JPH0572053B2 - - Google Patents

Info

Publication number
JPH0572053B2
JPH0572053B2 JP59049064A JP4906484A JPH0572053B2 JP H0572053 B2 JPH0572053 B2 JP H0572053B2 JP 59049064 A JP59049064 A JP 59049064A JP 4906484 A JP4906484 A JP 4906484A JP H0572053 B2 JPH0572053 B2 JP H0572053B2
Authority
JP
Japan
Prior art keywords
gas
ion source
boron
microwave
reacts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59049064A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60195853A (ja
Inventor
Katsumi Tokikuchi
Hidemi Koike
Kunyuki Sakumichi
Osami Okada
Takeshi Ninomya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59049064A priority Critical patent/JPS60195853A/ja
Priority to EP85101560A priority patent/EP0154824B1/fr
Priority to DE8585101560T priority patent/DE3584105D1/de
Priority to KR1019850001084A priority patent/KR920003156B1/ko
Priority to US06/711,824 priority patent/US4658143A/en
Publication of JPS60195853A publication Critical patent/JPS60195853A/ja
Publication of JPH0572053B2 publication Critical patent/JPH0572053B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP59049064A 1984-03-16 1984-03-16 マイクロ波イオン源 Granted JPS60195853A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59049064A JPS60195853A (ja) 1984-03-16 1984-03-16 マイクロ波イオン源
EP85101560A EP0154824B1 (fr) 1984-03-16 1985-02-13 Source d'ions
DE8585101560T DE3584105D1 (de) 1984-03-16 1985-02-13 Ionenquelle.
KR1019850001084A KR920003156B1 (ko) 1984-03-16 1985-02-21 이온빔을 안정적으로 인출할 수 있는 마이크로파 방전형의 이온원
US06/711,824 US4658143A (en) 1984-03-16 1985-03-14 Ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59049064A JPS60195853A (ja) 1984-03-16 1984-03-16 マイクロ波イオン源

Publications (2)

Publication Number Publication Date
JPS60195853A JPS60195853A (ja) 1985-10-04
JPH0572053B2 true JPH0572053B2 (fr) 1993-10-08

Family

ID=12820649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59049064A Granted JPS60195853A (ja) 1984-03-16 1984-03-16 マイクロ波イオン源

Country Status (1)

Country Link
JP (1) JPS60195853A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62237652A (ja) * 1986-04-08 1987-10-17 Nec Corp デユオプラズマトロンイオン源
JP4289837B2 (ja) 2002-07-15 2009-07-01 アプライド マテリアルズ インコーポレイテッド イオン注入方法及びｓｏｉウエハの製造方法
JP4328067B2 (ja) 2002-07-31 2009-09-09 アプライド マテリアルズ インコーポレイテッド イオン注入方法及びｓｏｉウエハの製造方法、並びにイオン注入装置
US10087520B2 (en) * 2016-06-21 2018-10-02 Axcelis Technologies, Inc. Implantation using solid aluminum iodide (AlI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products
US10676370B2 (en) * 2017-06-05 2020-06-09 Axcelis Technologies, Inc. Hydrogen co-gas when using aluminum iodide as an ion source material

Also Published As

Publication number Publication date
JPS60195853A (ja) 1985-10-04

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term