JPH0588467B2 - - Google Patents
Info
- Publication number
- JPH0588467B2 JPH0588467B2 JP8687485A JP8687485A JPH0588467B2 JP H0588467 B2 JPH0588467 B2 JP H0588467B2 JP 8687485 A JP8687485 A JP 8687485A JP 8687485 A JP8687485 A JP 8687485A JP H0588467 B2 JPH0588467 B2 JP H0588467B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- compound
- ring structure
- lactone ring
- photosensitive composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Description
〔産業上の利用分野〕
本発明は平版印刷版及びフオトレジスト等に好
適に使用される感光性組成物に関し、更に詳しく
は高感度で、且つ、ポジ型の感光性組成物に関す
るものである。
〔従来の技術〕
o−キノンジアジド化合物は活性光線を照射す
ると、5員環のカルボン酸を生じ、アルカリ可溶
性となることからこのo−キノンジアジド化合物
を用いた感光性組成物は、ポジ型平版印刷版やフ
オトレジストとして用いられてきた。
このo−キノンジアジド化合物とノボラツク樹
脂等の如きアルカリ可溶樹脂から成る感光性組成
物が一般に用いられており、この感光性組成物の
感度を高める方法についていろいろと試みられて
きた。例えば、特公昭56−19619号公報には、ヒ
ダントイン類及び安息香酸の添加が、特開昭55−
73045号公報には、ヒドロキシベンゾフエノンと
ホルムアルデヒドとの縮合生成物の添加がそれぞ
れ記載されている。しかし、充分に感度を高める
には、これらの添加剤を多量に加えねばならず、
そうすると画像形成材料に使用した際末露光部の
現像液に対する溶解性も増してしまい現像許容度
が狭くなるという欠点を伴なつていた。また、無
水フタル酸や無水マレイン酸等の添加(特開昭52
−80022号公報)や6員環状の酸無水物の添加
(特開昭58−11932号公報)も報告されており、こ
れらはいずれも光感度の増加には比較的効果的で
あるが、長期保存後に画像形成材料として用いた
場合、現像許容度が狭くなり、更にこれらの感光
性組成物を使用した平版印刷版は、製版作業に使
用する各種薬品(例えば、汚れ除去やガム引きに
用いる薬品や、アルコールを含んだ湿し水等)に
より画線部が侵され易いため、版とびや地汚れが
生じ易く重印刷用の刷版としての使用が難しいと
いう欠点を有していた。
〔発明が解決しようとする問題点〕
本発明の目的は、上記欠点を改良し、高感度
で、且つ、長期保存安定性にも優れた感光性組成
物の提供にある。
本発明の他の目的は特に平版印刷版として好適
に使用し得る感光性組成物の提供にある。
〔問題点を解決するための手段〕
本発明は、(a)分子中にγ−ラクトン環構造とo
−キノンジアジド基を有する感光性ポリウレタン
化合物及び(b)アルカリ可溶性樹脂を含有すること
を特徴とする感光性組成物に関する。
上記のγ−ラクトン環構造としては、例えば下
記一般式(1)で表わされる構造を挙げることができ
る。
[Industrial Field of Application] The present invention relates to a photosensitive composition suitably used for lithographic printing plates, photoresists, etc., and more specifically to a highly sensitive and positive photosensitive composition. [Prior Art] When an o-quinonediazide compound is irradiated with actinic rays, it produces a five-membered ring carboxylic acid and becomes alkali-soluble. It has been used as a photoresist. A photosensitive composition comprising this o-quinonediazide compound and an alkali-soluble resin such as a novolac resin is generally used, and various attempts have been made to improve the sensitivity of this photosensitive composition. For example, Japanese Patent Publication No. 56-19619 describes the addition of hydantoins and benzoic acid.
Publication No. 73045 describes the addition of a condensation product of hydroxybenzophenone and formaldehyde. However, in order to sufficiently increase sensitivity, large amounts of these additives must be added.
In this case, when used in an image-forming material, the solubility in a developing solution in the end-exposed area also increases, resulting in a disadvantage that the development tolerance becomes narrow. In addition, addition of phthalic anhydride, maleic anhydride, etc.
-80022) and the addition of a 6-membered cyclic acid anhydride (Japanese Unexamined Patent Publication No. 11932/1983), both of which are relatively effective in increasing photosensitivity, but long-term When used as an image-forming material after storage, the development latitude becomes narrower, and lithographic printing plates using these photosensitive compositions are susceptible to various chemicals used in plate-making operations (e.g., chemicals used for stain removal and gumming). Since the image area is easily attacked by water (e.g., alcohol-containing dampening water, etc.), plate skipping and background smearing are likely to occur, making it difficult to use as a printing plate for heavy printing. [Problems to be Solved by the Invention] An object of the present invention is to improve the above-mentioned drawbacks and to provide a photosensitive composition that is highly sensitive and has excellent long-term storage stability. Another object of the present invention is to provide a photosensitive composition that can be particularly suitably used as a lithographic printing plate. [Means for solving the problems] The present invention provides (a) a γ-lactone ring structure and an o-lactone ring structure in the molecule;
- A photosensitive composition characterized by containing a photosensitive polyurethane compound having a quinonediazide group and (b) an alkali-soluble resin. Examples of the above-mentioned γ-lactone ring structure include a structure represented by the following general formula (1).
〔1〕 感光性ポリウレタン化合物の製造
第1表に記載した配合組成をもつγ−ラクトン
環化合物とジイソシアネート化合物を第1表に記
載した量の溶剤(ジエチレングリコールジメチル
エーテル)と共に撹拌装置、温度計を備えた反応
器に仕込み、撹拌しつつ150℃に加温して反応を
開始した。その後、8時間に亘つて、150℃で撹
拌を続け、(a)ポリウレタン化合物前駆体を得た。
次いで、50℃までに冷却し、第1表の「感光性ポ
リウレタンの製造」の欄に記載した量の溶剤(ジ
エチレングリコールジメチルエーテル)を加え、
さらにハロゲノスルホニル基を有するo−キノン
ジアジド化合物として第1表に記載した量のナフ
トキノン−(1,2)−ジアジド−(2)−5−スルホ
ニルクロライドを加えて溶解し、40〜50℃に保ち
つつ、反応液が中性を示すまで、炭酸カリウム水
溶液(40%水溶液)を加えた。
中性にした後、約5時間撹拌し反応させたの
ち、反応溶媒の10倍の水を注ぎ、反応物を沈殿さ
せ別した。これを少量のイソプロピルアルコー
ルで洗浄し、常温で真空乾燥し、(a)ポリウレタン
化合物を得た。
〔2〕 感光性組成物の調製
前記〔1〕で製造した感光性ポリウレタン化合
物を使用し、第3表に記載の配合で、感光性ポリ
ウレタン化合物、アルカリ可溶性樹脂としてノボ
ラツク型フエノール樹脂PSF2807(郡栄化学社
製)、及び場合により第2表に記載した配合組成
から成るo−キノンジアジド化合物、種々の添加
剤等を溶剤に溶解せしめ感光性組成物を調整し
た。
〔3〕 感光性組成物の光感度の測定と現像許容
性の評価
〔3〕−1 感光板の作成方法
前記〔2〕で調整した組成物を砂目立てしたア
ルミニウム板(厚さ3mm)にホワラー塗布し、こ
れを乾燥して感光板を作成した。乾燥後の塗布重
量は2.0g/m2であつた。
〔3〕−2 光感度の測定条件と現像許容性の評
価条件
前記〔3〕−1で得られた感光板に、濃度段差
0.15のグレースケール(濃度段数0〜15)を密着
させ、感光板から1m離れた位置に設けた出力
1kWのメタルハライドランプ〔岩埼電気(株)「ア
イドルフイン1000」〕を用いて露光した。
その後、この感光板を市販のポジ型平版印刷版
用現像液「DP−4」(富士写真フイルム(株)社製)
の9倍希釈水溶液で20℃において60秒間現像し
た。感度はこの60秒間現像における適正露光時間
をもつて表わした。但し、この際の適正露光時間
とは、グレースケールで3段目が完全に現像され
る(クリアーとなる)露光時間とした。
現像許容性は前記〔3〕−1で作成した感光板
を前記と同様の露光装置を用いて60秒間現像にお
ける適正露光時間で露光し、引き続いて前記と同
様の現像方法で240秒間現像し、グレースケール
のクリアーとなる段数(以下、クリアー段数とい
う。)を測定し、60秒間現像の時のクリアー段数
(3段)と比較し、その段差をもつて示した。
〔4〕 印刷版の作製と印刷適性の評価
前記〔3〕−1と同様の方法で作製した感光板
にテストパターンのポジフイルムを密着させ、こ
れから1m離れた位置に設けた出力1kWのメタ
ルハライドランプ(岩埼電気(株)社製「アイドルフ
イン1000」〕を用いて、前記〔3〕−2における60
秒間現像における適正露光時間で露光し、引き続
いて前と同様に60秒間現像して印刷版を製作し
た。このようにして製作された印刷版を4色平版
印刷機に取り付け、平版印刷用標準インキを用い
て実際の平版印刷と同様の条件下で印刷を行い、
5万枚印刷した時点で印刷適性の評価を行つたと
ころ、いずれの印刷版においても網点太り、版と
び、かすれ等の印刷不良がなく原画に忠実で鮮明
な画像が得られた。
〔5〕 感光板の保存安定性の評価
前記〔3〕−1と同様の方法で作製し、引き続
いて促進試験として恒温恒湿機(60℃、60%
RH)に100時間保存した感光板と、促進試験を
行わない感光板を準備し、各々前記〔4〕と同様
の方法で印刷版を作製し、印刷を行い、促進試験
を行つた場合と促進試験を行わない場合で、現像
性、光感度、印刷適性等において相違が有るか否
かをもつて感光板の保存安定性を評価した。
[1] Production of photosensitive polyurethane compound A γ-lactone ring compound and a diisocyanate compound having the composition shown in Table 1 were mixed with a solvent (diethylene glycol dimethyl ether) in the amount shown in Table 1 using a stirrer and a thermometer. The mixture was charged into a reactor and heated to 150°C with stirring to start the reaction. Thereafter, stirring was continued at 150°C for 8 hours to obtain (a) polyurethane compound precursor.
Next, it was cooled to 50°C, and the amount of solvent (diethylene glycol dimethyl ether) listed in the column of "Production of photosensitive polyurethane" in Table 1 was added.
Further, naphthoquinone-(1,2)-diazide-(2)-5-sulfonyl chloride in the amount listed in Table 1 as an o-quinonediazide compound having a halogenosulfonyl group was added and dissolved, and the mixture was maintained at 40 to 50°C. An aqueous potassium carbonate solution (40% aqueous solution) was added until the reaction solution became neutral. After making the mixture neutral, the mixture was stirred for about 5 hours to react, and then 10 times the amount of water as the reaction solvent was poured to precipitate the reaction product, which was then separated. This was washed with a small amount of isopropyl alcohol and vacuum dried at room temperature to obtain polyurethane compound (a). [2] Preparation of photosensitive composition Using the photosensitive polyurethane compound produced in [1] above, the photosensitive polyurethane compound and the novolac type phenolic resin PSF2807 (Gunei Co., Ltd.) were added as the alkali-soluble resin. A photosensitive composition was prepared by dissolving o-quinonediazide compound (manufactured by Kagaku Co., Ltd.), and optionally an o-quinonediazide compound having the composition shown in Table 2, various additives, etc. in a solvent. [3] Measurement of photosensitivity and evaluation of development acceptability of photosensitive composition [3]-1 Method for making photosensitive plate The composition prepared in [2] above was coated on a grained aluminum plate (thickness: 3 mm). A photosensitive plate was prepared by coating the film and drying it. The coating weight after drying was 2.0 g/m 2 . [3]-2 Measurement conditions for photosensitivity and evaluation conditions for development tolerance
Output with 0.15 gray scale (density level 0 to 15) placed 1m away from the photosensitive plate.
Exposure was performed using a 1kW metal halide lamp [Idolfin 1000, manufactured by Iwasaki Electric Co., Ltd.]. Thereafter, this photosensitive plate was processed using a commercially available positive planographic printing plate developer "DP-4" (manufactured by Fuji Photo Film Co., Ltd.).
The film was developed with a 9-fold diluted aqueous solution at 20°C for 60 seconds. Sensitivity was expressed by the appropriate exposure time for this 60 second development. However, the appropriate exposure time at this time was defined as the exposure time at which the third stage of the gray scale was completely developed (became clear). Development acceptability was determined by exposing the photosensitive plate prepared in [3]-1 above for 60 seconds at the appropriate exposure time for development using the same exposure device as above, and then developing for 240 seconds using the same development method as above. The number of steps at which the gray scale becomes clear (hereinafter referred to as the number of clear steps) was measured and compared with the number of clear steps (3 steps) when developing for 60 seconds, and the difference in steps is shown. [4] Preparation of printing plate and evaluation of printing suitability A positive film with a test pattern was placed in close contact with a photosensitive plate prepared in the same manner as in [3]-1 above, and a metal halide lamp with an output of 1 kW was placed 1 m away from the photosensitive plate. (Idol Fin 1000 manufactured by Iwasaki Electric Co., Ltd.)
A printing plate was prepared by exposure at the appropriate exposure time in second development, followed by development for 60 seconds as before. The printing plate thus produced was mounted on a four-color lithographic printing machine, and printed using standard ink for lithographic printing under conditions similar to actual lithographic printing.
When printing suitability was evaluated after 50,000 copies were printed, clear images faithful to the originals were obtained in all printing plates, with no printing defects such as thick halftone dots, plate skipping, or blurring. [5] Evaluation of storage stability of photosensitive plate A photosensitive plate was prepared in the same manner as in [3]-1 above, and subsequently, as an accelerated test, it was placed in a constant temperature and humidity chamber (60°C, 60%
A photosensitive plate stored for 100 hours at RH) and a photosensitive plate without an accelerated test were prepared, and printing plates were prepared in the same manner as in [4] above, printed, and accelerated tests were performed. The storage stability of the photosensitive plates was evaluated by determining whether there were any differences in developability, photosensitivity, printability, etc., without conducting any tests.
【表】【table】
【表】【table】
【表】【table】
【表】【table】
本発明の感光性組成物は、5員環のγ−ラクト
ン環構造を有し、且つo−キノンジアジド基を有
するポリウレタン化合物を含有することにより、
高感度であり、且つ、現像許容性、長期保存安定
性等にも何ら問題のない良好な感光材料である。
本発明の感光性組成物は、特にポジ型感光性印
刷版用の感光材料として適したものであるが、必
ずしも感光性平版印刷版に限定されるものでな
く、例えば、IC、リードフレーム、コネクター
等の電子部品を製造する際に必要とされる微細加
工の為の感光材料としても使用し得るものであ
る。
The photosensitive composition of the present invention has a 5-membered γ-lactone ring structure and contains a polyurethane compound having an o-quinonediazide group.
It is a good photosensitive material that is highly sensitive and has no problems in development tolerance, long-term storage stability, etc. The photosensitive composition of the present invention is particularly suitable as a photosensitive material for positive-working photosensitive printing plates, but is not necessarily limited to photosensitive planographic printing plates, such as ICs, lead frames, connectors, etc. It can also be used as a photosensitive material for microfabrication required when manufacturing electronic components such as.
Claims (1)
ジアジド基を有する感光性ポリウレタン化合物及
び(b)アルカリ可溶性樹脂を含有することを特徴と
する感光性組成物。 2 γ−ラクトン環構造が 【式】 で表わされる構造である特許請求の範囲第1項記
載の感光性組成物。 3 (a)分子中にγ−ラクトン環構造とo−キノン
ジアジド基を有する感光性ポリウレタン化合物
が、分子中にγ−ラクトン環構造を有するポリヒ
ドロキシ化合物とポリイソシアネート化合物を反
応させて得られる水酸基含有ポリウレタン前駆体
にハロゲノスルホニル基を有するo−キノンジア
ジド化合物を反応させて得られるものである特許
請求の範囲第1項又は第2項記載の感光性組成
物。 4 分子中にγ−ラクトン環構造を有するポリヒ
ドロキシ化合物がフエノールフタレイン、チモー
ルフタレイン、ナフトールフタレイン、o−クレ
ゾールフタレイン、テトラクロロフエノールフタ
レイン及びテトラブロモフエノールフタレインよ
り成る群から選ばれる1種もしくは2種以上の化
合物である特許請求の範囲第3項記載の感光性組
成物。[Scope of Claims] 1. A photosensitive composition comprising (a) a photosensitive polyurethane compound having a γ-lactone ring structure and an o-quinonediazide group in the molecule, and (b) an alkali-soluble resin. 2. The photosensitive composition according to claim 1, wherein the γ-lactone ring structure is represented by the following formula. 3 (a) A photosensitive polyurethane compound having a γ-lactone ring structure and an o-quinonediazide group in the molecule contains a hydroxyl group obtained by reacting a polyhydroxy compound having a γ-lactone ring structure in the molecule with a polyisocyanate compound The photosensitive composition according to claim 1 or 2, which is obtained by reacting a polyurethane precursor with an o-quinonediazide compound having a halogenosulfonyl group. 4. The polyhydroxy compound having a γ-lactone ring structure in the molecule is selected from the group consisting of phenolphthalein, thymolphthalein, naphtholphthalein, o-cresolphthalein, tetrachlorophenolphthalein, and tetrabromophenolphthalein. The photosensitive composition according to claim 3, which is one or more kinds of compounds.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8687485A JPS61245154A (en) | 1985-04-23 | 1985-04-23 | Photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8687485A JPS61245154A (en) | 1985-04-23 | 1985-04-23 | Photosensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61245154A JPS61245154A (en) | 1986-10-31 |
| JPH0588467B2 true JPH0588467B2 (en) | 1993-12-22 |
Family
ID=13898971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8687485A Granted JPS61245154A (en) | 1985-04-23 | 1985-04-23 | Photosensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61245154A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5248582A (en) * | 1988-09-07 | 1993-09-28 | Fuji Photo Film Co., Ltd. | Positive-type photoresist composition |
| US5221592A (en) * | 1992-03-06 | 1993-06-22 | Hoechst Celanese Corporation | Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester |
-
1985
- 1985-04-23 JP JP8687485A patent/JPS61245154A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61245154A (en) | 1986-10-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3890152A (en) | Light-sensitive copying composition containing diazo resin and quinone diazide | |
| US4581321A (en) | Process for producing negative copies in a material based on 1,2-quinone diazides with thermal curing agent | |
| US4576901A (en) | Process for producing negative copies by means of a material based on 1,2-quinone diazides with 4-ester or amide substitution | |
| US4511640A (en) | Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer | |
| US2766118A (en) | Light-sensitive material for the photomechanical reproduction and process for the production of images | |
| JPS59219743A (en) | Positive type resist developing solution | |
| EP0394353A1 (en) | Aqueous developing solution and its use in developing positive-working photoresist composition | |
| JPH0145901B2 (en) | ||
| JPH0140338B2 (en) | ||
| JPH0157895B2 (en) | ||
| JPH0588467B2 (en) | ||
| JP2541736B2 (en) | Photosensitive mixture containing orthonaphthoquinonediazide sulfonate and recording material made therefrom | |
| JPS61230137A (en) | Element for polyester and lithography | |
| JP2652100B2 (en) | Photosensitive composition | |
| KR100608966B1 (en) | Radiation Sensitive Resin Composition | |
| JP3978885B2 (en) | Radiation sensitive resin composition | |
| GB2124399A (en) | A light-sensitive planographic printing plate precursor | |
| US5384228A (en) | Alkali-developable positive-working photosensitive resin composition | |
| JPS6388546A (en) | Positive type photosensitive composition | |
| US3028239A (en) | Light sensitive elements for the production of lithographic printing plates | |
| JPH0128369B2 (en) | ||
| JP2927014B2 (en) | Radiation-sensitive resin composition | |
| GB2210172A (en) | Light-sensitive material and method for forming images | |
| JPS6358335B2 (en) | ||
| JP3592332B2 (en) | Positive photosensitive composition |