JPH0578939B2 - - Google Patents

Info

Publication number
JPH0578939B2
JPH0578939B2 JP59149586A JP14958684A JPH0578939B2 JP H0578939 B2 JPH0578939 B2 JP H0578939B2 JP 59149586 A JP59149586 A JP 59149586A JP 14958684 A JP14958684 A JP 14958684A JP H0578939 B2 JPH0578939 B2 JP H0578939B2
Authority
JP
Japan
Prior art keywords
sio
uneven substrate
silicone resin
temperature
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP59149586A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6129153A (ja
Inventor
Shunichi Fukuyama
Yasuhiro Yoneda
Masashi Myagawa
Kota Nishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59149586A priority Critical patent/JPS6129153A/ja
Publication of JPS6129153A publication Critical patent/JPS6129153A/ja
Publication of JPH0578939B2 publication Critical patent/JPH0578939B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP59149586A 1984-07-20 1984-07-20 凹凸基板の平坦化方法 Granted JPS6129153A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59149586A JPS6129153A (ja) 1984-07-20 1984-07-20 凹凸基板の平坦化方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59149586A JPS6129153A (ja) 1984-07-20 1984-07-20 凹凸基板の平坦化方法

Publications (2)

Publication Number Publication Date
JPS6129153A JPS6129153A (ja) 1986-02-10
JPH0578939B2 true JPH0578939B2 (2) 1993-10-29

Family

ID=15478436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59149586A Granted JPS6129153A (ja) 1984-07-20 1984-07-20 凹凸基板の平坦化方法

Country Status (1)

Country Link
JP (1) JPS6129153A (2)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR900008647B1 (ko) * 1986-03-20 1990-11-26 후지쓰 가부시끼가이샤 3차원 집적회로와 그의 제조방법
JPH02106948A (ja) * 1988-10-17 1990-04-19 Fujitsu Ltd 半導体装置の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5760330A (en) * 1980-09-27 1982-04-12 Fujitsu Ltd Resin composition
JPS5957437A (ja) * 1982-09-28 1984-04-03 Fujitsu Ltd 酸化珪素膜の形成方法

Also Published As

Publication number Publication date
JPS6129153A (ja) 1986-02-10

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees