JPH0567876A - Manufacture of flexible multilayer printed circuit wiring board - Google Patents

Manufacture of flexible multilayer printed circuit wiring board

Info

Publication number
JPH0567876A
JPH0567876A JP22594191A JP22594191A JPH0567876A JP H0567876 A JPH0567876 A JP H0567876A JP 22594191 A JP22594191 A JP 22594191A JP 22594191 A JP22594191 A JP 22594191A JP H0567876 A JPH0567876 A JP H0567876A
Authority
JP
Japan
Prior art keywords
wiring board
printed circuit
circuit wiring
layer
multilayer printed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22594191A
Other languages
Japanese (ja)
Inventor
Toshishige Uehara
寿茂 上原
Tomohisa Ota
共久 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP22594191A priority Critical patent/JPH0567876A/en
Publication of JPH0567876A publication Critical patent/JPH0567876A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To contrive the efficient production of a flexible multilayer printed circuit wiring board, small in the positional deviation of a base material film at the time of lamination and a dimensional change in the base material film and superior in peel strength, soldering temperature resistance and electrolytic corrosion resistance. CONSTITUTION:A flexible multilayer printed circuit wiring board has a printed circuit wiring board consisting of a base material film 2 with conductive metal layer adhered on both surfaces of the film 2 and 5 subjected to circuit processing, as a circuit for at least one layer or more of an internal layer and a base material film 2 to be adhered with a conductive metal layer 3 on one surface is superposed on the outermost layer of this printed circuit wiring board via a bonding agent layer 1, which is hardened with a radiation, in such a way that the layer 3 is located upward. After that, the high-energy radiation is emitted over the outermost layer to harden the layer 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はフレキシブル多層印刷回
路配線板の製造方法に関する。
FIELD OF THE INVENTION The present invention relates to a method of manufacturing a flexible multilayer printed circuit wiring board.

【0002】[0002]

【従来の技術】フレキシブル多層印刷回路配線板は、従
来4層のフレキシブル印刷回路配線板の場合を例にとっ
て説明すると、両面MCFの片面回路加工品同士を接着
剤層を介して多層化する「ピンラミネート方式」や両面
MCFの両面回路加工品を間に挟み、その両側から片面
が銅箔、他面が接着剤で構成されるMCFを重ね合わせ
る「コア方式」で多層化し、その後、加熱・加圧して接
着剤層を硬化させることにより得られてきた。
2. Description of the Related Art A flexible multilayer printed circuit wiring board will be described by taking a conventional four-layer flexible printed circuit wiring board as an example. In this case, a single-sided circuit processed product of double-sided MCF is multilayered through an adhesive layer. "Laminate method" or "core method" in which double-sided circuit processed products of double-sided MCF are sandwiched between and MCF composed of copper foil on one side and adhesive on the other side is laminated from both sides, and then heating / heating is performed. It has been obtained by pressing to cure the adhesive layer.

【0003】[0003]

【発明が解決しようとする課題】近年フレキシブル印刷
回路配線板に対して、多層化の要求が高まりつつある。
しかし、従来の製造法では、加熱・加圧プロセスを必要
とし、それによって多層化された配線板間の位置ずれや
基材フィルムの熱膨張、加熱収縮などが原因で寸法変化
を生じるため、高度な寸法精度が要求されるフレキシブ
ル多層印刷回路配線板では多層化時の大きな障害となっ
ていた。さらに通常の熱硬化プロセスでは硬化に多大な
時間を要するため、生産効率が悪かった。本発明はかか
る点に鑑みなされたものであって、多層化配線時の位置
ずれや基材フィルムの寸法変化が小さく、さらにピール
強度、はんだ耐熱、耐電食性などの基本特性にも優れた
フレキシブル多層印刷回路配線板を効率よく生産する方
法を提供せんとするものである。
In recent years, there has been an increasing demand for multilayered flexible printed circuit wiring boards.
However, the conventional manufacturing method requires a heating / pressurizing process, which causes dimensional changes due to misalignment between multilayered wiring boards, thermal expansion and heat shrinkage of the base film, etc. Flexible multi-layer printed circuit wiring boards that require high dimensional accuracy have been a major obstacle to multi-layering. Further, in the usual heat curing process, it takes a long time to cure, and thus the production efficiency is poor. The present invention has been made in view of the above points, and a flexible multilayer excellent in basic characteristics such as peeling strength, solder heat resistance, and electrolytic corrosion resistance, in which misalignment and dimensional change of the base material film during multilayer wiring are small. It is intended to provide a method for efficiently producing a printed circuit wiring board.

【0004】[0004]

【課題を解決するための手段】本発明は、従来の熱硬化
反応の代わりに高エネルギー放射線により接着剤層を硬
化させることによって、前記の問題点を解決したもので
ある。すなわち本発明は、基材フィルムの両面に接着す
る導電性金属層を回路加工した印刷回路配線板を少なく
とも1層以上内層用回路として有し、これに放射線によ
り硬化する接着剤層を介して、最外層に、片面に導電性
金属層が接着する基材フィルムを導電性金属層が上にな
るように重ね合わせたのち、最外層上より高エネルギー
の放射線を照射し、接着剤層を硬化させることを特徴と
するフレキシブル多層印刷回路配線板の製造方法に関す
る。
SUMMARY OF THE INVENTION The present invention solves the above problems by curing the adhesive layer with high energy radiation instead of the conventional thermosetting reaction. That is, the present invention has a printed circuit wiring board circuit-processed conductive metal layers that adhere to both sides of the base film as at least one inner layer circuit, via an adhesive layer that is cured by radiation, After overlaying the outermost layer with a base film on which the conductive metal layer is bonded on one side so that the conductive metal layer is on top, irradiating higher energy radiation than the outermost layer to cure the adhesive layer And a method for manufacturing a flexible multilayer printed circuit wiring board.

【0005】次に本発明に用いる基材フィルムとして
は、耐熱性を有するポリイミドフィルム、ポリアミドフ
ィルム、ポリエステルフィルムなどのプラスチックフィ
ルムが好適に用いられる。このうちポリイミドフィルム
が特に優れているが、その厚みは、耐屈曲性、強度、電
子線透過性などから12.5〜125μmが好ましく、
25〜50μmがさらに適している。また必要に応じて
表面をサンドブラスト処理をしてもよい。
Next, as the substrate film used in the present invention, a plastic film such as a heat-resistant polyimide film, a polyamide film or a polyester film is preferably used. Among them, the polyimide film is particularly excellent, but its thickness is preferably 12.5 to 125 μm in view of bending resistance, strength, electron beam transparency, and the like.
25 to 50 μm is more suitable. If necessary, the surface may be sandblasted.

【0006】次に本発明で用いられる導電性金属箔とし
ては銅箔、銀、金、アルミ箔などを挙げることができる
が、電気伝導性、価格などの点から銅箔が優れており、
その厚みはフレキシブル印刷回路配線板用に使う場合、
50μm以下、更には10〜40μmが望ましい。ま
た、材質に耐屈曲性が望まれることから電解銅箔よりも
圧延銅箔が望ましく、その表面には、接着剤の濡れ性を
向上させるためにニッケルめっきなどを施してもよい。
Next, as the conductive metal foil used in the present invention, copper foil, silver, gold, aluminum foil and the like can be mentioned. Copper foil is superior in terms of electrical conductivity, price, etc.
When used for flexible printed circuit wiring boards, its thickness is
It is preferably 50 μm or less, more preferably 10 to 40 μm. Further, a rolled copper foil is more preferable than an electrolytic copper foil because the material is desired to have bending resistance, and its surface may be plated with nickel or the like in order to improve the wettability of the adhesive.

【0007】次に本発明で用いる接着剤層について詳述
する。本発明でいう接着剤層とは上述した基材フィルム
の片面または両面に接着剤を塗工したものである。接着
剤としては、分子内に不飽和2重結合を有するブロック
共重合エラストマーで、ポリブタジエン、ポリイソプレ
ンなどのゴム性ジエン成分を分子中に含み、その両端ま
たは片端がポリスチレン又はポリスチレン誘導体がブロ
ック共重合されているポリマーである。これらのポリマ
ーの具体例としては、ポリ−(スチレン−ブタジエ
ン)、ポリ−(スチレン−イソプレン)、ポリ−(スチ
レン−ブタジエン−スチレン)、ポリ−(スチレン−イ
ソプレン−スチレン)などが挙げられる。これらは単独
で用いてもよいし、ブレンドして用いてもよい。これら
のポリマーが電子線で十分に硬化し、耐熱性を持つため
には、ブタジエン又はイソプレンのゴム成分が60wt%
以上であることが好ましい。また接着剤に十分な接着強
度を保持させるために、その分子量は50,000以上
であることが望ましいが、その値が500,000を超
えると有機溶媒に対する分散性が悪くなり好ましくな
い。
Next, the adhesive layer used in the present invention will be described in detail. The term “adhesive layer” as used in the present invention refers to the above-mentioned base film coated with an adhesive on one side or both sides. The adhesive is a block copolymer elastomer having an unsaturated double bond in the molecule, which contains a rubber diene component such as polybutadiene or polyisoprene in the molecule, and polystyrene or polystyrene derivative is block copolymerized at both ends or one end thereof. Is a polymer. Specific examples of these polymers include poly- (styrene-butadiene), poly- (styrene-isoprene), poly- (styrene-butadiene-styrene), poly- (styrene-isoprene-styrene) and the like. These may be used alone or in a blend. In order for these polymers to be sufficiently cured by electron beams and to have heat resistance, the rubber component of butadiene or isoprene is 60 wt%
The above is preferable. Further, in order to maintain sufficient adhesive strength in the adhesive, its molecular weight is preferably 50,000 or more, but when the value exceeds 500,000, dispersibility in an organic solvent is deteriorated, which is not preferable.

【0008】接着剤として用いる場合に、ポリマーの希
釈溶媒としてはMEK、トルエン、酢酸エチル、ベンゼ
ン、THF、四塩化炭素、ヘキサン等から相溶性、分散
性の優れたものを選ぶことができる。寸法安定性に大き
な影響を及ぼす溶媒の乾燥温度は使用した溶媒の沸点と
加熱収縮率の温度依存性で決まるが、通常は200℃以
下で、150℃以下がさらに好ましい。また、本発明で
用いられる接着剤には不飽和二重結合の安定性を保つた
めに、ハイドロキノン、ベンゾキノンなどの重合禁止剤
や酸化防止剤を配合してもよい。
When used as an adhesive, the polymer diluting solvent can be selected from MEK, toluene, ethyl acetate, benzene, THF, carbon tetrachloride, hexane and the like, which have excellent compatibility and dispersibility. The drying temperature of the solvent, which has a great influence on the dimensional stability, is determined by the boiling point of the solvent used and the temperature dependence of the heat shrinkage, but it is usually 200 ° C or lower, and more preferably 150 ° C or lower. Further, the adhesive used in the present invention may contain a polymerization inhibitor such as hydroquinone or benzoquinone or an antioxidant in order to maintain the stability of the unsaturated double bond.

【0009】一方、放射線の照射線源としては、電子
線、紫外線、X線、γ線などがあるが、取扱いやすさ、
安全性などの点から電子線が最も好ましい。そのエネル
ギーレベルは電子線が銅箔を貫通する必要性から500
KeV以上のものが必須であるが、透過力の大きい1M
eV以上の高エネルギー型がさらに好ましい。
On the other hand, there are electron beams, ultraviolet rays, X-rays, γ-rays, etc. as radiation irradiation radiation sources.
The electron beam is most preferable from the viewpoint of safety. The energy level is 500 because the electron beam needs to penetrate the copper foil.
KeV or higher is indispensable, but 1M with high penetrating power
A high energy type of eV or higher is more preferable.

【0010】次に本発明の接着剤を硬化させる放射線の
線量は、通常0.5〜100Mradの範囲で使用でき
るが、1.0〜50Mradがさらに好ましい。線量が
0.5Mrad未満だと十分な架橋が得られないことが
あり、100Mradを超えるとポリマーの分解が始ま
る。なお、電子線照射の際、注意を要するのは、活性ラ
ジカルの酸素による失活である。これを避けるために
は、事前に接着剤を真空脱泡した上で、基材フィルムに
塗工し溶媒を乾燥後、気泡を巻き込まないように直ちに
銅箔をラミネートすることが好ましい。この時場合によ
ってはラミネート後、加熱エージングを行ってもよい。
The radiation dose for curing the adhesive of the present invention can be used usually in the range of 0.5 to 100 Mrad, but 1.0 to 50 Mrad is more preferable. If the dose is less than 0.5 Mrad, sufficient crosslinking may not be obtained, and if it exceeds 100 Mrad, the polymer starts to decompose. At the time of electron beam irradiation, what needs attention is deactivation of active radicals by oxygen. In order to avoid this, it is preferable that the adhesive is degassed in vacuum in advance, then the base film is coated with the solvent and the solvent is dried, and then the copper foil is immediately laminated so as not to entrap air bubbles. At this time, heat aging may be performed after the lamination depending on the case.

【0011】[0011]

【作用】本発明の効果が発現する理由は必ずしも明確で
はないが、本方法の特徴の1つである銅箔上から銅箔の
反対面にある接着剤が硬化する理由は、図2で説明され
る。
The reason why the effect of the present invention is exhibited is not always clear, but the reason why the adhesive on the opposite surface of the copper foil is cured from above the copper foil, which is one of the features of this method, is explained in FIG. To be done.

【0012】すなわち、1.0MeV以上の高電圧タイ
プの電子線は、その透過能が比重1の物質において最大
4.0mmの透過力で、比重が約8.9で35μm厚の銅
箔を貫通する。従って銅箔裏面にある接着剤を硬化させ
ることが可能で、これにより多層化品の加熱・加圧によ
る接着剤の硬化プロセスが不要となり、生産効率が向上
する。また本発明品の位置ずれが小さいことは、高温の
加熱・加圧プロセスがないことから明らかであるが、さ
らに寸法変化率が小さい理由は、次のように考案され
る。すなわち、従来の熱硬化型接着剤では硬化温度に昇
温させ、その後室温に冷却する熱履歴を経ることによっ
て内部歪みをもち、銅箔エッチングの工程で歪みが解放
され寸法変化を生じている。従って電子線反応を使った
本発明においては、高温熱履歴を経ることなく接着剤を
硬化できるため、寸法変化が少ないと考えられる。また
基板のそり・ねじれの原因となる接着剤の重合収縮の程
度は反応点の数に依存するが、本発明の接着剤のように
低Tgのゴム系プレポリマーを出発物質として使用した
場合、反応点が少なく、また、流動による内部歪みの緩
和機構が働き、それ・ねじれが小さく抑えられているも
のと推測される。また、電食を生じるメカニズムは次の
ように考案される。従来のNBRのような高極性ポリマ
ーはその合成時に微量のイオン性不純物がポリマー中に
混入することは避けられない。この不純物が媒体となっ
て回路に電圧が印加された時に、絶縁されている銅間で
電気分解が生じ、回路間で短絡が発生する。しかし、請
求項5で記述したようなポリマーの場合、かかるイオン
性不純物が皆無のため、このような現象が発生しないも
のと考えられる。
That is, a high-voltage type electron beam of 1.0 MeV or more has a maximum penetrating power of 4.0 mm in a substance having a specific gravity of 1 and has a specific gravity of about 8.9 and penetrates a 35 μm-thick copper foil. To do. Therefore, it is possible to cure the adhesive on the back surface of the copper foil, which eliminates the need for the adhesive curing process by heating and pressurizing the multilayered product, thus improving the production efficiency. Further, it is clear that the product of the present invention has a small displacement because there is no high temperature heating / pressurizing process, and the reason why the dimensional change rate is smaller is devised as follows. That is, the conventional thermosetting adhesive has an internal strain due to the heat history of heating to the curing temperature and then cooling to room temperature, and the strain is released during the copper foil etching step to cause a dimensional change. Therefore, in the present invention using the electron beam reaction, it is considered that the dimensional change is small because the adhesive can be cured without undergoing a high temperature heat history. Further, the degree of polymerization shrinkage of the adhesive which causes warpage and twist of the substrate depends on the number of reaction points, but when a rubber prepolymer having a low Tg is used as a starting material like the adhesive of the present invention, It is presumed that there are few reaction points, and that the internal strain-induced relaxation mechanism of the flow works, and that / twist is suppressed. Further, the mechanism that causes electrolytic corrosion is devised as follows. In the case of a highly polar polymer such as the conventional NBR, it is inevitable that a trace amount of ionic impurities are mixed into the polymer during its synthesis. When a voltage is applied to the circuits by using these impurities as a medium, electrolysis occurs between the insulated copper and a short circuit occurs between the circuits. However, in the case of the polymer as described in claim 5, it is considered that such a phenomenon does not occur because there is no such ionic impurity.

【0013】[0013]

【実施例】次に実施例において本発明を詳述するが、本
発明はこれに限定されるものではない。
The present invention will be described in more detail with reference to the following examples, but the present invention is not limited thereto.

【0014】実施例1 (1)両面接着剤付きフィルムの作り方 ポリ−(スチレン−ブタジエン−スチレン)ブロック共
重合体(シェル化学(株)製、商品名TR−1150、
ブタジエン成分62wt%、重量平均分子量12万)をト
ルエンに溶解し、15wt%溶液にしたのち、ハンドロキ
ノンモノメチルエーテルをポリマー重量の1,000pp
m になるように加えた。この溶液をポリイミドフィルム
(東レ・デュポン(株)製、商品名カプトン100H、
両面をサンドブラスト処理、厚さ25μm)に固形分厚
さが40μmになるようにフィルムの両面に塗布し、1
00℃で10分間乾燥炉で溶媒を乾燥させた。 (2)両面MCFの作り方 (1)で得た両面接着フィルムに圧延銅箔(日鉱グール
ド(株)製、両面ニッケル処理、厚さ35μm)を脱泡
しながら気泡が混入しないように注意して、接着剤付き
のポリイミドフィルムの両面にラミネートし、両面銅箔
付きMCFを得た。この両面MCFを銅箔上から高エネ
ルギー電子線を15Mrad照射した。(加速電圧1.
0MeV、電流5.0mA)。 (3)片面FPCの作り方 (他面は銅箔) (2)で得られた両面MCFの片面にレジストを貼付
け、片面のみパターン焼付、現像、エッチング、レジス
ト剥離の工程を順次施し、回路形成をした。他面は全面
エッチングした。 (4)両面FPCの作り方 (2)で得られたMCFの両面にレジストを貼付け、両
面ともパターン焼付、現像、エッチング、レジスト剥離
の工程を順次施し、両面とも回路形成をした。 (5)4層FPCの作りかた (4)で得た両面FPCの両側に(1)で得た接着フィ
ルムを介して、(3)で得た片面FPCの回路面が外側
になるようにして重ね合わせた。これを120℃、10
kg/cm2で10分間加熱・加圧し、(2)と同様に高エネ
ルギー電子線を15Mrad最外層から照射した。最後
に(3)と同様に、最外層の両面の銅箔にレジストを貼
付け、パターン焼付、現像、エッチング、レジスト剥離
の工程を施し、4層FPCを得た。(図1参照) この4層FPCに対して、(1)位置ずれ(2)寸法変
化率(3)ピール強度(4)はんだ耐熱(5)耐電食性
の各試験を行った。その結果を表1に示す。
Example 1 (1) How to make a film with a double-sided adhesive Poly- (styrene-butadiene-styrene) block copolymer (manufactured by Shell Chemical Co., trade name TR-1150,
A butadiene component (62 wt%, weight average molecular weight: 120,000) was dissolved in toluene to form a 15 wt% solution, and handloquinone monomethyl ether was added to the polymer weight of 1,000 pp.
Added to be m. A polyimide film (Toray DuPont Co., Ltd., trade name Kapton 100H,
Both sides are sandblasted, thickness 25μm) and coated on both sides of the film so that the solid content thickness is 40μm.
The solvent was dried in a drying oven at 00 ° C for 10 minutes. (2) Preparation of double-sided MCF Rolled copper foil (Nikko Gould Co., Ltd., double-sided nickel treatment, thickness 35 μm) is defoamed on the double-sided adhesive film obtained in (1), but be careful not to mix air bubbles. Then, it was laminated on both sides of a polyimide film with an adhesive to obtain an MCF with double-sided copper foil. This double-sided MCF was irradiated with 15 Mrad of a high energy electron beam from above the copper foil. (Acceleration voltage 1.
0 MeV, current 5.0 mA). (3) How to make single-sided FPC (copper foil on the other side) A resist is attached to one side of the double-sided MCF obtained in (2), and pattern printing, development, etching and resist stripping are sequentially performed on only one side to form a circuit. did. The other surface was entirely etched. (4) Method of making double-sided FPC Resists were attached to both sides of the MCF obtained in (2), and pattern baking, development, etching, and resist stripping were sequentially performed on both sides to form a circuit on both sides. (5) How to make a 4-layer FPC With the adhesive film obtained in (1) on both sides of the double-sided FPC obtained in (4), the circuit surface of the single-sided FPC obtained in (3) should be on the outside. I put them together. This is 120 ℃, 10
After heating and pressurizing at kg / cm 2 for 10 minutes, a high energy electron beam was irradiated from the outermost layer of 15 Mrad as in (2). Finally, in the same manner as in (3), a resist was attached to the copper foil on both sides of the outermost layer, and the steps of pattern baking, development, etching and resist stripping were performed to obtain a 4-layer FPC. (See FIG. 1) Each test of (1) misalignment (2) dimensional change rate (3) peel strength (4) solder heat resistance (5) electrolytic corrosion resistance was performed on this four-layer FPC. The results are shown in Table 1.

【0015】実施例2 実施例1で使ったポリ−(スチレン−ブタジエン−スチ
レン)のブタジエン成分62wt%の代わりに70wt%の
もの(シェル化学(株)製、商品名TR−1101、重
量平均分子量11万)を接着剤として使用し、実施例1
と同様にして4層FPCを得、同様の試験を行った。
Example 2 70% by weight of poly- (styrene-butadiene-styrene) used in Example 1 instead of 62% by weight of the butadiene component (manufactured by Shell Chemical Co., trade name TR-1101, weight average molecular weight) 110,000) as an adhesive,
A four-layer FPC was obtained in the same manner as above, and the same test was performed.

【0016】実施例3 実施例1で使ったポリ−(スチレン−ブタジエン−スチ
レン)ポリマーの代わりにポリ−(スチレン−イソプレ
ン−スチレン)ポリマー(日本ゼオン(株)製、商品名
SIS−5000、重量平均分子量10万)を接着剤と
して使用し、実施例1と同様にして4層FPCを得、同
様の試験を行った。
Example 3 Instead of the poly- (styrene-butadiene-styrene) polymer used in Example 1, a poly- (styrene-isoprene-styrene) polymer (manufactured by Nippon Zeon Co., Ltd., trade name SIS-5000, weight) was used. A four-layer FPC was obtained in the same manner as in Example 1 using an average molecular weight of 100,000) as an adhesive, and the same test was performed.

【0017】実施例4 実施例1で使ったポリ−(スチレン−ブタジエン−スチ
レン)ポリマーの代わりにブタジエン成分が53.5wt
%のポリ−(スチレン−ブタジエン)ポリマー(日本ゼ
オン(株)製、商品名Nipol、NS−220、重量
平均分子量約10万)を接着剤として使用し、実施例1
と同様にして4層FPCを得、同様の試験を行った。
Example 4 The poly- (styrene-butadiene-styrene) polymer used in Example 1 was replaced by 53.5 wt% of butadiene component.
% Poly- (styrene-butadiene) polymer (manufactured by Nippon Zeon Co., Ltd., trade name Nipol, NS-220, weight average molecular weight about 100,000) was used as an adhesive, and Example 1 was used.
A four-layer FPC was obtained in the same manner as above, and the same test was performed.

【0018】比較例1 実施例1で使用した高エネルギー電子線照射装置の代わ
りに、加速電圧が200keVの低エネルギー電子線照
射装置を使って、実施例1と同様にして4層FPCを
得、同様の試験を行った。
Comparative Example 1 In place of the high energy electron beam irradiation apparatus used in Example 1, a low energy electron beam irradiation apparatus having an accelerating voltage of 200 keV was used in the same manner as in Example 1 to obtain a four-layer FPC. A similar test was conducted.

【0019】比較例2 実施例1で使用したポリ−(スチレン−ブタジエン−ス
チレン)ポリマーの代わりにポリ−アクリロニトリル−
ブタジエン(日本ゼオン(株)製商品名Nipol、N
−1032)/フェノール(日立化成工業(株)製商品
名H−2400)/エポキシ(日本化薬(株)製商品名
BREN−S)硬化剤(橋本化成(株)製商品名BF3
−MEA)/充填剤(昭和電工(株)製商品名ハイジラ
イト42M)を50/30/20/5/70の重量比で
配合したものを接着剤として使った。なお、この接着剤
の硬化は電子線の代わりに170℃・30kg/cm2で60
分間加熱・加圧を使った。
Comparative Example 2 Instead of the poly- (styrene-butadiene-styrene) polymer used in Example 1, poly-acrylonitrile-
Butadiene (trade name Nipol, N manufactured by Nippon Zeon Co., Ltd.)
-1032) / phenol (trade name H-2400 manufactured by Hitachi Chemical Co., Ltd.) / Epoxy (brand name BREN-S manufactured by Nippon Kayaku Co., Ltd.) curing agent (trade name BF 3 manufactured by Hashimoto Kasei Co., Ltd.)
-MEA) / filler (Higelite 42M, trade name, manufactured by Showa Denko KK) was blended at a weight ratio of 50/30/20/5/70 and used as an adhesive. The adhesive is cured at 170 ° C and 30 kg / cm 2 instead of 60 times at 60
Heat and pressure were used for minutes.

【0020】比較例3 実施例1で使用したポリマーの代わりに、ポリ−(アク
リロニトリル−ブタジエン)ポリマー(日本ゼオン
(株)製,商品名Nipol、DN−401)を15wt
%MEK溶液とし、実施例1と同様にして4層FPCを
得、同様の試験を行った。
Comparative Example 3 Instead of the polymer used in Example 1, 15 wt% of poly- (acrylonitrile-butadiene) polymer (manufactured by Nippon Zeon Co., Ltd., trade name Nipol, DN-401) was used.
% MEK solution, a four-layer FPC was obtained in the same manner as in Example 1, and the same test was performed.

【0021】上記実施例及び比較例における試験は次の
ようにして行った。 (1)位置ずれ 約70%の銅箔をエッチング除去した4層用回路パター
ンにおいて、最外層回路と内層回路の位置ずれを肉眼観
察した。 (2)寸法変化率 銅箔付きポリイミドフィルムの銅をすべてエッチングで
除去し、エッチング前後のポリイミドフィルムの寸法変
化を3次元寸法測定装置で測定した。 (3)ピール強度 銅箔付きポリイミドフィルムを40℃、90%RHの恒
温恒湿槽で96Hr保管し、直後に銅箔の引きはがし強
さを測定した。剥離角180゜、剥離速度50mm/min
。 (4)はんだ耐熱 銅箔付きポリイミドフィルムを40℃、90%RHの恒
温恒湿槽で96Hr処理し、直後にはんだバスに1分間
浸漬して異常の有無を観察した。値は異常の生じない最
高温度を表示した。 (5)耐電食性 各実施例で作製したサンプルにライン幅0.2mm、ライ
ン間隔0.2mmの回路を作り、これを85℃・85%R
H中で100V印加し、回路の短絡の有無を漏れ電流で
観察し、異常の発生するまでに要する時間を記した。
The tests in the above Examples and Comparative Examples were conducted as follows. (1) Positional deviation In the circuit pattern for four layers in which about 70% of the copper foil was removed by etching, the positional deviation between the outermost layer circuit and the inner layer circuit was visually observed. (2) Dimensional change rate All the copper of the polyimide film with a copper foil was removed by etching, and the dimensional change of the polyimide film before and after etching was measured by a three-dimensional dimension measuring device. (3) Peel Strength The polyimide film with copper foil was stored in a constant temperature and humidity chamber at 40 ° C. and 90% RH for 96 hours, and immediately after that, the peeling strength of the copper foil was measured. Peeling angle 180 °, peeling speed 50 mm / min
.. (4) Soldering Heat Resistance The polyimide film with copper foil was treated for 96 hours in a thermo-hygrostat at 40 ° C. and 90% RH, and immediately after that, it was immersed in a solder bath for 1 minute and observed for any abnormality. The value indicates the maximum temperature at which no abnormality occurs. (5) Electrolytic corrosion resistance A circuit with a line width of 0.2 mm and a line interval of 0.2 mm was made on the samples prepared in each of the examples, and this was subjected to 85 ° C./85% R
A voltage of 100 V was applied in H, the presence or absence of a short circuit in the circuit was observed by a leakage current, and the time required for occurrence of abnormality was noted.

【0022】[0022]

【表1】 [Table 1]

【0023】[0023]

【発明の効果】本発明による製造方法は実施例からも明
らかなように、製造プロセスが簡単なため、従来煩雑で
あった配線板の生産効率が向上する。さらに本製造方法
により得られた多層化配線は位置ずれや寸法変化率が小
さく、ピール強度、はんだ耐熱、耐電食性などの基本特
性にも優れている。
As is clear from the examples, the manufacturing method according to the present invention has a simple manufacturing process, so that the production efficiency of a wiring board, which was conventionally complicated, is improved. Furthermore, the multilayered wiring obtained by this manufacturing method has a small positional deviation and a small dimensional change rate, and has excellent basic characteristics such as peel strength, solder heat resistance, and electrolytic corrosion resistance.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の工程を説明するための断面
図である。
FIG. 1 is a sectional view for explaining a process of an embodiment of the present invention.

【図2】本発明の作用を説明するための線図で、高エネ
ルギー電子線の透過能力をしめすグラフであり、(a)
はエネルギーレベル1000KVまでの、(b)は1.
5MV以上の電子線の透過能力を示す。
FIG. 2 is a diagram for explaining the operation of the present invention, which is a graph showing the penetrating ability of high-energy electron beams,
Up to an energy level of 1000 KV, (b) is 1.
It shows a penetrating ability of an electron beam of 5 MV or more.

【符号の説明】[Explanation of symbols]

1 接着剤 2 基材フィルム 3 金属箔 4 回路 1 Adhesive 2 Base film 3 Metal foil 4 Circuit

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 基材フィルムの両面に接着する導電性金
属層を回路加工した印刷回路配線板を少なくとも1層以
上内層用回路として有し、これに放射線により硬化する
接着剤層を介して、最外層に、片面に導電性金属層が接
着する基材フィルムを導電性金属層が上になるように重
ね合わせたのち、最外層上より高エネルギーの放射線を
照射し接着剤層を硬化させることを特徴とするフレキシ
ブル多層印刷回路配線板の製造方法。
1. A printed circuit wiring board having a circuit-processed conductive metal layer that adheres to both sides of a base film, has at least one or more layers as a circuit for an inner layer, and an adhesive layer that is cured by radiation is provided on the printed circuit wiring board. The outermost layer, a conductive metal layer is adhered to one side of the base film, the conductive metal layer is placed on top, then the outermost layer is irradiated with high-energy radiation to cure the adhesive layer. And a method for manufacturing a flexible multilayer printed circuit wiring board.
【請求項2】 基材フィルムがポリイミドフィルム又は
ポリエステルフィルムである請求項1記載のフレキシブ
ル多層印刷回路配線板の製造方法。
2. The method for producing a flexible multilayer printed circuit wiring board according to claim 1, wherein the base film is a polyimide film or a polyester film.
【請求項3】 導電性金属層が銅箔である請求項1記載
のフレキシブル多層印刷回路配線板の製造方法。
3. The method for manufacturing a flexible multilayer printed circuit wiring board according to claim 1, wherein the conductive metal layer is a copper foil.
【請求項4】 接着剤層が基材フィルムと分子内に不飽
和2重結合を有するブロック共重合エラストマーよりな
る請求項1記載のフレキシブル多層印刷回路配線板の製
造方法。
4. The method for producing a flexible multilayer printed circuit wiring board according to claim 1, wherein the adhesive layer is composed of a base film and a block copolymer elastomer having an unsaturated double bond in the molecule.
【請求項5】 分子内に不飽和2重結合を有するブロッ
ク共重合エラストマーがポリ−(スチレン−ブタジエン
−スチレン)又はポリ−(スチレン−イソプレン−スチ
レン)、又はポリ−(スチレン−ブタジエン)で、ブタ
ジエン又はイソプレンなどのゴム成分の含有率が重量分
率で60〜90重量%である請求項4記載のフレキシブ
ル多層印刷回路配線板の製造方法。
5. The block copolymer elastomer having an unsaturated double bond in the molecule is poly- (styrene-butadiene-styrene) or poly- (styrene-isoprene-styrene), or poly- (styrene-butadiene), The method for producing a flexible multilayer printed circuit wiring board according to claim 4, wherein the content of the rubber component such as butadiene or isoprene is 60 to 90% by weight.
【請求項6】 分子内に不飽和2重結合を有するブロッ
ク共重合エラストマーの重量平均分子量が50,000
〜500,000の範囲内にある請求項1又は4又は5
記載のフレキシブル多層印刷回路配線板の製造方法。
6. The block copolymer elastomer having an unsaturated double bond in the molecule has a weight average molecular weight of 50,000.
1 or 4 or 5 within the range of 500,000 to 500,000.
A method for manufacturing the flexible multilayer printed circuit wiring board described.
【請求項7】 高エネルギーの放射線の放射線源が電子
線である請求項1記載のフレキシブル多層印刷回路配線
板の製造方法。
7. The method for manufacturing a flexible multilayer printed circuit wiring board according to claim 1, wherein the radiation source of high-energy radiation is an electron beam.
JP22594191A 1991-09-05 1991-09-05 Manufacture of flexible multilayer printed circuit wiring board Pending JPH0567876A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22594191A JPH0567876A (en) 1991-09-05 1991-09-05 Manufacture of flexible multilayer printed circuit wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22594191A JPH0567876A (en) 1991-09-05 1991-09-05 Manufacture of flexible multilayer printed circuit wiring board

Publications (1)

Publication Number Publication Date
JPH0567876A true JPH0567876A (en) 1993-03-19

Family

ID=16837299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22594191A Pending JPH0567876A (en) 1991-09-05 1991-09-05 Manufacture of flexible multilayer printed circuit wiring board

Country Status (1)

Country Link
JP (1) JPH0567876A (en)

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