JPH0573848A - Production of floating type thin-film magnetic head - Google Patents

Production of floating type thin-film magnetic head

Info

Publication number
JPH0573848A
JPH0573848A JP3231405A JP23140591A JPH0573848A JP H0573848 A JPH0573848 A JP H0573848A JP 3231405 A JP3231405 A JP 3231405A JP 23140591 A JP23140591 A JP 23140591A JP H0573848 A JPH0573848 A JP H0573848A
Authority
JP
Japan
Prior art keywords
thin film
cutting
magnetic head
row
film magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3231405A
Other languages
Japanese (ja)
Other versions
JP2964722B2 (en
Inventor
Minoru Yamamori
実 山森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP23140591A priority Critical patent/JP2964722B2/en
Publication of JPH0573848A publication Critical patent/JPH0573848A/en
Application granted granted Critical
Publication of JP2964722B2 publication Critical patent/JP2964722B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)

Abstract

(57)【要約】 【目的】 本発明は薄膜面のキズや欠けの発生を防止
し、品質の良好な浮上型薄膜磁気ヘッドを高い生産性で
かつ、高歩留りで量産できる浮上型薄膜磁気ヘッドの製
造方法の提供を目的とする。 【構成】 本発明の浮上型薄膜磁気ヘッドの製造方法
は、スパッタ法等により形成された薄膜を有する基板を
切断・研削・研磨等の機械加工を施してスライダーを形
成する浮上型薄膜磁気ヘッドの製造方法であって、ウェ
ハー基板から切断されたブロック基板を整列したヘッド
素子に沿って列状加工物に切断する工程と、前記工程で
得られた列状加工物7,7′の薄膜面2を当接させ、次
いで切断・研削・研磨等の機械加工を施す工程と、を有
する構成からなる。
(57) [Summary] [PROBLEMS] The present invention is a flying thin film magnetic head capable of preventing scratches and chips on a thin film surface and mass-producing a flying thin film magnetic head of good quality with high productivity and high yield. An object of the present invention is to provide a manufacturing method of. A method of manufacturing a floating thin-film magnetic head according to the present invention is a method of manufacturing a floating thin-film magnetic head in which a slider is formed by subjecting a substrate having a thin film formed by a sputtering method or the like to mechanical processing such as cutting, grinding and polishing. A method of manufacturing, comprising a step of cutting a block substrate cut from a wafer substrate into row-shaped workpieces along aligned head elements, and a thin film surface 2 of the row-shaped workpieces 7 and 7'obtained in the above step. And a machining process such as cutting, grinding, polishing, etc., are performed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は磁気記録再生装置に用い
られる浮上型薄膜磁気ヘッドの製造方法に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a floating thin film magnetic head used in a magnetic recording / reproducing apparatus.

【0002】[0002]

【従来の技術】近年、情報機器の普及に伴い薄膜磁気ヘ
ッドが各種開発され、その製造方法も種々改良されてい
る。
2. Description of the Related Art In recent years, various thin-film magnetic heads have been developed with the spread of information equipment, and their manufacturing methods have been variously improved.

【0003】以下に従来の浮上型薄膜磁気ヘッドの製造
方法について説明する。図6は一般的な薄膜磁気ヘッド
の斜視図である。
A conventional method of manufacturing a floating thin film magnetic head will be described below. FIG. 6 is a perspective view of a general thin film magnetic head.

【0004】図6において、1はAl23−TiC系セ
ラミック材料により加工されたスライダー本体、2はス
ライダー本体1の一面にスパッタ法により形成された薄
膜面、3は精密に研削、研磨加工された浮上面、4は浮
上面3の端部を浮上面3に対して傾斜角略1度の勾配で
形成されたリーディングテーパー、5は以上の構成要素
からなる浮上型薄膜磁気ヘッドである。
In FIG. 6, reference numeral 1 is a slider body made of Al 2 O 3 -TiC ceramic material, 2 is a thin film surface formed by sputtering on one surface of the slider body 1, and 3 is precisely ground and polished. The air bearing surface 4 is a leading taper in which the end portion of the air bearing surface 3 is formed with an inclination angle of about 1 degree with respect to the air bearing surface 3, and 5 is a flying thin film magnetic head including the above components.

【0005】以上のように構成された浮上型薄膜磁気ヘ
ッドについて、以下その製造方法を図7乃至図9に基づ
いて説明する。
A method of manufacturing the flying thin-film magnetic head having the above structure will be described below with reference to FIGS.

【0006】図7は一般的な基板ブロックからのスライ
ダー本体研削工程図である。工程(a)で鏡面研磨され
たAl23−TiC系等のセラミックスからなるウェハ
ー基板上に、スパッタ法や電着法等で薄膜及びパターン
形状を形成した円形の基板を、整列したヘッド素子に沿
って四角形のブロック6に研削加工する。
FIG. 7 is a process diagram of grinding a slider body from a general substrate block. A circular substrate having a thin film and a pattern formed by a sputtering method or an electrodeposition method on a wafer substrate made of ceramics such as Al 2 O 3 —TiC system which is mirror-polished in the step (a) A square block 6 is ground along the above.

【0007】次に工程(b)で加工効率を向上する目的
で、多数個のヘッド素子を一括して加工できるようにヘ
ッド素子に沿って精密に列切断し、さらに精度を上げる
ために研削を行い列状加工物7を作製する。その後、工
程(c)で浮上面3を研削により加工し研摩を行って面
精度を向上させ、工程(d)で同様に研摩によってリー
ディングテーパー4を作製する。最後に工程(e)で列
状加工物7を精密に切断し、スライダー本体1を完成さ
せている。
Next, in order to improve the processing efficiency in the step (b), a large number of head elements are precisely line-cut along the head elements so that they can be processed collectively, and grinding is performed to further improve the accuracy. The row-shaped processed product 7 is manufactured. Then, in step (c), the air bearing surface 3 is processed by grinding and polished to improve the surface accuracy, and in step (d), the leading taper 4 is similarly prepared by polishing. Finally, in step (e), the row-shaped workpiece 7 is precisely cut to complete the slider body 1.

【0008】ここで、列状加工物7の加工方法について
説明する。図8は従来の列状加工物のみを切断加工する
切削工程図で、(a)は列状加工物の斜視図であり、
(b)はその切断後の斜視図である。図9は切断時の説
明図である。スライダー本体1に切断する時は薄膜面2
は外部に露出した状態にあるため、切断砥石8の回転に
より薄膜面2は砥石8の接触時あるいは切断時の損傷に
よる影響で切断面にクラック等が発生し易いので、薄膜
面2をキズ付けないように細心の注意を払いながら切断
がなされるとともに砥石8の砥粒や切り屑等により薄膜
面2にキズをつけないように防塵等に細心の注意を要
し、生産性が低く、かつ歩留りも低いものであった。
Now, a method of processing the row-shaped workpiece 7 will be described. FIG. 8 is a cutting process diagram for cutting only a conventional row-shaped workpiece, and FIG. 8A is a perspective view of the row-shaped workpiece.
(B) is a perspective view after the cutting. FIG. 9 is an explanatory diagram at the time of cutting. When cutting into the slider body 1, the thin film surface 2
Is exposed to the outside, the thin film surface 2 is likely to be cracked by the rotation of the cutting grindstone 8 due to the contact of the grindstone 8 or the damage at the time of cutting, so that the thin film surface 2 is scratched. The cutting is done with great care so that the thin film surface 2 is not scratched by the abrasive grains of the grindstone 8 or chips, and the productivity is low, and the productivity is low. The yield was also low.

【0009】これはスライダー本体1を形成する材料で
あるAl23−TiC系セラミックのビッカース硬度
(Hv=2000)が、薄膜面2のビッカース硬度(A
23保護膜はHv=400〜800)と比較して極め
て硬い難加工材であるためである。硬度の異なる複合材
料の切断には、切断砥石・砥粒・砥石の回転速度や切断
送り速度の選定が難しく、スライダー本体1の良好な切
断を行うことは可能であるが、欠け易いAl23の薄膜
面2の外観を良好に保つのは容易ではないからである。
This is because the Al 2 O 3 --TiC-based ceramic, which is the material forming the slider body 1, has a Vickers hardness (Hv = 2000) of the thin film surface 2 (Av).
This is because the l 2 O 3 protective film is a hard material that is extremely hard as compared with Hv = 400 to 800). When cutting composite materials with different hardness, it is difficult to select the rotation speed of the cutting grindstone, abrasive grains, grindstone, and cutting feed speed, and it is possible to cut the slider body 1 satisfactorily, but it is easy to chip Al 2 O This is because it is not easy to keep the appearance of the thin film surface 2 of 3 good.

【0010】図10、図11は図9の切断方法のこれら
の問題を解決するための改良法であって、薄膜面2に当
て材9を配設して切断加工する方法を示す切削工程図
で、図10(a)は当て材を当てた列状加工物の斜視図
であり、(b)はその切断後の斜視図であり、図11は
その切断時の説明図である。この方法は薄膜面2に当て
材9を当接させておき、薄膜面2が露出していることか
ら考えられる上記諸問題を防ぐことを目的としている。
列状加工物7と略同一の寸法にあらかじめ加工した当て
材9を薄膜面2に密着させ次いで、切断砥石8で切断す
るので、薄膜面2が当て材で保護される薄膜面2にキズ
ができるのをある程度防止できる。
10 and 11 show an improved method for solving these problems of the cutting method of FIG. 9, which is a cutting process diagram showing a method of arranging the patch 9 on the thin film surface 2 and cutting. 10 (a) is a perspective view of the row-shaped workpiece to which a patch is applied, FIG. 10 (b) is a perspective view after cutting, and FIG. 11 is an explanatory view at the time of cutting. The purpose of this method is to prevent the above-mentioned problems that may be caused by the exposed thin film surface 2 by contacting the backing material 9 with the thin film surface 2.
Since the patch material 9 preliminarily processed to have substantially the same dimensions as the row-shaped workpiece 7 is brought into close contact with the thin film surface 2 and then cut by the cutting grindstone 8, the thin film surface 2 is protected from scratches on the thin film surface 2. It can be prevented to some extent.

【0011】[0011]

【発明が解決しようとする課題】しかしながら上記従来
の浮上型薄膜磁気ヘッドの製造方法では、薄膜面2と当
て材9との材質の違い等により切断条件が異なるため、
薄膜面2のキズや欠けを完全に防止することが不可能で
あった。また、当て材9という他の材料がさらに必要な
ためコストが上がり、かつ当て材9をその都度、完全に
密着させて当接させねばならず工数が増え、著しく生産
性を落とすという問題点を有していた。
However, in the conventional method for manufacturing a floating thin film magnetic head described above, the cutting conditions are different due to the difference in the materials of the thin film surface 2 and the pad material 9, and so on.
It was impossible to completely prevent scratches and chips on the thin film surface 2. Further, since another material called the pad material 9 is further required, the cost is increased, and the pad material 9 must be completely brought into close contact with each other each time, resulting in an increase in the number of steps and a significant decrease in productivity. I had.

【0012】本発明は上記従来の問題点を解決するもの
で、薄膜面のキズや欠けの発生を防止し、品質の良好な
浮上型薄膜磁気ヘッドを高い生産性でかつ、高歩留りで
量産できる浮上型薄膜磁気ヘッドの製造方法を提供する
ことを目的とする。
The present invention solves the above-mentioned problems of the prior art, prevents scratches and chips on the thin film surface, and enables mass production of high-quality floating thin-film magnetic heads with high productivity. An object of the present invention is to provide a method for manufacturing a flying thin film magnetic head.

【0013】[0013]

【課題を解決するための手段】この目的を達成するため
に本発明の浮上型薄膜磁気ヘッドの製造方法は、スパッ
タ法等により形成された薄膜面を有する基板を切断・研
削・研磨等の機械加工を施してスライダーを形成する浮
上型薄膜磁気ヘッドの製造方法であって、ウェハー基板
から切断されたブロック基板を整列したヘッド素子に沿
って列状加工物に切断する工程と、前記工程で得られた
列状加工物の薄膜面を当接させ、次いで切断・研削・研
磨等の機械加工を施す工程と、を有する構成からなる。
In order to achieve this object, a method of manufacturing a floating thin film magnetic head according to the present invention is a machine for cutting, grinding, polishing, etc. a substrate having a thin film surface formed by a sputtering method or the like. A method of manufacturing a floating thin-film magnetic head, wherein a slider is processed to form a slider, the method comprising: cutting a block substrate cut from a wafer substrate into aligned workpieces along aligned head elements; A step of bringing the thin film surfaces of the row-shaped workpiece thus formed into contact with each other, and then performing machining such as cutting, grinding, and polishing.

【0014】[0014]

【作用】この構成によって、被加工物の加工時に機械的
物性の同一のもの同士が当接され薄膜面等が拘束される
ことにより、加工砥石の回転等によるキズや欠け等の発
生を著しく軽減し、生産性を高め、かつ歩留りを上げる
ことができる。
With this structure, when the workpieces are machined, the same mechanical properties are brought into contact with each other and the thin film surface is restrained, so that the occurrence of scratches or chips due to the rotation of the processing grindstone is significantly reduced. However, it is possible to improve productivity and yield.

【0015】[0015]

【実施例】以下本発明の一実施例について、図面を参照
しながら説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

【0016】(実施例1)図1及び図2は本実施例の切
断加工方法を説明する説明図であり、図1はブロック基
板からヘッド素子に沿って列切断された列状加工物の切
断工程図であり、(a)は列状加工物の薄膜面を対面さ
せたときの斜視図、(b)は薄膜面を当接させたときの
斜視図、(c)は列状加工物をスライダー本体の大きさ
に切断したときの斜視図、(d)はスライダー本体の斜
視図であり、図2はその切断時の説明図である。
(Embodiment 1) FIGS. 1 and 2 are explanatory views for explaining a cutting method of the present embodiment, and FIG. 1 is a view showing cutting of a row-shaped workpiece cut along a head element from a block substrate. 4A to 4C are process diagrams, in which (a) is a perspective view when the thin film surfaces of the row-shaped workpieces are faced to each other, (b) is a perspective view when the thin film surfaces are brought into contact with each other, and (c) is the row-shaped workpieces. FIG. 2 is a perspective view of the slider body cut to the size of the slider body, FIG. 2D is a perspective view of the slider body, and FIG.

【0017】2は薄膜面、7,7′は列状加工物、8は
切断砥石である。列状加工物7と7′の薄膜面2を当接
させ、次いで切断砥石8で二つの列状加工物7,7′を
同時に切削し、一回の切削作業で2個のスライダー本体
1を得ることができた。その薄膜面2を倍率100で顕
微鏡写真を取り観察した。その結果を図3(a)に示
す。
2 is a thin film surface, 7 and 7'are row-shaped workpieces, and 8 is a cutting grindstone. The thin film surfaces 2 of the row-shaped workpieces 7 and 7'are brought into contact with each other, and then the two row-shaped workpieces 7 and 7'are simultaneously cut by the cutting grindstone 8, and the two slider bodies 1 are cut by one cutting operation. I was able to get it. The thin film surface 2 was observed by taking a micrograph at a magnification of 100. The result is shown in FIG.

【0018】(比較例1,2)比較例1として、従来例
の図8及び図9で示した方法で、列状加工物のみを切断
加工した。その薄膜面2を実施例1と同一の条件で観察
した。その結果を図3(b)に示す。
(Comparative Examples 1 and 2) As Comparative Example 1, only the row-shaped workpiece was cut by the method shown in FIGS. 8 and 9 of the conventional example. The thin film surface 2 was observed under the same conditions as in Example 1. The result is shown in FIG.

【0019】比較例2として、従来例の図10、図11
で示した方法で、列状加工物の薄膜面2に当て材9を密
着当接させ切削加工した。その薄膜面2を実施例1と同
一の条件で観察した。その結果を図3(c)に示す。
As Comparative Example 2, FIGS. 10 and 11 of the conventional example.
By the method shown in (1), the patch material 9 was brought into close contact with the thin film surface 2 of the row-shaped workpiece, and was cut. The thin film surface 2 was observed under the same conditions as in Example 1. The result is shown in FIG.

【0020】図3からも明らかなように、本実施例によ
れば、薄膜面2の同種材料が密接しているために、この
部分は連続した単一材料と考えることができ、従って薄
膜面2に対して最適な加工条件での加工が可能なことか
ら、キズや欠けのない最も良好な外観を有しているのが
わかる。
As is clear from FIG. 3, according to this embodiment, since the same kind of material of the thin film surface 2 is in intimate contact, this portion can be considered as a continuous single material, and therefore, the thin film surface can be considered. Since it can be processed under the optimum processing conditions for No. 2, it can be seen that it has the best appearance with no scratches or chips.

【0021】これに対し、比較例1はキズや欠けが他の
加工法と比べ最も多く、特に薄膜面2は自由面であった
ために欠けが発生すると、それが伝搬し、欠け深さが3
0μmにまで及びかなりの寸法にまで成長する傾向にあ
ることがわかった。また、比較例2は、キズや欠けの発
生に幾分改善が見られ欠け深さも5μmのものが認めら
れた程度であった。しかし薄膜面2と当て材9は材質が
異なるために複合材料の加工として考えられ、各々の材
料を同時に最適な条件で加工することが難しく、その結
果、種々の小さなキズや欠け等が生じ外観の品質に問題
が残るといえる。
On the other hand, Comparative Example 1 had the most scratches and chippings as compared with the other processing methods, and particularly when the chipping occurred because the thin film surface 2 was a free surface, it propagated and the chipping depth was 3.
It has been found that there is a tendency to grow to 0 μm and to considerable size. In Comparative Example 2, the occurrence of scratches and chips was somewhat improved, and the chip depth was 5 μm. However, since the thin film surface 2 and the pad material 9 are different materials, it is considered to be a composite material processing, and it is difficult to process each material simultaneously under the optimum conditions. As a result, various small scratches and chips are generated, and the appearance is deteriorated. It can be said that there remains a problem with the quality of.

【0022】(実施例2)列状加工物7の薄膜面2を当
接させた列状加工物群を図4に示すように複数段並設し
て切削加工をしてみたところ実施例1と同様に薄膜面2
の損傷のないスライダー本体1を1回の切削作業で4個
得ることができた。このことから、本実施例によれば高
品質のスライダー本体を高い生産性で製造できることが
わかった。
(Embodiment 2) A group of row-shaped workpieces in contact with the thin film surface 2 of the row-shaped workpiece 7 are arranged in parallel in a plurality of stages as shown in FIG. Thin film surface 2
It was possible to obtain four slider main bodies 1 having no damage in one cutting operation. From this, it was found that a high quality slider body can be manufactured with high productivity according to this embodiment.

【0023】(実施例3)次に、図5に示す溝入れ加工
を2個の列状加工物7,7′の薄膜面2を当接させ行っ
たが、薄膜面2をほとんど損傷させないで溝入れを行う
ことができた。
(Embodiment 3) Next, the grooving shown in FIG. 5 was carried out by abutting the thin film surfaces 2 of the two row-shaped workpieces 7 and 7 ', but the thin film surfaces 2 were hardly damaged. The grooving could be done.

【0024】[0024]

【発明の効果】以上のように本発明は、浮上型薄膜磁気
ヘッドの製造工程において、2個の被加工物の薄膜面同
志を当接させ多数個を同時に加工することで、薄膜面に
生じるキズや欠け等を減少させるとともに、外観品質が
向上し磁気特性の向上した高品質の浮上型薄膜磁気ヘッ
ドを高い歩留りで、かつ低原価で量産することができる
優れた浮上型薄膜磁気ヘッドの製造方法を実現できるも
のである。
As described above, according to the present invention, in the manufacturing process of the flying type thin film magnetic head, two thin film surfaces of two workpieces are brought into contact with each other and a large number of them are processed at the same time. Manufacture of excellent flying thin-film magnetic heads that can be mass-produced with high yield and at low cost while reducing scratches and chips and improving the appearance quality and magnetic characteristics. The method can be realized.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例における浮上型薄膜磁気ヘッ
ドの製造時におけるブロック基板からヘッド素子に沿っ
て列切断された列状加工物の切断工程図 (a)列状加工物の薄膜面を対面させたときの斜視図 (b)薄膜面を当接させたときの斜視図 (c)列状加工物をスライダー本体の大きさに切断した
ときの斜視図 (d)スライダー本体の斜視図
FIG. 1 is a cutting process diagram of a row-shaped workpiece that is row-cut along a head element from a block substrate during manufacturing of a floating thin-film magnetic head according to an embodiment of the present invention (a) Thin-film surface of the row-shaped workpiece (B) Perspective view when the thin film surfaces are brought into contact with each other (c) Perspective view when the row-shaped workpiece is cut into the size of the slider body (d) Perspective view of the slider body

【図2】本発明の一実施例における列状加工物の切断時
の概略図
FIG. 2 is a schematic view when cutting a line-shaped workpiece in one embodiment of the present invention.

【図3】(a)本実施例で製造したスライダー本体の薄
膜面の顕微鏡観察図 (b)従来例の列状加工物を直接加工した場合の薄膜面
の顕微鏡観察図 (c)従来例の当て材を用いて加工した場合の薄膜面の
顕微鏡観察図
FIG. 3A is a microscopic observation view of a thin film surface of a slider body manufactured in this example. FIG. 3B is a microscopic observation view of a thin film surface when a row-shaped workpiece of a conventional example is directly processed. Microscopic view of thin film surface when processed using patch material

【図4】本発明の第2実施例における切削状態を示す概
略図
FIG. 4 is a schematic view showing a cutting state in the second embodiment of the present invention.

【図5】本発明を溝加工に応用した場合のスライダー本
体の斜視図
FIG. 5 is a perspective view of a slider body when the present invention is applied to groove processing.

【図6】一般的な浮上型磁気ヘッドの斜視図FIG. 6 is a perspective view of a general flying type magnetic head.

【図7】一般的な基板ブロックからのスライダー本体の
切削工程図 (a)ウェハー基板から切削されたブロック基板の斜視
図 (b)列状加工物の斜視図 (c)浮上面を研削形成した列状加工物の斜視図 (d)リーディングテーパーを研削形成した列状加工物
の斜視図 (e)スライダー本体の斜視図
FIG. 7 is a cutting process diagram of a slider body from a general substrate block. (A) A perspective view of a block substrate cut from a wafer substrate (b) A perspective view of a row-shaped workpiece (c) An air bearing surface is ground and formed Perspective view of row-shaped workpiece (d) Perspective view of row-shaped workpiece with a leading taper ground (e) Perspective view of slider body

【図8】従来の列状加工物のみを切断加工する場合の切
削工程図 (a)列状加工物の斜視図 (b)その切断後の斜視図
FIG. 8 is a cutting process diagram in the case of cutting only a conventional row-shaped workpiece (a) a perspective view of the row-shaped workpiece (b) a perspective view after the cutting

【図9】切断時の説明図FIG. 9 is an explanatory diagram when cutting

【図10】従来の薄膜面に当て材を配設して切断加工す
る場合の切削工程図 (a)当て材を当てた列状加工物の斜視図 (b)その切断後の斜視図
FIG. 10 is a cutting process diagram in the case where a patch material is disposed on a thin film surface for cutting in the related art. (A) A perspective view of a row-shaped workpiece to which the patch material is applied (b) A perspective view after the cutting

【図11】切断時の説明図FIG. 11 is an explanatory diagram when cutting

【符号の説明】[Explanation of symbols]

1,1′ スライダー本体 2 薄膜面 3 浮上面 4 リーディングテーパー 5 浮上型薄膜磁気ヘッド 6 ブロック 7 列状加工物 8 切断砥石 9 当て材 1, 1'Slider body 2 Thin film surface 3 Air bearing surface 4 Leading taper 5 Levitation type thin film magnetic head 6 Block 7 Row-shaped workpiece 8 Cutting grindstone 9 Patch material

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】スパッタ法等により形成された薄膜面を有
する基板を切断・研削・研磨等の機械加工を施してスラ
イダーを形成する浮上型薄膜磁気ヘッドの製造方法であ
って、ウェハー基板から切断されたブロック基板を整列
したヘッド素子に沿って列状加工物に切断する工程と、
前記工程で得られた列状加工物の薄膜面を当接させ、次
いで切断・研削・研磨等の機械加工を施す工程と、を有
することを特徴とする浮上型薄膜磁気ヘッドの製造方
法。
1. A method of manufacturing a flying thin film magnetic head, comprising forming a slider by subjecting a substrate having a thin film surface formed by a sputtering method or the like to mechanical processing such as cutting, grinding and polishing, which is cut from a wafer substrate. Cutting the formed block substrate into a row-shaped workpiece along the aligned head elements,
A method of manufacturing a flying thin-film magnetic head, comprising: bringing the thin-film surface of the row-shaped workpiece obtained in the above step into contact, and then subjecting the thin-film magnetic head to mechanical processing such as cutting, grinding, and polishing.
JP23140591A 1991-09-11 1991-09-11 Manufacturing method of floating type thin film magnetic head Expired - Lifetime JP2964722B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23140591A JP2964722B2 (en) 1991-09-11 1991-09-11 Manufacturing method of floating type thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23140591A JP2964722B2 (en) 1991-09-11 1991-09-11 Manufacturing method of floating type thin film magnetic head

Publications (2)

Publication Number Publication Date
JPH0573848A true JPH0573848A (en) 1993-03-26
JP2964722B2 JP2964722B2 (en) 1999-10-18

Family

ID=16923091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23140591A Expired - Lifetime JP2964722B2 (en) 1991-09-11 1991-09-11 Manufacturing method of floating type thin film magnetic head

Country Status (1)

Country Link
JP (1) JP2964722B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007257752A (en) * 2006-03-24 2007-10-04 Shinka Jitsugyo Kk Manufacturing method of slider
US20160005426A1 (en) * 2009-11-12 2016-01-07 Western Digital (Fremont), Llc Method and apparatus for controlling camber on air bearing surface of a slider

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007257752A (en) * 2006-03-24 2007-10-04 Shinka Jitsugyo Kk Manufacturing method of slider
US20160005426A1 (en) * 2009-11-12 2016-01-07 Western Digital (Fremont), Llc Method and apparatus for controlling camber on air bearing surface of a slider

Also Published As

Publication number Publication date
JP2964722B2 (en) 1999-10-18

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