JPH0541193A - Scanning electron microscope equipped with wafer carrier - Google Patents
Scanning electron microscope equipped with wafer carrierInfo
- Publication number
- JPH0541193A JPH0541193A JP3057088A JP5708891A JPH0541193A JP H0541193 A JPH0541193 A JP H0541193A JP 3057088 A JP3057088 A JP 3057088A JP 5708891 A JP5708891 A JP 5708891A JP H0541193 A JPH0541193 A JP H0541193A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- transfer device
- wafer transfer
- electron microscope
- magnetic shield
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
(57)【要約】
【目的】本発明はウエーハ搬送装置を備えた電子顕微鏡
に関し、特にウエーハ搬送装置の動作により変動する磁
場を最小に押える方法を提供することにある。
【構成】鏡体（６）とウエーハ搬送装置（８）との間
に、磁気シールド板（７）を設けると共に機構部（１
３）の駆動源であるモータ及び電磁バルブに磁気シール
ド箱を取付け、ウエーハ搬送装置（８）が動作しても上
記磁気シールド部材がウエーハ装置（８）内で磁場をシ
ョートさせることにより達成される。
【効果】ウエーハ搬送装置が動作したときの鏡体内の電
子レンズにおける磁場変動が防止できるので、像振れ等
のない鮮明な像が得られる。また、これら像障害がなく
なったため観察中においてもウエーハ搬送が行えるた
め、スループットが向上するという効果がある。
(57) [Summary] [Object] The present invention relates to an electron microscope provided with a wafer transfer device, and particularly to provide a method for suppressing a magnetic field fluctuated by the operation of the wafer transfer device to a minimum. [Structure] A magnetic shield plate (7) is provided between a mirror body (6) and a wafer transfer device (8), and a mechanical section (1) is provided.
This is achieved by attaching a magnetic shield box to the motor and the electromagnetic valve that are the driving sources of 3), and even if the wafer transfer device (8) operates, the magnetic shield member short-circuits the magnetic field in the wafer device (8). . [Effect] Since the magnetic field fluctuation in the electron lens in the mirror body when the wafer transfer device is operated can be prevented, a clear image without image shake can be obtained. Further, since these image defects are eliminated, the wafer can be transported even during observation, which has the effect of improving the throughput.
Description
【０００１】[0001]
【産業上の利用分野】本発明は走査電子顕微鏡に付属す
るウエーハ搬送装置の防磁方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for degaussing a wafer carrier attached to a scanning electron microscope.
【０００２】[0002]
【従来の技術】従来の測長ＳＥＭは、特開昭61−181050
号公報に記載のように走査電子顕微鏡の試料交換機能を
持つローダ室に、特開昭60−52437 号公報に示すような
ウエーハをカセットから１枚ずつ取り出す機構を取り付
けていた。2. Description of the Related Art A conventional measuring SEM is disclosed in Japanese Patent Laid-Open No. 61-181050.
As described in Japanese Patent Laid-Open No. 60-52437, a loader chamber having a sample exchange function of a scanning electron microscope is equipped with a mechanism for taking out wafers one by one from a cassette.
【０００３】これら従来の装置では観察終了から、次の
観察に至るまでにウエーハ搬送に多くの時間を費やして
おり、スループット向上の工夫がされていなかった。In these conventional apparatuses, a large amount of time is spent for wafer conveyance from the end of observation to the next observation, and no attempt has been made to improve throughput.
【０００４】[0004]
【発明が解決しようとする課題】上記従来技術で問題と
なっているスループットを向上させるためにウエーハ観
察中に次のウエーハを搬送することを考案した。しか
し、ウエーハ搬送装置が動作することにより地磁場が変
動してしまいＳＥＭ像に悪影響を及ぼす問題があった。
本発明の目的は、ウエーハ像観察中のウエーハ搬送装置
の動作による地磁場変動を押え、スループットを向上さ
せることにある。In order to improve the throughput, which is a problem in the above-mentioned prior art, it was devised to convey the next wafer during wafer observation. However, there is a problem that the geomagnetic field fluctuates due to the operation of the wafer transfer device, which adversely affects the SEM image.
An object of the present invention is to suppress the fluctuation of the geomagnetic field due to the operation of the wafer transfer device during observation of a wafer image and improve the throughput.
【０００５】[0005]
【課題を解決するための手段】上記目的を達成するため
に、請求項１に関してはウエーハ搬送装置の各機構系の
移動動作による地磁場の変動を防ぐため、装置全体を覆
うようにＳＥＭ鏡体との間に強磁性体であるパーマロイ
ＰＣ材で作成した磁気シールド板を設置し、ウエーハ搬
送装置側の磁場をショートさせた。In order to achieve the above object, according to claim 1, in order to prevent the fluctuation of the earth magnetic field due to the movement operation of each mechanical system of the wafer transfer device, the SEM mirror body is covered so as to cover the entire device. A magnetic shield plate made of a permalloy PC material, which is a ferromagnetic material, was installed between the magnetic field and the magnetic field, and the magnetic field on the wafer carrier side was short-circuited.
【０００６】請求項２に関しては、ウエーハ搬送装置の
モータ及び電磁バルブの励磁による地場変動を防ぐため
に、上記パーマロイＰＣ材で箱を作成しその箱の中に納
め、磁場をショートさせた。According to the second aspect of the present invention, in order to prevent the ground fluctuation due to the excitation of the motor and the electromagnetic valve of the wafer carrier, a box is made of the Permalloy PC material and is housed in the box, and the magnetic field is short-circuited.
【０００７】請求項３に関しては、ウエーハ搬送装置の
モータ及び電磁バルブ等の磁性材料をＳＥＭ鏡体より離
れた位置に設置し、磁場変動による影響を最小に押え
た。According to the third aspect of the present invention, the magnetic material such as the motor and electromagnetic valve of the wafer transfer device is installed at a position apart from the SEM mirror body to minimize the influence of the magnetic field fluctuation.
【０００８】[0008]
【作用】ウエーハの取り出し／収納を行うウエーハ搬送
装置は、機構部の駆動源としてモータ，電磁バルブ等を
用いており、その動作により変動する磁場をＳＥＭ鏡体
とウエーハ搬送装置間に設置した磁気シールド板と駆動
源自体を包む磁気シールド箱を用い磁場をショートして
いるので、ウエーハ搬送装置の動作による磁場変動がＳ
ＥＭ鏡体に影響することはない。The wafer transfer device for taking out / storing a wafer uses a motor, an electromagnetic valve, etc. as a driving source of the mechanism section, and a magnetic field fluctuated by the operation is set between the SEM mirror body and the wafer transfer device. Since the magnetic field is short-circuited by using a magnetic shield box that encloses the shield plate and the driving source itself, the magnetic field fluctuation due to the operation of the wafer carrier is S
It does not affect the EM body.
【０００９】[0009]
【実施例】以下、本発明の実施例を図１，図２で説明す
る。Embodiments of the present invention will be described below with reference to FIGS.
【００１０】電子線１をウエーハ２表面に照射しウエー
ハ２より発生する二次電子３を検出してレジストパター
ン等を測定する走査電子顕微鏡において、上記検出を行
う観察部４と電子レンズ５を内蔵する鏡体６との間に磁
気シールド板７を設置したウエーハ搬送装置８が架台９
に固定されている。また、ウエーハ搬送装置８の駆動源
には図２に示すような磁気シールド箱１０及び１１が取
り付けられ、上記鏡体６より離れた位置に設置した。In a scanning electron microscope for irradiating the surface of a wafer 2 with an electron beam 1 to detect secondary electrons 3 generated from the wafer 2 and measuring a resist pattern or the like, an observation section 4 and an electron lens 5 for performing the above detection are built-in. The wafer transfer device 8 having the magnetic shield plate 7 installed between it and the mirror body 6
It is fixed to. Further, magnetic shield boxes 10 and 11 as shown in FIG. 2 were attached to the drive source of the wafer transfer device 8 and were installed at a position apart from the mirror body 6.
【００１１】本実施例によればウエーハ搬送装置８にお
いて、カセット１２からウエーハ２を取り出し且つ収納
する機構部１３が動作しても、動作時に変動する磁場を
磁気シールド部材でショートしているため、ウエーハ２
が観察中であってもウエーハ搬送が可能となり、その結
果スループットを向上させると共にクリアな観察像が得
られる。According to this embodiment, in the wafer transfer device 8, even if the mechanism portion 13 for taking out and storing the wafer 2 from the cassette 12 is operated, the magnetic field fluctuating during the operation is short-circuited by the magnetic shield member. Waha 2
The wafer can be transported even during observation, resulting in improved throughput and a clear observation image.
【００１２】[0012]
【発明の効果】本発明によればウエーハ観察中にウエー
ハ搬送をすることができるので、ウエーハ処理に要する
時間が短くてすみスループットが向上できる。さらに、
ウエーハ搬送中でもウエーハ観察像に障害を及ぼすこと
がないので鮮明な像を得ることができる。According to the present invention, since the wafer can be transported during wafer observation, the time required for wafer processing can be shortened and the throughput can be improved. further,
Even when the wafer is being transported, a clear image can be obtained because it does not interfere with the wafer observation image.
【図１】本発明の一実施例の構成図である。FIG. 1 is a configuration diagram of an embodiment of the present invention.
【図２】磁気シールド箱１０及び１１の詳細図である。FIG. 2 is a detailed view of magnetic shield boxes 10 and 11.
１…電子線、２…ウエーハ、３…二次電子、４…観察
部、５…電子レンズ、６…鏡体、７…磁気シールド板、
８…ウエーハ搬送装置、９…架台、１０…磁気シールド
箱、１１…磁気シールド箱、１２…カセット、１３…機
構部。1 ... Electron beam, 2 ... Wafer, 3 ... Secondary electron, 4 ... Observation part, 5 ... Electron lens, 6 ... Mirror body, 7 ... Magnetic shield plate,
8 ... Wafer transfer device, 9 ... Stand, 10 ... Magnetic shield box, 11 ... Magnetic shield box, 12 ... Cassette, 13 ... Mechanical part.
Claims (3)
ハから発生する二次電子を測定することにより、ウエー
ハの表面形状を観察する観察部と、上記ウエーハを搬送
する搬送装置とを備えたものにおいて、上記ウエーハ観
察部と上記ウエーハ搬送装置との間に磁気シールド板を
取付け、且つ上記ウエーハ搬送装置の駆動用モータ及び
電磁バルブに於いてその全体を覆う磁気シールド箱を設
けたことを特徴とするウエーハ搬送装置を備えた走査電
子顕微鏡。1. A wafer equipped with an observation section for observing a surface shape of a wafer by irradiating the wafer with an electron beam and measuring secondary electrons generated from the wafer, and a transportation device for transporting the wafer. In the above, a magnetic shield plate is attached between the wafer observation section and the wafer transfer device, and a magnetic shield box is provided to cover the whole of the drive motor and electromagnetic valve of the wafer transfer device. Scanning electron microscope equipped with a wafer carrier.
非磁性体で構成したことを特徴とする請求項１記載のウ
エーハ搬送装置を備えた走査電子顕微鏡。2. A scanning electron microscope equipped with a wafer transfer device according to claim 1, wherein the main material of the structure of the wafer transfer device is a non-magnetic material.
材料を有する部材に於いては、上記ウエーハ観察部より
最も遠い場所に設置したことを特徴とするウエーハ搬送
装置を備えた走査電子顕微鏡。3. A scanning electron microscope equipped with a wafer transfer device, wherein the member having a magnetic material used in the wafer transfer device is installed at a position farthest from the wafer observation section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3057088A JPH0541193A (en) | 1991-03-20 | 1991-03-20 | Scanning electron microscope equipped with wafer carrier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3057088A JPH0541193A (en) | 1991-03-20 | 1991-03-20 | Scanning electron microscope equipped with wafer carrier |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0541193A true JPH0541193A (en) | 1993-02-19 |
Family
ID=13045745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3057088A Pending JPH0541193A (en) | 1991-03-20 | 1991-03-20 | Scanning electron microscope equipped with wafer carrier |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0541193A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8529068B2 (en) | 2009-04-14 | 2013-09-10 | Hitachi Consumer Electronics Co., Ltd. | Optical unit |
| WO2019188232A1 (en) * | 2018-03-30 | 2019-10-03 | 株式会社オートネットワーク技術研究所 | Connector, and device with connector |
-
1991
- 1991-03-20 JP JP3057088A patent/JPH0541193A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8529068B2 (en) | 2009-04-14 | 2013-09-10 | Hitachi Consumer Electronics Co., Ltd. | Optical unit |
| WO2019188232A1 (en) * | 2018-03-30 | 2019-10-03 | 株式会社オートネットワーク技術研究所 | Connector, and device with connector |
| JP2019179620A (en) * | 2018-03-30 | 2019-10-17 | 株式会社オートネットワーク技術研究所 | Connector and connector-equipped device |
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