JPH06144871A - Glass paste - Google Patents
Glass pasteInfo
- Publication number
- JPH06144871A JPH06144871A JP31609792A JP31609792A JPH06144871A JP H06144871 A JPH06144871 A JP H06144871A JP 31609792 A JP31609792 A JP 31609792A JP 31609792 A JP31609792 A JP 31609792A JP H06144871 A JPH06144871 A JP H06144871A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- glass
- barrier
- black pigment
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 48
- 239000000843 powder Substances 0.000 claims abstract description 43
- 239000000049 pigment Substances 0.000 claims abstract description 21
- 239000011347 resin Substances 0.000 claims abstract description 17
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000000919 ceramic Substances 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims abstract description 12
- 239000002904 solvent Substances 0.000 claims abstract description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052878 cordierite Inorganic materials 0.000 claims abstract description 4
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 claims abstract description 4
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052863 mullite Inorganic materials 0.000 claims abstract description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 239000011247 coating layer Substances 0.000 abstract description 5
- 238000000149 argon plasma sintering Methods 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 230000004888 barrier function Effects 0.000 description 35
- 238000000034 method Methods 0.000 description 12
- 239000000758 substrate Substances 0.000 description 8
- 238000010304 firing Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000036211 photosensitivity Effects 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
Landscapes
- Glass Compositions (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ガラスペーストに係
り、より詳細には、例えば、プラズマディスプレイの絶
縁物障壁として好適なガラスペーストで、ガラス基板や
セラミック基板等の基板上にホトリソグラフィ法で形成
する微細加工ガラスパターン形成用のガラスペーストに
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass paste, and more particularly, it is a glass paste suitable as an insulator barrier of a plasma display, for example, by a photolithography method on a substrate such as a glass substrate or a ceramic substrate. The present invention relates to a glass paste for forming a microfabricated glass pattern to be formed.
【０００２】[0002]
【従来の技術】従来、ガラスペーストとしては、種々の
ものが提案されている。例えば、プラズマディスプレイ
パネルの障壁形成用の絶縁ペーストとしては、SiO2，Al
2O3 ，Fe2O3 ，Cr2O3 ，MnO ，CoO ，PbO ，B2O3からな
る黒色セラミック粉末に紫外線硬化樹脂と溶剤を混合し
てスリップとしたものが知られている。2. Description of the Related Art Conventionally, various glass pastes have been proposed. For example, as an insulating paste for forming a barrier of a plasma display panel, SiO 2 , Al
It is known that black ceramic powder consisting of 2 O 3 , Fe 2 O 3 , Cr 2 O 3 , MnO, CoO, PbO, and B 2 O 3 is mixed with an ultraviolet curable resin and a solvent to form a slip.
【０００３】ところで、このプラズマディスプレイパネ
ルは、上下ガラス基板（絶縁板）にアノード電極とカソ
ード電極が交差するようにして形成され、かつ２枚のガ
ラス基板の内側に障壁が形成された構造であり、電極の
内部に希ガスを封入しガスをグロー放電させて表示する
装置で、例えば、Ａ４サイズのパネルの場合、約６４０
本もの障壁が形成されている。By the way, this plasma display panel has a structure in which upper and lower glass substrates (insulating plates) are formed so that an anode electrode and a cathode electrode intersect with each other, and a barrier is formed inside two glass substrates. , A device for encapsulating a rare gas inside an electrode and causing a glow discharge of the gas for display. For example, in the case of an A4 size panel, about 640
A real barrier is formed.
【０００４】この障壁は、前述した通り、ガラス粉末
と、セラミック粉末等を有機バインダーと、溶剤を混合
したペーストを厚膜印刷法でパターン形成後、乾燥、焼
結して形成されている。As described above, this barrier is formed by patterning a paste prepared by mixing glass powder, ceramic powder, etc., with an organic binder, and a solvent by a thick film printing method, followed by drying and sintering.
【０００５】しかし、このプラズマディスプレイパネル
におるけ障壁には、次のような問題がある。すなわち、 厚膜印刷法で形成するため、１回の印刷で形成可能
な厚みは、せいぜい１０数μｍであり、必要な１００μ
ｍ以上の高さとする為に、約１０回以上の組返し印刷が
必要であり、１回毎の位置合わせが非常に困難であり、
歩留が悪い。 厚膜印刷の繰返しで形成するため、障壁幅、各障壁
の間隔が、最小１００μｍ程度を限界とする。 等の問題がある。However, the barriers in this plasma display panel have the following problems. That is, since it is formed by the thick film printing method, the thickness that can be formed by one printing is at most 10 and several μm.
In order to make the height of m or more, it is necessary to carry out grouped printing about 10 times or more, and it is very difficult to align each time.
The yield is bad. Since the thick film printing is repeated, the barrier width and the interval between the barriers are limited to about 100 μm at the minimum. There is a problem such as.
【０００６】そこで、本発明者は、先に、このような問
題に対処して、種々・研究し、ホトリソグラフィ法によ
る障壁の形成方法を提案〔特願昭６３−３２１５９０号
（特開平２−１６５５３８号公報）“プラズマディスプ
レイパネル障壁の製造方法”参照〕した。すなわち、
『セラミック粉末に紫外線硬化樹脂を混合した障壁形成
のためのスリップを電極の形成されたガラス板上にコー
ティングした後、該コーティング層の障壁形成に必要な
部分のみ露光マスクで露光・硬化し、かつこれを繰り返
して必要高さの障壁層を形成し、更に該障壁層を現像し
てパターニングし、非露光部を溶出し、かつ該紫外線硬
化された部分を焼成して障壁を形成する構成』の障壁形
成方法を提案した。そして、この障壁形成方法によれ
ば、細幅の障壁が確実に形成可能でかつ今後の大画面化
にも対応できるプラズマディスプレイ用障壁の形成が可
能となる。Therefore, the present inventor previously addressed various problems and studied variously, and proposed a method of forming a barrier by a photolithography method [Japanese Patent Application No. 63-321590 (JP-A-2-321590). 165538), "Method for manufacturing barrier of plasma display panel". That is,
"After coating a glass plate on which an electrode is formed with a slip for mixing a ceramic powder and an ultraviolet curing resin for forming a barrier, only a portion of the coating layer necessary for forming a barrier is exposed and cured by an exposure mask, and This is repeated to form a barrier layer having a required height, and the barrier layer is further developed and patterned to elute the non-exposed portion, and the ultraviolet-cured portion is baked to form a barrier. A barrier formation method was proposed. Further, according to this barrier formation method, it is possible to form a barrier for plasma display which can surely form a narrow barrier and can cope with future large screens.
【０００７】[0007]
【発明が解決しようとする課題】しかし、上述した障壁
形成方法の場合であっても、露光の際、ガラス基板上に
均一に塗布されたコーティング層の内部で光の散乱が起
こると、幅が８０〜１００μｍ以下のファイン・パター
ンを持つ障壁の形成が困難になるという課題がある。However, even in the case of the above-mentioned barrier forming method, when light is scattered inside the coating layer uniformly applied on the glass substrate during exposure, the width is reduced. There is a problem that it is difficult to form a barrier having a fine pattern of 80 to 100 μm or less.
【０００８】本発明は、以上のような課題に対処して創
案されたものであって、その目的とする処は、露光の
際、ガラス・コーティング層内で紫外光の散乱が少な
く、かつ幅が５０μｍ以下のファイン・パターンを持つ
障壁を安定して作成できるガラスペーストを提供するこ
とにある。The present invention has been made in view of the above problems, and its object is to reduce the scattering of ultraviolet light in the glass coating layer during exposure and to reduce the width. Is to provide a glass paste capable of stably forming a barrier having a fine pattern of 50 μm or less.
【０００９】[0009]
【課題を解決するための手段】そして、上記目的を達成
するための手段としての本発明のガラスペーストは、Pb
O 系ガラス粉末と、セラミック粉末、および黒色顔料か
らなる配合粉末と、紫外線硬化樹脂と溶剤を加えてなる
絶縁ペーストであって、該ガラス粉末が、PbO：５０〜
７０重量％、B2O3：１５〜２５重量％、SiO2：８〜２５
重量％、Al2O3：１〜１０重量％の組成範囲にあり、前
記セラミック粉末が、アルミナ、ムライト、コージェラ
イト粉末の一種または二種以上からなる混合物であり、
前記黒色顔料が、Fe、 Cr、 Mn、 Co の酸化物の一種また
は二種以上を主成分として含む酸化物顔料で、前記ガラ
ス粉末を４０〜９０重量％、セラミック粉末を５〜３０
重量％、黒色顔料を５〜３０重量％の配合割合とし、か
つ該配合粉末１に対して、紫外線硬化樹脂を０．１〜
１．０の組成範囲とした構成としている。The glass paste of the present invention as a means for achieving the above object is Pb
An insulating paste obtained by adding an O 2 -based glass powder, a ceramic powder, and a mixed powder of a black pigment, an ultraviolet curable resin, and a solvent, wherein the glass powder is PbO: 50-
70 wt%, B 2 O 3: 15~25 wt%, SiO 2: 8~25
% By weight, Al 2 O 3, in the composition range of 1 to 10% by weight, the ceramic powder is a mixture of one or more of alumina, mullite and cordierite powder,
The black pigment is an oxide pigment containing, as a main component, one or more oxides of Fe, Cr, Mn and Co, and the glass powder is 40 to 90% by weight and the ceramic powder is 5 to 30%.
% Of the black pigment and 5 to 30% by weight of the black pigment.
The composition is set to a composition range of 1.0.
【００１０】[0010]
【作用】本発明のガラスペーストは、ガラス基板より低
いガラス転移点を持つガラス粉末に黒色顔料とセラミッ
ク粉末と紫外線硬化樹脂とを配合した組成物であるの
で、紫外光の散乱防止できるペーストを得ることができ
る。The glass paste of the present invention is a composition in which a glass powder having a glass transition point lower than that of a glass substrate is mixed with a black pigment, a ceramic powder and an ultraviolet curable resin, so that a paste capable of preventing ultraviolet light scattering is obtained. be able to.
【００１１】ここで、前記ガラス粉末を、PbO ：５０〜
７０重量％、B2O3：１５〜２５重量％、SiO2：８〜２５
重量％、Al2O3 ：１〜１０重量％の組成範囲としたの
は、ガラスフリットのガラス転移点がガラス基板のそれ
より低温度でなければならないことによる。また、前記
黒色顔料が、Fe、 Cr、 Mn、 Co の酸化物の一種以上を主
成分として含む酸化物顔料としたのは、該黒色顔料が所
定の範囲より小さい場合は、紫外光の散乱によりファイ
ンパターンを持つ障壁の形成が困難であることに対処し
たことによる。また、前記セラミック粉末を添加したの
は、紫外線硬化樹脂を大量に添加した後に適正な焼成収
縮率を保つためで、その組成上限は、障壁形成材料とし
て必要な特性（焼成後の強度、緻密性）を保持させるこ
とに対処したことによる。紫外線硬化樹脂の割合も、所
定以下では、感光性が十分でなく、所定以上では、焼成
収縮率が大で焼成後障壁に断線等が起こったことに対処
したことによる。Here, the glass powder is PbO: 50-
70 wt%, B 2 O 3: 15~25 wt%, SiO 2: 8~25
The composition range of 1 wt% and Al 2 O 3 : 1 to 10 wt% is set because the glass transition temperature of the glass frit must be lower than that of the glass substrate. Further, the black pigment is an oxide pigment containing one or more oxides of Fe, Cr, Mn, and Co as a main component, because when the black pigment is smaller than a predetermined range, it is caused by ultraviolet light scattering. This is because it was difficult to form a barrier having a fine pattern. Further, the reason why the ceramic powder is added is to maintain an appropriate firing shrinkage ratio after adding a large amount of the ultraviolet curable resin, and the upper limit of its composition is the characteristics required as a barrier forming material (strength after firing, denseness). ) Is dealt with by holding. With respect to the proportion of the ultraviolet curable resin, the photosensitivity was not sufficient when the ratio was less than the predetermined value, and the shrinkage factor was high when the ratio was higher than the predetermined value, and the occurrence of disconnection or the like in the barrier after firing was dealt with.
【００１２】また、前記紫外線硬化樹脂としては、紫外
線照射により硬化して、現像薬剤に不溶化するものであ
れば良く、少なくとも１個の不飽和結合を有するオリゴ
マーないしポリマーが挙げられる。例えば、ポリエステ
ルアクリレート、ポリエステルメタクリレート、エポキ
シアクリレート、エポキシメタクリレート等が挙げられ
る。The ultraviolet curable resin may be any resin which is insoluble in a developing agent when it is cured by irradiation with ultraviolet rays, and includes an oligomer or polymer having at least one unsaturated bond. Examples thereof include polyester acrylate, polyester methacrylate, epoxy acrylate, and epoxy methacrylate.
【００１３】[0013]
【実施例】以下、本発明を具体化した二実施例について
説明する。しかし、本発明は、以下の実施例に限定され
るものでなく、本発明の要旨を変更しない範囲内で変形
実施できる構成を含む。EXAMPLES Two examples embodying the present invention will be described below. However, the present invention is not limited to the following embodiments, but includes configurations that can be modified within the scope of the present invention.
【００１４】−実施例１− PbO ：５７重量％、B2O3：１９重量％、SiO2：２０重量
％、Al2O3 ：５重量％からなるガラスフリットを、１２
００℃に加熱後、粉砕して作製し、次いで、ガラスフリ
ットとアルミナ粉末とFe2O3,Mn3O4,CoO を主成分とする
黒色顔料を、６：２：２の割合で混合して配合粉末を得
た。この配合粉末：１に対し、０．３の割合で紫外線硬
化樹脂と、ブチルセロソルブ等の溶剤を混合して、屈伏
点４９５℃のガラスペーストを得た。Example 1 A glass frit consisting of 57% by weight of PbO, 19% by weight of B 2 O 3, 20% by weight of SiO 2 and 5% by weight of Al 2 O 3 :
After heating to 00 ° C., pulverizing to prepare, and then mixing glass frit, alumina powder, and a black pigment containing Fe 2 O 3 , Mn 3 O 4 , and CoO as main components in a ratio of 6: 2: 2. To obtain a blended powder. An ultraviolet curable resin and a solvent such as butyl cellosolve were mixed at a ratio of 0.3 with respect to this compounded powder: 1 to obtain a glass paste having a yield point of 495 ° C.
【００１５】そして、このガラスペーストを、ガラス板
にロールコーターにてコーティングし、紫外線露光、現
像、５７０℃で焼成して障壁を作製した処、幅３０μ
ｍ、高さ１５０μｍの高精細な障壁を作製することが出
来た。Then, the glass paste was coated on a glass plate with a roll coater, exposed to ultraviolet rays, developed, and baked at 570 ° C. to form a barrier.
It was possible to fabricate a high-definition barrier having a height of m and a height of 150 μm.
【００１６】なお、ここで黒色顔料の割合を、ガラスフ
リット、アルミナ粉末、黒色顔料の総量の５％以下とし
た時は、１００μｍ以下のファインな障壁の作製ができ
なかった。また配合粉末１に対し、０．１以下の紫外線
硬化樹脂の混合では、感光能が十分でなく、パターン形
成ができなかった。配合粉末１に対し、１．０以上の紫
外線硬化樹脂では、焼成収縮が大きく、障壁に断線が起
こり、良好な障壁を作製することができず、またアルミ
ナ粉末が５％以下では、焼成時、障壁のダレを生じ、良
くなかった。When the ratio of the black pigment was 5% or less of the total amount of the glass frit, the alumina powder and the black pigment, it was not possible to produce a fine barrier of 100 μm or less. Further, when the UV-curable resin of 0.1 or less was mixed with the blended powder 1, the photosensitivity was not sufficient and the pattern could not be formed. With respect to the compounded powder 1, when the UV curable resin is 1.0 or more, the firing shrinkage is large and the barrier is broken, so that a good barrier cannot be produced. It caused bad barriers and was not good.
【００１７】なお、焼成時に溶融しない粉末、例えば、
ムライト、コージェライト等のセラミック粉末を用いて
も差支えないことは言うまでもない。また、ガラスフリ
ットの割合が４０％を割った時には、障壁はポーラスと
なり、強度も不十分で適切でなかった。A powder that does not melt during firing, for example,
It goes without saying that there is no problem even if a ceramic powder such as mullite or cordierite is used. Further, when the ratio of the glass frit was less than 40%, the barrier became porous and the strength was insufficient, which was not appropriate.
【００１８】−実施例２− PbO ：６５重量％、B2O3：２１重量％、SiO2：１１重量
％、Al2O3 ：３重量％からなるガラスフリットを、１２
００℃に加熱後粉砕して作成し、次いで、ガラスフリッ
トとアルミナ粉末とＦe2O3，Ｍn3O4，ＣoOを主成分とす
る黒色顔料を、６：２：２の割合で混合して配合粉末を
得た。この配合粉末１に対し、０．３の割合で紫外線硬
化樹脂と、ブチルセロソルブ等の溶剤を混合して、屈伏
点４５５℃のガラスペーストを得た。そして、このガラ
スペーストをガラス板にロールコーターにてコーティン
グし、紫外線露光、現像、５２０℃で焼成してプラズマ
ディスプレイパネル障壁を作製したところ、幅３０μ
ｍ、高さ１５０μｍの高精細な障壁を作成することが出
来た。Example 2-PbO: 65% by weight, B 2 O 3 : 21% by weight, SiO 2 : 11% by weight, Al 2 O 3 : 3: 3% by weight.
It is prepared by heating after heating to 00 ° C. and crushing, and then mixing glass frit, alumina powder, and black pigment containing Fe 2 O 3 , Mn 3 O 4 , and CoO as main components in a ratio of 6: 2: 2. A blended powder was obtained. An ultraviolet curable resin and a solvent such as butyl cellosolve were mixed with the compounded powder 1 at a ratio of 0.3 to obtain a glass paste having a yield point of 455 ° C. Then, this glass paste was coated on a glass plate with a roll coater, exposed to ultraviolet rays, developed, and baked at 520 ° C. to form a plasma display panel barrier.
It was possible to create a high-definition barrier having a height of m and a height of 150 μm.
【００１９】ところで、上述した各実施例においては、
プラズマディスプレイの障壁として具体化した実施例で
説明したが、ホトリソグラフィ法により形成する各種の
微細ガラスパターン形成用のガラスペーストとして適用
できることは当然である。By the way, in each of the embodiments described above,
Although it has been described in the embodiment embodied as a barrier of a plasma display, it can be naturally applied as a glass paste for forming various fine glass patterns formed by a photolithography method.
【００２０】[0020]
【発明の効果】以上の説明より明らかなように、本発明
のガラスペーストによれば、露光の際、ガラス・コーテ
ィング層内で紫外光の散乱が少なく、かつ５０μｍ以下
の微細加工ガラスパターンを安定して作成でき、しかも
小さな焼成収縮率を持つ紫外線感光能が得られるという
効果を有する。As is apparent from the above description, according to the glass paste of the present invention, ultraviolet light is less scattered in the glass coating layer during exposure, and a microfabricated glass pattern of 50 μm or less is stable. It is possible to obtain an ultraviolet photosensitivity which can be produced by the above method and has a small baking shrinkage.
【００２１】従って、本発明によれば、ホトリソグラフ
ィ法による微細な加工パターンを得ることができるガラ
スペーストを提供できるという効果を有する。Therefore, according to the present invention, there is an effect that it is possible to provide a glass paste capable of obtaining a fine processing pattern by the photolithography method.
Claims (1)
および黒色顔料からなる配合粉末と、紫外線硬化樹脂と
溶剤を加えてなる絶縁ペーストであって、該ガラス粉末
が、PbO ：５０〜７０重量％、B2O3：１５〜２５重量
％、SiO2：８〜２５重量％、Al2O3 ：１〜１０重量％の
組成範囲にあり、前記セラミック粉末が、アルミナ、ム
ライト、コージェライト粉末の一種または二種以上から
なる混合物であり、前記黒色顔料が、Fe、 Cr、 Mn、 Co
の酸化物の一種または二種以上を主成分として含む酸化
物顔料で、前記ガラス粉末を４０〜９０重量％、セラミ
ック粉末を５〜３０重量％、黒色顔料を５〜３０重量％
の配合割合とし、かつ該配合粉末１に対して、紫外線硬
化樹脂を０．１〜１．０の組成範囲としたことを特徴と
するガラスペースト。1. A PbO 3 -based glass powder, a ceramic powder,
And a blended powder comprising a black pigment, an insulating paste comprising adding ultraviolet curing resin and a solvent, the glass powder, PbO: 50-70 wt%, B 2 O 3: 15~25 wt%, SiO 2 : 8 to 25% by weight, Al 2 O 3 : 1 to 10% by weight, and the ceramic powder is a mixture of one or more of alumina, mullite and cordierite powder, and the black pigment But Fe, Cr, Mn, Co
Oxide pigment containing as a main component one or more oxides of 40 to 90% by weight, 5 to 30% by weight of ceramic powder and 5 to 30% by weight of black pigment.
And a composition ratio of the ultraviolet curable resin to the compounded powder 1 of 0.1 to 1.0.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31609792A JP3155097B2 (en) | 1992-10-30 | 1992-10-30 | Glass paste |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31609792A JP3155097B2 (en) | 1992-10-30 | 1992-10-30 | Glass paste |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06144871A true JPH06144871A (en) | 1994-05-24 |
| JP3155097B2 JP3155097B2 (en) | 2001-04-09 |
Family
ID=18073210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31609792A Expired - Fee Related JP3155097B2 (en) | 1992-10-30 | 1992-10-30 | Glass paste |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3155097B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100380556B1 (en) * | 2000-06-09 | 2003-04-18 | 대주정밀화학 주식회사 | Black paste composition for the formation of black layer |
| CN106098959A (en) * | 2015-04-28 | 2016-11-09 | 三星显示有限公司 | For the material of seal display devices and the organic light-emitting display device including it |
| WO2018230438A1 (en) | 2017-06-15 | 2018-12-20 | 中島産業株式会社 | Black mixed oxide material and method for manufacturing same |
| KR20190141784A (en) | 2017-06-15 | 2019-12-24 | 나카시마 산교 가부시키가이샤 | Black mixed oxide material and its manufacturing method |
-
1992
- 1992-10-30 JP JP31609792A patent/JP3155097B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100380556B1 (en) * | 2000-06-09 | 2003-04-18 | 대주정밀화학 주식회사 | Black paste composition for the formation of black layer |
| CN106098959A (en) * | 2015-04-28 | 2016-11-09 | 三星显示有限公司 | For the material of seal display devices and the organic light-emitting display device including it |
| WO2018230438A1 (en) | 2017-06-15 | 2018-12-20 | 中島産業株式会社 | Black mixed oxide material and method for manufacturing same |
| KR20190141784A (en) | 2017-06-15 | 2019-12-24 | 나카시마 산교 가부시키가이샤 | Black mixed oxide material and its manufacturing method |
| US10759943B2 (en) | 2017-06-15 | 2020-09-01 | Nakashima Sangyo Co., Ltd. | Black mixed oxide material and method for manufacturing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3155097B2 (en) | 2001-04-09 |
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