JPH0565585B2 - - Google Patents
Info
- Publication number
- JPH0565585B2 JPH0565585B2 JP59002917A JP291784A JPH0565585B2 JP H0565585 B2 JPH0565585 B2 JP H0565585B2 JP 59002917 A JP59002917 A JP 59002917A JP 291784 A JP291784 A JP 291784A JP H0565585 B2 JPH0565585 B2 JP H0565585B2
- Authority
- JP
- Japan
- Prior art keywords
- boat
- vapor deposition
- plate
- view
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
本発明は熱伝導の悪い物質の蒸着に用いられる
蒸着用ボートに関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a deposition boat used for deposition of a substance with poor thermal conductivity.
一般に、真空蒸着を行なうには、抵抗加熱方式
によるボート型が多く用いられている。即ち、薄
板に凹部を設け、この凹部に蒸着物質を装填し、
ボート両端を電極に接続して通電して蒸着物質を
昇温させる。 In general, a boat-type film using a resistance heating method is often used for vacuum evaporation. That is, a recess is provided in a thin plate, a vapor deposition substance is loaded into the recess,
Both ends of the boat are connected to electrodes and electricity is applied to raise the temperature of the deposited material.
しかしながら、熱伝導率の小さい物質の蒸着を
行なう場合にはしばしば蒸着物質が突沸し、蒸着
基板に塊状の蒸発物が附着し、蒸着基板に形成さ
れた薄膜に重大な欠陥を及ぼすという問題が生じ
ている。 However, when vapor-depositing a substance with low thermal conductivity, the vapor-deposited substance often bumps, causing lumps of evaporated material to adhere to the vapor-deposition substrate, causing serious defects in the thin film formed on the vapor-deposition substrate. ing.
本発明の目的は、前述の従来技術の欠点を改良
し、熱伝導の悪い物質の蒸着でも高品質の薄膜を
作製しうる蒸着用ボートを提供することである。 An object of the present invention is to improve the drawbacks of the prior art described above and to provide a deposition boat capable of producing a high-quality thin film even when depositing a substance with poor thermal conductivity.
すなわち本発明は、１以上の孔が設けられた良
熱伝導性物質からなる板が、蒸着物質を装填する
ボートの凹部に配置されたことを特徴とする。 That is, the present invention is characterized in that a plate made of a material with good thermal conductivity and provided with one or more holes is placed in a recessed part of a boat into which a vapor deposition material is loaded.
以下、図面を用いて詳細に説明する。 Hereinafter, it will be explained in detail using the drawings.
第１図は従来の蒸着用ボードの断面図である。
ボート本体１の凹部に蒸着物質２が装填される。
ボート端３，３′を電極（図示せず）に接続して
通電して蒸着物質を昇温させる。このとき、ボー
ト凹部の底の部分にある蒸着物質２′の温度は、
発熱部に近いため、ほぼボート底の温度に等し
い。一方、蒸着物質の熱伝導が悪い場合には、ボ
ート凹部の上の方にある蒸着物質２″の温度は前
記蒸着物質２′の温度よりもかなり低くなる。し
たがつて、ボートを昇温していくと、先ず、ボー
ト凹部の底の蒸着物質２′が蒸発する。それ故、
ボート上方にある蒸着物質２″は蒸発温度に達す
る前に下から吹き飛ばされるため、蒸着基板に塊
状に被着される。 FIG. 1 is a sectional view of a conventional deposition board.
A vapor deposition material 2 is loaded into a recessed portion of a boat body 1.
The boat ends 3, 3' are connected to electrodes (not shown) and electricity is applied to raise the temperature of the vapor deposited material. At this time, the temperature of the vapor deposited material 2' at the bottom of the boat recess is:
Because it is close to the heat generating part, the temperature is almost equal to the bottom of the boat. On the other hand, if the thermal conductivity of the vapor deposition material is poor, the temperature of the vapor deposition material 2'' located above the boat recess will be much lower than the temperature of the vapor deposition material 2'. As the process progresses, the deposited material 2' at the bottom of the boat recess evaporates first.
The vapor deposition material 2'' above the boat is blown off from below before reaching the evaporation temperature, so that it is deposited in bulk on the vapor deposition substrate.
第２図は本発明の蒸着用ボート凹部に配置され
る板の一例の平面図（第２図Ａ）と正面図（第２
図Ｂ）である。板２０の中に孔２１が多数設けら
れている。 FIG. 2 shows a plan view (FIG. 2 A) and a front view (FIG. 2
Figure B). A large number of holes 21 are provided in the plate 20.
第３図は本発明の蒸着用ボートに用いられる打
抜き板の他の例の平面図（第３図Ａ）と正面図
（第３図Ｂ）である。孔３０が多数設けられてい
る薄板３１をわく３２にとりつけることにより打
抜き板が形成されている。 FIG. 3 is a plan view (FIG. 3A) and a front view (FIG. 3B) of another example of a punched plate used in the vapor deposition boat of the present invention. A punched plate is formed by attaching a thin plate 31 with a large number of holes 30 to a frame 32.
第４図は本発明の蒸着用ボートの一例の断面図
である。ボート本体１の凹部に第２図或いは第３
図に示したような板４０が設けられており、その
間に蒸着物質２が装填される。 FIG. 4 is a sectional view of an example of the vapor deposition boat of the present invention. 2 or 3 in the recess of the boat body 1.
A plate 40 as shown in the figure is provided, between which the vapor deposition substance 2 is loaded.
第５図は本発明の蒸着用ボートの他の例の平面
図（第５図Ａ）と断面図（第５図Ｂ）である。ボ
ート本体１の凹部に板５０が設けられている。第
５図において、貫通孔を有する板のかわりにただ
の板を設けたものは、熱的な効果はほぼ同じ効果
が得られるが、各領域に均等に蒸着物質を装填す
るのが困難となるので、本発明のような貫通孔を
有する板であることが不可欠となる。 FIG. 5 is a plan view (FIG. 5A) and a cross-sectional view (FIG. 5B) of another example of the vapor deposition boat of the present invention. A plate 50 is provided in the concave portion of the boat body 1. In Figure 5, if a plain plate is provided instead of a plate with through holes, almost the same thermal effect can be obtained, but it becomes difficult to load the vapor deposition material evenly in each area. Therefore, it is essential that the plate has through-holes as in the present invention.
ボート本体の材料としては、通常のモリブデ
ン、タンタル、タングステン等が用いられる。打
抜き板の材料としては良熱伝導体であることが必
要であるが高融点金属が望ましく、とくに、モリ
ブデン、白金、タンタル、タングステンが望まし
い。板の厚さ及び孔径は、ボート本体の大きさ及
び板厚にも依存するが、おおむね0.05〜２mm、
0.5〜10mmが良好である。打抜き板とボート本体
とは電気的に接触していてもいなくともよい。 Common materials such as molybdenum, tantalum, and tungsten are used for the boat body. The material for the punched plate needs to be a good thermal conductor, but metals with high melting points are desirable, with molybdenum, platinum, tantalum, and tungsten being particularly desirable. The thickness of the plate and the hole diameter depend on the size of the boat body and the thickness of the plate, but are approximately 0.05 to 2 mm.
0.5-10mm is good. The punched plate and the boat body may or may not be in electrical contact.
さらに、本発明は上蓋付きボートにも適用でき
る。第６図は従来の上蓋付き蒸着用ボートの断面
図である。ボート本体１と上蓋１００と中間板１
０１で構成てれている。なお、中間板１０１はな
い場合もある。上蓋及び中間板には開口１０２，
１０３が設けられている。このような上蓋付きボ
ートの場合でも、板を設けることにより、欠陥の
ない薄膜を形成することができる。 Furthermore, the present invention can also be applied to a boat with a top. FIG. 6 is a sectional view of a conventional vapor deposition boat with an upper lid. Boat body 1, upper lid 100, and intermediate plate 1
It consists of 01. Note that the intermediate plate 101 may not be provided. The upper lid and the middle plate have openings 102,
103 is provided. Even in the case of such a boat with a top lid, a defect-free thin film can be formed by providing a plate.
以下、本発明の実施例を説明する。 Examples of the present invention will be described below.
実施例 １
板厚0.2mmのモリブデン製ボートの凹部に２mm
φの孔を多数設けた板厚0.05mmの打板き板を第４
図のように３mm間隔で３枚設け、５−アミノ−
２，３−ジシアノ−８−〔（４−エトキシ）アニリ
ノ〕−１，４−ナフトキノン色素を蒸着物質とし
て装填した。このボートに通電することにより、
1.2mm厚直径120mmのPMMA円板上に700Åの色素
膜を形成して追加書き込み可能光デイスクを作製
した。蒸着時の真空度は２×10-5Torr以下とし、
ボート温度は230〜240℃とした。光デイスク欠陥
測定装置により、本発明のボートを用いて作製さ
れた光デイスクの欠陥率とメツシユのない通常の
ボートを用いて作製された光デイスクの欠陥率と
を測定すると、本発明の蒸着用ボートを用いた方
が、はるかに少ない欠陥率であつた。Example 1 2 mm in the recess of a molybdenum boat with a plate thickness of 0.2 mm
A 0.05 mm thick plate with many φ holes was used as the fourth plate.
As shown in the figure, three sheets are provided at 3 mm intervals, and 5-amino-
2,3-dicyano-8-[(4-ethoxy)anilino]-1,4-naphthoquinone dye was loaded as the deposited material. By energizing this boat,
A 700 Å dye film was formed on a PMMA disk with a thickness of 1.2 mm and a diameter of 120 mm to fabricate an optical disk capable of additional writing. The degree of vacuum during vapor deposition is 2×10 -5 Torr or less.
The boat temperature was 230-240°C. When the defect rate of an optical disk manufactured using the boat of the present invention and the defect rate of an optical disk manufactured using an ordinary boat without a mesh are measured using an optical disk defect measuring device, it is found that Using boats had a much lower defect rate.
実施例 ２
上蓋板厚0.1mm、本体板厚0.1mmのモリブデン製
ボートの凹部に２mmφの孔を多数設けた板厚0.05
mmの打抜き板を第５図のように３mm間隔で３枚設
け、実施例１と同様にして光デイスクを作製し
た。本実施例でも本発明のボートを用いた方がは
るかに少ない欠陥率であつた。Example 2 A molybdenum boat with a top cover plate thickness of 0.1 mm and a main body plate thickness of 0.1 mm, with a plate thickness of 0.05 in which many holes of 2 mmφ were provided in the concave part.
An optical disk was produced in the same manner as in Example 1 by providing three punched plates of 3 mm in diameter at 3 mm intervals as shown in FIG. In this example as well, the defect rate was much lower when the boat of the present invention was used.
実施例 ３
実施例２と同様にして、酸化バナジウムフタロ
シアニン膜を900Å蒸着して光デイスクを作製し
た。本実施例でも本発明のボートを用いた方がは
るかに少ない欠陥率であつた。Example 3 In the same manner as in Example 2, a vanadium oxide phthalocyanine film was deposited to a thickness of 900 Å to produce an optical disk. In this example as well, the defect rate was much lower when the boat of the present invention was used.
以上のように、本発明のボートは従来のボート
と比較して膜欠陥を少なくできる。 As described above, the boat of the present invention can reduce membrane defects compared to conventional boats.
第１図は従来の蒸着用ボートの断面図、第２図
Ａ，Ｂは本発明の蒸着用ボートに用いられる板の
一例の平面図と正面図、第３図Ａ，Ｂは本発明の
蒸着用ボートに用いられる打抜き板の他の例の平
面図と正面図、第４図は本発明の蒸着用ボートの
一例の断面図、第５図Ａ，Ｂは本発明の蒸着用ボ
ートの他の例の平面図と横からみた断面図、第６
図は従来の上蓋付き蒸着用ボートの断面図であ
る。
図において、１はボート本体、２，２′，２″は
蒸着物質、３，３′はボート端、２０，３１は板、
２１，３０は孔、３２はわく、４０，５０は打抜
き版、１００は上蓋、１０１は中間板、１０２，
１０３は開口を示す。
Fig. 1 is a sectional view of a conventional vapor deposition boat, Fig. 2 A and B are a plan view and a front view of an example of a plate used in the vapor deposition boat of the present invention, and Fig. 3 A and B are a sectional view of a vapor deposition boat of the present invention. FIG. 4 is a cross-sectional view of an example of the vapor deposition boat of the present invention, and FIGS. 5A and B are other examples of the vapor deposition boat of the present invention. Example plan view and cross-sectional view from the side, No. 6
The figure is a sectional view of a conventional vapor deposition boat with an upper lid. In the figure, 1 is the boat body, 2, 2', 2'' are vapor deposition materials, 3, 3' are boat ends, 20, 31 are plates,
21 and 30 are holes, 32 is a frame, 40 and 50 are punching plates, 100 is a top cover, 101 is an intermediate plate, 102,
103 indicates an opening.
Claims (1)
からなる板が、蒸着物質を装填するボートの凹部
に３面以上配置されていることを特徴とする蒸着
用ボート。1. A vapor deposition boat, characterized in that three or more plates made of a material with good thermal conductivity and provided with one or more through holes are arranged on three or more sides in a concave portion of the boat into which a vapor deposition material is loaded.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP291784A JPS60149767A (en) | 1984-01-11 | 1984-01-11 | Boat for vapor deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP291784A JPS60149767A (en) | 1984-01-11 | 1984-01-11 | Boat for vapor deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60149767A JPS60149767A (en) | 1985-08-07 |
| JPH0565585B2 true JPH0565585B2 (en) | 1993-09-20 |
Family
ID=11542698
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP291784A Granted JPS60149767A (en) | 1984-01-11 | 1984-01-11 | Boat for vapor deposition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60149767A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5358778B2 (en) * | 2005-09-20 | 2013-12-04 | 国立大学法人東北大学 | Film forming apparatus, evaporation jig, and measuring method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59113174A (en) * | 1982-12-17 | 1984-06-29 | Matsushita Electric Ind Co Ltd | Method and device for forming thin film |
-
1984
- 1984-01-11 JP JP291784A patent/JPS60149767A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60149767A (en) | 1985-08-07 |
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