JPH0590720A - Composite printed wiring board - Google Patents
Composite printed wiring boardInfo
- Publication number
- JPH0590720A JPH0590720A JP24898691A JP24898691A JPH0590720A JP H0590720 A JPH0590720 A JP H0590720A JP 24898691 A JP24898691 A JP 24898691A JP 24898691 A JP24898691 A JP 24898691A JP H0590720 A JPH0590720 A JP H0590720A
- Authority
- JP
- Japan
- Prior art keywords
- wiring board
- printed wiring
- thermal expansion
- composite
- thermosetting resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002131 composite material Substances 0.000 title claims abstract description 39
- 239000000919 ceramic Substances 0.000 claims abstract description 36
- 229920005989 resin Polymers 0.000 claims abstract description 33
- 239000011347 resin Substances 0.000 claims abstract description 33
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 24
- 239000011810 insulating material Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims description 26
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 12
- 239000011889 copper foil Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 6
- 229920006231 aramid fiber Polymers 0.000 claims description 6
- 239000004065 semiconductor Substances 0.000 abstract description 9
- 239000011148 porous material Substances 0.000 abstract description 5
- 239000005373 porous glass Substances 0.000 abstract description 4
- 241001060350 Acalypha Species 0.000 abstract 1
- 230000002265 prevention Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 229910052878 cordierite Inorganic materials 0.000 description 6
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- 230000017525 heat dissipation Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000011800 void material Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 238000007750 plasma spraying Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000011074 autoclave method Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、セラミックスもしくは
ガラス質と熱硬化性樹脂を複合させた複合プリント配線
板に関し、特には銅箔の裏面に溶着した多孔性セラミッ
クスもしくは多孔性ガラス質の空孔間隙に熱硬化性樹脂
を含浸させた複合絶縁材料層を有するプリント配線板に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composite printed wiring board in which a ceramic or glassy material and a thermosetting resin are composited, and in particular, porous ceramics or porous glassy holes welded to the back surface of a copper foil. The present invention relates to a printed wiring board having a composite insulating material layer in which a gap is impregnated with a thermosetting resin.
【0002】[0002]
【従来の技術】従来、配線板材料はガラスエポキシ等の
有機材料とアルミナ等の無機材料とに大別される。無機
材料を使用したセラミックス配線板は高耐熱性や高放熱
性、低熱膨張性を生かして特徴のある分野を築いてい
る。しかし、セラミックス配線板は蒸着やスパッタリン
グによる薄膜技術によるにせよ、グリーンシートを使用
し、印刷した導体ペーストとコファイヤーによる厚膜技
術によるにせよ加工工程が複雑であり量産性に劣るもの
であった。2. Description of the Related Art Conventionally, wiring board materials are roughly classified into organic materials such as glass epoxy and inorganic materials such as alumina. Ceramic wiring boards using inorganic materials are building a unique field by taking advantage of their high heat resistance, high heat dissipation and low thermal expansion. However, the ceramic wiring board is inferior in mass productivity due to the complicated processing steps, regardless of whether the thin-film technology by vapor deposition or sputtering is used or the green sheet is used and the thick-film technology by the printed conductor paste and co-fire is used. ..
【0003】一方、有機材料を使用したプリント配線板
は量産性に富み、さらにパターンの微細加工や多層化が
容易なため民生機器用のほか産業機器用にも広く使用さ
れている。しかし、電子機器の高密度実装化が進み高速
化が要求される昨今においては、プリント配線板の高放
熱性が要求されるに到った。また、半導体集積回路(I
C)の小型薄型化によりTSOP(Thin Smal
l OutlinePackage)が多く使用され、
プリント配線板の低熱膨張化が要求されたのである。On the other hand, a printed wiring board using an organic material is highly producible in mass production, and since it is easy to perform fine pattern processing and multi-layering, it is widely used not only for consumer equipment but also for industrial equipment. However, in recent years when high-density mounting of electronic devices has progressed and high speed is required, high heat dissipation of printed wiring boards has been required. In addition, a semiconductor integrated circuit (I
C) is smaller and thinner than TSOP (Thin Small)
lOutlinePackage) is often used,
The low thermal expansion of the printed wiring board was required.
【0004】即ち、小型薄型化により半導体集積回路パ
ッケージの熱膨張係数が従来よりシリコン寄りに小さ
く、およそ7×10-6/℃となったため、それを搭載す
るプリント配線板の熱膨張を、従来のおよそ1.2〜
1.6×10-5/℃から小さくし近似させないと、実装
時に熱膨張差によって半田接続部が破損したり、半導体
集積回路パッケージに亀裂が入ったりする不良が発生し
たのである。That is, the thermal expansion coefficient of the semiconductor integrated circuit package is smaller than that of the conventional silicon due to the miniaturization and thinning, and is about 7 × 10 −6 / ° C. Therefore , the thermal expansion of the printed wiring board on which it is mounted is About 1.2 ~
Unless it is made smaller than 1.6 × 10 −5 / ° C. and approximated, defects such as breakage of the solder connection portion and cracking of the semiconductor integrated circuit package occurred due to thermal expansion difference during mounting.
【0005】このプリント配線板の低熱膨張化の要求に
対応するために、セラミックスと熱硬化性樹脂による複
合材料が注目されている。例えば、銅箔の裏面に熱膨張
係数が略7×10-6/℃のアルミナ(Al2O3)組成あ
るいは熱膨張係数が略2.5×10-6/℃のコージェラ
イト(2MgO・2Al2O3・5SiO2)組成の多孔
性セラミックスもしくは多孔性ガラス質をプラズマ溶
射、CVD、スパッタ等により形成し、それを多層プリ
ント配線板の外層材としてプリプレグとともに内層基板
と積層することにより、プリプレグからの樹脂を空孔間
隙に含浸させ一体化を行った低熱膨張複合材料の試みが
なされている。In order to meet the demand for low thermal expansion of this printed wiring board, attention has been paid to a composite material of ceramics and a thermosetting resin. For example, on the back surface of a copper foil, an alumina (Al 2 O 3 ) composition having a thermal expansion coefficient of approximately 7 × 10 −6 / ° C. or a cordierite (2MgO · 2Al) having a thermal expansion coefficient of approximately 2.5 × 10 −6 / ° C. By forming porous ceramics or porous glass having a composition of 2 O 3 · 5SiO 2 ) by plasma spraying, CVD, sputtering, etc., and laminating it as an outer layer material of a multilayer printed wiring board with a prepreg and an inner layer substrate, Attempts have been made for a low thermal expansion composite material in which the resin from No. 1 is impregnated into the voids to integrate them.
【0006】しかし、この方法によれば、銅箔の裏面の
多孔性セラミックス等は厚く形成することができなかっ
た。従って、厚い樹脂基板と積層した場合には、積層後
の全体の熱膨張係数を小さくすることはできなかった。
即ち、プラズマ溶射、CVD,スパッタ等では0.2m
m以上の厚みとすることは困難であり、また銅箔の裏面
に溶着した状態で取り扱うためにも厚くできないのであ
り、これを0.6mm厚さのガラスエポキシ基板の両面
に0.2mm厚さのプリプレグを介して積層して、全体
の厚さ1.2mmとした場合の熱膨張係数は1.3×1
0-5/℃と目的の7×10-6/℃に比べ随分大きく使用
できないものとなったのである。However, according to this method, the porous ceramics or the like on the back surface of the copper foil could not be formed thick. Therefore, when laminated with a thick resin substrate, the thermal expansion coefficient of the entire laminated body could not be reduced.
That is, 0.2m for plasma spraying, CVD, sputtering, etc.
It is difficult to make the thickness more than m, and it cannot be made thicker to handle it while it is welded to the back surface of the copper foil. It is 0.2 mm thick on both sides of the glass epoxy board of 0.6 mm thickness. The coefficient of thermal expansion is 1.3 x 1 when the total thickness is 1.2 mm by laminating through the prepreg of
Compared with the target value of 7 × 10 -6 / ° C, which is 0 -5 / ° C, it cannot be used much larger.
【0007】[0007]
【発明が解決しようとする課題】本発明は、以上の経緯
に鑑みてなされたものでありその解決しようとする課題
は、銅箔の裏面に溶着した多孔性セラミックスもしくは
多孔性ガラス質の空孔間隙に熱硬化性樹脂を含浸させた
複合絶縁材料層を使用しながら、且つ基板全体の熱膨張
係数を小さくすることにある。そして、本発明の目的は
半導体集積回路TSOPやベアチップICの熱膨張係数
に基板全体の熱膨張係数を近似させることにより、電子
部品との接続信頼性を向上させ且つ電子部品の破損を防
止することのできる複合プリント配線板を提供すること
にある。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and the problem to be solved is to provide porous ceramics or porous glassy pores welded to the back surface of a copper foil. It is to reduce the coefficient of thermal expansion of the entire substrate while using a composite insulating material layer in which a gap is impregnated with a thermosetting resin. The object of the present invention is to improve the connection reliability with electronic components and prevent damage to electronic components by approximating the thermal expansion coefficient of the entire substrate to the thermal expansion coefficient of the semiconductor integrated circuit TSOP or bare chip IC. It is to provide a composite printed wiring board that can be manufactured.
【0008】[0008]
【課題を解決するための手段】以上の課題を解決するた
めに、本発明の採った手段は、実施例において使用する
符号を付して説明すると、「銅箔(12)の裏面に溶着
した多孔性セラミックスもしくは多孔性ガラス質の空孔
間隙に熱硬化性樹脂を含浸させた複合絶縁材料層(1
3)を有するプリント配線板において、多孔性セラミッ
クスの空孔間隙に熱硬化性樹脂を含浸させたベース基板
(11)と複合絶縁材料層(13)とをプリプレグ(1
4)により積層させたことを特徴とする複合プリント配
線板(10)」である。もしくは、「前記プリント配線
板において、セラミックス緻密体、42ニッケル鉄合金
もしくはアラミド繊維強化熱硬化性樹脂のいづれか1つ
もしくは組み合わせたベース基板(11)と複合絶縁材
料層(13)とをプリプレグ(14)により積層させた
ことを特徴とする複合プリント配線板(10)」であ
る。Means for Solving the Problems In order to solve the above problems, the means adopted by the present invention will be described with reference to the reference numerals used in the examples. Composite insulating material layer (1) in which voids of porous ceramics or porous glass are impregnated with thermosetting resin
In a printed wiring board having 3), a base substrate (11) in which voids of porous ceramics are impregnated with a thermosetting resin and a composite insulating material layer (13) are prepreg (1).
4) is a laminated printed wiring board (10) ". Alternatively, "in the printed wiring board, a prepreg (14) including a base substrate (11) and a composite insulating material layer (13) in which one or a combination of a ceramics dense body, 42 nickel iron alloy or aramid fiber reinforced thermosetting resin is combined. ), The composite printed wiring board (10) ”characterized by being laminated by.
【0009】[0009]
【作用】銅箔(12)の裏面に溶着した多孔性セラミッ
クスもしくは多孔性ガラス質の空孔間隙に熱硬化性樹脂
を含浸させた複合絶縁材料層(13)は熱膨張が5〜1
0×10-6/℃と小さく、また熱放散性に優れたもので
ある。そしてこれと多孔性セラミックスの空孔に熱硬化
性樹脂を含浸させた熱膨張係数が2.5〜8×10-6/
℃のベース基板(11)もしくは熱膨張係数が2.5〜
7×10-6/℃のセラミックス緻密体、熱膨張係数が略
6×10-6/℃の42ニッケル鉄合金もしくは熱膨張係
数が7〜10×10-6/℃のアラミド繊維強化熱硬化性
樹脂のいづれか1つもしくは組み合わせたベース基板
(11)とをプリプレグにより積層させたので、全体の
熱膨張係数が1×10-5/℃以下と小さなものになって
いる。ここで、複合プリント配線板(10)全体の熱膨
張係数はセラミックスもしくはガラス質であればその組
成、多孔性セラミックスもしくはガラス質であれば空孔
間隙率、全体の基板厚みに占める複合絶縁材料層(1
3)及びベース基板(11)の厚みにより決定される。Function: The composite insulating material layer (13) in which the thermosetting resin is impregnated in the voids of porous ceramics or porous glass adhered to the back surface of the copper foil (12) has a thermal expansion of 5 to 1
It is as small as 0 × 10 -6 / ° C and has excellent heat dissipation. The coefficient of thermal expansion of this and the pores of the porous ceramics impregnated with a thermosetting resin is 2.5 to 8 × 10 −6 /
℃ base substrate (11) or coefficient of thermal expansion 2.5 ~
Dense ceramic body of 7 × 10 -6 / ° C, 42 nickel iron alloy with thermal expansion coefficient of approximately 6 × 10 -6 / ° C or aramid fiber reinforced thermosetting with thermal expansion coefficient of 7-10 × 10 -6 / ° C Since any one of the resins or the base substrate (11) in which the resins are combined is laminated by the prepreg, the thermal expansion coefficient of the whole is as small as 1 × 10 −5 / ° C. or less. Here, the coefficient of thermal expansion of the entire composite printed wiring board (10) is its composition if it is a ceramic or glass material, the void porosity if it is a porous ceramic material or a glass material, and the composite insulating material layer occupying the entire substrate thickness. (1
3) and the thickness of the base substrate (11).
【0010】[0010]
【実施例】次に、本発明を実施例に従って詳細に説明す
る。図1には、本発明に関わる複合プリント配線板の1
実施例の断面図が示してある。この実施例の場合のベー
ス基板(11)は多孔性セラミックスの空孔に熱硬化性
樹脂を含浸したものである。その製造方法は、まずコー
ジェライトまたはアルミナ組成のセラミックス原料をバ
インダーとともに混練し、ドクターブレイドによるシー
ト成形法かプレス成形法で板状に成形する。次にそれを
焼成して多孔性セラミックスとするのであるが、それは
焼成温度及び時間を調整することにより空孔率が決定さ
れる。即ち、セラミックス粒間の溶融を完全に行わせ
ず、接点のみの溶融に抑えることによって多孔性とす
る。本実施例では空孔率を略30%とした。30%は、
後の熱硬化性樹脂の含浸性と目的とする熱膨張率により
決定した。そして多孔性セラミックスに対して真空下で
熱硬化性樹脂であるエポキシ樹脂を含浸し、120〜1
70℃で60〜360分加熱し熱硬化性樹脂を硬化させ
ベース基板(11)を得た。なお、コージェライト組成
の場合のベース基板(11)の熱膨張係数は略3.5×
10-6/℃であった。上記実施例では他に、熱硬化性樹
脂として、ポリイミド樹脂、トリアジン樹脂等の一般に
プリント配線板材料に使用される熱硬化性樹脂が使用で
きた。EXAMPLES Next, the present invention will be described in detail according to examples. FIG. 1 shows a composite printed wiring board 1 according to the present invention.
A cross-sectional view of the embodiment is shown. In the case of this embodiment, the base substrate (11) is obtained by impregnating pores of porous ceramics with a thermosetting resin. The manufacturing method is as follows. First, a ceramic raw material having a cordierite or alumina composition is kneaded together with a binder, and then formed into a plate by a sheet forming method using a doctor blade or a press forming method. Next, it is fired to obtain a porous ceramic, and the porosity of the porous ceramic is determined by adjusting the firing temperature and time. That is, the porosity is obtained by not completely melting the ceramic particles but by suppressing the melting of only the contact. In this example, the porosity was set to about 30%. 30% is
It was determined by the subsequent impregnation of the thermosetting resin and the desired coefficient of thermal expansion. Then, the porous ceramics is impregnated with epoxy resin which is a thermosetting resin under vacuum, and 120 to 1
The base substrate (11) was obtained by heating at 70 ° C. for 60 to 360 minutes to cure the thermosetting resin. The coefficient of thermal expansion of the base substrate (11) in the case of the cordierite composition is about 3.5 ×
It was 10 -6 / ° C. In addition to the above examples, as the thermosetting resin, thermosetting resins generally used for printed wiring board materials such as polyimide resin and triazine resin could be used.
【0011】そして、このコージェライト組成の多孔性
セラミックスを使ったベース基板(11)の両面に公知
のパターン形成法を使って銅の導体回路を形成し内層基
板としそれと、ガラス織布強化エポキシ樹脂プリプレグ
(14)を介して、銅箔の裏面に多孔性セラミックスも
しくは多孔性ガラス質を溶着したものと積層プレスを行
い、適宜スルーホール穴明、メッキ、エッチング等を施
して、複合絶縁材料層(13)及びベース基板(11)
を有する複合プリント配線板(10)を得た。Then, a copper conductor circuit is formed on both sides of the base substrate (11) using the porous ceramics of the cordierite composition by a known pattern forming method to form an inner layer substrate and a glass woven cloth reinforced epoxy resin. Through the prepreg (14), the back surface of the copper foil is welded with porous ceramics or porous vitreous material, and laminated pressing is performed, and through-hole drilling, plating, etching, etc. are appropriately performed, and the composite insulating material layer ( 13) and base substrate (11)
A composite printed wiring board (10) having
【0012】ここでプリプレグ(14)はプリント配線
板に使用されるプリプレグが使用できるが、含浸した樹
脂が積層時に、銅箔の裏面に溶着した多孔性セラミック
スもしくは多孔性ガラス質の空孔間隙を埋めるように含
浸性の良い樹脂を選択する必要がある。ガラス織布は不
織布であってもよく、ガラスに替えてアラミド繊維でも
よく繊維の材質は限定されない。また、積層プレスは真
空下の低圧プレスが望ましく、オートクレーブ法がよ
い。その理由は、銅箔の裏面に溶着したセラミックス等
やベース基板(11)のセラミックスに余分な圧力を加
えて破損させないためである。As the prepreg (14), a prepreg used for a printed wiring board can be used. However, when the impregnated resin is laminated, the prepreg (14) forms a porous ceramic or porous glassy void gap welded to the back surface of the copper foil. It is necessary to select a resin having a good impregnating property so as to fill it. The glass woven fabric may be a non-woven fabric, and aramid fiber may be used instead of glass, and the material of the fiber is not limited. The lamination press is preferably a low pressure press under vacuum, and an autoclave method is preferable. The reason is that extra pressure is not applied to the ceramics or the like welded to the back surface of the copper foil or the ceramics of the base substrate (11) to damage them.
【0013】こうして得た複合プリント配線板(10)
の熱膨張係数は複合絶縁材料層(13)に使用した多孔
性セラミックス等の組成の種類(A)、その厚さ
(B)、ベース基板(11)に使用した多孔性セラミッ
クスの組成の種類(C)、その空孔率(D)、その厚さ
(D)及び介在する0.1mmプリプレグの枚数(E)
によって決定される。その数例を表1に示す。Composite printed wiring board (10) thus obtained
The coefficient of thermal expansion of is the composition type (A) of the porous ceramics used in the composite insulating material layer (13), its thickness (B), the composition type of the porous ceramics used in the base substrate (11) ( C), its porosity (D), its thickness (D) and the number of intervening 0.1 mm prepregs (E)
Determined by Some examples are shown in Table 1.
【0014】 表1 I II III ───────────────────────────────── (A) コージェライト アルミナ アルミナ (B) 0.1mm 0.1mm 0.1mm (C) コージェライト コージェライト コージェライト (D) 0.6mm 1.0mm 0.6mm (E) 表裏とも2枚 表裏とも2枚 表裏とも2枚 総厚さ 1.2mm 1.6mm 1.2mm ───────────────────────────────── 熱膨張係数4×10-6/℃ 7×10-6/℃ 8×10-6/℃Table 1 I II III ───────────────────────────────── (A) Cordierite Alumina Alumina (B ) 0.1mm 0.1mm 0.1mm (C) Cordierite Cordierite Cordierite (D) 0.6mm 1.0mm 0.6mm (E) Both front and back 2 sheets Front and back 2 sheets Total thickness 1 .2mm 1.6mm 1.2mm ───────────────────────────────── Coefficient of thermal expansion 4 × 10 -6 / ℃ 7 × 10 -6 / ℃ 8 × 10 -6 / ℃
【0015】なお、表1のIの複合プリント配線板(1
0)は熱膨張係数が半導体ベアチップのそれに非常に近
く、10mm角以上の大型チップ向けや、フリップチッ
プ実装に好適である。またII、IIIは熱膨張係数が
TSOPのそれに近く、TSOPの実装に好適な他、表
面がアルミナであるため放熱性に優れた特徴がある。ま
た、複合絶縁材料層(13)及びベース基板(11)は
ともに多孔質であり空孔間隙に熱硬化性樹脂が含浸され
ているのでドリルによる穴明が容易であるが、ドリルの
磨耗が早いのでダイアモンドドリルを使用するとよい。
また、以上は4層基板について述べたが、4層に限定さ
れず1層以上の導体層があればよい。絶縁層の構成は、
反り等を考慮すると、ベース基板(11)の両側にプリ
プレグ(14)層を同じ厚さで有し、複合絶縁材料層
(13)もその両側に設けることが望ましい。また、上
記ベース基板(11)として、コージェライト、アルミ
ナ、ムライト等のセラミックス緻密体、42ニッケル鉄
合金を使用することによっても、低熱膨張の複合プリン
ト配線板(10)を得ることができる。セラミックス緻
密体の場合でスルーホールを必要とするなら、グリーン
シートの状態でスルーホールに相当する箇所に予めスル
ーホールよりも大きな穴を形成しておいて焼成し、最終
的に積層を完了後樹脂で含浸されたその穴にスルーホー
ルを位置合わせすればよい。ただし、緻密体は焼成時に
焼き縮みが大きいので注意を要す。また、42ニッケル
鉄合金を使用する場合は、積層前に予め必要に応じたパ
ターン形状に形成しておく必要がある。また、さらにベ
ース基板(11)は熱膨張係数が小さく複合絶縁材料層
(13)との積層後の熱膨張係数を大きく損なうことが
ないアラミド繊維強化熱硬化性樹脂とすることもでき
る。セラミックス緻密体あるいはニッケル鉄合金もしく
はアラミド繊維強化熱硬化性樹脂の種類(F)、その厚
さ(G)と複合プリント配線板(10)の熱膨張係数の
数例を表2に示す。Incidentally, the composite printed wiring board (1) of I in Table 1 is
0) has a coefficient of thermal expansion very close to that of a semiconductor bare chip, and is suitable for large chips of 10 mm square or more and flip chip mounting. Further, II and III have a coefficient of thermal expansion close to that of TSOP, and are suitable for mounting TSOP, and have a characteristic of excellent heat dissipation because the surface is alumina. Further, since the composite insulating material layer (13) and the base substrate (11) are both porous and the void gap is impregnated with a thermosetting resin, drilling is easy, but wear of the drill is fast. So it is better to use a diamond drill.
Further, although the four-layer substrate has been described above, the number of conductor layers is not limited to four and may be one or more conductor layers. The structure of the insulating layer is
Considering warpage and the like, it is desirable to have prepreg (14) layers with the same thickness on both sides of the base substrate (11) and also provide the composite insulating material layer (13) on both sides thereof. Also, by using a dense ceramic body such as cordierite, alumina, or mullite, or 42 nickel iron alloy as the base substrate (11), the composite printed wiring board (10) with low thermal expansion can be obtained. If a through-hole is required in the case of a dense ceramics body, a hole larger than the through-hole is previously formed in a portion corresponding to the through-hole in the state of the green sheet, and then fired, and finally after the lamination is completed, the resin is formed. The through hole may be aligned with the hole impregnated with. However, it should be noted that the dense body has a large shrinkage during firing. Further, when using a 42-nickel-iron alloy, it is necessary to form it into a pattern shape in advance as needed before stacking. Further, the base substrate (11) may be made of an aramid fiber reinforced thermosetting resin which has a small coefficient of thermal expansion and does not largely impair the coefficient of thermal expansion after being laminated with the composite insulating material layer (13). Table 2 shows some examples of the type (F) of the ceramic dense body, the nickel iron alloy or the aramid fiber reinforced thermosetting resin, its thickness (G) and the thermal expansion coefficient of the composite printed wiring board (10).
【0016】 表2 IV V VI ───────────────────────────────── (A) コージェライト コージェライト コージェライト (B) 0.1mm 0.1mm 0.1mm (F) ムライト 42ニッケル鉄 アラミド強化樹脂 (G) 0.6mm 0.25mm 0.5mm (E) 表裏とも2枚 表裏とも2枚 アラミド強化樹脂 総厚さ 1.2mm 0.85mm 1.2mm ───────────────────────────────── 熱膨張係数5×10-6/℃ 7×10-6/℃ 8×10-6/℃ こうして得た複合プリント配線板は、多数の半導体TS
OPやベアチップICを搭載したメモリーモジュール等
のマルチチップモジュールや高発熱のパワーデバイス等
の電子部品や半導体集積回路パッケージを搭載したマザ
ーボート等の用途に好適である。Table 2 IV V VI ───────────────────────────────── (A) Cordierite Cordierite Cordierite (B) 0.1 mm 0.1 mm 0.1 mm (F) Mullite 42 Nickel Iron Aramid Reinforced Resin (G) 0.6 mm 0.25 mm 0.5 mm (E) Both Front and Back 2 Sheets Aramid Reinforced Resin Total Thickness is 1.2mm 0.85mm 1.2mm ───────────────────────────────── thermal expansion coefficient of 5 × 10 - 6 / ° C. 7 × 10 −6 / ° C. 8 × 10 −6 / ° C. The composite printed wiring board thus obtained is composed of a large number of semiconductor TS.
It is suitable for applications such as multi-chip modules such as memory modules equipped with OPs and bare chip ICs, electronic components such as high heat generation power devices, and mother boats equipped with semiconductor integrated circuit packages.
【0017】[0017]
【発明の効果】以上詳述した如く、本発明の複合プリン
ト配線板にあっては半導体集積回路TSOPやベアチッ
プに熱膨張係数を近似させることができ、電子部品の接
続信頼性を向上させ電子部品の破損を防止できる。ま
た、構成材料の種類、厚さ等を種々変化させることがで
き、いろんな電子部品との熱膨張の整合を行ったり、放
熱性を改善したりすることも可能である。As described in detail above, in the composite printed wiring board of the present invention, the coefficient of thermal expansion can be approximated to that of the semiconductor integrated circuit TSOP and the bare chip, and the connection reliability of the electronic component can be improved and the electronic component can be improved. Can be prevented from being damaged. Further, the type and thickness of the constituent materials can be variously changed, and it is possible to match the thermal expansion with various electronic components and to improve the heat dissipation.
【図1】本発明に係わる複合プリント配線板の1実施例
を示す平面図である。FIG. 1 is a plan view showing one embodiment of a composite printed wiring board according to the present invention.
【図2】本発明に係わる複合プリント配線板の別の実施
例を示す断面図である。FIG. 2 is a cross-sectional view showing another embodiment of the composite printed wiring board according to the present invention.
10 複合プリント配線板 11 ベース基板 12 導体回路 13 複合絶縁材料層 14 プリプレグ 10 composite printed wiring board 11 base substrate 12 conductor circuit 13 composite insulating material layer 14 prepreg
Claims (2)
スもしくは多孔性ガラス質の空孔間隙に熱硬化性樹脂を
含浸させた複合絶縁材料層を有するプリント配線板にお
いて、多孔性セラミックスの空孔間隙に熱硬化性樹脂を
含浸させたベース基板と前記複合絶縁材料層とをプリプ
レグにより積層させたことを特徴とする複合プリント配
線板。1. A printed wiring board having a composite insulating material layer in which a thermosetting resin is impregnated in the voids of porous ceramics or porous glassy material welded to the back surface of a copper foil, wherein the voids of porous ceramics are provided. A composite printed wiring board, characterized in that a base substrate having a gap impregnated with a thermosetting resin and the composite insulating material layer are laminated by a prepreg.
て、セラミックス緻密体、42ニッケル鉄合金もしくは
アラミド繊維強化熱硬化性樹脂のいづれか1つもしくは
組み合わせたベース基板と前記複合絶縁材料層とをプリ
プレグにより積層させたことを特徴とする複合プリント
配線板。2. The printed wiring board according to claim 1, wherein a base substrate, in which one or a combination of a ceramics dense body, 42 nickel iron alloy or aramid fiber reinforced thermosetting resin is combined, and the composite insulating material layer are formed by prepreg. A composite printed wiring board characterized by being laminated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24898691A JPH0590720A (en) | 1991-09-27 | 1991-09-27 | Composite printed wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24898691A JPH0590720A (en) | 1991-09-27 | 1991-09-27 | Composite printed wiring board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0590720A true JPH0590720A (en) | 1993-04-09 |
Family
ID=17186329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24898691A Pending JPH0590720A (en) | 1991-09-27 | 1991-09-27 | Composite printed wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0590720A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19961842A1 (en) * | 1999-12-21 | 2001-07-12 | Fraunhofer Ges Forschung | Multilayer circuit board |
| WO2013097126A1 (en) * | 2011-12-29 | 2013-07-04 | 广东生益科技股份有限公司 | Circuit substrate and manufacturing method thereof |
| KR20230068629A (en) * | 2021-11-11 | 2023-05-18 | 주식회사 비티솔루션 | Multi Printed Circuit Board |
-
1991
- 1991-09-27 JP JP24898691A patent/JPH0590720A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19961842A1 (en) * | 1999-12-21 | 2001-07-12 | Fraunhofer Ges Forschung | Multilayer circuit board |
| WO2013097126A1 (en) * | 2011-12-29 | 2013-07-04 | 广东生益科技股份有限公司 | Circuit substrate and manufacturing method thereof |
| KR20230068629A (en) * | 2021-11-11 | 2023-05-18 | 주식회사 비티솔루션 | Multi Printed Circuit Board |
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