JPH0590634A - Light emitting diode - Google Patents

Light emitting diode

Info

Publication number
JPH0590634A
JPH0590634A JP24581891A JP24581891A JPH0590634A JP H0590634 A JPH0590634 A JP H0590634A JP 24581891 A JP24581891 A JP 24581891A JP 24581891 A JP24581891 A JP 24581891A JP H0590634 A JPH0590634 A JP H0590634A
Authority
JP
Japan
Prior art keywords
light emitting
emitting diode
hole
electrode
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP24581891A
Other languages
Japanese (ja)
Inventor
Naoyuki Matsuoka
直之 松岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP24581891A priority Critical patent/JPH0590634A/en
Publication of JPH0590634A publication Critical patent/JPH0590634A/en
Withdrawn legal-status Critical Current

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  • Led Devices (AREA)

Abstract

PURPOSE:To make a light emitting part in optional shape and with optional area and make it highly efficient. CONSTITUTION:In a light emitting diode 20, where an epitaxial layer having an active layer 13 is grown on the substrate 11 and an electrode 17 on n side is made on the surface, the electrode 17 on n side is provided with at least one hole 16, and further a mesa part 12 is provided at the main face of the substrate 11 positioned below the hole 16.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、発光ダイオ−ドとくに
長寿命発光ダイオ−ドに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light emitting diode, and more particularly to a long life light emitting diode.

【0002】[0002]

【従来の技術】従来、発光ダイオ−ドとしては、例えば
図3に示すものが知られている(特開平3−17477
9号)。
2. Description of the Related Art Conventionally, as a light emitting diode, for example, one shown in FIG. 3 is known (Japanese Patent Laid-Open No. 17477/1993).
No. 9).

【0003】図中の1はp型GaAs基板であり、メサ
部2を有している。前記基板1上には、p型GaAIA
sクラッド層(第1クラッド層)3、GaAIAs活性
層4及びn型GaAIAsウィンドウ層(第2クラッド
層)5が形成されている。前記第2クラッド層5上には
n側電極6が形成され、前記基板1の裏面にはp側電極
7が形成されている。ここで、前記メサ部2は、平面的
にみると、n側電極6の外周部より外側に位置してい
る。
Reference numeral 1 in the figure denotes a p-type GaAs substrate having a mesa portion 2. The p-type GaAIA is formed on the substrate 1.
An s clad layer (first clad layer) 3, a GaAIAs active layer 4, and an n-type GaAIAs window layer (second clad layer) 5 are formed. An n-side electrode 6 is formed on the second cladding layer 5, and a p-side electrode 7 is formed on the back surface of the substrate 1. Here, the mesa portion 2 is located outside the outer peripheral portion of the n-side electrode 6 when seen in a plan view.

【0004】こうした構造の発光ダイオ−ドにおいて、
正孔と電子は図3のX,Yに示すように流れ、活性層4
で面発光し、n側電極6の外周部の第2クラッド層5か
ら矢印Zに示すように放出される。そして、発光部がn
側電極6の外周部より外側になるため、発生した光はn
側電極6に妨げられることなく放射され、効率が良く高
輝度となる。
In a light emitting diode having such a structure,
Holes and electrons flow as shown by X and Y in FIG.
Surface emission is performed and is emitted from the second cladding layer 5 on the outer peripheral portion of the n-side electrode 6 as indicated by an arrow Z. And the light emitting part is n
Since it is outside the outer periphery of the side electrode 6, the generated light is n
It is radiated without being hindered by the side electrode 6, and the efficiency is high and the brightness is high.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、従来の
発光ダイオ−ドによれば、発光部がn側電極6を取り巻
くド−ナツ形状であるため、任意の形状と面積をもつ発
光部を得ることができないという問題があった。
However, according to the conventional light emitting diode, since the light emitting portion has a donut shape surrounding the n-side electrode 6, a light emitting portion having an arbitrary shape and area can be obtained. There was a problem that I could not.

【0006】本発明は上記事情に鑑みてなされたもの
で、基板表側に少なくも1つの穴を設け、かつ前記穴の
下方に位置する前記基板主面に凸部を設けることによ
り、任意の形状と面積の発光部を持ち、かつ高効率な発
光ダイオ−ドを提供することを目的とする。
The present invention has been made in view of the above circumstances, and at least one hole is provided on the front side of the substrate, and a convex portion is provided on the main surface of the substrate located below the hole, whereby an arbitrary shape is obtained. It is an object of the present invention to provide a highly efficient light emitting diode having a light emitting portion having a large area.

【0007】[0007]

【課題を解決するための手段】本発明は、基板上に活性
層を有するエピタキシャル層を成長させると共に表面に
電極を形成した発光ダイオ−ドにおいて、上記電極に少
なくとも1つの穴を設け、かつ前記穴の下方に位置する
前記基板主面に凸部を設けたことを特徴とする発光ダイ
オ−ドである。
SUMMARY OF THE INVENTION The present invention is a light emitting diode in which an epitaxial layer having an active layer is grown on a substrate and an electrode is formed on the surface of the substrate, wherein the electrode is provided with at least one hole. The light emitting diode is characterized in that a convex portion is provided on the main surface of the substrate located below the hole.

【0008】本発明において、前記電極の穴は前記凸部
と同じ径であってもよいが、好ましくは電極の穴は前記
凸部よりも大きくする。これにより、凸部で主として生
じた発光が、電極に妨げられずに穴から一層効率良く放
出される。
In the present invention, the hole of the electrode may have the same diameter as the convex portion, but preferably the hole of the electrode is larger than the convex portion. Thereby, the light emission mainly generated in the convex portion is more efficiently emitted from the hole without being blocked by the electrode.

【0009】また、本発明において、前記電極の穴は、
前記電極の中心からずれた位置にあることが好ましい。
これにより、電極へのワイヤボンディングを容易にする
ことができる。
Further, in the present invention, the hole of the electrode is
It is preferably located at a position displaced from the center of the electrode.
Thereby, wire bonding to the electrode can be facilitated.

【0010】[0010]

【作用】上記の構成において、n側電極の円形の穴の真
下に対応する基板表面に凸部(メサ部)を設けられてい
るため、電子・正孔は図1の矢印にX,Yのように流
れ、メサ上部の活性層で発光する。そして、発光する光
はn側電極の穴を通して矢印Zのように放出される。
In the above structure, since the convex portion (mesa portion) is provided on the substrate surface directly under the circular hole of the n-side electrode, electrons and holes are indicated by arrows X and Y in FIG. And emits light in the active layer above the mesa. Then, the emitted light is emitted as shown by an arrow Z through the hole of the n-side electrode.

【0011】[0011]

【実施例】以下、本発明の一実施例に係る発光ダイオ−
ドについて図1及び図2を参照して説明する。ここで、
図1は発光ダイオ−ドの断面図、図2は図1の平面図を
示す。
EXAMPLE A light emitting diode according to an example of the present invention will be described below.
The mode will be described with reference to FIGS. 1 and 2. here,
FIG. 1 is a sectional view of the light emitting diode, and FIG. 2 is a plan view of FIG.

【0012】図中の11はp型GaAs基板であり、メ
サ部12を有している。ここで、前記基板11はキャリ
ア濃度2×1019cm-3,厚さ270μmで、メサ部は直径
30μm,高さ20μmの例えば円形である。前記基板
11上には、厚さ40μmのp型GaAIAs(混結比
0.65)クラッド層(第1クラッド層)13、厚さ1μm
のアンド−プGaAIAs(混結比0.35)活性層14及
び厚さ40μmのn型GaAIAsウィンドウ層(第2
クラッド層)15が夫々形成されている。前記第2クラ
ッド層15上には、前記メサ部12の真上に位置する部
分に円形の穴16を有するn側電極17が形成されてい
る。なお、上記穴16はメサ部12より少し大きめにし
ておく。前記基板11の裏面には、p側電極18が形成
されている。
Reference numeral 11 in the figure denotes a p-type GaAs substrate having a mesa portion 12. Here, the substrate 11 has a carrier concentration of 2 × 10 19 cm −3 and a thickness of 270 μm, and the mesa portion has a diameter of 30 μm and a height of 20 μm, for example, a circle. On the substrate 11, 40 μm thick p-type GaAIAs (mixing ratio
0.65) Clad layer (first clad layer) 13, thickness 1 μm
And-type GaAIAs (mixing ratio 0.35) active layer 14 and n-type GaAIAs window layer 40 μm thick (second
Cladding layers) 15 are formed respectively. An n-side electrode 17 having a circular hole 16 is formed on the second cladding layer 15 in a portion located right above the mesa portion 12. The hole 16 is slightly larger than the mesa portion 12. A p-side electrode 18 is formed on the back surface of the substrate 11.

【0013】こうした構成の発光ダイオ−ドにおいて、
電子・正孔は矢印X,Yのように流れ、メサ上部の活性
層14で発光する。そして、その上部にn側電極17が
ないため、発光する光19はn側電極17の穴16を通
して効率的に放出される。次に、上記構成の発光ダイオ
−ドの製造方法について説明する。
In the light emitting diode having such a structure,
Electrons and holes flow as indicated by arrows X and Y, and emit light in the active layer 14 above the mesa. Then, since there is no n-side electrode 17 on the upper portion, the emitted light 19 is efficiently emitted through the hole 16 of the n-side electrode 17. Next, a method of manufacturing the light emitting diode having the above structure will be described.

【0014】まず、前記GaAs基板11上にメサ部1
2をホトリソグラフィにより形成する。メサ部の平面形
状は任意であるが、この場合は円形とした。次に、前記
基板11上に、前記第1クラッド層13、活性層14及
び第2クラッド層15を夫々エピタキシャル成長法によ
り形成した。つづいて、前記第2クラッド層15上に、
前記メサ部12の真上に位置する部分に穴16を有する
n側電極17が形成した。更に、前記基板11の裏面に
p側電極18を形成して発光ダイオ−ド20を作製す
る。
First, the mesa portion 1 is formed on the GaAs substrate 11.
2 is formed by photolithography. The planar shape of the mesa is arbitrary, but in this case, it was circular. Next, the first clad layer 13, the active layer 14, and the second clad layer 15 were formed on the substrate 11 by an epitaxial growth method. Then, on the second cladding layer 15,
An n-side electrode 17 having a hole 16 was formed in a portion located right above the mesa portion 12. Further, a p-side electrode 18 is formed on the back surface of the substrate 11 to produce a light emitting diode 20.

【0015】しかして、上記実施例に係る発光ダイオ−
ドによれば、n側電極17の円形の穴16の真下に対応
する基板11表面に前記穴16より若干が径が小さいメ
サ部12を設けた構成になっているため、発光が主とし
てこのメサ部12で生じる。従って、生じた光がn側電
極16に妨げられることなく放出されるので、光の放出
効率が良く、しかも穴16の形状により発光面の形状を
制御できるという効果を有する。
Therefore, the light emitting diode according to the above embodiment is used.
According to C., the mesa portion 12 having a diameter slightly smaller than that of the hole 16 is provided on the surface of the substrate 11 directly below the circular hole 16 of the n-side electrode 17, so that light emission is mainly caused by this mesa. It occurs in part 12. Therefore, the generated light is emitted without being hindered by the n-side electrode 16, so that the light emission efficiency is good and the shape of the light emitting surface can be controlled by the shape of the hole 16.

【0016】なお、上記実施例では、穴がn側電極の中
心に位置している場合について述べたが、これに限定さ
れない。例えば、図2に示すように、穴21がn側電極
22の中心Pからずれた位置に設けられていてもよい。
こうした構成にすれば、電極22へのワイヤボンディン
グが容易にすることができる。
In the above embodiment, the case where the hole is located at the center of the n-side electrode has been described, but the present invention is not limited to this. For example, as shown in FIG. 2, the hole 21 may be provided at a position displaced from the center P of the n-side electrode 22.
With such a configuration, wire bonding to the electrode 22 can be facilitated.

【0017】[0017]

【発明の効果】以上詳述した如く本発明によれば、基板
表側に少なくも1つの穴を設け、かつ前記穴の下方に位
置する前記基板主面に凸部を設けることにより、任意の
形状と面積の発光部を持ち、かつ高効率な発光ダイオ−
ドを提供できる。
As described in detail above, according to the present invention, at least one hole is provided on the front side of the substrate, and a convex portion is provided on the main surface of the substrate located below the hole, whereby an arbitrary shape is obtained. And a light emitting part with a large area, and a highly efficient light emitting diode.
Can be provided.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例に係る発光ダイオ−ドの断面
図。
FIG. 1 is a sectional view of a light emitting diode according to an embodiment of the present invention.

【図2】図1の平面図。FIG. 2 is a plan view of FIG.

【図3】従来の発光ダイオ−ドの断面図。FIG. 3 is a cross-sectional view of a conventional light emitting diode.

【符号の説明】[Explanation of symbols]

11…p型GaAs基板、12…メサ部、13…第1ク
ラッド層、14…アンド−プGaAIAs活性層、15
…第2クラッド層、16…穴、17…n側電極、18…
p側電極、20…発光ダイオ−ド。
11 ... P-type GaAs substrate, 12 ... Mesa portion, 13 ... First clad layer, 14 ... And-GaaIAs active layer, 15
... second cladding layer, 16 ... hole, 17 ... n-side electrode, 18 ...
p-side electrode, 20 ... Light emitting diode.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基板上に活性層を有するエピタキシャル
層を成長させると共に表面に電極を形成した発光ダイオ
−ドにおいて、上記電極に少なくとも1つの穴を設け、
かつ前記穴の下方に位置する前記基板主面に凸部を設け
たことを特徴とする発光ダイオ−ド。
1. A light-emitting diode having an active layer formed on a substrate and having an electrode formed on the surface thereof, wherein at least one hole is formed in the electrode.
A light emitting diode characterized in that a convex portion is provided on the main surface of the substrate located below the hole.
【請求項2】 前記電極の穴が、前記電極の中心からず
れた位置にある請求項1記載の発光ダイオ−ド。
2. The light emitting diode according to claim 1, wherein the hole of the electrode is located off the center of the electrode.
【請求項3】 前記電極の穴が前記凸部よりも大きい請
求項1記載の発光ダイオ−ド。
3. The light emitting diode according to claim 1, wherein the hole of the electrode is larger than the convex portion.
JP24581891A 1991-09-25 1991-09-25 Light emitting diode Withdrawn JPH0590634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24581891A JPH0590634A (en) 1991-09-25 1991-09-25 Light emitting diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24581891A JPH0590634A (en) 1991-09-25 1991-09-25 Light emitting diode

Publications (1)

Publication Number Publication Date
JPH0590634A true JPH0590634A (en) 1993-04-09

Family

ID=17139311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24581891A Withdrawn JPH0590634A (en) 1991-09-25 1991-09-25 Light emitting diode

Country Status (1)

Country Link
JP (1) JPH0590634A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009200514A (en) * 2001-07-24 2009-09-03 Nichia Corp Semiconductor light-emitting device
US8299486B2 (en) 2001-07-24 2012-10-30 Nichia Corporation Semiconductor light emitting device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009200514A (en) * 2001-07-24 2009-09-03 Nichia Corp Semiconductor light-emitting device
US8299486B2 (en) 2001-07-24 2012-10-30 Nichia Corporation Semiconductor light emitting device
US8344402B2 (en) 2001-07-24 2013-01-01 Nichia Corporation Semiconductor light emitting device
US8344403B2 (en) 2001-07-24 2013-01-01 Nichia Corporation Semiconductor light emitting device
US8796721B2 (en) 2001-07-24 2014-08-05 Nichia Corporation Semiconductor light emitting device
US9368681B2 (en) 2001-07-24 2016-06-14 Nichia Corporation Semiconductor light emitting device
US9865773B2 (en) 2001-07-24 2018-01-09 Nichia Corporation Semiconductor light emitting device
US10396242B2 (en) 2001-07-24 2019-08-27 Nichia Corporation Semiconductor light emitting device
US10593833B2 (en) 2001-07-24 2020-03-17 Nichia Corporation Semiconductor light emitting device

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Effective date: 19981203