JPH05281132A - Apparatus for measuring particulate in liquid - Google Patents
Apparatus for measuring particulate in liquidInfo
- Publication number
- JPH05281132A JPH05281132A JP4178973A JP17897392A JPH05281132A JP H05281132 A JPH05281132 A JP H05281132A JP 4178973 A JP4178973 A JP 4178973A JP 17897392 A JP17897392 A JP 17897392A JP H05281132 A JPH05281132 A JP H05281132A
- Authority
- JP
- Japan
- Prior art keywords
- flow
- pressure
- rate
- valve
- cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 24
- 239000010419 fine particle Substances 0.000 claims description 11
- 239000012488 sample solution Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 28
- 238000004140 cleaning Methods 0.000 abstract description 17
- 230000001105 regulatory effect Effects 0.000 abstract description 5
- 239000012530 fluid Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 13
- 239000012086 standard solution Substances 0.000 description 8
- 238000001514 detection method Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
- Optical Measuring Cells (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、液体中の微粒子計測装
置、特に、シースフロー型微粒子計測装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for measuring fine particles in liquid, and more particularly to a sheath flow type fine particle measuring apparatus.
【0002】[0002]
【従来の技術】半導体製造過程においては極めて清浄な
洗浄用水を大量に必要とするところから、一定体積の洗
浄用水中に含まれる微粒子の数を一定値以下にする必要
がある。2. Description of the Related Art Since a large amount of extremely clean cleaning water is required in a semiconductor manufacturing process, it is necessary to keep the number of fine particles contained in a constant volume of cleaning water below a certain value.
【0003】前記洗浄用水中に含まれる微粒子を計測す
る従来技術として、散乱セル中に洗浄用水の一部をサン
プル水として導入し、これにタングステンランプによる
光を入射光として照射して、そのときサンプル水の表面
で生ずる散乱光を光検出器によって受光し、これに基づ
いてサンプル水中の微粒子の大きさ並びにその数を計測
するようにしていた。As a conventional technique for measuring fine particles contained in the cleaning water, a part of the cleaning water is introduced into the scattering cell as sample water, and light from a tungsten lamp is irradiated as incident light at that time. The scattered light generated on the surface of the sample water is received by a photodetector, and based on this, the size and the number of fine particles in the sample water are measured.
【0004】しかし、上記従来技術によれば、入射光が
散乱セルの中を横断する範囲の中で、散乱光検出領域以
外に非検出領域が存在し、この非検出領域からの散乱光
が所謂バックグラウンドとして有害となり、極微粒子の
検出を行うのが困難になる。これを解決する手段とし
て、本願出願人は、シースフロー型の液体中の微粒子計
測装置を別途実用新案登録出願しているところである。However, according to the above-mentioned prior art, there is a non-detection region other than the scattered light detection region in the range where the incident light traverses the scattering cell, and the scattered light from this non-detection region is so-called. It becomes harmful as a background and makes it difficult to detect ultrafine particles. As a means for solving this, the applicant of the present application is applying for a utility model registration of a sheath flow type fine particle measuring device in liquid.
【0005】このような微粒子計測装置では、検出信号
を安定化させるために定流量でサンプル液が散乱セル内
を貫流することが好ましく、かつ計測誤差を発生させる
要因となる気泡の発生を防ぐためにそのサンプル液が所
定の圧力に保たれることが望ましい。In such a fine particle measuring apparatus, it is preferable that the sample liquid flows through the scattering cell at a constant flow rate in order to stabilize the detection signal, and in order to prevent generation of bubbles that cause a measurement error. It is desirable that the sample liquid be kept at a predetermined pressure.
【0006】[0006]
【発明が解決しようとする課題】本発明はシースフロー
型液体中の微粒子計測装置において、定流量かつ所定圧
でサンプル液を散乱セル中を流過させることを目的とす
るものである。SUMMARY OF THE INVENTION An object of the present invention is to allow a sample liquid in a sheath flow type liquid to flow a sample liquid through a scattering cell at a constant flow rate and a predetermined pressure.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するた
め、本発明は、サンプル液を貫流させる散乱セルの排出
流路に、流量調整バルブを設けている。In order to achieve the above object, the present invention provides a flow rate adjusting valve in the discharge channel of the scattering cell through which the sample liquid flows.
【0008】[0008]
【作用】散乱セル出口側に接続された排出流路に流量調
整バルブを設けたことにより、散乱セル内を流過するサ
ンプル液の流量を一定とし、かつ所定圧に保つことがで
きる。これにより、検出信号を安定化し、かつ気泡の発
生を防ぐことができ計測精度を向上させることができ
る。なお、その流量調整バルブを散乱セルの下流側に設
けたので、そのバルブから出る汚れの影響を散乱セルに
与えないようにすることができる。By providing the flow rate adjusting valve in the discharge passage connected to the outlet side of the scattering cell, the flow rate of the sample liquid flowing through the scattering cell can be made constant and kept at a predetermined pressure. As a result, the detection signal can be stabilized, the generation of bubbles can be prevented, and the measurement accuracy can be improved. In addition, since the flow rate adjusting valve is provided on the downstream side of the scattering cell, it is possible to prevent the scattering cell from being affected by dirt coming out of the valve.
【0009】[0009]
【実施例】次に、本発明の一実施例を図面を参照しなが
ら説明する。図において、1は例えば半導体工場の洗浄
ライン(図示しない)に流れている洗浄用水を取り入れ
るためのサンプル取入口である。2はこのサンプル取入
口1に接続されたサンプル導入管1aに設けられた圧力調
整弁で、前記洗浄ライン内の洗浄水の圧力が高い(例え
ば5Kg/cm 3 )ので、これを所定圧力に減圧するための
元圧調整弁として機能するものである。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, an embodiment of the present invention will be described with reference to the drawings. In the figure, 1 is a sample inlet for taking in cleaning water flowing to a cleaning line (not shown) of a semiconductor factory, for example. 2 is a pressure regulating valve disposed in the sample taken is connected to the inlet 1 sample inlet pipe 1a, since the pressure of the washing water in the washing in the line is high (e.g., 5Kg / cm 3), vacuum into a predetermined pressure It functions as a source pressure control valve for operating.
【0010】10は前記圧力調整弁2の出口側に分岐接続
された第1流路で、第1流量計11及び三方弁(図示する
ものは三方電磁弁)12を備え、その終端は散乱セルSCに
おけるサンプル射出用ノズル(図示しない)に接続され
ている。この第1流路10は圧力調整弁2で所定圧力に減
圧された洗浄用水をサンプルとして散乱セルSCに供給す
るもので、第1流路10を流れるサンプルの流量は第1流
量計11によって測定される。Reference numeral 10 is a first flow path branched and connected to the outlet side of the pressure regulating valve 2, which is provided with a first flow meter 11 and a three-way valve (a three-way solenoid valve is shown) 12, the end of which is a scattering cell. It is connected to the sample injection nozzle (not shown) in the SC. The first flow path 10 supplies cleaning water, which has been depressurized to a predetermined pressure by the pressure control valve 2, to the scattering cell SC as a sample, and the flow rate of the sample flowing through the first flow path 10 is measured by the first flow meter 11. To be done.
【0011】20は前記第1流路10と並列的に設けられる
第2流路20で、流量バランス調整バルブ21、第2流量計
22、フィルタ装置23を備え、その終端は散乱セルSCのシ
ースフロー供給部(図示しない)に接続されている。流
量バランス調整バルブ21は互いに並列接続された第1流
路10と第2流路20における液流量のバランス調整を行う
バルブである。第2流量計22は第2流路20の液流量を測
定するものであり、その測定結果並びに第1流量計10の
測定結果に基づいて、流量バランス調整バルブ21が制御
される。フィルタ装置23は0.05〜0.1 μm程度の微粒子
を除去できる性能を有する例えば薄膜フィルタが用いら
れる。上述のように構成された第2流路20においては、
圧力調整弁2で所定圧力に減圧された洗浄用水をフィル
タ装置23によって濾過することにより、微粒子等不純物
を含まない純水が得られ、この濾過水はシースフロー液
として散乱セルSCに供給される。Reference numeral 20 denotes a second flow passage 20 provided in parallel with the first flow passage 10, a flow rate balance adjusting valve 21 and a second flow meter.
22 and a filter device 23, the ends of which are connected to the sheath flow supply unit (not shown) of the scattering cell SC. The flow rate balance adjusting valve 21 is a valve for adjusting the balance of the liquid flow rates in the first flow path 10 and the second flow path 20 which are connected in parallel with each other. The second flow meter 22 measures the liquid flow rate of the second flow path 20, and the flow rate balance adjustment valve 21 is controlled based on the measurement result and the measurement result of the first flow meter 10. As the filter device 23, for example, a thin film filter having the capability of removing fine particles of about 0.05 to 0.1 μm is used. In the second flow path 20 configured as described above,
By filtering the cleaning water reduced to a predetermined pressure by the pressure control valve 2 by the filter device 23, pure water containing no impurities such as fine particles is obtained, and this filtered water is supplied to the scattering cell SC as a sheath flow liquid. ..
【0012】30は前記フィルタ装置23と散乱セルSCとの
間の点24と前記三方弁12との間を接続するようにして設
けられた第3流路で、31はこの第3流路30に設けられる
逆止弁である。逆止弁31と三方弁12との間の点32には、
標準粒子供給装置41と標準粒子注入シリンジ42が互いに
並列的に接続されている。標準粒子供給装置41は標準径
を有する標準粒子を含む高濃度の標準液を貯蔵してお
り、逆止弁43を介して第3流路30に接続されている。な
お、逆止弁43は標準粒子供給装置41と一体的に構成して
あってもよい。標準粒子注入シリンジ42は例えば電気的
動力により駆動され、ピストンを上下動することにより
前記純水又は標準液を吸引し、これを押し出すよう構成
されている。33は開閉弁、44はピストンである。Reference numeral 30 is a third flow passage provided so as to connect between the point 24 between the filter device 23 and the scattering cell SC and the three-way valve 12, and 31 is the third flow passage 30. Is a check valve provided in. At the point 32 between the check valve 31 and the three-way valve 12,
The standard particle supply device 41 and the standard particle injection syringe 42 are connected in parallel with each other. The standard particle supply device 41 stores a high-concentration standard solution containing standard particles having a standard diameter, and is connected to the third flow path 30 via a check valve 43. The check valve 43 may be integrated with the standard particle supply device 41. The standard particle injection syringe 42 is driven by, for example, electric power, and is configured to suck the pure water or the standard solution by pushing the piston up and down and push out the pure water or the standard solution. 33 is an on-off valve and 44 is a piston.
【0013】3は散乱セルSCの出口側に接続された排出
流路4aに設けられる流量調整バルブで、散乱セルSC内の
圧力を所定圧に維持することにより該セルSC内における
気泡の発生を防ぐバルブである。4は排出口である。Reference numeral 3 is a flow rate adjusting valve provided in the discharge flow path 4a connected to the outlet side of the scattering cell SC, and by maintaining the pressure in the scattering cell SC at a predetermined pressure, generation of bubbles in the cell SC is prevented. It is a valve to prevent. 4 is an outlet.
【0014】上述の構成において、洗浄用水中の微粒子
を測定する場合、サンプル取入口1から取り入れられた
洗浄用水は圧力調整弁2によって所定圧力に減圧され
る。流量バランス調整バルブ21の適宜な開度調整によ
り、前記洗浄用水は第1流路10と第2流路20とに所定流
量比となるように分流される。In the above structure, when measuring fine particles in the cleaning water, the cleaning water taken from the sample inlet 1 is depressurized to a predetermined pressure by the pressure adjusting valve 2. By appropriately adjusting the opening degree of the flow rate balance adjustment valve 21, the cleaning water is divided into the first flow path 10 and the second flow path 20 so as to have a predetermined flow rate ratio.
【0015】三方弁12の第3流路30側への開口が閉じら
れているから、第1流路10側に分岐導入された洗浄水は
第1流量計11、三方弁12を経てサンプルとして散乱セル
SCに供給される。他方、第2流路20側に分岐導入された
洗浄用水は、流量バランス調整バルブ21、第2流量計22
を経てフィルタ装置23に至る。そして、このフィルタ装
置23を通過する際、所定の濾過が行われて、フィルタ装
置23を出た濾過水は究めて清浄な液となり、シースフロ
ー液として散乱セルSCに供給される。Since the opening of the three-way valve 12 to the side of the third flow passage 30 is closed, the washing water branched and introduced into the side of the first flow passage 10 passes through the first flow meter 11 and the three-way valve 12 and is used as a sample. Scattering cell
Supplied to SC. On the other hand, the cleaning water branched to the second flow path 20 side is supplied with the flow balance adjustment valve 21 and the second flow meter 22.
And reaches the filter device 23. Then, when passing through the filter device 23, predetermined filtration is performed, and the filtered water that has exited the filter device 23 becomes extremely clean liquid and is supplied to the scattering cell SC as a sheath flow liquid.
【0016】そして、前述のように、散乱セルSCの出口
側には流量調整バルブ3が設けてあり、このバルブ3が
散乱セルSC内の圧力をサンプル取入口1の取入圧力より
極端に低くならないようにして、散乱セルSC内における
気泡の発生を防止し、かつ散乱セルSCを貫流するサンプ
ル液の流量を一定に保持している。これにより、精度の
高い計測が可能となる。As described above, the flow control valve 3 is provided on the outlet side of the scattering cell SC, and this valve 3 makes the pressure in the scattering cell SC extremely lower than the intake pressure of the sample inlet 1. This prevents the occurrence of bubbles in the scattering cell SC and keeps the flow rate of the sample liquid flowing through the scattering cell SC constant. This enables highly accurate measurement.
【0017】次に、散乱セルSCに所定濃度に希釈された
標準液を供給して、微粒子計測装置の校正を行うには、
開閉弁33を閉状態、三方弁12の第3流路30側の口を閉状
態にしておき、標準粒子供給装置41の元栓を開いて逆止
弁43を介して所定量の標準液を第3流路30側へ導入す
る。このとき標準粒子注入シリンジ42のピストン44を矢
印D方向を移動させると、前記標準液がシリンジ42内に
吸引される。次いで、開閉弁33を開くと、接続点24を経
てフィルタ装置23からの純水が第3流路30に導入され、
標準粒子注入シリンジ42内に吸引導入される。そして、
標準粒子供給装置41からの標準液の量に対して、第2流
路20からの純水を所定量シリンジ42内に吸入することに
より、該シリンジ42内の標準粒子の濃度が希釈され、計
測装置の作動範囲内におさめることができる。この場
合、シリンジ42のピストン動作を数回繰り返して行う
と、所定濃度に希釈することができる。なお、上記希釈
された標準液が計測装置の作動範囲内であるか否かを判
別するにはオシロスコープ又はモニタ指示装置を用いれ
ばよい。Next, in order to calibrate the particle measuring device by supplying the standard solution diluted to a predetermined concentration to the scattering cell SC,
The on-off valve 33 is closed, the opening of the three-way valve 12 on the side of the third flow path 30 is closed, the main plug of the standard particle supply device 41 is opened, and a predetermined amount of standard solution is supplied via the check valve 43. 3 Introduce to the flow path 30 side. At this time, when the piston 44 of the standard particle injection syringe 42 is moved in the direction of arrow D, the standard solution is sucked into the syringe 42. Next, when the on-off valve 33 is opened, pure water from the filter device 23 is introduced into the third flow path 30 via the connection point 24,
It is introduced by suction into the standard particle injection syringe 42. And
By injecting a predetermined amount of pure water from the second flow path 20 into the syringe 42 with respect to the amount of the standard liquid from the standard particle supply device 41, the concentration of the standard particles in the syringe 42 is diluted and measured. It can be kept within the operating range of the device. In this case, by repeating the piston operation of the syringe 42 several times, it is possible to dilute to a predetermined concentration. An oscilloscope or a monitor indicating device may be used to determine whether or not the diluted standard solution is within the operating range of the measuring device.
【0018】而して、三方弁12を操作して、第3流路30
と散乱セルSCとが連通された状態で、ピストン44をU方
向に移動させると、シリンジ内の希釈された標準液が散
乱セルSCに希釈され、所定の校正が行われる。なお、上
記三方弁12に代えて二方弁を2個用いてもよい。Then, by operating the three-way valve 12, the third flow path 30
When the piston 44 is moved in the U direction with the scattering cell SC communicating with the scattering cell SC, the diluted standard solution in the syringe is diluted in the scattering cell SC and a predetermined calibration is performed. Two two-way valves may be used instead of the three-way valve 12.
【0019】[0019]
【発明の効果】以上詳述したように、本発明によれば散
乱セルの下流側に流量調整バルブを設けたので、散乱セ
ル内を流過するサンプル液の流量を一定とし、かつ所定
圧に保つことができる。これにより、検出信号を安定化
し、かつ気泡の発生を防ぐことができ計測精度を向上さ
せることができる。また、その流量調整バルブが散乱セ
ルの下流側に設けられているので、そのバルブから出る
汚れの影響を散乱セルに与えないようにすることもでき
る。As described in detail above, according to the present invention, since the flow rate adjusting valve is provided on the downstream side of the scattering cell, the flow rate of the sample liquid flowing through the scattering cell is kept constant and the pressure is kept at a predetermined pressure. Can be kept. As a result, the detection signal can be stabilized, the generation of bubbles can be prevented, and the measurement accuracy can be improved. Further, since the flow rate adjusting valve is provided on the downstream side of the scattering cell, it is possible to prevent the scattering cell from being affected by the dirt coming out of the valve.
【図1】本発明の液体中の微粒子計測装置の一実施例を
示す構成図である。FIG. 1 is a configuration diagram showing an embodiment of a device for measuring particles in a liquid according to the present invention.
3…流量調整バルブ、4a…排出流路、SC…散乱セル。 3 ... Flow control valve, 4a ... Discharge passage, SC ... Scattering cell.
Claims (1)
整バルブが設けられていることを特徴とする液体中の微
粒子計測装置。An apparatus for measuring fine particles in a liquid, characterized in that a flow rate adjusting valve is provided in the discharge flow path of the scattering cell through which the sample solution flows.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4178973A JPH05281132A (en) | 1992-06-13 | 1992-06-13 | Apparatus for measuring particulate in liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4178973A JPH05281132A (en) | 1992-06-13 | 1992-06-13 | Apparatus for measuring particulate in liquid |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60106283A Division JPS61264237A (en) | 1985-05-17 | 1985-05-17 | Measuring instrument for fine particle in liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05281132A true JPH05281132A (en) | 1993-10-29 |
Family
ID=16057897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4178973A Pending JPH05281132A (en) | 1992-06-13 | 1992-06-13 | Apparatus for measuring particulate in liquid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05281132A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014157036A (en) * | 2013-02-14 | 2014-08-28 | Kurita Water Ind Ltd | Underwater particulate number measurement method and warm pure water supply system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59151040A (en) * | 1983-02-17 | 1984-08-29 | Rion Co Ltd | Light scattering particle counter |
-
1992
- 1992-06-13 JP JP4178973A patent/JPH05281132A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59151040A (en) * | 1983-02-17 | 1984-08-29 | Rion Co Ltd | Light scattering particle counter |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014157036A (en) * | 2013-02-14 | 2014-08-28 | Kurita Water Ind Ltd | Underwater particulate number measurement method and warm pure water supply system |
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