JPH0542509B2 - - Google Patents

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Publication number
JPH0542509B2
JPH0542509B2 JP59007043A JP704384A JPH0542509B2 JP H0542509 B2 JPH0542509 B2 JP H0542509B2 JP 59007043 A JP59007043 A JP 59007043A JP 704384 A JP704384 A JP 704384A JP H0542509 B2 JPH0542509 B2 JP H0542509B2
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JP
Japan
Prior art keywords
boron nitride
coated
cbn
present
hard substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59007043A
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Japanese (ja)
Other versions
JPS60152677A (en
Inventor
Katsuhiro Mitsusaka
Shuji Yatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP704384A priority Critical patent/JPS60152677A/en
Publication of JPS60152677A publication Critical patent/JPS60152677A/en
Publication of JPH0542509B2 publication Critical patent/JPH0542509B2/ja
Granted legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • C23C16/342Boron nitride
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23BTURNING; BORING
    • B23B27/00Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14Cutting tools of which the bits or tips or cutting inserts are of special material
    • B23B27/148Composition of the cutting inserts

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔本発明の技術分野〕 本発明は切削工具として使用するのに適する耐
摩耗性に優れた立方晶窒化硼素(Cubic Boron
Nitride以下CBNと略す。)の表面層で被覆され
た硬質体の製造方法に関するものである。 〔従来の切削工具〕 現在、主として結合金属と共に少なくとも1種
の炭化物を含有する焼結された硬質基体の表面
に、TiC、TiN又はAl2O3等を被覆した工具が使
用されている。この現状の被覆工具は、靭性の高
い基体にこれよりも高硬度で耐摩耗性に優れた前
記被覆層をつけることにより、靭性と耐摩耗性の
双方に優れたものである。 しかし、切削速度の高速化に伴い刃先温度が上
昇するが、前記被覆層では(1)化学的安定性による
被削材との反応を少なくする(2)高熱伝導率による
刃先温度を下げることができない。その結果、前
記被覆層からなる切削工具では、その寿命を伸ば
すことが不可能であつた。 本発明者らは前記の(1)、(2)について被覆層の種
類を検討することによつて、高速切削で優れた性
能を発揮する工具材質を開発すべく研究を重ねた
結果、本発明を完成したものである。 〔本発明の目的〕 すなわち、本発明の目的は、高速で切削した場
合であつても、刃先温度が大きく上昇せず、ま
た、被削材との反応による摩耗も少ない被覆硬質
体の製造方法を提供するにある。 〔本発明の構成〕 そして、本発明は上記目的を達成する手段とし
て、被覆層としてCBNを選定したものであり、
また、この被覆層を硬質基体表面、または、予め
中間被覆層を施こした硬質基体表面に形成させる
手段として、まず、アモルフアス状の窒化硼素を
被覆させ、次いで、これをCBNに変換させる点
にある。すなわち、本発明は、 結合剤金属と共に少なくとも1種の炭化物を含
有する焼結された硬質基体または予め周期律表の
第4a、5a族金属の炭化物、窒化物、酸化物及び
硼化物の1種又はそれ以上の被覆が施された上記
硬質基体表面に、厚さ0.5〜20μのアモルフアス状
の窒化硼素を気相法により被覆し、この被覆され
た硬質体をAlおよび/又はAl化合物と接した状
態で立方晶窒化硼素の熱力学的安定領域に保持す
ることによつて、アモルフアス状の窒化硼素の全
てを立方晶窒化硼素に変換することを特徴とする
立方晶窒化硼素被覆硬質体の製造方法 である。 以下、本発明を詳細に説明すると、本発明者ら
は、CBNが、ダイヤモンドに次ぐ高硬度の物質
であり、また、熱伝導性に優れ、高温における鉄
族金属との反応性が少ない物質であることを知
り、そして、CBNが、結合金属と共に少なくと
も1種の炭化物を含有する焼結された硬質基体に
直接に又は周期律表の第4a、5a族金属の炭化物、
窒化物、酸化物、硼化物の1種又はそれ以上の被
覆の1層又はそれ以上の中間層を介して厚さ0.5
〜20μに被覆された硬質体が従来にない性能を有
していることを見い出した。 ところで、CBNを気相合成する研究は広く行
われているが、未だ確実な方法が見い出されてい
ない。ただ、アモルフアス状の窒化硼素は、プラ
ズマCVD、イオンプレーテイング、イオンビー
ム蒸着などの手段により均一な膜を作ることは比
較的容易である。本発明者らはこの点に着目した
ものであつて、一旦アモルフアス状の窒化硼素薄
膜(勿論部分的にCBNを含んだものであつても
良いが)を被覆し、これをAl及び/またはAl化
合物と接触した状態で、CBNの安定領域である
高圧、高温にさらすことにより、CBNの膜に転
換せしめるものである。この手段によれば、容易
にCBNのみからなる強固な被覆層が得られ、か
つ、硬質基体との密着強度も高いものである。 前述した如くCBNは、硬度、熱伝導性及び高
温における化学的安定性の各性質が非常に優れて
いるため、CBNを表面に被覆した硬質体は高速
で切削した場合においても、刃先温度が大きく上
昇せず又被削材との反応による摩耗も少ないもの
である。 本発明において、基体としては、結合剤金属と
共に少なくとも1種の炭化物を含有する焼結され
た硬質基体を用いるものであり、例えば、WC基
とか(Mo、W)C基超硬合金、TiCを主体とす
るサーメツト等公知のものから任意に選ぶことが
できる。 本発明において、表面のCBN被覆層の厚みは
0.5〜20μの範囲とするが、その理由は0.5μ未満で
は、硬度、熱伝導性、被削材に対する化学的安定
性等の特性が充分でなく製品間のバラツキも大き
くなるからであり、また20μを超えると、被覆層
内での歪が発生し易く層自体の強度が低くなり、
切削時に被覆層に微小欠損が生じ工具性能が低下
してしまうからである。 また、本発明において、CBN層をWC基超硬合
金に被覆する場合、アモルフアス状窒化硼素を直
接に被覆すると密着度の弱いものしか得られず、
下地として予め周期律表の第4a、5a族金属の炭
化物、窒化物、酸化物、硼化物の1種又はそれ以
上の被覆の1層又はそれ以上の中間層の被覆を行
い、その上にアモルフアス状窒化硼素の被覆を行
えばよい。しかし例えば硬質基体がTiC、TiNを
含有する場合には、直接にアモルフアス状窒化硼
素を密着度よく被覆することが可能である。 この中間層の厚みは、その有利な性質を保持す
る一定限界内で変えることができる。本発明によ
り好適な中間層を得るためには、厚みは少なくと
も0.5μである。最良の結果は1〜10μで見出され
た。この中間層は、良く知られているPVD、
CVD等の方法で被覆を行う。 CBN層の被覆においては、本発明によれば例
えば硬質基体をBCl4およびNH3含有ガス流れ内
に置いて温度600〜1000℃、圧力0.1〜10mmHg条
件下のプラズマCVD法でアモルフアス状の窒化
硼素を被覆し、この被覆された硬質基体とAlお
よび/又はAl化合物とをが接するようにして金
属容器、例えばMo、W等の中に充填し、その容
器を高温高圧発生室内に配し、第1図に示した
CBNの熱力学的安定な領域すなわちA域で数分
間以上曝す。(なお、第1図において、1は立方
晶−立方晶型窒化硼素平衡線であり、Aは高圧相
型窒化硼素安定域であり、Bは六方晶型窒化硼素
安定域である。)この間にアモルフアス状窒化硼
素は、Alおよび/又はAl化合物の触媒作用によ
りCBNに変換し、硬質基体の表面にCBN層が形
成される。保持終了後圧力を保持した状態で加熱
のみを停止し、高温高圧発生室内が室温付近まで
冷却された後に、保持圧力を除々に解除して常圧
に戻す。回収された試料は金属反応容器を酸処理
することによりCBN被覆硬質体が得られる。 アモルフアス状窒化硼素の硬質基体への被覆
は、上記したプラズマCVD法以外に、イオンビ
ーム蒸着、またはイオンプレーテイングなどの方
法も本発明で適用できるものである。 以下本発明の実施例をあげて、本発明をより詳
細に説明する。 実施例 1 WC基超硬合金(重量基準で9.5%Co、12%
TiC、6%TaCおよび残余WC)の基体を用いて
SNG432の切削チツプを作成した。これに予め
CVD法でTiCを1μ被覆したものと無被覆のもの
とをBCl4、NH3、H2を各々重量で15%、40%、
45%含有する混合ガス流れ内に置いて温度800℃、
圧力0.5mmHgの条件下で13.56MHz200Wの高周波
を用いたプラズマCVD法よりアモルフアス状窒
化硼素の被覆処理を行つた。処理時間は2時間で
あつた。この処理の結果、厚さ約4μのアモルフ
アス状窒化硼素を得た。これらを被覆層とAl粉
が接するようにしてMo容器に充填し、容器を温
度1200℃、圧力40kbに10分間保持した。その結
果アモルフアス状窒化硼素は全てCBNに変換し
ていた。これらのチツプを表1に示す条件で切削
テストを行つた。尚、比較として前記基体に
CVD法で直接Al2O3を被覆したチツプを用いた。
結果を表2に示す。
[Technical field of the present invention] The present invention relates to cubic boron nitride, which has excellent wear resistance and is suitable for use as a cutting tool.
Nitride is abbreviated as CBN. ) The present invention relates to a method for manufacturing a hard body coated with a surface layer. [Conventional Cutting Tools] Currently, tools are used in which the surface of a sintered hard substrate containing at least one type of carbide along with a bonding metal is coated with TiC, TiN, Al 2 O 3 or the like. This current coated tool has excellent both toughness and wear resistance by attaching the coating layer, which has higher hardness and excellent wear resistance, to a base having high toughness. However, as the cutting speed increases, the temperature of the cutting edge increases, but the coating layer can (1) reduce the reaction with the work material due to its chemical stability, and (2) lower the temperature of the cutting edge due to its high thermal conductivity. Can not. As a result, it has been impossible to extend the life of the cutting tool made of the coating layer. The present inventors have conducted repeated research to develop a tool material that exhibits excellent performance in high-speed cutting by considering the types of coating layers for (1) and (2) above, and have developed the present invention. This is the completed version. [Object of the present invention] That is, the object of the present invention is to provide a method for manufacturing a coated hard body in which the temperature of the cutting edge does not increase significantly even when cutting at high speed, and there is less wear due to reaction with the work material. is to provide. [Structure of the present invention] And, as a means to achieve the above object, the present invention selects CBN as the coating layer,
In addition, as a means of forming this coating layer on the surface of a hard substrate or on the surface of a hard substrate on which an intermediate coating layer has been previously applied, it is possible to first coat amorphous boron nitride and then convert it into CBN. be. That is, the present invention provides a sintered hard substrate containing at least one carbide together with a binder metal or one of the carbides, nitrides, oxides and borides of metals from groups 4a and 5a of the periodic table. The surface of the above-mentioned hard substrate coated with a coating of 0.5 to 20 μm in thickness is coated with amorphous boron nitride by a vapor phase method, and this coated hard body is brought into contact with Al and/or an Al compound. A method for manufacturing a cubic boron nitride-coated hard body, characterized in that all amorphous boron nitride is converted to cubic boron nitride by maintaining the cubic boron nitride in a thermodynamically stable region. It is. Describing the present invention in detail below, the present inventors discovered that CBN is a material with the second highest hardness next to diamond, has excellent thermal conductivity, and has low reactivity with iron group metals at high temperatures. Knowing that CBN is directly applied to a sintered hard substrate containing at least one carbide along with a bonding metal or a carbide of a group 4a or 5a metal of the periodic table,
0.5 through one or more intermediate layers of one or more coatings of nitrides, oxides, borides.
It has been found that a hard body coated with a thickness of ~20μ has unprecedented performance. Incidentally, although research into vapor phase synthesis of CBN has been widely conducted, a reliable method has not yet been found. However, it is relatively easy to form a uniform film of amorphous boron nitride using methods such as plasma CVD, ion plating, and ion beam evaporation. The present inventors focused on this point, and first coated with an amorphous boron nitride thin film (of course, it may also partially contain CBN), and then covered it with Al and/or Al. By exposing it to high pressure and high temperature, which is the stable region of CBN, while in contact with a compound, it is converted into a CBN film. According to this method, a strong coating layer made only of CBN can be easily obtained, and the adhesion strength to the hard substrate is also high. As mentioned above, CBN has excellent properties such as hardness, thermal conductivity, and chemical stability at high temperatures, so a hard object coated with CBN will have a high cutting edge temperature even when cutting at high speed. It does not rise and there is little wear due to reaction with the work material. In the present invention, a sintered hard substrate containing at least one type of carbide along with a binder metal is used as the substrate, for example, WC-based, (Mo, W)C-based cemented carbide, TiC. The material can be arbitrarily selected from known materials such as cermet, which is the main material. In the present invention, the thickness of the CBN coating layer on the surface is
The range is 0.5 to 20μ, because if it is less than 0.5μ, properties such as hardness, thermal conductivity, and chemical stability for the work material will not be sufficient, and there will be large variations between products. If it exceeds 20μ, strain will easily occur within the coating layer and the strength of the layer itself will decrease.
This is because micro-defects occur in the coating layer during cutting, resulting in a decrease in tool performance. Furthermore, in the present invention, when coating a WC-based cemented carbide with a CBN layer, if amorphous boron nitride is directly coated, only weak adhesion will be obtained;
As a base, one or more intermediate layers of one or more of carbides, nitrides, oxides, and borides of metals from groups 4a and 5a of the periodic table are coated in advance, and amorphous amorphous A coating of boron nitride may be applied. However, if the hard substrate contains TiC or TiN, for example, it is possible to directly coat it with amorphous boron nitride with good adhesion. The thickness of this intermediate layer can be varied within certain limits while retaining its advantageous properties. In order to obtain an intermediate layer suitable according to the invention, the thickness is at least 0.5μ. Best results were found between 1 and 10μ. This middle layer is the well-known PVD,
Coating is performed using methods such as CVD. In coating the CBN layer, according to the present invention, for example, a hard substrate is placed in a gas flow containing BCl 4 and NH 3 and amorphous boron nitride is deposited by plasma CVD at a temperature of 600 to 1000°C and a pressure of 0.1 to 10 mmHg. The coated hard substrate and Al and/or Al compound are filled in a metal container, such as Mo or W, so that they are in contact with each other, and the container is placed in a high temperature and high pressure generating chamber. Shown in Figure 1
Exposure for several minutes or more in the thermodynamically stable region of CBN, that is, region A. (In Fig. 1, 1 is the cubic-cubic boron nitride equilibrium line, A is the high-pressure phase boron nitride stability region, and B is the hexagonal boron nitride stability region.) During this time, Amorphous boron nitride is converted into CBN by the catalytic action of Al and/or Al compounds, and a CBN layer is formed on the surface of the hard substrate. After the holding is completed, only heating is stopped while the pressure is held, and after the high temperature and high pressure generation chamber is cooled to around room temperature, the holding pressure is gradually released and the pressure is returned to normal pressure. A CBN-coated hard body is obtained from the recovered sample by treating the metal reaction vessel with acid. For coating a hard substrate with amorphous boron nitride, in addition to the plasma CVD method described above, methods such as ion beam evaporation or ion plating can also be applied in the present invention. EXAMPLES The present invention will be described in more detail below with reference to Examples. Example 1 WC-based cemented carbide (9.5% Co, 12% by weight)
Using a substrate of TiC, 6% TaC and residual WC)
A cutting chip of SNG432 was created. This in advance
The one coated with 1μ of TiC by CVD method and the one without coating were treated with 15% and 40% by weight of BCl 4 , NH 3 , and H 2 respectively.
Temperature 800℃, placed in a mixed gas stream containing 45%
Amorphous boron nitride coating was performed by plasma CVD using a high frequency of 13.56 MHz and 200 W under a pressure of 0.5 mmHg. The treatment time was 2 hours. As a result of this treatment, amorphous boron nitride with a thickness of approximately 4 μm was obtained. These were filled into a Mo container so that the coating layer and the Al powder were in contact with each other, and the container was held at a temperature of 1200°C and a pressure of 40 kb for 10 minutes. As a result, all amorphous boron nitride was converted to CBN. A cutting test was conducted on these chips under the conditions shown in Table 1. For comparison, the above substrate
Chips directly coated with Al 2 O 3 using the CVD method were used.
The results are shown in Table 2.

【表】【table】

【表】 実施例 2 硬質基体として表3に示す3種を用いた。【table】 Example 2 Three types shown in Table 3 were used as hard substrates.

【表】 表3の硬質基体を用いて、SNG432のチツプを
作成し実施例1と同条件のプラズマCVD法にて
被覆処理を行つた。処理時間は3時間であつた。
この処理の結果、厚さ5.4μのアモルフアス状窒化
硼素を得た。これらを被覆層とAlN粉が接する
ようにしてMo容器に充填し、容器を温度1250℃
45kbに10分間保持した。その結果アモルフアス
状窒化硼素は全てCBNに変換していたこれらの
チツプを実施例1の条件1と同条件で切削テスト
を行つた。比較として表3に示すNo.K、Gの基体
にCVD法にて直接Al2O3を被覆したチツプを用い
た。 (各々比較材−1、−2とする)結果を表4に示
す。
[Table] Using the hard substrates shown in Table 3, SNG432 chips were prepared and coated using the plasma CVD method under the same conditions as in Example 1. The treatment time was 3 hours.
As a result of this treatment, amorphous boron nitride with a thickness of 5.4 μm was obtained. These were filled into a Mo container so that the coating layer and AlN powder were in contact with each other, and the container was heated to a temperature of 125°C.
It was held at 45kb for 10 minutes. As a result, all of the amorphous boron nitride had been converted to CBN.A cutting test was conducted on these chips under the same conditions as Condition 1 of Example 1. For comparison, chips No. K and G shown in Table 3 were used which were directly coated with Al 2 O 3 by the CVD method. (Comparative materials -1 and -2, respectively) The results are shown in Table 4.

【表】 実施例 3 実施例2の硬質基体No.Aを用いて実施例1と同
様にしてCBN被覆されたチツプ(SNG 432)を
作成した。これらのCBN層の厚みと処理時間を
表5に示す。これらを実施例1の条件2、3によ
つて切削テストを行つた結果を表5に示す。尚比
較材として基体AにAl2O3を5μ被覆したチツプを
用いた。
[Table] Example 3 Using the hard substrate No. A of Example 2, a CBN-coated chip (SNG 432) was produced in the same manner as in Example 1. Table 5 shows the thickness and processing time of these CBN layers. Table 5 shows the results of a cutting test conducted on these under conditions 2 and 3 of Example 1. As a comparative material, a chip in which substrate A was coated with 5μ of Al 2 O 3 was used.

〔本発明の効果〕[Effects of the present invention]

本発明は、以上詳記したように、切削工具とし
て使用するのに優れた性能、すなわち、高速切削
時においても、刃先温度が大きく上昇せず、ま
た、被削材との反応による摩耗も少ないものが得
られる効果が生ずるものである。
As detailed above, the present invention has excellent performance when used as a cutting tool, that is, the temperature of the cutting edge does not increase significantly even during high-speed cutting, and there is little wear due to reaction with the work material. It is something that produces the effect that something is obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は高圧相型窒化硼素の圧力−温度相図上
における熱力学的な安定領域を示したものであ
る。 1:立方晶−六方晶型窒化硼素平衡線、A:高
圧相型窒化硼素安定域、B:六方晶型窒化硼素安
定域。
FIG. 1 shows the thermodynamically stable region on the pressure-temperature phase diagram of high-pressure phase type boron nitride. 1: cubic-hexagonal boron nitride equilibrium line, A: high-pressure phase boron nitride stability region, B: hexagonal boron nitride stability region.

Claims (1)

【特許請求の範囲】[Claims] 1 結合剤金属と共に少なくとも1種の炭化物を
含有する焼結された硬質基体または予め周期律表
の第4a、5a族金属の炭化物、窒化物、酸化物及
び硼化物の1種又はそれ以上の被覆が施された上
記硬質基体表面に、厚さ0.5〜20μのアモルフアス
状の窒化硼素を気相法により被覆し、この被覆さ
れた硬質体をAlおよび/又はAl化合物と接した
状態で立方晶窒化硼素の熱力学的安定領域に保持
することによつて、アモルフアス状の窒化硼素の
全てを立方晶窒化硼素に変換することを特徴とす
る立方晶窒化硼素被覆硬質体の製造方法。
1. A sintered hard substrate containing at least one carbide together with the binder metal or a pre-coated with one or more carbides, nitrides, oxides and borides of metals from groups 4a and 5a of the periodic table. The surface of the above-mentioned hard substrate is coated with amorphous boron nitride with a thickness of 0.5 to 20μ by a vapor phase method, and the coated hard body is subjected to cubic nitriding in contact with Al and/or Al compounds. A method for producing a cubic boron nitride-coated hard body, which comprises converting all amorphous boron nitride into cubic boron nitride by maintaining the boron in a thermodynamically stable region.
JP704384A 1984-01-20 1984-01-20 Method for manufacturing cubic boron nitride coated hard body Granted JPS60152677A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP704384A JPS60152677A (en) 1984-01-20 1984-01-20 Method for manufacturing cubic boron nitride coated hard body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP704384A JPS60152677A (en) 1984-01-20 1984-01-20 Method for manufacturing cubic boron nitride coated hard body

Publications (2)

Publication Number Publication Date
JPS60152677A JPS60152677A (en) 1985-08-10
JPH0542509B2 true JPH0542509B2 (en) 1993-06-28

Family

ID=11655019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP704384A Granted JPS60152677A (en) 1984-01-20 1984-01-20 Method for manufacturing cubic boron nitride coated hard body

Country Status (1)

Country Link
JP (1) JPS60152677A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4971851A (en) * 1984-02-13 1990-11-20 Hewlett-Packard Company Silicon carbide film for X-ray masks and vacuum windows
JPS63239103A (en) * 1987-03-27 1988-10-05 Ulvac Corp Cubic boron nitride coated body and production thereof
US5135801A (en) * 1988-06-13 1992-08-04 Sandvik Ab Diffusion barrier coating material

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5775744A (en) * 1980-10-31 1982-05-12 Toshiba Tungaloy Co Ltd Tool containing and coated with dispersed material
JPS6063372A (en) * 1983-09-19 1985-04-11 Agency Of Ind Science & Technol Manufacture of thin boron nitride film of high hardness

Also Published As

Publication number Publication date
JPS60152677A (en) 1985-08-10

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