JPH0540933A - Magnetic disk and manufacturing method thereof - Google Patents
Magnetic disk and manufacturing method thereofInfo
- Publication number
- JPH0540933A JPH0540933A JP19461791A JP19461791A JPH0540933A JP H0540933 A JPH0540933 A JP H0540933A JP 19461791 A JP19461791 A JP 19461791A JP 19461791 A JP19461791 A JP 19461791A JP H0540933 A JPH0540933 A JP H0540933A
- Authority
- JP
- Japan
- Prior art keywords
- protective film
- magnetic disk
- high molecular
- molecular weight
- weight organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Lubricants (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
(57)【要約】
【目的】 磁気ディスクの保護膜上に形成する潤滑層の
結合性を向上させ、磁気ディスクの強度を増加し耐久性
を高められるようにすることを目的とする。
【構成】 磁性層上に成膜した保護膜上に潤滑を目的と
した高分子有機物を塗布後、プラズマ処理によって高分
子有機物を保護膜と化学結合させる磁気ディスクの製造
方法を構成する。
(57) [Summary] [Purpose] An object of the present invention is to improve the bondability of a lubricating layer formed on a protective film of a magnetic disk so as to increase the strength and durability of the magnetic disk. [Structure] A method for manufacturing a magnetic disk is provided in which a polymeric organic material for lubrication is applied on a protective film formed on a magnetic layer, and then the polymeric organic material is chemically bonded to the protective film by plasma treatment.
Description
【０００１】[0001]
【産業上の利用分野】本発明は磁気媒体に磁化状態を情
報として記録する磁気ディスク及びその製造方法に関す
る。近年、情報の電子化の進展により、計算機の外部記
憶装置である磁気ディスク装置の記憶容量は益々増大す
る傾向にある。このようにディスク装置の大容量化に伴
い情報の消失を伴う所謂ヘッドクラッシュは益々重要な
問題となっている。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic disk for recording a magnetization state on a magnetic medium as information and a method for manufacturing the magnetic disk. In recent years, with the progress of computerization of information, the storage capacity of a magnetic disk device, which is an external storage device of a computer, tends to increase more and more. As described above, so-called head crash, which is accompanied by loss of information as the capacity of the disk device increases, has become an increasingly important problem.
【０００２】[0002]
【従来の技術】従来の磁気ディスクにおいては、前述の
ようなヘッドクラッシュから磁性層を保護するために、
図２に示すように、磁性層上に保護膜が成膜され、その
保護膜の上にさらに潤滑層が形成されていた。即ち、図
２において、１−１はガラス基板、１−２はパーマロイ
（ＮｉＦｅ）から成る裏打層、１−３はコバルト・クロ
ム合金（ＣｏＣｒ）から成る磁性層、２−１は保護膜
（スパッタリングカーボン膜）、１−６は潤滑層（パー
フロロポリエーテル、カルボン酸などの高分子有機物）
である。2. Description of the Related Art In a conventional magnetic disk, in order to protect the magnetic layer from the head crash as described above,
As shown in FIG. 2, a protective film was formed on the magnetic layer, and a lubricating layer was further formed on the protective film. That is, in FIG. 2, 1-1 is a glass substrate, 1-2 is a backing layer made of permalloy (NiFe), 1-3 is a magnetic layer made of cobalt-chromium alloy (CoCr), 2-1 is a protective film (sputtering film). Carbon film), 1-6 are lubricating layers (polymer organic substances such as perfluoropolyether and carboxylic acid)
Is.
【０００３】[0003]
【発明が解決しようとする課題】しかし、潤滑層を形成
する際、潤滑剤を保護膜上に塗布するだけではその潤滑
剤は付着しにくい。磁気ディスクの強度は、保護膜と潤
滑層の結合性が大きく影響するため、潤滑剤を保護膜に
強固に付着させることが必要である。即ち、保護膜と潤
滑層の結合性が高い程膜強度が高く、潤滑層の寿命も長
い。However, when the lubricant layer is formed, the lubricant is not easily attached only by applying the lubricant on the protective film. Since the bonding strength between the protective film and the lubricating layer has a great influence on the strength of the magnetic disk, it is necessary to firmly adhere the lubricant to the protective film. That is, the higher the bond between the protective film and the lubricating layer, the higher the film strength, and the longer the life of the lubricating layer.
【０００４】潤滑剤を構成する高分子有機物分子はＯＨ
−、ＣＯＯＨ−等の官能基を１ケ所、又は２ケ所そなえ
ており、これによって保護膜と結合する。しかし２点程
度では十分ではない。本発明は磁気ディスクの保護膜上
に形成する潤滑層の結合性を向上させ、磁気ディスクの
強度を増加し耐久性を高めることのできる磁気ディスク
及びその製造方法を提供することを目的とする。OH is a high molecular weight organic compound molecule constituting the lubricant.
It has a functional group such as-, COOH- or the like at one place or at two places, and thereby it is bonded to the protective film. However, two points is not enough. SUMMARY OF THE INVENTION It is an object of the present invention to provide a magnetic disk capable of improving the bonding property of a lubricating layer formed on a protective film of the magnetic disk and increasing the strength and durability of the magnetic disk, and a manufacturing method thereof.
【０００５】[0005]
【課題を解決するための手段】このような課題を解決す
るために、第一の発明によれば、磁性層を保護する保護
膜上に潤滑を目的とした高分子有機物が設けられ、該高
分子有機物を構成する高分子有機物分子が上記保護膜と
３箇所以上で化学結合していることを特徴とする磁気デ
ィスクが提供される。In order to solve such a problem, according to the first invention, a high molecular weight organic substance for lubrication is provided on a protective film for protecting a magnetic layer, and There is provided a magnetic disk characterized in that high molecular weight organic compound molecules constituting a molecular organic substance are chemically bonded to the protective film at three or more places.
【０００６】第二の発明によれば、磁性層上に成膜した
保護膜上に潤滑を目的とした高分子有機物を塗布後、プ
ラズマ処理によって該高分子有機物を上記保護膜と化学
結合させる磁気ディスクの製造方法が提供される。更に
第三の発明によれば、磁性層上に成膜した保護膜上に潤
滑を目的とした高分子有機物を塗布後、プラズマ処理に
よって該高分子有機物を上記保護膜と化学結合させる磁
気ディスクの製造方法であって、前記保護膜の成膜、前
記高分子有機物の塗布、及びプラズマ処理を同一の真空
バッチで製造することを特徴とする磁気ディスクの製造
方法が提供される。According to the second aspect of the present invention, a polymer organic substance for lubrication is applied on the protective film formed on the magnetic layer, and the polymer organic substance is chemically bonded to the protective film by plasma treatment. A method of manufacturing a disc is provided. According to a third aspect of the present invention, after coating a polymeric organic material for lubrication on a protective film formed on a magnetic layer, a plasma treatment is performed to chemically bond the polymeric organic material to the protective film. A method of manufacturing a magnetic disk, which comprises manufacturing the protective film, coating the high molecular organic material, and performing plasma treatment in the same vacuum batch.
【０００７】[0007]
【作用】第一の発明によれば、磁気ディスクの保護膜上
に塗布した高分子有機物の分子はＯＨ−、ＣＯＯＨ−等
の官能基を１箇所又は２箇所もっており、この官能基部
分とそれ以外の場所との３箇所以上で保護膜と化学結合
させているので、両者間の結合力が高くなる。According to the first aspect of the present invention, the molecules of the high molecular weight organic substance coated on the protective film of the magnetic disk have one or two functional groups such as OH- and COOH-. Since the protective film is chemically bonded at three or more locations other than the above, the bonding force between the two becomes high.
【０００８】第一の発明によれば、磁気ディスクの保護
膜上に高分子有機物を塗布し、これをプラズマ処理によ
って保護膜と結合させているので、プラズマ重合膜が形
成され、両者間の結合力が高くなる。第三の発明によれ
ば、保護膜の成膜、高分子有機物の塗布、及びプラズマ
処理を同一の真空バッチで行うことにより、大気中の埃
等によってディスクが表面が汚染されることを防止で
き、潤滑剤としての高分子有機物の塗布及び結合工程に
支障をきたすことを防止できる。According to the first aspect of the present invention, since the high molecular weight organic substance is applied onto the protective film of the magnetic disk and is bonded to the protective film by the plasma treatment, the plasma polymerized film is formed and the bond between the two is formed. Power becomes high. According to the third aspect of the invention, the surface of the disk can be prevented from being contaminated by dust and the like in the atmosphere by forming the protective film, applying the high molecular weight organic substance, and performing the plasma treatment in the same vacuum batch. Also, it is possible to prevent troubles in the coating and bonding processes of the high molecular weight organic substance as a lubricant.
【０００９】[0009]
【実施例】図１は本発明の実施例構成図であり、磁気デ
ィスク（垂直二層膜ディスク）を示している。図中で、
１−１はガラス基板、１−２は例えばパーマロイ（Ｎｉ
Ｆｅ）から成る裏打ち層、１−３は例えばコバルト・ニ
ッケル合金（ＣｏＣｒ）から成る磁性層、１−４は保護
膜、即ちプラズマ重合膜、１−５は例えば官能基付きの
パーフロロポリエーテルから成る潤滑層である。1 is a block diagram of an embodiment of the present invention, showing a magnetic disk (vertical double-layer film disk). In the figure,
1-1 is a glass substrate, 1-2 is, for example, permalloy (Ni
Fe) a backing layer, 1-3 a magnetic layer made of, for example, a cobalt-nickel alloy (CoCr), 1-4 a protective film, that is, a plasma-polymerized film, and 1-5, for example, a functionalized perfluoropolyether. Is a lubricating layer.
【００１０】保護膜、即ちプラズマ重合膜１−４上にス
ピンコートあるいはディップコートによって潤滑層１−
５を設ける。潤滑層まで成膜した磁気ディスクにプラズ
マ処理を施す。プラズマ発生ガスとして、アルゴン（Ａ
ｒ）９０％、酸素（Ｏ2)１０％の混合ガスを用い、ガス
圧0.1Torr 、ラジオ波プラズマ電力1KW で１分間処理を
行う。これによって、図１に示すように塗布した潤滑剤
を活性にし官能基１−７はもちろん両末端にある官能基
以外の点１−８でも下層である保護膜１−４と化学結合
させることができる。The lubricating layer 1-is formed by spin coating or dip coating on the protective film, that is, the plasma polymerized film 1-4.
5 is provided. Plasma treatment is applied to the magnetic disk on which the lubricating layer is formed. Argon (A
r) Using a mixed gas of 90% and oxygen (O 2 ) 10%, a gas pressure of 0.1 Torr and a radio frequency plasma power of 1 KW are applied for 1 minute. As a result, the lubricant applied as shown in FIG. 1 can be activated to chemically bond to the protective film 1-4 as the lower layer not only at the functional groups 1-7 but also at points 1-8 other than the functional groups at both ends. it can.
【００１１】また、保護膜上に潤滑剤を成膜する場合あ
らかじめ単分子層を形成しておけば、全ての潤滑剤が保
護膜と結合することができる。上記の方法によって潤滑
剤を下層に結合させるため、潤滑剤の種類いかんに係わ
らず、潤滑効果の優れた有機物であればどんなものでも
保護膜に結合させることができる。即ち、潤滑剤は、真
空中で保護膜に吹きつけるために気化できるものでなく
てもよく、つまり基板のが熱変形を起こす温度よりも高
い沸点を持つ高分子有機物でもよく、又は官能基によっ
て付着させるものでなくてもよい。When a lubricant is formed on the protective film, if a monomolecular layer is formed in advance, all the lubricant can bond with the protective film. Since the lubricant is bonded to the lower layer by the above method, any organic material having an excellent lubricating effect can be bonded to the protective film regardless of the kind of the lubricant. That is, the lubricant does not have to be one that can be vaporized in order to spray it onto the protective film in a vacuum, that is, it may be a polymer organic substance having a boiling point higher than the temperature at which the substrate undergoes thermal deformation, or a functional group It does not have to be attached.
【００１２】図３は本発明の磁気ディスクの製造工程を
示す。本発明では、保護膜の成膜する工程、高分子有機
物の潤滑剤を塗布する工程、及びプラズマ処理を行う工
程を同一の真空バッチで行う。即ち、図３において、３
−１は保護膜成膜室、３−２は第一ロードアンロード
室、３−３は潤滑剤塗布室、３−４は第二ロードアンロ
ード室、３−５はプラズマ処理室である。各ロードアン
ロード室は各処理室との間に開閉扉があり、各処理室間
の圧力を調整する。FIG. 3 shows a manufacturing process of the magnetic disk of the present invention. In the present invention, the step of forming the protective film, the step of applying the high molecular organic lubricant, and the step of performing the plasma treatment are performed in the same vacuum batch. That is, in FIG.
Reference numeral -1 is a protective film forming chamber, 3-2 is a first load / unload chamber, 3-3 is a lubricant coating chamber, 3-4 is a second load / unload chamber, and 3-5 is a plasma processing chamber. Each loading / unloading chamber has an opening / closing door between it and each processing chamber, and adjusts the pressure between the processing chambers.
【００１３】本発明による磁気ディスクは次のようにし
て製造される。ガラス基板１−１（図１）上に裏打層１
−２を介して磁性層１−３を形成した後、保護膜成膜室
３−１に入れられ、保護膜１−４が成膜される。保護膜
成膜後、第一ロードアンロード室３−２を通過して潤滑
剤塗布室３−３に入れられ、高分子有機物である潤滑剤
１−５が塗布される。その後さらに、第二ロードアンロ
ード室３−４を通過してプラズマ処理室３−５に入れら
れ、プラズマ処理工程でプラズマガスが潤滑剤の上に照
射され、この潤滑剤と保護膜とが強固に結合される。こ
の際用いられる保護膜としてはスパッタリング・カーボ
ン等のようなスパッタリングによる成膜でも良い。The magnetic disk according to the present invention is manufactured as follows. Backing layer 1 on glass substrate 1-1 (Fig. 1)
After forming the magnetic layer 1-3 via -2, the magnetic layer 1-3 is placed in the protective film forming chamber 3-1 and the protective film 1-4 is formed. After forming the protective film, it passes through the first load / unload chamber 3-2 and is put into the lubricant applying chamber 3-3, where the lubricant 1-5, which is a high molecular weight organic substance, is applied. After that, the lubricant is further passed through the second load / unload chamber 3-4 and placed in the plasma processing chamber 3-5, and the plasma gas is irradiated onto the lubricant in the plasma processing step, so that the lubricant and the protective film are firm. Be combined with. The protective film used at this time may be a film formed by sputtering such as sputtering carbon.
【００１４】ここで、プラズマガスとしてアルゴン（Ａ
ｒ）等の不活性ガスが100 ％であるものを用いれば、塗
布した潤滑剤の性能を壊すことなく保護膜に結合させる
ことができる。また、プラズマガスとしてフッ素系ガス
の用いれば、潤滑剤を保護膜に付着させると同時にディ
スク全面を不活性にし、摩擦係数を下げることができ
る。Here, argon (A
If an inert gas such as r) having a 100% inert gas is used, it can be bonded to the protective film without damaging the performance of the applied lubricant. If a fluorine-based gas is used as the plasma gas, the lubricant can be adhered to the protective film and at the same time the entire surface of the disk can be made inactive and the friction coefficient can be lowered.
【００１５】さらに、潤滑剤を構成する分子、即ちユニ
ット（例えば、潤滑剤がパーフルオロポリエーテルであ
る場合は四フッ化炭素）を用いれば、潤滑剤を保護膜と
結合させると同時に潤滑層を成長させることができる。
また、保護膜としてプラズマ重合膜を用いればプラズマ
処理室と保護膜成膜室とを同一の処理室にすることがで
き、設備の簡略化を達成することができる。プラズマ重
合膜の成膜は、先ず、ラジオ波電源をプラズマ源とする
容量結合型プラズマ重合装置の反応器内のラジオ波電極
に磁性層、裏打層を成膜したガラス基板を設置する。こ
の際磁性層を成膜したガラス基板は、５０℃〜２００℃
に加熱保磁する。プラズマを形成するためにＡｒガスを
１００sccm流入し、反応器の内部が0.1Torr になるよう
に排気量を調整し、さらにラジオ波電力５０〜２００Ｗ
を与える。ここで、ガス化したベンゼン等の有機物を流
入し基板上で数１０秒重合を行う。Further, if a molecule constituting the lubricant, that is, a unit (for example, carbon tetrafluoride when the lubricant is perfluoropolyether) is used, the lubricant is bonded to the protective film and at the same time the lubricant layer is formed. Can grow.
Further, if the plasma polymerized film is used as the protective film, the plasma processing chamber and the protective film deposition chamber can be the same processing chamber, and the facility can be simplified. In order to form a plasma polymerized film, first, a glass substrate having a magnetic layer and a backing layer formed thereon is placed on a radio frequency electrode in a reactor of a capacitively coupled plasma polymerization apparatus using a radio frequency power source as a plasma source. At this time, the glass substrate on which the magnetic layer was formed had a temperature of 50 ° C to 200 ° C.
Heat and magnetize. Ar gas was introduced at 100 sccm in order to form plasma, the exhaust volume was adjusted so that the inside of the reactor was 0.1 Torr, and the radio frequency power was 50 to 200 W.
give. Here, an organic substance such as benzene which has been gasified is introduced and polymerization is performed on the substrate for several tens of seconds.
【００１６】潤滑剤処理後のプラズマ処理用ガスとして
プラズマ重合膜成膜用モノマーを用いれば、潤滑剤と保
護膜であるプラズマ重合膜との付着がさらに優れたもの
となる。If a plasma-polymerized film-forming monomer is used as the plasma treatment gas after the lubricant treatment, the adhesion between the lubricant and the plasma-polymerized film, which is the protective film, is further improved.
【００１７】[0017]
【発明の効果】以上のようにして成膜した磁気ディスク
は、その潤滑層の結合性がすぐれており、これによって
磁気ディスクとしての強度が向上し、耐久性の高い磁気
ディスクとなる。The magnetic disk formed as described above has an excellent bonding property of the lubricating layer, which improves the strength of the magnetic disk and makes it a highly durable magnetic disk.
【図面の簡単な説明】[Brief description of drawings]
【図１】図１は本発明の磁気ディスクの実施例を示す概
略図で、（ａ）は断面図、（ｂ）は保護層１−４の模式
的な斜視図である。FIG. 1 is a schematic view showing an embodiment of a magnetic disk of the present invention, (a) is a sectional view, and (b) is a schematic perspective view of a protective layer 1-4.
【図２】図２は従来の磁気ディスクの概略断面図であ
る。FIG. 2 is a schematic cross-sectional view of a conventional magnetic disk.
【図３】図３は本発明による磁気ディスクの製造工程を
示す概略図である。FIG. 3 is a schematic view showing a manufacturing process of a magnetic disk according to the present invention.
１−１…ガラス基板 １−２…裏打ち層（ＮｉＦｅ） １−３…磁性層（ＣｏＣｒ） １−４…保護膜（プラズマ重合膜） １−５…潤滑層（パーフルオロポリエーテル） １−７…高分子有機物分子 １−８…官能基 １−９…両末端にある官能基以外の点における結合点 ３−１…保護膜成膜室 ３−２…第一ロードアンロード室 ３−３…潤滑剤塗布室 ３−４…第二ロードアンロード室 ３−５…プラズマ処理室 1-1 ... Glass substrate 1-2 ... Backing layer (NiFe) 1-3 ... Magnetic layer (CoCr) 1-4 ... Protective film (plasma polymerized film) 1-5 ... Lubrication layer (perfluoropolyether) 1-7 ... Polymer organic molecule 1-8 ... Functional group 1-9 ... Bonding points at points other than functional groups at both ends 3-1 ... Protective film deposition chamber 3-2 ... First load / unload chamber 3-3 ... Lubricant coating chamber 3-4 ... Second load / unload chamber 3-5 ... Plasma processing chamber
Claims (10)
−4 ）上に潤滑を目的とした高分子有機物（１−５）が
設けられ、該高分子有機物（１−５）を構成する高分子
有機物分子が上記保護膜（１−4 ）と３箇所以上で化学
結合していることを特徴とする磁気ディスク。1. A protective film (1) for protecting the magnetic layer (1-3).
-4) A high molecular weight organic compound (1-5) is provided on the surface for lubrication, and the high molecular weight organic compound molecules constituting the high molecular weight organic compound (1-5) and the protective film (1-4) are located at three locations. A magnetic disk characterized by being chemically bonded as described above.
能基を有しない高分子有機物を用いることを特徴とする
請求項１に記載の磁気ディスク。2. The magnetic disk according to claim 1, wherein a polymer organic material having no functional group is used as the polymer organic material (1-5).
機物（１−５）を単分子層形成したことを特徴とする請
求項１に記載の磁気ディスク。3. The magnetic disk according to claim 1, wherein the high molecular weight organic compound (1-5) is formed as a monomolecular layer on the protective film (1-4).
合膜を用いることにより、前記高分子有機物（１−５）
と保護膜（１−4 ）との化学結合を行わせることを特徴
とする請求項１に記載の磁気ディスク。4. The high molecular weight organic compound (1-5) by using a plasma polymerized film as the protective film (1-4).
2. The magnetic disk according to claim 1, wherein the chemical bonding between the protective film and the protective film (1-4) is performed.
介して磁性層（１−３）及び保護膜（１−4 ）を形成
し、さらに該保護膜（１−4 ）上に潤滑を目的とした高
分子有機物（１−５）を塗布し、該高分子有機物（１−
５）を構成する高分子有機物分子を保護膜（１−4 ）と
３箇所以上で化学結合させ、該高分子有機物（１−５）
として、上記基板（１−１）が熱変形を起こす温度より
も高い沸点を有する高分子有機物を用いることを特徴と
する磁気ディスク。5. A magnetic layer (1-3) and a protective film (1-4) are formed on a substrate (1-1) via a backing layer (1-2), and the protective film (1-4) is further formed. ) Is coated with a polymer organic substance (1-5) for the purpose of lubrication, and the polymer organic substance (1-
5) The high molecular weight organic compound molecule constituting the 5) is chemically bonded to the protective film (1-4) at three or more positions to form the high molecular weight organic compound (1-5).
As the magnetic disk, a polymer organic material having a boiling point higher than the temperature at which the substrate (1-1) causes thermal deformation is used.
（１−4 ）上に潤滑を目的とした高分子有機物（１−
５）を塗布後、プラズマ処理によって該高分子有機物
（１−５）を上記保護膜（１−4 ）と化学結合させる磁
気ディスクの製造方法。6. A protective organic film (1-4) formed on the magnetic layer (1-3) and a polymer organic compound (1-
A method for producing a magnetic disk, wherein the high molecular weight organic compound (1-5) is chemically bonded to the protective film (1-4) by plasma treatment after applying 5).
に、フッ素系ガスを含んだガスを用いることを特徴とす
る請求項６に記載の磁気ディスクの製造方法。7. The method of manufacturing a magnetic disk according to claim 6, wherein a gas containing a fluorine-based gas is used as an atmospheric gas for generating plasma.
に、塗布した高分子有機物を構成する分子の少なくとも
一部を含むガスを用いることを特徴とする請求項６に記
載の磁気ディスクの製造方法。8. The method for producing a magnetic disk according to claim 6, wherein a gas containing at least a part of the molecules constituting the applied high molecular weight organic substance is used as the atmospheric gas for generating the plasma.
に、塗布した高分子有機物を構成する分子の少なくとも
一部を含むガスを用い、プラズマ重合膜を成膜すること
を特徴とする請求項６に記載の磁気ディスクの製造方
法。9. The plasma polymerized film is formed by using, as an atmospheric gas for generating plasma, a gas containing at least a part of molecules constituting the applied high molecular weight organic substance. A method for manufacturing the magnetic disk described.
（１−4 ）上に潤滑を目的とした高分子有機物（１−
５）を塗布後、プラズマ処理によって該高分子有機物
（１−５）を上記保護膜（１−4 ）と化学結合させる磁
気ディスクの製造方法であって、前記保護膜（１−4 ）
の成膜、前記高分子有機物（１−５）の塗布、及びプラ
ズマ処理を同一の真空バッチ（３−１，３，５）で製造
することを特徴とする磁気ディスクの製造方法。10. A high molecular weight organic compound (1-) for lubrication on a protective film (1-4) formed on a magnetic layer (1-3).
5) A method for producing a magnetic disk, wherein the high molecular weight organic compound (1-5) is chemically bonded to the protective film (1-4) by plasma treatment after applying the protective film (1-4).
2. The method for producing a magnetic disk, characterized in that the film formation, the coating of the polymer organic substance (1-5), and the plasma treatment are produced in the same vacuum batch (3-1, 3, 5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19461791A JPH0540933A (en) | 1991-08-05 | 1991-08-05 | Magnetic disk and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19461791A JPH0540933A (en) | 1991-08-05 | 1991-08-05 | Magnetic disk and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0540933A true JPH0540933A (en) | 1993-02-19 |
Family
ID=16327516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19461791A Withdrawn JPH0540933A (en) | 1991-08-05 | 1991-08-05 | Magnetic disk and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0540933A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001012705A1 (en) * | 1999-08-18 | 2001-02-22 | University Of Cincinnati | Product having a thin film polymer coating and method of making |
| WO2018151589A1 (en) * | 2017-02-17 | 2018-08-23 | Fuji Electric (Malaysia) Sdn. Bhd. | Magnetic recording medium and method for manufacturing the same |
-
1991
- 1991-08-05 JP JP19461791A patent/JPH0540933A/en not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001012705A1 (en) * | 1999-08-18 | 2001-02-22 | University Of Cincinnati | Product having a thin film polymer coating and method of making |
| US6488992B1 (en) | 1999-08-18 | 2002-12-03 | University Of Cincinnati | Product having a thin film polymer coating and method of making |
| WO2018151589A1 (en) * | 2017-02-17 | 2018-08-23 | Fuji Electric (Malaysia) Sdn. Bhd. | Magnetic recording medium and method for manufacturing the same |
| JP2019508834A (en) * | 2017-02-17 | 2019-03-28 | フジ エレクトリック （マレーシア） エスディーエヌ ビーエイチディー | Magnetic recording medium and method of manufacturing the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6365012B1 (en) | Magnetic recording medium and a method of manufacturing the same | |
| JPH022221B2 (en) | ||
| WO2007114207A1 (en) | Magnetic disc and method for manufacturing same | |
| JPH0534729B2 (en) | ||
| JP2830544B2 (en) | Magnetic recording media | |
| US5296263A (en) | Method of manufacturing a recording medium | |
| JPH0540933A (en) | Magnetic disk and manufacturing method thereof | |
| US6620481B2 (en) | Magnetic recording medium, magnetic recording medium manufacture method, and information regeneration apparatus | |
| JPS6122432A (en) | Production of magnetic recording medium | |
| JPH0516087B2 (en) | ||
| JP3151636B2 (en) | Magnetic recording medium and method of manufacturing the same | |
| JP2003331416A (en) | Magnetic recording media | |
| JP3801040B2 (en) | Method for manufacturing magnetic recording medium | |
| JPS61208621A (en) | Magnetic disk | |
| JPS62273624A (en) | Magnetic recording medium and its production | |
| JPS6122433A (en) | Production of magnetic recording medium | |
| JPH1125452A (en) | Manufacturing method of magnetic recording medium | |
| JPH10326408A (en) | Magnetic recording medium and method of manufacturing the same | |
| JPS6122419A (en) | Magnetic recording medium | |
| JPH04167224A (en) | Magnetic recording medium | |
| JPS6231022A (en) | Magnetic recording medium and its manufacture | |
| JPS61278025A (en) | Magnetic recording medium and its production | |
| JP2003077119A (en) | Magnetic recording medium and method of manufacturing the same | |
| JPH01296429A (en) | Recording medium manufacturing method | |
| JPS61211821A (en) | Magnetic recording medium |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19981112 |