JPH055940Y2 - - Google Patents
Info
- Publication number
- JPH055940Y2 JPH055940Y2 JP14166587U JP14166587U JPH055940Y2 JP H055940 Y2 JPH055940 Y2 JP H055940Y2 JP 14166587 U JP14166587 U JP 14166587U JP 14166587 U JP14166587 U JP 14166587U JP H055940 Y2 JPH055940 Y2 JP H055940Y2
- Authority
- JP
- Japan
- Prior art keywords
- sintered body
- bubbling
- quartz glass
- bubbler
- hollow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005587 bubbling Effects 0.000 claims description 24
- 238000007789 sealing Methods 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000007789 gas Substances 0.000 description 18
- 238000004140 cleaning Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- 238000009834 vaporization Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000009423 ventilation Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
【考案の詳細な説明】
「産業上の利用分野」
本考案はウエハーその他の半導体用各種部材を
洗浄する為に用いられるバブリング洗浄装置や、
多孔質合成石英ガラス等を製造する際の気化ガス
を得る為に、所定の液体原料をバブリングにより
気化させるバブリング気化装置その他の、各種半
導体又は光フアイバその他の光学系部材の製造装
置に用いられるバブラー管に関する。[Detailed description of the invention] "Industrial application field" This invention is a bubbling cleaning device used for cleaning wafers and various other semiconductor components,
A bubbler used in a bubbling vaporizer that vaporizes a predetermined liquid raw material by bubbling in order to obtain vaporized gas when manufacturing porous synthetic quartz glass, etc., and other devices for manufacturing various semiconductors, optical fibers, and other optical system components. Regarding pipes.
「従来の技術」
従来より、ウエハーその他の半導体用各種部材
を洗浄する為に、硫酸、塩酸、硝酸等の処理液を
満たした洗浄槽内に、オゾンその他のバブリング
ガスが導入されるバブラー管を配設し、該バブラ
ー管より多数の微小気泡を噴出させながらバブリ
ング洗浄を行うバブリング洗浄装置は公知であ
る。``Prior Art'' Traditionally, bubbler tubes have been used to introduce ozone and other bubbling gases into a cleaning tank filled with processing liquids such as sulfuric acid, hydrochloric acid, and nitric acid in order to clean wafers and other semiconductor components. A bubbling cleaning device is known that performs bubbling cleaning while ejecting a large number of microbubbles from the bubbler tube.
又四塩化珪素その他の液体原料を満たしたバブ
ラ槽内にバブラー管を配設するとともに、該バブ
ラー管よりキヤリアガスをバブラー槽内でバブリ
ングさせながら前記液体原料を気化させ、該気化
ガスをキヤリアガスとともに反応系に送出するよ
うにしたバブリング気化装置も公知である。 Further, a bubbler pipe is disposed in a bubbler tank filled with silicon tetrachloride or other liquid raw material, and the liquid raw material is vaporized while bubbling carrier gas from the bubbler pipe in the bubbler tank, and the vaporized gas is reacted with the carrier gas. Bubbling vaporizers are also known.
この種の装置に用いられるバブラー管は、一般
にバブリングガス供給通路の先端側をノズル形状
にしたり、又その先端側を多数の穴を穿孔した中
空球形体で形成し、前記ノズル部や中空球形体の
小孔より前記バブリングガスを噴出するようにし
て構成しているが、かかるバブラ管においては前
記ノズルや小孔の直径をミクロンタン単位まで小
径化する事が出来ず、而もノズルの場合には穴数
が一個又中空球形体の場合でも形成される穴数に
も限度がある為に、前記ノズル等より噴出される
気泡の微小化と該気泡を広範囲に亙つて均等に発
生させるのが困難であり、結果として洗浄効果や
気化効率を向上させる事が出来ない。 The bubbler tube used in this type of device generally has a nozzle shape at the tip end of the bubbling gas supply passage, or a hollow spherical body with a large number of holes perforated at the tip side, and the nozzle portion or the hollow spherical body However, in such a bubbler tube, the diameter of the nozzle and the small hole cannot be reduced to the micron unit, and in the case of a nozzle, Since there is a limit to the number of holes that can be formed even in the case of one hole or a hollow spherical body, it is important to miniaturize the air bubbles ejected from the nozzle etc. and to generate the air bubbles evenly over a wide range. This is difficult, and as a result, the cleaning effect and vaporization efficiency cannot be improved.
かかる欠点を解消する為に例えば第4図に示す
ように、前記バブリングガス供給通路1の先端側
に実球状焼結体2′を連接させたバブラ管が提案
されている。 In order to overcome this drawback, a bubbler tube has been proposed in which a real spherical sintered body 2' is connected to the distal end side of the bubbling gas supply passage 1, as shown in FIG. 4, for example.
「考案が解決しようとする問題点」
しかしながら、このような断面全域が焼結化さ
れている実球状の焼結体2′においては、ガス供
給通路1端の入口側2a′より焼結体2′表面まで
の通気距離が大きく異なる為に、前記入口側2
a′より奥側に進むに連れ該焼結体2′内を通過す
るガスの通気抵抗が幾何給数的に大きくなつてし
まい、従つて微小気泡発生部位が入口側2a′の通
路端近傍に限定されてしまう為に、微小気泡の発
生量に制限を受け、尚好ましい洗浄効果や気化効
率を得る事が出来ない。"Problems to be solved by the invention" However, in such a real spherical sintered body 2' whose entire cross section is sintered, the sintered body 2' is 'Since the ventilation distance to the surface differs greatly, the inlet side 2
The ventilation resistance of the gas passing through the sintered body 2' becomes geometrically larger as it goes deeper than a', and the micro-bubble generation site is located near the end of the passage on the inlet side 2a'. As a result, the amount of microbubbles generated is limited, making it impossible to obtain desirable cleaning effects and vaporization efficiency.
又前記焼結体は前記バブリング中に洗浄液や液
体原料中に不純物が溶解混入するのを避ける為
に、化学的安定性のよい石英ガラスを用いて形成
する場合が多いが、石英ガラスは他の耐熱性ガラ
スに比較して軟化点が非常に高く、この為前記の
ように内部にまでガラス粉が充填された実球状の
石英ガラス製焼結体を製作すると、内部側と表面
側の加熱温度の不均一により断面全面に亙つて均
等の結合力をもつて結合された焼結体を製作する
のが困難であり、この為結合度の弱い石英ガラス
粉がバブリング中に洗浄液や液体原料中に飛び出
す恐れがあり、これらが洗浄中のウエハに付着し
て各種製品欠陥を生じ易い。 In addition, the sintered body is often formed using quartz glass, which has good chemical stability, in order to avoid impurities from being dissolved and mixed into the cleaning liquid or liquid raw materials during the bubbling. Its softening point is much higher than that of heat-resistant glass, so when a real spherical sintered quartz glass body filled with glass powder is manufactured as described above, the heating temperature of the inside and surface sides will be lower. It is difficult to produce a sintered body that is bonded with uniform bonding force over the entire cross-section due to the non-uniformity of the There is a risk that these particles may fly out and adhere to the wafer being cleaned, causing various product defects.
本考案はかかる従来技術の欠点に鑑み、バブリ
ングガス供給通路先端側より均一に且つ微小気泡
が噴出し得るバブラー管を提供する事を目的とす
る。 In view of the drawbacks of the prior art, an object of the present invention is to provide a bubbler tube that can uniformly eject microbubbles from the tip side of a bubbling gas supply passage.
又、本考案の他の目的は、バブリングガス供給
通路先端側にガラス製焼結体を形成しつつも、該
焼結体が均一な結合力でもつて形成し得るバブラ
ー管を提供する事にある。 Another object of the present invention is to provide a bubbler tube in which a glass sintered body is formed at the tip side of a bubbling gas supply passage, and the sintered body can be formed with uniform bonding force. .
「問題点を解決する為の手段」
本考案はかかる技術的課題を達成する為に、例
えば第1図及び第3図に示すように、
バブリングガス供給通路1先端側に多数の小
孔3aを穿設した中空封止部3を設けた点、
この場合前記封止部3は、一般的には中空球状
又は先端が封止された筒状体で形成され、その周
面状に多数の小孔3aを穿設するのがよい。"Means for Solving the Problems" In order to achieve this technical problem, the present invention has a large number of small holes 3a on the tip side of the bubbling gas supply passage 1, as shown in FIGS. 1 and 3, for example. In this case, the sealing portion 3 is generally formed of a hollow sphere or a cylindrical body with a sealed tip, and has a large number of small holes on its circumferential surface. It is preferable to drill holes 3a.
少なくとも前記小孔3aを隠蔽する如く該封
止部3の表面に焼結体2を被覆した点
尚、前記前記焼結体2は耐熱ガラス材、テフロ
ン(デユポン社登録商標)石英ガラス材等のいず
れで形成してもよいが、熱的及び化学的安定性の
面より石英ガラス材で形成するのがよい。 The surface of the sealing part 3 is coated with a sintered body 2 so as to cover at least the small hole 3a.The sintered body 2 is made of a heat-resistant glass material, Teflon (registered trademark of DuPont), quartz glass material, etc. Although it may be formed of any material, it is preferably formed of quartz glass from the viewpoint of thermal and chemical stability.
更に前記焼結体2は、前記小孔3aのみを隠蔽
する如く形成してもよいが、好ましくは前記中空
封止部3表面全域を薄肉に隠蔽するのがよい。 Further, the sintered body 2 may be formed so as to cover only the small hole 3a, but it is preferable that the entire surface of the hollow sealing part 3 be covered with a thin wall.
「作用」
かかる技術手段によれば、前記焼結体2は多数
の小孔3aを穿設した中空封止部3に単に被覆さ
れている構成の為に、ガス供給通路1より中空封
止部3内の空洞部4に導入されたバブリングガス
は多数の小孔3aを介して焼結体2全域に導か
れ、而も前記焼結体2は中空封止部3表面に被覆
されている構成であるから当然に薄肉に形成出
来、結果として該焼結体2通気時のバブリングガ
スの通気抵抗の大幅低減と均等化し、これにより
焼結体2全域より均等に且つ多量の微細気泡が噴
出し、洗浄及び気化効率の大幅向上を図る事が出
来る。"Operation" According to this technical means, since the sintered body 2 is simply covered with the hollow sealing part 3 having a large number of small holes 3a, the hollow sealing part 3 is more easily covered than the gas supply passage 1. The bubbling gas introduced into the cavity 4 in the cavity 3 is guided throughout the sintered body 2 through a large number of small holes 3a, and the sintered body 2 is coated on the surface of the hollow sealing part 3. Therefore, it can naturally be formed into a thin wall, and as a result, the ventilation resistance of the bubbling gas when ventilating the sintered body 2 is greatly reduced and equalized, and as a result, a large amount of fine bubbles are ejected evenly from the entire area of the sintered body 2. , cleaning and vaporization efficiency can be significantly improved.
而も前記中空封止部3を膨出させる事により、
その内部の空洞部4がバツフアタンク的機能を発
揮し、前記効果が一層向上する。 Moreover, by expanding the hollow sealing part 3,
The internal cavity 4 functions as a buffer tank, further improving the above effect.
又本技術手段に係る焼結体2は、前述したよう
に薄肉であるからして、石英ガラスのように高温
で焼結加熱する場合においちても内部側と表面側
の加熱温度が均熱化され、均一な結合度でもつて
焼結化させる事が可能となり、バブリング中に結
合度の弱い石英ガラス粉が洗浄液や液体原料中に
飛び出す恐れがなくなる。 Furthermore, since the sintered body 2 according to the present technical means is thin as described above, even when sintering and heating it at a high temperature like quartz glass, the heating temperature on the inside and surface side is equalized. It becomes possible to sinter with a uniform degree of bonding, and there is no fear that quartz glass powder with a weak bonding degree will fly out into the cleaning liquid or liquid raw material during bubbling.
更に前記支持体は、支持体として機能する中空
封止部3表面に付着させる構成であるからして、
所定肉厚で精度よく製作する事が容易であり、製
造コストの低減も図れる。 Furthermore, since the support is configured to be attached to the surface of the hollow sealing part 3 that functions as a support,
It is easy to manufacture with a predetermined thickness and precision, and manufacturing costs can be reduced.
尚、前記小孔3aは必ずしも封止部3全域に形
成する必要はなく、バブリングが必要とする上部
側のみに形成しても良い。 Note that the small holes 3a do not necessarily have to be formed over the entire sealing part 3, and may be formed only on the upper side where bubbling is required.
「実施例」
以下、図面を参照して本考案の好適な実施例を
例示的に詳しく説明する。ただしこの実施例に記
載されている構成部品の寸法、材質、形状、その
相対配置などは特に特定的な記載がない限りは、
この考案の範囲をそれのみに限定する趣旨ではな
く、単なる説明例に過ぎない。Embodiments Hereinafter, preferred embodiments of the present invention will be described in detail by way of example with reference to the drawings. However, the dimensions, materials, shapes, relative positions, etc. of the components described in this example are as follows, unless otherwise specified.
This is not intended to limit the scope of this invention, but is merely an illustrative example.
第1図乃至第3図は、本考案の実施例に係る石
英ガラス製のバブラー管を示し、先ず第2図にお
いてその全体構成を概略的に説明するに、先ず垂
直に立設するバブリングガス導入管11の下端を
直角に折曲させて水平方向に延設するとともに、
該水平延設部位12の自由端側を封止するととも
に、該水平延設部位12の両側に僅かに上方に向
け傾斜をもたして各5本の枝管13を順次連接す
る。 1 to 3 show a bubbler tube made of quartz glass according to an embodiment of the present invention. First, the overall structure will be schematically explained with reference to FIG. The lower end of the pipe 11 is bent at a right angle and extended horizontally,
The free end side of the horizontally extending portion 12 is sealed, and each of the five branch pipes 13 is successively connected to both sides of the horizontally extending portion 12 with a slight upward slope.
そして前記枝管13の先端側には、中空球形状
に膨出させた中空封止部3を形成するとともに、
該中空封止部3の周面上に多数の小孔3aを穿設
し、その外表面上に石英ガラス製の焼結体2を被
覆する。 A hollow sealing portion 3 bulged in the shape of a hollow sphere is formed on the distal end side of the branch pipe 13, and
A large number of small holes 3a are bored on the circumferential surface of the hollow sealing portion 3, and the outer surface thereof is covered with a sintered body 2 made of quartz glass.
尚、前記小孔3aは、必ずしも中空封止部3の
全周面に設ける必要はなく、バブリングガスが必
要とする上半分側にのみ設けてもよい。 Note that the small holes 3a do not necessarily need to be provided on the entire circumferential surface of the hollow sealing portion 3, and may be provided only on the upper half side where bubbling gas is required.
次に前記枝管13の製造方法について説明す
る。 Next, a method for manufacturing the branch pipe 13 will be explained.
前記枝管13は、例えば先端を封止した10mm前
後の石英ガラス管をバーナにより加熱させながら
熱軟化させた後、該先端部のみを15mm前後の中空
球形状に膨出させ、該熱軟化している間に前記多
数の1mm前後の小孔3aを穿設させる事により中
空封止部3を形成する。 The branch pipe 13 is made by, for example, thermally softening a quartz glass tube of approximately 10 mm with a sealed tip by heating it with a burner, and then expanding only the tip into a hollow spherical shape of approximately 15 mm. During this time, the hollow sealing portion 3 is formed by drilling a large number of small holes 3a of approximately 1 mm in diameter.
次に前記中空封止部3の外表面に粒度調整され
た石英ガラス粉を所定層厚で付着させた後、電気
炉内で加熱して焼結固化させる。 Next, a predetermined layer thickness of quartz glass powder whose particle size has been adjusted is adhered to the outer surface of the hollow sealing portion 3, and then heated in an electric furnace to be sintered and solidified.
そしてこのようにして形成された焼結体2は例
えば3〜5mm前後の膜厚に形成され、前記石英ガ
ラス粉粒度の調整により焼結体2各細隙孔の直径
が略20〜150μm程度になるように設定している。 The sintered body 2 thus formed has a film thickness of, for example, about 3 to 5 mm, and by adjusting the particle size of the quartz glass powder, the diameter of each pore of the sintered body 2 is approximately 20 to 150 μm. It is set so that
かかる実施例によれば、第3図に示すように、
ガス導入管11より水平延設部位12及び枝管1
3を介して中空封止部3内に供給されたバブリン
グガスは、該封止部3の空洞部4内で一旦バツフ
アされた後、前記多数の小孔3aを介して焼結体
2に通気されその全域より均等に微小気泡化され
たバブリングガスが噴出し、前述した本考案の効
果が円滑に達成される。 According to this embodiment, as shown in FIG.
Horizontal extension part 12 and branch pipe 1 from gas introduction pipe 11
The bubbling gas supplied into the hollow sealing part 3 through the sealing part 3 is once buffered in the hollow part 4 of the sealing part 3, and then is vented into the sintered body 2 through the large number of small holes 3a. The bubbling gas made into microbubbles is uniformly ejected from the entire area, and the effects of the present invention described above are smoothly achieved.
尚、本考案によれば前記焼結体2の厚みを適宜
調整し、該焼結体2の下側を厚肉にして上側から
のみ微小気泡が発生するようにする事も出来、又
洗浄処理液の内圧に応じて下側を上側より薄肉し
て全体的に均等に微小気泡が発生するよう構成す
る事も可能である。 According to the present invention, the thickness of the sintered body 2 can be appropriately adjusted so that the lower side of the sintered body 2 is thickened so that microbubbles are generated only from the upper side. Depending on the internal pressure of the liquid, it is also possible to make the lower side thinner than the upper side so that microbubbles are generated evenly throughout.
「考案の効果」
以上記載した如く本考案によれば、バブリング
ガス供給通路先端側より均一に且つ微小気泡が噴
出し、洗浄効果を気化効率が大幅に向上し得ると
ともに、該微小気泡を噴出させる焼結体が均一な
結合力でもつて形成されている為に、石英ガラス
粉その他の不純物が飛び出す恐れがなく、該不純
物付着に起因する各種デバイス欠陥を完全に防止
出来る。"Effects of the Invention" As described above, according to the present invention, microbubbles are ejected uniformly from the tip side of the bubbling gas supply passage, the cleaning effect and vaporization efficiency can be greatly improved, and the microbubbles are ejected. Since the sintered body is formed with uniform bonding strength, there is no fear of quartz glass powder or other impurities flying out, and various device defects caused by the adhesion of these impurities can be completely prevented.
等の種々の著効を有す。It has various effects such as
第1図乃至第3図は、本考案の実施例に係るバ
ブラー管を用いたバブラ装置を示し、第2図はそ
の全体斜視図、第1図はその要部切欠き拡大断面
図、第3図はその作用を示す要部断面図である。
第4図は、従来技術の作用を示す要部断面図であ
る。
1……バブリングガス供給通路、2……焼結
体、3a……小孔、3……中空封止部。
1 to 3 show a bubbler device using a bubbler tube according to an embodiment of the present invention, FIG. 2 is an overall perspective view thereof, FIG. The figure is a sectional view of a main part showing its effect.
FIG. 4 is a sectional view of a main part showing the effect of the prior art. 1...Bubbling gas supply passage, 2...Sintered body, 3a...Small hole, 3...Hollow sealing part.
Claims (1)
小孔を穿設した中空封止部を設けるとともに、
少なくとも前記小孔を隠蔽する如く該封止部の
表面に焼結体を被覆した事を特徴とするバブラ
ー管。 2) 前記焼結体が石英ガラス製焼結体である実
用新案登録請求の範囲第1項記載のバブラー
管。 3) 前記中空封止部を膨出させてその表面に薄
肉の焼結体が形成されている実用新案登録請求
の範囲第1項記載のバブラー管。[Scope of Claim for Utility Model Registration] 1) A hollow sealing part with a large number of small holes is provided on the tip side of the bubbling gas supply passage, and
A bubbler tube characterized in that the surface of the sealing portion is coated with a sintered body so as to hide at least the small hole. 2) The bubbler tube according to claim 1, wherein the sintered body is a sintered body made of quartz glass. 3) The bubbler tube according to claim 1, wherein the hollow sealing portion is bulged and a thin sintered body is formed on the surface thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14166587U JPH055940Y2 (en) | 1987-09-18 | 1987-09-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14166587U JPH055940Y2 (en) | 1987-09-18 | 1987-09-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6448135U JPS6448135U (en) | 1989-03-24 |
| JPH055940Y2 true JPH055940Y2 (en) | 1993-02-16 |
Family
ID=31406933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14166587U Expired - Lifetime JPH055940Y2 (en) | 1987-09-18 | 1987-09-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH055940Y2 (en) |
-
1987
- 1987-09-18 JP JP14166587U patent/JPH055940Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6448135U (en) | 1989-03-24 |
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