JPH0584657B2 - - Google Patents
Info
- Publication number
- JPH0584657B2 JPH0584657B2 JP61077188A JP7718886A JPH0584657B2 JP H0584657 B2 JPH0584657 B2 JP H0584657B2 JP 61077188 A JP61077188 A JP 61077188A JP 7718886 A JP7718886 A JP 7718886A JP H0584657 B2 JPH0584657 B2 JP H0584657B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- magnetic
- substrate
- substrate holder
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁性膜形成装置に係り、特にスパツタ
法により基板上に磁性膜を形成する磁性膜形成装
置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic film forming apparatus, and more particularly to a magnetic film forming apparatus for forming a magnetic film on a substrate by sputtering.
〔従来の技術〕
磁気記録再生装置などに用いられる磁気ヘツド
としては、薄膜で磁性膜が形成された薄膜磁気ヘ
ツドが多用化されている。この薄膜磁気ヘツドの
製法としては、スパツタ法、真空蒸着法、マグネ
トロン法、対向ターゲツト法など多種類の方法が
開発され実用化されているが、薄膜の再現性がよ
く基板との付着力が強いなどの利点からスパツタ
法が多く用いられている。またこの薄膜には金属
膜から絶縁物膜まで多くの種類があるが、磁気ヘ
ツドなどに用いられる薄膜は磁性材料で形成され
たものが多い。[Prior Art] Thin film magnetic heads, in which a thin magnetic film is formed, are widely used as magnetic heads used in magnetic recording/reproducing devices and the like. Many methods have been developed and put into practical use for producing thin film magnetic heads, including the sputtering method, vacuum evaporation method, magnetron method, and facing target method. The sputtering method is often used because of the following advantages. There are many types of thin films ranging from metal films to insulating films, but the thin films used in magnetic heads and the like are often made of magnetic materials.
磁性材料の薄膜をスパツタ法で基板上に成膜す
るときには、磁気特性を得るために成膜時に平行
磁場を印加して、磁区を一定方向に配向させなが
らスパツタさせる必要がある。このために現状で
は、「高密度磁気記録技術集成」（対馬立郎監修、
綜合技術センター発行）図１，２，167頁及び197
頁に記載されたように、磁区を揃えたい方向に磁
場コイルまたは永久磁石などにより磁場を発生さ
せ印加する方法が採用されている。 When a thin film of a magnetic material is formed on a substrate by sputtering, it is necessary to apply a parallel magnetic field during film formation and sputter while aligning the magnetic domains in a certain direction in order to obtain magnetic properties. For this reason, at present, the ``High-density magnetic recording technology collection'' (supervised by Tatsuro Tsushima,
Published by Sogo Technological Center) Figures 1, 2, pages 167 and 197
As described on page 1, a method is adopted in which a magnetic field is generated and applied using a magnetic field coil or a permanent magnet in the direction in which the magnetic domains are desired to be aligned.
しかしながら、この方法において、第４図ａに
示すように磁場コイル１により外部磁場を与える
場合に、磁力線２は少なくとも１個の図示せぬ基
板を載置した基板ホルダ３の全域にわたつて平行
にはならない。このため第４図ｂに示すように基
板ホルダ３の両側に磁性材からなる磁極板４を設
けて、この磁極板４に磁束を集めることによつて
基板上の空間磁場をより均一平行にする方法が知
られている。この方法によれば基板上での磁場の
均一性は改善されるが、図から明らかなように磁
力線２は直線ではなく弧状になるため、基板全域
にわたつて磁力線２を平行にすることはできな
い。
However, in this method, when an external magnetic field is applied by the magnetic field coil 1 as shown in FIG. Must not be. For this purpose, as shown in FIG. 4b, magnetic pole plates 4 made of magnetic material are provided on both sides of the substrate holder 3, and by concentrating the magnetic flux on the magnetic pole plates 4, the spatial magnetic field on the substrate is made more uniform and parallel. method is known. This method improves the uniformity of the magnetic field on the substrate, but as is clear from the figure, the lines of magnetic force 2 are arcuate rather than straight, so it is not possible to make the lines of magnetic force 2 parallel across the entire substrate. .
特に最近は生産性向上を目的として複数の基板
を同時に処理する場合が多いため、磁極板４間の
距離が増加して複数の基板の全域にわたつて、平
行均一な磁場を印加することはますます困難とな
つてきている。このため第４図ｃに示すように複
数個の磁極板５を基板６の間に設け、基板６への
印加磁場を平行均一化することが考えられてい
る。しかしこの方法によつてもなお基板６の全域
にわたつて磁力線２を平行にすることはできな
い。またこの方法では追加した磁極板２の巾だけ
基板ホルダ３の長さが長くなり、装置が大形にな
るという問題もあつた。 Especially recently, as multiple substrates are often processed simultaneously to improve productivity, the distance between the magnetic pole plates 4 has increased, making it difficult to apply a parallel and uniform magnetic field over the entire area of multiple substrates. It's becoming increasingly difficult. For this reason, it has been considered to provide a plurality of magnetic pole plates 5 between the substrates 6, as shown in FIG. 4c, to make the magnetic field applied to the substrate 6 parallel and uniform. However, even with this method, it is still not possible to make the lines of magnetic force 2 parallel over the entire area of the substrate 6. This method also has the problem that the length of the substrate holder 3 becomes longer by the width of the added magnetic pole plate 2, making the device larger.
本発明は上述した事情に鑑みてなされたもの
で、広範囲にわたつて基板面と平行に均一な磁場
を生成させることができ、磁気特性のすぐれた磁
性薄膜を成膜することができる小形の磁性膜形成
装置を提供することを目的とする。 The present invention has been made in view of the above-mentioned circumstances, and is a compact magnetic material that can generate a uniform magnetic field parallel to the substrate surface over a wide range and can form a magnetic thin film with excellent magnetic properties. The purpose of the present invention is to provide a film forming apparatus.
本発明は上記の目的を達成するために、成膜材
料からなるターゲツトと、このターゲツトに対向
する被成膜母材である基板と、この基板を保持す
る基板ホルダと、基板面上に磁場を印加する主磁
場生成装置と、これらうち少なくともターゲツ
ト、基板及び基板ホルダを収納保持する真空容器
とよりなる磁性膜形成装置において、基板ホルダ
のうち磁場方向に向かつて左右の部位に当たる両
側縁の近傍にそれぞれ、主磁場生成装置の生成す
る磁場を強化するようにこの磁場とほぼ平行な磁
場を生成する補助磁場生成装置を設けたものであ
る。
In order to achieve the above object, the present invention includes a target made of a film forming material, a substrate which is a base material on which a film is formed facing the target, a substrate holder that holds this substrate, and a magnetic field applied to the surface of the substrate. In a magnetic film forming apparatus consisting of a main magnetic field generating device that applies a magnetic field, and a vacuum container that houses and holds at least a target, a substrate, and a substrate holder, a magnetic film is formed near both edges of the substrate holder corresponding to the left and right portions facing the direction of the magnetic field. Each is provided with an auxiliary magnetic field generating device that generates a magnetic field substantially parallel to the magnetic field generated by the main magnetic field generating device so as to strengthen the magnetic field.
上記の構成によると、主磁場生成装置と補助磁
場生成装置とのそれぞれが生成する磁場が、基板
面上で主磁場印加方向には強め合い、これに垂直
方向には弱め合うようにすることによつて、基板
面上での磁場の印加方向の強度、均一性を高める
ことができる。
According to the above configuration, the magnetic fields generated by the main magnetic field generator and the auxiliary magnetic field generator strengthen each other in the main magnetic field application direction on the substrate surface, and weaken each other in the direction perpendicular to this. Therefore, the strength and uniformity of the magnetic field in the application direction on the substrate surface can be increased.
以下、本発明に係る磁性膜形成装置の一実施例
を図面を参照して説明する。
An embodiment of the magnetic film forming apparatus according to the present invention will be described below with reference to the drawings.
第１図、第２図及び第３図に本発明の一実施例
を示す。これらの図において第４図に示す従来例
と同一または同等部分には同一符号を付して示
す。図において、真空容器７の底部にはカソード
電極８に連結されたターゲツトホルダ９が設けら
れており、このターゲツトホルダ９上に磁性材料
よりなるターゲツト１０が載置されている。前記
カソード電極８は前記真空器７に絶縁物１１を介
して気密に固定されている。真空容器７の上部に
は１対のヘルムホルツコイル１が主磁場発生装置
として設けられており、コイル１間に磁場を形成
している。これらのコイル１間には基板ホルダ３
に保持された少なくとも１個の基板６が配置され
ており、この基板ホルダ３と前記ターゲツト１０
との間にはシヤツタ１２が設けられている。また
真空容器７内の基板ホルダ３の上部には基板ヒー
タ１３が設けられており、基板ホルダ３の両端に
はパーマロイなどからなる磁極板４が一体に設け
られている。また基板ホルダ３の両側には基板６
と平行な面上で基板ホルダ３から一定の距離をお
いて一対の永久磁石１４が補助磁場生成装置とし
て配設されている。そしてこの永久磁石は、例え
ば前記１対のコイル１によつて基板ホルダ３上で
図中左から右向きに磁場を生成させたとすば、Ｎ
極を図中左側に向けて配置されている。 An embodiment of the present invention is shown in FIGS. 1, 2, and 3. In these figures, parts that are the same or equivalent to those of the conventional example shown in FIG. 4 are denoted by the same reference numerals. In the figure, a target holder 9 connected to a cathode electrode 8 is provided at the bottom of a vacuum container 7, and a target 10 made of a magnetic material is placed on the target holder 9. The cathode electrode 8 is airtightly fixed to the vacuum chamber 7 via an insulator 11. A pair of Helmholtz coils 1 are provided in the upper part of the vacuum container 7 as main magnetic field generators, and a magnetic field is formed between the coils 1. Between these coils 1 is a substrate holder 3.
At least one substrate 6 held by the substrate holder 3 and the target 10 are arranged.
A shutter 12 is provided between the two. Further, a substrate heater 13 is provided above the substrate holder 3 in the vacuum container 7, and magnetic pole plates 4 made of permalloy or the like are integrally provided at both ends of the substrate holder 3. Also, on both sides of the substrate holder 3 are substrates 6.
A pair of permanent magnets 14 are arranged as auxiliary magnetic field generating devices at a certain distance from the substrate holder 3 on a plane parallel to the substrate holder 3 . For example, if a magnetic field is generated from the left to the right in the figure on the substrate holder 3 by the pair of coils 1, the permanent magnet will be N
The poles are placed towards the left in the figure.
次に本実施例の作用を説明する。第３図ａ，ｂ
にそれぞれ永久磁石１４及びコイル１が別個に生
成する磁場を示す。永久磁石１４のＮ極は図中左
側に形成されており、左右１対のコイル１に流れ
る同一方向の電流の方向を、図中左右上側のコイ
ル断面において紙面裏側より表側に向う方向に選
んでいるので、それぞれ図に示した磁力線２の方
向に磁場が発生する。基板ホルダ３の両端には均
一な磁場を印加するために磁極板４が配置されて
いるが、コイル１のみによる磁力線２はｂに示す
ように中心のごく一部を除いて均一平行とはなら
ない。しかし第３図ｃに示すように、コイル１の
間に１対の永久磁石１４を対向して配置すると、
図に示すように基板ホルダ３上の磁力線２はほぼ
平行となり、磁場の平行性がよくなり図中ｘ方向
の磁場強度が増大する。 Next, the operation of this embodiment will be explained. Figure 3 a, b
1 and 2 show the magnetic fields generated separately by the permanent magnet 14 and the coil 1, respectively. The N pole of the permanent magnet 14 is formed on the left side in the figure, and the direction of the current flowing in the same direction in the left and right pair of coils 1 is selected from the direction toward the front side of the paper in the coil cross section on the upper left and right sides in the figure. Therefore, a magnetic field is generated in the direction of the magnetic lines of force 2 shown in the figure. Magnetic pole plates 4 are arranged at both ends of the substrate holder 3 in order to apply a uniform magnetic field, but the lines of magnetic force 2 due to only the coil 1 are not uniformly parallel except for a small part in the center as shown in b. . However, as shown in FIG. 3c, if a pair of permanent magnets 14 are placed facing each other between the coils 1,
As shown in the figure, the lines of magnetic force 2 on the substrate holder 3 become almost parallel, the parallelism of the magnetic fields improves, and the magnetic field strength in the x direction in the figure increases.
このことは下記の理由によつて実現できる。す
なわち第３図ａに示す磁力線２上のある点M1と、
この点M1と整合する位置における第３図ｂに示
す磁力線２上の点C1での磁場を比較すると、点
M1におけるｘ方向の磁場BM1xと、点C1における
ｘ方向の磁場BC1xとは同じ向きであるが、それぞ
れのＺ方向の磁場BM1zとBC1zとは逆向きである。
従つて両者を合成したときｘ方向には強め合うが
ｚ方向には打消し合う。このことは第３図ａ，ｂ
にそれぞれ示す別の点M2，C2についても同様で
ある。従つて第３図ｃでは、ｘ方向の磁場の平行
性が良くなるとともに、強度も強められる。 This can be achieved for the following reasons. That is, a certain point M 1 on the magnetic field lines 2 shown in Figure 3a,
Comparing the magnetic field at point C 1 on the magnetic field line 2 shown in Figure 3b at a position consistent with this point M 1 , the point
The magnetic field B M1x in the x direction at M 1 and the magnetic field B C1x in the x direction at point C 1 are in the same direction, but the respective magnetic fields B M1z and B C1z in the Z direction are in opposite directions.
Therefore, when the two are combined, they strengthen each other in the x direction, but cancel each other out in the z direction. This is shown in Figure 3 a and b.
The same applies to the other points M 2 and C 2 shown in . Therefore, in FIG. 3c, the parallelism of the magnetic field in the x direction is improved and the strength is also increased.
本実施例によれば、従来例において設けられた
中間の磁極板を必要とせず基板ホルダ３上に全体
にわたつて平行均一で強い磁場を印加できる。ま
た第４図Ｃに示す中間の磁極板５のない分だけ基
板ホルダ３を小さくすることができ、装置の小型
化が可能である。さらに永久磁石１４の位置や強
さを変えることにより、磁場印加の最適条件を比
較的簡単に実現できる。 According to this embodiment, a parallel, uniform, strong magnetic field can be applied over the entire substrate holder 3 without requiring the intermediate magnetic pole plate provided in the conventional example. Furthermore, the substrate holder 3 can be made smaller by the absence of the intermediate magnetic pole plate 5 shown in FIG. 4C, and the apparatus can be made smaller. Furthermore, by changing the position and strength of the permanent magnet 14, the optimum conditions for applying the magnetic field can be achieved relatively easily.
本実施例では補助磁場生成装置として永久磁石
を用いた場合について説明したが、この補助磁場
生成装置として電磁コイルを用いてもよい。 In this embodiment, a case has been described in which a permanent magnet is used as the auxiliary magnetic field generating device, but an electromagnetic coil may be used as the auxiliary magnetic field generating device.
上述したように本発明によれば、磁性膜形成装
置の主磁場生成装置の生成する磁場とほぼ平行な
磁場を生成する補助磁場生成装置を設けたので、
基板ホルダ側部上における磁場を強化して基板ホ
ルダ上に広範囲にわたつて基板面と平行に均一な
磁場を生成させることができ、小形の装置で磁気
ヘツドに要求される磁気特性のすぐれた磁性薄膜
を基板上に成膜することができる。
As described above, according to the present invention, an auxiliary magnetic field generating device is provided that generates a magnetic field substantially parallel to the magnetic field generated by the main magnetic field generating device of the magnetic film forming apparatus.
By strengthening the magnetic field on the side of the substrate holder, it is possible to generate a uniform magnetic field over a wide area on the substrate holder, parallel to the substrate surface, and to achieve the excellent magnetic properties required for magnetic heads with a small device. A thin film can be deposited on a substrate.
第１図は本発明に係る磁性膜形成装置の一実施
例を示す縦断面図、第２図は第１図の横断面図、
第３図は本実施例による磁力線を示す平面図、第
４図は従来の磁性膜形成装置による磁力線を示す
平面図である。
１……コイル（主磁場生成装置）、２……磁力
線、３……基板ホルダ、６……基板、７……真空
容器、１０……ターゲツト、１４……永久磁石
（補助磁場生成装置）。
FIG. 1 is a longitudinal cross-sectional view showing an embodiment of a magnetic film forming apparatus according to the present invention, FIG. 2 is a cross-sectional view of FIG. 1,
FIG. 3 is a plan view showing lines of magnetic force according to this embodiment, and FIG. 4 is a plan view showing lines of magnetic force according to a conventional magnetic film forming apparatus. DESCRIPTION OF SYMBOLS 1... Coil (main magnetic field generation device), 2... Line of magnetic force, 3... Substrate holder, 6... Substrate, 7... Vacuum vessel, 10... Target, 14... Permanent magnet (auxiliary magnetic field generation device).
Claims (1)
トに対向する被成膜母材である基板と、この基板
を保持する基板ホルダと、前記基板面上に磁場を
印加する主磁場生成装置と、これらのうち少なく
とも前記ターゲツト、前記基板及び前記基板ホル
ダを収納保持する真空容器とよりなる磁性膜形成
装置において、前記基板ホルダで前記磁場方向に
向かつて左右に当たる両側縁の近傍にそれぞれ、
前記主磁場生成装置の生成する磁場を強化するよ
うに該磁場とほぼ平行な磁場を生成する補助磁場
生成装置を設けたことを特徴とする磁性膜形成装
置。 ２ 特許請求の範囲第１項において、補助磁場生
成装置は、永久磁石であることを特徴とする磁性
膜形成装置。[Scope of Claims] 1. A target made of a film forming material, a substrate which is a base material on which a film is formed and faces the target, a substrate holder that holds this substrate, and a main magnetic field that applies a magnetic field onto the surface of the substrate. In a magnetic film forming apparatus comprising a generation device and a vacuum container that houses and holds at least the target, the substrate, and the substrate holder among them, the substrate holder is provided with magnetic film in the vicinity of left and right edges of the substrate holder facing the direction of the magnetic field. ,
A magnetic film forming apparatus characterized in that an auxiliary magnetic field generating device is provided that generates a magnetic field substantially parallel to the magnetic field generated by the main magnetic field generating device so as to strengthen the magnetic field generated by the main magnetic field generating device. 2. The magnetic film forming apparatus according to claim 1, wherein the auxiliary magnetic field generating device is a permanent magnet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7718886A JPS62232911A (en) | 1986-04-03 | 1986-04-03 | Magnetic film forming equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7718886A JPS62232911A (en) | 1986-04-03 | 1986-04-03 | Magnetic film forming equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62232911A JPS62232911A (en) | 1987-10-13 |
| JPH0584657B2 true JPH0584657B2 (en) | 1993-12-02 |
Family
ID=13626840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7718886A Granted JPS62232911A (en) | 1986-04-03 | 1986-04-03 | Magnetic film forming equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62232911A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01294859A (en) * | 1988-05-23 | 1989-11-28 | Hitachi Ltd | Opposed target-type sputtering device |
| US5630916A (en) * | 1993-03-02 | 1997-05-20 | Cvc Products, Inc. | Magnetic orienting device for thin film deposition and method of use |
| GB9609470D0 (en) * | 1996-05-07 | 1996-07-10 | Nordiko Ltd | Magnet array |
| US6106682A (en) | 1998-05-22 | 2000-08-22 | Cvc Products, Inc. | Thin-film processing electromagnet for low-skew magnetic orientation |
| US6042707A (en) * | 1998-05-22 | 2000-03-28 | Cvc Products, Inc. | Multiple-coil electromagnet for magnetically orienting thin films |
| JP4648876B2 (en) * | 2006-06-28 | 2011-03-09 | 信越化学工業株式会社 | Magnetic circuit for radial magnetic field generation |
| CN107313019B (en) * | 2017-07-14 | 2019-11-29 | 北京北方华创微电子装备有限公司 | Thin magnetic film deposition chambers and film deposition equipment |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60182711A (en) * | 1984-02-29 | 1985-09-18 | Konishiroku Photo Ind Co Ltd | Method and apparatus for forming magnetic thin-film |
-
1986
- 1986-04-03 JP JP7718886A patent/JPS62232911A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62232911A (en) | 1987-10-13 |
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