JPH05281480A - Optical wavelength variable filter and its production - Google Patents
Optical wavelength variable filter and its productionInfo
- Publication number
- JPH05281480A JPH05281480A JP8121192A JP8121192A JPH05281480A JP H05281480 A JPH05281480 A JP H05281480A JP 8121192 A JP8121192 A JP 8121192A JP 8121192 A JP8121192 A JP 8121192A JP H05281480 A JPH05281480 A JP H05281480A
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- Prior art keywords
- film thickness
- transparent substrate
- thin film
- optical wavelength
- dielectric
- Prior art date
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Abstract
(57)【要約】
【目的】 光波長可変フィルタ及びその製造方法に関
し、結合損失が一定で、且つ透過率が変動しない光波長
可変フィルタ及びその製造方法を提供することを目的と
する。
【構成】 直方体状の透明基板21と、選択した端部側の
膜厚が漸次減少する高屈折率誘電体薄膜と低屈折率誘電
体薄膜とが、交互に重層して透明基板21の表面に形成さ
れてなる、一方の端部の膜厚が薄く他方の端部の膜厚が
厚い誘電体多層膜22と、透明基板21を光路に直交する方
向に微細移動する手段とを、備えた構成とする。
(57) [Summary] [PROBLEMS] To provide an optical wavelength tunable filter and a method of manufacturing the same, which have a constant coupling loss and a constant transmittance. [Structure] A rectangular parallelepiped transparent substrate 21, a high-refractive-index dielectric thin film and a low-refractive-index dielectric thin film whose film thickness on the selected end side gradually decreases are alternately layered on the surface of the transparent substrate 21. A structure including a formed dielectric multilayer film 22 having a thin film thickness at one end and a large film thickness at the other end, and means for finely moving the transparent substrate 21 in a direction orthogonal to the optical path. And
Description
【０００１】[0001]
【産業上の利用分野】本発明は、光波長可変フィルタ及
びその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a variable wavelength filter and a method for manufacturing the same.
【０００２】[0002]
【従来の技術】図４は従来例の図で、(A) は構成図、
(B) は詳細図である。図４において、11は光学ガラスよ
りなる直方体状の透明基板である。2. Description of the Related Art FIG. 4 is a diagram of a conventional example, (A) is a configuration diagram,
(B) is a detailed view. In FIG. 4, 11 is a rectangular parallelepiped transparent substrate made of optical glass.
【０００３】12は、透明基板11の選択した面に、所定の
膜厚の高屈折率誘電体薄膜（例えばTiO2で、屈折率は2.
3)と低屈折率誘電体薄膜（例えばSiO2で、屈折率は1.4
6）とを、交互に所望数重層して形成された誘電体多層
膜である。Reference numeral 12 is a high-refractive-index dielectric thin film (for example, TiO 2 ) having a predetermined film thickness on a selected surface of the transparent substrate 11, and has a refractive index of 2.
3) and a low-refractive-index dielectric thin film (for example, SiO 2, with a refractive index of 1.4
6) is a dielectric multilayer film formed by alternately laminating a desired number of layers.
【０００４】上述のような誘電体多層膜12は、所定の波
長のみ透過する。したがって、透明基板11に誘電体多層
膜12を形成してなる光波長フィルタ10は、パンドパスフ
ィルタ等である。The dielectric multilayer film 12 as described above transmits only a predetermined wavelength. Therefore, the optical wavelength filter 10 formed by forming the dielectric multilayer film 12 on the transparent substrate 11 is a bandpass filter or the like.
【０００５】従来は、図４の(A) に図示したように、光
伝送路（例えば光ファイバ)1-1の出射光をレンズで平行
ビームにし、その平行ビームを光波長フィルタ10に投射
し、光波長フィルタ10を透過した平行ビームを、他のレ
ンズで集光して他の光伝送路1-2 に入射させている。Conventionally, as shown in FIG. 4A, the light emitted from the optical transmission line (for example, optical fiber) 1-1 is collimated by a lens and the collimated beam is projected on the optical wavelength filter 10. The parallel beam transmitted through the optical wavelength filter 10 is condensed by another lens and is incident on another optical transmission line 1-2.
【０００６】この際、光波長フィルタ10の光路に対する
角度を変える、即ち入射角を変えることで透過する波長
帯が変化する。即ち光波長可変フィルタとなる。なお、
入射角を大きくすると、短波長側にシフトし、入射角を
小さくすると、長波長側にシフトする。At this time, the wavelength band to be transmitted changes by changing the angle of the optical wavelength filter 10 with respect to the optical path, that is, changing the incident angle. That is, it becomes a variable wavelength filter. In addition,
Increasing the incident angle shifts to the short wavelength side, and decreasing the incident angle shifts to the long wavelength side.
【０００７】上述の光波長フィルタ10の角度を変えるこ
とによる波長シフトは、1500nm帯で（２〜３）nm／度で
ある。また、光波長フィルタと光伝送路間の結合損失は
通常０.5 dB 以下である。The wavelength shift caused by changing the angle of the optical wavelength filter 10 is (2-3) nm / degree in the 1500 nm band. The coupling loss between the optical wavelength filter and the optical transmission line is usually 0.5 dB or less.
【０００８】[0008]
【発明が解決しようとする課題】ところで上述のように
誘電体多層膜に投射する平行ビームの入射角を変えるこ
とで、光波長可変フィルタとした従来のものは、図４の
(B) に図示したように、光軸が入射角に比例して、δだ
けずれる。By the way, the conventional optical wavelength tunable filter shown in FIG. 4 is used by changing the incident angle of the parallel beam projected on the dielectric multilayer film as described above.
As shown in (B), the optical axis shifts by δ in proportion to the incident angle.
【０００９】このことにより、入射角を大きくすると即
ち可変幅を拡開すると光波長フィルタと光伝送路間の結
合損失が著しく増加するという問題点があった。一方、
入射角が変わると誘電体多層膜の透過率が変化するの
で、波長を広範囲に可変することができないという問題
点があった。As a result, when the incident angle is increased, that is, when the variable width is widened, the coupling loss between the optical wavelength filter and the optical transmission line is significantly increased. on the other hand,
Since the transmittance of the dielectric multilayer film changes when the incident angle changes, there is a problem that the wavelength cannot be varied over a wide range.
【００１０】本発明はこのような点に鑑みて創作された
もので、結合損失が一定で、且つ透過率が変動しない光
波長可変フィルタを提供することにある。また他の目的
は、上述の特性を有する光波長可変フィルタの製造方法
を提供することにある。The present invention has been made in view of the above circumstances, and an object thereof is to provide an optical wavelength tunable filter having a constant coupling loss and a constant transmittance. Still another object is to provide a method of manufacturing an optical wavelength tunable filter having the above characteristics.
【００１１】[0011]
【課題を解決するための手段】上記の目的を達成するた
めに本発明は、図１に図示したように、直方体状の透明
基板21と、一方の端部に移行するに伴い膜厚が漸次減少
する高屈折率誘電体薄膜と低屈折率誘電体薄膜とが、交
互に重層して透明基板21の表面に形成されてなる、一方
の端部の膜厚が薄く他方の端部の膜厚が厚い誘電体多層
膜22と、透明基板21を光路に直交する方向に微細移動す
る手段とを、備えた構成とする。In order to achieve the above object, the present invention, as shown in FIG. 1, has a transparent substrate 21 in the shape of a rectangular parallelepiped, and the film thickness gradually increases as it moves to one end. A high-refractive-index dielectric thin film and a low-refractive-index dielectric thin film, which are decreasing in number, are formed alternately on the surface of the transparent substrate 21. One end has a small film thickness and the other end has a small film thickness. A thick dielectric multilayer film 22 and means for finely moving the transparent substrate 21 in the direction orthogonal to the optical path are provided.
【００１２】またその製造方法は、基台30の底面32に対
向する面を所定の曲面31に形成し、その曲面31に、剥離
可能に透明体薄板25を貼着する。そして、所定の屈折率
を有する誘電体物質を、底面32にほぼ直交する方向か
ら、透明体薄板25に交互に投射し蒸着して、透明体薄板
25の表面に一方の端部の膜厚が薄く他方の端部の膜厚が
厚い誘電体多層膜22を設ける。Further, in the manufacturing method, the surface facing the bottom surface 32 of the base 30 is formed into a predetermined curved surface 31, and the transparent thin plate 25 is releasably attached to the curved surface 31. Then, a dielectric material having a predetermined refractive index is alternately projected and vapor-deposited on the transparent thin plate 25 from a direction substantially orthogonal to the bottom surface 32 to form a transparent thin plate.
A dielectric multilayer film 22 having a thin film thickness at one end and a large film thickness at the other end is provided on the surface of 25.
【００１３】その後、透明体薄板25を基台30から剥離
し、直方体状の透明基板21の表面に貼着して、光波長可
変フィルタとする。After that, the transparent thin plate 25 is peeled from the base 30 and attached to the surface of the rectangular parallelepiped transparent substrate 21 to form a variable wavelength filter.
【００１４】[0014]
【作用】本発明に係わる誘電体多層膜は、一方の端部に
移行するに伴い膜厚が漸次減少する高屈折率誘電体薄膜
と、同方向の端部に移行するに伴い膜厚が漸次減少する
低屈折率誘電体薄膜とが、交互に重層して形成されたも
のである。The dielectric multilayer film according to the present invention has a high-refractive-index dielectric thin film whose thickness gradually decreases as it moves to one end, and a film thickness gradually increases as it moves to one end. The low-refractive-index dielectric thin films that decrease in number are alternately layered.
【００１５】したがって、透明基板即ち誘電体多層膜を
光路に直交する方向に移動することで、光が通過する部
分の誘電体多層膜の膜厚が変化する。よって、パンドパ
スフィルタ等のパスする波長帯がシフトする。Therefore, by moving the transparent substrate, that is, the dielectric multilayer film in the direction orthogonal to the optical path, the thickness of the dielectric multilayer film in the portion where the light passes changes. Therefore, the passing wavelength band of the bandpass filter or the like shifts.
【００１６】本発明によれば、光は透明基板に直交する
ように入射するので、光波長フィルタを通過する前と後
とで光軸がずれることがない。よって、光伝送路と光波
長可変フィルタ間の結合損失が増加することがない。According to the present invention, since the light is incident on the transparent substrate so as to be orthogonal thereto, the optical axis does not shift before and after passing through the optical wavelength filter. Therefore, the coupling loss between the optical transmission line and the optical wavelength tunable filter does not increase.
【００１７】また、誘電体多層膜を光路に直交する方向
に移動すのであるから入射角は不変である。即ち、誘電
体多層膜の透過率もまた変動することがない。一方、本
発明の製造に際して用いる基台は、所定の形状の曲面
で、この局面に板厚が一定の透明体薄板を貼着し、その
透明体薄板の表面に所定の同方向から誘電体物質を投射
し蒸着している。Further, since the dielectric multilayer film is moved in the direction orthogonal to the optical path, the incident angle remains unchanged. That is, the transmittance of the dielectric multilayer film also does not change. On the other hand, the base used in the production of the present invention is a curved surface of a predetermined shape, and a transparent thin plate having a constant plate thickness is attached to this aspect, and a dielectric substance is applied to the surface of the transparent thin plate from the same predetermined direction. Is projected and vapor-deposited.
【００１８】したがって、それぞれの誘電体薄膜の膜厚
は、誘電体物質の入射角の余弦に比例して形成されるこ
とになる。即ち、この曲面を所定の二次曲線よりなる曲
面とすることで、一方の端部の膜厚が薄く他方の端部の
膜厚が厚い誘電体薄膜を透明体薄板の表面に形成するこ
とができる。Therefore, the film thickness of each dielectric thin film is formed in proportion to the cosine of the incident angle of the dielectric substance. That is, by forming this curved surface into a curved surface having a predetermined quadratic curve, it is possible to form a dielectric thin film having a thin film thickness at one end and a large film thickness at the other end on the surface of the transparent thin plate. it can.
【００１９】[0019]
【実施例】以下図を参照しながら、本発明を具体的に説
明する。なお、全図を通じて同一符号は同一対象物を示
す。The present invention will be described in detail with reference to the drawings. The same reference numerals denote the same objects throughout the drawings.
【００２０】図１は本発明の構成図で、(A) は平面図、
(B) は側面図、図２は本発明の実施例の断面図、図３の
(A),(B) は本発明の製造工程を示す図である。図におい
て、21は、光学ガラスまたは高分子材料等からなる直方
体状の透明基板である。FIG. 1 is a block diagram of the present invention, (A) is a plan view,
(B) is a side view, FIG. 2 is a sectional view of an embodiment of the present invention, and FIG.
(A), (B) is a figure which shows the manufacturing process of this invention. In the figure, reference numeral 21 is a rectangular parallelepiped transparent substrate made of optical glass or a polymer material.
【００２１】22は、一方の端部に移行するに伴い膜厚が
漸次減少する高屈折率誘電体薄膜と低屈折率誘電体薄膜
とが、交互に重層して透明基板21の表面に形成された、
一方の端部の膜厚が薄く他方の端部の膜厚が厚い誘電体
多層膜である。Reference numeral 22 denotes a high refractive index dielectric thin film and a low refractive index dielectric thin film whose thickness gradually decreases as they move to one end, and are formed alternately on the surface of the transparent substrate 21. Was
The dielectric multilayer film has a thin film thickness at one end and a large film thickness at the other end.
【００２２】詳細すると、図２に例示したように透明基
板21の選択した面に、一方の端部の膜厚が薄く他方の端
部の膜厚が厚い、中心部の膜厚がλ0 ／４（λ0 は光波
長）の高屈折率誘電体薄膜（例えばTiO2で、屈折率は2.
3)22-1が蒸着等されて形成されている。More specifically, as shown in FIG. 2, on the selected surface of the transparent substrate 21, the film thickness at one end is thin and the film thickness at the other end is thick, and the film thickness at the center is λ 0 / 4 (λ 0 is the light wavelength) high-refractive-index dielectric thin film (for example, TiO 2 with a refractive index of 2.
3) 22-1 is formed by vapor deposition or the like.
【００２３】そして、その上に、同方向の端部の膜厚が
薄く他方の端部の膜厚が厚い、中心部の膜厚がλ0 ／４
（λ0 は光波長）の低屈折率誘電体薄膜（例えばSiO
2で、屈折率は1.46）22-2が形成され、さらにこの低屈
折率誘電体薄膜22-2の表面上に他の高屈折率誘電体薄膜
22-1が形成されている。[0023] Then, on the film thickness of the film thickness in the same direction of the end portion is thin other end is thick, the thickness of the center portion lambda 0/4
(Λ 0 is the wavelength of light) Low refractive index dielectric thin film (eg SiO 2
2 has a refractive index of 1.46) 22-2, and another high refractive index dielectric thin film is formed on the surface of this low refractive index dielectric thin film 22-2.
22-1 is formed.
【００２４】そしてその表面上に、中心部の膜厚がλ0
／２（λ0 は光波長）の低屈折率誘電体（例えばSiO
2で、屈折率は1.46）よりなるキャビティ薄膜22-3が形
成され、次に高屈折率誘電体薄膜22-1, 低屈折率誘電体
薄膜22-2, 高屈折率誘電体薄膜22-1, キャビティ薄膜22
-3と交互に、例えば50層を蒸着等して重層させたもので
ある。Then, on the surface, the film thickness of the central portion is λ 0
/ 2 (λ 0 is the wavelength of light) low-refractive-index dielectric (eg SiO 2
2 , a cavity thin film 22-3 having a refractive index of 1.46) is formed, and then a high refractive index dielectric thin film 22-1, a low refractive index dielectric thin film 22-2, and a high refractive index dielectric thin film 22-1. , Cavity thin film 22
Alternately with -3, for example, 50 layers are laminated by vapor deposition or the like.
【００２５】上述のような誘電体多層膜22は、所定の波
長λ0 のみ透過する。したがって、透明基板21に誘電体
多層膜22を形成してなる光波長フィルタ20は、パンドパ
スフィルタである。The dielectric multilayer film 22 as described above transmits only a predetermined wavelength λ 0 . Therefore, the optical wavelength filter 20 formed by forming the dielectric multilayer film 22 on the transparent substrate 21 is a bandpass filter.
【００２６】なお、キャビティ薄膜の数及びその膜厚に
より、パスする波長帯の幅を所望に加減し得る。光伝送
路（例えば光ファイバ)1-1の出射光をレンズで平行ビー
ムにし、その平行ビームを光波長フィルタ20の誘電体多
層膜22に直交するように投射し、光波長フィルタ20を透
過した平行ビームを、他のレンズで集光して他の光伝送
路1-2 に入射させている。The width of the wavelength band to be passed can be adjusted as desired depending on the number of cavity thin films and the thickness thereof. Light emitted from the optical transmission line (for example, optical fiber) 1-1 is made into a parallel beam with a lens, the parallel beam is projected so as to be orthogonal to the dielectric multilayer film 22 of the optical wavelength filter 20, and is transmitted through the optical wavelength filter 20. The parallel beam is condensed by another lens and is incident on another optical transmission line 1-2.
【００２７】一方、透明基板21の長手方向の側面の下部
を挟むように、一対の平行するガイド27を設けるととも
に、貫通するねじ孔を有する角形部材28を、透明基板21
の横方向に所望の間隔を隔てて設置している。On the other hand, a pair of parallel guides 27 are provided so as to sandwich the lower part of the side surface in the longitudinal direction of the transparent substrate 21, and a rectangular member 28 having a screw hole penetrating therethrough is provided on the transparent substrate 21.
Are installed at desired intervals in the lateral direction.
【００２８】そして、角形部材28のねじ孔に調整ねじ29
を螺合し、調整ねじ29の先端部を透明基板21の端面に取
りつけたラジアルボールベアリングの孔に圧入してい
る。したがって、調整ねじ29を所望に回動することで、
光波長フィルタ20は、光路に直交する方向に微細に移動
する。このことにより、光が通過する部分の誘電体多層
膜22膜厚が微細に変化する。即ちパンドパスフィルタの
パスする波長帯がシフトする。Then, the adjusting screw 29 is inserted into the screw hole of the rectangular member 28.
The tip end of the adjusting screw 29 is press-fitted into the hole of the radial ball bearing mounted on the end surface of the transparent substrate 21. Therefore, by turning the adjusting screw 29 as desired,
The optical wavelength filter 20 finely moves in the direction orthogonal to the optical path. As a result, the film thickness of the dielectric multilayer film 22 in the portion through which the light passes is minutely changed. That is, the wavelength band that the bandpass filter passes shifts.
【００２９】なお、膜厚が薄い方向に光波長フィルタ20
を移動すると、短波長側にシフトし、膜厚が厚い方向に
光波長フィルタ20を移動すると、長波長側にシフトす
る。以下図３を参照しながら、上述の光波長可変フィル
タの製造方法を説明する。The optical wavelength filter 20 is arranged in the direction of decreasing the film thickness.
Is shifted to the short wavelength side, and when the optical wavelength filter 20 is moved in the direction of increasing the film thickness, it is shifted to the long wavelength side. Hereinafter, a method of manufacturing the above-mentioned optical wavelength tunable filter will be described with reference to FIG.
【００３０】図において、30は、底面32に対向する面
が、所定の二次曲線が並列してなる曲面31を有する基台
である。この二次曲線は下式で示される。In the figure, reference numeral 30 is a base having a curved surface 31 whose surface facing the bottom surface 32 is formed by arranging predetermined quadratic curves in parallel. This quadratic curve is shown by the following equation.
【００３１】[0031]
【数１】 ｂは定数25は、光学ガラス又は高分子材料( ポリイミド
樹脂等) 等からなる、板厚が50μm 程度の短冊形の透明
体薄板である。[Equation 1] b is a constant 25, which is a strip-shaped transparent thin plate made of optical glass or polymer material (polyimide resin, etc.) and having a plate thickness of about 50 μm.
【００３２】上述の透明体薄板25を、基台30の曲面31に
剥離可能に貼着した後に、高屈折率誘電体物質を底面32
に直交する方向から、透明体薄板25の面に投射し蒸着し
て、所望の膜厚の高屈折率誘電体薄膜を形成する。次に
低屈折率誘電体物質を底面32に直交する方向から、透明
体薄板25の面に投射し蒸着して、所望の膜厚の低屈折率
誘電体薄膜をを形成する。After the transparent thin plate 25 described above is releasably adhered to the curved surface 31 of the base 30, a high refractive index dielectric substance is applied to the bottom surface 32.
A high refractive index dielectric thin film having a desired film thickness is formed by projecting and vapor-depositing it on the surface of the transparent thin plate 25 from a direction orthogonal to. Next, a low-refractive-index dielectric material is projected onto the surface of the transparent thin plate 25 from the direction orthogonal to the bottom surface 32 and vapor-deposited to form a low-refractive-index dielectric thin film having a desired thickness.
【００３３】このように屈折率の異なる誘電体物質を交
互に蒸着し重層して、所望の層数の誘電体多層膜を透明
体薄板25の表面に形成する。その後、透明体薄板25を基
台30から剥離し、直方体状の透明基板21の表面に、光学
接着材26を用いて貼着することで、光波長フィルタ20が
完成する。できる。In this way, dielectric materials having different refractive indexes are alternately deposited and laminated to form a desired number of dielectric multilayer films on the surface of the transparent thin plate 25. After that, the transparent thin plate 25 is peeled from the base 30, and the transparent substrate 21 having a rectangular parallelepiped shape is adhered to the surface of the transparent substrate 21 with an optical adhesive 26, whereby the optical wavelength filter 20 is completed. it can.
【００３４】上述のように形成された誘電体多層膜のそ
れぞれの誘電体薄膜の膜厚Ｔ(x) と、誘電体物質の投射
される入射角θとは、The thickness T (x) of each dielectric thin film of the dielectric multilayer film formed as described above and the incident angle θ of the dielectric substance projected are
【００３５】[0035]
【数２】 ａは定数の関係にある。[Equation 2] a has a constant relationship.
【００３６】一方、曲面31は(1) 式のｙに示すような二
次曲線からなる曲面である。したがって、On the other hand, the curved surface 31 is a curved surface composed of a quadratic curve as shown by y in the equation (1). Therefore,
【００３７】[0037]
【数３】 となるので、ｘに比例して減少する膜厚の誘電体薄膜が
得られる。[Equation 3] Therefore, a dielectric thin film having a film thickness that decreases in proportion to x can be obtained.
【００３８】[0038]
【発明の効果】以上説明したように本発明は、一方の端
部に移行するに伴い膜厚が漸次減少する高屈折率誘電体
薄膜と、同方向の端部に移行するに伴い膜厚が漸次減少
する低屈折率誘電体薄膜とを、交互に重層してなる誘電
体多層膜を、直方体状の透明基板に表面に形成し、誘電
体多層膜を光路に直交する方向に移動して、パスする波
長帯をシフトするようにした光波長可変フィルタであっ
て、光波長フィルタを通過する前と後とで光軸がずれる
ことがないので、光伝送路と光波長可変フィルタ間の結
合損失が一定で小さいという、実用上で優れた効果を有
する。As described above, according to the present invention, the high-refractive-index dielectric thin film in which the film thickness gradually decreases as it moves to one end and the film thickness as it moves to the end in the same direction. A low-refractive-index dielectric thin film that gradually decreases, a dielectric multilayer film formed by alternately stacking it is formed on the surface of a rectangular parallelepiped transparent substrate, and the dielectric multilayer film is moved in a direction orthogonal to the optical path, An optical wavelength tunable filter that shifts the passing wavelength band.Because the optical axis does not shift before and after passing through the optical wavelength filter, the coupling loss between the optical transmission line and the optical wavelength tunable filter Has a practically excellent effect that is constant and small.
【００３９】また、誘電体多層膜の透過率が変動するこ
とがなくて、安定した波長特性を有する。一方、本発明
方法によれば、所望に膜厚が減少する誘電体多層膜を容
易に得られる。Further, the transmittance of the dielectric multilayer film does not fluctuate, and stable wavelength characteristics are obtained. On the other hand, according to the method of the present invention, a dielectric multilayer film having a desired film thickness can be easily obtained.
【図１】 本発明の構成図で (A) は平面図 (B）は側面図FIG. 1 is a configuration diagram of the present invention, in which (A) is a plan view and (B) is a side view.
【図２】 本発明の実施例の断面図FIG. 2 is a sectional view of an embodiment of the present invention.
【図３】 (A),(B) は本発明の製造工程を示す図3 (A) and 3 (B) are views showing a manufacturing process of the present invention.
【図４】 従来例の図で (A) は構成図 (B) は詳細図FIG. 4 is a diagram of a conventional example, (A) is a configuration diagram, and (B) is a detailed diagram.
1-1,1-2 光伝送路 10,20 光波長フィルタ 11, 21 透明基板 12, 22 誘電体多層膜 22-1 高屈折率誘電体薄膜 22-2 低屈折率誘電体薄膜 22-3 キャビティ薄膜 25 透明体薄板 29 調整ねじ 30 基台 1-1,1-2 Optical transmission line 10,20 Optical wavelength filter 11, 21 Transparent substrate 12, 22 Dielectric multilayer film 22-1 High refractive index dielectric thin film 22-2 Low refractive index dielectric thin film 22-3 Cavity Thin film 25 Transparent thin plate 29 Adjusting screw 30 base
Claims (2)
に移行するに伴い膜厚が漸次減少する高屈折率誘電体薄
膜と低屈折率誘電体薄膜とが、交互に重層して該透明基
板(21)の表面に形成されてなる、一方の端部の膜厚が薄
く他方の端部の膜厚が厚い誘電体多層膜(22)と、 該透明基板(21)を光路に直交する方向に微細移動する手
段とを、備えたことを特徴とする光波長可変フィルタ。1. A transparent substrate (21) in the shape of a rectangular parallelepiped, and a high-refractive-index dielectric thin film and a low-refractive-index dielectric thin film whose film thickness gradually decreases as they move to one end are alternately laminated. And a dielectric multilayer film (22) formed on the surface of the transparent substrate (21) with one end having a small film thickness and the other end having a large film thickness, and the transparent substrate (21) having an optical path. An optical wavelength tunable filter comprising means for finely moving in a direction orthogonal to the optical wavelength tunable filter.
の曲面(31)に形成し、該曲面(31)に剥離可能に透明体薄
板(25)を貼着し、 所定の屈折率を有する誘電体物質を、該底面(32)にほぼ
直交する方向から、該透明体薄板(25)に交互に投射し蒸
着して該透明体薄板(25)の表面に、一方の端部の膜厚が
薄く他方の端部の膜厚が厚い誘電体多層膜(22)を設けた
後に、 該透明体薄板(25)を該基台(30)から剥離し、直方体状の
透明基板(21)の表面に貼着することを特徴とする光波長
可変フィルタの製造方法。2. A surface opposite to the bottom surface (32) of the base (30) is formed into a predetermined curved surface (31), and a transparent thin plate (25) is removably attached to the curved surface (31), A dielectric substance having a predetermined refractive index is alternately projected onto the transparent thin plate (25) from a direction substantially orthogonal to the bottom surface (32) and vapor-deposited on the surface of the transparent thin plate (25). After providing the dielectric multilayer film (22) having a thin film thickness at the end portion and a large film thickness at the other end portion, the transparent thin plate (25) is peeled from the base (30) to form a rectangular parallelepiped. A method of manufacturing an optical wavelength tunable filter, which is characterized in that it is attached to the surface of a transparent substrate (21).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4081211A JP2874439B2 (en) | 1992-04-03 | 1992-04-03 | Optical wavelength tunable filter and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4081211A JP2874439B2 (en) | 1992-04-03 | 1992-04-03 | Optical wavelength tunable filter and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05281480A true JPH05281480A (en) | 1993-10-29 |
| JP2874439B2 JP2874439B2 (en) | 1999-03-24 |
Family
ID=13740156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4081211A Expired - Lifetime JP2874439B2 (en) | 1992-04-03 | 1992-04-03 | Optical wavelength tunable filter and method of manufacturing the same |
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| Country | Link |
|---|---|
| JP (1) | JP2874439B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06281812A (en) * | 1993-03-26 | 1994-10-07 | Sun Tec Kk | Variable wavelength interference optical filter device |
| US5696859A (en) * | 1995-02-23 | 1997-12-09 | Fujitsu Limited | Optical-filter array, optical transmitter and optical transmission system |
| US6246818B1 (en) | 1998-11-13 | 2001-06-12 | Fujitsu Limited | Tunable optical filter |
| JP2008153561A (en) * | 2006-12-20 | 2008-07-03 | Seiko Epson Corp | External resonant laser light source device, monitor device using the same, and image display device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5633252B2 (en) | 2010-08-31 | 2014-12-03 | 日本電気株式会社 | Wavelength multiplexing section and wavelength multiplexing method of wavelength multiplexing optical transmission system |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02132405A (en) * | 1988-11-14 | 1990-05-21 | Minolta Camera Co Ltd | Spectral filter and spectral measuring sensor |
| JPH04126201U (en) * | 1991-05-09 | 1992-11-17 | 株式会社アドバンテスト | Multilayer dielectric film wavelength filter |
-
1992
- 1992-04-03 JP JP4081211A patent/JP2874439B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02132405A (en) * | 1988-11-14 | 1990-05-21 | Minolta Camera Co Ltd | Spectral filter and spectral measuring sensor |
| JPH04126201U (en) * | 1991-05-09 | 1992-11-17 | 株式会社アドバンテスト | Multilayer dielectric film wavelength filter |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06281812A (en) * | 1993-03-26 | 1994-10-07 | Sun Tec Kk | Variable wavelength interference optical filter device |
| US5696859A (en) * | 1995-02-23 | 1997-12-09 | Fujitsu Limited | Optical-filter array, optical transmitter and optical transmission system |
| US6246818B1 (en) | 1998-11-13 | 2001-06-12 | Fujitsu Limited | Tunable optical filter |
| JP2008153561A (en) * | 2006-12-20 | 2008-07-03 | Seiko Epson Corp | External resonant laser light source device, monitor device using the same, and image display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2874439B2 (en) | 1999-03-24 |
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