JPH0597880A - Novel asymmetric axially chiral aminophosphine derivative - Google Patents

Novel asymmetric axially chiral aminophosphine derivative

Info

Publication number
JPH0597880A
JPH0597880A JP25767791A JP25767791A JPH0597880A JP H0597880 A JPH0597880 A JP H0597880A JP 25767791 A JP25767791 A JP 25767791A JP 25767791 A JP25767791 A JP 25767791A JP H0597880 A JPH0597880 A JP H0597880A
Authority
JP
Japan
Prior art keywords
group
lower alkyl
alkyl group
trifluoromethyl
lower alkoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25767791A
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Japanese (ja)
Other versions
JP2939510B2 (en
Inventor
Kazuo Achinami
一雄 阿知波
Katsuya Awano
勝也 粟野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyorin Pharmaceutical Co Ltd
Original Assignee
Kyorin Pharmaceutical Co Ltd
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Abstract

(57)【要約】 (修正有) 【目的】 実用的で有用な不斉合成用触媒の配位子を提
供する。 【構成】 一般式[I] [式中、Rはフッ素で置換されていても良い低級アル
キル基、同ベンジル基、2個のRが相伴って炭素原子
4〜5個からなる環状基を、Rはフェニル基(これ
は、低級アルキル基、低級アルコキシ基、トリフルオロ
メチル基又はハロゲン原子から選ばれる1〜5個で置換
されていても良い)又はシクロヘキシル基を、R,R
,R,Rは同一又は相異なって、水素原子、低級
アルキル基、低級アルコキシ基、トリフルオロメチル基
を、R及びRは同一又は相異なって、低級アルキル
基、低級アルコキシ基、トリフルオロメチル基を表す
か、又はRとR,RとRが相伴って芳香環を表
す]で表される光学活性な軸不斉アミノホスフィン誘導
体。
(57) [Summary] (Modified) [Objective] To provide a practical and useful ligand for a catalyst for asymmetric synthesis. [Structure] General formula [I] [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, the same benzyl group, 2 R 1 are cyclic groups each having 4 to 5 carbon atoms, and R 2 is a phenyl group ( This may be substituted with 1 to 5 selected from a lower alkyl group, a lower alkoxy group, a trifluoromethyl group or a halogen atom) or a cyclohexyl group, and R 3 , R
4 , R 7 and R 8 are the same or different and each represent a hydrogen atom, a lower alkyl group, a lower alkoxy group or a trifluoromethyl group, and R 5 and R 6 are the same or different and a lower alkyl group or a lower alkoxy group. Represents a trifluoromethyl group, or R 4 and R 5 , and R 6 and R 7 together represent an aromatic ring.] An optically active axially chiral aminophosphine derivative.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、各種有機合成反応、特
に不斉水素化反応などの触媒の配位子として有用な新規
な軸不斉アミノホスフィン誘導体に関するものである。
TECHNICAL FIELD The present invention relates to a novel axially asymmetric aminophosphine derivative useful as a ligand for a catalyst for various organic synthetic reactions, particularly asymmetric hydrogenation reactions.

【0002】[0002]

【従来の技術】現在不斉合成用触媒の配位子として多数
の光学活性なビスホスフィン及びアミノホスフィン配位
子が開発されている。本発明者らは、先にビスホスフィ
ンの各々のホスフィノ基の電子的、立体的環境を変え、
別々の機能を持たせることにより触媒活性の高効率化を
達成できることを発見した(特開昭63−5094号、
特開昭64−19085号)。しかし、軸不斉を有する
アミノホスフィン誘導体は新規である。
2. Description of the Related Art Many optically active bisphosphine and aminophosphine ligands have been developed as ligands for asymmetric synthesis catalysts. The present inventors previously changed the electronic and steric environment of each phosphino group of bisphosphine,
It has been discovered that high efficiency of catalytic activity can be achieved by providing different functions (JP-A-63-5094,
JP-A-64-19085). However, aminophosphine derivatives having axial asymmetry are novel.

【0003】[0003]

【発明が解決しようとする課題及び課題を解決するため
の手段】従来のアミノホスフィン誘導体は、そのパラジ
ウムあるいはニッケル錯体を触媒とする不斉ヒドロシリ
ル化もしくは不斉クロスカップリング反応(Chem.
Lett.,999(1990)、TL Assymm
etry ,151(1990))等に特徴を示すも
のの不斉収率が不十分である。
Problems to be Solved by the Invention and Means for Solving the Problems Conventional aminophosphine derivatives are asymmetric hydrosilylation or asymmetric cross-coupling reactions (Chem.
Lett. , 999 (1990), TL Assymm
However, the asymmetric yield is inadequate although it is characterized by "Etry 1 , 151 (1990)" and the like.

【0004】このため窒素及びリン上の電子的、立体的
環境の異なった軸不斉アミノホスフィン誘導体[I]を
着想し、研究の結果、本発明化合物が実用的で有用な不
斉合成用触媒の配位子であることを見出し、本発明を完
成したものである。
Therefore, the present inventors have conceived an axially asymmetric aminophosphine derivative [I] having different electronic and steric environments on nitrogen and phosphorus, and as a result of research, the compounds of the present invention are practical and useful catalysts for asymmetric synthesis. The present invention has been completed by discovering that it is a ligand of

【0005】[0005]

【化18】 [Chemical 18]

【0006】[式中、R1 はフッ素で置換されていても
良い低級アルキル基、置換されていても良いベンジル
基、2個のR1 が相伴って炭素原子4もしくは5個から
なる環状基を、R2 はフェニル基(該フェニル基は、低
級アルキル基、低級アルコキシ基、トリフルオロメチル
基又はハロゲン原子から選ばれる1〜5個で置換されて
いても良い)又はシクロヘキシル基を、R3 ,R4 ,R
7 ,R8 は同一又は相異なって、水素原子、低級アルキ
ル基、低級アルコキシ基、トリフルオロメチル基を、R
5 及びR6 は同一又は相異なって、低級アルキル基、低
級アルコキシ基、トリフルオロメチル基を表すか、又は
4 とR5 、R6 とR7 が相伴って芳香環を表す]本発
明によれば、前記一般式[I]で表される軸不斉アミノ
ホスフィン誘導体は、以下に述べる経路により製造する
ことが出来る。
[Wherein R 1 is a lower alkyl group which may be substituted with fluorine, an optionally substituted benzyl group, and two R 1 are cyclic groups each having 4 or 5 carbon atoms. R 2 is a phenyl group (the phenyl group may be substituted with 1 to 5 selected from a lower alkyl group, a lower alkoxy group, a trifluoromethyl group or a halogen atom) or a cyclohexyl group, and R 3 , R 4 , R
7 , R 8 are the same or different and each represent a hydrogen atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, R
5 and R 6 are the same or different and represent a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 , R 6 and R 7 together represent an aromatic ring. According to the above, the axially asymmetric aminophosphine derivative represented by the general formula [I] can be produced by the route described below.

【0007】(1)一般式[I]で表される化合物は、
一般式[VI]で表される化合物を光学分割後、ホスフィ
ニル基を還元することにより製造することができる。
(1) The compound represented by the general formula [I] is
It can be produced by optically resolving the compound represented by the general formula [VI] and then reducing the phosphinyl group.

【0008】[0008]

【化19】 [Chemical 19]

【0009】[式中、R1 はフッ素で置換されていても
良い低級アルキル基、置換されていても良いベンジル
基、2個のR1 が相伴って炭素原子4もしくは5個から
なる環状基を、R2 はフェニル基(該フェニル基は、低
級アルキル基、低級アルコキシ基、トリフルオロメチル
基又はハロゲン原子から選ばれる1〜5個で置換されて
いても良い)又はシクロヘキシル基を、R3 ,R4 ,R
7 ,R8 は同一又は相異なって、水素原子、低級アルキ
ル基、低級アルコキシ基、トリフルオロメチル基を、R
5 及びR6 は同一又は相異なって、低級アルキル基、低
級アルコキシ基、トリフルオロメチル基を表すか、又は
4 とR5 、R6 とR7 が相伴って芳香環を表す]ここ
で、光学分割は例えば(1S)−(+)−10−カンフ
ァースルホン酸、(−)−O,O’−ジベンゾイル酒石
酸等の酸とのジアステレオマー塩の形成による分割も可
能であるが、光学活性カラム、例えばキラルパックOT
(+)(ダイセル社製)を用いた分取が有効である。
[In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1 are cyclic groups each having 4 or 5 carbon atoms. R 2 is a phenyl group (the phenyl group may be substituted with 1 to 5 selected from a lower alkyl group, a lower alkoxy group, a trifluoromethyl group or a halogen atom) or a cyclohexyl group, and R 3 , R 4 , R
7 , R 8 are the same or different and each represent a hydrogen atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, R
5 and R 6 are the same or different and represent a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 , R 6 and R 7 together represent an aromatic ring] The optical resolution can be performed by forming a diastereomeric salt with an acid such as (1S)-(+)-10-camphorsulfonic acid or (-)-O, O'-dibenzoyltartaric acid, but Active column, eg Chiralpak OT
Preparative collection using (+) (manufactured by Daicel) is effective.

【0010】ホスフィニル基の還元は、還元剤として、
例えば水素化リチウムアルミニウム、トリクロロシラン
等の還元剤の使用が可能であるが、トリクロロシランを
用いて、例えばトルエン、クロロベンゼン又はベンゼン
等の溶媒中でのシラン還元が有効である。
The reduction of the phosphinyl group can be carried out as a reducing agent.
For example, reducing agents such as lithium aluminum hydride and trichlorosilane can be used, but silane reduction is effective with trichlorosilane in a solvent such as toluene, chlorobenzene or benzene.

【0011】(2)一般式[I]で表される化合物を製
造する際の光学分割は、一般式[X]で表される化合物
のアミノ基を利用したジアステレオマー塩もしくはジア
ステレオマーであるアミド基の形成によっても行うこと
ができる。
(2) The optical resolution in producing the compound represented by the general formula [I] is a diastereomeric salt or diastereomer utilizing the amino group of the compound represented by the general formula [X]. It can also be done by the formation of certain amide groups.

【0012】[0012]

【化20】 [Chemical 20]

【0013】[式中、R3 ,R4 ,R7 ,R8 は同一又
は相異なって、水素原子、低級アルキル基、低級アルコ
キシ基、トリフルオロメチル基を、R5 及びR6 は同一
又は相異なって、低級アルキル基、低級アルコキシ基、
トリフルオロメチル基を表すか、又はR4 とR5 、R6
とR7 が相伴って芳香環を表し、Xはハロゲン原子を表
す]光学分割は、特にジアステレオマーであるアミド基
を形成して行うことが好ましい。一般式[X]の化合物
と、例えばベンゼン、塩化メチレン等の有機溶媒中、ア
ミン塩基、例えばトリエチルアミン、ピリジン等の塩基
の存在下に、(L)−N−トシルプロリルクロライドと
を反応させることにより、一般式[XI]で表されるジア
ステレオマーアミドが製造できる。この際、アミン塩基
を溶媒として用いることもできる。
[In the formula, R 3 , R 4 , R 7 and R 8 are the same or different and each represents a hydrogen atom, a lower alkyl group, a lower alkoxy group or a trifluoromethyl group, and R 5 and R 6 are the same or different. Differently, a lower alkyl group, a lower alkoxy group,
Represents a trifluoromethyl group, or represents R 4 and R 5 , R 6
And R 7 together represent an aromatic ring and X represents a halogen atom.] The optical resolution is preferably performed by forming an amide group which is a diastereomer. Reacting the compound of the general formula [X] with (L) -N-tosylprolyl chloride in the presence of an amine base such as triethylamine or pyridine in an organic solvent such as benzene or methylene chloride. Thus, the diastereomeric amide represented by the general formula [XI] can be produced. At this time, an amine base can also be used as a solvent.

【0014】[0014]

【化21】 [Chemical 21]

【0015】[式中、R3 ,R4 ,R7 ,R8 は同一又
は相異なって、水素原子、低級アルキル基、低級アルコ
キシ基、トリフルオロメチル基を、R5 及びR6 は同一
又は相異なって、低級アルキル基、低級アルコキシ基、
トリフルオロメチル基を表すか、又はR4 とR5 、R6
とR7 が相伴って芳香環を表し、Xはハロゲン原子を表
す]得られたジアステレオマーアミドをシリカゲルカラ
ムクロマトもしくは高速液体クロマト等により分離した
後、アルカリ水溶液、例えば水酸化ナトリウム、水酸化
カリウム水溶液中で加水分解し、光学活性な一般式
[X]で表される化合物を製造できる。この際、少量の
エタノールの添加も好ましい。
[In the formula, R 3 , R 4 , R 7 and R 8 are the same or different and each represents a hydrogen atom, a lower alkyl group, a lower alkoxy group or a trifluoromethyl group, and R 5 and R 6 are the same or different. Differently, a lower alkyl group, a lower alkoxy group,
Represents a trifluoromethyl group, or represents R 4 and R 5 , R 6
And R 7 together represent an aromatic ring, and X represents a halogen atom.] The obtained diastereomeric amide was separated by silica gel column chromatography, high performance liquid chromatography or the like, and then an aqueous alkali solution such as sodium hydroxide or hydroxide was used. By hydrolyzing in an aqueous potassium solution, an optically active compound represented by the general formula [X] can be produced. At this time, addition of a small amount of ethanol is also preferable.

【0016】光学活性な一般式[X]で表される化合物
を更に誘導することにより、一般式[I]で表される化
合物に導くことができる。
Further derivation of the optically active compound represented by the general formula [X] can lead to the compound represented by the general formula [I].

【0017】(3)一般式[IX]で表される化合物は、
一般式[VII] で表される化合物に一般式[VIII]で表され
る化合物を作用させることにより製造することができ
る。
(3) The compound represented by the general formula [IX] is
It can be produced by reacting the compound represented by the general formula [VII] with the compound represented by the general formula [VIII].

【0018】[0018]

【化22】 [Chemical formula 22]

【0019】[式中、R1 はフッ素で置換されていても
良い低級アルキル基、置換されていても良いベンジル
基、2個のR1 が相伴って炭素原子4もしくは5個から
なる環状基を、R2 はフェニル基(該フェニル基は、低
級アルキル基、低級アルコキシ基、トリフルオロメチル
基又はハロゲン原子から選ばれる1〜5個で置換されて
いても良い)又はシクロヘキシル基を、nは0又は1の
数字を示す)を、R3 ,R4 ,R7 ,R8 は同一又は相
異なって、水素原子、低級アルキル基、低級アルコキシ
基、トリフルオロメチル基を、R5 及びR6 は同一又は
相異なって、低級アルキル基、低級アルコキシ基、トリ
フルオロメチル基を表すか、又はR4 とR5、R6 とR7
が相伴って芳香環を表し、nは0又は1の数字を表
す]
[In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1 are cyclic groups each having 4 or 5 carbon atoms. R 2 is a phenyl group (the phenyl group may be substituted with 1 to 5 selected from a lower alkyl group, a lower alkoxy group, a trifluoromethyl group or a halogen atom) or a cyclohexyl group, and n is 0 or indicating the number 1), R 3, R 4, R 7, R 8 are the same or different, a hydrogen atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, R 5 and R 6 Are the same or different and represent a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 , R 6 and R 7
Together represent an aromatic ring, and n represents a number of 0 or 1.]

【0020】[0020]

【化23】 [Chemical formula 23]

【0021】[式中、R1 はフッ素で置換されていても
良い低級アルキル基、置換されていても良いベンジル
基、2個のR1 が相伴って炭素原子4もしくは5個から
なる環状基を、R3 ,R4 ,R7 ,R8 は同一又は相異
なって、水素原子、低級アルキル基、低級アルコキシ
基、トリフルオロメチル基を、R5 及びR6 は同一又は
相異なって、低級アルキル基、低級アルコキシ基、トリ
フルオロメチル基を表すか、又はR4 とR5 、R6 とR
7 が相伴って芳香環を表し、Xはハロゲン原子を表す]
[Wherein R 1 is a lower alkyl group which may be substituted with fluorine, an optionally substituted benzyl group, and two R 1 are cyclic groups each having 4 or 5 carbon atoms. R 3 , R 4 , R 7 and R 8 are the same or different and each represent a hydrogen atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, and R 5 and R 6 are the same or different and a lower Represents an alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 , R 6 and R
7 together represents an aromatic ring, and X represents a halogen atom]

【0022】[0022]

【化24】 [Chemical formula 24]

【0023】[式中、R2 はフェニル基(該フェニル基
は、低級アルキル基、低級アルコキシ基、トリフルオロ
メチル基又はハロゲン原子から選ばれる1〜5個で置換
されていても良い)又はシクロヘキシル基を、nは0又
は1の数字を示す)を、X1 はハロゲン原子を表す]反
応は、有機溶媒、例えばエーテル又はテトラヒドロフラ
ン等中で、一般式[VII] で表される化合物を有機リチウ
ム試薬によりリチオ化するか、金属マグネシウムにより
グリニャール試薬を調製した後に一般式[VIII]で表さ
れる化合物を作用させることができるが、n−ブチルリ
チウム、t−ブチルリチウム等の有機リチウム試薬を用
い、反応温度は−50〜−70℃で行うことが好まし
い。
[Wherein R 2 is a phenyl group (the phenyl group may be substituted with 1 to 5 selected from a lower alkyl group, a lower alkoxy group, a trifluoromethyl group or a halogen atom) or cyclohexyl. Group, n represents a number of 0 or 1), and X 1 represents a halogen atom.] The reaction is carried out by reacting the compound represented by the general formula [VII] with an organic lithium in an organic solvent such as ether or tetrahydrofuran. The compound represented by the general formula [VIII] can be reacted after lithiation with a reagent or after preparing a Grignard reagent with metallic magnesium, but an organolithium reagent such as n-butyllithium or t-butyllithium is used. The reaction temperature is preferably -50 to -70 ° C.

【0024】(4)一般式[VII] で、R1 がフッ素で置
換されていても良い低級アルキル基、置換されても良い
ベンジル基である化合物は、一般式[X]で表される化
合物に塩基の存在下、一般式[XII] で表される化合物を
作用させることにより製造することができる。
(4) The compound of the general formula [VII] in which R 1 is a lower alkyl group which may be substituted with fluorine or a benzyl group which may be substituted is a compound represented by the general formula [X]. Can be produced by reacting with a compound represented by the general formula [XII] in the presence of a base.

【0025】[0025]

【化25】 [Chemical 25]

【0026】[式中、R3 ,R4 ,R7 ,R8 は同一又
は相異なって、水素原子、低級アルキル基、低級アルコ
キシ基、トリフルオロメチル基を、R5 及びR6 は同一
又は相異なって、低級アルキル基、低級アルコキシ基、
トリフルオロメチル基を表すか、又はR4 とR5 、R6
とR7 が相伴って芳香環を表し、Xはハロゲン原子を表
す]
[In the formula, R 3 , R 4 , R 7 and R 8 are the same or different and each represents a hydrogen atom, a lower alkyl group, a lower alkoxy group or a trifluoromethyl group, and R 5 and R 6 are the same or different. Differently, a lower alkyl group, a lower alkoxy group,
Represents a trifluoromethyl group, or represents R 4 and R 5 , R 6
And R 7 together represent an aromatic ring, and X represents a halogen atom.]

【0027】[0027]

【化26】 [Chemical formula 26]

【0028】[式中、Ra1 はフッ素で置換されていて
も良い低級アルキル基、置換されていても良いベンジル
基を、X2 はハロゲン原子を表す]ここでフッ素で置換
されていても良い低級アルキル基とは、メチル、エチ
ル、プロピル、2,2,3,3,3−ペンタフルオロプ
ロピル、2,2,3,3,4,4,4−ヘプタフルオロ
ブチル等を示す。
[In the formula, Ra 1 represents a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and X 2 represents a halogen atom] Here, it may be substituted with fluorine. The lower alkyl group includes methyl, ethyl, propyl, 2,2,3,3,3-pentafluoropropyl, 2,2,3,3,4,4,4-heptafluorobutyl and the like.

【0029】反応は、例えばジメチルホルムアミド、ア
セトン、水−エタノール等の溶媒中、例えば炭酸カリウ
ム、炭酸ナトリウム、水素化ナトリウム等の塩基の存在
下に、室温から溶媒の還流温度の範囲で行うことが好ま
しい。
The reaction may be carried out in a solvent such as dimethylformamide, acetone or water-ethanol in the presence of a base such as potassium carbonate, sodium carbonate or sodium hydride in the range of room temperature to the reflux temperature of the solvent. preferable.

【0030】Ra1 がメチル基の場合は、一般式[X]
で表される化合物にギ酸及びホルマリンを加え、還流す
ることによっても製造することができる。
When Ra 1 is a methyl group, the general formula [X]
It can also be produced by adding formic acid and formalin to the compound represented by and refluxing.

【0031】(5)一般式[VII] で表される化合物は、
一般式[XIII]で表される化合物に塩基の存在下、必要
ならば臭化第一銅もしくは塩化第一銅等の銅触媒の存在
下に一般式[XIV] で表される化合物を作用させることに
よっても製造することができる。
(5) The compound represented by the general formula [VII] is
The compound represented by the general formula [XIV] is reacted with the compound represented by the general formula [XIII] in the presence of a base and, if necessary, a copper catalyst such as cuprous bromide or cuprous chloride. It can also be manufactured.

【0032】[0032]

【化27】 [Chemical 27]

【0033】[式中、R3 ,R4 ,R7 ,R8 は同一又
は相異なって、水素原子、低級アルキル基、低級アルコ
キシ基、トリフルオロメチル基を、R5 及びR6 は同一
又は相異なって、低級アルキル基、低級アルコキシ基、
トリフルオロメチル基を表すか、又はR4 とR5 、R6
とR7 が相伴って芳香環を表し、X及びX3 は同一又は
相異なって、ハロゲン原子を表す]
[In the formula, R 3 , R 4 , R 7 and R 8 are the same or different and each represents a hydrogen atom, a lower alkyl group, a lower alkoxy group or a trifluoromethyl group, and R 5 and R 6 are the same or different. Differently, a lower alkyl group, a lower alkoxy group,
Represents a trifluoromethyl group, or represents R 4 and R 5 , R 6
And R 7 together represent an aromatic ring, and X and X 3 are the same or different and represent a halogen atom.]

【0034】[0034]

【化28】 [Chemical 28]

【0035】[式中、R1 はフッ素で置換されていても
良い低級アルキル基、置換されていても良いベンジル基
を、2個のR1 が相伴って炭素原子4もしくは5個から
なる環状基を表す]反応は、例えばジメチルホルムアミ
ド、ジメチルスルホキシド等の溶媒の存在下又は非存在
下に、例えば炭酸カリウム、炭酸ナトリウム等の塩基を
加え、加温下で行うことが好ましい。この際、臭化第一
銅もしくは塩化第一銅等の銅触媒の添加も好ましい。ま
た、一般式[XIV] で表される化合物を過剰に加え、塩基
を代用することも可能である。
[Wherein R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group is a cyclic group consisting of 4 or 5 carbon atoms in combination with two R 1 's. Representing a group] The reaction is preferably carried out in the presence or absence of a solvent such as dimethylformamide or dimethylsulfoxide with the addition of a base such as potassium carbonate or sodium carbonate under heating. At this time, addition of a copper catalyst such as cuprous bromide or cuprous chloride is also preferable. It is also possible to add the compound represented by the general formula [XIV] in excess and substitute the base.

【0036】一般式[X]及び一般式[XIII]で示され
る化合物は以下の化29にしたがって合成することがで
きる。
The compounds represented by the general formula [X] and the general formula [XIII] can be synthesized according to the following Chemical Formula 29.

【0037】[0037]

【化29】 [Chemical 29]

【0038】化29中の反応は以下に記載した方法によ
り、容易に行われる。
The reaction in Chemical formula 29 is easily carried out by the method described below.

【0039】a)ハロゲン化:ハロゲン化反応は、有機
溶媒、例えば酢酸、塩化メチレン等中、反応温度として
は10〜50℃で行うことが好ましい。また、ハロゲン
化剤としては通常のハロゲン化剤が使用できるが、特に
臭素が好ましい。
A) Halogenation: The halogenation reaction is preferably carried out in an organic solvent such as acetic acid or methylene chloride at a reaction temperature of 10 to 50 ° C. As the halogenating agent, an ordinary halogenating agent can be used, but bromine is particularly preferable.

【0040】b)ザンドマイヤー反応:ザンドマイヤー
反応は有機溶媒、例えば酢酸、硝酸又は臭化水素水等
中、亜硝酸ナトリウムによりジアゾニウム塩とした後、
ハロゲン化剤としてヨウ化カリウム又は臭化第一銅を作
用させることが好ましい。反応温度は0〜30℃で行う
ことが好適である。
B) Zandmeier reaction: The Zandmeier reaction is carried out by using sodium nitrite to form a diazonium salt in an organic solvent such as acetic acid, nitric acid or water with hydrobromide, and then
It is preferable to act potassium iodide or cuprous bromide as the halogenating agent. The reaction temperature is preferably 0 to 30 ° C.

【0041】c)ニトロ基の還元:ニトロ基の還元の場
合、通常の還元剤が使用できるが、他の置換基にハロゲ
ン原子が含まれる場合は、鉄−塩酸の系が好ましく、そ
の他の置換基の場合は、パラジウム−炭素を触媒とした
接触還元が好ましい。接触還元の場合、溶媒はアルコー
ルが好適である。
C) Reduction of nitro group: In the case of reduction of a nitro group, an ordinary reducing agent can be used, but when other substituents include a halogen atom, an iron-hydrochloric acid system is preferable, and other substitutions are performed. In the case of a group, catalytic reduction using palladium-carbon as a catalyst is preferable. In the case of catalytic reduction, alcohol is suitable as the solvent.

【0042】d)クルチウス転移:低級アルコキシカル
ボニル基をアミノ基へ変換する方法は、クルチウス転移
を利用する方法が好ましく、低級アルコキシカルボニル
基を加水分解後、得られたカルボン酸体を塩化チオニル
等で酸塩化物とするか、クロル炭酸アルキルと作用さ
せ、酸無水物とした後、アジ化ナトリウムと作用させ、
アシルアジド体とし、ベンゼン、トルエン等の有機溶媒
中で還流することによりイソシアナート体とし、更にア
ルカリで加水分解することによりアミノ体とすることが
できる。
D) Curtius rearrangement: As a method for converting a lower alkoxycarbonyl group into an amino group, a method utilizing Curtius rearrangement is preferable. After the lower alkoxycarbonyl group is hydrolyzed, the obtained carboxylic acid body is treated with thionyl chloride or the like. As an acid chloride, or with an alkyl chlorocarbonate to give an acid anhydride, and then with sodium azide,
It can be converted into an acyl azide form, an isocyanate form by refluxing in an organic solvent such as benzene and toluene, and an amino form by further hydrolyzing with an alkali.

【0043】化29に記載された化合物のうち、一般式
[XV]で表される化合物は、一般式[XVI] で表される化
合物と一般式[XVII]で表される化合物を、金属触媒の
存在下に作用させることにより製造することができる。
Among the compounds represented by Chemical formula 29, the compounds represented by the general formula [XV] are obtained by reacting the compound represented by the general formula [XVI] and the compound represented by the general formula [XVII] with a metal catalyst. It can be produced by acting in the presence of.

【0044】[0044]

【化30】 [Chemical 30]

【0045】[式中、R3 ,R4 は同一又は相異なっ
て、水素原子、低級アルキル基、低級アルコキシ基、ト
リフルオロメチル基を、R5 は低級アルキル基、低級ア
ルコキシ基、トリフルオロメチル基を表すか、又はR4
とR5 が相伴って芳香環を表し、Y1 は水素原子、ニト
ロ基、低級アルコキシカルボニル基を、X4 はハロゲン
原子又はホウ酸基を表す]
[Wherein R 3 and R 4 are the same or different and each represents a hydrogen atom, a lower alkyl group, a lower alkoxy group or a trifluoromethyl group, and R 5 is a lower alkyl group, a lower alkoxy group or a trifluoromethyl group. Represents a group or R 4
And R 5 together represent an aromatic ring, Y 1 represents a hydrogen atom, a nitro group, a lower alkoxycarbonyl group, and X 4 represents a halogen atom or a boric acid group.]

【0046】[0046]

【化31】 [Chemical 31]

【0047】[式中、R7 ,R8 は同一又は相異なっ
て、水素原子、低級アルキル基、低級アルコキシ基、ト
リフルオロメチル基を、R6 は低級アルキル基、低級ア
ルコキシ基、トリフルオロメチル基を表すか、又はR6
とR7 が相伴って芳香環を表し、Y2 は水素原子、ニト
ロ基、低級アルコキシカルボニル基を、X5 はハロゲン
原子又はホウ酸基を表すが、X4 とX5 は同時にホウ酸
基ではない]一般式[XVI] で表される化合物と一般式
[XVII]で表される化合物の反応においてX4 及びX5
がともにハロゲン原子の場合は、金属触媒として、例え
ば銅粉を用い、スルホラン、キノリン等の有機溶媒中、
170〜250℃の反応温度で行うことが好ましい。こ
こで、Y1及びY2がニトロ基又は低級アルコキシカルボ
ニル基の場合は、X4 及びX5 が臭素原子であることが
好ましく、Y1 及び/又はY2 が水素原子の場合は、ヨ
ウ素原子であることが好ましい。
[Wherein R 7 and R 8 are the same or different and each represents a hydrogen atom, a lower alkyl group, a lower alkoxy group or a trifluoromethyl group, and R 6 is a lower alkyl group, a lower alkoxy group or a trifluoromethyl group. Represents a group or R 6
And R 7 together represent an aromatic ring, Y 2 represents a hydrogen atom, a nitro group, a lower alkoxycarbonyl group, X 5 represents a halogen atom or a boric acid group, and X 4 and X 5 are boric acid groups at the same time. No.] In the reaction of the compound represented by the general formula [XVI] with the compound represented by the general formula [XVII], X 4 and X 5
When both are halogen atoms, copper powder, for example, is used as a metal catalyst in an organic solvent such as sulfolane and quinoline,
It is preferable to carry out at a reaction temperature of 170 to 250 ° C. Here, when Y 1 and Y 2 are a nitro group or a lower alkoxycarbonyl group, X 4 and X 5 are preferably bromine atoms, and when Y 1 and / or Y 2 are hydrogen atoms, an iodine atom Is preferred.

【0048】一般式[XVI] で表される化合物と一般式
[XVII]で表される化合物の反応においてX4 又はX5
がホウ酸基の場合は、パラジウム触媒、特にテトラキス
トリフェニルホスフィンパラジウム0価の錯体を用い、
ベンゼン、トルエン、塩化メチレン等の有機溶媒中、溶
媒の還流温度で行うことが好ましい。
In the reaction between the compound represented by the general formula [XVI] and the compound represented by the general formula [XVII], X 4 or X 5
Is a boric acid group, a palladium catalyst, particularly tetrakistriphenylphosphine palladium zero-valent complex is used,
It is preferably carried out in an organic solvent such as benzene, toluene or methylene chloride at the reflux temperature of the solvent.

【0049】また、原料である一般式[XVI] 及び一般式
[XVII]で表される化合物は、公知文献(例えばテトラ
ヘドロン、37,747(1981)等)に従って合成
できるか、又は更にニトロ化もしくは有機リチウム試薬
等を作用させた後に、トリアルキルボラートと作用する
ことにより必要な原料を製造できる。
The compounds represented by the general formula [XVI] and the general formula [XVII], which are the starting materials, can be synthesized according to known literature (eg, tetrahedron, 37 , 747 (1981), etc.) or further nitrated. Alternatively, a necessary raw material can be produced by acting an organolithium reagent or the like and then acting with a trialkyl borate.

【0050】[0050]

【実施例】次に本発明を具体例によって説明するが、こ
れらの例によって本発明が限定されるものではない。
The present invention will now be described with reference to specific examples, but the present invention is not limited to these examples.

【0051】実施例13,3’−ジメトキシ−2 ,2’,4,4’−テトラ
チル−6−ニトロ−1, 1’−ビフェニルの合成 3−ヨード−2,6−ジメチルアニソール(3.0
g)、3−ブロモ−2,6−ジメチル−4−ニトロアニ
ソール(3.0g)、銅粉(2.2g)、スルホラン
(40ml)の混合液を170℃にて3時間撹拌後、冷
却し、ベンゼンを加え、不溶物を濾去した。濾液を水洗
後、無水硫酸マグネシウムで乾燥し、減圧濃縮した。残
渣をシリカゲルクロマトにより分離精製(n−ヘキサ
ン:塩化メチレン=9:1)し、淡黄色プリズム晶の目
的物(0.78g)を得た(収率21.6%)。融点7
2〜73℃ H−NMR(δ,CDCl3 ):1.83(3H,
s),1.87(3H,s),2.27(3H,s),
2.33(3H,s),3.67(3H,s),3.7
0(3H,s),6.47(1H,d,J=8.0H
z),6.90(1H,d,J=8.0Hz),7.4
8(2H,s)。
[0051] Example 1 3,3'-dimethoxy-2, 2 ', 4,4'-tetra main
Synthesis of tyl -6-nitro- 1,1'-biphenyl 3-iodo-2,6-dimethylanisole (3.0
g), 3-bromo-2,6-dimethyl-4-nitroanisole (3.0 g), copper powder (2.2 g) and sulfolane (40 ml) were stirred at 170 ° C. for 3 hours and then cooled. , Benzene were added, and the insoluble material was filtered off. The filtrate was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was separated and purified by silica gel chromatography (n-hexane: methylene chloride = 9: 1) to obtain the desired product (0.78 g) as pale yellow prism crystals (yield 21.6%). Melting point 7
2 to 73 ° C. H-NMR (δ, CDCl 3 ): 1.83 (3H,
s), 1.87 (3H, s), 2.27 (3H, s),
2.33 (3H, s), 3.67 (3H, s), 3.7
0 (3H, s), 6.47 (1H, d, J = 8.0H
z), 6.90 (1H, d, J = 8.0 Hz), 7.4
8 (2H, s).

【0052】実施例26’−ブロモ−3,3’− ジメトキシ−2,2’,4
4’−テトラメチル−6−ニトロ−1,1’−ビフェニ
ルの合成 実施例1の化合物(1.3g)を酢酸(20ml)に溶
解し、冷却下に臭素(0.32ml)を加え、室温で一
夜撹拌した。反応液に氷水を加えてベンゼンで抽出し、
有機層を10%水酸化ナトリウム水溶液で洗浄、ついで
水洗して無水硫酸マグネシウムで乾燥し、減圧濃縮し
た。残渣をシリカゲルクロマトにより分離精製(n−ヘ
キサン:塩化メチレン=5:1)し、淡黄色板状晶の目
的物(1.36g)を得た(収率83.6%)。融点1
08〜110℃ H−NMR(δ,CDCl3 ):1.87(6H,
s),2.27(3H,s),2.37(3H,s),
3.67(3H,s),3.77(3H,s),7.2
7(1H,s),7.73(1H,s)。
Example 2 6'-Bromo-3,3'- dimethoxy-2,2 ', 4 ,
4'-tetramethyl-6-nitro-1,1'-biphenyl
Was dissolved Compound of Example 1 Le a (1.3 g) in acetic acid (20 ml), bromine (0.32 ml) was added under cooling and stirred overnight at room temperature. Ice water was added to the reaction solution and extracted with benzene,
The organic layer was washed with a 10% aqueous sodium hydroxide solution, then with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was separated and purified by silica gel chromatography (n-hexane: methylene chloride = 5: 1) to obtain the desired product (1.36 g) as pale yellow plate crystals (yield 83.6%). Melting point 1
08-110 ° C. H-NMR (δ, CDCl 3 ): 1.87 (6H,
s), 2.27 (3H, s), 2.37 (3H, s),
3.67 (3H, s), 3.77 (3H, s), 7.2
7 (1H, s), 7.73 (1H, s).

【0053】実施例36−アミノ−6’−ブロモ −3,3’−ジメトキシ−
2,2’,4,4’−テト ラメチル−1,1’−ビフ
ニルの合成 実施例2の化合物(1.36g)、鉄粉(0.6g)、
メタノール(20ml)、濃塩酸(5.4ml)の混合
液を15時間加熱還流した。反応液に氷水を加え、10
%水酸化ナトリウム水溶液にてアルカリ性とし、析出物
を濾取した。析出物を塩化メチレンで抽出し、抽出液を
水洗後、無水硫酸マグネシウムで乾燥し、減圧濃縮し
た。得られた残渣をシリカゲルクロマトにより分離精製
(n−ヘキサン:塩化メチレン=1:1)し、淡黄色プ
リズム晶の目的物(0.91g)を得た(収率72.4
%)。 MS(m/s):363,365(M+ )。
Example 36-amino-6'-bromo -3,3'-dimethoxy-
2,2 ', 4,4'-Tet Lamethyl-1,1'-biff Eh
Synthesis of nil The compound of Example 2 (1.36 g), iron powder (0.6 g),
Mixing methanol (20 ml) and concentrated hydrochloric acid (5.4 ml)
The liquid was heated to reflux for 15 hours. Add ice water to the reaction mixture and
Made alkaline with aqueous sodium hydroxide solution to precipitate
Was collected by filtration. The precipitate is extracted with methylene chloride and the extract is
After washing with water, dry over anhydrous magnesium sulfate and concentrate under reduced pressure.
It was The obtained residue is separated and purified by silica gel chromatography.
(N-hexane: methylene chloride = 1: 1), then
The target product (0.91 g) of a rhythm crystal was obtained (yield 72.4).
%). MS (m / s): 363, 365 (M+ ).

【0054】実施例46’−ブロモ−3,3’− ジメトキシ−2,2’,4
4’−テトラメチル−6 −ジメチルアミノ−1,1 ’−
ビフェニルの合成 実施例3の化合物(1.4g)、ヨウ化メチル(0.5
g)、炭酸ナトリウム(0.6g)、水(13ml)及
びエタノール(22ml)の混合液を5時間加熱還流し
た。反応液を減圧濃縮し、残渣を塩化メチレンで抽出し
た。有機層を水洗後、無水硫酸マグネシウムで乾燥し、
減圧濃縮した。得られた残渣をシリカゲルクロマトによ
り分離精製(n−ヘキサン:塩化メチレン=1:1)
し、白色板状晶の目的物(1.1g)を得た(収率7
3.0%)。 融点 100〜102℃ 元素分析(%):C2026BrNO2 として H−NMR(δ,CDCl3 ):1.83(3H,
s),1.90(3H,s),2.28(6H,s),
2.43(6H,s),3.67(6H,s),6.6
7(1H,s),7.23(1H,s)。
Example 4 6'-bromo-3,3'- dimethoxy-2,2 ', 4 ,
4'-tetramethyl-6 - dimethylamino-1,1 '-
Synthesis of biphenyl Compound of Example 3 (1.4 g), methyl iodide (0.5 g)
A mixture of g), sodium carbonate (0.6 g), water (13 ml) and ethanol (22 ml) was heated under reflux for 5 hours. The reaction solution was concentrated under reduced pressure, and the residue was extracted with methylene chloride. After washing the organic layer with water, dried over anhydrous magnesium sulfate,
It was concentrated under reduced pressure. The obtained residue is separated and purified by silica gel chromatography (n-hexane: methylene chloride = 1: 1).
To obtain the target product (1.1 g) as white plate crystals (yield 7
3.0%). Melting point 100 to 102 ° C. Elemental analysis (%): as C 20 H 26 BrNO 2 H-NMR (δ, CDCl 3 ): 1.83 (3H,
s), 1.90 (3H, s), 2.28 (6H, s),
2.43 (6H, s), 3.67 (6H, s), 6.6
7 (1H, s), 7.23 (1H, s).

【0055】実施例53,3’−ジメトキシ−2 ,2’,4,4’−テトラ
チル−6−ジメチルアミ ノ−6’−ジフェニルホス フィ
ニル−1,1’−ビフ ェニルの合成 乾燥テトラヒドロフラン(20ml)に実施例4の化合
物(0.51g)を完全に溶解し、−70℃に冷却し
た。t−ブチルリチウム(1.48mol/L ヘキサ
ン溶液:1.93ml)を加え、同温度で1時間撹拌し
た後、反応液に乾燥テトラヒドロフラン(5ml)に溶
かしたクロロジフェニルホスフィンオキシド(0.34
g)を−60℃以下で滴下し、同温度で1時間撹拌後、
徐々に室温に戻し、一夜放置した。テトラヒドロフラン
を減圧留去し、残渣に塩化メチレンと水を加えて抽出し
た。有機層を10%水酸化ナトリウム水溶液、水で順次
洗浄後、無水硫酸マグネシウムで乾燥した。溶媒を減圧
留去後、残渣をシリカゲルクロマトにより分離精製(n
−ヘキサン:塩化メチレン=1:10)、更にヘキサン
−ベンゼンから再結晶し、白色板状晶の目的物(0.4
4g)を得た(収率65.9%)。 融点 132〜134℃ 元素分析(%):C3236NO3 Pとして H−NMR(δ,CDCl3 ):1.53(3H,
s),1.87(3H,s),2.13(9H,s),
2.27(3H,s),3.50〜3.73(3H,
s),7.23〜7.76(12H,m)。
[0055] Example 5 3,3'-dimethoxy-2, 2 ', 4,4'-tetra main
Chill-6-dimethylaminopyridine Roh-6'-diphenylphosphine
Synthesis dry tetrahydrofuran (20ml) to the compound of Example 4 nil 1,1' Biff Eniru a (0.51 g) was completely dissolved, and cooled to -70 ° C.. After adding t-butyllithium (1.48 mol / L hexane solution: 1.93 ml) and stirring at the same temperature for 1 hour, chlorodiphenylphosphine oxide (0.34) dissolved in dry tetrahydrofuran (5 ml) was added to the reaction solution.
g) was added dropwise at −60 ° C. or below, and after stirring at the same temperature for 1 hour,
The temperature was gradually returned to room temperature and left overnight. Tetrahydrofuran was distilled off under reduced pressure, and methylene chloride and water were added to the residue for extraction. The organic layer was washed successively with 10% aqueous sodium hydroxide solution and water and then dried over anhydrous magnesium sulfate. After the solvent was distilled off under reduced pressure, the residue was separated and purified by silica gel chromatography (n
-Hexane: methylene chloride = 1:10), and then recrystallized from hexane-benzene to give a white plate-like target compound (0.4
4g) was obtained (yield 65.9%). Melting point 132-134 ° C Elemental analysis (%): as C 32 H 36 NO 3 P H-NMR (δ, CDCl 3 ): 1.53 (3H,
s), 1.87 (3H, s), 2.13 (9H, s),
2.27 (3H, s), 3.50 to 3.73 (3H,
s), 7.23-7.76 (12H, m).

【0056】実施例63,3’−ジメトキシ−2 ,2’,4,4’−テトラ
チル−6−ジメチルアミ ノ−6’−ジフェニルホス フィ
ニル−1,1’−ビフ ェニルの光学分割 実施例5で得られた化合物(500mg)を光学活性カ
ラム(キラルパックOT(+)(ダイセル製))を用
い、展開溶媒n−ヘキサン−イソプロピルアルコール
(20:1)で光学分割した。前出のフラクションを集
め、濃縮し、白色結晶(50mg)を得た。 [α]D 23 :+25.3°(c,0.29,CHCl3 )。
[0056] Example 6 3,3'-dimethoxy-2, 2 ', 4,4'-tetra main
Chill-6-dimethylaminopyridine Roh-6'-diphenylphosphine
Using the compound obtained in optical resolution Example 5 nil 1,1' Biff Eniru (500 mg) an optically active column (Chiralpak OT (+) (manufactured by Daicel)), developing solvent n- hexane - isopropyl alcohol Optical resolution was performed at (20: 1). The above-mentioned fractions were collected and concentrated to give white crystals (50 mg). [Α] D 23 : + 25.3 ° (c, 0.29, CHCl 3 ).

【0057】実施例7(+)−3,3’−ジメト キシ−2,2’,4,4’
テトラメチル−6−ジメ チルアミノ−6’−ジフェ ニル
ホスフィノ−1,1’ −ビフェニルの合成 耐圧管中で、実施例6の化合物(50mg)を乾燥、脱
気したクロロベンゼン(5ml)に溶解し、トリエチル
アミン(0.38ml)、アルゴン気流、氷冷下におい
てトリクロロシラン(0.24ml)を順に加え、アル
ゴン置換した後に封管して140℃で5時間撹拌した。
反応液に氷冷下、脱気した20%水酸化ナトリウム水溶
液を白色懸濁物が溶解するまで加え、アルゴン置換した
後、70℃で30分間撹拌した。続いて室温まで冷却
し、クロロベンゼン(5ml)を追加し、有機層を分取
し、水、飽和食塩水で順次洗浄した後、無水硫酸マグネ
シウムで乾燥した。有機層を減圧濃縮し、残渣をシリカ
ゲルクロマトにより分離精製(トルエン)し、白色プリ
ズム晶の目的物(34mg)を得た(収率70.2
%)。 [α]D 23 :+44.4°(c,0.174,CHCl3 ) H−NMR(δ,CDCl3 ):1.55(3H,
s),1.99(3H,s),2.22(3H,s),
2.27(6H,s),2.32(3H,s),3.5
9(3H,s),3.73(3H,m),6.75(1
H,s),6.93(1H,s),6.94〜7.40
(10H,m)。
[0057] Example 7 (+) - 3,3'-dimethoxyethane carboxymethyl-2,2 ', 4,4' -
Tetramethyl-6-dimethyl Chiruamino 6'diphenyl sulfonyl
Synthesis of phosphino-1,1'- biphenyl In a pressure resistant tube, the compound of Example 6 (50 mg) was dissolved in dry and degassed chlorobenzene (5 ml), triethylamine (0.38 ml), argon stream, under ice cooling. In (3), trichlorosilane (0.24 ml) was added in that order, the atmosphere was replaced with argon, and the tube was sealed and stirred at 140 ° C. for 5 hours.
Under ice cooling, a degassed 20% aqueous sodium hydroxide solution was added to the reaction solution until the white suspension was dissolved, and the atmosphere was replaced with argon, followed by stirring at 70 ° C. for 30 minutes. Subsequently, the mixture was cooled to room temperature, chlorobenzene (5 ml) was added, the organic layer was separated, washed successively with water and saturated brine, and then dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was separated and purified by silica gel chromatography (toluene) to obtain the target product (34 mg) as white prism crystals (yield 70.2).
%). [Α] D 23 : + 44.4 ° (c, 0.174, CHCl 3 ) H-NMR (δ, CDCl 3 ): 1.55 (3H,
s), 1.99 (3H, s), 2.22 (3H, s),
2.27 (6H, s), 2.32 (3H, s), 3.5
9 (3H, s), 3.73 (3H, m), 6.75 (1
H, s), 6.93 (1H, s), 6.94 to 7.40.
(10H, m).

【0058】実施例83’−メトキシ−2’,4 ’−ジメチル−2−ニトロ
4,6−ビス(トリフル オロメチル)−1,1’− ビフ
ェニルの合成 3−ヨード−2,6−ジメチルアニソールと1−ブロモ
−2−ニトロ−4,6−ビス(トリフルオロメチル)ベ
ンゼンより実施例1と同様にして微黄色プリズム晶の目
的物を得た(収率80%)。 融点 80〜81℃ 元素分析(%):C17136 NO3 として H−NMR(δ,CDCl3 ):1.97(3H,
s),2.34(3H,s),3.73(3H,s),
6.75(1H,d,J=7.9Hz),7.06(1
H,d,J=7.9Hz),8.21(1H,s),
8.22(1H,s)。
[0058] Example 8 3'-methoxy-2 ', 4' - dimethyl-2-nitro -
4,6-bis (a trifluoromethyl) -1,1' Biff
Synthesis of phenyl In the same manner as in Example 1 from 3-iodo-2,6-dimethylanisole and 1-bromo-2-nitro-4,6-bis (trifluoromethyl) benzene, the desired product as slightly yellow prism crystals was obtained. (Yield 80%). Melting point 80-81 ° C Elemental analysis (%): as C 17 H 13 F 6 NO 3. H-NMR (δ, CDCl 3 ): 1.97 (3H,
s), 2.34 (3H, s), 3.73 (3H, s),
6.75 (1H, d, J = 7.9 Hz), 7.06 (1
H, d, J = 7.9 Hz), 8.21 (1H, s),
8.22 (1H, s).

【0059】実施例96’−ブロモ−3’−メト キシ−2’,4’−ジメチ
−2−ニトロ−4,6− ビス(トリフルオロメチル )−
1,1’−ビフェニル の合成 実施例8の化合物を実施例2と同様に処理することによ
り目的物を得た。 H−NMR(δ,CDCl3 ):1.83(3H,
s),2.25(3H,s),3.63(3H,s),
7.17(1H,s),8.01(1H,s),8.0
2(1H,s)。
[0059] Example 9 6'-Bromo-3'-meth carboxymethyl-2 ', 4'-dimethyl-
-2-Nitro-4,6- bis (trifluoromethyl )-
Synthesis of 1,1′-biphenyl The target compound was obtained by treating the compound of Example 8 in the same manner as in Example 2. H-NMR (δ, CDCl 3 ): 1.83 (3H,
s), 2.25 (3H, s), 3.63 (3H, s),
7.17 (1H, s), 8.01 (1H, s), 8.0
2 (1H, s).

【0060】実施例102−アミノ−6’−ブロモ −3’−メトキシ−2’,
4’−ジメチル−4,6− ビス(トリフルオロメチル
−1,1’−ビフェニル の合成 実施例9の化合物を実施例3と同様に処理することによ
り白色プリズム晶の目的物を得た。 融点 85〜86℃ H−NMR(δ,CDCl3 ):1.90(3H,
s),2.27(3H,s),3.33(5H,s),
7.01(1H,s),7.27(2H,s)。
Example 102-amino-6'-bromo -3'-methoxy-2 ',
4'-dimethyl-4,6- Bis (trifluoromethyl )
-1,1'-biphenyl Synthesis of By treating the compound of Example 9 as in Example 3.
The target product of white prism crystals was obtained. Melting point 85-86 ° C. H-NMR (δ, CDCl3 ): 1.90 (3H,
s), 2.27 (3H, s), 3.33 (5H, s),
7.01 (1H, s), 7.27 (2H, s).

【0061】実施例116’−ブロモ−3’−メト キシ−2’,4’−ジメチ
−2−ジメチルアミノ− 4,6−ビス(トリフルオ ロメ
チル)−1,1’−ビ フェニルの合成 実施例10の化合物(0.8g)を37%ホルマリン
(1ml)及びギ酸(20ml)の溶液に加え、5時間
加熱還流した。減圧濃縮し、得られた残渣に10%水酸
化ナトリウム水溶液を加え、クロロホルムで抽出した。
有機層を水洗し、無水硫酸マグネシウムで乾燥後、減圧
濃縮し、残渣をシリカゲルクロマトにより分離精製(n
−ヘキサン:塩化メチレン=4:1)し、白色プリズム
晶の目的物(0.82g)を得た(収率96.4%)。 融点 65〜67℃ 元素分析(%):C1918BrF6 NOとして H−NMR(δ,CDCl3 ):1.53(3H,
s),2.23(3H,s),2.50(6H,s),
3.63(3H,s),7.17(1H,s),7.3
0(1H,s),7.47(1H,s)。
[0061] Example 11 6'-bromo-3'-meth carboxymethyl-2 ', 4'-dimethyl-
-2-dimethylamino - 4,6-bis (trifluoromethanesulfonyl
Chill) -1,1'-bi compound of Example 10 of phenyl and (0.8 g) was added to a solution of 37% formalin (1 ml) and formic acid (20 ml), it was heated under reflux for 5 hours. The mixture was concentrated under reduced pressure, 10% aqueous sodium hydroxide solution was added to the obtained residue, and the mixture was extracted with chloroform.
The organic layer was washed with water, dried over anhydrous magnesium sulfate and concentrated under reduced pressure, and the residue was separated and purified by silica gel chromatography (n
Hexane: methylene chloride = 4: 1) to obtain the target product (0.82 g) as white prism crystals (yield 96.4%). Melting point 65-67 ° C. Elemental analysis (%): as C 19 H 18 BrF 6 NO H-NMR (δ, CDCl 3 ): 1.53 (3H,
s), 2.23 (3H, s), 2.50 (6H, s),
3.63 (3H, s), 7.17 (1H, s), 7.3
0 (1H, s), 7.47 (1H, s).

【0062】実施例123’−メトキシ−2’,4 ’−ジメチル−2−ジメチ
アミノ−6’−ジフェニ ルホスフィニル−4,6− ビス
(トリフルオロメチル )−1,1’−ビフェニル の合成 実施例11の化合物を実施例5と同様に処理することに
より白色板状晶の目的物を得た(収率70.1%)。 融点 122〜124℃ 元素分析(%):C31286 NO2 Pとして H−NMR(δ,CDCl3 ):1.97(3H,
s),2.04(6H,s),2.28(3H,s),
3.76(3H,s),7.26〜7.60(13H,
m)。
[0062] Example 12 3'-methoxy-2 ', 4' - dimethyl-2-dimethyl-
Amino-6'-diphenyl Ruhosufiniru 4,6-bis
Synthesis of (trifluoromethyl ) -1,1′-biphenyl By treating the compound of Example 11 in the same manner as in Example 5, the target product as white plate crystals was obtained (yield 70.1%). Melting point 122-124 ° C. Elemental analysis (%): as C 31 H 28 F 6 NO 2 P H-NMR (δ, CDCl 3 ): 1.97 (3H,
s), 2.04 (6H, s), 2.28 (3H, s),
3.76 (3H, s), 7.26 to 7.60 (13H,
m).

【0063】実施例133’−メトキシ−2’,4 ’−ジメチル−2−ジメチ
アミノ−6’−ジフェニ ルホスフィニル−4,6− ビス
(トリフルオロメチル )−1,1’−ビフェニル の光学
分割 実施例12により得られた化合物を実施例6と同様に、
光学活性体分取用カラム(キラルパックOT(+)(ダ
イセル製))で、展開溶媒n−ヘキサン−イソプロピル
アルコール(20:1)で光学分割した。前出のフラク
ションを集め、濃縮し、白色結晶を得た。 [α]D 23 :+30.9°(c,0.29,CHCl3 ) HPLC分析で100%eeであった。
[0063] Example 13 3'-methoxy-2 ', 4' - dimethyl-2-dimethyl-
Amino-6'-diphenyl Ruhosufiniru 4,6-bis
Optics of (trifluoromethyl ) -1,1'-biphenyl
The compound obtained in Resolution Example 12 was treated in the same manner as in Example 6,
Optical separation was carried out with a developing solvent, n-hexane-isopropyl alcohol (20: 1), using a column for separating optically active substances (Chiral Pack OT (+) (manufactured by Daicel)). The above fractions were collected and concentrated to give white crystals. [Α] D 23 : + 30.9 ° (c, 0.29, CHCl 3 ) 100% ee by HPLC analysis.

【0064】実施例14(+)−3’−メトキシ− 2’,4’−ジメチル−2
ジメチルアミノ−6’− ジフェニルホスフィニル− 4,
6−ビス(トリフルオ ロメチル)−1,1’−ビ フェニ
ルの合成 実施例13の化合物を実施例7と同様に処理することに
より白色プリズム晶の目的物を得た(収率89.9
%)。 融点 164〜166℃ [α]D 23 :+58.3°(c,0.12,CHCl3 ) H−NMR(δ,CDCl3 ):1.50(3H,
s),2.00(6H,s),2.20(3H,s),
3.70(3H,s),6.70〜7.40(13H,
m)。
[0064] Example 14 (+) - 3'-methoxy - 2 ', 4'-dimethyl-2 -
Dimethylamino-6'-diphenyl phosphinyl - 4,
3,6-Bis (a trifluoromethyl) -1,1'-bi-phenylene
The desired product was obtained as a white prisms treated in the same manner as in Example 7 the compound of Example 13 of the Le (yield 89.9
%). Melting point 164-166 ° C. [α] D 23 : + 58.3 ° (c, 0.12, CHCl 3 ) H-NMR (δ, CDCl 3 ): 1.50 (3H,
s), 2.00 (6H, s), 2.20 (3H, s),
3.70 (3H, s), 6.70 to 7.40 (13H,
m).

【0065】実施例152−アミノ−3’−メトキ シ−2’,4’−ジメチル
4,6−ビス(トリフル オロメチル)−1,1’− ビフ
ェニルの合成 実施例8の化合物(4.3g)を5%パラジウム炭素
(1.0g)、エタノール(50ml)の溶液中に加
え、水素雰囲気下、室温、常圧にて15時間撹拌した。
不溶物を濾去し、得られた濾液を減圧濃縮した。残渣を
シリカゲルクロマトにより分離精製(n−ヘキサン:塩
化メチレン=1:2)し、目的物(2.5g)を得た。 H−NMR(δ,CDCl3 ):1.90(3H,
s),2.27(3H,s),3.63(3H,s),
6.57(1H,d,J=8.0Hz),6.90(1
H,d,J=8.0Hz),6.93(1H,s),
7.20(1H,s)。
[0065] Example 15 2-Amino-3'-methoxyethanol 2 ', 4'-dimethyl -
4,6-bis (a trifluoromethyl) -1,1' Biff
Synthesis of phenyl The compound of Example 8 (4.3 g) was added to a solution of 5% palladium carbon (1.0 g) and ethanol (50 ml), and the mixture was stirred under a hydrogen atmosphere at room temperature and atmospheric pressure for 15 hours.
The insoluble material was filtered off, and the obtained filtrate was concentrated under reduced pressure. The residue was separated and purified by silica gel chromatography (n-hexane: methylene chloride = 1: 2) to obtain the desired product (2.5 g). H-NMR (δ, CDCl 3 ): 1.90 (3H,
s), 2.27 (3H, s), 3.63 (3H, s),
6.57 (1H, d, J = 8.0 Hz), 6.90 (1
H, d, J = 8.0 Hz), 6.93 (1H, s),
7.20 (1H, s).

【0066】実施例162−ブロモ−3’−メトキ シ−2’,4’−ジメチル
4,6−ビス(トリフル オロメチル)−1,1’− ビフ
ェニルの合成 実施例15の化合物(1.5g)を酢酸(5ml)に溶
解、この溶液を濃硫酸(2.6ml)に亜硝酸ナトリウ
ム(0.34g)を溶解した溶液に加えた。室温で1時
間撹拌した後、反応液を、臭化第1銅(0.8g)、4
7%臭化水素酸水溶液(3ml)の混合液に加えた。室
温で24時間撹拌後、水を加え、ベンゼン抽出した。抽
出液を10%水酸化ナトリウム水溶液で洗浄、ついで水
洗後、無水硫酸マグネシウムで乾燥し、減圧濃縮した。
得られた残渣をシリカゲルクロマトにより分離精製(n
−ヘキサン:塩化メチレン=4:1)し、目的物(1.
6g)を得た。 H−NMR(δ,CDCl3 ):1.90(3H,
s),2.37(3H,s),3.70(3H,s),
6.57(1H,d,J=8.0Hz),7.01(1
H,d,J=8.0Hz),7.87(1H,s),
8.01(1H,s)。
[0066] Example 16 2-Bromo-3'-methoxyethanol 2 ', 4'-dimethyl -
4,6-bis (a trifluoromethyl) -1,1' Biff
Dissolved compound of Example 15 of Eniru a (1.5 g) in acetic acid (5 ml), was added to this solution to a solution of sodium nitrite (0.34 g) in concentrated sulfuric acid (2.6 ml). After stirring at room temperature for 1 hour, the reaction solution was mixed with cuprous bromide (0.8 g),
It was added to a mixture of 7% hydrobromic acid aqueous solution (3 ml). After stirring at room temperature for 24 hours, water was added and benzene was extracted. The extract was washed with 10% aqueous sodium hydroxide solution, then with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
The obtained residue is separated and purified by silica gel chromatography (n
-Hexane: methylene chloride = 4: 1) to give the desired product (1.
6 g) was obtained. H-NMR (δ, CDCl 3 ): 1.90 (3H,
s), 2.37 (3H, s), 3.70 (3H, s),
6.57 (1H, d, J = 8.0 Hz), 7.01 (1
H, d, J = 8.0 Hz), 7.87 (1H, s),
8.01 (1H, s).

【0067】実施例172−ブロモ−3’−メトキ シ−2’,4’−ジメチル
6’−ニトロ−4,6− ビス(トリフルオロメチル )−
1,1’−ビフェニル の合成 実施例16の化合物(5.9g)を80%濃硝酸(40
ml)、塩化メチレン(40ml)に加え、室温で13
時間撹拌した。塩化メチレンで抽出、有機層を順次、
水、10%水酸化ナトリウム水溶液、水で洗浄し、無水
硫酸ナトリウムで乾燥した。残渣をシリカゲルクロマト
により分離精製(n−ヘキサン:塩化メチレン=9:
1)℃で精製し、淡黄色油状物として目的物(5.4
g)を得た。 GCMS(m/z):471、473(M+ ) H−NMR(δ,CDCl3 ):1.83(3H,
s),2.60(3H,s),3.70(3H,s),
7.83(1H,s),7.87(1H,s),8.0
3(1H,s)。
[0067] Example 17 2-Bromo-3'-methoxyethanol 2 ', 4'-dimethyl -
6'-nitro-4,6- bis (trifluoromethyl )-
Synthesis of 1,1′-biphenyl The compound of Example 16 (5.9 g) was added to 80% concentrated nitric acid (40
ml) and methylene chloride (40 ml) at room temperature for 13
Stir for hours. Extraction with methylene chloride, the organic layer sequentially,
The extract was washed with water, 10% aqueous sodium hydroxide solution and water, and dried over anhydrous sodium sulfate. The residue was separated and purified by silica gel chromatography (n-hexane: methylene chloride = 9:
1) Purification at ℃, the target product (5.4
g) was obtained. GCMS (m / z): 471, 473 (M + ) H-NMR (δ, CDCl 3 ): 1.83 (3H,
s), 2.60 (3H, s), 3.70 (3H, s),
7.83 (1H, s), 7.87 (1H, s), 8.0
3 (1H, s).

【0068】実施例186’−アミノ−2−ブロモ −3’−メトキシ−2’,
4’−ジメチル−4,6− ビス(トリフルオロメチル
−1,1’−ビフェニル の合成 実施例17の化合物(1.4g)にエタノール(15m
l)、濃塩酸(6ml)、鉄(0.5g)を加え、20
時間還流後、減圧濃縮した。残渣に10%水酸化ナトリ
ウム水溶液を加え、アルカリ性とし、塩化メチレンを加
え、不溶物を濾去した。濾液を塩化メチレンで抽出し、
無水硫酸マグネシウムで乾燥後、減圧濃縮した。残渣を
シリカゲルクロマトにより分離精製(n−ヘキサン:塩
化メチレン=9:1)℃で精製し、目的物(0.73
g)を得た。GCMS(m/z):441、443(M
+ )。
Example 186'-amino-2-bromo -3'-methoxy-2 ',
4'-dimethyl-4,6- Bis (trifluoromethyl )
-1,1'-biphenyl Synthesis of The compound of Example 17 (1.4 g) was mixed with ethanol (15 m
l), concentrated hydrochloric acid (6 ml) and iron (0.5 g) were added, and 20
After refluxing for an hour, the mixture was concentrated under reduced pressure. 10% sodium hydroxide on the residue
Add an aqueous solution of um to make it alkaline and add methylene chloride.
The insoluble matter was filtered off. Extract the filtrate with methylene chloride,
The extract was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue
Separation and purification by silica gel chromatography (n-hexane: salt
Methylene chloride = 9: 1) and purified to obtain the desired product (0.73
g) was obtained. GCMS (m / z): 441, 443 (M
+ ).

【0069】実施例192−ブロモ−3’−メトキ シ−2’,4’−ジメチル
6’−(L)−N−トシ ルプロリルアミノ−4,6 −ビ
ス(トリフルオロメチ ル)−1,1’−ビフェニ ルの合
(L)−N−トシルプロリン(0.9g)と塩化チオニ
ル(5ml)より調製した(L)−N−トシルプロリル
クロライドをベンゼン(10ml)に溶解、これを実施
例18の化合物(1g)のピリジン(10ml)溶液に
滴下した。室温で2時間撹拌後、ベンゼンで抽出し、有
機層を順次、水、希塩酸、水で洗浄、無水硫酸マグネシ
ウムで乾燥後、減圧濃縮した。残渣を高速液体クロマト
(YMCPacked Column D−SIL−7
S−7 120A SIL、n−ヘキサン:イソプロ
ピルアルコール(20:1))で分離した。前出のフラ
クションを集め、白色プリズム晶として目的物(0.1
5g)を得た。 融点 193〜195℃ [α]D 23 :+99.8°(c,0.35,CHCl3 ) H−NMR(δ,CDCl3 ):1.33〜3.30
(7H,m),1.83(3H,s),2.30(6
H,s),2.33(3H,s),3.67(3H,
s),7.17(2H,d,J=8.0Hz),7.5
0(2H,d,J=8.0Hz),7.90(1H,
s),7.97(1H,s),8.13(1H,s)。
[0069] Example 19 2-Bromo-3'-methoxyethanol 2 ', 4'-dimethyl -
6 '- (L) -N- tosylate Rupuroriruamino 4,6 - bi
Scan (trifluoromethyl Le) -1,1' biphenyl merging
Forming (L)-N-tosyl-proline and (0.9 g) was prepared from thionyl chloride (5ml) (L) -N- tosyl prolyl chloride dissolved ride benzene (10 ml), which compound of Example 18 (1 g ) Was added dropwise to a pyridine (10 ml) solution. After stirring at room temperature for 2 hours, the mixture was extracted with benzene, and the organic layer was washed successively with water, diluted hydrochloric acid and water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to high performance liquid chromatography (YMCPacked Column D-SIL-7).
Separation with S-7 120A SIL, n-hexane: isopropyl alcohol (20: 1)). The above-mentioned fractions were collected, and the target substance (0.1
5 g) was obtained. Mp 193~195 ℃ [α] D 23: + 99.8 ° (c, 0.35, CHCl 3) H-NMR (δ, CDCl 3): 1.33~3.30
(7H, m), 1.83 (3H, s), 2.30 (6
H, s), 2.33 (3H, s), 3.67 (3H,
s), 7.17 (2H, d, J = 8.0 Hz), 7.5
0 (2H, d, J = 8.0Hz), 7.90 (1H,
s), 7.97 (1H, s), 8.13 (1H, s).

【0070】実施例20(+)−2−ブロモ−3’ −メトキシ−2’,4’−
メチル−6’−ジメチル アミノ−4,6−ビス(ト リフ
ルオロメチル)−1, 1’−ビフェニルの合成 実施例19の化合物(0.15g)を10%水酸化ナト
リウム水溶液及び少量のエタノールの混合液中に加え、
8時間、80℃にて加熱還流した。反応液を冷却後、塩
化メチレンで抽出し、有機層を水洗後、無水硫酸マグネ
シウムで乾燥、減圧濃縮した。残渣をシリカゲルクロマ
トにより分離精製(n−ヘキサン:塩化メチレン=4:
1)℃で精製し、(+)−6’−アミノ−2−ブロモ−
3’−メトキシ−2’,4’−ジメチル−4,6−ビス
(トリフルオロメチル)−1,1’−ビフェニル(70
mg)を得た。これを水(3ml),エタノール(5.
8ml)、炭酸ナトリウム(0.12g),ヨウ化メチ
ル(0.10g)の混合物中に加え、7時間還流した。
反応液を減圧濃縮し、塩化メチレンで抽出した。有機層
を水洗後、無水硫酸マグネシウムで乾燥、減圧濃縮し
た。残渣をシリカゲルクロマトにより分離精製(n−ヘ
キサン:塩化メチレン=4:1)し、目的物(37m
g)を得た。 [α]D 23 :+51.49°(c,0.17,CHCl3 ) H−NMR(δ,CDCl3 ):1.80(3H,
s),2.27(3H,s),2.37(6H,s),
3.60(3H,s),6.80(1H,s),7.8
0(1H,s),7.97(1H,s)。
Example 20 (+)-2-Bromo-3' -methoxy-2 ', 4'- di
Methyl-6'-dimethylamino-4,6-bis (g Riff
Synthesis of Luoromethyl) -1,1′- biphenyl The compound of Example 19 (0.15 g) was added to a mixed solution of 10% aqueous sodium hydroxide solution and a small amount of ethanol,
The mixture was heated under reflux at 80 ° C. for 8 hours. The reaction solution was cooled, extracted with methylene chloride, the organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was separated and purified by silica gel chromatography (n-hexane: methylene chloride = 4:
1) Purified at ℃, (+)-6'-amino-2-bromo-
3'-methoxy-2 ', 4'-dimethyl-4,6-bis (trifluoromethyl) -1,1'-biphenyl (70
mg) was obtained. This was mixed with water (3 ml) and ethanol (5.
8 ml), sodium carbonate (0.12 g) and methyl iodide (0.10 g) were added, and the mixture was refluxed for 7 hours.
The reaction solution was concentrated under reduced pressure and extracted with methylene chloride. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was separated and purified by silica gel chromatography (n-hexane: methylene chloride = 4: 1) to obtain the desired product (37 m
g) was obtained. [Α] D 23 : + 51.49 ° (c, 0.17, CHCl 3 ) H-NMR (δ, CDCl 3 ): 1.80 (3H,
s), 2.27 (3H, s), 2.37 (6H, s),
3.60 (3H, s), 6.80 (1H, s), 7.8
0 (1H, s), 7.97 (1H, s).

【0071】実施例21(+)−3’−メトキシ− 2’,4’−ジメチル−6
−ジメチルアミノ−2− ジフェニルホスフィノ−4 ,6
−ビス(トリフルオロ メチル)−1,1’−ビフ ェニル
の合成 実施例20の化合物(37mg)よりクロロジフェニル
ホスフィンを使用し、実施例5と同様にして目的物(2
1mg)を得た。 融点 165〜166℃ [α]D 23 :+23.5°(c,0.12,CHCl3 ) H−NMR(δ,CDCl3 ):1.23(3H,
s),2.27(3H,s),2.37(6H,s),
3.47(3H,s),6.73(1H,s),6.7
0〜7.33(10H,m),7.60(1H,s),
7.83(1H,s)。
Example 21 (+)-3'-methoxy- 2 ', 4'-dimethyl-6 '
- dimethylamino-2-diphenylphosphino -4 6
- bis (trifluoromethyl) -1,1' Biff Eniru
In the same manner as in Example 5 except that chlorodiphenylphosphine was used from the compound of Example 20 (37 mg), the desired compound (2
1 mg) was obtained. Melting point 165 to 166 ° C. [α] D 23 : + 23.5 ° (c, 0.12, CHCl 3 ) H-NMR (δ, CDCl 3 ): 1.23 (3H,
s), 2.27 (3H, s), 2.37 (6H, s),
3.47 (3H, s), 6.73 (1H, s), 6.7
0-7.33 (10H, m), 7.60 (1H, s),
7.83 (1H, s).

【0072】実施例221−(6−ブロモ−3−メ トキシ−2,4−ジメチル
ェニル)ナフタレン−2 −イルカルボン酸メチルの 合成 1−(3−メトキシ−2,4−ジメチルフェニル)ナフ
タレン−2−イルカルボン酸メチル(1.5g)を酢酸
(30ml)に溶解、撹拌下に臭素(0.24ml)を
加え、一晩室温にて撹拌した。反応液に塩化メチレンと
氷水を加え、抽出した。有機層を10%水酸化ナトリウ
ム水溶液、水にて順次洗浄し、無水硫酸マグネシウムで
乾燥後、減圧濃縮した。得られた残渣をn−ヘキサンで
再結晶して目的物(1.3g)を得た。 融点 97〜98℃ 元素分析(%):C2119BrO3 として H−NMR(δ,CDCl3 ):1.73(3H,
s),2.31(6H,s),3.60(3H,s),
3.63(3H,s),6.70〜7.33(7H,
m)。
[0072] Example 22 1- (6-bromo-3 main butoxy-2,4-dimethyl-off
Eniru) naphthalene - 2 - dissolution Synthesis of yl carboxylic acid methyl 1- (3-methoxy-2,4-dimethylphenyl) naphthalene-2-yl carboxylic acid methyl a (1.5 g) in acetic acid (30 ml), bromine under stirring ( 0.24 ml) was added, and the mixture was stirred overnight at room temperature. Methylene chloride and ice water were added to the reaction solution for extraction. The organic layer was washed successively with 10% aqueous sodium hydroxide solution and water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was recrystallized from n-hexane to obtain the desired product (1.3 g). Melting point 97-98 ° C. Elemental analysis (%): as C 21 H 19 BrO 3 H-NMR (δ, CDCl 3 ): 1.73 (3H,
s), 2.31 (6H, s), 3.60 (3H, s),
3.63 (3H, s), 6.70 to 7.33 (7H,
m).

【0073】実施例232−アミノ−1−(6−ブ ロモ−3−メトキシ−2,
−ジメチルフェニル)ナ フタレンの合成 実施例22の化合物(0.9g)を10%水酸化ナトリ
ウム水溶液(30ml)、エタノール(3ml)の溶液
に加え、2時間加熱還流した。冷却後、濃塩酸にて酸性
にし、塩化メチレンで抽出した。有機層を水洗し、無水
硫酸マグネシウムで乾燥後、減圧濃縮した。残渣に塩化
チオニル(20ml)を加え、1時間還流後、濃縮し
た。残渣に乾燥ベンゼンを加え、再度減圧濃縮した後、
残渣をアセトン(40ml)に溶解し、0℃に冷却し
た。反応液にアジ化ナトリウム(4g)、水(20m
l)の溶液を0℃以下にて滴下し、更に0℃で30分間
撹拌した。反応液に水(40ml)を加え、ベンゼンで
抽出、有機層を無水硫酸ナトリウムで乾燥後、1時間加
熱還流した。反応液に50%水酸化ナトリウム水溶液
(10ml)を加え、更に1時間加熱還流した。冷却
後、ベンゼンで抽出し、有機層を水洗後、無水硫酸ナト
リウムで乾燥し、減圧濃縮した。残渣をシリカゲルカラ
ムクロマトにより分離精製(塩化メチレン:n−ヘキサ
ン=3:2)し、淡黄色油状物の目的物(0.55g)
を得た。 H−NMR(δ,CDCl3 ):1.87(3H,
s),2.33(3H,s),3.50(2H,br
s),3.73(3H,s),6.70〜7.80(7
H,m)。
[0073] Example 23 2-Amino-1- (6-Bed Romo 3-methoxy-2, 4
- dimethylphenyl) Compound of Example 22 of Na Futaren (0.9 g) of 10% sodium hydroxide solution (30 ml), was added to a solution of ethanol (3 ml), was heated under reflux for 2 hours. After cooling, it was acidified with concentrated hydrochloric acid and extracted with methylene chloride. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. Thionyl chloride (20 ml) was added to the residue, and the mixture was refluxed for 1 hour and concentrated. After adding dry benzene to the residue and concentrating again under reduced pressure,
The residue was dissolved in acetone (40 ml) and cooled to 0 ° C. Sodium azide (4 g) and water (20 m
The solution of l) was added dropwise at 0 ° C or lower, and the mixture was further stirred at 0 ° C for 30 minutes. Water (40 ml) was added to the reaction solution, extracted with benzene, the organic layer was dried over anhydrous sodium sulfate, and then heated under reflux for 1 hour. A 50% aqueous sodium hydroxide solution (10 ml) was added to the reaction solution, and the mixture was heated under reflux for 1 hour. After cooling, the mixture was extracted with benzene, the organic layer was washed with water, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The residue was separated and purified by silica gel column chromatography (methylene chloride: n-hexane = 3: 2) to obtain the desired product (0.55 g) as a pale yellow oil.
Got H-NMR (δ, CDCl 3 ): 1.87 (3H,
s), 2.33 (3H, s), 3.50 (2H, br)
s), 3.73 (3H, s), 6.70 to 7.80 (7
H, m).

【0074】実施例241−(6−ブロモ−3−メ トキシ−2,4−ジメチル
ェニル)−2−ジメチル アミノナフタレンの合成 実施例23の化合物(0.55g)に水(15ml)、
エタノール(27ml)、炭酸ナトリウム(0.6
g)、ヨウ化メチル(0.5g)を加え、12時間加熱
還流した。反応液を減圧濃縮し、残渣に水を加え、塩化
メチレンで抽出、有機層を無水硫酸ナトリウムで乾燥
後、減圧濃縮した。残渣をシリカゲルカラムクロマトに
より分離精製(塩化メチレン:n−ヘキサン=2:3)
し、目的物(0.51g)を得た。 融点 84〜85℃ H−NMR(δ,CDCl3 ):1.83(3H,
s),2.30(3H,s),2.57(6H,s),
3.68(3H,s),6.83〜8.00(7H,
m)。
[0074] Example 24 1- (6-bromo-3 main butoxy-2,4-dimethyl-off
Synthesis of ( enyl) -2-dimethylaminonaphthalene The compound of Example 23 (0.55 g) was added to water (15 ml),
Ethanol (27 ml), sodium carbonate (0.6
g) and methyl iodide (0.5 g) were added, and the mixture was heated under reflux for 12 hours. The reaction solution was concentrated under reduced pressure, water was added to the residue, extracted with methylene chloride, the organic layer was dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The residue is separated and purified by silica gel column chromatography (methylene chloride: n-hexane = 2: 3).
Then, the target product (0.51 g) was obtained. Melting point 84-85 ° C. H-NMR (δ, CDCl 3 ): 1.83 (3H,
s), 2.30 (3H, s), 2.57 (6H, s),
3.68 (3H, s), 6.83 to 8.00 (7H,
m).

【0075】実施例252−ジメチルアミノ−1− (6−ジフェニルホスフィ
ル−3−メトキシ−2, 4−ジメチルフェニル)ナ フタ
レンの合成 実施例24の化合物(0.51g)を実施例5と同様に
処理することにより目的物(0.4g)を得た。 融点 90〜92℃ H−NMR(δ,CDCl3 ):1.80(3H,
s),2.27(3H,s),2.45(6H,s),
3.73(3H,s),6.33〜7.83(7H,
m)。
[0075] Example 25 2-Dimethylamino-1- (6-diphenylphosphine two
-3-methoxy-2, 4-dimethylphenyl) na lid
Synthesis of Ren The target compound (0.4 g) was obtained by treating the compound of Example 24 (0.51 g) in the same manner as in Example 5. Melting point 90-92 ° C. H-NMR (δ, CDCl 3 ): 1.80 (3H,
s), 2.27 (3H, s), 2.45 (6H, s),
3.73 (3H, s), 6.33 to 7.83 (7H,
m).

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】 一般式[I] 【化1】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を、R3 ,R4 ,R7 ,R8 は同一
又は相異なって、水素原子、低級アルキル基、低級アル
コキシ基、トリフルオロメチル基を、R5 及びR6 は同
一又は相異なって、低級アルキル基、低級アルコキシ
基、トリフルオロメチル基を表すか、又はR4 とR5
6 とR7 が相伴って芳香環を表す]で表される光学活
性な軸不斉アミノホスフィン誘導体。
1. A compound represented by the general formula [I]: [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group, and R 3 , R 4 , R 7 and R 8 are the same or different and are hydrogen. An atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, R 5 and R 6 are the same or different and represent a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 ,
R 6 and R 7 together represent an aromatic ring], which is an optically active axially asymmetric aminophosphine derivative.
【請求項2】 前記一般式[I]においてR3 ,R5
6 及びR8 がメチル基、R4 及びR7 がメトキシ基で
ある一般式[II] 【化2】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を表す]で表される光学活性な軸不
斉アミノホスフィン誘導体。
2. In the general formula [I], R 3 , R 5 ,
A compound of the general formula [II] in which R 6 and R 8 are methyl groups and R 4 and R 7 are methoxy groups [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group].
【請求項3】 前記一般式[I]においてR3 及びR5
がトリフルオロメチル基、R4 が水素原子、R6 及びR
8 がメチル基、R7 がメトキシ基である一般式[III] 【化3】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を表す]で表される光学活性な軸不
斉アミノホスフィン誘導体。
3. R 3 and R 5 in the general formula [I].
Is a trifluoromethyl group, R 4 is a hydrogen atom, R 6 and R
A compound of the general formula [III] in which 8 is a methyl group and R 7 is a methoxy group [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group].
【請求項4】 前記一般式[I]においてR3 及びR5
がメチル基、R4 がメトキシ基、R6 及びR8 がトリフ
ルオロメチル基、R7 が水素原子を表す一般式[IV] 【化4】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を表す]で表される光学活性な軸不
斉アミノホスフィン誘導体。
4. R 3 and R 5 in the general formula [I].
Is a methyl group, R 4 is a methoxy group, R 6 and R 8 are trifluoromethyl groups, and R 7 is a hydrogen atom. [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group].
【請求項5】 前記一般式[I]においてR3 及びR5
がメチル基、R4 がメトキシ基、R6 及びR7 が相伴っ
て芳香環、R8 が水素原子を表す一般式[V] 【化5】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を表す]で表される光学活性な軸不
斉アミノホスフィン誘導体。
5. R 3 and R 5 in the general formula [I].
Is a methyl group, R 4 is a methoxy group, R 6 and R 7 are together an aromatic ring, and R 8 is a hydrogen atom. [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group].
【請求項6】 一般式[VI] 【化6】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を、R3 ,R4 ,R7 ,R8 は同一
又は相異なって、水素原子、低級アルキル基、低級アル
コキシ基、トリフルオロメチル基を、R5 及びR6 は同
一又は相異なって、低級アルキル基、低級アルコキシ
基、トリフルオロメチル基を表すか、又はR4 とR5
6 とR7 が相伴って芳香環を表す]で表されるアミノ
ホスフィニル誘導体。
6. A compound represented by the general formula [VI]: [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group, and R 3 , R 4 , R 7 and R 8 are the same or different and are hydrogen. An atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, R 5 and R 6 are the same or different and represent a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 ,
R 6 and R 7 together represent an aromatic ring].
【請求項7】 一般式[VI] 【化7】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を、R3 ,R4 ,R7 ,R8 は同一
又は相異なって、水素原子、低級アルキル基、低級アル
コキシ基、トリフルオロメチル基を、R5 及びR6 は同
一又は相異なって、低級アルキル基、低級アルコキシ
基、トリフルオロメチル基を表すか、又はR4 とR5
6 とR7 が相伴って芳香環を表す]で表される化合物
を光学分割することを特徴とする光学活性な軸不斉アミ
ノホスフィニル誘導体。
7. A compound represented by the general formula [VI]: [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group, and R 3 , R 4 , R 7 and R 8 are the same or different and are hydrogen. An atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, R 5 and R 6 are the same or different and represent a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 ,
R 6 and R 7 together represent an aromatic ring], and an optically active axially asymmetric aminophosphinyl derivative is obtained.
【請求項8】 一般式[VI] 【化8】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を、R3 ,R4 ,R7 ,R8 は同一
又は相異なって、水素原子、低級アルキル基、低級アル
コキシ基、トリフルオロメチル基を、R5 及びR6 は同
一又は相異なって、低級アルキル基、低級アルコキシ
基、トリフルオロメチル基を表すか、又はR4 とR5
6 とR7 が相伴って芳香環を表す]で表されるホスフ
ィニル誘導体を還元することを特徴とする一般式[I] 【化9】 [式中、R1 ,R2 ,R3 ,R4 ,R5 ,R6 ,R7
8 は前記の通り]で表される光学活性な軸不斉アミノ
ホスフィン誘導体の製造方法。
8. A compound represented by the general formula [VI]: [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group, and R 3 , R 4 , R 7 and R 8 are the same or different and are hydrogen. An atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, R 5 and R 6 are the same or different and represent a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 ,
R 6 and R 7 together represent an aromatic ring] to reduce a phosphinyl derivative represented by the general formula [I] [Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 ,
R 8 is as described above] and a method for producing an optically active axially asymmetric aminophosphine derivative.
【請求項9】 一般式[I] 【化10】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を、R3 ,R4 ,R7 ,R8 は同一
又は相異なって、水素原子、低級アルキル基、低級アル
コキシ基、トリフルオロメチル基を、R5 及びR6 は同
一又は相異なって、低級アルキル基、低級アルコキシ
基、トリフルオロメチル基を表すか、又はR4 とR5
6 とR7 が相伴って芳香環を表す]で表されるホスフ
ィニル誘導体を酸化することを特徴とする一般式[VI] 【化11】 [式中、R1 ,R2 ,R3 ,R4 ,R5 ,R6 ,R7
8 は前記の通り]で表される光学活性な軸不斉アミノ
ホスフィン誘導体の製造方法。
9. A compound represented by the general formula [I]: [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group, and R 3 , R 4 , R 7 and R 8 are the same or different and are hydrogen. An atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, R 5 and R 6 are the same or different and represent a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 ,
R 6 and R 7 together represent an aromatic ring] to oxidize a phosphinyl derivative represented by the general formula [VI] [Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 ,
R 8 is as described above] and a method for producing an optically active axially asymmetric aminophosphine derivative.
【請求項10】 一般式[VII] 【化12】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
3 ,R4 ,R7 ,R8 は同一又は相異なって、水素原
子、低級アルキル基、低級アルコキシ基、トリフルオロ
メチル基を、R5 及びR6 は同一又は相異なって、低級
アルキル基、低級アルコキシ基、トリフルオロメチル基
を表すか、又はR4 とR5 、R6 とR7 が相伴って芳香
環を表し、Xはハロゲン原子を表す]で表される化合物
に一般式[VIII] 【化13】 [式中、R2 はフェニル基(該フェニル基は、低級アル
キル基、低級アルコキシ基、トリフルオロメチル基又は
ハロゲン原子から選ばれる1〜5個で置換されていても
良い)又はシクロヘキシル基を、nは0又は1の数字を
示す)を、X1 はハロゲン原子を表す]で表される化合
物を作用させることを特徴とする一般式[IX] 【化14】 [式中、R1 ,R2 ,R3 ,R4 ,R5 ,R6 ,R7
8 ,nは前記の通り]で表される化合物の製造方法。
10. A compound represented by the general formula [VII]: [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, and two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 3 , R 4 , R 7 and R 8 are the same or different and each represent a hydrogen atom, a lower alkyl group, a lower alkoxy group or a trifluoromethyl group, and R 5 and R 6 are the same or different and a lower alkyl group. , A lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 , R 6 and R 7 together represent an aromatic ring, and X represents a halogen atom]. VIII] [In the formula, R 2 represents a phenyl group (the phenyl group may be substituted with 1 to 5 selected from a lower alkyl group, a lower alkoxy group, a trifluoromethyl group or a halogen atom) or a cyclohexyl group, n represents a number of 0 or 1), and X 1 represents a halogen atom], and a compound represented by the general formula [IX] [Wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 ,
R 8 and n are as described above].
【請求項11】 一般式[X] 【化15】 [式中、R3 ,R4 ,R7 ,R8 は同一又は相異なっ
て、水素原子、低級アルキル基、低級アルコキシ基、ト
リフルオロメチル基を、R5 及びR6 は同一又は相異な
って、低級アルキル基、低級アルコキシ基、トリフルオ
ロメチル基を表すか、又はR4 とR5 、R6 とR7が相
伴って芳香環を表し、Xはハロゲン原子を表す]で表さ
れる化合物に(L)−N−トシルプロリルクロリドを作
用させ、一般式[XI] 【化16】 [式中、R3 ,R4 ,R5 ,R6 ,R7 ,R8 は前記の
通り]とし、これを光学分割した後に加水分解すること
を特徴とする一般式[X]で表される化合物の光学分割
方法。
11. A compound represented by the general formula [X]: [Wherein R 3 , R 4 , R 7 , and R 8 are the same or different, a hydrogen atom, a lower alkyl group, a lower alkoxy group, and a trifluoromethyl group, and R 5 and R 6 are the same or different. , A lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 , R 6 and R 7 together represent an aromatic ring, and X represents a halogen atom] By reacting (L) -N-tosylprolyl chloride with the compound of the general formula [XI] [Wherein R 3 , R 4 , R 5 , R 6 , R 7 , and R 8 are as described above], and these are optically resolved and then hydrolyzed. Method for optical resolution of compounds.
【請求項12】 一般式[I] 【化17】 [式中、R1 はフッ素で置換されていても良い低級アル
キル基、置換されていても良いベンジル基、2個のR1
が相伴って炭素原子4もしくは5個からなる環状基を、
2 はフェニル基(該フェニル基は、低級アルキル基、
低級アルコキシ基、トリフルオロメチル基又はハロゲン
原子から選ばれる1〜5個で置換されていても良い)又
はシクロヘキシル基を、R3 ,R4 ,R7 ,R8 は同一
又は相異なって、水素原子、低級アルキル基、低級アル
コキシ基、トリフルオロメチル基を、R5 及びR6 は同
一又は相異なって、低級アルキル基、低級アルコキシ
基、トリフルオロメチル基を表すか、又はR4 とR5
6 とR7 が相伴って芳香環を表す]で表される光学活
性な軸不斉アミノホスフィン誘導体を触媒の配位子とし
て用いることを特徴とする不斉合成法。
12. A compound represented by the general formula [I]: [In the formula, R 1 is a lower alkyl group optionally substituted with fluorine, an optionally substituted benzyl group, or two R 1
Together with a cyclic group consisting of 4 or 5 carbon atoms,
R 2 is a phenyl group (the phenyl group is a lower alkyl group,
A lower alkoxy group, a trifluoromethyl group or a halogen atom, which may be substituted with 1 to 5) or a cyclohexyl group, and R 3 , R 4 , R 7 and R 8 are the same or different and are hydrogen. An atom, a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, R 5 and R 6 are the same or different and represent a lower alkyl group, a lower alkoxy group, a trifluoromethyl group, or R 4 and R 5 ,
R 6 and R 7 together represent an aromatic ring], and an optically active axially chiral aminophosphine derivative is used as a catalyst ligand.
JP25767791A 1991-10-04 1991-10-04 New asymmetric axially chiral aminophosphine derivatives Expired - Fee Related JP2939510B2 (en)

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US6395916B1 (en) 1998-07-10 2002-05-28 Massachusetts Institute Of Technology Ligands for metals and improved metal-catalyzed processes based thereon
JP2006016361A (en) * 2004-07-05 2006-01-19 Sangaku Renkei Kiko Kyushu:Kk Amino compound optical resolution agent and optical resolution method
US7858784B2 (en) 2007-12-12 2010-12-28 Massachusetts Institute Of Technology Ligands for transition-metal-catalyzed cross-couplings, and methods of use thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6307087B1 (en) 1998-07-10 2001-10-23 Massachusetts Institute Of Technology Ligands for metals and improved metal-catalyzed processes based thereon
US6395916B1 (en) 1998-07-10 2002-05-28 Massachusetts Institute Of Technology Ligands for metals and improved metal-catalyzed processes based thereon
US6946560B2 (en) 1998-07-10 2005-09-20 Massachusetts Institute Of Technology Ligands for metals and improved metal-catalyzed processes based thereon
US7026498B2 (en) 1998-07-10 2006-04-11 Massachusetts Institute Of Technology Ligands for metals and improved metal-catalyzed processes based thereon
JP2006016361A (en) * 2004-07-05 2006-01-19 Sangaku Renkei Kiko Kyushu:Kk Amino compound optical resolution agent and optical resolution method
US7858784B2 (en) 2007-12-12 2010-12-28 Massachusetts Institute Of Technology Ligands for transition-metal-catalyzed cross-couplings, and methods of use thereof
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