JPH05299829A - Reflow equipment - Google Patents
Reflow equipmentInfo
- Publication number
- JPH05299829A JPH05299829A JP4100819A JP10081992A JPH05299829A JP H05299829 A JPH05299829 A JP H05299829A JP 4100819 A JP4100819 A JP 4100819A JP 10081992 A JP10081992 A JP 10081992A JP H05299829 A JPH05299829 A JP H05299829A
- Authority
- JP
- Japan
- Prior art keywords
- hot air
- substrate
- route
- reflow
- air route
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
(57)【要約】
【目的】 半田部やチップが過度に再加熱されるのを回
避できるリフロー装置を提供する。
【構成】 加熱室1の上部に基板Sの上面に熱風を吹き
付ける上側熱風ルートAを設けるとともに、この加熱室
1の下部に、この基板Sの下面に熱風を吹き付ける下側
熱風ルートBを設け、且つこの上側熱風ルートAと下側
熱風ルートBからこの基板Sの上面と下面に選択的に熱
風を吹き付けさせるルートの切替え手段9,12を設け
た。
【効果】 2回目のリフローにおいて、基板Sの下側の
半田部H1が再加熱されて溶融し、この半田部H1によ
り基板Sに接着されたチップP1が落下したり、熱破壊
されるのを回避できる。
(57) [Abstract] [Purpose] To provide a reflow device capable of avoiding excessive reheating of a solder part or a chip. An upper hot air route A for blowing hot air onto the upper surface of the substrate S is provided above the heating chamber 1, and a lower hot air route B for blowing hot air onto the lower surface of the substrate S is provided below the heating chamber 1. Moreover, route switching means 9 and 12 for selectively blowing hot air from the upper hot air route A and the lower hot air route B to the upper surface and the lower surface of the substrate S are provided. [Effect] In the second reflow, the solder part H1 on the lower side of the substrate S is reheated and melted, and the chip P1 bonded to the substrate S is dropped or thermally destroyed by the solder part H1. It can be avoided.
Description
【0001】[0001]
【産業上の利用分野】本発明はリフロー装置に係り、詳
しくは、加熱室内を搬送される両面実装基板の上面や下
面に選択的に熱風を吹き付けることにより、基板に設け
られた半田部やチップが過度に再加熱されるのを回避す
るようにしたものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflow apparatus, and more particularly, to a solder portion or a chip provided on a substrate by selectively blowing hot air onto the upper surface and the lower surface of a double-sided mounting substrate that is transported in a heating chamber. Is to avoid excessive reheating.
【0002】[0002]
【従来の技術】今日、基板の高密度実装を図るために、
基板の上面と下面にチップを実装する両面実装が行われ
ている。この両面実装は、基板の一方の面に形成された
回路パターンの電極にクリーム半田や半田プリコートな
どの半田部を形成し、この半田部上にチップを搭載した
後、この基板をリフロー装置へ送って、この基板の他面
の半田部を加熱処理して1回目のリフローを行い、次い
で基板を表裏反転させ、この基板の他面に形成された回
路パターンの電極部に半田部を形成し、同様にこの半田
部上にチップを搭載した後、この基板を再びリフロー装
置へ送ってこの基板の他面の半田部を加熱処理する2回
目のリフローを行うものである。次に、この半田部の加
熱処理に使用される従来のリフロー装置を図面を参照し
て説明する。2. Description of the Related Art Today, in order to achieve high-density mounting of substrates,
Double-sided mounting, in which chips are mounted on the upper and lower surfaces of a substrate, is performed. In this double-sided mounting, solder parts such as cream solder and solder precoat are formed on the electrodes of the circuit pattern formed on one surface of the board, the chip is mounted on this solder part, and then this board is sent to the reflow device. Then, the solder portion on the other surface of this substrate is heat-treated to perform the first reflow, then the substrate is turned upside down, and the solder portion is formed on the electrode portion of the circuit pattern formed on the other surface of this substrate, Similarly, after mounting a chip on this solder portion, this substrate is sent to the reflow device again, and the second reflow is performed in which the solder portion on the other surface of this substrate is heat-treated. Next, a conventional reflow device used for the heat treatment of the solder portion will be described with reference to the drawings.
【0003】図5は従来手段に係るリフロー装置の断面
図であり、100は加熱室、101は加熱室100の下
部に収納されて、基板Sを加熱室100の入口部102
から出口部103まで搬送するコンベア、104は加熱
室100の上部および下部に収納されたヒータ、105
はファンである。FIG. 5 is a cross-sectional view of a reflow apparatus according to the conventional means. 100 is a heating chamber, 101 is a lower portion of the heating chamber 100, and a substrate S is an inlet portion 102 of the heating chamber 100.
From the outlet to the outlet 103, 104 is a heater housed in the upper and lower parts of the heating chamber 100, 105
Is a fan.
【0004】基板Sの上面106に半田部H1を形成
し、この半田部H1上にチップP1を搭載した後、この
基板Sはリフロー装置に送られる。同図実線に示すよう
に、入口部102から加熱室100に入ってきた基板S
は、コンベア101により加熱室100内を搬送され、
この搬送中にファン105によりヒータ104の熱が基
板Sの上面106および下面107に吹き付けられ、半
田部H1を加熱処理する1回目のリフローが行われる。After the solder portion H1 is formed on the upper surface 106 of the substrate S and the chip P1 is mounted on the solder portion H1, the substrate S is sent to the reflow apparatus. As shown by the solid line in the figure, the substrate S entering the heating chamber 100 through the inlet 102.
Is conveyed in the heating chamber 100 by the conveyor 101,
During this conveyance, the heat of the heater 104 is blown to the upper surface 106 and the lower surface 107 of the substrate S by the fan 105, and the first reflow process for heating the solder portion H1 is performed.
【0005】次いで基板Sを表裏反転させ、この基板S
の下面107に形成された回路パターンの電極部に半田
部H2を形成し、この半田部H2上にチップP2を搭載
した後、同図鎖線に示すように、この基板Sを再びリフ
ロー装置に送って、コンベア10により搬送しながら、
この下面107の電極に形成された半田部H2を加熱処
理する2回目のリフローが行われる。Next, the substrate S is turned upside down, and the substrate S
After the solder portion H2 is formed on the electrode portion of the circuit pattern formed on the lower surface 107 of the substrate and the chip P2 is mounted on the solder portion H2, the substrate S is sent to the reflow device again as shown by the chain line in the figure. , While being conveyed by the conveyor 10,
A second reflow process is performed in which the solder portion H2 formed on the electrode on the lower surface 107 is heat-treated.
【0006】[0006]
【発明が解決しようとする課題】両面実装基板Sは、上
述のように上面106の半田部H1を加熱処理する1回
目のリフローを行った後に、表裏反転して下面107の
半田部H2を加熱処理する2回目のリフローを行わねば
ならない。従って、表裏反転により下向きになった半田
部H1は、2回目のリフロー時に再加熱されることにな
る。このため半田部H1が溶けて、チップP1が基板S
から落下するという問題点があった。しかも、この2回
目のリフロー時の熱により、チップP1が熱破壊される
危険性も増大するという問題点があった。As described above, the double-sided mounting board S is turned upside down after heating the solder portion H1 on the upper surface 106 for the first time, and then the solder portion H2 on the lower surface 107 is heated. A second reflow to process must be done. Therefore, the solder portion H1 which has been turned downward due to the front-back reversal is reheated during the second reflow. Therefore, the solder portion H1 is melted, and the chip P1 becomes the substrate S.
There was a problem of falling from. In addition, there is a problem that the risk of thermal destruction of the chip P1 is increased by the heat during the second reflow.
【0007】そこで本発明は、両面実装基板の半田部や
チップが、2回目のリフローにおいて過度に再加熱され
るのを回避できるリフロー装置を提供することを目的と
する。Therefore, an object of the present invention is to provide a reflow apparatus capable of avoiding excessive reheating of a solder portion or a chip of a double-sided mounting substrate in the second reflow.
【0008】[0008]
【課題を解決するための手段】このために本発明は、加
熱室の上部に基板の上面に熱風を吹き付ける上側熱風ル
ートを設けるとともに、この加熱室の下部に、この基板
の下面に熱風を吹き付ける下側熱風ルートを設け、且つ
この上側熱風ルートと下側熱風ルートからこの基板の上
面と下面に選択的に熱風を吹き付けさせるルートの切替
え手段を設けたものである。To this end, according to the present invention, an upper hot air route for blowing hot air onto the upper surface of the substrate is provided in the upper portion of the heating chamber, and hot air is blown onto the lower surface of the substrate to the lower portion of the heating chamber. A lower hot air route is provided, and a route switching means for selectively blowing hot air from the upper hot air route and the lower hot air route to the upper surface and the lower surface of the substrate is provided.
【0009】[0009]
【作用】上記構成によれば、ルートの切替え手段を操作
して、上側熱風ルートと下側熱風ルートから基板の上面
と下面に選択的に熱風を吹き付けることにより、2回目
のリフローにおいて半田部やチップが過度に再加熱され
るのを回避できる。According to the above structure, the route switching means is operated to selectively blow hot air from the upper hot air route and the lower hot air route to the upper surface and the lower surface of the substrate, thereby making it possible to remove solder or It is possible to avoid excessive reheating of the chips.
【0010】[0010]
【実施例】(実施例1)次に、図面を参照しながら本発
明の実施例を説明する。図2は本発明の実施例1に係る
リフロー装置の斜視図であって、1は加熱室である。こ
の加熱室1には、基板Sを加熱室1の入口部2から出口
部3まで搬送するコンベア4が収納されている。P1は
半田部H1により基板Sに接着されたチップである。図
1は加熱室1の断面図であって、加熱室1内にはコンベ
ア4を中間にして、その上部に基板Sの上面に熱風を吹
き付ける上側熱風ルートAを構成するダクト7が設けら
れ、その下部に基板Sの下面に熱風を吹き付ける下側熱
風ルートBを構成するダクト10が設けられている。ダ
クト7とダクト10は上下対称な同形状である。(Embodiment 1) Next, an embodiment of the present invention will be described with reference to the drawings. FIG. 2 is a perspective view of the reflow apparatus according to the first embodiment of the present invention, and 1 is a heating chamber. The heating chamber 1 contains a conveyor 4 that conveys the substrate S from the inlet 2 to the outlet 3 of the heating chamber 1. P1 is a chip adhered to the substrate S by the solder portion H1. FIG. 1 is a cross-sectional view of the heating chamber 1. Inside the heating chamber 1, a conveyor 7 is provided in the middle, and a duct 7 forming an upper hot air route A for blowing hot air onto the upper surface of the substrate S is provided above the conveyor 4. A duct 10 forming a lower hot air route B for blowing hot air onto the lower surface of the substrate S is provided below the duct 10. The duct 7 and the duct 10 are vertically symmetrical and have the same shape.
【0011】上側熱風ルートAのダクト7の下部両側部
には、開口部7aと開口部7bが形成され、またその上
部中央部にはヒータ8とファン9が設けられている。開
口部7aと開口部7bは、ダクト7の下部に互いに対向
するように横向きに形成されている。ファン9を駆動す
ると、ヒータ8の熱は同図矢印に示すように開口部7a
から吹き出されて、コンベア4により搬送される基板S
の上面に横方向から水平に吹き付けられ、開口部7bか
ら再びダクト7に吸い込まれて循環する。An opening 7a and an opening 7b are formed on both sides of the lower portion of the duct 7 of the upper hot air route A, and a heater 8 and a fan 9 are provided in the center of the upper portion. The opening 7a and the opening 7b are formed laterally in the lower portion of the duct 7 so as to face each other. When the fan 9 is driven, the heat of the heater 8 is heated by the opening 7a as shown by the arrow in the figure.
Substrate S blown out from and conveyed by conveyor 4.
Is horizontally blown from the lateral direction onto the upper surface of the sheet and is sucked into the duct 7 again through the opening 7b to circulate.
【0012】また下側熱風ルートBのダクト10の上部
両側部には、開口部10aと開口部10bが互いに対向
するように横向きに形成され、またその下部中央部には
ヒータ11とファン12が設けられている。ファン12
を駆動すると、ヒータ11の熱は同図矢印に示すように
開口部10aから吹き出されて、コンベア4により搬送
される基板Sの下面に横方向から水平に吹き付けられ、
開口部10bから再びダクト10に吸い込まれて循環す
る。一方のヒータ11およびファン12を停止させ、他
方のヒータ8およびファン9を駆動すると、上側熱風ル
ートAのみに熱風が循環し、また基板Sとダクト7に包
囲された上側空間T1のみが高温となり、基板Sの上面
のみが加熱される。またこれと反対に、一方のヒータ8
とファン9を停止させ、他方のヒータ11およびファン
12を駆動すると、下側熱風ルートBのみに熱風が循環
し、また基板Sとダクト10に包囲された下側空間T2
のみが高温となり、基板Sの下面のみが加熱される。す
なわち、ファン8または9の駆動を選択的に切り替える
ことにより、上側熱風ルートAと下側熱風ルートBの切
替えが行われる。なお、ファン9,12は正逆ファンで
あり、その回転方向は任意に切替えられる。このリフロ
ー装置は上記のような構成より成り、次に動作を説明す
る。On both sides of the upper portion of the duct 10 of the lower hot air route B, an opening 10a and an opening 10b are formed laterally so as to face each other, and a heater 11 and a fan 12 are provided in the center of the lower portion. It is provided. Fan 12
Is driven, the heat of the heater 11 is blown out from the opening 10a as shown by the arrow in the drawing, and is blown horizontally from the lateral direction onto the lower surface of the substrate S conveyed by the conveyor 4,
The duct 10 is sucked again from the opening 10b and circulates. When the heater 11 and the fan 12 on one side are stopped and the heater 8 and the fan 9 on the other side are driven, hot air circulates only in the upper hot air route A, and only the upper space T1 surrounded by the substrate S and the duct 7 becomes hot. , Only the upper surface of the substrate S is heated. On the contrary, one heater 8
And the fan 9 are stopped and the other heater 11 and the fan 12 are driven, the hot air circulates only in the lower hot air route B, and the lower space T2 surrounded by the substrate S and the duct 10.
Is heated to a high temperature, and only the lower surface of the substrate S is heated. That is, the upper hot air route A and the lower hot air route B are switched by selectively switching the drive of the fan 8 or 9. The fans 9 and 12 are forward / reverse fans, and their rotation directions can be arbitrarily switched. This reflow apparatus has the above-mentioned configuration, and its operation will be described below.
【0013】基板Sの一方の面5に半田部H1を形成し
てチップP1を載置した後、この一方の面5に形成され
た半田部H1を加熱処理する1回目のリフローを行う。
図1実線に示すように、チップPが搭載された一方の面
5を上面として基板Sはコンベア4により加熱室1内を
搬送される。この搬送中にファン9,12の駆動によ
り、ヒータ8,11の熱が同図矢印のように開口部7
a,10aから基板Sの上面と下面に横方向から水平に
吹き付けられる。After the solder portion H1 is formed on the one surface 5 of the substrate S and the chip P1 is placed thereon, the first reflow process of heating the solder portion H1 formed on the one surface 5 is performed.
As shown by the solid line in FIG. 1, the substrate S is transported by the conveyor 4 in the heating chamber 1 with the one surface 5 on which the chips P are mounted as the upper surface. During this conveyance, the heat of the heaters 8 and 11 is driven by the fans 9 and 12 as shown by the arrow in FIG.
It is sprayed horizontally from the lateral direction on the upper surface and the lower surface of the substrate S from a and 10a.
【0014】上側熱風ルートAの熱風は、基板Sの上面
5の半田部H1を加熱し、また下側熱風ルートBの熱風
は、半田部H1の溶融を早めるために基板Sの下面6を
加熱する。加熱処理が終了した基板Sは、出口部3から
加熱室1の外へ送られる。勿論この場合、下側熱風ルー
トBによる基板Sの下面の積極的な加熱はせずともよ
く、下方のヒータ11とファン12は駆動を停止してい
てもよい。またファン9,12の回転方向を変えること
により、熱風の循環方向を適宜切替えながら、リフロー
を行ってもよく、このようにするれば基板Sの場所的な
温度むらを解消できる。The hot air from the upper hot air route A heats the solder portion H1 on the upper surface 5 of the substrate S, and the hot air from the lower hot air route B heats the lower surface 6 of the substrate S to accelerate the melting of the solder portion H1. To do. The substrate S for which the heating process has been completed is sent from the outlet section 3 to the outside of the heating chamber 1. Of course, in this case, the lower surface of the substrate S may not be positively heated by the lower hot air route B, and the driving of the heater 11 and the fan 12 below may be stopped. Further, by changing the rotation direction of the fans 9 and 12, the reflow may be performed while appropriately changing the circulation direction of the hot air, and by doing so, it is possible to eliminate the local temperature unevenness of the substrate S.
【0015】次に、基板Sは表裏反転されて、他面6の
電極に半田部H2を形成し、この半田部H2にチップP
2を搭載した後、2回目のリフローが行われる。この2
回目のリフローも、1回目のリフローと同様に、図1鎖
線に示すように基板Sをコンベア4により搬送しながら
行われるが、このときリフロー済の下面側の半田部H1
を再度加熱しないように、下側熱風ルートBのヒータ1
1やファン12は駆動を停止させ、ヒータ8とファン9
を駆動して上側熱風ルートAのみ熱風を循環させ、他面
6の半田部H2を加熱処理する。Next, the substrate S is turned upside down to form solder portions H2 on the electrodes on the other surface 6, and the chips P are attached to the solder portions H2.
After mounting 2, the second reflow is performed. This 2
Similarly to the first reflow, the second reflow is also performed while the substrate S is being conveyed by the conveyor 4 as shown by the chain line in FIG. 1. At this time, the reflowed solder portion H1 on the lower surface side is also used.
Heater 1 of the lower hot air route B so that it is not heated again
1 and fan 12 stop driving, and heater 8 and fan 9
Is driven to circulate the hot air only in the upper hot air route A, and the solder portion H2 on the other surface 6 is heat-treated.
【0016】このように下側熱風ルートBの熱風の循環
は停止しているので、下面には熱風は吹き付けられな
い。このため、1回目のリフロー済の半田部H1は2回
目のリフロー時の熱により再加熱されず、半田部H1が
溶融してチップP1が落下するのを防止できるととも
に、このときの熱によってチップP1が熱破壊される危
険性を低減できる。Since the circulation of the hot air in the lower hot air route B is stopped in this way, the hot air cannot be blown to the lower surface. Therefore, the solder portion H1 that has undergone the first reflow is not reheated by the heat during the second reflow, and it is possible to prevent the solder portion H1 from melting and dropping the chip P1. The risk of thermal destruction of P1 can be reduced.
【0017】(実施例2)図3は本発明に係る実施例2
のリフロー装置の断面図であり、13は上側熱風ルート
Aのダクトであり、このダクト13の下部両側部には一
対の開口部13aが互いに対向するように横向きに形成
され、またその上部中央部には下向きの開口部13bが
形成されている。このダクト13の上部両側部には、そ
れぞれ一対のヒータ14とファン15が設けられてお
り、ファン15の駆動により各ヒータ14の熱は同図矢
印のように左右の開口部13aから吹き出されて、基板
Sの上面に両横方向から水平に熱風を吹き付け、その後
上昇して開口部13bに吸い込まれる。(Second Embodiment) FIG. 3 shows a second embodiment according to the present invention.
13 is a cross-sectional view of the reflow apparatus of FIG. 1, 13 is a duct of the upper hot air route A, and a pair of openings 13a are formed laterally on both lower sides of the duct 13 so as to face each other, and an upper central portion thereof A downward opening 13b is formed in the. A pair of heaters 14 and fans 15 are provided on both sides of the upper portion of the duct 13, and the heat of the heaters 14 is blown out from the left and right openings 13a as shown by the arrows in FIG. The hot air is blown horizontally from both lateral directions onto the upper surface of the substrate S, and then rises and is sucked into the opening 13b.
【0018】16は下側熱風ルートBのダクトであり、
このダクト16の上部両側部には一対の開口部16aが
互いに対向するように横向きに形成され、またその下部
中央部には、上向きの開口部16bが形成されている。
このダクト16の下部両側部には、それぞれ一対のヒー
タ18とファン19が設けられており、ファン19の駆
動により各ヒータ18の熱は同図矢印のように左右の開
口部16aから吹き出されて、基板Sの下面に両横方向
から水平に熱風を吹き付け、その後下降して開口部16
bに吸い込まれる。このダクト13とダクト16も上下
対称な同形状である。Reference numeral 16 is a duct for the lower hot air route B,
A pair of openings 16a are formed laterally on both sides of the upper portion of the duct 16 so as to face each other, and an upward opening 16b is formed at the center of the lower portion.
A pair of heaters 18 and fans 19 are provided on both sides of the lower part of the duct 16, and the heat of each heater 18 is blown out from the left and right openings 16a as shown by the arrows in FIG. , Hot air is blown horizontally from both lateral directions onto the lower surface of the substrate S, and then descends to open the opening 16
sucked into b. The duct 13 and the duct 16 are also vertically symmetrical and have the same shape.
【0019】25は各開口部13aに設けられたルート
の切替え手段としての上側シャッタであり、26は各開
口部16aに設けられた同じくルートの切替え手段とし
ての下側シャッタである。これらのシャッタ25,26
をシリンダ(図外)などの駆動手段により開閉させるこ
とにより、上側熱風ルートAと下側熱風ルートBから基
板Sの上面と下面に選択的に熱風を吹き付ける。なお、
上側熱風ルートAは、通常、リフロー中には常時熱風を
循環させるものであり、したがって上側シャッタ25は
必ずしも設けなくてもよく、下側シャッタ26を開閉操
作することにより、上側熱風ルートAと下側熱風ルート
Bから基板Sの上面と下面に選択的に熱風を吹き付けて
もよい。この装置は上記のような構成より成り、次に動
作を説明する。Reference numeral 25 is an upper shutter provided as a route switching means in each opening 13a, and 26 is a lower shutter similarly provided as a route switching means in each opening 16a. These shutters 25, 26
Is opened and closed by a driving means such as a cylinder (not shown) to selectively blow hot air from the upper hot air route A and the lower hot air route B to the upper surface and the lower surface of the substrate S. In addition,
The upper hot air route A normally circulates the hot air constantly during reflow, and therefore the upper shutter 25 does not necessarily have to be provided, and the upper shutter 25 and the upper hot air route A can be opened and closed by opening and closing the lower shutter 26. Hot air may be selectively blown from the side hot air route B to the upper surface and the lower surface of the substrate S. This device is constructed as described above, and the operation will be described below.
【0020】基板Sの一方の面5に半田部H1を形成し
てチップP1を載置した後、一方の面5の半田部H1を
加熱処理する1回目のリフローを行う。このとき、図3
に示すように各シャッタ25,26を開いて上側熱風ル
ートAと下側熱風ルートBを開放しておく。ファン1
5,19を駆動すると、ヒータ14,18の熱は各開口
部13a,16aから吹き出され、基板Sの一方の面5
と他面6に両横方向から熱風を吹き付けて半田部H1を
加熱処理し、開口部13b,16bからダクト13,1
6内に吸い込まれる。このとき、ダクト13の両側に形
成された開口部13aより、チップPの両横方向から半
田部H1に水平に熱風が吹き付けられるので、実施例1
の場合よりも基板Sの温度むらを防止し、基板Sの全面
をより均一に加熱できる。After forming the solder portion H1 on the one surface 5 of the substrate S and mounting the chip P1 thereon, the first reflow process for heating the solder portion H1 on the one surface 5 is performed. At this time,
The shutters 25 and 26 are opened and the upper hot air route A and the lower hot air route B are opened as shown in FIG. Fan 1
When the heaters 5 and 19 are driven, the heat of the heaters 14 and 18 is blown out from the openings 13a and 16a, and the one surface 5 of the substrate S
Hot air is blown from both lateral directions to the other surface 6 to heat the solder portion H1, and the ducts 13 and 1 from the openings 13b and 16b.
It is sucked in 6. At this time, hot air is blown horizontally from both lateral directions of the chip P to the solder portion H1 through the openings 13a formed on both sides of the duct 13, so that the first embodiment
As compared with the above case, the temperature unevenness of the substrate S can be prevented and the entire surface of the substrate S can be heated more uniformly.
【0021】次いで、基板Sは表裏反転され、他面6の
電極に半田部H2を形成してチップP2を搭載した後、
基板Sをコンベア4により搬送しながら2回目のリフロ
ーが行われる。このときリフロー済の下面側の半田部H
1を再度加熱しないように、下側熱風ルートBの下側シ
ャッタ26は閉じ、ヒータ18とファン19を駆動し
て、上側熱風ルートAのみに熱風を循環させて、他面6
の半田部H2を加熱処理する。Next, the substrate S is turned upside down, solder portions H2 are formed on the electrodes on the other surface 6 and the chip P2 is mounted,
The second reflow is performed while the substrate S is being conveyed by the conveyor 4. At this time, the reflowed solder part H on the lower surface side
The lower shutter 26 of the lower hot air route B is closed so as not to reheat 1 and the heater 18 and the fan 19 are driven to circulate the hot air only in the upper hot air route A, and the other surface 6
The solder part H2 is heat-treated.
【0022】(実施例3)図4は本発明に係る実施例3
のリフロー装置の断面図であり、20は上側熱風ルート
Aのダクトと下側熱風ルートBのダクトを兼務したダク
トである。ダクト20の上部両側部に開口部20aと開
口部20bが形成され、またその中央部両側部に開口部
20cと開口部20dが形成されている。両開口部20
a,20bには上側シャッタ27が設けられ、また両開
口部20c,20dには下側シャッタ28が設けられて
いる。(Third Embodiment) FIG. 4 shows a third embodiment according to the present invention.
2 is a cross-sectional view of the reflow device, and 20 is a duct that also serves as a duct for the upper hot air route A and a duct for the lower hot air route B. An opening 20a and an opening 20b are formed on both sides of the upper portion of the duct 20, and an opening 20c and an opening 20d are formed on both sides of the central portion of the duct 20. Both openings 20
An upper shutter 27 is provided at a and 20b, and a lower shutter 28 is provided at both openings 20c and 20d.
【0023】1回目のリフロー時には、図4に示すよう
に各シャッタ27,28を開いて上側熱風ルートAと下
側熱風ルートBを開放しておく。ファン23を駆動する
と、ヒータ22の熱は各開口部20a,20cから吹き
出され、基板Sの一方の面5と他面6に両横方向から熱
風を吹き付けて半田部H1を加熱処理し、開口部20
b,20dからダクト20内に吸い込まれる。During the first reflow, as shown in FIG. 4, the shutters 27 and 28 are opened and the upper hot air route A and the lower hot air route B are opened. When the fan 23 is driven, the heat of the heater 22 is blown out from each of the openings 20a and 20c, and hot air is blown from one lateral direction to one surface 5 and the other surface 6 of the substrate S to heat the solder portion H1. Part 20
It is sucked into the duct 20 from b and 20d.
【0024】次いで、基板Sは表裏反転され、他面6の
電極に半田部H2を形成してチップP2を搭載した後、
基板Sをコンベア4により搬送しながら2回目のリフロ
ーが行われる。このとき各下側シャッタ28は閉じて下
側熱風ルートBは閉鎖され、上側熱風ルートAにより半
田部H2が加熱処理される。Next, the substrate S is turned upside down, solder portions H2 are formed on the electrodes on the other surface 6 and the chip P2 is mounted,
The second reflow is performed while the substrate S is being conveyed by the conveyor 4. At this time, each lower shutter 28 is closed, the lower hot air route B is closed, and the solder portion H2 is heat-treated by the upper hot air route A.
【0025】[0025]
【発明の効果】以上説明したように本発明では、加熱室
の上部に基板の上面に熱風を吹き付ける上側熱風ルート
を設けるとともに、この加熱室の下部に、この基板の下
面に熱風を吹き付ける下側熱風ルートを設け、且つこの
上側熱風ルートと下側熱風ルートからこの基板の上面と
下面に選択的に熱風を吹き付けさせるルートの切替え手
段を設けたので、両面実装基板の半田部が2回目のリフ
ローにおいて過度に再加熱されて溶融し、この半田部に
より基板に接着されたチップが落下したり、チップが熱
破壊されるのを回避できる。As described above, in the present invention, an upper hot air route for blowing hot air onto the upper surface of the substrate is provided in the upper part of the heating chamber, and a lower side for blowing hot air onto the lower surface of the substrate is provided in the lower part of the heating chamber. Since the hot air route is provided and the route switching means for selectively blowing hot air from the upper hot air route and the lower hot air route to the upper surface and the lower surface of the board is provided, the solder portion of the double-sided mounting board is reflowed for the second time. In this case, it is possible to prevent the chip bonded to the substrate from being dropped or thermally destroyed by being excessively reheated and melted by the solder portion.
【図1】本発明に係る実施例1のリフロー装置の断面図FIG. 1 is a sectional view of a reflow device according to a first embodiment of the present invention.
【図2】本発明に係る実施例1のリフロー装置の斜視図FIG. 2 is a perspective view of a reflow device according to a first embodiment of the present invention.
【図3】本発明に係る実施例2のリフロー装置の断面図FIG. 3 is a sectional view of a reflow device according to a second embodiment of the present invention.
【図4】本発明に係る実施例3のリフロー装置の断面図FIG. 4 is a sectional view of a reflow device according to a third embodiment of the present invention.
【図5】従来手段に係るリフロー装置の断面図FIG. 5 is a sectional view of a reflow device according to a conventional means.
1 加熱室 4 コンベア 8 ヒータ 9 ファン(ルートの切替え手段) 11 ヒータ 12 ファン(ルートの切替え手段) 14 ヒータ 15 ファン 18 ヒータ 19 ファン 22 ヒータ 23 ファン 25 ルートの切替え手段 26 ルートの切替え手段 27 ルートの切替え手段 28 ルートの切替え手段 A 上側熱風ルート B 下側熱風ルート S 基板 1 heating chamber 4 conveyor 8 heater 9 fan (route switching means) 11 heater 12 fan (route switching means) 14 heater 15 fan 18 heater 19 fan 22 heater 23 fan 25 route switching means 26 route switching means 27 route Switching means 28 Route switching means A Upper hot air route B Lower hot air route S Substrate
Claims (1)
と、この加熱室に収納されて基板を搬送するコンベアと
を備えたリフロー装置において、この加熱室の上部にこ
の基板の上面に熱風を吹き付ける上側熱風ルートを設け
るとともに、この加熱室の下部に、この基板の下面に熱
風を吹き付ける下側熱風ルートを設け、且つこの上側熱
風ルートと下側熱風ルートからこの基板の上面と下面に
選択的に熱風を吹き付けさせるルートの切替え手段を設
けたことを特徴とするリフロー装置。1. A reflow apparatus comprising a heating chamber in which a heater and a fan are accommodated, and a conveyer accommodated in the heating chamber to convey a substrate, and hot air is blown onto the upper surface of the substrate above the heating chamber. In addition to providing an upper hot air route, a lower hot air route for blowing hot air to the lower surface of the substrate is provided in the lower part of the heating chamber, and the upper hot air route and the lower hot air route are selectively applied to the upper surface and the lower surface of the substrate. A reflow apparatus comprising a route switching means for blowing hot air.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10081992A JP3191398B2 (en) | 1992-04-21 | 1992-04-21 | Reflow equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10081992A JP3191398B2 (en) | 1992-04-21 | 1992-04-21 | Reflow equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05299829A true JPH05299829A (en) | 1993-11-12 |
| JP3191398B2 JP3191398B2 (en) | 2001-07-23 |
Family
ID=14283957
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10081992A Expired - Fee Related JP3191398B2 (en) | 1992-04-21 | 1992-04-21 | Reflow equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3191398B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1702705A4 (en) * | 2004-01-07 | 2008-12-03 | Senju Metal Industry Co | Reflow furnace |
| CN102485399A (en) * | 2010-12-06 | 2012-06-06 | 西安中科麦特电子技术设备有限公司 | Heat recycling backflow welding machine |
| KR102262479B1 (en) * | 2020-10-26 | 2021-06-09 | 주식회사 원진 | Convective circulation structure of brazing furnace |
| WO2024224789A1 (en) * | 2023-04-27 | 2024-10-31 | パナソニックIpマネジメント株式会社 | Manufacturing method for component mounting substrate |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200065554A (en) | 2018-11-30 | 2020-06-09 | 삼성중공업 주식회사 | Grinding Device for Pipe Insulation |
-
1992
- 1992-04-21 JP JP10081992A patent/JP3191398B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1702705A4 (en) * | 2004-01-07 | 2008-12-03 | Senju Metal Industry Co | Reflow furnace |
| CN102485399A (en) * | 2010-12-06 | 2012-06-06 | 西安中科麦特电子技术设备有限公司 | Heat recycling backflow welding machine |
| KR102262479B1 (en) * | 2020-10-26 | 2021-06-09 | 주식회사 원진 | Convective circulation structure of brazing furnace |
| WO2024224789A1 (en) * | 2023-04-27 | 2024-10-31 | パナソニックIpマネジメント株式会社 | Manufacturing method for component mounting substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3191398B2 (en) | 2001-07-23 |
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