JPH0554375A - Lubricating film forming method and lubricating film forming apparatus for magnetic disk - Google Patents
Lubricating film forming method and lubricating film forming apparatus for magnetic diskInfo
- Publication number
- JPH0554375A JPH0554375A JP21195591A JP21195591A JPH0554375A JP H0554375 A JPH0554375 A JP H0554375A JP 21195591 A JP21195591 A JP 21195591A JP 21195591 A JP21195591 A JP 21195591A JP H0554375 A JPH0554375 A JP H0554375A
- Authority
- JP
- Japan
- Prior art keywords
- lubricant
- magnetic disk
- lubricating film
- organic solvent
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
(57)【要約】
【目的】本発明は磁気ディスクの表層として設けられる
潤滑膜の形成方法及び形成装置に関し、信頼性の高い安
定した磁気記憶を可能にする潤滑膜を形成することを目
的とする。
【構成】潤滑剤50を塗布した磁気ディスク基体10を
有機溶剤蒸気61の雰囲気中に配置し、有機溶剤蒸気6
1の結露及び滴下によって余剰の潤滑剤50を溶解除去
し、均一で且つ極めて薄い潤滑膜を形成するように構成
される。
(57) [Summary] [Object] The present invention relates to a method and an apparatus for forming a lubricating film provided as a surface layer of a magnetic disk, and an object thereof is to form a lubricating film that enables reliable and stable magnetic storage. To do. A magnetic disk substrate 10 coated with a lubricant 50 is placed in an atmosphere of an organic solvent vapor 61, and an organic solvent vapor 6
The excessive lubricant 50 is dissolved and removed by dew condensation and dropping of No. 1 to form a uniform and extremely thin lubricating film.
Description
【0001】[0001]
【産業上の利用分野】本発明は、磁気ディスクの表層と
して設けられる潤滑膜の形成方法及び形成装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for forming a lubricating film provided as a surface layer of a magnetic disk.
【0002】磁気ディスク装置においては、記録密度を
高めるために磁気ディスクと磁気ヘッドスライダとの間
隙(スペーシング)の微小化が進められている。これに
ともなって、磁気ディスクの最上層として設けられる潤
滑膜に起因したヘッド吸着やヘッドクラッシュの防止が
望まれている。In a magnetic disk device, the gap (spacing) between the magnetic disk and the magnetic head slider is being miniaturized in order to increase the recording density. Along with this, it is desired to prevent head adsorption and head crash due to the lubricating film provided as the uppermost layer of the magnetic disk.
【0003】[0003]
【従来の技術】従来において、潤滑膜の形成方法として
は、浸漬法やスピンコート法、又は潤滑剤蒸気を結露さ
せる蒸気付着法などの手法を用いて潤滑剤を塗布する方
法、及び、塗布の後に紙や布で余剰の潤滑剤を拭き取る
処理を行って膜厚を薄くする方法が用いられていた。2. Description of the Related Art Conventionally, as a method of forming a lubricating film, a method of applying a lubricant by using a method such as a dipping method, a spin coating method, or a vapor deposition method for dew condensation of a lubricant vapor, and After that, a method of wiping off excess lubricant with paper or cloth to reduce the film thickness has been used.
【0004】[0004]
【発明が解決しようとする課題】従来においては、磁気
ディスク装置の機械的動作の安定化及び信頼性の確保の
上で適当な潤滑膜を形成することが困難であるという問
題があった。Conventionally, there has been a problem that it is difficult to form an appropriate lubricating film in order to stabilize the mechanical operation of the magnetic disk device and ensure the reliability.
【0005】すなわち、従来の特にCSS(コンタクト
・スタート・ストップ)方式の磁気ディスク装置では、
磁気ヘッドスライダ(以下「スライダ」という)が潤滑
膜を介して磁気ディスクに密着するいわゆるヘッド吸着
が起こり、磁気ディスクの回転に支障が生じることがあ
った。また、スライダとの接触又は空気流により飛散し
た潤滑剤がスライダに堆積し、その後に磁気ディスク上
に脱落した潤滑剤の塊にスライダが衝突して浮上姿勢が
乱れ、そのために磁性層が損傷を受けて記憶情報が破壊
されるといったいわゆるヘッドクラッシュが発生するこ
ともあった。That is, in the conventional CSS (contact start stop) type magnetic disk drive,
The magnetic head slider (hereinafter referred to as “slider”) may adhere to the magnetic disk via the lubricating film, so-called head attraction occurs, which may hinder the rotation of the magnetic disk. Also, the lubricant scattered by the contact with the slider or the air flow is accumulated on the slider, and the slider collides with the lubricant mass that has fallen off on the magnetic disk and disturbs the flying posture, which damages the magnetic layer. There was a case where a so-called head crash occurred, in which the stored information was destroyed.
【0006】なお、ヘッド吸着を抑えるために、磁気デ
ィスクの基体となる基板(非磁性基板)又はその上面を
覆う保護膜の表面を粗面化する手法が知られているが、
この手法を用いると、実効スペーシングが増大すること
から高密度記録の点で不利となる。本発明は、上述の問
題に鑑み、信頼性の高い安定した磁気記憶を可能にする
潤滑膜の形成方法及び形成装置を提供することを目的と
している。There is known a method of roughening the surface of a substrate (non-magnetic substrate) serving as a base body of a magnetic disk or a protective film covering the upper surface thereof in order to suppress head adsorption.
When this method is used, the effective spacing increases, which is disadvantageous in terms of high-density recording. The present invention has been made in view of the above problems, and an object thereof is to provide a method and an apparatus for forming a lubricating film that enables highly reliable and stable magnetic memory.
【0007】[0007]
【課題を解決するための手段】請求項1の発明に係る方
法は、上述の課題を解決するため、図1に示すように、
潤滑剤50を塗布した磁気ディスク基体10を有機溶剤
蒸気61の雰囲気中に配置し、当該有機溶剤蒸気61の
結露及び滴下によって余剰の潤滑剤50を溶解除去す
る。In order to solve the above-mentioned problems, the method according to the invention of claim 1 is as follows, as shown in FIG.
The magnetic disk substrate 10 coated with the lubricant 50 is placed in the atmosphere of the organic solvent vapor 61, and the excess lubricant 50 is dissolved and removed by condensation and dropping of the organic solvent vapor 61.
【0008】請求項2の発明に係る方法は、前記磁気デ
ィスク基体10を前記有機溶剤蒸気61の雰囲気中に配
置する以前に、前記潤滑剤50の被塗布面に対して表面
活性化のための摩擦処理を加える。In the method according to the second aspect of the present invention, before the magnetic disk substrate 10 is placed in the atmosphere of the organic solvent vapor 61, the surface to be coated with the lubricant 50 is activated for surface activation. Add friction treatment.
【0009】請求項3の発明に係る方法は、前記磁気デ
ィスク基体10を冷却した状態で前記有機溶剤蒸気61
の雰囲気中に配置する。請求項4の発明に係る装置は、
潤滑剤50を塗布した磁気ディスク基体10の搬入口9
0Aを有し、当該潤滑剤50を部分的に溶解除去するた
めの有機溶剤蒸気61を収納するチャンバー90と、前
記搬入口90Aからの流出を抑えるために前記有機溶剤
蒸気61を凝縮させる冷却手段93とを備えてなる。In the method according to the third aspect of the present invention, the organic solvent vapor 61 is cooled while the magnetic disk substrate 10 is cooled.
Place in the atmosphere. The device according to the invention of claim 4 is
Inlet 9 for magnetic disk substrate 10 coated with lubricant 50
0A, a chamber 90 containing an organic solvent vapor 61 for partially dissolving and removing the lubricant 50, and a cooling means for condensing the organic solvent vapor 61 in order to suppress the outflow from the carry-in port 90A. And 93.
【0010】[0010]
【作用】潤滑剤50を塗布した磁気ディスク基体10を
搬入口90Aからチャンバー90内に搬入して有機溶剤
蒸気61の雰囲気中に配置すると、潤滑剤50の表面で
有機溶剤蒸気61が結露して滴下し、これにより潤滑剤
50が表層から溶解して漸次除去される。このとき、磁
気ディスク基体10を冷却状態とすることにより、結露
が迅速化されて余剰の潤滑剤50の溶解除去の効率が高
まる。When the magnetic disk substrate 10 coated with the lubricant 50 is carried into the chamber 90 from the carry-in port 90A and placed in the atmosphere of the organic solvent vapor 61, the organic solvent vapor 61 is condensed on the surface of the lubricant 50. It is dripped, whereby the lubricant 50 is dissolved from the surface layer and gradually removed. At this time, by cooling the magnetic disk substrate 10, dew condensation is speeded up and the efficiency of dissolving and removing the excess lubricant 50 is increased.
【0011】潤滑剤50の膜厚が減少するにつれて被塗
布面に対する付着力が強くなることから、単分子膜程度
の膜厚まで膜厚が減少した時点で溶解除去が自然に停止
する。つまり、極めて薄い均一な潤滑膜を容易に形成す
ることができる。As the film thickness of the lubricant 50 decreases, the adhesive force to the surface to be coated becomes stronger. Therefore, when the film thickness decreases to a film thickness of about a monomolecular film, the dissolution and removal naturally stops. That is, an extremely thin uniform lubricating film can be easily formed.
【0012】潤滑剤50の塗布前又は塗布後に被塗布面
を擦る摩擦処理を施すと、被塗布面の表面硬化により潤
滑膜の付着性が向上する。したがって、スライダとの摺
動に際して潤滑剤50が押し退けられて潤滑膜が部分的
に薄くなる(又は無くなる)現象が生じにくくなって潤
滑性が向上する。なお、有機溶剤蒸気61は搬入口90
Aの近傍で冷却手段93により凝縮し、これにより、チ
ャンバー90からの有機溶剤蒸気61の流出が抑えられ
る。When a friction treatment is performed to rub the surface to be coated before or after the coating of the lubricant 50, the surface of the surface to be coated is hardened to improve the adhesion of the lubricating film. Therefore, the phenomenon in which the lubricant 50 is pushed away when the slider slides and the lubricant film is partially thinned (or disappeared) hardly occurs, and the lubricity is improved. It should be noted that the organic solvent vapor 61 is introduced into the carry-in port 90.
It is condensed by the cooling means 93 in the vicinity of A, whereby the outflow of the organic solvent vapor 61 from the chamber 90 is suppressed.
【0013】[0013]
【実施例】図2(a)及び(b)は本発明に係る磁気デ
ィスク1の構成を示す図である。図2(a)は外観を示
す一部切欠き斜視図であり、図2(b)は図2(a)中
に鎖線で囲んだAA部を拡大して示す要部断面図であ
る。2 (a) and 2 (b) are views showing the structure of a magnetic disk 1 according to the present invention. FIG. 2A is a partially cutaway perspective view showing the external appearance, and FIG. 2B is an enlarged cross-sectional view of an essential part showing an AA portion surrounded by a chain line in FIG. 2A.
【0014】磁気ディスク1は、環状の非磁性基板1
1、下地層12、磁性膜13、及び保護膜14からなる
磁気ディスク基体10と、その上面を被覆する潤滑膜1
5とから構成されている。非磁性基板11は例えばアル
マイト表面加工を施したアルミニウム基板であり、下地
層12はニッケルとリンとのメッキ膜などからなる。ま
た、磁性膜13はγ−Fe2 O3 の酸化鉄などからな
り、保護膜14は200Å程度の厚さの硬質カーボン膜
などからなる。The magnetic disk 1 is an annular non-magnetic substrate 1.
1, a magnetic disk substrate 10 including an underlayer 12, a magnetic film 13, and a protective film 14, and a lubricating film 1 covering the upper surface thereof.
It is composed of 5 and. The non-magnetic substrate 11 is, for example, an alumite surface-treated aluminum substrate, and the underlayer 12 is formed of a plated film of nickel and phosphorus. Further, the magnetic film 13 is made of iron oxide such as γ-Fe 2 O 3 , and the protective film 14 is made of a hard carbon film having a thickness of about 200Å.
【0015】潤滑膜15は、後述するように、磁気ディ
スク基体10への潤滑剤の塗布処理、有機溶剤蒸気中に
磁気ディスク基体10を晒すことによって有機溶剤蒸気
の結露及び滴下現象を利用して余剰の潤滑剤を除去する
処理とを含む一連の処理によって形成されている。As will be described later, the lubricating film 15 utilizes the coating process of the lubricant on the magnetic disk substrate 10 and the condensation and dripping phenomenon of the organic solvent vapor by exposing the magnetic disk substrate 10 to the organic solvent vapor. It is formed by a series of processes including a process of removing excess lubricant.
【0016】図1は本発明に係る潤滑膜形成装置100
の要部の構成を模式的に示す図である。潤滑膜形成装置
100は、潤滑剤50を溜める潤滑剤槽70、有機溶剤
60Bを溜める溶剤槽80、及び有機溶剤蒸気61を収
納するチャンバー90などを備え、ワーク(製造中の磁
気ディスク)としての磁気ディスク基体10を経路Rに
沿って搬送し、潤滑膜15を形成するための後述の各処
理を順次自動的に行うように構成されている。FIG. 1 shows a lubricating film forming apparatus 100 according to the present invention.
It is a figure which shows the structure of the principal part of this typically. The lubricant film forming apparatus 100 includes a lubricant tank 70 for storing the lubricant 50, a solvent tank 80 for storing the organic solvent 60B, a chamber 90 for storing the organic solvent vapor 61, and the like, and serves as a work (magnetic disk being manufactured). The magnetic disk substrate 10 is conveyed along the route R, and the respective processes described below for forming the lubricating film 15 are sequentially and automatically performed.
【0017】チャンバー90の下部には有機溶剤60を
溜める液槽部90Cが設けられ、その液槽部90Cの底
部には有機溶剤蒸気61を生成するために有機溶剤60
を加熱する加熱手段96が設けられている。A liquid tank portion 90C for accumulating the organic solvent 60 is provided under the chamber 90, and the organic solvent 60 for generating the organic solvent vapor 61 is formed at the bottom of the liquid tank portion 90C.
A heating means 96 for heating the is provided.
【0018】また、チャンバー90は、経路Rに対応し
た位置で常時開口する搬入口90A及び搬出口90B
と、点検や清掃のための窓部90Cとを有しており、こ
れら開口部の近傍には、外部への流出を抑えるために有
機溶剤蒸気61を凝縮させるクーリングパイプなどの冷
却手段93,94,95が組み付けられている。Further, the chamber 90 has a carry-in port 90A and a carry-out port 90B which are always open at positions corresponding to the route R.
And a window 90C for inspection and cleaning, and cooling means 93, 94 such as a cooling pipe for condensing the organic solvent vapor 61 in order to suppress the outflow to the outside in the vicinity of these openings. , 95 are assembled.
【0019】以上のように構成された潤滑膜形成装置1
00による潤滑膜15の形成に際しては、まず、磁気デ
ィスク基体10は、図示しない移動手段に支持された状
態で、潤滑剤槽70を満たす液状の潤滑剤50中に浸漬
された後、ゆっくりと引き上げられる。これにより、磁
気ディスク基体10の表面(保護膜14の上面)に潤滑
剤50が比較的に厚い膜状に塗布される。Lubricating film forming apparatus 1 configured as described above
In forming the lubricating film 15 by using No. 00, first, the magnetic disk substrate 10 is immersed in a liquid lubricant 50 that fills the lubricant tank 70 while being supported by a moving unit (not shown), and then slowly pulled up. Be done. As a result, the lubricant 50 is applied to the surface of the magnetic disk substrate 10 (the upper surface of the protective film 14) in the form of a relatively thick film.
【0020】続いて、潤滑膜15を薄い膜とする上で余
剰となる潤滑剤50を大まかに除去するため、磁気ディ
スク基体10は溶剤槽80内の有機溶剤60B中に浸漬
される。そして、溶剤槽80から引き上げられた磁気デ
ィスク基体10は、チャンバー90内に搬入される。Subsequently, the magnetic disk substrate 10 is immersed in the organic solvent 60B in the solvent tank 80 in order to roughly remove the excess lubricant 50 when the lubricating film 15 is made thin. Then, the magnetic disk substrate 10 pulled up from the solvent tank 80 is carried into the chamber 90.
【0021】チャンバー90内は磁気ディスク基体10
より高い温度の有機溶剤蒸気61で充満されており、こ
の有機溶剤蒸気61の雰囲気中を一定速度で搬送される
間(この間、基体10は径方向を鉛直方向とした配置状
態に保たれる)に、潤滑剤50の膜の表面で有機溶剤蒸
気61が結露して滴下し、これにより潤滑剤50が表層
から溶解して漸次除去される。The inside of the chamber 90 is the magnetic disk substrate 10.
It is filled with the organic solvent vapor 61 at a higher temperature, and is transported in the atmosphere of the organic solvent vapor 61 at a constant speed (while the substrate 10 is kept in the arrangement state with the radial direction being the vertical direction). In addition, the organic solvent vapor 61 is condensed on the surface of the film of the lubricant 50 and is dropped, whereby the lubricant 50 is dissolved from the surface layer and gradually removed.
【0022】すなわち、潤滑剤50の表面で均一に結露
が生じ、潤滑剤50の表面は有機溶剤60の薄い膜で覆
われる形となる。そして、溶解した潤滑剤50は、有機
溶剤60の膜中で沈澱するように徐々に下方に向かい、
磁気ディスク基体10の下端から有機溶剤60の雫とと
もに落下する。That is, dew condensation is uniformly generated on the surface of the lubricant 50, and the surface of the lubricant 50 is covered with a thin film of the organic solvent 60. Then, the dissolved lubricant 50 gradually moves downward so as to precipitate in the film of the organic solvent 60,
It drops from the lower end of the magnetic disk substrate 10 together with a drop of the organic solvent 60.
【0023】ただし、被塗布面に近い程、被塗布面に対
する潤滑剤50の付着力が強いので、潤滑剤50の膜厚
が単分子膜相当の値まで減少すると、結露及び滴下によ
る穏やかな除去処理では潤滑剤50の除去が不能とな
り、その時点で実質的に除去処理が終了する。つまり、
潤滑剤50が完全に除去されることはないので、処理条
件の厳密な制御によらずに、極めて薄く且つ均一な潤滑
膜15を容易に形成することができる。However, the closer to the surface to be coated, the stronger the adhesion of the lubricant 50 to the surface to be coated. Therefore, when the thickness of the lubricant 50 decreases to a value equivalent to a monomolecular film, dew condensation and gentle removal by dripping are carried out. In the process, the removal of the lubricant 50 becomes impossible, and the removal process is substantially finished at that point. That is,
Since the lubricant 50 is not completely removed, the extremely thin and uniform lubricant film 15 can be easily formed without strictly controlling the processing conditions.
【0024】なお、磁気ディスク基体10の温度(厳密
には潤滑剤50の温度)が有機溶剤蒸気61の温度に達
すると結露が停止するので、長時間にわたって結露を持
続させるには、磁気ディスク基体10を室温以下に冷却
した状態でチャンバー90内に配置する必要がある。When the temperature of the magnetic disk substrate 10 (strictly speaking, the temperature of the lubricant 50) reaches the temperature of the organic solvent vapor 61, the dew condensation stops. Therefore, in order to maintain the dew condensation for a long time, the magnetic disk substrate It is necessary to place 10 inside the chamber 90 in a state of being cooled to room temperature or lower.
【0025】その場合において、冷却の方法としては、
チャンバー90への搬入に先立って磁気ディスク基体1
0を冷却する冷却室を経路R内に設ける方法、半導体冷
却素子などを搬送手段に組み込み、チャンバー90内で
必要に応じて冷却する方法などを用いることができる。In that case, as a cooling method,
Prior to loading into the chamber 90, the magnetic disk substrate 1
It is possible to use a method of providing a cooling chamber for cooling 0 in the route R, a method of incorporating a semiconductor cooling element or the like in the transporting means, and cooling the inside of the chamber 90 as necessary.
【0026】また、図示を省略したが、潤滑膜形成装置
100には、例えば潤滑剤50を塗布する以前の段階
で、磁気ディスク基体10の表面エネルギーを高めて潤
滑剤50の付着性を向上させるための摩擦処理手段が設
けられている。Although not shown, in the lubricating film forming apparatus 100, for example, before the application of the lubricant 50, the surface energy of the magnetic disk substrate 10 is increased to improve the adhesion of the lubricant 50. Friction processing means are provided.
【0027】摩擦処理手段は、磁気ディスク基体10を
回転させるとともに、磁気ディスク基体10に例えばポ
リッシュ用パッドを押し当て、潤滑剤50の被塗布面を
擦るように構成されている。The friction processing means is configured to rotate the magnetic disk substrate 10 and press a polishing pad against the magnetic disk substrate 10 to rub the surface to be coated with the lubricant 50.
【0028】上述の実施例においては、潤滑剤50を塗
布の手法として浸漬法を用いたが、スプレー法、スピン
コート法、蒸気付着法などの各種手法を使用する潤滑剤
に応じて適宜採用することができる。また、余剰の潤滑
剤50の除去に要する時間を短縮するために大まかに潤
滑剤50を除去する処理にも浸漬法を用いたが、超音波
洗浄を併用した浸漬法、溶剤を流動させる浸漬法、又は
スプレー洗浄法を用いてもよい。Although the dipping method is used as the coating method for the lubricant 50 in the above-mentioned embodiments, various methods such as a spray method, a spin coating method, and a vapor deposition method may be appropriately adopted depending on the lubricant used. be able to. Further, the dipping method was also used for the treatment for roughly removing the lubricant 50 in order to shorten the time required for removing the surplus lubricant 50. However, the dipping method combined with ultrasonic cleaning and the dipping method in which the solvent is made to flow are also used. Alternatively, a spray cleaning method may be used.
【0029】上述の実施例においては、潤滑剤50を塗
布する以前に被塗布面を擦る摩擦処理を行うものとして
説明したが、この摩擦処理はチャンバー90への搬入以
前に行えばよく、潤滑剤50の塗布後に行うようにして
もよい。また、被塗布面を擦るための部材としては、ポ
リッシュ用パッドの他に、不織紙や布、又はフェルトな
どを使用することができる。In the above-described embodiment, the frictional treatment of rubbing the surface to be coated is performed before the lubricant 50 is applied. However, this frictional treatment may be performed before carrying the lubricant 50 into the chamber 90. It may be performed after the application of 50. As the member for rubbing the coated surface, non-woven paper, cloth, felt, or the like can be used in addition to the polishing pad.
【0030】以上の形成方法による潤滑膜15の良否を
調べるため、実施例1〜3として以下のように潤滑剤5
0及び有機溶剤60の材質を選定して試料を作製し、こ
れら各試料に対してMn−Znフェライトからなるスラ
イダを連続的に摺動させる試験を行い、摩擦係数の変化
を測定するとともに、スライダの動作状態及び試料の表
面の変化を観察した。なお、各試料の磁気ディスク基体
10には上述の材質からなるものを用いた。In order to check the quality of the lubricating film 15 formed by the above-described forming method, the lubricant 5 is used as Examples 1 to 3 as follows.
0 and the material of the organic solvent 60 are selected to prepare samples, and a test of continuously sliding a slider made of Mn-Zn ferrite is performed on each of these samples to measure the change in friction coefficient and The operating state and changes in the surface of the sample were observed. The magnetic disk substrate 10 of each sample was made of the above-mentioned material.
【0031】ここで、実施例1の試料では、パーフロロ
ポリエーテルを主成分とするデュポン社製の潤滑液(商
品名はKRYTOX 143AD)をフロロカーボン
(商品名はフレオンTF)で1万分の1の濃度に希釈し
た潤滑剤を浸漬法で塗布して常温乾燥し、布バフによる
摩擦処理を加えた後、フロロカーボン蒸気中に配置する
ことによって潤滑膜15を形成した。Here, in the sample of Example 1, a lubricating liquid (trade name: KRYTOX 143AD) manufactured by DuPont and containing perfluoropolyether as a main component was mixed with fluorocarbon (trade name: Freon TF) at a ratio of 1/1000. A lubricant diluted to a concentration was applied by a dipping method, dried at room temperature, rubbed with a cloth buff, and placed in fluorocarbon vapor to form a lubricating film 15.
【0032】実施例2の試料では、モンテフルオス社製
の潤滑液(商品名はFOMBLINAM 2001)を
フロリナートで2万分の1の濃度に希釈した潤滑剤を浸
漬法で塗布して常温乾燥し、フロロカーボン蒸気中に配
置することによって潤滑膜15を形成した。In the sample of Example 2, a lubricant obtained by diluting a lubricating fluid (trade name: FOMBLINAM 2001) manufactured by Montefluos Co., Ltd. with Fluorinert to a concentration of 1/20000 is applied by a dipping method and dried at room temperature to obtain a fluorocarbon vapor. The lubricating film 15 was formed by disposing it inside.
【0033】実施例3の試料では、飽和脂肪酸の一種で
あるベヘン酸を潤滑剤とし、これを蒸気付着法で塗布し
た後、アセトンへの浸漬によって大まかに除去し、5℃
に冷却した状態でフロロカーボン蒸気中に配置すること
によって潤滑膜15を形成した。In the sample of Example 3, behenic acid, which is one of saturated fatty acids, was used as a lubricant, which was applied by the vapor deposition method, and then roughly removed by immersion in acetone, and then at 5 ° C.
The lubricating film 15 was formed by arranging it in the fluorocarbon vapor in a state of being cooled.
【0034】なお、比較例1〜3として、実施例1〜3
と同様に材質を選定して従来の形成方法によって試料を
作製し、実施例1〜3と同様の測定及び観察を行った。
比較例1の試料では、上述の潤滑液(商品名はKRYT
OX 143AD)をフロロカーボンで10万分の1の
濃度に希釈した潤滑剤をスピンコート法で塗布すること
によって潤滑膜を形成した。比較例2の試料では、上述
の潤滑液(商品名はFOMBLIN AM 2001)
をフロリナートで5万分の1の濃度に希釈した潤滑剤を
スピンコート法で塗布することによって潤滑膜を形成し
た。比較例3の試料では、ベヘン酸を蒸気付着法で塗布
した後、不織紙による拭き取りによって余剰の潤滑剤を
除去することによって潤滑膜を形成した。As Comparative Examples 1 to 3, Examples 1 to 3 were used.
A material was selected in the same manner as in 1 above, a sample was prepared by a conventional forming method, and the same measurement and observation as in Examples 1 to 3 were performed.
In the sample of Comparative Example 1, the above-mentioned lubricating liquid (trade name is KRYT
OX143AD) was diluted with fluorocarbon to a concentration of 1 / 100,000 to apply a lubricant by spin coating to form a lubricant film. In the sample of Comparative Example 2, the above-mentioned lubricating liquid (trade name is FOMBLIN AM 2001)
A lubricant film was formed by applying a lubricant diluted with Fluorinert to a concentration of 1 / 50,000 by a spin coating method. In the sample of Comparative Example 3, behenic acid was applied by the vapor deposition method, and the excess lubricant was removed by wiping with a non-woven paper to form a lubricating film.
【0035】測定及び観察の結果は、表1に示されるよ
うに、実施例1と比較例1との対比においては、摺動開
始時点及び摺動回数(試料の回転回数)が4000の時
点で摩擦係数に大きな差はなく両方とも潤滑作用は良好
であった。しかし、実施例1では、摺動回数が1000
0を越えてもヘッドクラッシュの原因となる潤滑剤のス
ライダへの堆積及びディスク側への脱落(以下、これを
「堆積・脱落」という)が起こらないのに対し、比較例
1では、摺動回数が4500に達した頃に堆積・脱落が
発生した。As shown in Table 1, the results of measurement and observation show that, in comparison between Example 1 and Comparative Example 1, at the start of sliding and the number of times of sliding (the number of rotations of the sample) was 4,000. There was no significant difference in the coefficient of friction, and both had good lubricating action. However, in Example 1, the number of slides was 1000
Even if the value exceeds 0, the lubricant that causes the head crash does not accumulate on the slider and drop off on the disk side (hereinafter, referred to as "deposit / drop off"), whereas in Comparative Example 1, sliding occurs. Accumulation and dropping occurred when the number of times reached 4,500.
【0036】実施例2と比較例2との対比においては、
実施例2では、摺動回数が10000を越えてもヘッド
吸着及び堆積・脱落は発生しなかったが、比較例2で
は、摺動開始時点で摩擦係数が0.7以上(ヘッド吸着
が生じている状態)であって、スライダが円滑に摺動し
なかった。In comparison between Example 2 and Comparative Example 2,
In Example 2, the head adsorption and the deposition / shedding did not occur even when the number of sliding times exceeded 10,000, but in Comparative Example 2, the friction coefficient was 0.7 or more at the start of sliding (when head adsorption occurred. The slider did not slide smoothly.
【0037】実施例3と比較例3との対比においては、
実施例3では、摺動回数が10000を越えてもヘッド
吸着及び堆積・脱落は発生しなかったが、比較例3で
は、摺動回数が6000に達した頃に堆積・脱落が発生
した。In comparison between Example 3 and Comparative Example 3,
In Example 3, the head adsorption and deposition / shedding did not occur even when the sliding number exceeded 10,000, but in Comparative Example 3, the deposition / shedding occurred when the sliding number reached 6000.
【0038】つまり、本発明の形成方法による潤滑膜1
5が、粗面化処理を加えない表面の平坦な膜であるにも
かかわらずヘッド吸着が起こらず、しかも堆積・脱落の
ない安定した膜であって、磁気ディスク装置の信頼性を
確保する上で優れた潤滑膜であることが確認できた。That is, the lubricating film 1 formed by the forming method of the present invention
No. 5 is a stable film that is not subjected to surface roughening treatment but has no head adsorption, and is a stable film that does not deposit or drop, and is used for ensuring the reliability of the magnetic disk device. It was confirmed that it was an excellent lubricating film.
【0039】[0039]
【表1】 [Table 1]
【0040】[0040]
【発明の効果】本発明によれば、膜状態の安定した潤滑
性の良好な潤滑膜を形成することができ、ヘッド吸着や
ヘッドクラッシュの発生を防止して磁気記憶の信頼性を
高めることができる。According to the present invention, it is possible to form a lubrication film having a stable film state and good lubricity, and prevent the occurrence of head adsorption or head crush to improve the reliability of magnetic storage. it can.
【0041】請求項2の発明によれば、潤滑膜の磁気デ
ィスク基体に対する付着性を高めることができ、潤滑性
を向上させることができる。請求項3の発明によれば、
潤滑膜の形成の効率化を図ることができる。According to the second aspect of the present invention, the adhesion of the lubricating film to the magnetic disk substrate can be increased, and the lubricating property can be improved. According to the invention of claim 3,
It is possible to improve the efficiency of forming the lubricating film.
【0042】請求項4の発明によれば、潤滑膜形成の自
動化に際して、潤滑膜形成条件の安定化を図ることがで
きるとともに、形成装置の周囲の汚染を防止することが
できる。According to the fourth aspect of the present invention, when automating the formation of the lubricating film, it is possible to stabilize the conditions for forming the lubricating film and prevent contamination of the surroundings of the forming apparatus.
【図1】本発明に係る潤滑膜形成装置の要部の構成を模
式的に示す図である。FIG. 1 is a diagram schematically showing a configuration of a main part of a lubricating film forming apparatus according to the present invention.
【図2】本発明に係る磁気ディスクの構成を示す図であ
る。FIG. 2 is a diagram showing a configuration of a magnetic disk according to the present invention.
1 磁気ディスク 10 磁気ディスク基体 50 潤滑剤 61 有機溶剤蒸気 100 潤滑膜形成装置 90 チャンバー 90A 搬入口 93 冷却手段 1 Magnetic Disk 10 Magnetic Disk Substrate 50 Lubricant 61 Organic Solvent Vapor 100 Lubricating Film Forming Device 90 Chamber 90A Inlet 93 Cooling Means
Claims (4)
体(10)を有機溶剤蒸気(61)の雰囲気中に配置
し、当該有機溶剤蒸気(61)の結露及び滴下によって
余剰の潤滑剤(50)を溶解除去することを特徴とする
磁気ディスクの潤滑膜形成方法。1. A magnetic disk substrate (10) coated with a lubricant (50) is placed in an atmosphere of an organic solvent vapor (61), and an excessive lubricant ( 50) A method for forming a lubricating film for a magnetic disk, which comprises dissolving and removing 50).
溶剤蒸気(61)の雰囲気中に配置する以前に、前記潤
滑剤(50)の被塗布面に対して表面活性化のための摩
擦処理を加えることを特徴とする請求項1記載の磁気デ
ィスクの潤滑膜形成方法。2. A friction treatment for surface activation of the surface to be coated with the lubricant (50) before the magnetic disk substrate (10) is placed in the atmosphere of the organic solvent vapor (61). The method for forming a lubricating film of a magnetic disk according to claim 1, further comprising:
状態で前記有機溶剤蒸気(61)の雰囲気中に配置する
ことを特徴とする請求項1又は請求項2記載の磁気ディ
スクの潤滑膜形成方法。3. The formation of a lubricating film for a magnetic disk according to claim 1, wherein the magnetic disk substrate (10) is arranged in a cooled state in the atmosphere of the organic solvent vapor (61). Method.
体(10)の搬入口(90A)を有し、当該潤滑剤(5
0)を部分的に溶解除去するための有機溶剤蒸気(6
1)を収納するチャンバー(90)と、 前記搬入口(90A)からの流出を抑えるために前記有
機溶剤蒸気(61)を凝縮させる冷却手段(93)とを
備えてなることを特徴とする潤滑膜形成装置。4. A lubricant inlet (90A) for a magnetic disk substrate (10) coated with a lubricant (50), the lubricant (5) being provided.
Organic solvent vapor (6) for partially dissolving and removing (0)
Lubrication, characterized in that it comprises a chamber (90) for containing 1) and a cooling means (93) for condensing the organic solvent vapor (61) in order to suppress outflow from the carry-in port (90A). Film forming equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21195591A JPH0554375A (en) | 1991-08-23 | 1991-08-23 | Lubricating film forming method and lubricating film forming apparatus for magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21195591A JPH0554375A (en) | 1991-08-23 | 1991-08-23 | Lubricating film forming method and lubricating film forming apparatus for magnetic disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0554375A true JPH0554375A (en) | 1993-03-05 |
Family
ID=16614470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21195591A Withdrawn JPH0554375A (en) | 1991-08-23 | 1991-08-23 | Lubricating film forming method and lubricating film forming apparatus for magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0554375A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007510145A (en) * | 2003-10-28 | 2007-04-19 | ケルシュアグル、ペーター | Process and apparatus for distinguishing parts affecting alternating electromagnetic fields |
| JP2009199699A (en) * | 2008-02-25 | 2009-09-03 | Fujitsu Ltd | Lubricant applicator and applying method |
-
1991
- 1991-08-23 JP JP21195591A patent/JPH0554375A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007510145A (en) * | 2003-10-28 | 2007-04-19 | ケルシュアグル、ペーター | Process and apparatus for distinguishing parts affecting alternating electromagnetic fields |
| JP2009199699A (en) * | 2008-02-25 | 2009-09-03 | Fujitsu Ltd | Lubricant applicator and applying method |
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