical metal container on both sides of the metal powder are used as spacers to form a sandwich-like structure,
A hot isostatic press forming method characterized by producing a square high-density sintered body is obtained.
これによると、HIP処理後は、金属粉末はコン
テナと接触する面のみが不均一変形を示し、上下
面の金属性スペーサーと接触する面は不均一変形
を示すことなく平坦面となる。したがつて側面の
みの切断、研削、研磨等により角型基板を得るこ
とができる。
According to this, after the HIP treatment, only the surface of the metal powder that contacts the container shows non-uniform deformation, and the surfaces that contact the upper and lower metal spacers become flat surfaces without showing non-uniform deformation. Therefore, a square substrate can be obtained by cutting, grinding, polishing, etc. only the side surfaces.
以下に本発明の実施例を示す。 Examples of the present invention are shown below.
第1図を参照して離形剤(BN)を塗布した
軟鋼製の円筒形コンテナ6に離形剤(BN)を塗
布した軟鋼製の断面半円形のスペーサー7を2枚
装入する。その後、コンテナ6の中心部に、30メ
ツシユアンダーに粉砕したGdTbFe系合金粉末2
を充てんする。そして排気管(図示せず)を有す
る蓋をコンテナ6に溶接する。この状態で排気管
を真空ポンプに接続し、コンテナ内を1000℃×
2H、3×10-6Torrの条件にて加熱真空引処理を
施した。加熱真空引後、真空脱気を続けながら排
気管の一部を加熱圧着し、しかる後、排気管を切
断するとともに密封コンテナを作製した。 Referring to FIG. 1, two spacers 7 made of mild steel and having a semicircular cross section coated with a mold release agent (BN) are charged into a cylindrical container 6 made of mild steel coated with a mold release agent (BN). After that, in the center of the container 6, place 2 pieces of GdTbFe alloy powder pulverized to 30 meshes.
Fill it with. A lid with an exhaust pipe (not shown) is then welded to the container 6. In this state, connect the exhaust pipe to the vacuum pump and heat the inside of the container to 1000℃
A heating vacuum treatment was performed under the conditions of 2H and 3×10 -6 Torr. After heating and evacuation, a part of the exhaust pipe was heat-pressed while continuing vacuum degassing, and then the exhaust pipe was cut and a sealed container was produced.
この密封コンテナをHIP炉内に設置し、温度
1600℃圧力1000気圧、保持時間3時間の条件にて
HIP処理を施した。HIP処理後の密封コンテナを
第1図に記号8で示す。 This sealed container is placed in a HIP furnace and the temperature
Under the conditions of 1600℃ pressure 1000 atm and holding time 3 hours
HIP treatment was applied. The sealed container after HIP treatment is indicated by symbol 8 in FIG.
このような工程を経てコンテナ8より取り出し
た焼結体、即ち、GdTbFe合金を第1図に記号
9で示す。この合金9によると、側面のみ切断、
研磨を施し、上下面は軽く研磨するだけで角形の
大型高密度焼結体〔(2〜8)インチ×(9〜
20.4)インチ×(3〜10)ミリメートル〕、即ち、
スパツターターゲツト基板10を作製することが
できた。 The sintered body, ie, the GdTbFe alloy, taken out from the container 8 after such a process is shown by the symbol 9 in FIG. According to this alloy 9, only the sides are cut,
By simply polishing and lightly polishing the top and bottom surfaces, a large square high-density sintered body [(2~8) inches x (9~
20.4) inches x (3-10) mm], i.e.
A sputter target substrate 10 could be manufactured.
また、GdTbFe合金9の組織はボイド及びクラ
ツク等の欠陥はみられず相対密度99.6%の高密度
の材料となつていた。また酸素含有率を測定した
所820ppmの含有量を示し、粉末時の酸素含有率
850ppmと比較して同等の酸素含有率であつた。
本材料を導電金属にろう付けし、スパツターター
ゲツトを作製し、スパツター膜を形成した所、良
好な光磁気記録用媒体膜が得られた。 Further, the structure of GdTbFe alloy 9 was a high-density material with a relative density of 99.6% without defects such as voids and cracks. In addition, when the oxygen content was measured, it was found to be 820 ppm.
The oxygen content was equivalent to 850 ppm.
When this material was brazed to a conductive metal, a sputter target was prepared, and a sputter film was formed, a good magneto-optical recording medium film was obtained.
なお、スペーサーとしては、融点がHIP処理温
度以上の材質が好ましく、通常は、軟鋼やステン
レス等が用いられる。 The spacer is preferably made of a material with a melting point equal to or higher than the HIP treatment temperature, and is usually made of mild steel, stainless steel, or the like.
以上述べた通り、本発明によれば、容易に、か
つ歩留の良好な大型の角型高密度焼結体を得るこ
とができる。
As described above, according to the present invention, it is possible to easily obtain a large prismatic high-density sintered body with a good yield.
第1図は本発明の一実施例による熱間静水圧プ
レス成形方法を示す説明図、第2図は従来の熱間
静水圧プレス成形方法を示す説明図である。
2……金属粉末、6……円筒形コンテナ、7…
…スペーサー、8……密封コンテナ、9……
GdTbFe合金、10……スパツターターゲツト基
板。
FIG. 1 is an explanatory diagram showing a hot isostatic pressing method according to an embodiment of the present invention, and FIG. 2 is an explanatory diagram showing a conventional hot isostatic pressing method. 2... Metal powder, 6... Cylindrical container, 7...
...Spacer, 8...Sealed container, 9...
GdTbFe alloy, 10... Sputter target substrate.
Claims (1)
属粉末を充填し、該コンテナを脱気密封し、しか
る後に、該コンテナに高温高圧の熱間静水圧プレ
ス処理を施す方法において、前記金属粉末の両側
に前記円筒形状の金属コンテナの中心軸に沿う対
向面を有する一対の金属製ダミーをスペーサとし
て用いサンドイツチ状に構成し、角型高密度焼結
体を製造することを特徴とする熱間静水圧プレス
成形方法。 2 金属粉末として希土類金属を含むFe系ある
いはCo系金属粉末を用いることを特徴とする特
許請求の範囲第1項記載の熱間静水圧プレス成形
方法。[Claims] 1. A method in which a cylindrical metal container having a central axis is filled with metal powder, the container is degassed and sealed, and then the container is subjected to hot isostatic pressing at high temperature and pressure. , a pair of metal dummies having opposing surfaces along the central axis of the cylindrical metal container on both sides of the metal powder are used as spacers to form a sandwich-like structure to produce a square high-density sintered body. Hot isostatic press molding method. 2. The hot isostatic press forming method according to claim 1, characterized in that Fe-based or Co-based metal powder containing a rare earth metal is used as the metal powder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62028182A JPS63199808A (en) | 1987-02-12 | 1987-02-12 | Hot isostatic press molding method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62028182A JPS63199808A (en) | 1987-02-12 | 1987-02-12 | Hot isostatic press molding method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63199808A JPS63199808A (en) | 1988-08-18 |
| JPH052721B2 true JPH052721B2 (en) | 1993-01-13 |
Family
ID=12241569
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62028182A Granted JPS63199808A (en) | 1987-02-12 | 1987-02-12 | Hot isostatic press molding method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63199808A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6527609B2 (en) * | 2017-02-16 | 2019-06-05 | 住友化学株式会社 | Sputtering target processing method, sputtering target processing apparatus, and sputtering target product manufacturing method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6230802A (en) * | 1985-08-02 | 1987-02-09 | Showa Denko Kk | Hydrostatic hot press method |
-
1987
- 1987-02-12 JP JP62028182A patent/JPS63199808A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63199808A (en) | 1988-08-18 |
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