JPH059226A - Polypropylene resin and its composition - Google Patents
Polypropylene resin and its compositionInfo
- Publication number
- JPH059226A JPH059226A JP3183634A JP18363491A JPH059226A JP H059226 A JPH059226 A JP H059226A JP 3183634 A JP3183634 A JP 3183634A JP 18363491 A JP18363491 A JP 18363491A JP H059226 A JPH059226 A JP H059226A
- Authority
- JP
- Japan
- Prior art keywords
- halogen
- chloride
- polymerization
- polypropylene resin
- ethyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 Polypropylene Polymers 0.000 title claims abstract description 41
- 239000004743 Polypropylene Substances 0.000 title claims abstract description 30
- 229920001155 polypropylene Polymers 0.000 title claims abstract description 30
- 229920005989 resin Polymers 0.000 title claims abstract description 23
- 239000011347 resin Substances 0.000 title claims abstract description 23
- 239000000203 mixture Substances 0.000 title description 11
- 239000000155 melt Substances 0.000 claims abstract description 15
- 229920001384 propylene homopolymer Polymers 0.000 claims abstract description 10
- 238000005194 fractionation Methods 0.000 claims abstract description 9
- 238000006116 polymerization reaction Methods 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 20
- 238000010828 elution Methods 0.000 claims description 16
- 230000000630 rising effect Effects 0.000 claims description 7
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 claims description 4
- 239000011342 resin composition Substances 0.000 claims description 4
- 229920005673 polypropylene based resin Polymers 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 4
- 239000002985 plastic film Substances 0.000 abstract 2
- 230000009194 climbing Effects 0.000 abstract 1
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 42
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 36
- 150000001875 compounds Chemical class 0.000 description 33
- 229910052736 halogen Inorganic materials 0.000 description 33
- 150000002367 halogens Chemical class 0.000 description 33
- 239000012265 solid product Substances 0.000 description 28
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 25
- 239000011777 magnesium Substances 0.000 description 18
- 229910052749 magnesium Inorganic materials 0.000 description 18
- 239000002245 particle Substances 0.000 description 18
- 239000011949 solid catalyst Substances 0.000 description 18
- 125000004429 atom Chemical group 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 15
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 13
- 239000002253 acid Substances 0.000 description 12
- 150000003609 titanium compounds Chemical class 0.000 description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 238000009826 distribution Methods 0.000 description 9
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 229910052740 iodine Inorganic materials 0.000 description 8
- 239000011630 iodine Substances 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 229910052801 chlorine Inorganic materials 0.000 description 7
- YNLAOSYQHBDIKW-UHFFFAOYSA-M diethylaluminium chloride Chemical compound CC[Al](Cl)CC YNLAOSYQHBDIKW-UHFFFAOYSA-M 0.000 description 7
- 125000005843 halogen group Chemical group 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 7
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- 229910001873 dinitrogen Inorganic materials 0.000 description 6
- 150000004820 halides Chemical class 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000002685 polymerization catalyst Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 4
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- PBKONEOXTCPAFI-UHFFFAOYSA-N 1,2,4-trichlorobenzene Chemical compound ClC1=CC=C(Cl)C(Cl)=C1 PBKONEOXTCPAFI-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 125000002252 acyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- FYXKZNLBZKRYSS-UHFFFAOYSA-N benzene-1,2-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC=C1C(Cl)=O FYXKZNLBZKRYSS-UHFFFAOYSA-N 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 description 2
- WNZQDUSMALZDQF-UHFFFAOYSA-N 2-benzofuran-1(3H)-one Chemical compound C1=CC=C2C(=O)OCC2=C1 WNZQDUSMALZDQF-UHFFFAOYSA-N 0.000 description 2
- DGMOBVGABMBZSB-UHFFFAOYSA-N 2-methylpropanoyl chloride Chemical compound CC(C)C(Cl)=O DGMOBVGABMBZSB-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- 239000004135 Bone phosphate Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- AQZGPSLYZOOYQP-UHFFFAOYSA-N Diisoamyl ether Chemical compound CC(C)CCOCCC(C)C AQZGPSLYZOOYQP-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- 229920002943 EPDM rubber Polymers 0.000 description 2
- FHUODBDRWMIBQP-UHFFFAOYSA-N Ethyl p-anisate Chemical compound CCOC(=O)C1=CC=C(OC)C=C1 FHUODBDRWMIBQP-UHFFFAOYSA-N 0.000 description 2
- YZBOVSFWWNVKRJ-UHFFFAOYSA-N Monobutylphthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(O)=O YZBOVSFWWNVKRJ-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- SESFRYSPDFLNCH-UHFFFAOYSA-N benzyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OCC1=CC=CC=C1 SESFRYSPDFLNCH-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- XSIFPSYPOVKYCO-UHFFFAOYSA-N butyl benzoate Chemical compound CCCCOC(=O)C1=CC=CC=C1 XSIFPSYPOVKYCO-UHFFFAOYSA-N 0.000 description 2
- 239000012295 chemical reaction liquid Substances 0.000 description 2
- SJJCABYOVIHNPZ-UHFFFAOYSA-N cyclohexyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C1CCCCC1 SJJCABYOVIHNPZ-UHFFFAOYSA-N 0.000 description 2
- 229960002380 dibutyl phthalate Drugs 0.000 description 2
- 150000005690 diesters Chemical class 0.000 description 2
- MGWAVDBGNNKXQV-UHFFFAOYSA-N diisobutyl phthalate Chemical compound CC(C)COC(=O)C1=CC=CC=C1C(=O)OCC(C)C MGWAVDBGNNKXQV-UHFFFAOYSA-N 0.000 description 2
- WOZVHXUHUFLZGK-UHFFFAOYSA-N dimethyl terephthalate Chemical compound COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 2
- IPKKHRVROFYTEK-UHFFFAOYSA-N dipentyl phthalate Chemical compound CCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCC IPKKHRVROFYTEK-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- GXJPKIGCMGAHTL-UHFFFAOYSA-N dipropyl benzene-1,4-dicarboxylate Chemical compound CCCOC(=O)C1=CC=C(C(=O)OCCC)C=C1 GXJPKIGCMGAHTL-UHFFFAOYSA-N 0.000 description 2
- MQHNKCZKNAJROC-UHFFFAOYSA-N dipropyl phthalate Chemical compound CCCOC(=O)C1=CC=CC=C1C(=O)OCCC MQHNKCZKNAJROC-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- NUJGJRNETVAIRJ-UHFFFAOYSA-N octanal Chemical compound CCCCCCCC=O NUJGJRNETVAIRJ-UHFFFAOYSA-N 0.000 description 2
- YLYBTZIQSIBWLI-UHFFFAOYSA-N octyl acetate Chemical compound CCCCCCCCOC(C)=O YLYBTZIQSIBWLI-UHFFFAOYSA-N 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 239000012488 sample solution Substances 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 2
- 235000016804 zinc Nutrition 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- BJMLLSSSTGHJJE-UHFFFAOYSA-N (4-methylbenzoyl) 4-methylbenzoate Chemical compound C1=CC(C)=CC=C1C(=O)OC(=O)C1=CC=C(C)C=C1 BJMLLSSSTGHJJE-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- POXXQVSKWJPZNO-UHFFFAOYSA-N 1-o-ethyl 2-o-(2-methylpropyl) benzene-1,2-dicarboxylate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC(C)C POXXQVSKWJPZNO-UHFFFAOYSA-N 0.000 description 1
- YNOQMANFEGIPDL-UHFFFAOYSA-N 1-o-ethyl 2-o-propyl benzene-1,2-dicarboxylate Chemical compound CCCOC(=O)C1=CC=CC=C1C(=O)OCC YNOQMANFEGIPDL-UHFFFAOYSA-N 0.000 description 1
- AOPDRZXCEAKHHW-UHFFFAOYSA-N 1-pentoxypentane Chemical compound CCCCCOCCCCC AOPDRZXCEAKHHW-UHFFFAOYSA-N 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- BTUUJXBKBIRHPP-UHFFFAOYSA-N 2-(3-methylbutoxycarbonyl)benzoic acid Chemical compound CC(C)CCOC(=O)C1=CC=CC=C1C(O)=O BTUUJXBKBIRHPP-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- WFSGQBNCVASPMW-UHFFFAOYSA-N 2-ethylhexanoyl chloride Chemical compound CCCCC(CC)C(Cl)=O WFSGQBNCVASPMW-UHFFFAOYSA-N 0.000 description 1
- NWPNXBQSRGKSJB-UHFFFAOYSA-N 2-methylbenzonitrile Chemical compound CC1=CC=CC=C1C#N NWPNXBQSRGKSJB-UHFFFAOYSA-N 0.000 description 1
- GPZXFICWCMCQPF-UHFFFAOYSA-N 2-methylbenzoyl chloride Chemical compound CC1=CC=CC=C1C(Cl)=O GPZXFICWCMCQPF-UHFFFAOYSA-N 0.000 description 1
- WKEBLSOTVYFYKY-UHFFFAOYSA-N 2-methylhexanoyl chloride Chemical compound CCCCC(C)C(Cl)=O WKEBLSOTVYFYKY-UHFFFAOYSA-N 0.000 description 1
- JEABIFHLYSDNRJ-UHFFFAOYSA-N 2-o-butyl 1-o-ethyl benzene-1,2-dicarboxylate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC JEABIFHLYSDNRJ-UHFFFAOYSA-N 0.000 description 1
- NFOQRIXSEYVCJP-UHFFFAOYSA-N 2-propoxycarbonylbenzoic acid Chemical compound CCCOC(=O)C1=CC=CC=C1C(O)=O NFOQRIXSEYVCJP-UHFFFAOYSA-N 0.000 description 1
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- ISULZYQDGYXDFW-UHFFFAOYSA-N 3-methylbutanoyl chloride Chemical compound CC(C)CC(Cl)=O ISULZYQDGYXDFW-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- QLUQHFODHZKSDT-UHFFFAOYSA-N 4-butoxycarbonylbenzoic acid Chemical compound CCCCOC(=O)C1=CC=C(C(O)=O)C=C1 QLUQHFODHZKSDT-UHFFFAOYSA-N 0.000 description 1
- ADFVYWCDAKWKPH-UHFFFAOYSA-N 4-ethoxycarbonylbenzoic acid Chemical compound CCOC(=O)C1=CC=C(C(O)=O)C=C1 ADFVYWCDAKWKPH-UHFFFAOYSA-N 0.000 description 1
- REIDAMBAPLIATC-UHFFFAOYSA-M 4-methoxycarbonylbenzoate Chemical compound COC(=O)C1=CC=C(C([O-])=O)C=C1 REIDAMBAPLIATC-UHFFFAOYSA-M 0.000 description 1
- XHLATTBMSGXSFT-UHFFFAOYSA-N 4-propoxycarbonylbenzoic acid Chemical compound CCCOC(=O)C1=CC=C(C(O)=O)C=C1 XHLATTBMSGXSFT-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- QQTGJVBUIOTPGZ-UHFFFAOYSA-N CCC[Zn]CCC Chemical compound CCC[Zn]CCC QQTGJVBUIOTPGZ-UHFFFAOYSA-N 0.000 description 1
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 1
- LQLQDKBJAIILIQ-UHFFFAOYSA-N Dibutyl terephthalate Chemical compound CCCCOC(=O)C1=CC=C(C(=O)OCCCC)C=C1 LQLQDKBJAIILIQ-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- ZFDIRQKJPRINOQ-HWKANZROSA-N Ethyl crotonate Chemical compound CCOC(=O)\C=C\C ZFDIRQKJPRINOQ-HWKANZROSA-N 0.000 description 1
- ICMAFTSLXCXHRK-UHFFFAOYSA-N Ethyl pentanoate Chemical compound CCCCC(=O)OCC ICMAFTSLXCXHRK-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- 229920000181 Ethylene propylene rubber Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- JGFBQFKZKSSODQ-UHFFFAOYSA-N Isothiocyanatocyclopropane Chemical compound S=C=NC1CC1 JGFBQFKZKSSODQ-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- FNJSWIPFHMKRAT-UHFFFAOYSA-N Monomethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(O)=O FNJSWIPFHMKRAT-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- OYRRQADPTVZBPP-UHFFFAOYSA-N [ethoxy(dimethyl)silyl] triethyl silicate Chemical compound CCO[Si](C)(C)O[Si](OCC)(OCC)OCC OYRRQADPTVZBPP-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- FXXACINHVKSMDR-UHFFFAOYSA-N acetyl bromide Chemical compound CC(Br)=O FXXACINHVKSMDR-UHFFFAOYSA-N 0.000 description 1
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 1
- 239000012346 acetyl chloride Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- CJPIDIRJSIUWRJ-UHFFFAOYSA-N benzene-1,2,4-tricarbonyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C(C(Cl)=O)=C1 CJPIDIRJSIUWRJ-UHFFFAOYSA-N 0.000 description 1
- UDEWPOVQBGFNGE-UHFFFAOYSA-N benzoic acid n-propyl ester Natural products CCCOC(=O)C1=CC=CC=C1 UDEWPOVQBGFNGE-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- AQIHMSVIAGNIDM-UHFFFAOYSA-N benzoyl bromide Chemical compound BrC(=O)C1=CC=CC=C1 AQIHMSVIAGNIDM-UHFFFAOYSA-N 0.000 description 1
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 1
- 229960002903 benzyl benzoate Drugs 0.000 description 1
- HSDAJNMJOMSNEV-UHFFFAOYSA-N benzyl chloroformate Chemical compound ClC(=O)OCC1=CC=CC=C1 HSDAJNMJOMSNEV-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- JANBFCARANRIKJ-UHFFFAOYSA-N bis(3-methylbutyl) benzene-1,2-dicarboxylate Chemical compound CC(C)CCOC(=O)C1=CC=CC=C1C(=O)OCCC(C)C JANBFCARANRIKJ-UHFFFAOYSA-N 0.000 description 1
- IRXBNHGNHKNOJI-UHFFFAOYSA-N butanedioyl dichloride Chemical compound ClC(=O)CCC(Cl)=O IRXBNHGNHKNOJI-UHFFFAOYSA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 1
- PWLNAUNEAKQYLH-UHFFFAOYSA-N butyric acid octyl ester Natural products CCCCCCCCOC(=O)CCC PWLNAUNEAKQYLH-UHFFFAOYSA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- DVECBJCOGJRVPX-UHFFFAOYSA-N butyryl chloride Chemical compound CCCC(Cl)=O DVECBJCOGJRVPX-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- JEZFASCUIZYYEV-UHFFFAOYSA-N chloro(triethoxy)silane Chemical compound CCO[Si](Cl)(OCC)OCC JEZFASCUIZYYEV-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- MLCGVCXKDYTMRG-UHFFFAOYSA-N cyclohexane-1,1-dicarbonyl chloride Chemical compound ClC(=O)C1(C(Cl)=O)CCCCC1 MLCGVCXKDYTMRG-UHFFFAOYSA-N 0.000 description 1
- RVOJTCZRIKWHDX-UHFFFAOYSA-N cyclohexanecarbonyl chloride Chemical compound ClC(=O)C1CCCCC1 RVOJTCZRIKWHDX-UHFFFAOYSA-N 0.000 description 1
- DQZKGSRJOUYVPL-UHFFFAOYSA-N cyclohexyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OC1CCCCC1 DQZKGSRJOUYVPL-UHFFFAOYSA-N 0.000 description 1
- SIGXBXOSJWJXFE-UHFFFAOYSA-N cyclohexyl-diethoxy-(2-methylpropyl)silane Chemical compound CCO[Si](CC(C)C)(OCC)C1CCCCC1 SIGXBXOSJWJXFE-UHFFFAOYSA-N 0.000 description 1
- OIOZTXHFRJOLIH-UHFFFAOYSA-N cyclohexyl-diethoxy-propan-2-ylsilane Chemical compound CCO[Si](OCC)(C(C)C)C1CCCCC1 OIOZTXHFRJOLIH-UHFFFAOYSA-N 0.000 description 1
- YYUODOUSPSBQCB-UHFFFAOYSA-N cyclohexyl-dimethoxy-(2-methylpropyl)silane Chemical compound CC(C)C[Si](OC)(OC)C1CCCCC1 YYUODOUSPSBQCB-UHFFFAOYSA-N 0.000 description 1
- ZFLIIDCHUBTTDV-UHFFFAOYSA-N cyclohexyl-dimethoxy-propan-2-ylsilane Chemical compound CO[Si](OC)(C(C)C)C1CCCCC1 ZFLIIDCHUBTTDV-UHFFFAOYSA-N 0.000 description 1
- IPIVAXLHTVNRBS-UHFFFAOYSA-N decanoyl chloride Chemical compound CCCCCCCCCC(Cl)=O IPIVAXLHTVNRBS-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- ONIHPYYWNBVMID-UHFFFAOYSA-N diethyl benzene-1,4-dicarboxylate Chemical compound CCOC(=O)C1=CC=C(C(=O)OCC)C=C1 ONIHPYYWNBVMID-UHFFFAOYSA-N 0.000 description 1
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- LDCRTTXIJACKKU-ARJAWSKDSA-N dimethyl maleate Chemical compound COC(=O)\C=C/C(=O)OC LDCRTTXIJACKKU-ARJAWSKDSA-N 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- AXAZMDOAUQTMOW-UHFFFAOYSA-N dimethylzinc Chemical compound C[Zn]C AXAZMDOAUQTMOW-UHFFFAOYSA-N 0.000 description 1
- QRQUTSPLBBZERR-UHFFFAOYSA-M dioctylalumanylium;chloride Chemical compound CCCCCCCC[Al](Cl)CCCCCCCC QRQUTSPLBBZERR-UHFFFAOYSA-M 0.000 description 1
- ZMXPNWBFRPIZFV-UHFFFAOYSA-M dipropylalumanylium;chloride Chemical compound [Cl-].CCC[Al+]CCC ZMXPNWBFRPIZFV-UHFFFAOYSA-M 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- IWYBVQLPTCMVFO-UHFFFAOYSA-N ethyl 2,2-dichloroacetate Chemical compound CCOC(=O)C(Cl)Cl IWYBVQLPTCMVFO-UHFFFAOYSA-N 0.000 description 1
- HHEIMYAXCOIQCJ-UHFFFAOYSA-N ethyl 2,2-dimethylpropanoate Chemical compound CCOC(=O)C(C)(C)C HHEIMYAXCOIQCJ-UHFFFAOYSA-N 0.000 description 1
- RETLCWPMLJPOTP-UHFFFAOYSA-N ethyl 2-chlorobenzoate Chemical compound CCOC(=O)C1=CC=CC=C1Cl RETLCWPMLJPOTP-UHFFFAOYSA-N 0.000 description 1
- OUZCDRGUTZLAGO-UHFFFAOYSA-N ethyl 2-ethoxybenzoate Chemical compound CCOC(=O)C1=CC=CC=C1OCC OUZCDRGUTZLAGO-UHFFFAOYSA-N 0.000 description 1
- LMXMLKHKWPCFTG-UHFFFAOYSA-N ethyl 4-butoxybenzoate Chemical compound CCCCOC1=CC=C(C(=O)OCC)C=C1 LMXMLKHKWPCFTG-UHFFFAOYSA-N 0.000 description 1
- JJOYCHKVKWDMEA-UHFFFAOYSA-N ethyl cyclohexanecarboxylate Chemical compound CCOC(=O)C1CCCCC1 JJOYCHKVKWDMEA-UHFFFAOYSA-N 0.000 description 1
- HQKSINSCHCDMLS-UHFFFAOYSA-N ethyl naphthalene-2-carboxylate Chemical compound C1=CC=CC2=CC(C(=O)OCC)=CC=C21 HQKSINSCHCDMLS-UHFFFAOYSA-N 0.000 description 1
- MYEJNNDSIXAGNK-UHFFFAOYSA-N ethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(OC(C)C)OC(C)C MYEJNNDSIXAGNK-UHFFFAOYSA-N 0.000 description 1
- BLHLJVCOVBYQQS-UHFFFAOYSA-N ethyllithium Chemical compound [Li]CC BLHLJVCOVBYQQS-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 238000012685 gas phase polymerization Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- ARBOVOVUTSQWSS-UHFFFAOYSA-N hexadecanoyl chloride Chemical compound CCCCCCCCCCCCCCCC(Cl)=O ARBOVOVUTSQWSS-UHFFFAOYSA-N 0.000 description 1
- YWGHUJQYGPDNKT-UHFFFAOYSA-N hexanoyl chloride Chemical compound CCCCCC(Cl)=O YWGHUJQYGPDNKT-UHFFFAOYSA-N 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- WIAVVDGWLCNNGT-UHFFFAOYSA-M lithium;butanoate Chemical compound [Li+].CCCC([O-])=O WIAVVDGWLCNNGT-UHFFFAOYSA-M 0.000 description 1
- XBEREOHJDYAKDA-UHFFFAOYSA-N lithium;propane Chemical compound [Li+].CC[CH2-] XBEREOHJDYAKDA-UHFFFAOYSA-N 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- QABLOFMHHSOFRJ-UHFFFAOYSA-N methyl 2-chloroacetate Chemical compound COC(=O)CCl QABLOFMHHSOFRJ-UHFFFAOYSA-N 0.000 description 1
- QSSJZLPUHJDYKF-UHFFFAOYSA-N methyl 4-methylbenzoate Chemical compound COC(=O)C1=CC=C(C)C=C1 QSSJZLPUHJDYKF-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- DDIZAANNODHTRB-UHFFFAOYSA-N methyl p-anisate Chemical compound COC(=O)C1=CC=C(OC)C=C1 DDIZAANNODHTRB-UHFFFAOYSA-N 0.000 description 1
- OLXYLDUSSBULGU-UHFFFAOYSA-N methyl pyridine-4-carboxylate Chemical compound COC(=O)C1=CC=NC=C1 OLXYLDUSSBULGU-UHFFFAOYSA-N 0.000 description 1
- DVSDBMFJEQPWNO-UHFFFAOYSA-N methyllithium Chemical compound C[Li] DVSDBMFJEQPWNO-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- YWWHKOHZGJFMIE-UHFFFAOYSA-N monoethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(O)=O YWWHKOHZGJFMIE-UHFFFAOYSA-N 0.000 description 1
- RZJSUWQGFCHNFS-UHFFFAOYSA-N monoisobutyl phthalate Chemical compound CC(C)COC(=O)C1=CC=CC=C1C(O)=O RZJSUWQGFCHNFS-UHFFFAOYSA-N 0.000 description 1
- FPGPRAKRYDSZAW-UHFFFAOYSA-N monopentyl phthalate Chemical compound CCCCCOC(=O)C1=CC=CC=C1C(O)=O FPGPRAKRYDSZAW-UHFFFAOYSA-N 0.000 description 1
- MXHTZQSKTCCMFG-UHFFFAOYSA-N n,n-dibenzyl-1-phenylmethanamine Chemical compound C=1C=CC=CC=1CN(CC=1C=CC=CC=1)CC1=CC=CC=C1 MXHTZQSKTCCMFG-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N n-butyric acid methyl ester Natural products CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- 150000004002 naphthaldehydes Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- WTBAHSZERDXKKZ-UHFFFAOYSA-N octadecanoyl chloride Chemical compound CCCCCCCCCCCCCCCCCC(Cl)=O WTBAHSZERDXKKZ-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- REEZZSHJLXOIHL-UHFFFAOYSA-N octanoyl chloride Chemical compound CCCCCCCC(Cl)=O REEZZSHJLXOIHL-UHFFFAOYSA-N 0.000 description 1
- VECVSKFWRQYTAL-UHFFFAOYSA-N octyl benzoate Chemical compound CCCCCCCCOC(=O)C1=CC=CC=C1 VECVSKFWRQYTAL-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- XGISHOFUAFNYQF-UHFFFAOYSA-N pentanoyl chloride Chemical compound CCCCC(Cl)=O XGISHOFUAFNYQF-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000002530 phenolic antioxidant Substances 0.000 description 1
- FCJSHPDYVMKCHI-UHFFFAOYSA-N phenyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OC1=CC=CC=C1 FCJSHPDYVMKCHI-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 230000037048 polymerization activity Effects 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- SXYFKXOFMCIXQW-UHFFFAOYSA-N propanedioyl dichloride Chemical compound ClC(=O)CC(Cl)=O SXYFKXOFMCIXQW-UHFFFAOYSA-N 0.000 description 1
- RZWZRACFZGVKFM-UHFFFAOYSA-N propanoyl chloride Chemical compound CCC(Cl)=O RZWZRACFZGVKFM-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- JBKRFNWKBHROJI-UHFFFAOYSA-N tert-butyl-cyclohexyl-diethoxysilane Chemical compound CCO[Si](OCC)(C(C)(C)C)C1CCCCC1 JBKRFNWKBHROJI-UHFFFAOYSA-N 0.000 description 1
- RTZXSWUXDHSDMQ-UHFFFAOYSA-N tert-butyl-cyclohexyl-dimethoxysilane Chemical compound CO[Si](OC)(C(C)(C)C)C1CCCCC1 RTZXSWUXDHSDMQ-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000007970 thio esters Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- ZFDIRQKJPRINOQ-UHFFFAOYSA-N transbutenic acid ethyl ester Natural products CCOC(=O)C=CC ZFDIRQKJPRINOQ-UHFFFAOYSA-N 0.000 description 1
- SGCFZHOZKKQIBU-UHFFFAOYSA-N tributoxy(ethenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C=C SGCFZHOZKKQIBU-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical compound CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 description 1
- OJAJJFGMKAZGRZ-UHFFFAOYSA-N trimethyl(phenoxy)silane Chemical compound C[Si](C)(C)OC1=CC=CC=C1 OJAJJFGMKAZGRZ-UHFFFAOYSA-N 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- LFXVBWRMVZPLFK-UHFFFAOYSA-N trioctylalumane Chemical compound CCCCCCCC[Al](CCCCCCCC)CCCCCCCC LFXVBWRMVZPLFK-UHFFFAOYSA-N 0.000 description 1
- JUKPJGZUFHCZQI-UHFFFAOYSA-N undecanoyl chloride Chemical compound CCCCCCCCCCC(Cl)=O JUKPJGZUFHCZQI-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- HEPBQSXQJMTVFI-UHFFFAOYSA-N zinc;butane Chemical compound [Zn+2].CCC[CH2-].CCC[CH2-] HEPBQSXQJMTVFI-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、高剛性及び高耐熱性及
び高い溶融張力を有する安価なポリプロピレン樹脂及び
その組成物に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inexpensive polypropylene resin having high rigidity, high heat resistance and high melt tension, and a composition thereof.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】従来よ
り、ポリプロピレン樹脂、特にメルトインデックス(M
I)の低いポリプロピレン樹脂は、シートやフィルム等
のプラスチック材料として用いられている。ここで、低
MIグレードのポリプロピレン樹脂シートやフィルムな
どの押出し成形分野においては、ポリプロピレン樹脂の
剛性及び耐熱性を改良する手段が望まれていた。また、
従来、低MIグレード領域で十分な溶融張力を得るため
には多段重合が必須とされており、生産性及びコスト面
での改良が望まれていた。2. Description of the Related Art Conventionally, polypropylene resins, especially melt index (M
Polypropylene resin having a low I) is used as a plastic material such as a sheet and a film. Here, in the field of extrusion molding of low-MI grade polypropylene resin sheets and films, means for improving the rigidity and heat resistance of polypropylene resins have been desired. Also,
Conventionally, multistage polymerization has been indispensable in order to obtain sufficient melt tension in the low MI grade region, and improvement in productivity and cost has been desired.
【0003】これに対し、ポリプロピレン樹脂の剛性及
び耐熱性を向上させるためにNMR測定によるペンタッ
ド分率や沸騰ヘプタン抽出率(II)の改良を行なうことが
提案されているが(特公平3-30605号)、これらペンタ
ッド分率や沸騰ヘプタン抽出率(II)は、高剛性化・高耐
熱性のおおよその目安にはなるが、それだけの改良だけ
では効果は不十分であった。On the other hand, it has been proposed to improve the pentad fraction and boiling heptane extraction rate (II) by NMR measurement in order to improve the rigidity and heat resistance of polypropylene resin (Japanese Patent Publication No. 30605/1993). No.), these pentad fractions and boiling heptane extraction rate (II) can be used as an approximate guideline for high rigidity and high heat resistance, but the effect alone is not sufficient.
【0004】また、多段重合を前提とした従来技術(特
開昭63-284252号及び特開昭63-317505号)は、プロセス
上およびコスト面での制約が多いのみならず、異なった
条件下での重合の組合せにより、立体規則性および分子
量の分布が広くなるという欠点がある。言い換えれば、
平均値としての立体規則性、分子量は良好であっても、
少量の低立体規則性および低分子量成分を取り込まざる
を得なくなり、結果的に品質上の問題(特に気相重合法
において)を残していた。本発明は上記事情に鑑みてな
されたもので、極めて高い剛性、耐熱性及び溶融張力を
有する安価なポリプロピレン樹脂の提供を目的とする。Further, the prior arts (Japanese Patent Laid-Open Nos. 63-284252 and 63-317505), which are premised on multi-stage polymerization, are not only restricted in terms of process and cost, but also under different conditions. The combination of the polymerizations in 1) has the disadvantage of broadening the stereoregularity and the distribution of the molecular weight. In other words,
Stereoregularity as an average value, even if the molecular weight is good,
A small amount of low stereoregularity and low molecular weight components had to be incorporated, resulting in quality problems (especially in the gas phase polymerization method). The present invention has been made in view of the above circumstances, and an object thereof is to provide an inexpensive polypropylene resin having extremely high rigidity, heat resistance, and melt tension.
【0005】[0005]
【課題を解決するための手段】本発明者らは、上記目的
を達成するために鋭意検討を行なった結果、昇温分別法
における主溶出ピークの位置及びピークの半値幅の値が
ポリプロピレン樹脂の剛性及び耐熱性に影響を与えるこ
とを見出した。そして、ペンタッド分率、昇温分別
法における主溶出ピーク位置及び半値幅の値、メルト
インデックス、溶融張力とメルトインデックスとの関
係の各値が一定の範囲内にあるポリプロピレン樹脂が、
極めて高い剛性及び耐熱性を有し、しかも成形性及び耐
ドローダウン性に優れていることを知見して本発明をな
すに至った。Means for Solving the Problems As a result of intensive studies for achieving the above-mentioned object, the present inventors have found that the position of the main elution peak and the half-value width of the peak in the temperature-raising fractionation method are the same as those of polypropylene resin. It was found that it affects rigidity and heat resistance. Then, the pentad fraction, the value of the main elution peak position and the half width in the temperature rising fractionation method, the melt index, the polypropylene resin in which each value of the relationship between the melt tension and the melt index is within a certain range,
The present invention has been accomplished by finding that it has extremely high rigidity and heat resistance, and is also excellent in moldability and drawdown resistance.
【0006】したがって、本発明は、下記特性,,
及びを有するプロピレン単独重合体からなるポリプ
ロピレン樹脂を提供する。13
C−NMRで測定したペンタッド分率においてmm
mm分率が96.0%以上
昇温分別法での主溶出ピークの位置(Tmax)が1
17.0℃以上で、かつそのピークの半値幅(σ)が
4.0度未満
メルトインデックスが0.01g/10分以上、3.
0g/10分以下
230℃で測定した溶融張力(T)とMIとの関係が
T≧−5.2 logMI+3.0
また、本発明は、少なくとも上記プロピレン樹脂を含
み、必要に応じてEPR,EPDM,ポリエチレン等の
他の樹脂を含むポリプロピレン系樹脂組成物を提供す
る。Therefore, the present invention has the following characteristics:
Provided is a polypropylene resin comprising a propylene homopolymer having and. Mm in pentad fraction measured by 13 C-NMR
The mm fraction is 96.0% or more, and the position (Tmax) of the main elution peak in the temperature rising fractionation method is 1
The temperature at 17.0 ° C. or higher and the half width (σ) of the peak is less than 4.0 degrees. The melt index is 0.01 g / 10 minutes or more, 3.
The relationship between the melt tension (T) and MI measured at 230 ° C. for 0 g / 10 minutes or less is T ≧ −5.2 logMI + 3.0, and the present invention includes at least the above-mentioned propylene resin, and if necessary, EPR, EPDM. Provided is a polypropylene resin composition containing other resin such as polyethylene.
【0007】以下、本発明につき更に詳しく説明する。
まず、各特性について詳述する。
ペンタッド分率(mmmm分率)
本発明でいうmmmm分率は、13C−NMRにより測定
を行なって得られた値である。本発明のポリプロピレン
は、13C−NMRで測定したペンタッド分率が96.0
%以上、好ましくは97.0%以上、更に好ましくは、
97.5%以上である。ペンタッド分率の値が96.0
%未満であると剛性、耐熱性が不足する。The present invention will be described in more detail below.
First, each characteristic will be described in detail. Pentad Fraction (mmmm Fraction) The mmmm fraction referred to in the present invention is a value obtained by measurement by 13 C-NMR. The polypropylene of the present invention has a pentad fraction measured by 13 C-NMR of 96.0.
% Or more, preferably 97.0% or more, more preferably,
It is 97.5% or more. The value of the pentad fraction is 96.0
If it is less than%, the rigidity and heat resistance are insufficient.
【0008】昇温分別法による主溶出ピーク位置及び
ピークの半値幅
これらの値は、カラム内に試料溶液を導入し、試料を充
填剤に吸着させた後、カラムの温度を昇温させていき、
各温度で溶出したポリマー濃度を検出することにより測
定することができる。ここで、主溶出ピーク位置(Tm
ax)及びピーク半値幅(σ)は、図1に示す分析チャ
ートによって定義される値である。すなわち、Tmax
は最も大きいピークがあらわれたときのピーク位置(温
度)、σはそのピークの高さの半分の高さの位置におけ
るピーク幅である。ポリマーの立体規則性は、溶出温度
に依存するので、昇温分別法によって溶出温度とポリマ
ー濃度との関係を求めることにより、ポリマーの立体規
則性分布を知ることができる。Main elution peak position and half-value width of peak by the temperature rising fractionation method. These values are obtained by introducing the sample solution into the column, adsorbing the sample to the packing material, and then increasing the temperature of the column. ,
It can be measured by detecting the concentration of polymer eluted at each temperature. Here, the main elution peak position (Tm
The ax) and the peak half width (σ) are values defined by the analysis chart shown in FIG. 1. That is, Tmax
Is the peak position (temperature) when the largest peak appears, and σ is the peak width at a position half the height of the peak. Since the stereoregularity of the polymer depends on the elution temperature, the stereoregularity distribution of the polymer can be known by determining the relationship between the elution temperature and the polymer concentration by the temperature rising fractionation method.
【0009】本発明のポリプロピレンは、昇温分別法で
測定した主溶出ピーク(Tmax)が117.0℃以
上、好ましくは117.5℃以上、更に好ましくは11
8.0℃以上である。また、主溶出ピークの半値幅
(σ)が4.0度未満、好ましくは3.8度未満、更に
好ましくは3.4度未満である。主溶出ピークの位置
(Tmax)が117.0℃未満であると結晶化度が低
下し、剛性、耐熱性が低下する。また、主溶出ピークの
半値幅(σ)が4.0度以上であるとやはり剛性、耐熱
性が不足する。The polypropylene of the present invention has a main elution peak (Tmax) measured by the temperature rising fractionation method of 117.0 ° C. or higher, preferably 117.5 ° C. or higher, more preferably 11
The temperature is 8.0 ° C or higher. The full width at half maximum (σ) of the main elution peak is less than 4.0 degrees, preferably less than 3.8 degrees, and more preferably less than 3.4 degrees. If the position (Tmax) of the main elution peak is less than 117.0 ° C., the crystallinity decreases, and the rigidity and heat resistance decrease. Further, if the full width at half maximum (σ) of the main elution peak is 4.0 degrees or more, the rigidity and heat resistance are also insufficient.
【0010】メルトインデックス(MI)
本発明でいうメルトインデックスは、JIS K721
0に準拠して測定した値である。本発明のポリプロピレ
ンは、メルトインデックスが、0.01〜3.0g/1
0分、好ましくは0.1〜3.0g/10分である。メ
ルトインデックスが0.01g/10分未満であると剛
性、耐熱性が低くなり、3.0g/10分を超えると溶
融張力が低下し好ましくない。Melt Index (MI) The melt index referred to in the present invention is JIS K721.
It is a value measured according to 0. The polypropylene of the present invention has a melt index of 0.01 to 3.0 g / 1.
It is 0 minutes, preferably 0.1 to 3.0 g / 10 minutes. If the melt index is less than 0.01 g / 10 minutes, the rigidity and heat resistance will be low, and if it exceeds 3.0 g / 10 minutes, the melt tension will be decreased, such being undesirable.
【0011】溶融張力
本発明のポリプロピレン樹脂においては、230℃で測
定した溶融張力(T)の値とMIの値とが下記式で表わ
される関係にあることが必要である。
T≧−5.2 logMI+3.0
溶融張力(T)の値が−5.2 logMI+3.0よ
り小さいと、シートやブロー製品の成形時にドローダウ
ンが大きくなるので好ましくない。Melt Tension In the polypropylene resin of the present invention, it is necessary that the value of melt tension (T) measured at 230 ° C. and the value of MI have the relationship represented by the following formula. T ≧ −5.2 log MI + 3.0 If the value of melt tension (T) is smaller than −5.2 log MI + 3.0, drawdown becomes large at the time of molding a sheet or blown product, which is not preferable.
【0012】上記特性を有する本発明のプロピレン樹脂
の製造方法は特に制限されないが、高い重合活性及び立
体規則性を発現しうる重合用触媒を用いることが好まし
い。このような重合用触媒及びその重合用触媒をもちい
たポリオレフィンの製造方法としては、たとえば、本願
出願人が先になした特願平2-413883号に開示した重合用
触媒及び製造方法が挙げられる。特願平2-413883号に開
示の重合用触媒は、金属マグネシウム、アルコール及び
特定量のハロゲンを反応させて得た固体生成物(a)を
担体として用いたことを特徴とするものである。そし
て、かかる固体生成物(a)とチタン化合物(b)と、
場合により電子供与性化合物(c)とを用いて得られる
固体触媒成分(A)と、有機金属化合物(B)と、場合
により電子供与性化合物(C)とを用いて重合を行なう
ものである。The method for producing the propylene resin of the present invention having the above characteristics is not particularly limited, but it is preferable to use a polymerization catalyst capable of exhibiting high polymerization activity and stereoregularity. Examples of such a polymerization catalyst and a method for producing a polyolefin using the polymerization catalyst include a polymerization catalyst and a production method disclosed in Japanese Patent Application No. 2-413883 previously filed by the present applicant. . The polymerization catalyst disclosed in Japanese Patent Application No. 2-413883 is characterized by using a solid product (a) obtained by reacting magnesium metal, alcohol and a specific amount of halogen as a carrier. And such a solid product (a) and a titanium compound (b),
Polymerization is carried out using a solid catalyst component (A) obtained by using an electron donating compound (c), an organometallic compound (B), and optionally an electron donating compound (C). .
【0013】上記固体生成物(a)は、金属マグネシウ
ムとアルコールとハロゲン及び/又はハロゲン含有化合
物とから得る。この場合、金属マグネシウムの形状等は
特に限定されない。従って、任意の粒径の金属マグネシ
ウム、例えば顆粒状、リボン状、粉末状等の金属マグネ
シウムを用いることができる。また、金属マグネシウム
の表面状態も特に限定されないが、表面に酸化マグネシ
ウム等の被膜が生成されていないものが好ましい。The solid product (a) is obtained from magnesium metal, alcohol, halogen and / or halogen-containing compound. In this case, the shape of metallic magnesium is not particularly limited. Therefore, it is possible to use metallic magnesium having an arbitrary particle diameter, for example, granular, ribbon-shaped or powdered metallic magnesium. The surface state of the metallic magnesium is not particularly limited, but it is preferable that the surface of the metallic magnesium is not coated with magnesium oxide.
【0014】アルコールとしては任意のものを用いるこ
とができるが、炭素原子数1〜6の低級アルコールを用
いることが好ましい。特に、エタノールを用いると、触
媒性能の発現を著しく向上させる固体生成物が得られる
ので好ましい。アルコールの純度及び含水量も限られな
いが、含水量の多いアルコールを用いると金属マグネシ
ウム表面に水酸化マグネシウム[Mg(OH)2]が生
成されるので、含水量が1%以下、特に2000ppm
以下のアルコールを用いることが好ましい。更に、より
良好なモルフォロジーを有する固体生成物(a)を得る
ためには、水分は少なければ少ないほど好ましく、一般
的には200ppm以下が望ましい。Although any alcohol can be used, it is preferable to use a lower alcohol having 1 to 6 carbon atoms. In particular, the use of ethanol is preferable because a solid product that significantly improves the expression of catalytic performance can be obtained. The purity and the water content of the alcohol are not limited, but when an alcohol having a high water content is used, magnesium hydroxide [Mg (OH) 2 ] is produced on the surface of magnesium metal, so that the water content is 1% or less, particularly 2000 ppm.
It is preferable to use the following alcohols. Furthermore, in order to obtain a solid product (a) having a better morphology, the smaller the water content, the more preferable, and generally 200 ppm or less is desirable.
【0015】ハロゲンの種類については特に制限されな
いが、塩素、臭素又はヨウ素、特にヨウ素が好適に使用
される。ハロゲン含有化合物の種類に限定はなく、ハロ
ゲン原子をその化学式中に含む化合物であればいずれの
ものでも使用できる。この場合、ハロゲン原子の種類に
ついては特に制限されないが、塩素、臭素又はヨウ素で
あることが好ましい。また、ハロゲン含有化合物の中で
はハロゲン含有金属化合物が特に好ましい。ハロゲン含
有化合物として、具体的には、MgCl2,MgI2,M
g(OEt)Cl,Mg(OEt)I,MgBr2,C
aCl2,NaCl,KBr等を好適に使用できる。こ
れらの中では、特にMgCl2,MgI2が好ましい。こ
れらの状態、形状、粒度等は特に限定されず、任意のも
のでよく、例えばアルコール系溶媒(例えば、エタノー
ル)中の溶液の形で用いることができる。The type of halogen is not particularly limited, but chlorine, bromine or iodine, especially iodine is preferably used. The kind of the halogen-containing compound is not limited, and any compound containing a halogen atom in its chemical formula can be used. In this case, the type of halogen atom is not particularly limited, but chlorine, bromine or iodine is preferable. Further, among the halogen-containing compounds, halogen-containing metal compounds are particularly preferable. As the halogen-containing compound, specifically, MgCl 2 , MgI 2 , M
g (OEt) Cl, Mg (OEt) I, MgBr 2 , C
ACl 2 , NaCl, KBr, etc. can be preferably used. Of these, MgCl 2 and MgI 2 are particularly preferable. These states, shapes, particle sizes and the like are not particularly limited and may be arbitrary, and for example, they can be used in the form of a solution in an alcohol solvent (for example, ethanol).
【0016】アルコールの量については問わないが、金
属マグネシウム1モルに対して好ましくは2〜100モ
ル、特に好ましくは5〜50モルである。アルコール量
が多すぎる場合、モルフォロジーの良好な固体生成物
(a)の収率が低下するおそれがあり、少なすぎる場合
は、反応槽での攪拌がスムーズに行なわれなくなるおそ
れがある。しかし、そのモル比に限定されるものではな
い。The amount of alcohol is not limited, but it is preferably 2 to 100 mol, and particularly preferably 5 to 50 mol per 1 mol of metal magnesium. If the amount of alcohol is too large, the yield of the solid product (a) having a good morphology may decrease, and if it is too small, stirring in the reaction tank may not be smoothly performed. However, the molar ratio is not limited.
【0017】ハロゲンの使用量は、金属マグネシウム1
グラム原子に対して、0.0001グラム原子以上、好
ましくは0.0005グラム原子以上、更に好ましくは
0.001グラム原子以上である。また、ハロゲン含有
化合物は、金属マグネシウム1グラム原子に対して、ハ
ロゲン含有化合物中のハロゲン原子が0.0001グラ
ム原子以上、好ましくは0.0005グラム原子以上、
更に好ましくは0.001グラム原子以上となるように
使用する。0.0001グラム原子未満の場合、ハロゲ
ンを反応開始剤として用いる量と大差なく、所望の粒径
のものを得るためには固体生成物の粉砕分級処理が不可
欠なものとなる。The amount of halogen used is metallic magnesium 1
The amount of gram atom is 0.0001 gram atom or more, preferably 0.0005 gram atom or more, and more preferably 0.001 gram atom or more. The halogen-containing compound has a halogen atom in the halogen-containing compound of 0.0001 gram atom or more, preferably 0.0005 gram atom or more, based on 1 gram atom of metallic magnesium.
More preferably, it is used in an amount of 0.001 gram atom or more. If the amount is less than 0.0001 gram atom, there is no great difference from the amount of halogen used as the reaction initiator, and the pulverizing and classifying treatment of the solid product is indispensable to obtain the desired particle size.
【0018】ハロゲン及びハロゲン含有化合物はそれぞ
れ1種を単独で用いてもよく、2種以上を併用してもよ
い。また、ハロゲンとハロゲン含有化合物とを併用して
もよい。このようにハロゲンとハロゲン含有化合物とを
併用する場合、全ハロゲン原子の量を金属マグネシウム
1グラム原子に対して、0.0001グラム原子以上、
好ましくは0.0005グラム原子以上、更に好ましく
は0.001グラム原子以上とする。ハロゲン及び/又
はハロゲン含有化合物の使用量の上限について特に定め
はなく、目的とする固体生成物が得られる範囲で適宜選
択すればよいが、一般的には全ハロゲン原子の量を金属
マグネシウム1グラム原子に対して0.06グラム原子
未満とすることが好ましい。この場合、ハロゲン及び/
又はハロゲン含有化合物の使用量を適宜選択することに
より、固体生成物の粒径を自由にコントロールすること
が可能である。Each of the halogen and the halogen-containing compound may be used alone or in combination of two or more. Further, halogen and a halogen-containing compound may be used in combination. When halogen and a halogen-containing compound are used in combination, the total amount of halogen atoms is 0.0001 gram atom or more per 1 gram atom of metallic magnesium.
The amount is preferably 0.0005 gram atom or more, and more preferably 0.001 gram atom or more. The upper limit of the amount of halogen and / or halogen-containing compound used is not particularly limited and may be appropriately selected within a range in which the desired solid product is obtained. Generally, the amount of all halogen atoms is 1 g of magnesium metal. It is preferably less than 0.06 gram atom per atom. In this case, halogen and /
Alternatively, the particle size of the solid product can be freely controlled by appropriately selecting the amount of the halogen-containing compound used.
【0019】金属マグネシウムとアルコールとハロゲン
及び/又はハロゲン含有化合物との反応それ自体は、公
知の方法と同様に実施することができる。例えば、金属
マグネシウムとアルコールとハロゲン及び/又はハロゲ
ン含有化合物とを、還流下(約79℃)で、水素ガスの
発生が認められなくなるまで(通常、約20〜30時
間)反応させて、固体生成物を得る方法である。具体的
には、例えばハロゲンとしてヨウ素を用いる場合、金属
マグネシウム、アルコール中に固体状のヨウ素を投入
し、しかる後に加熱し還流する方法、金属マグネシウ
ム、アルコール中にヨウ素のアルコール溶液を滴下投入
後加熱し還流する方法、金属マグネシウム、アルコール
溶液を加熱しつつヨウ素のアルコール溶液を滴下する方
法などが挙げられる。いずれの方法も、不活性ガス(例
えば、窒素ガス、アルゴンガス)雰囲気下で、場合によ
り不活性有機溶媒(例えば、n−ヘキサン等の飽和炭化
水素)を用いて行なうことが好ましい。The reaction itself of the magnesium metal, the alcohol, the halogen and / or the halogen-containing compound can be carried out in the same manner as a known method. For example, metallic magnesium, an alcohol, a halogen and / or a halogen-containing compound are reacted under reflux (about 79 ° C.) until generation of hydrogen gas is no longer recognized (usually about 20 to 30 hours) to produce a solid. It is a way to get things. Specifically, for example, when iodine is used as the halogen, a method in which solid iodine is introduced into metallic magnesium and alcohol, and then heated and refluxed, metallic alcohol is added after the alcohol solution of iodine is dropped into the alcohol and heated. And the like, and a method of dropping an alcohol solution of iodine while heating the magnesium metal or alcohol solution. Both methods are preferably carried out under an inert gas (for example, nitrogen gas or argon gas) atmosphere, optionally using an inert organic solvent (for example, saturated hydrocarbon such as n-hexane).
【0020】金属マグネシウム、アルコール、ハロゲン
及び/又はハロゲン含有化合物の投入については、最初
から各々全量を反応槽に投入しておく必要はなく、分割
して投入してもよい。特に好ましい形態は、アルコール
を最初から全量投入しておき、金属マグネシウムを数回
に分割して投入する方法である。このようにした場合、
水素ガスの一時的な大量発生を防ぐことができ、安全面
から非常に望ましい。また、反応槽も小型化することが
可能となる。更には、水素ガスの一時的な大量発生によ
り引き起こされるアルコールやハロゲン及び/又はハロ
ゲン含有化合物の飛沫同伴を防ぐことも可能となる。分
割する回数は、反応槽の規模を勘案して決めればよく、
特に問わないが、操作の煩雑さを考えると通常5〜10
回が好適である。Regarding the addition of magnesium metal, alcohol, halogen and / or halogen-containing compound, it is not necessary to add the whole amount to the reaction tank from the beginning, and it may be added in a divided manner. A particularly preferable form is a method in which the entire amount of alcohol is charged from the beginning, and metallic magnesium is charged in several times. If you do this,
It is possible to prevent the generation of a large amount of hydrogen gas temporarily, which is highly desirable from the viewpoint of safety. Also, the reaction tank can be downsized. Further, it becomes possible to prevent the entrainment of alcohol, halogen and / or halogen-containing compound caused by the temporary large generation of hydrogen gas. The number of divisions may be determined in consideration of the scale of the reaction tank,
Although not particularly limited, it is usually 5 to 10 in consideration of complexity of operation.
Times are preferred.
【0021】また、反応自体は、バッチ式、連続式のい
ずれでもよいことは言うまでもない。さらには、変法と
して、最初から全量投入したアルコール中に金属マグネ
シウムを先ず少量投入し、反応により生成した生成物を
別の槽に分離して除去した後、再び金属マグネシウムを
少量投入するという操作を繰り返すということも可能で
ある。こうして得た固体生成物(a)を、次の固体触媒
成分の合成に用いる場合、乾燥させたものを用いてもよ
く、また瀘別後ヘプタン等の不活性溶媒で洗浄したもの
を用いてもよい。いずれの場合においても、得られた固
体生成物(a)は、粉砕あるいは粒度分布をそろえるた
めの分級操作をすることなく以下の工程に用いることが
できる。It goes without saying that the reaction itself may be either batch type or continuous type. Furthermore, as a modified method, a small amount of metallic magnesium is first added to the alcohol that has been entirely added from the beginning, the product produced by the reaction is separated and removed in another tank, and then a small amount of metallic magnesium is added again. It is also possible to repeat. When the solid product (a) thus obtained is used for the next synthesis of the solid catalyst component, a dried product may be used, or a product washed with an inert solvent such as heptane after filtration may be used. Good. In any case, the obtained solid product (a) can be used in the following steps without pulverization or classification operation for adjusting the particle size distribution.
【0022】また、固体生成物(a)は球状に近く、し
かも粒径分布がシャープである。さらには、粒子一つ一
つをとってみても、球形度のばらつきは非常に小さい。
この場合、下記(1)式で表わされる球形度(S)が
1.60未満、特に1.40未満であり、かつ下記
(2)式で表わされる粒径分布指数(P)が5.0未
満、特に4.0未満であることが好ましい。
S=(E1/E2)2 ・・・(1)
(ここで、E1は粒子の投影の輪郭長、E2は粒子の投
影面積に等しい円の周長を示す。)
P=D90/D10 ・・・(2)
(ここで、D90とは重量累積分率が90%に対応する
粒子径をいう。即ちD90であらわされる粒子径より小
さい粒子群の重量和が全粒子総重量和の90%であるこ
とを示している。D10も同様である。)Further, the solid product (a) is close to spherical and has a sharp particle size distribution. Furthermore, even if each particle is taken, the variation in sphericity is very small.
In this case, the sphericity (S) represented by the following formula (1) is less than 1.60, particularly less than 1.40, and the particle size distribution index (P) represented by the following formula (2) is 5.0. It is preferably less than 4.0, particularly less than 4.0. S = (E1 / E2) 2 (1) (where E1 is the contour length of the projected particle and E2 is the circumference of a circle equal to the projected area of the particle.) P = D90 / D10 ... (2) (Here, D90 means a particle size corresponding to a weight cumulative fraction of 90%. That is, the weight sum of the particle groups smaller than the particle size represented by D90 is 90% of the total weight of all particles. (The same applies to D10.)
【0023】上記固体触媒成分(A)におけるチタン化
合物(b)としては、例えば、一般式
TiX1n(OR1)4-n
(式中、X1はハロゲン原子、特に塩素原子であり、R1
は炭素原子数1〜10の炭化水素基、特に直鎖又は分岐
鎖のアルキル基であり、基R1が複数存在する場合には
それらは互に同じでも異なっていてもよい。nは0〜4
の整数である。)で表わされるチタン化合物が挙げられ
る。具体的には、Ti(O−i−C3 H7)4、Ti(O
−C4H9)4、TiCl(O−C2H5)3、TiCl(O
−i−C3H7)3、TiCl(O−C4H9)3、TiCl
2(O−C4H9)2、TiCl2(O−i−C3H7)2、T
iCl4等を挙げることができる。Examples of the titanium compound (b) in the above solid catalyst component (A) include, for example, the general formula TiX 1 n (OR 1 ) 4-n (wherein X 1 is a halogen atom, especially a chlorine atom, and R 1
Is a hydrocarbon group having 1 to 10 carbon atoms, in particular a linear or branched alkyl group, and when a plurality of groups R 1 are present, they may be the same or different from each other. n is 0-4
Is an integer. ) And titanium compounds. Specifically, Ti (O-i-C 3 H 7) 4, Ti (O
-C 4 H 9) 4, TiCl (O-C 2 H 5) 3, TiCl (O
-I-C 3 H 7) 3 , TiCl (O-C 4 H 9) 3, TiCl
2 (O-C 4 H 9 ) 2, TiCl 2 (O-i-C 3 H 7) 2, T
Examples thereof include iCl 4 .
【0024】上記固体触媒成分(A)では、必要に応じ
て任意の電子供与性化合物(c)を用いることができ
る。それらの電子供与性化合物(c)は、通常は、酸
素、窒素、リンあるいは硫黄を含有する有機化合物であ
る。具体的には、アミン類、アミド類、ケトン類、ニト
リル類、ホスフィン類、ホスミルアミド類、エステル
類、エーテル類、チオエーテル類、アルコール類、チオ
エステル類、酸無水物類、酸ハライド類、アルデヒド
類、有機酸類、Si−O−C結合を有する有機ケイ素化
合物等を挙げることができ、より具体的には下記のもの
を挙げることができる。In the above solid catalyst component (A), any electron donating compound (c) can be used if necessary. The electron donating compound (c) is usually an organic compound containing oxygen, nitrogen, phosphorus or sulfur. Specifically, amines, amides, ketones, nitriles, phosphines, phosmylamides, esters, ethers, thioethers, alcohols, thioesters, acid anhydrides, acid halides, aldehydes, Examples thereof include organic acids and organic silicon compounds having a Si—O—C bond, and more specific examples include the following.
【0025】芳香族カルボン酸、例えば、安息香酸、p
−オキシ安息香酸;酸無水物、例えば、無水コハク酸、
無水安息香酸、無水p−トルイル酸;炭素原子数3〜1
5のケトン類、例えば、アセトン、メチルエチルケト
ン、メチルイソブチルケトン、アセトフェノン、ベンゾ
フェノン、ベンゾキノン;炭素原子数2〜15のアルデ
ヒド類、例えば、アセトアルデヒド、プロピオンアルデ
ヒド、オクチルアルデヒド、ベンズアルデド、ナフトア
ルデヒド;炭素原子数2〜18のエステル類、例えば、
ギ酸メチル、ギ酸エチル、酢酸メチル、酢酸エチル、酢
酸ビニル、酢酸プロピル、酢酸オクチル、酢酸シクロヘ
キシル、プロピオン酸エチル、酪酸メチル、酪酸エチ
ル、吉草酸エチル、クロル酢酸メチル、ジクロル酢酸エ
チル、メタクリル酸メチル、クロトン酸エチル、ピバリ
ン酸エチル、マレイン酸ジメチル、シクロヘキサンカル
ボン酸エチル、安息香酸メチル、安息香酸エチル、安息
香酸プロピル、安息香酸ブチル、安息香酸オクチル、安
息香酸シクロヘキシル、安息香酸フェニル、安息香酸ベ
ンジル、トルイル酸メチル、トルイル酸エチル、トルイ
ル酸アミル、エチル安息香酸エチル、アニス酸メチル、
アニス酸エチル、エトキシ安息香酸エチル、p−ブトキ
シ安息香酸エチル、o−クロル安息香酸エチル、ナフト
エ酸エチル、γ−ブチロラクトン、δ−バレロラクト
ン、クマリン、フタリド、炭酸エチレン;Aromatic carboxylic acids such as benzoic acid, p
-Oxybenzoic acid; acid anhydrides such as succinic anhydride,
Benzoic anhydride, p-toluic anhydride; C3 to C1
5 ketones, such as acetone, methyl ethyl ketone, methyl isobutyl ketone, acetophenone, benzophenone, benzoquinone; aldehydes having 2 to 15 carbon atoms, such as acetaldehyde, propionaldehyde, octylaldehyde, benzalded, naphthaldehyde; 2 carbon atoms ~ 18 esters, for example:
Methyl formate, ethyl formate, methyl acetate, ethyl acetate, vinyl acetate, propyl acetate, octyl acetate, cyclohexyl acetate, ethyl propionate, methyl butyrate, ethyl butyrate, ethyl valerate, methyl chloroacetate, ethyl dichloroacetate, methyl methacrylate, Ethyl crotonate, ethyl pivalate, dimethyl maleate, ethyl cyclohexanecarboxylate, methyl benzoate, ethyl benzoate, propyl benzoate, butyl benzoate, octyl benzoate, cyclohexyl benzoate, phenyl benzoate, benzyl benzoate, toluyl. Methyl acid, ethyl toluate, amyl toluate, ethyl ethyl benzoate, methyl anisate,
Ethyl anisate, ethyl ethoxybenzoate, ethyl p-butoxybenzoate, ethyl o-chlorobenzoate, ethyl naphthoate, γ-butyrolactone, δ-valerolactone, coumarin, phthalide, ethylene carbonate;
【0026】芳香族ジカルボン酸のモノ及びジエステ
ル、例えばフタル酸のモノエステル及びジエステルが好
ましく、例えば、モノメチルフタレート、ジメチルフタ
レート、モノメチルテレフタレート、ジメチルテレフタ
レート、モノエチルフタレート、ジエチルフタレート、
モノエチルテレフタレート、ジエチルテレフタレート、
モノプロピルフタレート、ジプロピルフタレート、モノ
プロピルテレフタレート、ジプロピルテレフタレート、
モノブチルフタレート、ジブチルフタレート、モノブチ
ルテレフタレート、ジブチルテフタレート、モノイソブ
チルフタレート、ジイソブチルフタレート、モノアミル
フタレート、ジアミルフタレート、モノイソアミルフタ
レート、ジイソアミルフタレート、エチルブチルフタレ
ート、エチルイソブチルフタレート、エチルプロピルフ
タレート;Aromatic dicarboxylic acid mono and diesters such as phthalic acid monoesters and diesters are preferred, for example monomethyl phthalate, dimethyl phthalate, monomethyl terephthalate, dimethyl terephthalate, monoethyl phthalate, diethyl phthalate,
Monoethyl terephthalate, diethyl terephthalate,
Monopropyl phthalate, dipropyl phthalate, monopropyl terephthalate, dipropyl terephthalate,
Monobutyl phthalate, dibutyl phthalate, monobutyl terephthalate, dibutyl terephthalate, monoisobutyl phthalate, diisobutyl phthalate, monoamyl phthalate, diamyl phthalate, monoisoamyl phthalate, diisoamyl phthalate, ethyl butyl phthalate, ethyl isobutyl phthalate, ethyl propyl phthalate;
【0027】炭素原子数2〜20の酸ハロゲン化物類、
この酸ハロゲン化物の酸部分(アシル基部分)として
は、炭素数2〜20程度の脂肪族(脂環族等の環を有す
るものも含む)系の一塩基性、二塩基性又は三塩基性酸
からそれぞれの水酸基を引き抜いた1価〜3価のアシル
酸、あるいは炭素数7〜20程度の芳香族(アルカリ−
ル型やアラルキル型のものも含む。)系の一塩基性、二
塩基性又は三塩基性酸からそれぞれの水酸基を引き抜い
た1価〜3価のアシル基などが好ましい。また、前記酸
ハロゲン化物中のハロゲン原子としては、塩素原子、臭
素原子などが好ましく、特に塩素原子が好ましい。Acid halides having 2 to 20 carbon atoms,
The acid portion (acyl group portion) of the acid halide is an aliphatic (including those having a ring such as alicyclic) carbon atoms of about 2 to 20, monobasic, dibasic or tribasic. A monovalent to trivalent acyl acid obtained by removing each hydroxyl group from an acid, or an aromatic (alkali-containing) having about 7 to 20 carbon atoms.
Also includes le-type and aralkyl-type. ) Monovalent to trivalent acyl groups obtained by removing each hydroxyl group from a monobasic, dibasic or tribasic acid of the system are preferred. The halogen atom in the acid halide is preferably a chlorine atom, a bromine atom, etc., and particularly preferably a chlorine atom.
【0028】好適に使用することのできる酸ハロゲン化
物としては、例えば、アセチルクロリド、アセチルブロ
ミド、プロピオニルクロリド、ブチリルクロリド、イソ
ブチリルクロリド、2−メチルプロピオニルクロリド、
バレリルクロリド、イソバレリルクロリド、ヘキサノイ
ルクロリド、メチルヘキサノイルクロリド、2−エチル
ヘキサノイルクロリド、オクタノイルクロリド、デカノ
イルクロリド、ウンデカノイルクロリド、ヘキサデカノ
イルクロリド、オクタデカノイルクロリド、ベンジルカ
ルボニルクロリド、シクロヘキサンカルボニルクロリ
ド、マロニルジクロリド、スクシニルジクロリド、ペン
タンジオイルジクロリド、ヘキサンジオイルジクロリ
ド、シクロヘキサンジカルボニルジクロリド、ベンゾイ
ルクロリド、ベンゾイルブロミド、メチルベンゾイルク
ロリド、フタロイルクロリド、イソフタロイルクロリ
ド、テレフタロイルクロリド、ベンゼン−1,2,4−
トリカルボニルトリクロリドなどを挙げることができ
る。これらの中でも、特にフタロイルクロリド、イソフ
タロイルクロリド、テレフタロイルクロリドなどが好ま
しく、特にフタロイルクロリドが好ましい。なお、これ
らの酸ハロゲン化物は、一種を単独で使用してもよい
し、二種以上を併用してもよい。Acid halides that can be preferably used include, for example, acetyl chloride, acetyl bromide, propionyl chloride, butyryl chloride, isobutyryl chloride, 2-methylpropionyl chloride,
Valeryl chloride, isovaleryl chloride, hexanoyl chloride, methylhexanoyl chloride, 2-ethylhexanoyl chloride, octanoyl chloride, decanoyl chloride, undecanoyl chloride, hexadecanoyl chloride, octadecanoyl chloride, benzylcarbonyl Chloride, cyclohexane carbonyl chloride, malonyl dichloride, succinyl dichloride, pentane dioil dichloride, hexane dioil dichloride, cyclohexane dicarbonyl dichloride, benzoyl chloride, benzoyl bromide, methylbenzoyl chloride, phthaloyl chloride, isophthaloyl chloride, terephthaloyl chloride. , Benzene-1,2,4-
Tricarbonyl trichloride etc. can be mentioned. Among these, phthaloyl chloride, isophthaloyl chloride, terephthaloyl chloride and the like are preferable, and phthaloyl chloride is particularly preferable. These acid halides may be used alone or in combination of two or more.
【0029】炭素原子数2〜20のエーテル類、例え
ば、メチルエーテル、エチルエーテル、イソプロピルエ
ーテル、n−ブチルエーテル、アミルエーテル、テトラ
ヒドロフラン、アニソール、ジフェニルエーテル、エチ
レングリコールブチルエーテル;酸アミド、例えば、酢
酸アミド、安息香酸アミド、トルイル酸アミド;アミン
類、例えば、トリブチルアミン、N、N’−ジメチルピ
ペラジン、トリベンジルアミン、アニリン、ピリジン、
ピロリン、テトラメチルエチレンジアミン;ニトリル
類、例えば、アセトニトリル、ベンゾニトリル、トルニ
トリル;テトラメチル尿素、ニトロベンゼン、リチウム
ブチレート;Ethers having 2 to 20 carbon atoms such as methyl ether, ethyl ether, isopropyl ether, n-butyl ether, amyl ether, tetrahydrofuran, anisole, diphenyl ether, ethylene glycol butyl ether; acid amides such as acetic acid amide, benzoic acid Acid amide, toluic acid amide; amines such as tributylamine, N, N′-dimethylpiperazine, tribenzylamine, aniline, pyridine,
Pyroline, tetramethylethylenediamine; Nitriles such as acetonitrile, benzonitrile, tolunitrile; Tetramethylurea, nitrobenzene, lithium butyrate;
【0030】Si−O−C結合を有する有機ケイ素化合
物、例えば、トリメチルメトキシシラン、トリメチルエ
トキシシラン、ジメチルジメトキシシラン、ジメチルジ
エトキシシラン、ジフェニルジメトキシシラン、メチル
フェニルジメトキシシラン、ジフェニルジエトキシシラ
ン、フェニルトリメトキシシラン、γ−クロルプロピル
トリメトキシシラン、メチルトリエトキシシラン、エチ
ルトリエトキシシラン、ビニルトリエトキシシラン、ブ
チルトリエトキシシラン、フェニルトリエトキシシラ
ン、γ−アミノプロピルトリエトキシシラン、クロルト
リエトキシシラン、エチルトリイソプロポキシシラン、
ビニルトリブトキシシラン、イソプロピルシクロヘキシ
ルジメトキシシラン、イソブチルシクロヘキシルジメト
キシシラン、tert−ブチルシクロヘキシルジメトキシシ
ラン、イソプロピルシクロヘキシルジエトキシシラン、
イソブチルシクロヘキシルジエトキシシラン、tert−ブ
チルシクロヘキシルジエトキシシラン、メチルシクロヘ
キシルジメトキシシラン、ケイ酸エチル、ケイ酸ブチ
ル、トリメチルフェノキシシラン、メチルトリアリロキ
シシラン、ビニルトリス(β−メトキシエトキシ)シラ
ン、ビニルトリアセトキシシラン、ジメチルテトラエト
キシジシロキサン等を挙げることができる。これらのう
ち、好ましいものは、エステル類、エーテル類、ケトン
類、酸無水物等である。Organosilicon compounds having a Si--O--C bond, such as trimethylmethoxysilane, trimethylethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, diphenyldimethoxysilane, methylphenyldimethoxysilane, diphenyldiethoxysilane, phenyltri. Methoxysilane, γ-chloropropyltrimethoxysilane, methyltriethoxysilane, ethyltriethoxysilane, vinyltriethoxysilane, butyltriethoxysilane, phenyltriethoxysilane, γ-aminopropyltriethoxysilane, chlorotriethoxysilane, ethyl Triisopropoxysilane,
Vinyltributoxysilane, isopropylcyclohexyldimethoxysilane, isobutylcyclohexyldimethoxysilane, tert-butylcyclohexyldimethoxysilane, isopropylcyclohexyldiethoxysilane,
Isobutylcyclohexyldiethoxysilane, tert-butylcyclohexyldiethoxysilane, methylcyclohexyldimethoxysilane, ethyl silicate, butyl silicate, trimethylphenoxysilane, methyltriaryloxysilane, vinyltris (β-methoxyethoxy) silane, vinyltriacetoxysilane , Dimethyltetraethoxydisiloxane, and the like. Among these, preferred are esters, ethers, ketones, acid anhydrides and the like.
【0031】固体触媒成分(A)は、(a)固体生成物
と、(b)チタン化合物と、必要に応じて(c)電子供
与性化合物とを用い、公知の方法で調製することができ
る。例えば、固体生成物(a)と電子供与性化合物
(c)とを接触させた後、チタン化合物(b)と接触さ
せるのが好ましい。固体生成物(a)に電子供与性化合
物(c)を接触させる際の条件には特に制限はなく、各
種の事情に応じて適宜定めればよい。通常は、マグネシ
ウム原子換算で固体生成物(a)1モルに対して電子供
与性化合物(c)0.01〜10モル、好ましくは0.
05〜5モルを加え、0〜200℃にて5分〜10時間
の条件、好ましくは30〜150℃にて30分〜3時間
の条件で接触反応を行なえばよい。なお、この反応系に
は、ペンタン、ヘキサン、ヘプタン又はオクタン等の不
活性炭化水素を溶媒として加えることもできる。The solid catalyst component (A) can be prepared by a known method using (a) a solid product, (b) a titanium compound and, if necessary, (c) an electron donating compound. . For example, it is preferable to contact the solid product (a) with the electron-donating compound (c) and then contact with the titanium compound (b). The conditions for bringing the electron donating compound (c) into contact with the solid product (a) are not particularly limited and may be appropriately determined depending on various circumstances. Usually, 0.01 to 10 moles of the electron-donating compound (c), preferably 0.1 to 1 mole of the solid product (a) in terms of magnesium atom.
05 to 5 moles may be added, and the catalytic reaction may be performed at 0 to 200 ° C. for 5 minutes to 10 hours, preferably at 30 to 150 ° C. for 30 minutes to 3 hours. Incidentally, an inert hydrocarbon such as pentane, hexane, heptane or octane can be added to this reaction system as a solvent.
【0032】固体生成物(a)に、又はそれと電子供与
性化合物(c)との接触生成物に、チタン化合物(b)
を接触させる際の条件には特に制限はないが、通常は生
成物中のマグネシウム1モルに対して、チタン化合物
(b)を1〜50モル、好ましくは2〜20モルの範囲
で加え、0〜200℃にて5分〜10時間、好ましくは
30〜150℃にて30分〜5時間反応させる。チタン
化合物(b)との接触は、液体状のチタン化合物(例え
ば、四塩化チタン)はそれ単独で、それ以外のチタン化
合物は任意の不活性炭化水素溶媒(例えば、ヘキサン、
ヘプタン、灯油)に溶解させた状態で行なうことができ
る。また、前記の固体生成物(a)とチタン化合物
(b)と、必要に応じて電子供与性化合物(c)との前
記の接触の前に、例えば、ハロゲン化炭化水素、ハロゲ
ン含有ケイ素化合物、ハロゲンガス、塩化水素、ヨウ化
水素等を固体生成物(a)に接触させることもできる。
なお、反応終了後は、不活性炭化水素(例えば、n−ヘ
キサン、n−ヘプタン)で、生成物を洗浄するのが好ま
しい。The titanium compound (b) is added to the solid product (a) or the contact product of the solid product (a) and the electron-donating compound (c).
There are no particular restrictions on the conditions for contacting, but usually 1 to 50 mol, preferably 2 to 20 mol of the titanium compound (b) is added to 1 mol of magnesium in the product. The reaction is performed at ˜200 ° C. for 5 minutes to 10 hours, preferably at 30 to 150 ° C. for 30 minutes to 5 hours. The liquid titanium compound (for example, titanium tetrachloride) is used alone for the contact with the titanium compound (b), and the titanium compound other than the above is used for any inert hydrocarbon solvent (for example, hexane,
It can be carried out in a state of being dissolved in heptane, kerosene). In addition, prior to the contact between the solid product (a) and the titanium compound (b), and optionally the electron-donating compound (c), for example, a halogenated hydrocarbon, a halogen-containing silicon compound, It is also possible to bring halogen gas, hydrogen chloride, hydrogen iodide, or the like into contact with the solid product (a).
After the reaction, it is preferable to wash the product with an inert hydrocarbon (for example, n-hexane or n-heptane).
【0033】前記有機金属化合物(B)としては、周期
率表第1族〜第3族の金属を含む任意の有機化合物を好
適に用いることができる。この周期率表第1族〜第3族
の金属としては、例えば、リチウム、ナトリウム、カリ
ウム、亜鉛、カドミウム、アルミニウム等を挙げること
ができ、特にアルミニウムが好ましい。有機金属化合物
(B)の具体例を示せば、アルキルリチウム、例えば、
メチルリチウム、エチルリチウム、プロピルリチウム又
はブチルリチウム;ジアルキル亜鉛、例えば、ジメチル
亜鉛、ジエチル亜鉛、ジプロピル亜鉛又はジブチル亜鉛
等がある。As the organic metal compound (B), any organic compound containing a metal of Groups 1 to 3 of the periodic table can be preferably used. Examples of the metals of Groups 1 to 3 of the periodic table include lithium, sodium, potassium, zinc, cadmium, aluminum and the like, and aluminum is particularly preferable. Specific examples of the organometallic compound (B) include alkyllithium, for example,
Methyl lithium, ethyl lithium, propyl lithium or butyl lithium; dialkyl zincs such as dimethyl zinc, diethyl zinc, dipropyl zinc or dibutyl zinc.
【0034】また、有機アルミニウム化合物としては、
一般式
AlR2 mX2 3-m
(式中、R2は炭素原子数1〜10のアルキル基、シク
ロアルキル基又はアリール基であり、mは1〜3の整数
であり、X2はハロゲン原子例えば塩素原子又は臭素原
子である)で表わされる化合物が広く用いられる。具体
的には、トリアルキルアルミニウム化合物、例えば、ト
リメチルアルミニウム、トリエチルアルミニウム、トリ
イソプロピルアルミニウム、トリイソブチルアルミニウ
ム又はトリオクチルアルミニウム;あるいは、ジアルキ
ルアルミニウムモノハライド化合物、例えば、ジエチル
アルミニウムモノクロリド、ジプロピルアルミニウムモ
ノクロリド又はジオクチルアルミニウムモノクロリド等
を挙げることができる。As the organoaluminum compound,
In the general formula AlR 2 m X 2 3-m ( wherein, R 2 is an alkyl group, a cycloalkyl group or an aryl group having 1 to 10 carbon atoms, m is an integer of 1 to 3, X 2 is a halogen Compounds represented by atoms such as chlorine or bromine are widely used. Specifically, trialkyl aluminum compounds such as trimethyl aluminum, triethyl aluminum, triisopropyl aluminum, triisobutyl aluminum or trioctyl aluminum; or dialkyl aluminum monohalide compounds such as diethyl aluminum monochloride and dipropyl aluminum monochloride. Alternatively, dioctylaluminum monochloride and the like can be mentioned.
【0035】前記電子供与性化合物(C)は、必要に応
じて併用することができる。この場合、電子供与性化合
物(C)としては、前記の固体触媒成分(A)の調製の
際に用いた電子供与性化合物(c)と同様のものを用い
ることができる。この際、電子供与性化合物(C)は、
前記の固体触媒成分(A)の調製の際に用いた電子供与
性化合物(c)と同じものであっても、異なるものであ
ってもよい。The electron donating compound (C) can be used in combination, if necessary. In this case, as the electron donating compound (C), the same one as the electron donating compound (c) used in the preparation of the solid catalyst component (A) can be used. At this time, the electron donating compound (C) is
It may be the same as or different from the electron-donating compound (c) used in the preparation of the solid catalyst component (A).
【0036】本発明のポリプロピレンは、上記触媒を用
いて製造することができる。重合条件は特に制限され
ず、公知の方法と同様の条件を用いることができ、例え
ば、大気圧よりも高いプロピレンの分圧下で、−80℃
〜+150℃の温度下で、場合により不活性炭化水素希
釈剤の存在下で、液相又は気相中で実施することができ
る。この場合、本発明のポリプロピレンは、実質的に一
段階の重合によって製造することが好ましく、これによ
り良好な品質を得ることができ、かつ安価に製造するこ
とができる。このようにして得られたポリプロピレンパ
ウダーは球状に近く、さらに粒径分布もシャープであ
る。即ち、前述の球形度(S)が1.60未満であり、
かつ粒径分布指数(P)が5.0未満である。The polypropylene of the present invention can be produced using the above catalyst. The polymerization conditions are not particularly limited, and the same conditions as known methods can be used, for example, under a partial pressure of propylene higher than atmospheric pressure, at −80 ° C.
It can be carried out in the liquid phase or in the gas phase at a temperature of ˜ + 150 ° C., optionally in the presence of an inert hydrocarbon diluent. In this case, the polypropylene of the present invention is preferably produced by substantially one-step polymerization, whereby good quality can be obtained and the production can be performed at low cost. The polypropylene powder thus obtained is nearly spherical and has a sharp particle size distribution. That is, the above-mentioned sphericity (S) is less than 1.60,
And the particle size distribution index (P) is less than 5.0.
【0037】本発明のポリプロピレン樹脂組成物は、少
なくとも、上記本発明のポリプロピレンを含み、必要に
応じてEPR,EPDM,ポリエチレン,EBR,ポリ
ブテン−1等を含んでもよい。また、本発明のポリプロ
ピレン樹脂組成物には、各種安定剤,顔料,分散剤,造
核剤等の添加剤を必要に応じて配合してもよい。The polypropylene resin composition of the present invention contains at least the above-mentioned polypropylene of the present invention, and may optionally contain EPR, EPDM, polyethylene, EBR, polybutene-1 and the like. Further, additives such as various stabilizers, pigments, dispersants and nucleating agents may be added to the polypropylene resin composition of the present invention as required.
【0038】[0038]
【実施例】次に、実施例及び比較例により本発明を具体
的に示すが、本発明は下記実施例に限定されるものでは
ない。なお、以下の実施例、比較例においては、下記の
試薬を用いた。
金属マグネシウム:顆粒状(平均粒度350μm)
エタノール:和光純薬(株)製、試薬特級
ヨウ素:和光純薬(株)製、試薬特級EXAMPLES Next, the present invention will be specifically shown by Examples and Comparative Examples, but the present invention is not limited to the following Examples. In addition, the following reagents were used in the following Examples and Comparative Examples. Metallic magnesium: Granular (average particle size 350 μm) Ethanol: Wako Pure Chemical Industries, Ltd., reagent special grade Iodine: Wako Pure Chemical Industries, Ltd., reagent special grade
【0039】実施例1
(1)固体生成物(a)の調製
攪拌機付きのガラス製反応器(内容積約6リットル)を
窒素ガスで充分に置換し、エタノール約2430g、ヨ
ウ素16g及び金属マグネシウム160gを投入し、攪
拌しながら還流条件下で系内から水素ガスの発生がなく
なるまで、加熱下で反応させ、固体状反応生成物を得
た。この固体状生成物を含む反応液を減圧下乾燥させる
ことにより、固体生成物(a)を得た。得られた固体生
成物(a)の球形度(S)は1.20、粒径分布指数
(P)は1.8であった。 Example 1 (1) Preparation of solid product (a) A glass reactor equipped with a stirrer (internal volume: about 6 liters) was sufficiently replaced with nitrogen gas, and about 2430 g of ethanol, 16 g of iodine and 160 g of magnesium metal were obtained. Was added, and the mixture was reacted with heating under reflux until the generation of hydrogen gas disappeared from the inside of the system under stirring, to obtain a solid reaction product. The reaction liquid containing this solid product was dried under reduced pressure to obtain a solid product (a). The resulting solid product (a) had a sphericity (S) of 1.20 and a particle size distribution index (P) of 1.8.
【0040】(2)固体触媒成分(A)の調製
窒素ガスで充分に置換したガラス製三ツ口フラスコ(内
容積500ml)に、前記固体生成物(a)(粉砕して
いないもの)16g、精製ヘプタン80ml、四塩化ケ
イ素2.4ml及びフタル酸ジエチル2.3mlを加え
た。系内を90℃に保ち、攪拌しながら四塩化チタン7
7mlを投入して110℃で2時間反応させた後、固体
成分を分離して80℃の精製ヘプタンで洗浄した。さら
に、四塩化チタン122mlを加え、110℃で2時間
反応させた後、精製ヘプタンで充分に洗浄し、固体触媒
成分(A)を得た。(2) Preparation of solid catalyst component (A) In a glass three-necked flask (internal volume: 500 ml) sufficiently replaced with nitrogen gas, 16 g of the above solid product (a) (not crushed) and purified heptane 80 ml, 2.4 ml of silicon tetrachloride and 2.3 ml of diethyl phthalate were added. Maintaining the system temperature at 90 ° C, stirring titanium tetrachloride 7
After adding 7 ml and reacting at 110 ° C. for 2 hours, solid components were separated and washed with purified heptane at 80 ° C. Further, 122 ml of titanium tetrachloride was added, and the mixture was reacted at 110 ° C. for 2 hours and then thoroughly washed with purified heptane to obtain a solid catalyst component (A).
【0041】(3)プロピレンの重合
スチレンスチール製オートクレーブ(内容積約5リット
ル)に、ポリプロピレンパウダーを30g投入し、系内
を窒素ガスで充分置換した後、トリエチルアルミニウム
2.0ミリモル、ジフェニルジメトキシシラン0.5ミ
リモル及び前記固体触媒成分(A)をチタン原子換算で
0.01ミリモル投入し、さらに水素0.7Kg/cm
2G及びプロピレン27.3Kg/cm2Gを導入し、全
圧28.0Kg/cm2G、70℃において2時間重合
を行ない。プロピレン単独重合体を得た。(3) Polymerization of Propylene 30 g of polypropylene powder was placed in an autoclave made of styrene steel (internal volume of about 5 liters), the system was sufficiently replaced with nitrogen gas, and then 2.0 mmol of triethylaluminum and diphenyldimethoxysilane were added. 0.5 mmol and 0.01 mmol of the solid catalyst component (A) in terms of titanium atom were added, and further hydrogen was 0.7 kg / cm.
2 G and propylene 27.3 Kg / cm 2 G were introduced, and polymerization was carried out at a total pressure of 28.0 Kg / cm 2 G and 70 ° C. for 2 hours. A propylene homopolymer was obtained.
【0042】実施例2
(3)プロピレンの重合において、ジフェニルジメトキ
シシランの代りにシクロヘキシルメチルジメトキシシラ
ンを0.3ミリモル使用した以外は、実施例1と同様に
して重合を行ない、プロピレン単独重合体を得た。 Example 2 (3) Polymerization of propylene was carried out in the same manner as in Example 1 except that 0.3 mmol of cyclohexylmethyldimethoxysilane was used in place of diphenyldimethoxysilane in the polymerization of propylene to obtain a propylene homopolymer. Obtained.
【0043】実施例3
(3)プロピレンの重合において、水素投入量を2.0
Kg/cm2Gに増加させた以外は、実施例1と同様に
して重合を行ない、プロピレン単独重合体を得た。 Example 3 (3) In the polymerization of propylene, the amount of hydrogen added was 2.0.
Polymerization was performed in the same manner as in Example 1 except that the content was increased to Kg / cm 2 G to obtain a propylene homopolymer.
【0044】比較例1
ステンレス製オートクレーブ(内容積10リットル)に
精製ヘプタン5リットルを投入し、ジエチルアルミニウ
ムクロライド(DEAC)5ml、TiCl3触媒(ソ
ルベー社製タイプ01)0.7gを引き続き投入する。
所定量の水素及びプロピレンを導入し、70℃、全圧
8.0Kg/cm2で90分重合した後、系内から反応
ガスをパージする。次いで、n−ブチルアルコール50
mlを加えて、30分間、同温度で加熱攪拌した後、固
体生成物を濾別し、減圧乾燥してプロピレン単独重合体
を得た。 Comparative Example 1 5 liters of purified heptane was put into a stainless steel autoclave (internal volume 10 liters), 5 ml of diethylaluminum chloride (DEAC) and 0.7 g of TiCl 3 catalyst (Type 01 made by Solvay Co., Ltd.) were successively put in.
After introducing a predetermined amount of hydrogen and propylene and polymerizing at 70 ° C. and a total pressure of 8.0 Kg / cm 2 for 90 minutes, the reaction gas is purged from the system. Then, n-butyl alcohol 50
After adding ml and heating and stirring at the same temperature for 30 minutes, the solid product was separated by filtration and dried under reduced pressure to obtain a propylene homopolymer.
【0045】比較例2
(1)固体触媒成分の調製
無水塩化マグネシウム30g、n−ヘプタン150ml
及び塩化マグネシウムに対し6倍molのエタノールを
窒素ガスで充分置換された攪拌機付きガラス製反応器に
導入し、還流条件下で2時間加熱攪拌した。次いで、こ
の反応液を−20℃に冷却した四塩化チタン1500m
lの入った攪拌機付きガラス製反応器に圧送し、攪拌し
ながら室温まで昇温した後、ジブチルフタレート160
mlを投入し、110℃で2時間加熱攪拌した。生成し
た固体成分を分離し、さらに150mlの四塩化チタン
中で再度110℃において2時間の加熱攪拌を行なった
後、精製したn−ヘプタンで充分洗浄して固体触媒成分
を得た。
(2)プロピレンの重合
得られた固体触媒成分を用いて実施例1(3)と同様に
して重合を行ない、プロピレンパウダーを得た。 Comparative Example 2 (1) Preparation of solid catalyst component Anhydrous magnesium chloride 30 g, n-heptane 150 ml
Further, 6 times mol of ethanol with respect to magnesium chloride was introduced into a glass reactor equipped with a stirrer, which was sufficiently replaced with nitrogen gas, and the mixture was heated and stirred for 2 hours under reflux conditions. Then, this reaction liquid was cooled to -20 ° C, and titanium tetrachloride 1500 m
It was fed under pressure to a glass reactor equipped with a stirrer and heated to room temperature with stirring, and then dibutyl phthalate 160 was added.
ml was added and the mixture was heated with stirring at 110 ° C. for 2 hours. The produced solid component was separated, and again heated and stirred in 150 ml of titanium tetrachloride at 110 ° C. for 2 hours, and then sufficiently washed with purified n-heptane to obtain a solid catalyst component. (2) Polymerization of propylene Polymerization was carried out in the same manner as in Example 1 (3) using the obtained solid catalyst component to obtain propylene powder.
【0046】比較例3
(1)固体触媒成分の調製
比較例2と同様にして調製した。
(2)プロプレンの重合
実施例1と同様の方法で行なったが、但し、先ず極限粘
度[η]=5.0となる様な水素/プロピレン組成で重
合した後、系内の反応ガスを全てパージし、次いで
[η]=1.0となる様な反応ガス組成で前段/後段の
反応量比が55%/45%となるよう調節して再び重合
を行ない、最終的なプロピレン単独重合体を得た。 Comparative Example 3 (1) Preparation of solid catalyst component A solid catalyst component was prepared in the same manner as in Comparative Example 2. (2) Polymerization of propylene Preparative polymerization was carried out in the same manner as in Example 1, except that first, the polymerization was carried out with a hydrogen / propylene composition such that the intrinsic viscosity [η] = 5.0, and then all the reaction gases in the system were After purging, and then adjusting the reaction gas composition such that [η] = 1.0 so that the reaction amount ratio of the first stage / the second stage is 55% / 45%, polymerization is carried out again, and the final propylene homopolymer is obtained. Got
【0047】比較例4
(1)固体触媒成分の調製
窒素ガスで充分置換された攪拌機付きガラス製反応器
に、精製したn−ヘプタン600ml、ジエチルアルミ
ニウムクロライド0.5mol、ジイソアミルエーテル
1.2molを投入し、室温で5分間反応させた。別に
用意した反応器中に四塩化チタン4.0molを入れ、
次いで上記反応液を180分間かけて滴下した後、室温
で80分間反応させ、さらに75℃に昇温した後、1時
間加熱攪拌した。得られた固体生成物を精製ヘプタンで
充分洗浄した後、さらにn−ヘプタン3リットル、ジイ
ソアミルエーテル160g、四塩化チタン350gを加
え65℃で1時間反応させ、さらにヘプタンで再び充分
洗浄した後、減圧乾燥にて固体触媒成分を得た。 Comparative Example 4 (1) Preparation of solid catalyst component In a glass reactor equipped with a stirrer, which was sufficiently replaced with nitrogen gas, 600 ml of purified n-heptane, 0.5 mol of diethylaluminum chloride and 1.2 mol of diisoamyl ether were added. It was charged and reacted at room temperature for 5 minutes. Titanium tetrachloride (4.0 mol) was placed in a separately prepared reactor,
Next, the above reaction solution was added dropwise over 180 minutes, reacted at room temperature for 80 minutes, further heated to 75 ° C., and then heated and stirred for 1 hour. After thoroughly washing the obtained solid product with purified heptane, 3 liters of n-heptane, 160 g of diisoamyl ether and 350 g of titanium tetrachloride were added, and the mixture was reacted at 65 ° C. for 1 hour, and further thoroughly washed with heptane, A solid catalyst component was obtained by drying under reduced pressure.
【0048】(2)予備重合触媒の調製
ステンレス製オートクレーブ(内容積10リットル)に
n−ヘプタン5リットル、ジエチルアルミニウムクロラ
イド14g,上記固体触媒成分10gを投入し、水素を
全圧が3Kg/cm2Gになるように導入した後、プロ
ピレンを全圧8Kg/cm2となるように導入して5分
間反応させた。次いで系内を脱気し、反応液中の固体生
成物を濾別し、減圧乾燥して予備重合触媒を得た。(2) Preparation of prepolymerization catalyst: A stainless autoclave (internal volume: 10 liters) was charged with 5 liters of n-heptane, 14 g of diethylaluminum chloride and 10 g of the above solid catalyst component, and the total pressure of hydrogen was 3 Kg / cm 2. After introducing so as to have G, propylene was introduced so as to have a total pressure of 8 Kg / cm 2 and reacted for 5 minutes. Then, the system was degassed, the solid product in the reaction solution was filtered off, and dried under reduced pressure to obtain a prepolymerized catalyst.
【0049】(3)プロピレンの重合
ステンレス製オートクレーブ(内容積10リットル)に
精製ヘプタン4リットル、次いでジエチルアルミニウム
クロライド(DEAC)0,4g、前記予備重合触媒
0.4g、P−トルイル酸メチル0.44g(井上香料
社製)を投入した後、比較例3と同様に、極限粘度
[η]=5.0、[η]=1.0がそれぞれ55%,4
5%となるように2段階で重合を行なった。得られたポ
リプロピレンスラリーにn−ブチルアルコール50ml
を添加し、70℃で30分間加熱攪拌した後、濾別し、
減圧乾燥してプロピレン単独重合体を得た。(3) Polymerization of Propylene 4 liters of purified heptane was placed in a stainless steel autoclave (internal volume: 10 liters), 0.4 g of diethylaluminum chloride (DEAC), 0.4 g of the prepolymerized catalyst, and 0.4 g of methyl P-toluate. After adding 44 g (manufactured by Inoue Fragrance Co., Ltd.), as in Comparative Example 3, the intrinsic viscosities [η] = 5.0 and [η] = 1.0 were 55% and 4 respectively.
Polymerization was carried out in two steps so that the concentration became 5%. 50 ml of n-butyl alcohol in the obtained polypropylene slurry
Was added, and the mixture was heated and stirred at 70 ° C. for 30 minutes, filtered,
It was dried under reduced pressure to obtain a propylene homopolymer.
【0050】上記実施例1〜3及び比較例1〜4で得ら
れたポリプロピレン樹脂のペンタッド分率(mmmm
%)、昇温分別法による主溶出ピーク位置(Tmax)
(℃)及び主溶出ピークの半値幅(σ)(度)、メルト
インデックス(MI)(g/10分)、溶融張力を、そ
れぞれ下記の測定方法及び測定条件に基づいて求めた。
結果を表1に示す。Pentad fraction (mmmm) of the polypropylene resins obtained in Examples 1 to 3 and Comparative Examples 1 to 4 above.
%), Main elution peak position (Tmax) by the temperature-raising fractionation method
(° C.), full width at half maximum (σ) (degree) of main elution peak, melt index (MI) (g / 10 minutes), and melt tension were determined based on the following measurement methods and measurement conditions, respectively.
The results are shown in Table 1.
【0051】ペンタッド分率
測定機器として日本電子社製のJNM−EX400(13
C核共鳴周波数100MHZ)を用い、次の条件で測定
した。
測定モード : スカラーデカップリング法
パルス幅 : 9.0μs(45°)
パルス繰り返し時間: 4s
積算回数 : 10000回
溶媒 : 1,2,4−トリクロロベンゼ
ン/重ベンゼンの混合溶媒(90/10容量%)
試料濃度 : 200mg/3.0ml溶媒
測定温度 : 130℃
この場合、ペンタッド分率は13C−NMRスペクトルの
メチル基領域における分裂ピークの測定により求めた。
また、メチル基領域のピークの帰属は、[Macromolecul
es, 13(2), 267(1980)(A.Zambelli ら)]によった。As a pentad fraction measuring instrument, JNM-EX400 ( 13
It was measured under the following conditions using a C nuclear resonance frequency of 100 MHz. Measurement mode: Scalar decoupling method Pulse width: 9.0 μs (45 °) Pulse repetition time: 4 s Accumulation number: 10,000 times Solvent: 1,2,4-Trichlorobenzene / deuterated benzene mixed solvent (90/10% by volume) Sample concentration: 200 mg / 3.0 ml Solvent measurement temperature: 130 ° C. In this case, the pentad fraction was determined by measuring the split peak in the methyl group region of the 13 C-NMR spectrum.
In addition, the attribution of the peak in the methyl group region is [Macromolecul
es, 13 (2), 267 (1980) (A. Zambelli et al.)].
【0052】Tmax及びσ
次の条件で測定した。
溶媒 : オルトジクロルベンゼン
流速 : 2ml/min
昇温速度 : 20℃/hr
検出器 : 液クロ用赤外検出器
測定波数 : 3.41μm
カラム : 1.07cmφ×30cm
充填剤 : クロモソルブP
濃度 : 7.5mg/20ml
注入量 : 2ml
カラム温度分布: ±0.2℃以内
この場合、カラム内に試料溶液を135℃条件下で導入
した後、2℃/hrで除冷してポリマーを充填剤に吸着
させ、室温まで冷却した後、カラム温度を上記条件で昇
温させることにより、各温度で溶出したポリマー濃度を
赤外検出器で検出した。 Tmax and σ were measured under the following conditions. Solvent: Orthodichlorobenzene Flow rate: 2 ml / min Temperature rising rate: 20 ° C./hr Detector: Infrared detector for liquid chromatography Measured wave number: 3.41 μm Column: 1.07 cmφ × 30 cm Filler: Chromosolve P concentration: 7 0.5 mg / 20 ml Injection volume: 2 ml Column temperature distribution: Within ± 0.2 ° C In this case, the sample solution was introduced into the column under the conditions of 135 ° C and then cooled at 2 ° C / hr to use the polymer as the packing material. After adsorption and cooling to room temperature, the column temperature was raised under the above conditions, and the concentration of polymer eluted at each temperature was detected by an infrared detector.
【0053】MI
JIS K 7210に準拠して測定した。溶融張力
メルトテンションテスター(東洋精機株式会社製)を用
い、溶融温度230℃で試料を溶融し、ノズル(孔径:
2.10mm、長さ:8.00mm、シリンダー内径
9.55mm)より一定速度(ピストン下降速度:10
mm/min)で押出し、ロードセルを介して押出され
た溶融ストランドを一定速度(20rpm)で回転して
いるローラー(外径:5.0cm)で引き取るときに発
生する応力を測定して溶融張力(g)を求めた。It was measured according to MI JIS K 7210. Melt tension Using a melt tension tester (manufactured by Toyo Seiki Co., Ltd.), the sample is melted at a melting temperature of 230 ° C. and a nozzle (pore diameter:
2.10mm, Length: 8.00mm, Cylinder inner diameter 9.55mm) From constant speed (Piston descending speed: 10
mm / min), and the stress generated when the molten strand extruded through the load cell is taken up by a roller (outer diameter: 5.0 cm) rotating at a constant speed (20 rpm) to measure the melt tension ( g) was determined.
【0054】また、得られた樹脂にフェノール系酸化防
止剤0.1%、ステアリン酸カルシウム0.1%を添加
し、20mm単軸造粒機にてペレット化した後、プレス
板成形を行ない、物性測定用のサンプルを作製し、物性
の測定を行なった。物性の測定は、引張弾性率(Kg/
cm2)及び熱変形温度(荷重たわみ温度)(HDT)
(℃)について行なった。結果を表1に示す。なお、各
物性の評価は以下の方法によって行なった。Further, 0.1% of phenolic antioxidant and 0.1% of calcium stearate were added to the obtained resin and pelletized with a 20 mm uniaxial granulator, followed by press plate molding to obtain physical properties. A sample for measurement was prepared and the physical properties were measured. The physical properties are measured by the tensile modulus (Kg /
cm 2 ) and heat distortion temperature (deflection temperature under load) (HDT)
(° C). The results are shown in Table 1. The evaluation of each physical property was performed by the following methods.
【0055】引張弾性率
JIS−K7113に準拠して測定した。HDT
JIS−K7207に準拠して測定した。なお、測定サ
ンプルはアニールを行なわずに用い、サンプルに負荷す
る曲げ応力は4.6Kg/cm2とした。 Tensile elastic modulus was measured according to JIS-K7113. It was measured according to HDT JIS-K7207. The measurement sample was used without annealing, and the bending stress applied to the sample was 4.6 Kg / cm 2 .
【0056】[0056]
【表1】 [Table 1]
【0057】[0057]
【発明の効果】以上説明したように、本発明のポリプロ
ピレン樹脂及びその組成物は、極めて高い剛性、耐熱性
及び溶融張力を有し、しかもコスト的に有利なものであ
る。As described above, the polypropylene resin of the present invention and the composition thereof have extremely high rigidity, heat resistance and melt tension, and are advantageous in terms of cost.
【図1】昇温分別法による主溶出ピーク位置(Tma
x)及びピークの半値幅(σ)を示した分析チャートで
ある。FIG. 1 Main elution peak position (Tma
x) and the half-value width (σ) of the peak.
Tmax…主溶出ピーク位置 σ…ピークの半値幅 Tmax ... Main elution peak position σ ... half width of peak
Claims (3)
ピレン単独重合体からなることを特徴とするポリプロピ
レン樹脂。13 C−NMRで測定したペンタッド分率においてmm
mm分率が96.0%以上 昇温分別法での主溶出ピークの位置(Tmax)が1
17.0℃以上で、かつそのピークの半値幅(σ)が
4.0度未満 メルトインデックスが0.01g/10分以上、3.
0g/10分以下 230℃で測定した溶融張力(T)とMIとの関係が T≧−5.2 logMI+3.01. A polypropylene resin comprising a propylene homopolymer having the following characteristics and: Mm in pentad fraction measured by 13 C-NMR
The mm fraction is 96.0% or more, and the position (Tmax) of the main elution peak in the temperature rising fractionation method is 1
The temperature at 17.0 ° C. or higher and the half width (σ) of the peak is less than 4.0 degrees. The melt index is 0.01 g / 10 minutes or more, 3.
The relationship between the melt tension (T) and MI measured at 230 ° C. for 0 g / 10 minutes or less is T ≧ −5.2 logMI + 3.0.
一段階で行なわれるものである請求項1記載のポリプロ
ピレン樹脂。2. The polypropylene resin according to claim 1, wherein the polymerization of the propylene homopolymer is carried out in substantially one step.
脂を含有することを特徴とするポリプロピレン系樹脂組
成物。3. A polypropylene-based resin composition comprising the polypropylene resin according to claim 1 or 2.
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3183634A JP2521382B2 (en) | 1991-06-28 | 1991-06-28 | Polypropylene resin |
| EP92912913A EP0546191B1 (en) | 1991-06-27 | 1992-06-25 | Polypropylene resin and its composition |
| DE69222005T DE69222005T2 (en) | 1991-06-27 | 1992-06-25 | POLYPROPYLENE RESIN AND COMPOSITION THEREOF |
| PCT/JP1992/000807 WO1993000375A1 (en) | 1991-06-27 | 1992-06-25 | Polypropylene resin and its composition |
| AU21666/92A AU649872B2 (en) | 1991-06-27 | 1992-06-25 | Polypropylene resin and its composition |
| CA002089818A CA2089818C (en) | 1991-06-27 | 1992-06-25 | Polypropylene based resins and their compositions |
| US07/974,591 US5332789A (en) | 1991-06-27 | 1992-06-25 | Polypropylene block copolymer resin and compositions |
| ES92912913T ES2106873T3 (en) | 1991-06-27 | 1992-06-25 | POLYPROPYLENE RESIN AND ITS COMPOSITION. |
| KR1019930700586A KR970009997B1 (en) | 1991-06-27 | 1993-02-26 | Polypropylene Resin and Compositions thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3183634A JP2521382B2 (en) | 1991-06-28 | 1991-06-28 | Polypropylene resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH059226A true JPH059226A (en) | 1993-01-19 |
| JP2521382B2 JP2521382B2 (en) | 1996-08-07 |
Family
ID=16139212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3183634A Expired - Lifetime JP2521382B2 (en) | 1991-06-27 | 1991-06-28 | Polypropylene resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2521382B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995031490A1 (en) * | 1994-05-12 | 1995-11-23 | Showa Denko K. K. | Propylene polymer, process for producing the same, composition thereof, polymerization catalyst component, and process for producing the same |
| WO1999062987A1 (en) * | 1998-05-29 | 1999-12-09 | Mitsubishi Plastics, Inc. | Polyolefin film for stretch packaging |
| US6184328B1 (en) | 1994-09-07 | 2001-02-06 | Showa Denko Kabushiki Kaisha | Propylene-based polymer, method for its production, composition thereof, catalyst component for polymerization, and method for its production |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59149907A (en) * | 1983-02-15 | 1984-08-28 | Idemitsu Petrochem Co Ltd | Crystalline polypropylene and its production |
| JPH03111404A (en) * | 1989-09-26 | 1991-05-13 | Chisso Corp | Highly stereoregular polypropylene |
-
1991
- 1991-06-28 JP JP3183634A patent/JP2521382B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59149907A (en) * | 1983-02-15 | 1984-08-28 | Idemitsu Petrochem Co Ltd | Crystalline polypropylene and its production |
| JPH03111404A (en) * | 1989-09-26 | 1991-05-13 | Chisso Corp | Highly stereoregular polypropylene |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995031490A1 (en) * | 1994-05-12 | 1995-11-23 | Showa Denko K. K. | Propylene polymer, process for producing the same, composition thereof, polymerization catalyst component, and process for producing the same |
| US5916990A (en) * | 1994-05-12 | 1999-06-29 | Showa Denko K.K. | Propylene-based polymer, method of its production, composition thereof, catalyst component for polymerization, and method for its production |
| US6323298B1 (en) | 1994-05-12 | 2001-11-27 | Showa Denko K.K. | Propylene-based polymer, method for its production, composition thereof, catalyst component for polymerization, and method for its production |
| US6184328B1 (en) | 1994-09-07 | 2001-02-06 | Showa Denko Kabushiki Kaisha | Propylene-based polymer, method for its production, composition thereof, catalyst component for polymerization, and method for its production |
| WO1999062987A1 (en) * | 1998-05-29 | 1999-12-09 | Mitsubishi Plastics, Inc. | Polyolefin film for stretch packaging |
| US6541123B1 (en) | 1998-05-29 | 2003-04-01 | Mitsubishi Plastics, Inc. | Polyolefin film for stretch packaging |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2521382B2 (en) | 1996-08-07 |
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