JPH0543096Y2 - - Google Patents
Info
- Publication number
- JPH0543096Y2 JPH0543096Y2 JP1987186370U JP18637087U JPH0543096Y2 JP H0543096 Y2 JPH0543096 Y2 JP H0543096Y2 JP 1987186370 U JP1987186370 U JP 1987186370U JP 18637087 U JP18637087 U JP 18637087U JP H0543096 Y2 JPH0543096 Y2 JP H0543096Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- plate
- shower electrode
- distribution chamber
- rectifier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987186370U JPH0543096Y2 (pt) | 1987-12-09 | 1987-12-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987186370U JPH0543096Y2 (pt) | 1987-12-09 | 1987-12-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0189957U JPH0189957U (pt) | 1989-06-13 |
| JPH0543096Y2 true JPH0543096Y2 (pt) | 1993-10-29 |
Family
ID=31477600
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987186370U Expired - Lifetime JPH0543096Y2 (pt) | 1987-12-09 | 1987-12-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0543096Y2 (pt) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6060242B2 (ja) * | 2010-11-30 | 2017-01-11 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法及びバッフル構造 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6137969A (ja) * | 1984-07-31 | 1986-02-22 | Canon Inc | プラズマcvd薄膜製造装置 |
| JPS6187319A (ja) * | 1984-10-05 | 1986-05-02 | Hitachi Ltd | プラズマを用いた化学気相成膜装置 |
| JPS6187872A (ja) * | 1984-10-05 | 1986-05-06 | Hitachi Ltd | 平行平板型プラズマcvd装置のアノ−ド電極 |
-
1987
- 1987-12-09 JP JP1987186370U patent/JPH0543096Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0189957U (pt) | 1989-06-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8845806B2 (en) | Shower plate having different aperture dimensions and/or distributions | |
| KR100243446B1 (ko) | 플라즈마 발생부를 가지는 샤워헤드장치 | |
| US4612077A (en) | Electrode for plasma etching system | |
| KR20260041748A (ko) | 샤워헤드 어셈블리 | |
| US6089472A (en) | Shower head | |
| US4422407A (en) | Apparatus for chemically activated deposition in a plasma | |
| US5439524A (en) | Plasma processing apparatus | |
| US5985115A (en) | Internally cooled target assembly for magnetron sputtering | |
| US20060096540A1 (en) | Apparatus to manufacture semiconductor | |
| JPH0594950A (ja) | 反応室の設計及び化学蒸着反応器における粒子発生を最小限にする方法 | |
| JPH11158633A (ja) | Cvd反応及びpecvd反応で反応物ガスの早期混合を防止するための装置並びに方法 | |
| TW201630072A (zh) | 半導體晶圓處理用的設備、系統及方法 | |
| JPH07316824A (ja) | 気相反応装置 | |
| CN101315880B (zh) | 一种气体分配装置及采用该气体分配装置的等离子体处理设备 | |
| JPH08239775A (ja) | プロセスガス流入及び散布の通路 | |
| KR20190139321A (ko) | 다수의 가스 주입 구역을 갖는 플라즈마 스트립 도구 | |
| US7480974B2 (en) | Methods of making gas distribution members for plasma processing apparatuses | |
| JP2021523556A (ja) | 中心からエッジへの圧力の変化を制御するための圧力スキューシステム | |
| JPH0338345B2 (pt) | ||
| US5134963A (en) | LPCVD reactor for high efficiency, high uniformity deposition | |
| US11049699B2 (en) | Gas box for CVD chamber | |
| JPH076961A (ja) | プラズマ気相成長装置 | |
| CN221227817U (zh) | 一种保持多区板式pecvd电极平行装置 | |
| CN224192116U (zh) | 气体输送组件及等离子体产生装置 | |
| JPH01168021A (ja) | アウターワークホルダー |