JPH054171A - Resin-bond grinding wheel for precision working - Google Patents

Resin-bond grinding wheel for precision working

Info

Publication number
JPH054171A
JPH054171A JP18290391A JP18290391A JPH054171A JP H054171 A JPH054171 A JP H054171A JP 18290391 A JP18290391 A JP 18290391A JP 18290391 A JP18290391 A JP 18290391A JP H054171 A JPH054171 A JP H054171A
Authority
JP
Japan
Prior art keywords
resin
abrasive grains
inorganic salt
grindstone
grinding wheel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18290391A
Other languages
Japanese (ja)
Other versions
JP3048073B2 (en
Inventor
Mikio Fukuhara
幹夫 福原
Haruhiko Sei
晴彦 清
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tungaloy Corp
Original Assignee
Toshiba Tungaloy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Tungaloy Co Ltd filed Critical Toshiba Tungaloy Co Ltd
Priority to JP3182903A priority Critical patent/JP3048073B2/en
Publication of JPH054171A publication Critical patent/JPH054171A/en
Application granted granted Critical
Publication of JP3048073B2 publication Critical patent/JP3048073B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To provide a grinding wheel enabling hard material or soft material to have a mirror surface of excellent surface roughness, said hard material including various ceramics sintered materials, glass, single crystal, CBN sintered material, diamond sintered material, and diamond cladding material, said soft material including a magnetic tape. CONSTITUTION:A precision-working resin bond grinding wheel containing at least 30% by volume of inorganic salt abrasive grains. By this, the surface roughness of a worked material is improved approximately 5 to 242 times as greatly as that obtainable with a grinding wheel containing conventional abrasive grains. When comparison is made in terms of the surface roughness of the same worked material, improvement is made approximately 38 to 151 times.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体用ウェハーや基
板,磁気ヘッド基盤,レーザ用反射鏡,光学部品,精密
機械部品,精密計測器部品,電子部品等の各種産業に用
いられるセラミックス,ガラス,単結晶を代表とする硬
質材料又は軟質加工材料を鏡面加工するのに最適な精密
加工用レジンボンド砥石に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to semiconductor wafers and substrates, magnetic head substrates, laser reflecting mirrors, optical parts, precision machine parts, precision measuring instrument parts, electronic parts, and other ceramics and glass used in various industries. The present invention relates to a resin-bonded grindstone for precision machining which is most suitable for mirror-finishing a hard material or a soft-working material represented by a single crystal.

【0002】[0002]

【従来の技術】従来、研削加工又は研削加工の内、ラッ
ピングやポリシクングのように鏡面加工を目的とする仕
上加工には、被加工材料よりも硬い主としてダイヤモン
ドや立方晶窒化ホウ素のような超硬質砥粒もしくはそれ
を含む砥石が用いられている。
2. Description of the Related Art Conventionally, among grinding processes or grinding processes, for finishing processes such as lapping and polishing for the purpose of mirror finishing, it is mainly harder than the material to be processed and mainly hard such as diamond or cubic boron nitride. Abrasive grains or a whetstone containing them are used.

【0003】これに対し、被加工材料よりも軟質な砥粒
又はそれを含む砥石を用いて、被加工材料との機械的な
作用により誘起される化学反応、所謂メカノケミカルを
生じさせる仕上加工法が提案されている。
On the other hand, a finish processing method in which a so-called mechanochemical, which is a chemical reaction induced by a mechanical action with a material to be processed, is used by using abrasive grains softer than the material to be processed or a grindstone containing the same. Is proposed.

【0004】このメカノケミカルによる加工法の代表的
なものとしては、Voraらの「Mechanoche
mical Polishing of Silico
nNitride」[J.Am.Cer.Soc,65
(9)C−140(1982)]、唐木らの「Si単結
晶のメカノケミカルポリシングにおける加工速度促進機
構」[精密機械,46,3(1980)53−59]、
落合らの「フェライト材のメカノケミカルポリシング」
[精密工学会誌,54,3(1988)146−15
1]及び特開昭64−64766号公報がある。
A typical example of this mechanochemical processing method is "Mechanoche" by Vora et al.
medical Polishing of Silico
nNitride ”[J. Am. Cer. Soc, 65
(9) C-140 (1982)], Karaki et al., "Mechanism for promoting machining speed in mechanochemical polishing of Si single crystal" [Precision Machinery, 46, 3 (1980) 53-59],
Ochiai et al. "Mechanochemical polishing of ferrite materials"
[Journal of Precision Engineering, 54, 3 (1988) 146-15
1] and JP-A-64-64766.

【0005】[0005]

【発明が解決しようとする課題】Voraらの「Mec
hanochemical Polishing of
Silicon Nitride」には、窒化ケイ素と
セラミックスをCaCO3,MgO,SiO2,Fe
23,Fe34等の軟質な砥粒を用いて湿式でメカノケ
ミカルポリシングをしたことが記載されており、唐木ら
の「Si単結晶のメカノケミカルポリシングにおける加
工速度促進機構」には、Si単結晶をアルカリ性溶液
中、ZrO2砥粒によりメカノケミカルポリシングした
ことについて記載されている。落合らの「フェライト材
のメカノケミカルポリシング」には、Mn−Zn系単結
晶フェライトを蒸留水,水酸化ナトリウム,塩酸溶液
中、Al23砥粒によりメカノケミカルポリシングした
ことについて記載されている。
[Problems to be Solved by the Invention] Vora et al.
hananochemical Polishing of
Silicon Nitride ”includes silicon nitride and ceramics such as CaCO 3 , MgO, SiO 2 , and Fe.
It is described that wet mechanochemical polishing was carried out using soft abrasive grains such as 2 O 3 and Fe 3 O 4 , and Karaki et al., "Mechanochemical polishing mechanism for Si single crystal mechanochemical polishing" , Si single crystals were mechanochemically polished with ZrO 2 abrasive grains in an alkaline solution. The "mechanochemical polishing of the ferrite material" Ochiai et al., Distilling the Mn-Zn-based single crystal ferrite water, sodium hydroxide, hydrochloric acid solution, there is described that the mechanochemical polishing with Al 2 O 3 abrasive grains .

【0006】また、特開昭64−64766号公報に
は、被加工材料との反応性に優れた金属,酸化物,窒化
物,ケイ化物,ホウ化物,炭化物の砥粒と、ポリアセタ
ール,ポリエチレン,アクリロニトリル,ポリフェニル
サルファイド,フェノール,エポキシの樹脂とを被加工
材料より軟質に成形した砥石材が記載されている。
Further, in Japanese Patent Laid-Open No. 64-64766, abrasive grains of metals, oxides, nitrides, suicides, borides, and carbides, which have excellent reactivity with the material to be processed, polyacetal, polyethylene, A grindstone material is described in which acrylonitrile, polyphenyl sulfide, phenol, and epoxy resin are molded so as to be softer than the material to be processed.

【0007】以上の内、Vora,唐木,落合らの前者
は、酸化物砥粒を用いてメカノケミカルポリシングを行
ったものであり、後者の特開昭64−64766号公報
は、酸化物、特にCr23,Fe23,CeO2の酸化
物砥粒と樹脂とからなる砥石について記載されている。
これらに用いられている砥粒は、化学的に安定な金属酸
化物からなるために、ポリシング効果が弱く、溶媒を介
在させてポリシング効果を高めようとしていること、被
加工材料の表面を鏡面にする場合、長時間加工する必要
があること、又加工後の鏡面状態、すなわち面粗度が満
足できないという問題がある。
Of the above, the former of Vora, Karaki, Ochiai et al. Is the one in which mechanochemical polishing is performed using oxide abrasive grains, and the latter Japanese Patent Laid-Open No. 64-64766 discloses oxides, especially It describes a grindstone composed of oxide abrasive grains of Cr 2 O 3 , Fe 2 O 3 , and CeO 2 and a resin.
Since the abrasive grains used for these are composed of a chemically stable metal oxide, the polishing effect is weak, and it is attempting to enhance the polishing effect by interposing a solvent. In this case, there is a problem that it is necessary to process for a long time, and the mirror surface state after processing, that is, the surface roughness cannot be satisfied.

【0008】本発明は、上述ような問題点を解決したも
ので、具体的には、無機塩の砥粒を樹脂で固めて、ポリ
シング効果の高い、被加工材料の面粗度を高めることが
可能な精密加工用レジンボンド砥石の提供を目的とする
ものである。
The present invention has solved the above-mentioned problems. Specifically, the abrasive grains of an inorganic salt can be hardened with a resin to increase the surface roughness of a material to be processed which has a high polishing effect. The purpose is to provide a possible resin bond grindstone for precision processing.

【0009】[0009]

【課題を解決するための手段】本発明者らは、半導体用
Siウェハーやセラミックス焼結体でなる被加工材料の
表面を鏡面加工し、加工時間の短縮及び被加工材料の面
精度の向上について検討していた所、超硬質砥粒よりも
軟質な無機塩を樹脂で固めた砥石を用いて、メカノケミ
カルポリシングを行うと鏡面加工ができること、このと
き市販の金属酸化物を含む砥石が酸性溶液又はアルカリ
性溶液を媒介とする湿式によるメカノケミカルポリシン
グを行う必要があるのに対し、無機塩を含む砥石は、乾
式でもつてメカノケミカルポリシング効果が十分に生じ
ること、及びその効果として、被加工材料の表面への影
響、例えば、応力,酸素付着,酸化膜付着等が生じな
く、かつ面精度を顕著に向上させうるという知見を得
た。
Means for Solving the Problems The inventors of the present invention shorten the processing time and improve the surface accuracy of the material to be processed by mirror-finishing the surface of the material to be processed made of a Si wafer for semiconductors and a ceramics sintered body. When I was studying, using a grindstone in which an inorganic salt softer than ultra-hard abrasive was hardened with a resin, mechanochemical polishing could be used for mirror finishing, and at this time, a grindstone containing a commercially available metal oxide was an acidic solution. Or, while it is necessary to perform wet-type mechanochemical polishing mediated by an alkaline solution, a grindstone containing an inorganic salt has a sufficient mechanochemical polishing effect even in a dry type, and as an effect thereof, It was found that influences on the surface such as stress, adhesion of oxygen, adhesion of oxide film, etc. do not occur, and the surface accuracy can be significantly improved.

【0010】本発明は、上述の知見に基づいて完成した
ものである。
The present invention has been completed based on the above findings.

【0011】すなわち、本発明の精密加工用レジンボン
ド砥石は、無機塩の砥粒を少なくとも30体積%含有し
ていることを特徴とするものである。
That is, the resin bond grindstone for precision processing of the present invention is characterized by containing at least 30% by volume of abrasive grains of an inorganic salt.

【0012】本発明における無機塩の砥粒は、例えばフ
ッ酸塩,塩酸塩,臭素酸塩,ヨウ素酸塩,硝酸塩,硫酸
塩,炭酸塩,修酸塩,酢酸塩を挙げることができ、具体
的にはLiF,NaF,KF,KF・HF等のフッ酸
塩、LiCl,NaCl,KCl,NaClO3,KC
lO3,Ba(ClO32,KClO4,NaClO4
MgCl,BaCl,NiCl,CoCl,CaCl,
ZnCl,AlCl,CrCl,NH4Cl等の塩酸
塩、NaBr,KBr,KBrO3,NaBrO3等の臭
素酸塩、NaI,KI,KIO3,KH(IO3 2,C
dI2等のヨウ素酸塩、NaNO2,NaNO3,KN
2,KNO3,Ca(NO32,Zn(NO32,Al
(NO33,AgNO3,Co(NO32,ZrO(N
32,Sr(NO32,Fe(NO32,Cu(NO
32,Pb(NO32,Ni(NO32,Ba(N
32,Mg(NO32,LiNO3等の硝酸塩、Na2
SO4,Na2SO3,Na HSO3,NaHSO4,K2
4,K2SO3,KHSO3,ZnSO4,Al(SO4
3,CdSO4,CaSO4,CoSO4,FeSO4,F
2(SO43,CuSO4,NiSO4,BaSO4,M
gSO4,MnSO4,等の硫酸塩、Na2CO3,K2
3,CaCO3,Li2CO3,BaCO3,等の炭酸
塩、Na224,K224,KH3(C242等の修
酸塩、CH3COONa,CH3COOK,Zn(CH3
COO)2,Cd(CH3COO)2,Ca(CH3CO
O)2,Co(CH3COO)2,Cu(CH3CO
O)2,Pb(CH3COO)2,Ni(CH3CO
O)2,Ba(CH3COO)2,Mg(CH3CO
O)2,Mn(CH3COO)2,等の酢酸塩を挙げるこ
とが出来る。
The abrasive grains of the inorganic salt used in the present invention are, for example,
Oxalate, hydrochloride, bromate, iodate, nitrate, sulfuric acid
Salts, carbonates, oxalates, acetates can be mentioned.
Fluorine such as LiF, NaF, KF, KF ・ HF, etc.
Salt, LiCl, NaCl, KCl, NaClO3, KC
103, Ba (ClO3)2, KClOFour, NaClOFour
MgCl, BaCl, NiCl, CoCl, CaCl,
ZnCl, AlCl, CrCl, NHFourHydrochloric acid such as Cl
Salt, NaBr, KBr, KBrO3, NaBrO3Odor
Phosphate, NaI, KI, KIO3, KH (IO3)2, C
dI2Iodates such as NaNO2, NaNO3, KN
O2, KNO3, Ca (NO3)2, Zn (NO3)2, Al
(NO3)3, AgNO3, Co (NO3)2, ZrO (N
O3)2, Sr (NO3)2, Fe (NO3)2, Cu (NO
3)2, Pb (NO3)2, Ni (NO3)2, Ba (N
O3)2, Mg (NO3)2, LiNO3Nitrates such as Na2
SOFour, Na2SO3, Na HSO3, NaHSOFour, K2S
OFour, K2SO3, KHSO3, ZnSOFour, Al (SOFour)
3, CdSOFour, CaSOFour, CoSOFour, FeSOFour, F
e2(SOFour)3, CuSOFour, NiSOFour, BaSOFour, M
gSOFour, MnSOFour, Etc. sulfate, Na2CO3, K2C
O3, CaCO3, Li2CO3, BaCO3Carbonic acid such as
Salt, Na2C2OFour, K2C2OFour, KH3(C2OFour)2Etc.
Acid salt, CH3COONa, CH3COOK, Zn (CH3
COO)2, Cd (CH3COO)2, Ca (CH3CO
O)2, Co (CH3COO)2, Cu (CH3CO
O)2, Pb (CH3COO)2, Ni (CH3CO
O)2, Ba (CH3COO)2, Mg (CH3CO
O)2, Mn (CH3COO)2, Acetate etc.
You can

【0013】これらの無機塩の砥粒の内、アルカリ金
属,アルカリ土類金属のフッ酸塩,塩酸塩,臭素酸塩,
ヨウ素酸塩でなる場合には、立方晶窒化ホウ素焼結体や
ダイヤモンド焼結体等の超硬質物体を鏡面加工すること
もできることから好ましく、特にフッ素酸塩が好まし
い。
Among these inorganic salt abrasives, alkali metal and alkaline earth metal hydrofluorates, hydrochlorides, bromates,
When the iodate is used, it is preferable because a super-hard object such as a cubic boron nitride sintered body or a diamond sintered body can be mirror-finished, and a fluorate is particularly preferable.

【0014】無機塩の砥粒は、微細である程、活性化が
高く、被加工材料の面精度の向上が顕著になり、平均粒
径50μm以下、好ましくは5μm以下で粒度分布の標
準偏差がσ以内の均一な粒子からなる砥粒、特に好まし
くは平均粒径0.05μm以下の粒子である。この砥粒
が30体積%未満になると被加工材料の面精度の向上効
果が顕著に低下する。
The finer the particles of the inorganic salt, the higher the activation, and the remarkable the improvement of the surface accuracy of the material to be processed. The average particle size is 50 μm or less, preferably 5 μm or less, and the standard deviation of the particle size distribution is Abrasive particles composed of uniform particles within σ, particularly preferably particles having an average particle size of 0.05 μm or less. If the abrasive grains are less than 30% by volume, the effect of improving the surface accuracy of the material to be processed is significantly reduced.

【0015】本発明の精密加工用レジンボンド砥石は、
特に上述の無機塩の砥粒が30〜80体積と、樹脂が1
5〜49体積%と、残部が金属の化合物を主成分とする
他物質とからなる場合が砥石の強度上からも好ましいこ
とである。
The resin bond grindstone for precision machining of the present invention is
In particular, the above-mentioned inorganic salt abrasive grains are 30 to 80 volumes, and the resin is 1
From the standpoint of strength of the grindstone, it is preferable that the content of the balance is 5 to 49% by volume and the balance is another substance containing a metal compound as a main component.

【0016】本発明における樹脂は、特に制限を受ける
ものでないが、フェノール,エポキシ,ポリイミド,ポ
リスチレン又はポリエチレンでなる場合には、砥石の成
形性,強度及び砥石の成形時での砥粒及び他物質の分散
性にすぐれるので好ましいことである。
The resin in the present invention is not particularly limited, but when it is made of phenol, epoxy, polyimide, polystyrene or polyethylene, the formability and strength of the grindstone, the abrasive grains and other substances at the time of molding the grindstone. It is preferable because it has excellent dispersibility.

【0017】本発明における他物質とは、従来から砥石
に用いられている物質ならば特に制限を受けるものでな
く、具体的には、超硬質砥粒,セラミックス砥粒,ガラ
ス,ウィスカー,繊維,カーボンを挙げることができ、
さらに具体的には、例えばAl23,SiO2,Si
C,Fe23,Fe34,Cr23,ZrO2,Ce
2,CBN,WBN,(ウルツ鉱型BN),ダイヤモ
ンドを挙げることができる。また、本発明者の1人が発
明し、平成3年5月30日付で特許出願した砥石に含ま
れる砥粒も他物質として使用すると、効果が高いもので
ある。
The other substance in the present invention is not particularly limited as long as it is a substance that has been conventionally used for a grindstone, and specifically, it includes super-hard abrasive grains, ceramic abrasive grains, glass, whiskers, fibers, Carbon can be mentioned,
More specifically, for example, Al 2 O 3 , SiO 2 , Si
C, Fe 2 O 3 , Fe 3 O 4 , Cr 2 O 3 , ZrO 2 , Ce
O 2, CBN, WBN, mention may be made of (wurtzite BN), diamond. Further, when the abrasive grains contained in the grindstone, which was invented by one of the present inventors and applied for a patent on May 30, 1991, is used as another substance, the effect is high.

【0018】本発明の精密加工用レジンボンド砥石は、
従来から行われている砥石の成形法、具体的には、砥粒
と樹脂又は必要に応じて他物質の含有した出発原料を混
合,篩別後、金型でもってホットプレスして作製するこ
とができる。
The resin bond grindstone for precision machining of the present invention is
Conventional grinding wheel forming method, specifically, it is made by mixing abrasive grains and starting materials containing resin or other substances as necessary, sieving, and hot pressing with a mold. You can

【0019】[0019]

【作用】本発明の精密加工用レジンボンド砥石は、使用
時には、無機塩の砥粒に内在している活性力と被加工材
料の表面に生じる摩擦熱により、砥粒及び被加工材料の
表面を原始的溶解状態にさせ、一層活性化を高め、砥粒
と被加工材料との化学反応の促進作用、特に無機塩の分
解による被加工材料の表面エッチング作用、所謂メカノ
ケミカル作用を顕著に生じさせている。また、砥石に含
有する樹脂は、無機塩の砥粒及び他物質を保持し、砥石
の強度を高める作用及び、使用時には、無機塩の砥粒と
被加工材料の表面とを接触しやすくする作用をしている
ものである。
When the resin bond grindstone for precision machining of the present invention is used, the surface of the abrasive grains and the material to be machined are affected by the active force inherent in the abrasive grains of the inorganic salt and the frictional heat generated on the surface of the material to be machined. Primitively dissolved state to further enhance activation, to promote the chemical reaction between the abrasive grains and the material to be processed, in particular the surface etching effect of the material to be processed due to the decomposition of the inorganic salt, the so-called mechanochemical effect. ing. Further, the resin contained in the grindstone holds the abrasive grains of the inorganic salt and other substances, enhances the strength of the grindstone, and facilitates the contact between the abrasive grains of the inorganic salt and the surface of the work material during use. It is something that

【0020】[0020]

【実施例1】各種の無機塩の粉末と、各種の樹脂を用い
て、表1のように配合し、各試料を得た。
Example 1 Powders of various inorganic salts and various resins were used and blended as shown in Table 1 to obtain respective samples.

【0021】表1に示した配合組成の各試料を擂摺機に
て混合,篩別後、表2に示す焼結条件でもって砥石を作
製した。
Each sample having the composition shown in Table 1 was mixed and sieved with a sanding machine, and then a grindstone was produced under the sintering conditions shown in Table 2.

【0022】[0022]

【表1】 [Table 1]

【0023】[0023]

【表2】 表1及び表2により得られた本発明品1〜8と比較品1
〜3に市販のシリカゾルを比較品4として、下記の条件
でもって鏡面研摩仕上を試みた。 鏡面研摩仕上げ条件 被加工材料:表3に示すセラミックス,ガラス及びSi
ウェハーの表面を1μmダイヤモンド砥石で研摩した
面、 回転数 :200rpm 加工圧力 :150g/cm2 研摩方式 :乾式 評価 :所定の研摩時間における被加工材料の面粗
度、60分研摩後における被加工材料の面状態及び砥石
の損傷状態の観察。
[Table 2] Inventive products 1 to 8 obtained according to Table 1 and Table 2 and comparative product 1
3 to 3 are commercially available silica sols, and the following conditions are used.
So I tried mirror finishing. Mirror polishing finish condition Work Material: Ceramics, Glass and Si shown in Table 3
The surface of the wafer was polished with a 1 μm diamond wheel
surface, Rotation speed: 200 rpm Processing pressure: 150g / cm2 Polishing method: Dry method Evaluation: Surface roughness of the material to be processed at the specified polishing time
Surface state and grindstone of the work material after polishing for 60 minutes
Observation of the damage state.

【0024】上記鏡面研摩仕上試験の結果を表3に示し
た。
The results of the above-mentioned mirror-polishing finishing test are shown in Table 3.

【0025】[0025]

【表3】 [Table 3]

【0026】[0026]

【発明の効果】本発明の精密加工用レジンボンド砥石
は、砥石中に含有している無機塩の砥粒と、使用時に被
加工材料の表面に発生する摩擦熱でもって、被加工材料
の表面でサブナノメーターのオーダーでの溶解及び酸
化,酸化被膜形成及びその被膜除去が繰り返されるとい
う、酸化反応の促進効果の高い砥石であり、従来の砥粒
を含有した砥石に比べて、被加工材料の面粗度(Rma
x)において、約5〜242倍も向上させうるという顕
著な効果を有するものである。
The resin-bonded grindstone for precision processing of the present invention has the surface of the material to be processed by the abrasive grains of the inorganic salt contained in the grindstone and the friction heat generated on the surface of the material to be processed during use. It is a grindstone with a high effect of promoting the oxidation reaction, in which dissolution and oxidation on the order of sub-nanometers, oxide film formation and its film removal are repeated, compared to conventional grindstones containing abrasive grains Surface roughness (Rma
In x), it has a remarkable effect that it can be improved by about 5 to 242 times.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 無機塩の砥粒を少なくとも30体積%含
有させたことを特徴とする精密加工用レジンボンド砥
石。
1. A resin-bonded grindstone for precision processing, characterized by containing at least 30% by volume of abrasive grains of an inorganic salt.
【請求項2】 上記無機塩がアルカリ金属及びアルカリ
土類金属の中の少なくとも1種と、ハロゲン元素とでな
る化合物の少なくとも1種からなることを特徴とする請
求項1記載の精密加工用レジンボンド砥石。
2. The resin for precision processing according to claim 1, wherein the inorganic salt comprises at least one compound selected from the group consisting of an alkali metal and an alkaline earth metal and a halogen element. Bond whetstone.
【請求項3】 上記無機塩が平均粒径50μm以下の粒
子でなることを特徴とする請求項1又は2記載の精密加
工用レジンボンド砥石。
3. The resin-bonded grindstone for precision machining according to claim 1, wherein the inorganic salt is particles having an average particle size of 50 μm or less.
【請求項4】 無機塩が30〜80体積%と、樹脂が1
5〜49体積%と、残部が金属,金属の化合物及び/又
は超硬質砥粒でなる他物質とからなることを特徴とする
精密加工用レジンボンド砥石。
4. The inorganic salt is 30 to 80% by volume, and the resin is 1
A resin-bonded grindstone for precision machining, comprising 5 to 49% by volume, and the balance being a metal, a compound of a metal, and / or another substance composed of ultra-hard abrasive grains.
【請求項5】 上記無機塩がアルカリ金属の弗化物,ア
ルカリ土類金属の弗化物及び/又はこれらの相互固溶体
からなり、上記樹脂がフェノール,エポキシ,ポリイミ
ド,ポリスチレン又はポリエチレンからなることを特徴
とする請求項4記載の精密加工用レジンボンド砥石。
5. The inorganic salt comprises an alkali metal fluoride, an alkaline earth metal fluoride and / or a mutual solid solution thereof, and the resin comprises phenol, epoxy, polyimide, polystyrene or polyethylene. The resin bond grindstone for precision processing according to claim 4.
JP3182903A 1991-06-27 1991-06-27 Resin bond whetstone for precision machining Expired - Fee Related JP3048073B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3182903A JP3048073B2 (en) 1991-06-27 1991-06-27 Resin bond whetstone for precision machining

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3182903A JP3048073B2 (en) 1991-06-27 1991-06-27 Resin bond whetstone for precision machining

Publications (2)

Publication Number Publication Date
JPH054171A true JPH054171A (en) 1993-01-14
JP3048073B2 JP3048073B2 (en) 2000-06-05

Family

ID=16126395

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3048073B2 (en)

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Publication number Priority date Publication date Assignee Title
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WO1999055493A1 (en) * 1998-04-28 1999-11-04 Ebara Corporation Polishing grinding wheel and substrate polishing method with this grinding wheel
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JPWO2004041477A1 (en) * 2002-11-06 2006-03-02 株式会社野村鍍金 Surface treatment method for vacuum member
CN103492126A (en) * 2011-04-18 2014-01-01 3M创新有限公司 Resin bonded grinding wheel
CN103921219A (en) * 2014-03-13 2014-07-16 常熟鼎天赫机械有限公司 High-precision diamond grinding wheel
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CN104440610A (en) * 2014-11-14 2015-03-25 河南新源超硬材料有限公司 High-precision drum-type resin binder diamond grinding wheel and manufacturing method thereof
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