JPH0542806B2 - - Google Patents

Info

Publication number
JPH0542806B2
JPH0542806B2 JP59010544A JP1054484A JPH0542806B2 JP H0542806 B2 JPH0542806 B2 JP H0542806B2 JP 59010544 A JP59010544 A JP 59010544A JP 1054484 A JP1054484 A JP 1054484A JP H0542806 B2 JPH0542806 B2 JP H0542806B2
Authority
JP
Japan
Prior art keywords
exposure
light source
exposure light
stages
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59010544A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60154527A (ja
Inventor
Makoto Torigoe
Michio Kono
Akyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59010544A priority Critical patent/JPS60154527A/ja
Priority to US06/690,940 priority patent/US4653903A/en
Priority to GB08501765A priority patent/GB2155648B/en
Priority to DE19853502339 priority patent/DE3502339A1/de
Publication of JPS60154527A publication Critical patent/JPS60154527A/ja
Priority to GB08723949A priority patent/GB2195031A/en
Publication of JPH0542806B2 publication Critical patent/JPH0542806B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59010544A 1984-01-24 1984-01-24 露光装置 Granted JPS60154527A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59010544A JPS60154527A (ja) 1984-01-24 1984-01-24 露光装置
US06/690,940 US4653903A (en) 1984-01-24 1985-01-14 Exposure apparatus
GB08501765A GB2155648B (en) 1984-01-24 1985-01-24 An exposure apparatus
DE19853502339 DE3502339A1 (de) 1984-01-24 1985-01-24 Belichtungsvorrichtung
GB08723949A GB2195031A (en) 1984-01-24 1987-10-12 Exposing wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59010544A JPS60154527A (ja) 1984-01-24 1984-01-24 露光装置

Publications (2)

Publication Number Publication Date
JPS60154527A JPS60154527A (ja) 1985-08-14
JPH0542806B2 true JPH0542806B2 (fr) 1993-06-29

Family

ID=11753198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59010544A Granted JPS60154527A (ja) 1984-01-24 1984-01-24 露光装置

Country Status (2)

Country Link
JP (1) JPS60154527A (fr)
DE (1) DE3502339A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2611682B2 (ja) * 1995-02-10 1997-05-21 株式会社ニコン 半導体製造装置
KR100238377B1 (ko) * 1997-05-03 2000-01-15 김영환 광학배향장치 및 방법
JP2000260684A (ja) 1999-03-08 2000-09-22 Nikon Corp 露光装置、及び照明装置
JP2002299221A (ja) 2001-04-02 2002-10-11 Canon Inc Ｘ線露光装置
DE102004013886A1 (de) * 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
DE102015212878A1 (de) * 2015-07-09 2017-01-12 Carl Zeiss Smt Gmbh Strahlführungsvorrichtung
CN105467779A (zh) * 2016-01-04 2016-04-06 京东方科技集团股份有限公司 一种曝光机及曝光方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2134144A1 (de) * 1970-07-09 1972-01-20 Thomson Csf Opto-elektrisches Schreibsystem zur Herstellung von Mikroschaltungen
JPS5583232A (en) * 1978-12-20 1980-06-23 Chiyou Lsi Gijutsu Kenkyu Kumiai Method and apparatus for x ray exposure
JPS57169242A (en) * 1981-04-13 1982-10-18 Hitachi Ltd X-ray transferring device
JPS607723A (ja) * 1983-06-28 1985-01-16 Nippon Telegr & Teleph Corp <Ntt> プラズマｘ線露光装置
DE3330806A1 (de) * 1983-08-26 1985-03-14 Feinfocus Röntgensysteme GmbH, 3050 Wunstorf Roentgenlithographiegeraet

Also Published As

Publication number Publication date
DE3502339A1 (de) 1985-08-14
JPS60154527A (ja) 1985-08-14

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