JPH0594941A - Electron beam exposing device - Google Patents

Abstract

(57) [Abstract] [PROBLEMS] To improve the structure of an electron beam exposure apparatus. Secondary electron emission that can prevent vapor from entering a column portion from a chamber and that can be easily and easily provided. An object is to provide an electron beam exposure apparatus equipped with a plate. An electron beam exposure apparatus for irradiating an irradiation target 7 mounted on a mounting table 4 in a chamber 3 provided below the column 2 with an electron beam emitted from an electron gun 1 and passing through the column 2. At the connection between the column portion 2 and the chamber 3, a secondary electron emission plate 5 that emits secondary electrons from the position where the electron beam is irradiated, and a DC voltage is applied to the secondary electron emission plate 5. And a direct current power supply 6 that operates.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improved structure of an electron beam exposure apparatus. In the electron beam exposure apparatus used in the manufacturing process of a semiconductor device in recent years, it is necessary to lengthen the cleaning period of the column portion that generates the electron beam as long as possible and to lengthen the period during which the electron beam exposure apparatus can be used continuously. Is.

Under the circumstances as described above, there is a demand for an electron beam exposure apparatus which can make the cleaning cycle of the column portion as long as possible.

[0003]

2. Description of the Related Art A conventional electron beam exposure apparatus will be described in detail with reference to FIG. FIG. 2 is a diagram showing a schematic structure of a conventional electron beam exposure apparatus.

As shown in the figure, the electron beam emitted from the electron gun 1 passes through the column portion 2 and is placed on a stage 4 in a chamber 3 provided in the lower portion of the column portion 2. The object 7 to be irradiated is irradiated.

When the resist film or the like formed on the surface of the object 7 to be irradiated is irradiated with an electron beam, the vapor sublimated from the resist film or the like adheres to the inside of the column part 2 to contaminate the column part 2. It is supposed to do.

[0006]

In the conventional electron beam exposure apparatus described above, when the resist film or the like formed on the surface of the object to be irradiated is irradiated with the electron beam, the resist film or the like sublimes. There is a problem that vapor adheres to the inside of the column section and contaminates the column section, and this contamination easily causes charge-up, which causes problems such as deviation of the electron beam trajectory. was there.

Under the above circumstances, the present invention provides an electron beam equipped with a secondary electron emission plate which can prevent vapor from entering a column portion from a chamber and can be easily and easily provided. The purpose is to provide an exposure apparatus.

[0008]

An electron beam exposure apparatus according to the present invention is designed to emit an electron beam emitted from an electron gun and passing through a column portion,
In the electron beam exposure apparatus for irradiating the irradiation target placed on the stage in the chamber provided at the bottom of the column part,
A connection part between the column part and the chamber is provided with a secondary electron emission plate that emits secondary electrons from the position where the electron beam is irradiated, and a DC power supply that applies a DC voltage to the secondary electron emission plate. To configure.

[0009]

That is, in the present invention, since a secondary electron emission plate is provided at the connection between the column section and the chamber of the electron beam exposure apparatus, and a DC voltage is applied to this secondary electron emission plate by using a DC power source, Since secondary electrons can be emitted from the lower surface of the position where the upper surface of the secondary electron emission plate is irradiated with the electron beam, there is no obstacle to the exposure of the electron beam during the operation of the electron beam exposure apparatus, and the irradiation target is not affected. It is possible to prevent vapor generated from the resist film or the like formed on the surface of the object from entering the column portion from the chamber.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to FIG. FIG. 1 is a diagram showing a schematic structure of an electron beam exposure apparatus of one embodiment according to the present invention.

As shown in the figure, the electron beam emitted from the electron gun 1 passes through the column section 2 and the column section 2 and the chamber 3.
The secondary electron emission plate 5 provided between the and is irradiated. A DC power supply 6 is used for the secondary electron emission plate 5 and the irradiation target 7.
Since a high voltage of 1 KV to 10 KV is applied by this, there is a potential difference between the secondary electron emission plate 5 and the irradiation target 7, and the electrons emitted from the electron gun 1 are the secondary electrons. When colliding with the radiation plate 5, secondary electrons accelerated from the colliding position are radiated, and the secondary electrons can collide with the irradiation target 7.

Since the secondary electron emission plate 5 separates the space between the column portion 2 and the chamber 3 in this manner, the vapor generated in the chamber 3 enters the column portion 2 to cause charge-up to cause an electron beam. It is possible to prevent obstacles where the orbit of the vehicle shifts.

[0013]

As is apparent from the above description, according to the present invention, the column portion and the chamber can be partitioned by the secondary electron emission plate by an extremely simple structure change, so that charge-up occurs. Therefore, there is an advantage that it is possible to prevent the obstacle that the trajectory of the electron beam is deviated, and it is possible to provide an electron beam exposure apparatus which can be expected to be significantly economical and to improve the reliability.

[Brief description of drawings]

FIG. 1 is a diagram showing a schematic structure of an electron beam exposure apparatus according to an embodiment of the present invention,

FIG. 2 is a diagram showing a schematic structure of a conventional electron beam exposure apparatus,

[Explanation of reference numerals] 1 is an electron gun, 2 is a column section, 3 is a chamber, 4 is a stage, 5 is a secondary electron emission plate, 6 is a DC power supply, 7 is an irradiation target,

Claims (1)

[Claims] 1. A chamber in which an electron beam emitted from an electron gun (1) and passing through a column portion (2) is provided below the column portion (2).
(3) In the electron beam exposure apparatus for irradiating the irradiation target (7) placed on the stage (4) in the electron beam, in the connection between the column section (2) and the chamber (3), the electron beam Secondary electron emission plate (5) that emits secondary electrons from the position irradiated by, and a DC power supply that applies a DC voltage to the secondary electron emission plate (5)
(6) An electron beam exposure apparatus comprising: