JPH05696B2 - - Google Patents
Info
- Publication number
- JPH05696B2 JPH05696B2 JP14921182A JP14921182A JPH05696B2 JP H05696 B2 JPH05696 B2 JP H05696B2 JP 14921182 A JP14921182 A JP 14921182A JP 14921182 A JP14921182 A JP 14921182A JP H05696 B2 JPH05696 B2 JP H05696B2
- Authority
- JP
- Japan
- Prior art keywords
- metal salt
- silver halide
- present
- salt particles
- photographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 silver halide Chemical class 0.000 claims description 93
- 229910052709 silver Inorganic materials 0.000 claims description 73
- 239000004332 silver Substances 0.000 claims description 73
- 229910052751 metal Inorganic materials 0.000 claims description 57
- 239000002184 metal Substances 0.000 claims description 57
- 150000003839 salts Chemical class 0.000 claims description 54
- 239000002245 particle Substances 0.000 claims description 46
- 238000011161 development Methods 0.000 claims description 29
- 239000003795 chemical substances by application Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 26
- 238000012545 processing Methods 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 15
- 239000000470 constituent Substances 0.000 claims description 9
- 239000003638 chemical reducing agent Substances 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000004181 carboxyalkyl group Chemical group 0.000 claims description 3
- 125000004964 sulfoalkyl group Chemical group 0.000 claims description 3
- 150000001450 anions Chemical class 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims description 2
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 41
- 239000000839 emulsion Substances 0.000 description 20
- 230000035945 sensitivity Effects 0.000 description 13
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- 239000000975 dye Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 229910021607 Silver chloride Inorganic materials 0.000 description 9
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000004090 dissolution Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 7
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 6
- 239000000084 colloidal system Substances 0.000 description 6
- 108010010803 Gelatin Proteins 0.000 description 5
- 206010034972 Photosensitivity reaction Diseases 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000008273 gelatin Substances 0.000 description 5
- 229920000159 gelatin Polymers 0.000 description 5
- 235000019322 gelatine Nutrition 0.000 description 5
- 235000011852 gelatine desserts Nutrition 0.000 description 5
- 230000036211 photosensitivity Effects 0.000 description 5
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- GRFNBEZIAWKNCO-UHFFFAOYSA-N 3-pyridinol Chemical compound OC1=CC=CN=C1 GRFNBEZIAWKNCO-UHFFFAOYSA-N 0.000 description 4
- KDYVCOSVYOSHOL-UHFFFAOYSA-N 7-methylquinoline Chemical compound C1=CC=NC2=CC(C)=CC=C21 KDYVCOSVYOSHOL-UHFFFAOYSA-N 0.000 description 4
- JRLTTZUODKEYDH-UHFFFAOYSA-N 8-methylquinoline Chemical compound C1=CN=C2C(C)=CC=CC2=C1 JRLTTZUODKEYDH-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910021645 metal ion Inorganic materials 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 3
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910021612 Silver iodide Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000004945 emulsification Methods 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229940045105 silver iodide Drugs 0.000 description 3
- 229940001482 sodium sulfite Drugs 0.000 description 3
- 235000010265 sodium sulphite Nutrition 0.000 description 3
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical group C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 2
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 2
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 2
- PBYMYAJONQZORL-UHFFFAOYSA-N 1-methylisoquinoline Chemical compound C1=CC=C2C(C)=NC=CC2=C1 PBYMYAJONQZORL-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- NURQLCJSMXZBPC-UHFFFAOYSA-N 3,4-dimethylpyridine Chemical compound CC1=CC=NC=C1C NURQLCJSMXZBPC-UHFFFAOYSA-N 0.000 description 2
- DTBDAFLSBDGPEA-UHFFFAOYSA-N 3-methylquinoline Chemical compound C1=CC=CC2=CC(C)=CN=C21 DTBDAFLSBDGPEA-UHFFFAOYSA-N 0.000 description 2
- HJKGBRPNSJADMB-UHFFFAOYSA-N 3-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CN=C1 HJKGBRPNSJADMB-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- QMHIMXFNBOYPND-UHFFFAOYSA-N 4-methylthiazole Chemical compound CC1=CSC=N1 QMHIMXFNBOYPND-UHFFFAOYSA-N 0.000 description 2
- QHRZMGDJNNDMGZ-UHFFFAOYSA-N 5-methylisoquinoline Chemical compound N1=CC=C2C(C)=CC=CC2=C1 QHRZMGDJNNDMGZ-UHFFFAOYSA-N 0.000 description 2
- LMYVCXSKCQSIEQ-UHFFFAOYSA-N 5-methylquinoline Chemical compound C1=CC=C2C(C)=CC=CC2=N1 LMYVCXSKCQSIEQ-UHFFFAOYSA-N 0.000 description 2
- ZLLOWHFKKIOINR-UHFFFAOYSA-N 5-phenyl-1,3-thiazole Chemical compound S1C=NC=C1C1=CC=CC=C1 ZLLOWHFKKIOINR-UHFFFAOYSA-N 0.000 description 2
- HFDLDPJYCIEXJP-UHFFFAOYSA-N 6-methoxyquinoline Chemical compound N1=CC=CC2=CC(OC)=CC=C21 HFDLDPJYCIEXJP-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 206010034960 Photophobia Diseases 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 description 2
- 235000018417 cysteine Nutrition 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 2
- VQMSRUREDGBWKT-UHFFFAOYSA-N quinoline-4-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=NC2=C1 VQMSRUREDGBWKT-UHFFFAOYSA-N 0.000 description 2
- 229930182490 saponin Natural products 0.000 description 2
- 150000007949 saponins Chemical class 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 2
- 235000019345 sodium thiosulphate Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- NJYFRQQXXXRJHK-UHFFFAOYSA-N (4-aminophenyl) thiocyanate Chemical compound NC1=CC=C(SC#N)C=C1 NJYFRQQXXXRJHK-UHFFFAOYSA-N 0.000 description 1
- UUJOCRCAIOAPFK-UHFFFAOYSA-N 1,3-benzoselenazol-5-ol Chemical compound OC1=CC=C2[se]C=NC2=C1 UUJOCRCAIOAPFK-UHFFFAOYSA-N 0.000 description 1
- BREUOIWLJRZAFF-UHFFFAOYSA-N 1,3-benzothiazol-5-ol Chemical compound OC1=CC=C2SC=NC2=C1 BREUOIWLJRZAFF-UHFFFAOYSA-N 0.000 description 1
- ORIIXCOYEOIFSN-UHFFFAOYSA-N 1,3-benzothiazol-6-ol Chemical compound OC1=CC=C2N=CSC2=C1 ORIIXCOYEOIFSN-UHFFFAOYSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- RBIZQDIIVYJNRS-UHFFFAOYSA-N 1,3-benzothiazole-5-carboxylic acid Chemical compound OC(=O)C1=CC=C2SC=NC2=C1 RBIZQDIIVYJNRS-UHFFFAOYSA-N 0.000 description 1
- UPPYOQWUJKAFSG-UHFFFAOYSA-N 1,3-benzoxazol-5-ol Chemical compound OC1=CC=C2OC=NC2=C1 UPPYOQWUJKAFSG-UHFFFAOYSA-N 0.000 description 1
- RMBHSENKYFNMQI-UHFFFAOYSA-N 1,3-benzoxazol-5-yl(phenyl)methanone Chemical compound C=1C=C2OC=NC2=CC=1C(=O)C1=CC=CC=C1 RMBHSENKYFNMQI-UHFFFAOYSA-N 0.000 description 1
- SAHAKBXWZLDNAA-UHFFFAOYSA-N 1,3-benzoxazol-6-ol Chemical compound OC1=CC=C2N=COC2=C1 SAHAKBXWZLDNAA-UHFFFAOYSA-N 0.000 description 1
- WJBOXEGAWJHKIM-UHFFFAOYSA-N 1,3-benzoxazole-5-carboxylic acid Chemical compound OC(=O)C1=CC=C2OC=NC2=C1 WJBOXEGAWJHKIM-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- NLBRKFZDJTVITJ-UHFFFAOYSA-N 1-(1,3-benzoxazol-5-yl)ethanone Chemical compound CC(=O)C1=CC=C2OC=NC2=C1 NLBRKFZDJTVITJ-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical class SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- QRINVLDPXAXANH-UHFFFAOYSA-N 2,3,3a,4-tetrahydro-1,3-benzoselenazole Chemical compound C1C=CC=C2[Se]CNC21 QRINVLDPXAXANH-UHFFFAOYSA-N 0.000 description 1
- ALUQMCBDQKDRAK-UHFFFAOYSA-N 2,3,3a,4-tetrahydro-1,3-benzothiazole Chemical compound C1C=CC=C2SCNC21 ALUQMCBDQKDRAK-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- NKSZCPBUWGZONP-UHFFFAOYSA-N 3,4-dihydroisoquinoline Chemical compound C1=CC=C2C=NCCC2=C1 NKSZCPBUWGZONP-UHFFFAOYSA-N 0.000 description 1
- PWRBCZZQRRPXAB-UHFFFAOYSA-N 3-chloropyridine Chemical compound ClC1=CC=CN=C1 PWRBCZZQRRPXAB-UHFFFAOYSA-N 0.000 description 1
- VITIJXJNRKRDKF-UHFFFAOYSA-N 3-methyl-4-phenyl-1h-1,2,4-triazole-5-thione Chemical compound CC1=NNC(=S)N1C1=CC=CC=C1 VITIJXJNRKRDKF-UHFFFAOYSA-N 0.000 description 1
- VVEQSNONASWWMH-UHFFFAOYSA-N 3h-1,3-benzoselenazole-2-thione Chemical compound C1=CC=C2[se]C(S)=NC2=C1 VVEQSNONASWWMH-UHFFFAOYSA-N 0.000 description 1
- UWSONZCNXUSTKW-UHFFFAOYSA-N 4,5-Dimethylthiazole Chemical compound CC=1N=CSC=1C UWSONZCNXUSTKW-UHFFFAOYSA-N 0.000 description 1
- ODKHOKLXMBWVOQ-UHFFFAOYSA-N 4,5-diphenyl-1,3-oxazole Chemical compound O1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 ODKHOKLXMBWVOQ-UHFFFAOYSA-N 0.000 description 1
- BGTVICKPWACXLR-UHFFFAOYSA-N 4,5-diphenyl-1,3-thiazole Chemical compound S1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 BGTVICKPWACXLR-UHFFFAOYSA-N 0.000 description 1
- IFEPGHPDQJOYGG-UHFFFAOYSA-N 4-chloro-1,3-benzothiazole Chemical compound ClC1=CC=CC2=C1N=CS2 IFEPGHPDQJOYGG-UHFFFAOYSA-N 0.000 description 1
- PVMNPAUTCMBOMO-UHFFFAOYSA-N 4-chloropyridine Chemical compound ClC1=CC=NC=C1 PVMNPAUTCMBOMO-UHFFFAOYSA-N 0.000 description 1
- XQPAPBLJJLIQGV-UHFFFAOYSA-N 4-methoxy-1,3-benzothiazole Chemical compound COC1=CC=CC2=C1N=CS2 XQPAPBLJJLIQGV-UHFFFAOYSA-N 0.000 description 1
- PUMREIFKTMLCAF-UHFFFAOYSA-N 4-methyl-1,3-oxazole Chemical compound CC1=COC=N1 PUMREIFKTMLCAF-UHFFFAOYSA-N 0.000 description 1
- NTFMLYSGIKHECT-UHFFFAOYSA-N 4-phenyl-1,3-oxazole Chemical compound O1C=NC(C=2C=CC=CC=2)=C1 NTFMLYSGIKHECT-UHFFFAOYSA-N 0.000 description 1
- KXCQDIWJQBSUJF-UHFFFAOYSA-N 4-phenyl-1,3-thiazole Chemical compound S1C=NC(C=2C=CC=CC=2)=C1 KXCQDIWJQBSUJF-UHFFFAOYSA-N 0.000 description 1
- HYXKRZZFKJHDRT-UHFFFAOYSA-N 5,6-dimethoxy-1,3-benzothiazole Chemical compound C1=C(OC)C(OC)=CC2=C1SC=N2 HYXKRZZFKJHDRT-UHFFFAOYSA-N 0.000 description 1
- QMUXKZBRYRPIPQ-UHFFFAOYSA-N 5,6-dimethyl-1,3-benzothiazole Chemical compound C1=C(C)C(C)=CC2=C1SC=N2 QMUXKZBRYRPIPQ-UHFFFAOYSA-N 0.000 description 1
- RWNMLYACWNIEIG-UHFFFAOYSA-N 5,6-dimethyl-1,3-benzoxazole Chemical compound C1=C(C)C(C)=CC2=C1OC=N2 RWNMLYACWNIEIG-UHFFFAOYSA-N 0.000 description 1
- KFDDRUWQFQJGNL-UHFFFAOYSA-N 5-bromo-1,3-benzothiazole Chemical compound BrC1=CC=C2SC=NC2=C1 KFDDRUWQFQJGNL-UHFFFAOYSA-N 0.000 description 1
- DUMYZVKQCMCQHJ-UHFFFAOYSA-N 5-chloro-1,3-benzoselenazole Chemical compound ClC1=CC=C2[se]C=NC2=C1 DUMYZVKQCMCQHJ-UHFFFAOYSA-N 0.000 description 1
- YTSFYTDPSSFCLU-UHFFFAOYSA-N 5-chloro-1,3-benzothiazole Chemical compound ClC1=CC=C2SC=NC2=C1 YTSFYTDPSSFCLU-UHFFFAOYSA-N 0.000 description 1
- VWMQXAYLHOSRKA-UHFFFAOYSA-N 5-chloro-1,3-benzoxazole Chemical compound ClC1=CC=C2OC=NC2=C1 VWMQXAYLHOSRKA-UHFFFAOYSA-N 0.000 description 1
- CWNRDOFXKWOGKW-UHFFFAOYSA-N 5-chloro-6-methyl-1,3-benzoxazole Chemical compound C1=C(Cl)C(C)=CC2=C1N=CO2 CWNRDOFXKWOGKW-UHFFFAOYSA-N 0.000 description 1
- OCARCLRLOLFHPY-UHFFFAOYSA-N 5-chloro-6-nitro-1,3-benzothiazole Chemical compound C1=C(Cl)C([N+](=O)[O-])=CC2=C1N=CS2 OCARCLRLOLFHPY-UHFFFAOYSA-N 0.000 description 1
- KYZBUAFFLVOXMM-UHFFFAOYSA-N 5-chloro-6-nitro-1,3-benzoxazole Chemical compound C1=C(Cl)C([N+](=O)[O-])=CC2=C1N=CO2 KYZBUAFFLVOXMM-UHFFFAOYSA-N 0.000 description 1
- GWKNDCJHRNOQAR-UHFFFAOYSA-N 5-ethoxy-1,3-benzothiazole Chemical compound CCOC1=CC=C2SC=NC2=C1 GWKNDCJHRNOQAR-UHFFFAOYSA-N 0.000 description 1
- MHWNEQOZIDVGJS-UHFFFAOYSA-N 5-ethoxy-1,3-benzoxazole Chemical compound CCOC1=CC=C2OC=NC2=C1 MHWNEQOZIDVGJS-UHFFFAOYSA-N 0.000 description 1
- GLKZKYSZPVHLDK-UHFFFAOYSA-N 5-iodo-1,3-benzothiazole Chemical compound IC1=CC=C2SC=NC2=C1 GLKZKYSZPVHLDK-UHFFFAOYSA-N 0.000 description 1
- AHIHYPVDBXEDMN-UHFFFAOYSA-N 5-methoxy-1,3-benzoselenazole Chemical compound COC1=CC=C2[se]C=NC2=C1 AHIHYPVDBXEDMN-UHFFFAOYSA-N 0.000 description 1
- PNJKZDLZKILFNF-UHFFFAOYSA-N 5-methoxy-1,3-benzothiazole Chemical compound COC1=CC=C2SC=NC2=C1 PNJKZDLZKILFNF-UHFFFAOYSA-N 0.000 description 1
- IQQKXTVYGHYXFX-UHFFFAOYSA-N 5-methoxy-1,3-benzoxazole Chemical compound COC1=CC=C2OC=NC2=C1 IQQKXTVYGHYXFX-UHFFFAOYSA-N 0.000 description 1
- SEBIXVUYSFOUEL-UHFFFAOYSA-N 5-methyl-1,3-benzothiazole Chemical compound CC1=CC=C2SC=NC2=C1 SEBIXVUYSFOUEL-UHFFFAOYSA-N 0.000 description 1
- UBIAVBGIRDRQLD-UHFFFAOYSA-N 5-methyl-1,3-benzoxazole Chemical compound CC1=CC=C2OC=NC2=C1 UBIAVBGIRDRQLD-UHFFFAOYSA-N 0.000 description 1
- ZYMHCFYHVYGFMS-UHFFFAOYSA-N 5-methyl-1,3-oxazole Chemical compound CC1=CN=CO1 ZYMHCFYHVYGFMS-UHFFFAOYSA-N 0.000 description 1
- IQQNLNOMZISILX-UHFFFAOYSA-N 5-methyl-4,5-dihydro-1,3-thiazole Chemical compound CC1CN=CS1 IQQNLNOMZISILX-UHFFFAOYSA-N 0.000 description 1
- RLYUNPNLXMSXAX-UHFFFAOYSA-N 5-methylthiazole Chemical compound CC1=CN=CS1 RLYUNPNLXMSXAX-UHFFFAOYSA-N 0.000 description 1
- AEUQLELVLDMMKB-UHFFFAOYSA-N 5-nitro-1,3-benzothiazole Chemical compound [O-][N+](=O)C1=CC=C2SC=NC2=C1 AEUQLELVLDMMKB-UHFFFAOYSA-N 0.000 description 1
- AAKPXIJKSNGOCO-UHFFFAOYSA-N 5-phenyl-1,3-benzothiazole Chemical compound C=1C=C2SC=NC2=CC=1C1=CC=CC=C1 AAKPXIJKSNGOCO-UHFFFAOYSA-N 0.000 description 1
- NIFNXGHHDAXUGO-UHFFFAOYSA-N 5-phenyl-1,3-benzoxazole Chemical compound C=1C=C2OC=NC2=CC=1C1=CC=CC=C1 NIFNXGHHDAXUGO-UHFFFAOYSA-N 0.000 description 1
- YPYPBEGIASEWKA-UHFFFAOYSA-N 5-phenyl-1,3-oxazole Chemical compound O1C=NC=C1C1=CC=CC=C1 YPYPBEGIASEWKA-UHFFFAOYSA-N 0.000 description 1
- 125000004070 6 membered heterocyclic group Chemical group 0.000 description 1
- YJOUISWKEOXIMC-UHFFFAOYSA-N 6-bromo-1,3-benzothiazole Chemical compound BrC1=CC=C2N=CSC2=C1 YJOUISWKEOXIMC-UHFFFAOYSA-N 0.000 description 1
- AIBQGOMAISTKSR-UHFFFAOYSA-N 6-chloro-1,3-benzothiazole Chemical compound ClC1=CC=C2N=CSC2=C1 AIBQGOMAISTKSR-UHFFFAOYSA-N 0.000 description 1
- NCJNOOHAQSFEJN-UHFFFAOYSA-N 6-chloroisoquinoline Chemical compound C1=NC=CC2=CC(Cl)=CC=C21 NCJNOOHAQSFEJN-UHFFFAOYSA-N 0.000 description 1
- GKJSZXGYFJBYRQ-UHFFFAOYSA-N 6-chloroquinoline Chemical compound N1=CC=CC2=CC(Cl)=CC=C21 GKJSZXGYFJBYRQ-UHFFFAOYSA-N 0.000 description 1
- AJAKVPMSAABZRX-UHFFFAOYSA-N 6-ethoxyquinoline Chemical compound N1=CC=CC2=CC(OCC)=CC=C21 AJAKVPMSAABZRX-UHFFFAOYSA-N 0.000 description 1
- NICZKYFUJVAZLV-UHFFFAOYSA-N 6-iodo-1,3-benzothiazole Chemical compound IC1=CC=C2N=CSC2=C1 NICZKYFUJVAZLV-UHFFFAOYSA-N 0.000 description 1
- AHOIGFLSEXUWNV-UHFFFAOYSA-N 6-methoxy-1,3-benzothiazole Chemical compound COC1=CC=C2N=CSC2=C1 AHOIGFLSEXUWNV-UHFFFAOYSA-N 0.000 description 1
- FKYKJYSYSGEDCG-UHFFFAOYSA-N 6-methoxy-1,3-benzoxazole Chemical compound COC1=CC=C2N=COC2=C1 FKYKJYSYSGEDCG-UHFFFAOYSA-N 0.000 description 1
- XZNUJESLPUNSNO-UHFFFAOYSA-N 6-methoxyisoquinoline Chemical compound C1=NC=CC2=CC(OC)=CC=C21 XZNUJESLPUNSNO-UHFFFAOYSA-N 0.000 description 1
- IVKILQAPNDCUNJ-UHFFFAOYSA-N 6-methyl-1,3-benzothiazole Chemical compound CC1=CC=C2N=CSC2=C1 IVKILQAPNDCUNJ-UHFFFAOYSA-N 0.000 description 1
- QLUFBCVWKTWKBF-UHFFFAOYSA-N 6-nitro-1,3-benzothiazole Chemical compound [O-][N+](=O)C1=CC=C2N=CSC2=C1 QLUFBCVWKTWKBF-UHFFFAOYSA-N 0.000 description 1
- NNESGHWUVLNAML-UHFFFAOYSA-N 6-nitro-1,3-benzoxazole Chemical compound [O-][N+](=O)C1=CC=C2N=COC2=C1 NNESGHWUVLNAML-UHFFFAOYSA-N 0.000 description 1
- RXEDQOMFMWCKFW-UHFFFAOYSA-N 7-chloro-1,3-benzothiazole Chemical compound ClC1=CC=CC2=C1SC=N2 RXEDQOMFMWCKFW-UHFFFAOYSA-N 0.000 description 1
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- RUSMDMDNFUYZTM-UHFFFAOYSA-N 8-chloroquinoline Chemical compound C1=CN=C2C(Cl)=CC=CC2=C1 RUSMDMDNFUYZTM-UHFFFAOYSA-N 0.000 description 1
- HHZGHKIHHIKUHK-UHFFFAOYSA-N 8-methoxyisoquinoline Chemical compound C1=NC=C2C(OC)=CC=CC2=C1 HHZGHKIHHIKUHK-UHFFFAOYSA-N 0.000 description 1
- 239000004129 EU approved improving agent Substances 0.000 description 1
- LEVWYRKDKASIDU-IMJSIDKUSA-N L-cystine Chemical compound [O-]C(=O)[C@@H]([NH3+])CSSC[C@H]([NH3+])C([O-])=O LEVWYRKDKASIDU-IMJSIDKUSA-N 0.000 description 1
- HWGBHCRJGXAGEU-UHFFFAOYSA-N Methylthiouracil Chemical compound CC1=CC(=O)NC(=S)N1 HWGBHCRJGXAGEU-UHFFFAOYSA-N 0.000 description 1
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- ULEOPYHOORBWOY-UHFFFAOYSA-N [1,3]dioxolo[4,5-f][1,3]benzothiazole Chemical compound C1=C2OCOC2=CC2=C1SC=N2 ULEOPYHOORBWOY-UHFFFAOYSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229910052946 acanthite Inorganic materials 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 229940101006 anhydrous sodium sulfite Drugs 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 235000006708 antioxidants Nutrition 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 1
- AMTXUWGBSGZXCJ-UHFFFAOYSA-N benzo[e][1,3]benzoselenazole Chemical class C1=CC=C2C(N=C[se]3)=C3C=CC2=C1 AMTXUWGBSGZXCJ-UHFFFAOYSA-N 0.000 description 1
- KXNQKOAQSGJCQU-UHFFFAOYSA-N benzo[e][1,3]benzothiazole Chemical compound C1=CC=C2C(N=CS3)=C3C=CC2=C1 KXNQKOAQSGJCQU-UHFFFAOYSA-N 0.000 description 1
- WMUIZUWOEIQJEH-UHFFFAOYSA-N benzo[e][1,3]benzoxazole Chemical group C1=CC=C2C(N=CO3)=C3C=CC2=C1 WMUIZUWOEIQJEH-UHFFFAOYSA-N 0.000 description 1
- UENWRTRMUIOCKN-UHFFFAOYSA-N benzyl thiol Chemical compound SCC1=CC=CC=C1 UENWRTRMUIOCKN-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- KNSPATVVQHLSKI-UHFFFAOYSA-N cyano thiocyanate;sodium Chemical compound [Na].N#CSC#N KNSPATVVQHLSKI-UHFFFAOYSA-N 0.000 description 1
- 229960003067 cystine Drugs 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- FGRVOLIFQGXPCT-UHFFFAOYSA-L dipotassium;dioxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [K+].[K+].[O-]S([O-])(=O)=S FGRVOLIFQGXPCT-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- NYONLFVSTRIQFN-UHFFFAOYSA-N ethyl 1,3-benzoxazole-5-carboxylate Chemical compound CCOC(=O)C1=CC=C2OC=NC2=C1 NYONLFVSTRIQFN-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 150000002473 indoazoles Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- UQGOTDUTYINDJD-UHFFFAOYSA-N methyl 1,3-benzothiazole-5-carboxylate Chemical compound COC(=O)C1=CC=C2SC=NC2=C1 UQGOTDUTYINDJD-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 150000002918 oxazolines Chemical class 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- LDWSZOXQGAFOGX-UHFFFAOYSA-L potassium sodium 5-methyl-2H-benzotriazole bromide hydroxide Chemical compound [Br-].[K+].CC1=CC2=C(NN=N2)C=C1.[OH-].[Na+] LDWSZOXQGAFOGX-UHFFFAOYSA-L 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- OVYWMEWYEJLIER-UHFFFAOYSA-N quinolin-6-ol Chemical compound N1=CC=CC2=CC(O)=CC=C21 OVYWMEWYEJLIER-UHFFFAOYSA-N 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 229940056910 silver sulfide Drugs 0.000 description 1
- XUARKZBEFFVFRG-UHFFFAOYSA-N silver sulfide Chemical compound [S-2].[Ag+].[Ag+] XUARKZBEFFVFRG-UHFFFAOYSA-N 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- NRUVOKMCGYWODZ-UHFFFAOYSA-N sulfanylidenepalladium Chemical compound [Pd]=S NRUVOKMCGYWODZ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/08—Sensitivity-increasing substances
- G03C1/10—Organic substances
- G03C1/12—Methine and polymethine dyes
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
本発明は物理現象核を利用した迅速現象処理に
より高感度、高コントラストで最高濃度の高い陰
画像を得る陰画像形成方法の改良に関する。
ハロゲン化銀写真材料の原料として不可欠な金
属録は、その供給が減少している一方、各産業界
での需要が増大していることから著しく価格の変
動をきたしており、そのため当業界では省銀量化
の試みが積極的になされている現状である。
例えば、その一例として物理現象核を利用した
銀塩拡散転写法がある。この方法は転写像のカバ
リング・パワー(銀被覆力)が非常に高いため小
量のハロゲン化銀にて、より高濃度の写真画像が
得られ、且つ感度、鮮鋭度も優れるため、極めて
有用な画像形成法として知られている。
しかしながら本方法は、ネガーポジ型拡散転写
法であつて、最終的に得られる画像はポジ画像で
あるためネガ像を形成させる方法、目的には適合
しない。
一方、最終的に陰画像を得ることを目的とした
感光材料として、
(1) 感光性ハロゲン化銀
(2) 感光性ハロゲン化銀より易溶性でかつ実質的
に感光性を有しない金属塩粒子に難溶化剤を吸
着せしめた粒子、および
(3) 物理現像核
を含有する写真材料が、特開昭54−48544号公報
により提案されている。この写真材料は陰画像を
得るためにハロゲン化銀還元剤と金属塩粒子を溶
解させる物質とを含む物理現像液で処理するもの
であるが、この方法では物理現像核上に銀イオン
を還元析出させる工程に時間を要し、迅速処理適
性に欠けており、さらに感度ならびに最高濃度の
低下を招き、充分な方法とは言い難い点があつ
た。即ち、現像処理時間の短縮である処理の迅速
化の面からもさらに改良が望まれていた。
本発明の目的は、前記の省銀化された写真材料
を用いる陰画像形成方法の欠点を改良することで
ある。
即ち、本発明の第1の目的は、改良させた感
度、及びコントラストならびに高い最高濃度が得
られる写真材料を用いた陰画像形成方法を提供す
ることである。
本発明の第2の目的は、生保存中に於ける写真
特性の劣化を改良した写真材料を用いた陰画像形
成方法を提供することである。
本発明の第3の目的は、迅速に写真画像を形成
できる陰画像形成方法を提供することである。
本発明の上記目的は、支持体上に塗設された写
真構成層中に下記に示す(1)、(2)及び(3)と下記一般
式〔〕で表わされる化合物の少なくとも1つを
含有する写真感光材料を画像露光後、還元剤及び
下記(2)の金属塩粒子を溶解せしめる物質を含む処
理液で処理することにより露光部の金属塩粒子を
選択的に溶解し、次いで下記(3)の物理現像核上に
金属画像として析出せしめる工程を有することを
特徴とする陰画像形成方法によつて構成される。
(1) 感光性ハロゲン化銀粒子
(2) それ自体上記(1)より易溶性で、かつ難溶化剤
にて表面を難溶化せしめた金属塩の粒子
(3) 物理現像核
一般式〔〕
式中のZ1、Z2は同じかまたは異なつてもよい5
員または6員の含窒素複素環核を完成するに必要
な原子群を表わし、具体的にはオキサゾリン核、
オキサゾール核(例えば、4−メチルオキサゾー
ル、5−メチルオキサゾール、4−フエニルオキ
サゾール、5−フエニルオキサゾール、4,5−
ジフエニルオキサゾール等)、ベンゾオキサゾー
ル核(例えば、ベンゾオキサゾール、5−クロロ
ベンゾオキサゾール、5−メチルベンゾオキサゾ
ール、5−フエニルベンゾオキサゾール、5,6
−ジメチルベンゾオキサゾール、5−メトキシベ
ンゾオキサゾール、5−エトキシベンゾオキサゾ
ール、6−メトキシベンゾオキサゾール、5−ア
セチルベンゾオキサゾール、5−ベンゾイルベン
ゾオキサゾール、5−クロロ−6−メチルベンゾ
オキサゾール、5−カルボキシベンゾオキサゾー
ル、5−エトキシカルボニルベンゾオキサゾー
ル、6−ニトロベンゾオキサゾール、5−クロロ
−6−ニトロベンゾオキサゾール、5−ヒドロキ
シベンゾオキサゾール、6−ヒドロキシベンゾオ
キサゾール等)、ナフトオキサゾール核(例えば、
α−ナフトオキサゾール、β−ナフトオキサゾー
ル等)、チアゾリン酸(例えば、チアゾリン、5
−メチルチアゾリン等)、チアゾール核(例えば、
チアゾール、4−メチルチアゾール、4−フエニ
ルチアゾール、5−メチルチアゾール、5−フエ
ニルチアゾール、4,5−ジメチルチアゾール、
4,5−ジフエニルチアゾール等)、ベンゾチア
ゾール核(例えば、ベンゾチアゾール、4−クロ
ロベンゾチアゾール、5−クロロベンゾチアゾー
ル、6−クロロベンゾチアゾール、7−クロロベ
ンゾチアゾール、5−メチルベンゾチアゾール、
6−メチルベンゾチアゾール、5,6−ジメチル
ベンゾチアゾール、5−ブロモベンゾチアゾー
ル、6−ブロモベンゾチアゾール、5−フエニル
ベンゾチアゾール、4−メトキシベンゾチアゾー
ル、5−メトキシベンゾチアゾール、6−メトキ
シベンゾチアゾール、5−ヨードベンゾチアゾー
ル、6−ヨードベンゾチアゾール、5−メトキシ
カルボニルベンゾチアゾール、5−エトキシベン
ゾチアゾール、テトラヒドロベンゾチアゾール、
5−N,N−ジメチルアミノベンゾチアゾール、
5,6−ジメトキシベンゾチアゾール、5−ヒド
ロキシベンゾチアゾール、6−ヒドロキシベンゾ
チアゾール、5−カルボキシベンゾチアゾール、
5−ニトロベンゾチアゾール、6−ニトロベンゾ
チアゾール、5−クロロ−6−ニトロベンゾチア
ゾール、5,6−メチレンジオキシベンゾチアゾ
ール等)、ナフトチアゾール核(例えば、α−ナ
フトチアゾール、β−ナフトチアゾール、5−メ
トキシ−β−ナフトチアゾール、5−エトキシ−
β−ナフトチアゾール、8−メトキシ−α−ナフ
トチアゾール、7−メトキシ−α−ナフトチアゾ
ール等)、ベンゾセレナゾール核(例えば、ベン
ゾセレナゾール、5−クロロベンゾセレナゾー
ル、5−メトキシベンゾセレナゾール、5−ヒド
ロキシベンゾセレナゾール、テトラヒドロベンゾ
セレナゾール等)、ナフトセレナゾール核(例え
ば、α−ナフトセレナゾール、β−ナフトセレナ
ゾール等)、2−ピリジン核(例えば、2−ピリ
ジン、3−メチルピリジン、4−メチルピリジ
ン、5−メチルピリジン、3,4−ジメチルピリ
ジン、4−クロロピリジン、3−ヒドロキシピリ
ジン、3−フエニルピリジン等)、4−ピリジン
核(例えば、4−ピリジン、2−メチルピリジ
ン、3−メチルピリジン、3−クロロピリジン、
2,6−ジメチルピリジン、3−ヒドロキシピリ
ジン等)、2−キノリン核(例えば、2−キノリ
ン、3−メチルキノリン、5−メチルキノリン、
7−メチルキノリン、8−メチルキノリン、6−
クロロキノリン、8−クロロキノリン、6−メト
キシキノリン、6−エトキシキノリン、6−ヒド
ロキシキノリン、8−ヒドロキシキノリン等)、
4−キノリン酸(例えば、4−キノリン、6−メ
トキシキノリン、7−メチルキノリン、8−メチ
ルキノリン等)、1−イソキノリン核(例えば、
1−イソキノリン、3,4−ジヒドロイソキノリ
ン等)、3−イソキノリン核(例えば、3−イソ
キノリン、5−メチルイソキノリン、1−メチル
イソキノリン、6−クロロイソキノリン、6−メ
トキシイソキノリン、8−メトキシイソキノリン
等)を表わす。
また上記式中のR1およびR2は炭素数1〜4の
低級アルキル基(例えばメチル、エチル、プロピ
ル、ブチルの各基等)、置換アルキル基(例えば
β−ヒドロキシエチル、γ−ヒドロキシプロピル
等のヒドロキシアルキル基、β−スルホエチル、
γ−スルホプロピル、δ−スルホブチル等のスル
ホアルキル基、β−カルボキシエチル、γ−カル
ボキシプロピル等のカルボキシアルキル基)を表
わし、R1およびR2のうちの少なくとも一方はス
ルホアルキル基もしくはカルボキシアルキル基で
ある。また、R3は炭素数1〜4の低級アルキル
基を示し、Xはアニオン(例えばハロゲン等)を
示し、l、m及びnは0または1、aは0または
1を表わす。
次に本発明の陰画像形成方法について、更に詳
細に説明する。
先づ上記一般式〔〕で表わされる化合物の具
体例を下記に記載するが、本発明はこれらに限定
されるものではない。
上記一般式〔〕に含まれるこれらの化合物は
公知であり、例えばシアニンダイズ・アンド・リ
レイテツドコンパウンド(ハーマー著、1964年)
およびザ・セオリー・オブ・ザ・ホトグラフイツ
クプロセス(ミース・ジエームス著、第3版、
1966年)等の記載により合成することができる。
そして、本発明の陰画像形成方法においては、上
記の化合物は、前記の金属塩粒子または物理現像
核を含有する写真構成層に添加するか、または感
光性ハロゲン化銀粒子、金属塩粒子および物理現
像核が混合されて含有する写真構成層に添加され
てもよいが、感光性ハロゲン化銀粒子を含有する
構成層中に添加、吸着せしめて使用されることが
最も好ましい。使用量はハロゲン化銀1モルに対
して10-5〜10-2モル、好ましくは10-4〜10-3モル
である。添加される時期は、製造工程中のいずれ
の時期でもよいが、感光性ハロゲン化銀乳剤の場
合は化学熟成の初期或は後期の任意の時期に添加
してさしつかえない。
本発明の写真画像形成方法において使用される
感光性ハロゲン化銀としては、塩化銀、臭化銀、
沃化銀、塩臭化銀、沃臭化銀、塩沃臭化銀あるい
はこれらの混合物などが含まれるが、好ましくは
高感度の沃臭化銀を用いるのがよく、特に50モル
%以下の沃化銀を含む沃臭化銀が本発明において
は好適である。
上記感光性ハロゲン化銀はハロゲン化銀乳剤の
形態で本発明に適用されるが、該乳剤は、通常行
われる製造法をはじめ種々の製造法、例えば特公
昭46−7772号公報に記載されている如き方法、あ
るいは米国特許第2592250号に記載されている所
謂コンバージヨン乳剤法、例えばシングルジエツ
ト乳剤法およびダブルジエツト乳剤法などにより
調製することができる。
また、本発明に用いられる感光性ハロゲン化銀
の粒子は種々の晶癖を有するものが包含される。
粒径は写真感光材料の使用目的等によつて異なる
が、通常0.1〜3.0μの範囲が適当である。
そして、これらのハロゲン化銀乳剤は各種の化
学増感剤を用いて化学増感される。化学増感剤と
しては、硫黄増感剤、セレン増感剤、貴金属増感
剤などの公知の増感剤を始めとして還元増感剤、
ポリアルキレンオキサイド系の増感剤なども広く
使用に供せられる。
またこれらのハロゲン化銀乳剤は、例えばイミ
ダゾール類、トリアゾール類、アザインデン類な
ど公知の安定剤の使用によつてカプリの発生を防
止することもできる。
次に、本発明に用いられる金属塩の粒子は、難
溶化剤によつて表面を被覆されていない状態にお
いては、後記の金属塩の粒子を溶解する物質に対
する溶解速度が前記感光性ハロゲン化銀よりも大
きく、かつ実質的に感光性を有さない金属の塩で
ある。これら両粒子の溶解速度についての条件を
更に具体的に示せば、金属塩の粒子群(A)と感光性
ハロゲン化銀の粒子群(B)の、後記の金属塩溶解剤
の少なくとも1つの存在下における(例えば本発
明に用いられる処理液中における)溶解速度(単
位時間当り溶解した物質の質量)が(A)、(B)両粒子
群に含まれる粒子の合計質量が等しい条件におい
て粒子群(A)が粒子群(B)よりも大であることが必要
である。このような条件を実際に適用する場合の
測定方法としては次の方法が挙げられる。
先ず、感光性ハロゲン化銀の粒子及び金属塩の
粒子を親水性コロイド中にそれぞれ含む2種の乳
剤を作成し、それぞれ支持体上に塗布し乾燥し、
2種の試料を作成する。このときの塗布量は単位
面積当りの感光性ハロゲン化銀、金属塩及び親水
性コロイドの量を2種の試料間で等しくする。
得られた試料を5%チオ硫酸ナトリウム水溶液
(温度20℃)中に撹拌することなく浸漬する。浸
漬時間は例えば2秒、5秒及び8秒のように数秒
間とする。次いで直ちに水槽中に試料を移し水洗
後乾燥する。このように処理した試料について残
溜感光性ハロゲン化銀及び残溜金属塩量を公知の
方法で分析測定し、それぞれについて残溜率
(%)を求める。
残溜率・浸漬時間のグラフを画き、残溜率50%
に対応する感光性ハロゲン化銀試料の浸漬時間t1
及び金属塩粒子試料の浸漬時間t2を求め、t2/t1
の値を求める。このようにして求めたt2/t1の値
は1より小であることが必要であり、0.7より小
であることが好ましい。
本発明に用いられる金属塩の粒子は上記の如き
性質を有するものから適宜選択され得るものであ
れば良いが、本発明の好ましい一実施態様におい
ては前記金属塩の粒子は、実質的に感光性を有さ
ないハロゲン化銀粒子であり、前記感光性ハロゲ
ン化銀粒子に比べ、ハロゲン化銀粒子を溶解せし
める物質に対する溶解速度が大なる粒子が選ばれ
る。さらに具体的には、本発明に好ましく適用さ
れる金属塩の粒子は、化学増感処理を施されてい
ない純臭化銀、純塩化銀あるいはこれらの混合ハ
ロゲン化銀で、前記感光性ハロゲン化銀よりも微
細な結晶であることが望ましい。
前記の「実質的に感光性を有さない」なる語
は、本発明の方法においては、前記感光性ハロゲ
ン化銀との相対的な関係において「非感光性」で
あることを意味し、具体的には該感光性ハロゲン
化銀を感光させるに必要な光エネルギーを本発明
に係る感光性写真要素に与えた時、該光エネルギ
ーによつては「実質的に感光されない」と理解す
べきものである。さらに詳細には、本発明の金属
塩の粒子は前記感光性ハロゲン化銀に対して、概
して、大きくとも1/10の光感度を有さない金属塩
の微細粒子である。そしてこの金属塩の粒子が溶
解する結果生じる金属イオンあるいは金属錯イオ
ンは物理現像核上で還元剤の存在下に金属に還元
される。
本発明に用いられる金属塩の粒子は感光性ハロ
ゲン化銀1モルに対して0.1モル乃至100モルの範
囲で用いられる。
本発明に用いられる金属塩の粒子は、難溶化剤
によつて表面を被覆されるが、上記難溶化剤は金
属塩粒子の表面に吸着し、あるいは溶解反応の活
性点となる粒子表面の一部分に吸着することによ
り、前記金属塩溶解剤の存在下における粒子の溶
解速度を遅くする化合物であり、またこの難溶化
剤は易溶性金属塩の粒子の表面に吸着し、該金属
塩の金属イオンと難溶性の塩あるいば錯塩を形成
する化合物をも包含するものである。
本発明の好ましい一つの実施態様によれば、難
溶化剤は易溶性金属塩の粒子であるハロゲン化銀
粒子に吸着して、その溶解性を低下させる化合物
から選択される。これらの化合物は、例えばメル
カプト系化合物であり、より具体的にはシステイ
ン、1−フエニル−5−メルカプトテトラゾー
ル、メルカプトベンツチアゾール、メルカプトベ
ンツセレナゾール、メルカプトベンツオキサゾー
ル、メルカプトベンツイミダゾール、ベンジルメ
ルカプタン、4−エチル−2−チオ−オキサゾリ
ン、2−メルカプト−6−アザウラシル、4−ヒ
ドロキシ−2−メルカプト−6−メチル−ピリミ
ジン、3−メルカプト−4−フエニル−5−メチ
ル−1,2,4−トリアゾール等が代表的な具体
例として包含される。またチオウレア、インダゾ
ール類、トリアゾール類、イミダゾール類等も本
発明に使用できる好ましい化合物である。これら
のうちメルカプトテトラゾール化合物が好まし
い。
本発明に用いられる金属塩の粒子を溶解する物
質(以下、金属塩溶解剤という。)は、本発明に
用いられる金属塩粒子に作用して金属イオンある
いは可溶性の金属錯イオンを生成せしめる物質で
あり、これは本発明に用いられる処理液自身の溶
媒、例えば水であつてもよい。本発明の好ましい
実施態様によれば、前記溶解剤は本発明に用いら
れる感光性ハロゲン化銀を実質的に溶解しない物
質で、あるいは該感光性ハロゲン化銀を実質的に
溶解しない添加量において金属塩粒子である前記
感光性ハロゲン化銀とは溶解性の異なるハロゲン
化銀の微粒子を溶解する物質であり、代表的な具
体例としては、亜硫酸ナトリウム等の亜硫酸塩、
チオ硫酸ナトリウム、チオ硫酸カリウム、チオ硫
酸アンモニウム等のチオ硫酸塩、シアン化カリウ
ム、シアン化ナトリウム等の青酸塩、チオシアン
化ナトリウム、ロダンカリウム等のチオシアン酸
塩、シスチン、システイン等のアミノ酸系化合
物、チオ尿素、フエニルチオ尿素、3,6−ジ−
チア−1,8−オクタジオール等のチオ尿素系化
合物、チオエーテル系化合物等を挙げることがで
きる。
そして本発明においては、前記金属塩溶解剤は
処理液中に存在せしめ、一方、上記難溶化剤は金
属塩粒子が含有されている写真構成層中に存在せ
しめる実施態様が最も好ましい。
また、上記難溶化剤の添加時の溶剤としてはメ
タノールが好適である。添加量については、写真
構成層中に含有させる場合には、難溶化剤は本発
明に用いられる金属塩粒子の金属塩1モル当り
0.01g〜7.0gが好ましく、0.1g〜5.0gの範囲が
更に好ましい。
また上記金属塩溶解剤のうち、特に亜硫酸ナト
リウムの場合は一般に現像液の保恒剤として使用
されるので、これを除外した上記溶解剤の処理液
1当りの使用量としては0.001〜50g、好まし
く0.01〜30gの範囲であるが、本発明による一般
式〔〕の化合物の使用により、上記金属塩溶解
剤の使用を減量し得たので、その結果、現像液の
スラツジの発生と保存性の改良に成功したのであ
る。
さらに本発明に用いられる物理現像核としては
例えば金、銀、白金などの貴金属コロイド、銀、
パラジウム、亜鉛などの金属硫化物、または金属
セレン化物などを使用することができる。これら
のうち、銀化合物(例えば硝酸銀、ハロゲン化銀
等)を還元して得た金属銀粒子及び硫化パラジウ
ムが特に好ましい。これらの物理現像核は前記の
金属塩が溶解して生成する金属イオンあるいは金
属錯イオンが還元剤によつて金属に還元される過
程を触媒的に促進する機能を有する物質、あるい
はそのような機能を有する化学的活性点を含むも
ので、必ずしも物理的な粒子である必要はない。
上記物理現像核の写真構成層中の含有量は、そ
の種類によつても異なるが、例えば硫化銀の場合
は金属銀として0.001g〜1.0g/m2、金属銀(塩
化銀の微粒子を還元して製造した)の場合には
0.01g〜3.0g/m2の範囲が適当である。
本発明に係る写真感光材料は、その目的あるい
は用途に応じて各種の構成層の態様をとることが
できる。即ち、本発明に係る写真感光材料は、支
持体上に(1)感光性ハロゲン化銀粒子、(2)前記ハロ
ゲン化銀より易溶性でかつ実質的に感光性を有し
ない金属塩粒子及び(3)物理現像核を含有する写真
感光材料であるが、上記(1)〜(3)をそれぞれ別個の
層に含有させても、あるいは上記(1)〜(3)の任意の
2つ以上を同一層に含有させてもよい。例えば支
持体上に、支持体側から、物理現像核を含有する
層、金属塩粒子を含有する層、感光性ハロゲン化
銀粒子を含有する層、ハロゲン化銀現像剤を含有
する層の順に積層させた層構成を始めとして、こ
の積層の順序を逆に構成してもよいし、さらに例
えば支持体側から物理現像核及びハロゲン化銀現
像剤を含有する層を塗設し、この上に感光性ハロ
ゲン化銀粒子と金属塩粒子とが同一層中に混合し
て存在する層を積層し、二層構成としても差支え
なくまた同一層中に感光性ハロゲン化銀粒子、金
属塩粒子及び物理現像核が混合して存在する層を
支持体上に塗設し、単層構成とすることもでき
る。またさらに別法としては、2枚の支持体を用
意し、支持体毎に別々に層構成を行なうこともで
き、さらには3枚の支持体を用意し、それぞれの
支持体上に一層づつ塗設してもよい。
そして、本発明に係るハロゲン化銀写真感光材
料の層構成として好ましいものは、感光性ハロゲ
ン化銀粒子、金属塩粒子および物理現像核が同一
層中に混合して存在する単一層として同一支持体
上に塗設した層構成か、あるいは支持体側から金
属塩粒子と物理現像核とを混合した層を塗設し、
この上に感光性ハロゲン化銀粒子のみを含有する
層を塗設して二層構成となしたものがよい。
本発明に係る写真感光材料の層構成に関しては
既に前述した通りであるが、必要に応じて適切な
位置に例えば保護層、ハレーシヨン防止層、モル
ダントにて染料を固着した非拡散性染料層などの
補助層を設けることができ、また、これらの層に
前記以外の写真用添加剤を添加することもでき
る。また前記の感光性ハロゲン化銀、金属塩の粒
子および物理現像核はそれぞれ単独で、又は二種
以上混合して、適当なバインダー中に分散して存
在させる。バインダーとしては各種の親水性コロ
イドが用いられるが、代表的にはゼラチンが好ま
しく適用される。また上記親水性コロイドをバイ
ンダーとする塗膜の物性を改良する目的で、必要
に応じて各種の膜物性改良剤、例えば硬膜剤を用
いることは好ましいことである。
本発明に用いられる親水性コロイドをバインダ
ーとする塗膜組成物には必要に応じて前記硬膜剤
以外の写真用添加剤として、例えばゼラチン可塑
剤、界面活性剤、紫外線吸収剤、アンチステイン
剤、PH調節剤、酸化防止剤、帯電防止剤、増粘
剤、粒状性向上剤、染料、モルダント、増白剤、
現像速度調整剤、マツト剤、ハロゲン化銀現像剤
等を本発明の効果が損なわれない範囲内で使用す
ることができる。
また本発明に用いられる写真感光材料に用いら
れる支持体としては、たとえばバライタ紙、ポリ
エチレン被覆紙、ポリプロピレン合成紙、ガラス
板、セルロースアセテート、セルロースナイトレ
ート、たとえばポリエチレンテレフタレート等の
ポリエステルフイルム、ポリアミドフイルム、ポ
リプロピレンフイルム、ポリカーボネートフイル
ム、ポリスチレンフイルム等が代表的なものとし
て包含され、これらの支持体はそれぞれ写真感光
材料の使用目的に応じて適宜選択される。
本発明に用いられるハロゲン化銀写真感光材料
は露光後、還元剤を含有する処理液で処理され
る。
本発明に用いられる処理液の還元剤としては現
像主薬が有利に用いられる。現像主薬としては、
当業界にてよく知られた例えばハイドロキノン、
トルハイドロキノン、2,5−ジメチルハイドロ
キノンなどで代表されるポリハイドロキシベンゼ
ン類、例えば1−フエニル−3−ビラゾリドン、
1−フエニル−4−メチル−3−ビラゾリドンな
どで代表される3−ビラゾリドン類、例えばο−
アミノフエノール、p−アミノフエノールなどで
代表されるアミノフエノール類、例えば1−(p
−ハイドロキシフエニル)−3−アミノビラゾリ
ドン、1−(p−メチルアミノフエニル)−3−ビ
ラゾリンなどで代表される1−アリール−3−ア
ミノビラゾリン類、アスコルビン酸、その他、C.
E.K.MeesとT.H.James共著「The Theory of
the Photographic Process」第3版(1966年、
Maemillan Co,N.Y.)、第13章や、L.P.A.
Mason著「Photographic Processing
Chemistry」(1966年、The Focal Press,
London)16〜30頁に現像主薬として記載されて
いる化合物が、単独または組合せて使用すること
ができる。
処理液のPHは5以上、好ましくはPH5.5〜13.2
程度が最適である。
上記処理液には必要により、アルカリ剤、PH緩
衝剤、現像促進剤、カブリ防止剤など各種添加剤
を含有させることができる。そして上記処理液に
よる処理温度は20℃〜50℃の範囲が適当である。
以上、述べた如く、本発明の方法による省銀化
されたハロゲン化銀写真感光材料は、汎用白黒写
真感光材料は勿論のこと、高感度の放射線用感光
材料、或は高コントラストの印刷用感光材料、さ
らには平版印刷用感光材料など広範囲に応用でき
るものである。
以下、本発明を実施例により具体的に説明す
る。
実施例 1
〔感光性ハロゲン化銀乳剤の調製〕
通常の方法により、金増感・硫黄増感されて、
最高感度まで熟成された沃化銀4.0モル%を含有
した高感度沃臭化銀ゼラチン乳剤に、安定剤とし
て、4−ヒドロキシ−6−メチル−1,3,3a,
7−テトラザインデンを、ハロゲン化銀1モル当
り、1.5g加えて、感光性ハロゲン化銀粒子乳剤
とした。なおこの乳剤の平均粒径は約1.3μであつ
た。
〔金属塩粒子(実質的に感光性のないハロゲン化
銀粒子)の調製〕
中性法により、硝酸塩と塩化ナトリウムとから
なる純塩化銀ゼラチン乳剤を調製した。
なおこの乳剤の平均粒径は約0.1μの易溶性塩化
銀粒子であつた。
〔物理現像角の調製〕
1%のポリビニールアルコール(ケン化度99
%、重合度1000のポリマー)の水溶液10mlに、
0.2%の塩化金酸を50ml加え、室温で撹拌した中
へ、1%の水素化ホウ酸ナトリウムの10mlを加
え、金コロイドの物理現像核とした。
以上のようにして調整した3種のうちから、先
ず実質的に感光性のない塩化銀乳剤を採り、難溶
化剤として1−フエニル−5−メルカプトテトラ
ゾールをハロゲン化銀1モル当り1.2g添加し、
続いて、上述の物理現像核を、塩化銀乳剤1モル
当り塩化金酸として120mg添加してから、塗布助
剤としてサポニンの適量を加えて塗布液とした。
塗布に際しては下引加工を施した、ポリエチレ
ンテレフタレートベース上の両面に対して均一に
塗布した。
続いて、前記のように調製した感光性乳剤を採
取し、等分してから本発明における前記一般式
〔〕で表される化合物を、下記第1表に示され
るように添加したものと、比較として未添加のも
のおよび比較色素として下記の比較−〔R〕を添
加したものとを作製した。次に、それぞれに塗布
助剤としてサポニンの適量を加えたのち、前記の
塩化銀乳剤層上に両面均一塗布した。
更に、この層の上に、保護層として、適量の硬
膜剤(ホルマリン)と塗布助剤(コハク酸−2−
エチルヘキシル−エステルモノスルホン酸ナトリ
ウム)とを含む2.5%ゼラチン水溶液を重層塗布
し、各種ネガ型ハロゲン化銀写真感光材料を作成
した。
得られた試料の両面塗布量としては、感光性の
ないハロゲン化銀乳剤層としての塩化銀層の銀量
が1.0g/m2、物理現像核が金量として1.0mg/m2
で、感光性ハロゲン化銀乳剤層としての沃臭化銀
層の銀量が3.0g/m2であつた。
得られた各試料について、第1表に示される条
件にて生保存性試験処理を行なつてから、各試料
フイルムピースを3.2CMSの光でウエツジ露光し
たのち、下記処方の現像液により35℃で30秒間現
像を行い、ついで定着、水洗乾燥してからセンシ
トメトリーを行つた。
〔現像液処方〕
ハイドロキン
無水亜硫酸ナトリウム
フエニドン
水酸化ナトリウム
5−メチルベンゾトリアゾール
臭化カリウム
水を加えて1にする。 12.0g
65.0g
1.0g
15.0g
0.5g
2.0g
得られた結果を下記の第1表に示す。
なお、表中の感度値は試料No.1の感度を100と
する相対感度で示してある。
The present invention relates to an improvement in a negative image forming method for obtaining a negative image with high sensitivity, high contrast, and high maximum density through rapid phenomenon processing using physical phenomenon nuclei. The supply of metallurgical materials, which are essential as raw materials for silver halide photographic materials, is decreasing, while the demand in various industries is increasing, resulting in significant price fluctuations. Currently, attempts are being made to quantify silver. For example, one example is a silver salt diffusion transfer method that utilizes physical phenomenon nuclei. This method is extremely useful because the covering power (silver covering power) of the transferred image is very high, so a photographic image with higher density can be obtained with a small amount of silver halide, and the sensitivity and sharpness are also excellent. This is known as an image forming method. However, this method is a negative-positive diffusion transfer method, and the image finally obtained is a positive image, so it is not suitable for the purpose of forming a negative image. On the other hand, as a photosensitive material for the purpose of finally obtaining a negative image, (1) photosensitive silver halide (2) metal salt particles that are more easily soluble than photosensitive silver halide and have substantially no photosensitivity. A photographic material containing particles in which a refractory agent is adsorbed and (3) physical development nuclei has been proposed in JP-A-54-48544. This photographic material is processed with a physical developer containing a silver halide reducing agent and a substance that dissolves metal salt particles in order to obtain a negative image. In this method, silver ions are reduced and precipitated on physical development nuclei. The method requires time, lacks suitability for rapid processing, and also causes a decrease in sensitivity and maximum concentration, making it difficult to say that it is an adequate method. That is, further improvements have been desired from the viewpoint of speeding up the processing by shortening the development processing time. The object of the present invention is to improve the disadvantages of the negative image forming method using the silver-saving photographic materials mentioned above. SUMMARY OF THE INVENTION It is therefore a first object of the present invention to provide a method for forming negative images using photographic materials which provides improved sensitivity and contrast as well as high maximum density. A second object of the present invention is to provide a method for forming a negative image using a photographic material that has improved deterioration of photographic properties during raw storage. A third object of the present invention is to provide a negative image forming method that can quickly form a photographic image. The above object of the present invention is to contain at least one of the following compounds (1), (2) and (3) and the following general formula [] in a photographic constituent layer coated on a support. After image exposure, the photographic material is treated with a processing solution containing a reducing agent and a substance that dissolves the metal salt particles described in (2) below to selectively dissolve the metal salt particles in the exposed areas. ) is constituted by a negative image forming method characterized by having a step of depositing a metal image on the physical development nuclei of (a). (1) Photosensitive silver halide grains (2) Metal salt particles that are more easily soluble than the above (1) and whose surfaces have been made difficult to dissolve with a refractory agent (3) Physical development nucleus general formula [] Z 1 and Z 2 in the formula may be the same or different5
Represents the atomic group necessary to complete a nitrogen-containing or 6-membered heterocyclic nucleus, specifically an oxazoline nucleus,
Oxazole nuclei (e.g. 4-methyloxazole, 5-methyloxazole, 4-phenyloxazole, 5-phenyloxazole, 4,5-
diphenyloxazole, etc.), benzoxazole nuclei (e.g., benzoxazole, 5-chlorobenzoxazole, 5-methylbenzoxazole, 5-phenylbenzoxazole, 5,6
-dimethylbenzoxazole, 5-methoxybenzoxazole, 5-ethoxybenzoxazole, 6-methoxybenzoxazole, 5-acetylbenzoxazole, 5-benzoylbenzoxazole, 5-chloro-6-methylbenzoxazole, 5-carboxybenzoxazole , 5-ethoxycarbonylbenzoxazole, 6-nitrobenzoxazole, 5-chloro-6-nitrobenzoxazole, 5-hydroxybenzoxazole, 6-hydroxybenzoxazole, etc.), naphthoxazole core (e.g.
α-naphthoxazole, β-naphthoxazole, etc.), thiazophosphoric acid (e.g. thiazoline, 5
-methylthiazoline etc.), thiazole nucleus (e.g.
Thiazole, 4-methylthiazole, 4-phenylthiazole, 5-methylthiazole, 5-phenylthiazole, 4,5-dimethylthiazole,
4,5-diphenylthiazole, etc.), benzothiazole nuclei (e.g., benzothiazole, 4-chlorobenzothiazole, 5-chlorobenzothiazole, 6-chlorobenzothiazole, 7-chlorobenzothiazole, 5-methylbenzothiazole,
6-Methylbenzothiazole, 5,6-dimethylbenzothiazole, 5-bromobenzothiazole, 6-bromobenzothiazole, 5-phenylbenzothiazole, 4-methoxybenzothiazole, 5-methoxybenzothiazole, 6-methoxybenzothiazole , 5-iodobenzothiazole, 6-iodobenzothiazole, 5-methoxycarbonylbenzothiazole, 5-ethoxybenzothiazole, tetrahydrobenzothiazole,
5-N,N-dimethylaminobenzothiazole,
5,6-dimethoxybenzothiazole, 5-hydroxybenzothiazole, 6-hydroxybenzothiazole, 5-carboxybenzothiazole,
5-nitrobenzothiazole, 6-nitrobenzothiazole, 5-chloro-6-nitrobenzothiazole, 5,6-methylenedioxybenzothiazole, etc.), naphthothiazole nuclei (e.g., α-naphthothiazole, β-naphthothiazole, 5-methoxy-β-naphthothiazole, 5-ethoxy-
β-naphthothiazole, 8-methoxy-α-naphthothiazole, 7-methoxy-α-naphthothiazole, etc.), benzoselenazole core (e.g., benzoselenazole, 5-chlorobenzoselenazole, 5-methoxybenzoselenazole, 5-hydroxybenzoselenazole, tetrahydrobenzoselenazole, etc.), naphthoselenazole nucleus (e.g., α-naphthoselenazole, β-naphthoselenazole, etc.), 2-pyridine nucleus (e.g., 2-pyridine, 3-methylpyridine) , 4-methylpyridine, 5-methylpyridine, 3,4-dimethylpyridine, 4-chloropyridine, 3-hydroxypyridine, 3-phenylpyridine, etc.), 4-pyridine nucleus (e.g., 4-pyridine, 2-methyl pyridine, 3-methylpyridine, 3-chloropyridine,
2,6-dimethylpyridine, 3-hydroxypyridine, etc.), 2-quinoline nuclei (e.g., 2-quinoline, 3-methylquinoline, 5-methylquinoline,
7-methylquinoline, 8-methylquinoline, 6-
chloroquinoline, 8-chloroquinoline, 6-methoxyquinoline, 6-ethoxyquinoline, 6-hydroxyquinoline, 8-hydroxyquinoline, etc.),
4-quinolinic acid (e.g., 4-quinoline, 6-methoxyquinoline, 7-methylquinoline, 8-methylquinoline, etc.), 1-isoquinoline nucleus (e.g.,
1-isoquinoline, 3,4-dihydroisoquinoline, etc.), 3-isoquinoline core (e.g., 3-isoquinoline, 5-methylisoquinoline, 1-methylisoquinoline, 6-chloroisoquinoline, 6-methoxyisoquinoline, 8-methoxyisoquinoline, etc.) represents. In addition, R 1 and R 2 in the above formula are lower alkyl groups having 1 to 4 carbon atoms (e.g., methyl, ethyl, propyl, butyl, etc.), substituted alkyl groups (e.g., β-hydroxyethyl, γ-hydroxypropyl, etc.). hydroxyalkyl group, β-sulfoethyl,
a sulfoalkyl group such as γ-sulfopropyl or δ-sulfobutyl, or a carboxyalkyl group such as β-carboxyethyl or γ-carboxypropyl, and at least one of R 1 and R 2 is a sulfoalkyl group or a carboxyalkyl group. It is. Further, R 3 represents a lower alkyl group having 1 to 4 carbon atoms, X represents an anion (eg, halogen, etc.), l, m and n represent 0 or 1, and a represents 0 or 1. Next, the negative image forming method of the present invention will be explained in more detail. First, specific examples of the compound represented by the above general formula [] will be described below, but the present invention is not limited thereto. These compounds included in the above general formula [] are known, for example, Cyaninated Soy and Related Compound (Harmer, 1964).
and The Theory of the Photographic Process (by Mies James, 3rd edition,
(1966) and others.
In the negative image forming method of the present invention, the above-mentioned compound is added to the photographic constituent layer containing the metal salt particles or physical development nuclei, or is added to the photosensitive silver halide grains, metal salt particles and physical development nuclei. Although they may be added to a photographic constituent layer containing a mixture of development nuclei, it is most preferable to use them by adding and adsorbing them into a constituent layer containing photosensitive silver halide grains. The amount used is 10 -5 to 10 -2 mol, preferably 10 -4 to 10 -3 mol, per mol of silver halide. It may be added at any time during the manufacturing process, but in the case of a photosensitive silver halide emulsion, it may be added at any time during the early or late chemical ripening. Examples of the photosensitive silver halide used in the photographic image forming method of the present invention include silver chloride, silver bromide,
Silver iodide, silver chlorobromide, silver iodobromide, silver chloroiodobromide, or mixtures thereof are included, but it is preferable to use silver iodobromide, which has high sensitivity, especially when the Silver iodobromide containing silver iodide is preferred in the present invention. The above-mentioned photosensitive silver halide is applied to the present invention in the form of a silver halide emulsion, and the emulsion can be produced by various manufacturing methods including the usual manufacturing method, such as those described in Japanese Patent Publication No. 46-7772. Alternatively, the so-called conversion emulsion method described in US Pat. No. 2,592,250, such as the single-jet emulsion method and the double-jet emulsion method, can be used. Further, the photosensitive silver halide grains used in the present invention include those having various crystal habits.
Although the particle size varies depending on the intended use of the photographic material, it is usually within the range of 0.1 to 3.0 μm. These silver halide emulsions are then chemically sensitized using various chemical sensitizers. Chemical sensitizers include known sensitizers such as sulfur sensitizers, selenium sensitizers, and noble metal sensitizers, as well as reduction sensitizers,
Polyalkylene oxide-based sensitizers are also widely used. These silver halide emulsions can also be prevented from generating capri by using known stabilizers such as imidazoles, triazoles, and azaindenes. Next, in a state where the surface of the metal salt particles used in the present invention is not coated with the refractory agent, the dissolution rate in the substance that dissolves the metal salt particles described below is the same as that of the photosensitive silver halide. It is a salt of a metal that is larger than the above and has substantially no photosensitivity. More specifically, the conditions regarding the dissolution rate of both of these grains are as follows: The presence of at least one of the metal salt dissolving agents described below in the metal salt grain group (A) and the photosensitive silver halide grain group (B). The dissolution rate (mass of substance dissolved per unit time) (in the treatment liquid used in the present invention) shown below is (A) and (B) when the total mass of particles contained in both particle groups is equal. It is necessary that (A) is larger than the particle group (B). Measurement methods when such conditions are actually applied include the following methods. First, two types of emulsions each containing photosensitive silver halide particles and metal salt particles in a hydrophilic colloid were prepared, each emulsion was coated on a support and dried.
Create two types of samples. The amount of coating at this time is such that the amounts of photosensitive silver halide, metal salt, and hydrophilic colloid per unit area are equal between the two types of samples. The obtained sample is immersed in a 5% aqueous sodium thiosulfate solution (temperature 20°C) without stirring. The immersion time is several seconds, for example 2 seconds, 5 seconds and 8 seconds. Next, the sample is immediately transferred to a water tank, washed with water, and then dried. The amount of residual photosensitive silver halide and residual metal salt of the sample treated in this manner is analyzed and measured by a known method, and the residual percentage (%) is determined for each. Draw a graph of residual distillation rate and soaking time, and the residual distillation rate is 50%.
The immersion time t1 of the photosensitive silver halide sample corresponding to
and find the immersion time t2 of the metal salt particle sample, and calculate t2/t1
Find the value of. The value of t2/t1 determined in this way needs to be smaller than 1, and preferably smaller than 0.7. The metal salt particles used in the present invention may be appropriately selected from those having the above-mentioned properties, but in a preferred embodiment of the present invention, the metal salt particles are substantially photosensitive. Silver halide grains that do not have a silver halide grain and have a higher dissolution rate for a substance that dissolves silver halide grains than the photosensitive silver halide grains are selected. More specifically, the metal salt particles preferably applied to the present invention are pure silver bromide, pure silver chloride, or a mixed silver halide thereof that has not been subjected to chemical sensitization treatment, and is It is desirable that the crystals be finer than that of silver. In the method of the present invention, the term "substantially non-photosensitive" means "non-photosensitive" in relation to the photosensitive silver halide; Specifically, when the light-sensitive photographic element of the present invention is provided with the light energy necessary to sensitize the light-sensitive silver halide, it is to be understood that it is "substantially unsensitized" by the light energy. be. More specifically, the particles of the metal salt of the present invention are fine particles of the metal salt that generally have a photosensitivity that is at least 1/10 less than that of the photosensitive silver halide. The metal ions or metal complex ions produced as a result of the dissolution of the metal salt particles are reduced to metals on the physical development nuclei in the presence of a reducing agent. The metal salt particles used in the present invention are used in an amount of 0.1 to 100 mol per mol of photosensitive silver halide. The surface of the metal salt particles used in the present invention is coated with a refractory agent, and the refractory agent is adsorbed onto the surface of the metal salt particles, or a portion of the particle surface becomes an active site for a dissolution reaction. This is a compound that slows down the dissolution rate of particles in the presence of the metal salt dissolving agent by adsorbing to the metal salt dissolving agent, and this poorly soluble agent adsorbs to the surface of the easily soluble metal salt particles, dissolving the metal ions of the metal salt. It also includes compounds that form poorly soluble salts or complex salts with. According to one preferred embodiment of the present invention, the refractory agent is selected from compounds that adsorb to silver halide grains, which are easily soluble metal salt particles, and reduce the solubility thereof. These compounds are, for example, mercapto compounds, and more specifically cysteine, 1-phenyl-5-mercaptotetrazole, mercaptobenzthiazole, mercaptobenzselenazole, mercaptobenzoxazole, mercaptobenzimidazole, benzylmercaptan, 4- Ethyl-2-thio-oxazoline, 2-mercapto-6-azauracil, 4-hydroxy-2-mercapto-6-methyl-pyrimidine, 3-mercapto-4-phenyl-5-methyl-1,2,4-triazole, etc. are included as representative examples. Further, thiourea, indazoles, triazoles, imidazoles and the like are also preferred compounds that can be used in the present invention. Among these, mercaptotetrazole compounds are preferred. The substance that dissolves the metal salt particles used in the present invention (hereinafter referred to as metal salt dissolving agent) is a substance that acts on the metal salt particles used in the present invention to generate metal ions or soluble metal complex ions. This may be the solvent of the treatment liquid used in the present invention, such as water. According to a preferred embodiment of the present invention, the dissolving agent is a substance that does not substantially dissolve the photosensitive silver halide used in the present invention, or is a metal in an amount that does not substantially dissolve the photosensitive silver halide. The photosensitive silver halide, which is a salt particle, is a substance that dissolves fine particles of silver halide that have different solubility, and typical examples include sulfites such as sodium sulfite,
Thiosulfates such as sodium thiosulfate, potassium thiosulfate, and ammonium thiosulfate; cyanates such as potassium cyanide and sodium cyanide; thiocyanates such as sodium thiocyanide and potassium rhodan; amino acid compounds such as cystine and cysteine; thiourea; Phenylthiourea, 3,6-di-
Examples include thiourea compounds such as thia-1,8-octadiol, thioether compounds, and the like. In the present invention, the most preferred embodiment is that the metal salt dissolving agent is present in the processing solution, while the refractory agent is present in the photographic constituent layer containing the metal salt particles. Moreover, methanol is suitable as a solvent when adding the refractory agent. Regarding the addition amount, when it is included in the photographic constituent layer, the refractory agent is added per mole of metal salt of the metal salt particles used in the present invention.
The range is preferably 0.01g to 7.0g, and more preferably 0.1g to 5.0g. Among the metal salt dissolving agents, sodium sulfite in particular is generally used as a preservative for developing solutions, so the amount of the above dissolving agents used per processing solution excluding sodium sulfite is preferably 0.001 to 50 g. The amount ranges from 0.01 to 30 g, but by using the compound of the general formula [] according to the present invention, the amount of the metal salt dissolving agent used can be reduced.As a result, the generation of sludge in the developer and the storage stability are improved. was successful. Furthermore, physical development nuclei used in the present invention include colloids of precious metals such as gold, silver, and platinum;
Metal sulfides such as palladium and zinc, metal selenides, and the like can be used. Among these, metal silver particles obtained by reducing silver compounds (for example, silver nitrate, silver halide, etc.) and palladium sulfide are particularly preferred. These physical development nuclei are substances that have the function of catalytically promoting the process in which the metal ions or metal complex ions produced by dissolving the metal salt are reduced to metal by a reducing agent, or such a function. It does not necessarily have to be a physical particle. The content of the above-mentioned physical development nuclei in the photographic constituent layer varies depending on the type thereof, but for example, in the case of silver sulfide, it is 0.001 g/m 2 to 1.0 g/m 2 as metallic silver, and metallic silver (reducing fine particles of silver chloride) (manufactured by)
A range of 0.01 g to 3.0 g/m 2 is suitable. The photographic light-sensitive material according to the present invention can have various configurations of constituent layers depending on its purpose or use. That is, the photographic light-sensitive material according to the present invention comprises, on a support, (1) photosensitive silver halide grains, (2) metal salt particles that are more easily soluble than the silver halide and have substantially no photosensitivity, and ( 3) Although it is a photographic light-sensitive material containing physical development nuclei, the above (1) to (3) may be contained in separate layers, or any two or more of the above (1) to (3) may be contained. They may be contained in the same layer. For example, a layer containing physical development nuclei, a layer containing metal salt particles, a layer containing photosensitive silver halide particles, and a layer containing a silver halide developer are laminated on a support in this order from the support side. Starting with the layer structure, the order of lamination may be reversed, or for example, a layer containing physical development nuclei and a silver halide developer is coated from the support side, and a layer containing a photosensitive halogen It is possible to have a two-layer structure in which silver halide grains and metal salt particles are mixed in the same layer, and photosensitive silver halide grains, metal salt particles, and physical development nuclei are present in the same layer. It is also possible to form a single layer structure by coating a mixture of layers on a support. Still another method is to prepare two supports and perform the layer construction separately for each support, or even prepare three supports and coat each layer one layer at a time. may be set. A preferred layer structure of the silver halide photographic light-sensitive material according to the present invention is a single layer in which photosensitive silver halide grains, metal salt particles, and physical development nuclei are mixed and present on the same support. Either a layer structure coated on top or a layer containing a mixture of metal salt particles and physical development nuclei is coated from the support side,
Preferably, a layer containing only photosensitive silver halide grains is coated thereon to form a two-layer structure. The layer structure of the photographic light-sensitive material according to the present invention has already been described above, but if necessary, for example, a protective layer, an anti-halation layer, a non-diffusible dye layer in which a dye is fixed with a mordant, etc. are added at appropriate positions. Auxiliary layers may be provided and photographic additives other than those mentioned above may be added to these layers. Further, the photosensitive silver halide, metal salt particles, and physical development nuclei described above are present individually or in a mixture of two or more thereof, dispersed in a suitable binder. Various hydrophilic colloids can be used as the binder, and gelatin is typically preferably used. Furthermore, for the purpose of improving the physical properties of a coating film containing the above-mentioned hydrophilic colloid as a binder, it is preferable to use various film property improving agents, such as a hardening agent, as necessary. The coating composition containing hydrophilic colloid as a binder used in the present invention may contain photographic additives other than the above-mentioned hardeners, such as gelatin plasticizers, surfactants, ultraviolet absorbers, and antistain agents, if necessary. , PH regulator, antioxidant, antistatic agent, thickener, graininess improver, dye, mordant, brightener,
Development speed regulators, matting agents, silver halide developers, etc. can be used within the range that does not impair the effects of the present invention. Supports used in the photographic material used in the present invention include, for example, baryta paper, polyethylene-coated paper, polypropylene synthetic paper, glass plates, cellulose acetate, cellulose nitrate, polyester films such as polyethylene terephthalate, polyamide films, Typical examples include polypropylene film, polycarbonate film, polystyrene film, etc., and these supports are appropriately selected depending on the intended use of the photographic material. After exposure, the silver halide photographic material used in the present invention is processed with a processing solution containing a reducing agent. A developing agent is advantageously used as the reducing agent in the processing solution used in the present invention. As a developing agent,
For example, hydroquinone, which is well known in the art,
Polyhydroxybenzenes represented by toluhydroquinone, 2,5-dimethylhydroquinone, etc., such as 1-phenyl-3-virazolidone,
3-virazolidones represented by 1-phenyl-4-methyl-3-virazolidone, such as ο-
Aminophenols represented by aminophenol, p-aminophenol, etc., such as 1-(p
-hydroxyphenyl)-3-aminovirazolidone, 1-aryl-3-aminovirazolines such as 1-(p-methylaminophenyl)-3-virazoline, ascorbic acid, and others, C.
EKMees and THJames, “The Theory of
the Photographic Process” 3rd edition (1966,
Maemillan Co, NY), Chapter 13, LPA
Photographic Processing by Mason
"Chemistry" (1966, The Focal Press,
Compounds described as developing agents on pages 16 to 30 (London) can be used alone or in combination. The PH of the treatment liquid is 5 or more, preferably PH5.5 to 13.2
degree is optimal. The processing solution may contain various additives such as an alkaline agent, a PH buffer, a development accelerator, and an antifoggant, if necessary. The processing temperature using the above-mentioned processing liquid is suitably in the range of 20°C to 50°C. As mentioned above, the silver halide photographic material which has been reduced in silver by the method of the present invention can be used not only as a general-purpose black-and-white photographic material, but also as a highly sensitive radiation-sensitive material or a high-contrast photographic material for printing. It can be applied to a wide range of materials, including photosensitive materials for lithographic printing. Hereinafter, the present invention will be specifically explained with reference to Examples. Example 1 [Preparation of photosensitive silver halide emulsion] Gold sensitized and sulfur sensitized by a conventional method.
A high-sensitivity silver iodobromide gelatin emulsion containing 4.0 mol% of silver iodide that has been aged to the highest sensitivity is added with 4-hydroxy-6-methyl-1,3,3a, as a stabilizer.
A photosensitive silver halide grain emulsion was prepared by adding 1.5 g of 7-tetrazaindene per mole of silver halide. The average grain size of this emulsion was approximately 1.3μ. [Preparation of metal salt grains (substantially non-photosensitive silver halide grains)] A pure silver chloride gelatin emulsion consisting of nitrate and sodium chloride was prepared by a neutral method. The average grain size of this emulsion was easily soluble silver chloride grains of about 0.1 μm. [Preparation of physical development angle] 1% polyvinyl alcohol (saponification degree 99)
%, polymer with a degree of polymerization of 1000) in 10 ml of an aqueous solution of
50 ml of 0.2% chloroauric acid was added and stirred at room temperature, and 10 ml of 1% sodium borate hydride was added to form physical development nuclei of gold colloid. First, a silver chloride emulsion with virtually no photosensitivity was taken from among the three types prepared as described above, and 1.2 g of 1-phenyl-5-mercaptotetrazole was added per mole of silver halide as a refractory agent. ,
Subsequently, 120 mg of the above-mentioned physical development nucleus was added as chloroauric acid per mole of silver chloride emulsion, and then an appropriate amount of saponin was added as a coating aid to prepare a coating solution. At the time of application, it was applied uniformly to both sides of a polyethylene terephthalate base that had been subjected to undercoat processing. Subsequently, the photosensitive emulsion prepared as described above was collected, divided into equal parts, and the compound represented by the general formula [] according to the present invention was added as shown in Table 1 below. For comparison, a sample without the addition of the dye and a sample with the following comparative dye [R] added thereto were prepared. Next, an appropriate amount of saponin was added as a coating aid to each layer, and then coated uniformly on both sides of the silver chloride emulsion layer. Furthermore, on top of this layer, a suitable amount of a hardening agent (formalin) and a coating aid (succinic acid-2-
A 2.5% aqueous gelatin solution containing ethylhexyl-ester monosulfonate (sodium ethylhexyl ester monosulfonate) was coated in multiple layers to prepare various negative-working silver halide photographic materials. The amount of coating on both sides of the obtained sample was as follows: the amount of silver in the silver chloride layer as a non-photosensitive silver halide emulsion layer was 1.0 g/m 2 , and the amount of gold as physical development nuclei was 1.0 mg/m 2
The silver content of the silver iodobromide layer as a photosensitive silver halide emulsion layer was 3.0 g/m 2 . Each of the obtained samples was subjected to a raw storage test treatment under the conditions shown in Table 1, and then each sample film piece was wedge-exposed to 3.2 CMS light, and then incubated at 35°C using a developer with the following formulation. The film was developed for 30 seconds, then fixed, washed with water, and dried before sensitometry. [Developer formulation] Add hydroquine anhydrous sodium sulfite phenidone sodium hydroxide 5-methylbenzotriazole potassium bromide water to make 1. 12.0g 65.0g 1.0g 15.0g 0.5g 2.0g The results obtained are shown in Table 1 below. Note that the sensitivity values in the table are expressed as relative sensitivities, with the sensitivity of sample No. 1 being 100.
【表】
第1表から明らかなように、本発明法による試
料No.2〜13は高い感度、コントラスト及び最高濃
度が得られ、しかも高温低湿下および高温高湿下
における保存によるところのカブリの増加を大幅
に低減できることが判る。
実施例 2
感光性ハロゲン化銀乳剤に、前記した例示化合
物および比較色素として下記のものを添加した以
外は、実施例1とまつたく同一の方法で下記第2
表の如く試料を作成した。
比較色素
これら試料について実施例1と同様に処理して
得られた結果を次の第2表に示す。[Table] As is clear from Table 1, samples Nos. 2 to 13 obtained by the method of the present invention have high sensitivity, contrast, and maximum density, and are free from fog due to storage at high temperature and low humidity and high temperature and high humidity. It can be seen that the increase can be significantly reduced. Example 2 The following Example 2 was prepared in exactly the same manner as in Example 1, except that the above-mentioned exemplary compounds and the following comparative dyes were added to the photosensitive silver halide emulsion.
Samples were prepared as shown in the table. comparison dye These samples were treated in the same manner as in Example 1, and the results obtained are shown in Table 2 below.
【表】
なお、試料No.15、16および17は比較色素−〔A〕
と、試料No.18および20は比較色素−〔B〕とそれ
ぞれ緑色光感度を相対感度で比較したものであ
る。また試料No.22および24はそれぞれ比較色素−
〔C〕および〔D〕の赤色光感度を相対感度で比
較した値である。
この結果からも明らかなように、本発明の色素
を含有する試料は、苛酷なフイルム保存条件下に
長期間放置されても、高感度と高ガンマが保持さ
れることが判る。
実施例 3
この実施例は、本発明が迅速処理性の面でも、
短時間にカブリの小さい高感度、高ガンマの銀画
像が得られることを示したものである。
実施例1と2で作成した試料のうちから、下記
第3表に示したものについて迅速現像処理した。
現像液は実施例1と同一のものを用いた。[Table] Samples No. 15, 16 and 17 are comparative dyes - [A]
Samples Nos. 18 and 20 were compared with comparative dye-[B] in green light sensitivity in terms of relative sensitivity. Samples No. 22 and 24 are comparative dyes, respectively.
This is a value obtained by comparing the red light sensitivities of [C] and [D] in terms of relative sensitivity. As is clear from these results, it can be seen that the sample containing the dye of the present invention maintains high sensitivity and high gamma even if it is left under severe film storage conditions for a long period of time. Example 3 This example shows that the present invention has advantages in terms of rapid processability as well.
This shows that high-sensitivity, high-gamma silver images with little fog can be obtained in a short time. Among the samples prepared in Examples 1 and 2, those shown in Table 3 below were subjected to rapid development processing. The same developer as in Example 1 was used.
【表】【table】
【表】
第3表(1)及び(2)からも明らかなように、本発明
に係る試料は迅速現像処理性がすぐれることが判
る。[Table] As is clear from Tables 3 (1) and (2), it can be seen that the samples according to the present invention have excellent rapid development processability.
Claims (1)
示す(1)、(2)及び(3)と下記一般式〔〕で表わされ
る化合物の少なくとも1つを含有する写真感光材
料を画像露光後、還元剤及び下記(2)の金属塩粒子
を溶解せしめる物質を含む処理液で処理すること
により露光部の金属塩粒子を選択的に溶解し、次
いで下記(3)の物理現像核上に金属画像として析出
せしめる工程を有することを特徴とする陰画像形
成方法。 (1) 感光性ハロゲン化銀粒子 (2) それ自体上記(1)より易溶性でかつ難溶化剤に
て表面を難溶化せしめた金属塩の粒子 (3) 物理現像核 一般式〔〕 〔式中、Z1およびZ2は各々5員または6員の含窒
素複素環核を完成するに必要な非金属原子群を表
わし、R1およびR2は各々低級アルキル基または
置換アルキル基であつて、R1、R2のうちの少な
くとも一方はスルホアルキル基もしくはカルボキ
シアルキル基である。R3は低級アルキル基、X
はアニオン、l、m及びnは0または1、aは0
または1を表わす。〕[Scope of Claims] 1 A photographic constituent layer coated on a support contains at least one of the following compounds (1), (2) and (3) and the following general formula [] After image exposure, the photographic material is treated with a processing solution containing a reducing agent and a substance that dissolves the metal salt particles described in (2) below to selectively dissolve the metal salt particles in the exposed areas. 1.) A method for forming a negative image, comprising the step of depositing a metal image on the physical development nuclei of .). (1) Photosensitive silver halide grains (2) Metal salt particles that are themselves more easily soluble than the above (1) and whose surfaces have been made refractory with a refractory agent (3) Physical development nucleus general formula [] [In the formula, Z 1 and Z 2 each represent a group of nonmetallic atoms necessary to complete a 5- or 6-membered nitrogen-containing heterocyclic nucleus, and R 1 and R 2 are each a lower alkyl group or a substituted alkyl group. At least one of R 1 and R 2 is a sulfoalkyl group or a carboxyalkyl group. R 3 is a lower alkyl group,
is an anion, l, m and n are 0 or 1, a is 0
Or represents 1. ]
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14921182A JPS5938738A (en) | 1982-08-30 | 1982-08-30 | Formation of negative image |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14921182A JPS5938738A (en) | 1982-08-30 | 1982-08-30 | Formation of negative image |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5938738A JPS5938738A (en) | 1984-03-02 |
| JPH05696B2 true JPH05696B2 (en) | 1993-01-06 |
Family
ID=15470264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14921182A Granted JPS5938738A (en) | 1982-08-30 | 1982-08-30 | Formation of negative image |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5938738A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR950000103B1 (en) * | 1991-04-15 | 1995-01-09 | 금성일렉트론 주식회사 | Semiconductor device and manufacturing method thereof |
-
1982
- 1982-08-30 JP JP14921182A patent/JPS5938738A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5938738A (en) | 1984-03-02 |
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