JPH0571163B2 - - Google Patents

Info

Publication number
JPH0571163B2
JPH0571163B2 JP22516787A JP22516787A JPH0571163B2 JP H0571163 B2 JPH0571163 B2 JP H0571163B2 JP 22516787 A JP22516787 A JP 22516787A JP 22516787 A JP22516787 A JP 22516787A JP H0571163 B2 JPH0571163 B2 JP H0571163B2
Authority
JP
Japan
Prior art keywords
magnetic
heat treatment
film
amorphous soft
soft magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP22516787A
Other languages
Japanese (ja)
Other versions
JPS6468913A (en
Inventor
Kanji Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP22516787A priority Critical patent/JPS6468913A/en
Priority to US07/243,533 priority patent/US4944805A/en
Publication of JPS6468913A publication Critical patent/JPS6468913A/en
Publication of JPH0571163B2 publication Critical patent/JPH0571163B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は二層以上の非晶質軟磁性膜の熱処理方
法に関し、特に広い周波数範囲で高透磁率が得ら
れて薄膜磁気ヘツドの磁気コアなどの各種磁気応
用部品に好適となる非晶質軟磁性膜の熱処理方法
に関する。
Detailed Description of the Invention (Industrial Application Field) The present invention relates to a method for heat treatment of an amorphous soft magnetic film having two or more layers, and in particular to a method for heat treatment of an amorphous soft magnetic film having two or more layers, and in particular for obtaining a high magnetic permeability in a wide frequency range and applying it to a magnetic core of a thin film magnetic head. The present invention relates to a heat treatment method for an amorphous soft magnetic film suitable for various magnetic application parts such as.

(従来技術) 金属は、通常、固体状態において原子配列が規
則性を有した結晶構造を持つて存在しているもの
であるが、例えば、ある種の合金溶液を溶融状態
から急冷凝固させたり、あるいは、ある種のター
ゲツト材料をイオンによりスパツタリングし、そ
の散乱された原子を基板上に急冷付着させたりす
ることにより、固体状態でも液体状態に類似した
原子配列を持つ非晶質状態の軟磁性材料が得られ
ることは周知のとおりである。
(Prior Art) Metals usually exist in a solid state with a crystal structure in which the atomic arrangement is regular. Alternatively, by sputtering a certain type of target material with ions and rapidly cooling and depositing the scattered atoms on a substrate, an amorphous soft magnetic material with an atomic arrangement similar to that in the liquid state can be created even in the solid state. It is well known that the following can be obtained.

このようにして得られた非晶質軟磁性材料は、
原子配列が結晶質材料のような長範囲規則性を有
せず、ランダムに配列しているために元来、結晶
質のような結晶磁気異方性を有していない。
The amorphous soft magnetic material obtained in this way is
Since the atomic arrangement does not have long-range regularity like crystalline materials and is arranged randomly, it does not inherently have magnetocrystalline anisotropy like crystalline materials.

しかし、非晶質軟磁性材料は、その製造時に何
らかの理由で材料中に磁気異方性が誘起されるこ
とが多い。ところが、このように生起された誘導
磁気異方性は、その大きさや方向の分布が不均一
であり、製造直後の材料の磁気特性が一般的に余
り良くなく、しかも熱的にも不安定である。ま
た、非晶質状態を作り出す際に、その製造方法に
起因する種々の歪が生じており、これが材料内部
に残留してしまい、この点からも磁気特性を悪く
し、熱的に不安定である。特に磁気ヘツドの様に
磁極材料がガラスなどによつてモールドされてい
る場合には、モールド後に熱処理を施こすと、内
部歪は一度除去されてもガラスとの界面に新たな
応力が発生し、かえつて特性を悪くしてしまうこ
とがある。
However, magnetic anisotropy is often induced in the amorphous soft magnetic material for some reason during its manufacture. However, the induced magnetic anisotropy generated in this way is non-uniform in its distribution in size and direction, and the magnetic properties of the material immediately after manufacture are generally not very good, and moreover, it is thermally unstable. be. In addition, when creating an amorphous state, various strains occur due to the manufacturing method, and this remains inside the material, which also impairs magnetic properties and makes it thermally unstable. be. Particularly when the magnetic pole material is molded with glass, as in the case of a magnetic head, if heat treatment is applied after molding, new stress will be generated at the interface with the glass even if the internal strain has been removed. It may even worsen the characteristics.

非晶質軟磁性材料製造時のこれら誘導磁気異方
性や内部歪を除去するために、従来より行われて
いる熱処理方法、例えば、キユリー温度および結
晶化温度以下の温度で非酸化性雰囲気中において
回転磁界中で熱処理する方法は有効な方法であ
り、直流や低周波領域での透磁率を向上させるこ
とができる。
In order to remove these induced magnetic anisotropy and internal strain during the production of amorphous soft magnetic materials, conventional heat treatment methods are used, for example, in a non-oxidizing atmosphere at a temperature below the Curie temperature and the crystallization temperature. The method of heat treatment in a rotating magnetic field is an effective method and can improve the magnetic permeability in the direct current and low frequency regions.

(発明が解決しようとする問題点) しかし、反面、誘導磁気異方性が除去されて磁
気異方性が小さくなると、磁区構造が不安定で粗
大になり、磁壁の移動が生じ易くなるため、高周
波領域(1MHz以上)での透磁率は逆に低下して
くるという問題が生じる。
(Problems to be Solved by the Invention) However, on the other hand, when the induced magnetic anisotropy is removed and the magnetic anisotropy becomes smaller, the magnetic domain structure becomes unstable and coarse, and domain walls tend to move. A problem arises in that the magnetic permeability in the high frequency region (1 MHz or higher) decreases.

高周波領域での透磁率を向上させるためには、
磁化過程として、磁壁移動よりもそのスイツチン
グ速度が速い磁化回転を用いる必要があり、その
ためには、磁気材料にある適切な大きさの一軸磁
気異方性を付与し、その困難軸方向に駆動する必
要がある。
In order to improve magnetic permeability in the high frequency region,
As the magnetization process, it is necessary to use magnetization rotation, which has a faster switching speed than domain wall movement. To do this, it is necessary to impart an appropriate amount of uniaxial magnetic anisotropy to the magnetic material and drive it in the difficult axis direction. There is a need.

また、磁性材料の内部に残留した歪をガラスな
どの異種材料に覆われるまえに除去してやり最終
的に磁性材料内部に歪が残らないようにしてやる
必要がある。
Furthermore, it is necessary to remove the strain remaining inside the magnetic material before it is covered with a different material such as glass, so that no strain remains inside the magnetic material.

本発明の目的は、上記事情に基づいて行われた
もので、非晶質軟磁性材料の高周波特性が改善さ
れる熱処理方法を提供することにある。つまり、
高周波領域で使用する非晶質軟磁性材料の特性を
向上させるためには、製造時に誘起される誘導磁
気異方性や内部歪を除去し、所望の方向に目的に
応じたある適切な大きさの一軸磁気異方性を付与
することが必要である。
An object of the present invention was made based on the above-mentioned circumstances, and it is an object of the present invention to provide a heat treatment method that improves the high frequency characteristics of an amorphous soft magnetic material. In other words,
In order to improve the properties of amorphous soft magnetic materials used in the high frequency region, it is necessary to remove the induced magnetic anisotropy and internal strain induced during manufacturing, and to adjust the properties of the amorphous soft magnetic material in the desired direction and size according to the purpose. It is necessary to impart uniaxial magnetic anisotropy.

(問題点を解決するための手段) 本発明の上記目的は、酸化物などから成る基体
上に少なくとも二層以上の非晶質軟磁性膜と酸化
物、導体金属膜などを付着させて、加工形成する
磁気応用素子において、該非晶質軟磁性膜を一層
付着させる毎に、非晶質軟磁性膜が最終的に高い
高周波透磁率を得たい方向と略直交する方向にか
けた静磁界中で該非晶質軟磁性材料の結晶化温度
およびキユリー温度より低い温度で熱処理を施
し、該非晶質軟磁性膜の各層を全て付着し終わつ
た後には、前記熱処理にひきつづいて、前記熱処
理温度と同じか、それ以下の温度で、該非晶質軟
磁性膜が最終的に高い高周波透磁率を得たい主た
る方向にかけた静磁界中で最終の熱処理をし、こ
の最終の熱処理の温度と時間により該非晶質軟磁
性材料の一軸磁気異方性の大きさを制御すること
を特徴とする非晶質軟磁性膜の熱処理方法により
達成される。
(Means for Solving the Problems) The above object of the present invention is to attach at least two or more layers of an amorphous soft magnetic film, an oxide, a conductive metal film, etc. on a substrate made of an oxide, etc., and process it. In the magnetic application element to be formed, each time the amorphous soft magnetic film is deposited, the non-crystalline soft magnetic film is exposed to a static magnetic field applied in a direction substantially perpendicular to the direction in which high high frequency magnetic permeability is desired to be obtained. After the heat treatment is performed at a temperature lower than the crystallization temperature and the Curie temperature of the crystalline soft magnetic material, and after all the layers of the amorphous soft magnetic film have been deposited, subsequent to the heat treatment, a temperature equal to or lower than the heat treatment temperature is applied. At a temperature lower than that, a final heat treatment is performed in a static magnetic field applied in the main direction in which the amorphous soft magnetic film is desired to finally obtain high high frequency magnetic permeability. This is achieved by a heat treatment method for an amorphous soft magnetic film characterized by controlling the magnitude of uniaxial magnetic anisotropy of a magnetic material.

以上のようにして熱処理された非晶質軟磁性膜
は、最終的に内部歪がほとんどなく、また一軸異
方性が目的に応じた適切な大きさに制御されてい
るので、広い周波数範囲に渡つて高い透磁率が得
られ薄膜磁気ヘツドの磁気コアなどに好適なもの
となる。
The amorphous soft magnetic film heat-treated as described above has almost no internal strain, and the uniaxial anisotropy is controlled to an appropriate size according to the purpose, so it can be used in a wide frequency range. High magnetic permeability can be obtained over the entire range, making it suitable for magnetic cores of thin-film magnetic heads.

また、この方法では、非晶質軟磁性膜を付着す
る毎に静磁界中で熱処理を施し、歪を除去し、大
きな一軸誘導磁気異方性を付与するので最終の熱
処理をするまでの間の工程で受ける弱い浮遊磁界
や熱によつても一軸磁気異方性が乱されることが
なく、安定な特性を得ることができるという利点
もある。
In addition, in this method, each time an amorphous soft magnetic film is deposited, heat treatment is performed in a static magnetic field to remove strain and impart large uniaxially induced magnetic anisotropy. Another advantage is that the uniaxial magnetic anisotropy is not disturbed even by weak stray magnetic fields or heat received during the process, and stable characteristics can be obtained.

(実施例) 以下、本発明を薄膜磁気ヘツドの製造において
応用した実施例を挙げて本発明を説明する。
(Example) The present invention will be described below with reference to an example in which the present invention is applied to the production of a thin film magnetic head.

第1図a及びbは、作製した薄膜磁気ヘツドの
形状を示した概略図である。図中のコイル導体4
に電流を流すことにより矢印で示した方向に磁束
は流れ、磁気ギヤツプ部6より磁束が磁気コア7
の外部に漏れ磁気記録媒体へ記録をしたり、逆に
磁気記録媒体から漏れた磁束を磁気ギヤツプ部6
より磁気コア内に導き、矢印方向に磁束が流れ鎖
交するコイルに誘導電圧が誘起されることにより
記録信号の再生を行なつたりできる様な構造にな
つている。従つて、この薄膜磁気ヘツドでは、図
中に示した矢印方向(すなわち主にY方向)の透
磁率を広い周波数範囲に渡つて高めることが必要
となつている。
FIGS. 1a and 1b are schematic diagrams showing the shape of the manufactured thin film magnetic head. Coil conductor 4 in the diagram
By applying a current to the magnetic core 7, the magnetic flux flows in the direction shown by the arrow, and the magnetic flux flows from the magnetic gap part 6 to the magnetic core 7.
The magnetic flux leaking out of the magnetic recording medium can be recorded on the magnetic recording medium, or conversely, the magnetic flux leaking from the magnetic recording medium can be transferred to the magnetic gap part 6.
The structure is such that the magnetic flux is guided further into the magnetic core, flows in the direction of the arrow, and induces an induced voltage in the interlinking coils, thereby making it possible to reproduce the recorded signal. Therefore, in this thin film magnetic head, it is necessary to increase the magnetic permeability in the direction of the arrow shown in the figure (ie, mainly in the Y direction) over a wide frequency range.

また、このヘツドでは磁気コア7が2層の非晶
質軟磁性膜によつて形成されている。すなわち、
基板1材料に接している下部磁極膜2とこれとコ
イルをはさみ込む様に形づくられた上部磁極膜5
の2層の非晶質軟磁性膜からなつている。
Further, in this head, the magnetic core 7 is formed of two layers of amorphous soft magnetic films. That is,
A lower magnetic pole film 2 that is in contact with the substrate 1 material, and an upper magnetic pole film 5 that is shaped so as to sandwich the lower magnetic pole film 2 and the coil.
It consists of two layers of amorphous soft magnetic films.

以下、この薄膜磁気ヘツドの作製手順に従つて
本発明を発明する。まず、アルミナ研磨基板を基
板材料としてこの基板上にスパツタリング法を用
いて、10μm膜厚のCo91.8Zr2.3Nb5.9(at)%なる
組成の非晶質軟磁性膜(飽和磁束密度Bs=
10.5KG、飽和磁歪λs≒+3×10-7、結晶化温度
Tx=480℃)を全面に形成した。
The present invention will be described below in accordance with the manufacturing procedure of this thin film magnetic head. First, an amorphous soft magnetic film (saturation magnetic flux density Bs =
10.5KG, saturation magnetostriction λ s ≒+3×10 -7 , crystallization temperature
Tx=480°C) was formed on the entire surface.

次に、この試料に最終的に高い高周波透磁率を
得たい方向と略直交する方向すなわち後にヘツド
のパターンを形成した時に第1図のX方向となる
方向に印加した1Kθeの均一な磁界中において、
かつ10-3〜10-5Torrの真空中において350℃で30
分間の第1の熱処理を施しその後室温まで冷却し
た。この熱処理前後の磁性膜のBH曲線を第2図
のA,Bにそれぞれ示した。Aの様に熱処理前に
生じていた不明確な誘導磁気異方性は、この熱処
理によりBの様にX方向を容易軸とする明確な一
軸磁気異方性を示すBH曲線へと変化している。
この段階での異方性は最終的に高い透磁率を得た
い方向と略直交する方向(X方向)に付与されて
おり、その異方性磁界の大きさは10.0θeとなつて
いる。同時に、膜付着時に生じた基板の凸状のそ
りも熱処理後はほとんどなくなり膜中に生じてい
た圧縮応力が除去されることも解つた。
Next, a uniform magnetic field of 1Kθe was applied to this sample in a direction approximately perpendicular to the direction in which high high-frequency magnetic permeability was desired to be obtained, that is, in the direction that would become the X direction in Figure 1 when the head pattern was later formed. ,
and 30 at 350℃ in a vacuum of 10 -3 to 10 -5 Torr.
A first heat treatment was applied for 1 minute and then cooled to room temperature. The BH curves of the magnetic film before and after this heat treatment are shown in A and B of FIG. 2, respectively. Due to this heat treatment, the unclear induced magnetic anisotropy that had occurred before the heat treatment as shown in A changes to a BH curve that shows clear uniaxial magnetic anisotropy with the easy axis in the X direction as shown in B. There is.
At this stage, anisotropy is imparted in a direction (X direction) substantially perpendicular to the direction in which high magnetic permeability is desired to be obtained, and the magnitude of the anisotropic magnetic field is 10.0θe. At the same time, it was also found that the convex warpage of the substrate that occurred during film attachment almost disappeared after the heat treatment, and the compressive stress that had occurred in the film was removed.

この第1の熱処理をした後は、上部磁極と下部
磁極の間に絶縁材料であるSiO2膜とコイル導体
であるCu膜をスパツタリングにより付着させ、
これらをパターンニングする工程を繰り返し、磁
気コアと鎖交するコイルパターンや、磁気ギヤツ
プ、磁気コアの後部コンタクト部等を形成してい
く。これらのパターンニングは、フオトリソグラ
フイーによるフオトジストパターンの形成と、イ
オンビームによるドライエツチングによつて行つ
た。
After this first heat treatment, a SiO 2 film as an insulating material and a Cu film as a coil conductor are deposited between the upper magnetic pole and the lower magnetic pole by sputtering.
The process of patterning these is repeated to form a coil pattern interlinking with the magnetic core, a magnetic gap, a rear contact portion of the magnetic core, etc. These patternings were performed by forming a photodist pattern using photolithography and dry etching using an ion beam.

磁気ギヤツプおよび磁気コアの後部コンタクト
部を形成した後にスパツタリング法により、
10μm膜厚の下部磁極と同一の組成の非晶質軟磁
性膜を上部磁極として付着させた。この時点での
BH曲線は図2Cに示した様に明確な一軸異方性
を示さなくなる。しかし、この特性はBとAの
BH特性を重ねをわせた特性に近く、熱処理した
後の下部磁極の特性が保たれたまま、Aと同様の
特性を持つた上部磁極膜が付着されていることを
示している。この後、第一の熱処理と同様X方向
に印加した1kθeの均一な磁界中において、かつ、
10-3〜10-5Torrの真空中において350℃で30分の
第2の熱処理を施し室温まで冷却した。この時の
BH特性は第2図Dの様にBと全く同様なBH曲
線になつた。同時に、上部磁極膜付着時に生じた
凸状の基板のそりも熱処理後はほとんどなくな
り、上部磁極膜中に生じていた圧縮応力と下部磁
極膜中に生じていた引張応力は両者とも除去され
ていた。磁気特性およびそりを測定した後、今度
はY方向に印加した1kθeの均一な磁界中におい
てかつ10-3〜10-5Torrの真空中において300℃で
200分間の第3の熱処理を施し室温まで冷却した。
第3の熱処理後の上下部磁極のBH特性を第2図
Eに示した。第1,第2の熱処理により、上下部
磁極膜ともX方向に付与された異方性磁界10.0
〔θe〕の一軸磁気異方性は、第3の熱処理によつ
て印加されたY方向の静磁界と300℃、200分とい
う温度条件により上下部磁極膜ともその容易軸を
X方向に保つたまま、大きさだけが減少し、異方
性磁界約3〔θe〕の一軸磁気異方性を示す膜に変
化していた。
After forming the magnetic gap and the rear contact part of the magnetic core, by sputtering method,
An amorphous soft magnetic film having the same composition as the bottom pole and having a thickness of 10 μm was deposited as the top pole. At this point
The BH curve no longer shows clear uniaxial anisotropy as shown in FIG. 2C. However, this property is different from B and A.
The characteristics are close to those obtained by overlapping the BH characteristics, indicating that the upper magnetic pole film having the same characteristics as A was attached while maintaining the characteristics of the lower magnetic pole after heat treatment. After this, in a uniform magnetic field of 1 kθe applied in the X direction as in the first heat treatment, and
A second heat treatment was performed at 350° C. for 30 minutes in a vacuum of 10 −3 to 10 −5 Torr and cooled to room temperature. at this time
The BH characteristic became a BH curve completely similar to B as shown in Fig. 2D. At the same time, the convex warpage of the substrate that occurred when the upper magnetic pole film was attached almost disappeared after the heat treatment, and both the compressive stress that had occurred in the upper magnetic pole film and the tensile stress that had occurred in the lower magnetic pole film were removed. . After measuring the magnetic properties and warpage, it was then tested at 300℃ in a uniform magnetic field of 1kθe applied in the Y direction and in a vacuum of 10 -3 to 10 -5 Torr.
A third heat treatment was performed for 200 minutes and cooled to room temperature.
The BH characteristics of the upper and lower magnetic poles after the third heat treatment are shown in FIG. 2E. Due to the first and second heat treatments, an anisotropic magnetic field of 10.0 was applied in the X direction to both the upper and lower magnetic pole films.
The uniaxial magnetic anisotropy of [θe] is determined by the static magnetic field in the Y direction applied during the third heat treatment and the temperature conditions of 300°C and 200 minutes to maintain the easy axis of both the upper and lower magnetic pole films in the X direction. However, only the size decreased, changing to a film exhibiting uniaxial magnetic anisotropy with an anisotropic magnetic field of approximately 3 [θe].

磁気ヘツドはこの後、上部磁極をパターンニン
グし、保護層付着保護板接合した後に機械加工に
より所定形状に仕上げ完成する。
The magnetic head is then completed by patterning the upper magnetic pole, adhering a protective layer and bonding the protective plate, and then finishing it into a predetermined shape by machining.

以上の様に本発明の熱処理方法を用いることに
より、非晶質軟磁性膜中の歪を各膜を付着する毎
に取り除くため、歪による磁気特性の劣化がな
く、また、大きく明確な一軸磁気異方性を付与し
た状態で工程を進められるので、その間に磁気特
性が乱れ難く、各層の一軸磁気異方性を同じ大き
さにそろえることができ、最終的に確実に磁気異
方性を制御することができる。
As described above, by using the heat treatment method of the present invention, strain in the amorphous soft magnetic film is removed each time each film is deposited, so there is no deterioration of magnetic properties due to strain, and large and clear uniaxial magnetic Since the process can proceed with anisotropy imparted, the magnetic properties are unlikely to be disturbed during the process, making it possible to align the uniaxial magnetic anisotropy of each layer to the same magnitude, ultimately controlling the magnetic anisotropy reliably. can do.

一軸磁気異方性の大きさは、第一の熱処理など
の各膜を付着する毎に行なう熱処理の温度にもよ
るが、略、最終熱処理の温度と時間によつて制御
することができる。
The magnitude of the uniaxial magnetic anisotropy depends on the temperature of the heat treatment performed each time each film is deposited, such as the first heat treatment, but can generally be controlled by the temperature and time of the final heat treatment.

各膜を付着する毎に行なう熱処理温度が350℃
の場合の最終熱処理温度、時間と最終的な一軸磁
気異方性の大きさの関係をCo91.8Zr2.3Nb5.9(at
%)非晶質軟磁性膜の場合について示したのが第
3図である。同様の関係は他の組成のCoZrNb非
晶質軟磁性膜や他の合金元素から成る非晶質軟磁
性膜に対しても求めることができ、材料に応じた
熱処理温度と時間を選ぶことにより異方性磁界
Hkを制御することができる。
The heat treatment temperature performed each time each film is attached is 350℃
The relationship between the final heat treatment temperature, time and final uniaxial magnetic anisotropy in the case of Co91.8Zr2.3Nb5.9 (at
%) FIG. 3 shows the case of an amorphous soft magnetic film. Similar relationships can be obtained for CoZrNb amorphous soft magnetic films with other compositions and amorphous soft magnetic films made of other alloying elements, and can be determined by selecting the heat treatment temperature and time according to the material. directional magnetic field
Hk can be controlled.

なお、磁気コア材料の一軸異方性磁界Hkは、
磁壁が不安定にならない範囲でかつなるべく小さ
い方が良く、これはコア寸法にもよるが略2〜
6θe程度である。従つて、第3図の測定結果より
300℃の最終熱処理では45〜300分で所望の一軸異
方性磁界が得られる。
In addition, the uniaxial anisotropy magnetic field Hk of the magnetic core material is
It is better to make the domain wall as small as possible without making it unstable, and this depends on the core size, but it is about 2~
It is about 6θe. Therefore, from the measurement results in Figure 3,
The final heat treatment at 300°C takes 45 to 300 minutes to obtain the desired uniaxial anisotropy field.

また、上記実施例では、第2の熱処理後、室温
まで冷却した後第3の熱処理を実施したが、実際
の処理は、連続して行なつても良く、同温中で、
印加する静磁界の角度を変えるだけで同等の効果
が得られる。また、真空中において熱処理を行つ
たが、非酸化性雰囲気中において行なわれてもよ
い。
Further, in the above embodiment, after the second heat treatment, the third heat treatment was performed after cooling to room temperature, but the actual treatment may be performed continuously, and at the same temperature.
The same effect can be obtained simply by changing the angle of the applied static magnetic field. Further, although the heat treatment was performed in a vacuum, it may be performed in a non-oxidizing atmosphere.

また、本実施例では、磁性膜の困難軸方向と高
い高周波透磁率を得たい方向である磁路方向がほ
とんど平行になつている場合を示したが、磁気ヘ
ツドの構造によつては、必ずしもこの様に理想的
な状態にはならず、その場合には困難軸方向と高
い高周波透磁率を得たい方向が、ある傾きを持つ
ても良い。第4図にこの例として、隣接する2チ
ヤンネルにヘツドが並び、磁路が非平行な磁気ヘ
ツドの例を示した。この場合には2つのチヤンネ
ルの磁路方向になるべく平行でどちらのチヤンネ
ルのヘツドの磁路方向に対しても同じ傾きを持っ
た方向(Y方向)が最終的に困難軸となる様に熱
処理を施せば良い。
Furthermore, in this example, the hard axis direction of the magnetic film and the magnetic path direction, which is the direction in which high frequency permeability is desired, are almost parallel, but depending on the structure of the magnetic head, this may not always be possible. In this case, the difficult axis direction and the direction in which high frequency permeability is desired may have a certain inclination. As an example of this, FIG. 4 shows an example of a magnetic head in which the heads are arranged in two adjacent channels and the magnetic paths are non-parallel. In this case, heat treatment should be performed so that the direction (Y direction) that is as parallel as possible to the magnetic path direction of the two channels and has the same inclination to the magnetic path direction of the head of both channels becomes the difficult axis. Just give it.

(発明の効果) 以上の様に本発明の熱処理方法を用いることに
より、非晶質軟磁性膜中の歪を各膜を付着する毎
に取り除くため、歪による磁気特性の劣化がな
く、また、大きく明確な一軸磁気異方性を付与し
た状態で工程を進められるので、その工程中に磁
気特性が乱れ難く、各層の一軸磁気異方性の大き
さをそろえることができるため、異方性分散が少
なく、最終的に確実に磁気異方性を制御すること
ができる。さらに最終熱処理の温度と時間を選ぶ
ことにより、目的に応じた適切な大きさの異方性
磁界に制御することができ、その制御性および再
現性は良好なものとなつている。
(Effects of the Invention) As described above, by using the heat treatment method of the present invention, strain in the amorphous soft magnetic film is removed each time each film is deposited, so there is no deterioration of magnetic properties due to strain, and Since the process can proceed with a large and clear uniaxial magnetic anisotropy, the magnetic properties are less likely to be disturbed during the process, and the uniaxial magnetic anisotropy of each layer can be made uniform in size, resulting in anisotropic dispersion. In the end, magnetic anisotropy can be controlled reliably. Furthermore, by selecting the temperature and time of the final heat treatment, it is possible to control the anisotropic magnetic field to an appropriate magnitude depending on the purpose, and the controllability and reproducibility are good.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明が薄膜磁気ヘツドの磁気コア
に適用された様子を説明する図で、第1図aは平
面図、第1図bは垂直断面図、第2図は薄膜磁気
ヘツドの磁気コアを本発明により熱処理した際の
磁気特性の変化を示す図、第3図は
Co91.8Zr2.3Nb5.9(at%)非晶質軟磁性膜の最終
熱処理温度、時間とHkの関係を示す図、第4図
は本発明が2チヤンネルの薄膜磁気ヘツドの磁気
コアに適用された様子を説明する図である。 1……基板、2……下部磁極膜、3……絶縁
体、4……コイル導体、5……上部磁極膜、6…
…磁気ギヤツプ部、7……磁気コア。
FIG. 1 is a diagram illustrating how the present invention is applied to the magnetic core of a thin-film magnetic head. FIG. 1a is a plan view, FIG. 1b is a vertical sectional view, and FIG. Figure 3 is a diagram showing changes in magnetic properties when a magnetic core is heat treated according to the present invention.
Figure 4 shows the relationship between the final heat treatment temperature and time of Co91.8Zr2.3Nb5.9 (at%) amorphous soft magnetic film and Hk. FIG. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Lower magnetic pole film, 3... Insulator, 4... Coil conductor, 5... Upper magnetic pole film, 6...
...Magnetic gap part, 7...Magnetic core.

Claims (1)

【特許請求の範囲】 1 酸化物などから成る基体上に少なくとも二層
以上の非晶質軟磁性膜と酸化物、導体金属膜など
を付着させて、加工形成する磁気応用素子におい
て、該非晶質軟磁性膜を一層付着させる毎に、該
非晶質軟磁性膜が最終的に高い高周波透磁率を得
たい方向と直交する方向にかけた静磁界中で該非
晶質軟磁性材料の結晶化温度およびキユリー温度
より低い温度で熱処理を施し、該非晶質軟磁性膜
の各層を全て付着し終わつた後には、前記熱処理
にひきつづいて、前記熱処理温度と同じか、それ
以下の温度で、該非晶質軟磁性膜が最終的に高い
高周波透磁率を得たい主たる方向にかけた静磁界
中で最終の熱処理をし、この最終の熱処理の温度
と、時間により該非晶質軟磁性材料の一軸磁気異
方性の大きさを制御することを特徴とする非晶質
軟磁性膜の熱処理方法。 2 熱処理時に印加する静磁界が、非晶質軟磁性
膜に発生する反磁界よりも大きく、該非晶質軟磁
性膜を充分磁化できる大きさであることを特徴と
する特許請求の範囲第1項に記載の熱処理方法。 3 スパツタリング法により作製された非晶質軟
磁性膜を用いることを特徴とする特許請求の範囲
第1項に記載の熱処理方法。 4 磁気応用素子が薄膜磁気ヘツドである特許請
求の範囲第1項乃至第3項のいずれか1項に記載
の熱処理方法。
[Scope of Claims] 1. A magnetic application element formed by processing and forming at least two or more layers of amorphous soft magnetic film, oxide, conductive metal film, etc. on a substrate made of oxide, etc. Each time a layer of soft magnetic film is deposited, the crystallization temperature and Curie of the amorphous soft magnetic material are adjusted in a static magnetic field applied in a direction perpendicular to the direction in which the amorphous soft magnetic film ultimately wants to obtain high high frequency magnetic permeability. After all the layers of the amorphous soft magnetic film have been deposited by applying heat treatment at a temperature lower than the above temperature, following the heat treatment, the amorphous soft magnetic film is heated at a temperature equal to or lower than the heat treatment temperature. A final heat treatment is performed in a static magnetic field applied in the main direction in which the film ultimately wants to obtain high high-frequency magnetic permeability, and the magnitude of the uniaxial magnetic anisotropy of the amorphous soft magnetic material is determined by the temperature and time of this final heat treatment. 1. A method for heat treatment of an amorphous soft magnetic film characterized by controlling the magnetic field. 2. Claim 1, characterized in that the static magnetic field applied during heat treatment is larger than the demagnetizing field generated in the amorphous soft magnetic film and is large enough to sufficiently magnetize the amorphous soft magnetic film. The heat treatment method described in . 3. The heat treatment method according to claim 1, characterized in that an amorphous soft magnetic film produced by a sputtering method is used. 4. The heat treatment method according to any one of claims 1 to 3, wherein the magnetic application element is a thin film magnetic head.
JP22516787A 1987-09-10 1987-09-10 Heat treatment of amorphous soft magnetic film Granted JPS6468913A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP22516787A JPS6468913A (en) 1987-09-10 1987-09-10 Heat treatment of amorphous soft magnetic film
US07/243,533 US4944805A (en) 1987-09-10 1988-09-12 Method of heat treatment amorphous soft magnetic film layers to reduce magnetic anisotropy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22516787A JPS6468913A (en) 1987-09-10 1987-09-10 Heat treatment of amorphous soft magnetic film

Publications (2)

Publication Number Publication Date
JPS6468913A JPS6468913A (en) 1989-03-15
JPH0571163B2 true JPH0571163B2 (en) 1993-10-06

Family

ID=16824993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22516787A Granted JPS6468913A (en) 1987-09-10 1987-09-10 Heat treatment of amorphous soft magnetic film

Country Status (1)

Country Link
JP (1) JPS6468913A (en)

Also Published As

Publication number Publication date
JPS6468913A (en) 1989-03-15

Similar Documents

Publication Publication Date Title
US4386114A (en) Method of manufacturing a thin-film magnetic field sensor
US4475962A (en) Annealing method for amorphous magnetic alloy
KR910009970B1 (en) Co-Nb-Zr based amorphous magnetic alloy and magnetic head using same
US5503686A (en) Heat treatment method for thin film magnetic head
US4944805A (en) Method of heat treatment amorphous soft magnetic film layers to reduce magnetic anisotropy
JPH0571163B2 (en)
JPH0571164B2 (en)
JPH0773412A (en) Thin film magnetic head
JP3127074B2 (en) Magnetic head
JP2739574B2 (en) Heat treatment method for amorphous soft magnetic material
JP3130407B2 (en) Manufacturing method of magnetic film and thin film magnetic head
JPH05114530A (en) Manufacture of soft magnetic alloy film and manufacture of magnetic head
JPS58111119A (en) Thin film magnetic head
JPS63259072A (en) Method for controlling uniaxial magnetic anisotropy of amorphous soft magnetic material
JPH0694589B2 (en) Heat treatment method for amorphous soft magnetic material
JPS62128109A (en) Manufacture of high-permeability laminating film
JPH0714118A (en) Thin film magnetic head and manufacturing method thereof
JPH0481243B2 (en)
JPH0665662A (en) Soft magnetic alloy
JP2696526B2 (en) Thin film magnetic head
KR100193703B1 (en) Manufacturing method of soft magnetic alloy film, magnetic head and soft magnetic alloy film
JP3036891B2 (en) Thin film magnetic head
JPH0252415A (en) Formation of magnetic thin film having uniaxial anisotropy
JPH02126410A (en) Thin film magnetic head structure
JPH0289206A (en) thin film magnetic head

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees