JPH06151677A - Plated article supply device - Google Patents
Plated article supply deviceInfo
- Publication number
- JPH06151677A JPH06151677A JP31444092A JP31444092A JPH06151677A JP H06151677 A JPH06151677 A JP H06151677A JP 31444092 A JP31444092 A JP 31444092A JP 31444092 A JP31444092 A JP 31444092A JP H06151677 A JPH06151677 A JP H06151677A
- Authority
- JP
- Japan
- Prior art keywords
- rack
- plated
- plating
- movable arm
- plated product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims description 15
- 238000007747 plating Methods 0.000 abstract description 71
- 238000011282 treatment Methods 0.000 description 18
- 238000012545 processing Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 101100321304 Bacillus subtilis (strain 168) yxdM gene Proteins 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011328 necessary treatment Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Branching, Merging, And Special Transfer Between Conveyors (AREA)
- Specific Conveyance Elements (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明はICリードフレームの
ような短冊状のめっき物(以下、めっき物)を一枚あて
保持し、めっき装置のめっきライン(例えば樹脂モール
ド後のアウターリード部への半田めっきライン、銀めっ
き前のニッケルめっきライン、モールド前の全面パラジ
ュームめっきライン等のめっきライン)上に、供給する
ためのローデイング装置と総称されているめっき物の供
給装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention holds one strip-shaped plated product (hereinafter referred to as a plated product) such as an IC lead frame and holds it, and a plating line of a plating apparatus (for example, an outer lead portion after resin molding) On a solder plating line, a nickel plating line before silver plating, a full-scale palladium plating line before molding, and the like) for supplying a plated material, which is generally called a loading device.
【0002】[0002]
【従来の技術】従来、この種のめっき物をめっき処理す
るには、処理効率上一連の工程が連続ライン化された自
動めっき装置を使用することが多い。即ち供給部、前処
理部、本めっき処理部、後処理部および取り出し部を連
続配置してめっきラインを形成し、このめっきライン上
でめっき対象物を逐次搬送しつつめっき処理するもので
ある。2. Description of the Related Art Conventionally, in order to perform a plating treatment on a plated product of this type, an automatic plating apparatus in which a series of steps are arranged in a continuous line is often used in terms of processing efficiency. That is, the supply unit, the pretreatment unit, the main plating treatment unit, the posttreatment unit, and the take-out unit are continuously arranged to form a plating line, and the plating target is sequentially conveyed on the plating line to perform the plating treatment.
【0003】このようなめっきライン上でめっき物を搬
送する方法として、めっき物をラックと称する治具で保
持し、このラックを介してめっき物を搬送する技術があ
る。(たとえば特開平3─277796号公報に示され
る保持治具参照)このタイプの保持治具は、一つのラッ
クに多数枚のめっき物を保持するもので、例えば上記公
報のラックでは水平で並列状の桁に櫛歯を備え櫛歯の間
に多数のめっき物を横長垂直状態で入れて保持し、全体
を一つのラックとして扱い多数のめっき物を同時に搬送
してめっき処理してゆくものである。As a method of transporting a plated product on such a plating line, there is a technique of holding the plated product by a jig called a rack and transporting the plated product through the rack. (For example, refer to the holding jig disclosed in Japanese Patent Laid-Open No. 3-277796.) This type of holding jig holds a large number of plated products in one rack. It is equipped with comb teeth on the girders and holds a large number of plated products between the comb teeth in a horizontal and vertical state, and treats the whole as one rack to convey a large number of plated products at the same time for plating treatment. .
【0004】[0004]
【発明が解決しようとする課題】ところで、本めっき処
理に際しめっき装置内に入れためっき物にアノードを配
置する場合なるべくめっき物に近接配置することが望ま
れるものの、しかし上記のような従来のラックでは多数
枚のめっき物が桁の櫛歯に入れられ横長垂直状となって
群を形成しているため、アノードをめっき物群の上下に
近接配置してもそれ以上は近接配置するのが難しく、し
かも横長垂直状である各めっき物のめっき面にアノード
を対向させて位置することが難しいものである。By the way, in the case of disposing the anode in the plated product placed in the plating apparatus during the main plating treatment, it is desirable to dispose the anode as close to the plated product as possible, but the conventional rack as described above is used. However, since a large number of plated products are placed in the comb teeth of a girder to form a horizontally long vertical group, it is difficult to place the anodes further above and below the plated product group. In addition, it is difficult to position the anode so as to face the plating surface of each plating product having a horizontally long vertical shape.
【0005】そこでこの出願人は本めっき処理に際しめ
っき装置内に入れためっき物にアノードを配置する場
合、横長垂直状にしためっき物のめっき面に直ぐ間近で
対向してアノードを配置できるようなラックの使用を検
討した。そのためには以下の条件を満足させることので
きるめっき物の供給装置が必要となる。即ち(1)めっ
き物を一枚あて扱うものとし、めっき装置内でめっき物
を横長垂直状の状態で保持できるようにすること、
(2)タクトシステム採用の搬送装置の使用を前提と
し、めっき装置に一定間隔で複数のラックをあてがうも
のにして、多数のラックに逐次効率よくめっき物を一枚
あて供給できるようにすること、(3)取扱い上の便宜
を考え供給の際にめっき物を水平状態でラックに供給で
きること、このためには一度ラックを水平状態にしそこ
へめっき物を一枚あて供給し次いでラックが垂直状態の
姿勢を保持できるようにすること等の多くの条件、を満
足させる必要がある。そしてこの発明ではこれらの条件
を満足させることのできるめっき物の供給装置を提供せ
んとするものである。Therefore, the applicant of the present invention, when arranging the anode on the plated product placed in the plating apparatus during the present plating treatment, can arrange the anode so as to face the plated surface of the horizontally elongated plated product immediately and closely. Considered the use of racks. For that purpose, a plated material feeder capable of satisfying the following conditions is required. That is, (1) one plated product should be handled and the plated product can be held in a horizontally long vertical state in the plating apparatus.
(2) Assuming the use of a transfer device that employs a tact system, a plurality of racks are applied to the plating device at regular intervals so that one plated product can be sequentially and efficiently supplied to a large number of racks. (3) In consideration of handling convenience, it is possible to supply the plated product to the rack in a horizontal state at the time of supply. For this purpose, once the rack is in a horizontal state, one plated product is supplied to the rack, and then the rack is in a vertical state. It is necessary to satisfy many conditions such as being able to maintain the posture. And this invention aims at providing the supply apparatus of the plating substance which can satisfy these conditions.
【0006】[0006]
【課題を解決するための手段】この発明では、主に取上
げ搬送手段と、めっき物搬送用のラックと、スイングプ
レートと、ラック用開閉手段とでめっき物の供給装置を
構成するものとした。そして、取上げ搬送手段は、水平
状態に予め載置された短冊状のめっき物を一枚あて取上
げてめっき物搬送ラインのスタート部へ運びめっき物を
水平状態のまま落下させるものとした。まためっき物搬
送用のラックは、陰極電流を通電自在とするロッドに、
その長手交差方向に突出させて、同じく陰極電流を通電
自在とする固定・可動の両アームを各々配し、固定・可
動の両アームにはめっき物を少なくとも三点支持するた
めのピンを先端で向き合わせた位置に各々備え、そして
可動アームをロッドに対し回動自在とし且つ可動アーム
のピンを固定アームのピンに向けて押し付ける付勢手段
を可動アームに設けたものである。更に、スイングプレ
ートは、垂直状態の上記ラックに対し下方より旋回して
押し当たり、ラックを上に載せた状態でラックごと水平
状態を維持し、ラックによるめっき物の受取完了後は復
帰旋回してラックが自重で垂直状態になることを許すも
のとした。更に、ラック用開閉手段は、水平状態となっ
ているスイングプレート上のラックに対しその付勢手段
に逆らって可動アームを開放方向へ回動させ、スイング
プレート上で且つ固定・可動両アームのピン間に水平状
態のめっき物を受け入れさせて後に可動アームの閉鎖方
向への回動を許すものとした。SUMMARY OF THE INVENTION In the present invention, the picked-up material feeding device is mainly composed of the pick-up and feeding means, the rack for feeding the plated material, the swing plate, and the rack opening / closing means. Then, the pick-up and transport means picks up one strip-shaped plated product placed in advance in a horizontal state, carries it to the start portion of the plated product transport line, and drops the plated product in a horizontal state. In addition, the rack for transporting plated products is equipped with a rod that allows the cathode current to flow freely.
Both fixed and movable arms, which project in the longitudinal cross direction and also allow cathode current to flow freely, are arranged respectively, and both fixed and movable arms have pins for supporting at least three points of plated products at their tips. The movable arm is provided with biasing means that are provided at facing positions, and that make the movable arm rotatable with respect to the rod and press the pin of the movable arm toward the pin of the fixed arm. Further, the swing plate swivels and pushes against the rack in the vertical state from below, maintains the rack in a horizontal state with the rack placed on the rack, and returns and swivels after the rack receives the plated product. The rack is allowed to stand vertically by its own weight. Further, the rack opening / closing means rotates the movable arm in the opening direction against the urging means with respect to the rack on the swing plate which is in the horizontal state, and the pin of the fixed / movable arm on the swing plate. In the meantime, the horizontal plated product is received to allow the movable arm to rotate in the closing direction later.
【0007】[0007]
【作用】取上げ搬送手段は、めっき物搬送ラインのスタ
ート部近辺に予め水平状態で多数枚載置された短冊状の
めっき物を、一枚あて取上げてめっき物搬送ラインのス
タート部へ運び、そこでめっき物をラックに受け渡すた
めに吸着を解除してめっき物を水平状態のまま落下させ
るものである。このとき、スタート部においては、スイ
ングプレートが働きラックと協同してめっき物を受取可
能な状態としている。即ち、スイングプレートが垂直状
態の上記ラックに対し下方より旋回して押し当たり、ラ
ックを上に載せた状態でラックごと水平状態を維持する
と、スイングプレート上のラックに対しラック用開閉手
段が作動し付勢手段に逆らって可動アームを開放方向へ
回動させていわば固定・可動両アームが開いた状態とな
るので、吸着搬送手段から水平状態のまま落下されため
っき物は直ぐ真下に水平状態で待機しているスイングプ
レート上の、それも固定・可動両アームの開いた間に、
着陸することになる。尚スタート部では必ずラックのロ
ッドがめっきラインの進行方向に対して90度の交差方
向で横向きに位置され且つロッド両端が同じ高さで保持
されるものであり、以下の各段階でも同様である。[Operation] The pick-up and transport means picks up one strip of plated article placed horizontally in advance in the vicinity of the start section of the plated article transport line and carries it to the start section of the plated article transport line, where it is picked up. In order to transfer the plated product to the rack, the adsorption is released and the plated product is dropped in a horizontal state. At this time, in the start part, the swing plate works and cooperates with the rack so that the plated product can be received. That is, when the swing plate swivels and pushes against the above rack in the vertical state from below, and the rack is kept horizontal while the rack is placed on the rack, the rack opening / closing means operates on the rack on the swing plate. If the movable arm is rotated in the opening direction against the urging means, both fixed and movable arms will be opened, so the plated product dropped from the suction transfer means in a horizontal state immediately in a horizontal state. On the waiting swing plate, while both fixed and movable arms are open,
Will land. In the starting portion, the rod of the rack is always positioned laterally in a direction intersecting 90 ° with the traveling direction of the plating line, and both ends of the rod are held at the same height. The same applies to the following steps. .
【0008】次いでラック用開閉手段が可動アームの閉
鎖方向への回動を許し、その結果めっき物は固定・可動
両アームのピン間で挟持され、そしてスイングプレート
が更に復帰旋回し、ラックはそれと共にロッドを中心に
して自重で回転して略垂直状態になる。これによりラッ
クは、めっき物を横長垂直状にして保持する姿勢とな
り、搬送手段によって略垂直状態のままめっき物搬送ラ
イン上で逐次搬送される。めっき装置の前処理部、本め
っき処理部、後処理部へと、自重で略垂直状態になって
いるラックをその姿勢のまま逐次、上昇・前進・下降・
の如き動作を適宜の搬送機構により繰り返し行って搬送
するものである。Then, the rack opening / closing means allows the movable arm to rotate in the closing direction, so that the plated object is clamped between the pins of both the fixed and movable arms, and the swing plate further pivots to return to the rack. At the same time, the rod rotates about its own weight and becomes substantially vertical. As a result, the rack is in a posture of holding the plated product in a horizontally long vertical state, and the rack is successively transported on the plated product transport line in a substantially vertical state by the transport means. Racks that are in a substantially vertical state due to their own weight are sequentially raised, moved forward, lowered, and moved to the pre-treatment section, main plating treatment section, and post-treatment section of the plating equipment in that position.
The above operation is repeatedly carried out by an appropriate carrying mechanism to carry.
【0009】[0009]
【実施例】以下図面を参照して実施例を説明する。図1
はめっきシステムの全体概略図で、めっき物の供給装置
100、めっき物の搬送装置200、めっき装置30
0、取り出し装置400、ラックの後処理装置500、
そしてラックの復帰装置600等からめっきシステム全
体が構成されている。Embodiments will be described below with reference to the drawings. Figure 1
Is an overall schematic view of a plating system, which includes a plating material supply device 100, a plating material transport device 200, and a plating device 30.
0, take-out device 400, rack post-processing device 500,
The entire plating system is configured by the rack return device 600 and the like.
【0010】「めっき物の供給装置100について」こ
のめっき物の供給装置100は、主に取上げ搬送手段1
01と、めっき物搬送用のラック102と、スイングプ
レート103と、ラック用開閉手段104とで構成され
る。以下順に説明する。[Regarding Plating Material Supply Device 100] This plating material supply device 100 is mainly used for picking up and conveying means 1.
01, a rack 102 for transporting plated products, a swing plate 103, and a rack opening / closing means 104. The following will be described in order.
【0011】「取上げ搬送手段101について」取上げ
搬送手段101は、パット台車105と吸着パット10
6とを備えている。パット台車105には左右走行用の
アクチュエータ107と上下用のアクチュエータ108
が接続してあり、複数枚のめっき物109を予め積載し
最上位のめっき物109を常に所定高さ位置に保つエレ
ベータ110のあるテーブル111の真上と、めっき物
搬送ラインのスタート部112の真上とを左右走行して
は、アクチュエータ108にてパット台車105を下降
・復帰上昇させ、テーブル111では上記最上位のめっ
き物109を一枚あて水平状態で吸着して取り上げ、ス
タート部112では吸着解除によりめっき物109を水
平状態のまま落下させてそこに予め待機しているラック
102へ受け渡すものである。尚、図示の例では「取上
げ」手段として「吸着」の例を説明したが、チャックの
ような「挟持」機構を利用してもよい。[Regarding Pickup and Conveyance Unit 101] The pickup and conveyance unit 101 is composed of a pad carriage 105 and a suction pad 10.
6 and. The pad cart 105 includes a left and right actuator 107 and a vertical actuator 108.
Are connected to each other, and a plurality of plated products 109 are preliminarily loaded and the uppermost plated product 109 is always kept at a predetermined height position. When traveling right and left directly above, the actuator 108 causes the pad carriage 105 to descend and return to rise, and the table 111 is picked up by picking up one of the uppermost plated products 109 in a horizontal state and picked up by the start unit 112. When the adsorption is released, the plated product 109 is dropped in a horizontal state and delivered to the rack 102 waiting in advance. In the illustrated example, the "sucking" means is explained as the "picking up" means, but a "clamping" mechanism such as a chuck may be used.
【0012】「めっき物搬送用のラック102につい
て」めっき物搬送用のラック102は、ロッド113
と、このロッド113に配した固定・可動の両アーム1
14、115とより主に構成されている。先ずロッド1
13について説明する。ロッド113は、陰極電流を通
電自在とするためにステンレス製としてあり、めっき装
置300の奥行き長さL1より長い長さL2を有してい
る(図8参照)。なお、以上以下の説明で「奥行き長さ
L1」とは図8で示すように「めっきライン」に対し9
0度交差方向の処理槽301とその付帯設備例えばアノ
ードの上下動手段302とを含む長さを意味し、また
「長さL2」とはそれらを跨ぐのに必要にして十分な長
さを意味するものとして使用されるものである。[Regarding rack 102 for transporting plated products] The rack 102 for transporting plated products is a rod 113.
And both fixed and movable arms 1 arranged on this rod 113
It is mainly composed of 14, 115. First rod 1
13 will be described. The rod 113 is made of stainless steel so as to allow the cathode current to flow freely, and has a length L2 longer than the depth length L1 of the plating apparatus 300 (see FIG. 8). In the following description, “depth length L1” means 9 with respect to “plating line” as shown in FIG.
It means a length including the processing tank 301 in the 0-degree crossing direction and its auxiliary equipment, for example, the vertical moving means 302 of the anode, and "length L2" means a length necessary and sufficient to straddle them. It is used as something to do.
【0013】ロッド113は図6や図7で示す状態にお
いて縦長断面形状を有し、その両端にステンレス製でソ
ロバン玉のような形状に形成した位置決め用のガイド1
16が各々設けられている。そして両ガイド116近辺
のロッド113の断面形状は下方に向かい(固定・可動
の両アーム114、115の突出方向に向けて)鋭角状
とした鋭角部117が設けてある。次に固定・可動の両
アーム114、115について説明する。固定・可動の
両アーム114、115も陰極電流を通電自在とするた
めにステンレス製としてあり、ロッド113の長手交差
方向(図6、図7で下方向)に突出して各々配されてい
る。そして固定・可動の両アーム114、115の先端
には、「樹脂モールド後のICリードフレーム」として
のめっき物109を少なくとも三点支持するためのピン
118、119が向き合わせて設けてある。The rod 113 has a vertically long cross-sectional shape in the state shown in FIGS. 6 and 7, and both ends thereof are made of stainless steel and have a positioning guide 1 formed in a shape like an abacus ball.
16 are provided respectively. The cross-sectional shape of the rod 113 in the vicinity of both guides 116 is downward (toward the protruding direction of the fixed and movable arms 114 and 115), and an acute angled portion 117 is provided. Next, the fixed and movable arms 114 and 115 will be described. Both the fixed and movable arms 114 and 115 are also made of stainless steel so as to allow the cathode current to flow freely, and are arranged so as to project in the longitudinal crossing direction of the rod 113 (downward in FIGS. 6 and 7). Pins 118 and 119 for supporting at least three points of the plated product 109 as the "IC lead frame after resin molding" are provided facing each other at the tips of the fixed and movable arms 114 and 115.
【0014】固定アーム114はロッド113に対して
二本配してあり、また可動アーム115は曲折部120
のあるL字形状のやや大きなサイズのものがロッド11
3に対して一本回動軸121で軸止めされ回動自在とし
てある。従って図中固定アーム114のピン118が上
方の二点を形成し、この二点に対して可動アーム115
のピン119が下方の一点を形成するようになる。ピン
118、119は図7で示すように固定・可動の両アー
ム114、115の先端にあって90度の方向へ(図7
左方へ)突出して設けられ、各々滑り止めの溝122と
外れ防止の膨出部123とが設けてある。尚可動アーム
115の曲折部120はめっき処理の際液中に入るので
液より引き上げた場合の液切りを考慮して図7で示すよ
うに辺部が鋭角としてある。Two fixed arms 114 are arranged on the rod 113, and a movable arm 115 is provided on the bent portion 120.
Rod 11 has a slightly larger L-shaped shape
It is rotatable with respect to 3 by one rotation shaft 121. Therefore, in the figure, the pin 118 of the fixed arm 114 forms two upper points, and the movable arm 115 with respect to these two points.
The pin 119 will form a lower point. As shown in FIG. 7, the pins 118 and 119 are located at the tips of both fixed and movable arms 114 and 115, and are oriented in the direction of 90 degrees (see FIG.
It is provided so as to project (to the left), and a groove 122 for preventing slippage and a bulging portion 123 for preventing disengagement are provided respectively. Since the bent portion 120 of the movable arm 115 enters the liquid during the plating process, the side portion has an acute angle as shown in FIG. 7 in consideration of drainage when the liquid is pulled up from the liquid.
【0015】可動アーム115はその曲折部120をロ
ッド113の長手交差方向に突出した状態でロッド11
3に対して回動軸121で回動自在に軸止めされてお
り、且つ先端のピン119を固定アーム114のピン1
18に向けて押し付ける「付勢手段」として引張スプリ
ング124が可動アーム115に設けてある。そして可
動アーム115は、「ラック用開閉手段104」として
のロータリアクチュエータ126の回転にてそのピン1
27が水平回動して可動アーム115の上端部に押しつ
け力を作用させるように働き掛けると、引張スプリング
124に逆らって開放方向(図5、図6中の矢示K方
向)へ回動する。またロータリアクチュエータ126の
ピン127が押しつけ力を解除するといわば他からの働
き掛けが終わることになるので、今度は引張スプリング
124の引張力によって可動アーム115は閉鎖方向
(図5、図6中の矢示H方向)へ回動する。従ってめっ
き物109の幅サイズの大小にかかわらずこのラック1
02では固定・可動両アーム114、115のピン11
8、119間でめっき物109の辺部を常に三点支持す
ることができる。(図6中、125は幅サイズの小さい
めっき物を示す。)The movable arm 115 has its bent portion 120 projected in the direction transverse to the longitudinal direction of the rod 113.
3 is rotatably supported by a rotation shaft 121, and the pin 119 at the tip is fixed to the pin 1 of the fixed arm 114.
A tension spring 124 is provided on the movable arm 115 as a “biasing means” for pressing it toward the armature 18. The movable arm 115 has its pin 1 rotated by the rotation of the rotary actuator 126 as the "rack opening / closing means 104".
When 27 rotates horizontally and acts so as to exert a pressing force on the upper end portion of the movable arm 115, it rotates in the opening direction (the arrow K direction in FIGS. 5 and 6) against the tension spring 124. Further, when the pin 127 of the rotary actuator 126 releases the pressing force, the action from the other ends, so to speak, so that the movable arm 115 is closed by the tensile force of the tension spring 124 (shown by arrows in FIGS. 5 and 6). Rotate in the H direction). Therefore, regardless of the width size of the plated object 109, this rack 1
In 02, pin 11 of both fixed and movable arms 114 and 115
Between 8 and 119, the sides of the plated product 109 can be always supported at three points. (In FIG. 6, 125 indicates a plated product having a small width size.)
【0016】「スイングプレート103について」スイ
ングプレート103は主にプレート128とスイング手
段129とから成る。プレート128は図3で示すよう
にその押し当て面130にラック102のピン118受
入れ用の凹部131と他のピン119受入れ用の円弧状
凹部132を備え、押し当て面130が水平状態でめっ
き物109を受け止めた際に、押し当て面130上で水
平状態が強いられているラック102の各ピン118、
119の略真ん中部位(滑り止め溝122が形成してあ
る部位)にめっき物109の辺部が位置するようにして
あり、確実な辺部への三点支持(挟持)が成しえるよう
にしてある。尚、図3では、ラック102の可動アーム
115とそのピン119の図示が省略してある。スイン
グ手段129は、プレート128の裏面に接続された支
持用のバー133とバー133の両端にあるサイドアー
ム134と、これら両サイドアーム134をその回転軸
135で回転せしめバー133の回転と共にプレート1
28をスイングさせる圧力シリンダ136を備えてい
る。"About Swing Plate 103" The swing plate 103 mainly comprises a plate 128 and a swing means 129. As shown in FIG. 3, the plate 128 is provided with a concave portion 131 for receiving the pin 118 of the rack 102 and an arcuate concave portion 132 for receiving the other pin 119 on the pressing surface 130, and the pressing surface 130 is in a horizontal state to be plated. Each pin 118 of the rack 102, which is forced to be horizontal on the pressing surface 130 when receiving 109,
The side portion of the plated product 109 is located in the substantially middle portion of the portion 119 (the portion where the anti-slip groove 122 is formed) so that reliable three-point support (clamping) to the side portion can be achieved. There is. In FIG. 3, the movable arm 115 of the rack 102 and its pin 119 are not shown. The swinging means 129 includes a supporting bar 133 connected to the back surface of the plate 128, side arms 134 at both ends of the bar 133, and both side arms 134 rotated by a rotation shaft 135 thereof.
A pressure cylinder 136 for swinging 28 is provided.
【0017】スイングプレート103の作動は、圧力シ
リンダ136の押しつけ、サイドアーム134の回転、
バー133を介してのプレート128のスイング作動を
行うことにより、初め垂直状態にある上記ラック102
に対し下方より旋回して押し当たり、押し当て面130
の上にラック102を載せた状態でラック102ごと水
平状態の姿勢を維持し、ラック102によるめっき物1
09の受取完了後は復帰旋回して、それに伴いラック1
02が自重で垂直状態になることを許すものである。The swing plate 103 is operated by pressing the pressure cylinder 136, rotating the side arm 134,
By swinging the plate 128 via the bar 133, the rack 102 initially in the vertical state is initially moved.
To the pressing surface 130 by swiveling from below
With the rack 102 placed on the rack, maintain a horizontal posture together with the rack 102, and use the rack 102 for plating 1
After the receipt of 09 is completed, it will turn back and the rack 1
02 is allowed to be in a vertical state by its own weight.
【0018】「ラック用開閉手段104について」ラッ
ク用開閉手段104は図5で示すように具体的にはロー
タリアクチュエータ126を意味し、ラック102がス
イングプレート103により水平状態とされたときにラ
ック102の可動アーム115の上端部近傍と対応する
位置に予めピン127を臨むようにしてある。ロータリ
アクチュエータ126が作動するとピン127が水平面
上で回転し可動アーム115に押しつけ力を付与して、
引張スプリング124に逆らって可動アーム115ひい
てはそのピン119を固定アーム114ひいてはそのピ
ン118から離れる方向に強制的に移動させる。この状
態でラック102の固定・可動両アーム114、115
が開放されたものとなる。[Regarding Rack Opening / Closing Means 104] The rack opening / closing means 104 specifically means a rotary actuator 126 as shown in FIG. 5, and when the rack 102 is brought into a horizontal state by the swing plate 103, the rack 102. The pin 127 is previously exposed at a position corresponding to the vicinity of the upper end of the movable arm 115. When the rotary actuator 126 operates, the pin 127 rotates on a horizontal plane to apply a pressing force to the movable arm 115,
The movable arm 115 and thus the pin 119 thereof are forcibly moved in the direction away from the tension spring 124 and away from the fixed arm 114 and thus the pin 118. In this state, both fixed and movable arms 114, 115 of the rack 102
Will be open.
【0019】従ってこの状態で真上に位置する取上げ搬
送手段101からめっき物109が水平状態のまま落下
されれば、直ぐ真下に水平状態で待機しているプレート
128上のそれも固定・可動両アーム114、115の
開いた間に着陸することになる。そして今度は逆にロー
タリアクチュエータ126が押しつけ力を解除すること
によりプレート128の押し当て面130上で固定・可
動両アーム114、115が閉じ、ピン119が円弧状
凹部132内で移動してピン118と協同してめっき物
109の辺部を三点支持する。Therefore, in this state, if the plated product 109 is dropped from the pick-up and transport means 101 located directly above in the horizontal state, it will be fixed or movable on the plate 128 immediately below and standing by in the horizontal state. It will land while the arms 114, 115 are open. Then, conversely, when the rotary actuator 126 releases the pressing force, both the fixed and movable arms 114 and 115 are closed on the pressing surface 130 of the plate 128, and the pin 119 moves in the arc-shaped recess 132 to move the pin 118. In cooperation with, the three sides of the plated product 109 are supported.
【0020】そしてスイングプレート103が復帰旋回
すると、ラック102はその形態からして固定・可動両
アーム114、115が突出しておりそれもめっき物1
09を保持した状態にあるから、ラック102も自動的
にロッド113を中心に回動して元の垂直状態となる。When the swing plate 103 is returned and swiveled, the rack 102 has both fixed and movable arms 114 and 115 protruding due to its shape.
Since it is in the state of holding 09, the rack 102 also automatically rotates around the rod 113 and returns to the original vertical state.
【0021】「めっき物の搬送装置200について」上
記の説明で元の垂直状態となったラック102は、図1
で示す搬送装置200の桁201上に載置される。桁2
01は一対並行してめっき装置300の両側に配してあ
りタクトシステムの採用により同一の間隔(ピッチ)で
ラック102を上昇・前進・下降の動作を繰り返し行う
ことで図1で右方へと搬送してゆくものである。図2の
中央で右方に繰り返し図示してある丸形状はラック10
2のガイド116を意味し且つガイド116が同一間隔
でめっき装置300に配されている状態を示している。[Concerning the apparatus 200 for transporting the plated material] The rack 102 which has been in the original vertical state in the above description is shown in FIG.
Is placed on the girder 201 of the carrying device 200. Digit 2
01 are arranged in parallel on both sides of the plating apparatus 300, and by adopting a tact system, the rack 102 is repeatedly moved up, forward, and down at the same interval (pitch) to the right in FIG. It will be transported. The circular shape repeatedly illustrated on the right side in the center of FIG.
The two guides 116 are shown and the guides 116 are arranged in the plating apparatus 300 at the same intervals.
【0022】桁201には、前後進用の圧力シリンダー
202と上下用の圧力シリンダー203が組み合わせて
あり、上昇、前進、下降、復帰後進という四辺形状の軌
跡を描くようにして一対並行の桁201が同じ動作を繰
り返すものである。このとき図2で示す複数のガイド1
16、即ちラック102、は各々同時にめっき装置30
0の上辺位置から上に持ち上げられ、右方に1ピッチ前
進させられ、下に下げられてめっき装置300の上辺位
置に置かれ、この動作を繰り返し行うことによりめっき
装置300で所定のめっき処理を受けるものである。The girder 201 is combined with a pressure cylinder 202 for forward / backward movement and a pressure cylinder 203 for up / down movement. Is to repeat the same operation. At this time, the plurality of guides 1 shown in FIG.
16 or the racks 102 are each at the same time as the plating device 30.
It is lifted up from the upper side position of 0, moved forward by 1 pitch to the right, lowered and placed at the upper side position of the plating apparatus 300. By repeating this operation, a predetermined plating process is performed by the plating apparatus 300. To receive.
【0023】「めっき装置300について」このめっき
装置300は、供給部303(めっき物搬送ラインのス
タート部112相当)、前処理部304、本めっき処理
部305、後処理部306及び取り出し部307(取り
出し装置400相当)から主に構成されている。本めっ
き処理部305には、処理槽301内に受け入れる多数
枚のめっき物109の枚数に見合う多数枚のアノード3
08が上下動手段302を介して処理槽301内に臨ま
せてある。ラック102がめっき物109を一枚あて横
長・略垂直状態で保持しているので、アノード308も
保持アーム309を介して片持ち状態で横長・略垂直状
態に保持されている。図1では2枚のアノード308の
み示され他のアノード308の図示を省略している。[Regarding Plating Device 300] This plating device 300 includes a supply unit 303 (corresponding to the start unit 112 of the plated product transport line), a pretreatment unit 304, a main plating treatment unit 305, a posttreatment unit 306, and a take-out unit 307 ( It is mainly composed of a take-out device 400). In the main plating processing unit 305, a large number of anodes 3 corresponding to the number of the plated products 109 received in the processing tank 301 are provided.
08 is exposed to the inside of the processing tank 301 via the vertical movement means 302. The rack 102 holds one plated product 109 and holds it in a horizontally long and substantially vertical state, so that the anode 308 is also held in a horizontally long and substantially vertically state via the holding arm 309 in a cantilever state. In FIG. 1, only two anodes 308 are shown and the other anodes 308 are omitted.
【0024】多数枚のアノード308はそれぞれ同一間
隔を隔てて保持アーム309を介して保持桁310に取
り付けられ上下動手段302としての圧力シリンダー3
11にて同時に処理槽301内(めっき液内)で上昇し
て各めっき物109同士の間に入り、下降して処理槽3
01の底部近辺で待機して再び上昇してはめっき物10
9同士の間に入って、あたかも前後二枚のアノード30
8がその間に一枚のめっき物109を挟み込む状態を呈
するので、めっき物109のめっき面に対しアノード3
08が極めて真近な位置を占めるものである。従ってめ
っき効率が極めて向上することになる。尚、本めっき処
理部305その他の処理部において、処理槽301の上
辺側部に配した通電部材からラック102を介しめっき
物109へ陰極電流が施されめっき物109をカソード
化して、必要な処理を行うものである。A large number of anodes 308 are attached to a holding girder 310 via holding arms 309 at the same intervals, respectively, and a pressure cylinder 3 as a vertical moving means 302.
At 11 at the same time, it rises in the treatment tank 301 (in the plating solution) to enter between the plated objects 109, and descends to the treatment tank 3
Standing near the bottom of 01 and rising again, the plated product 10
Enter between 9 and feel as if the front and rear anodes 30
8 has a state in which one plated product 109 is sandwiched between them, so that the anode 3 can be attached to the plated surface of the plated product 109.
08 occupies an extremely close position. Therefore, the plating efficiency is extremely improved. In the main plating processing unit 305 and other processing units, a cathodic current is applied to the plated product 109 from the current-carrying member arranged on the upper side of the processing tank 301 via the rack 102 to make the plated product 109 a cathode, and necessary treatment is performed. Is to do.
【0025】後処理部306は、中和・洗浄処理槽31
2、ラックの回動・水平化装置313、オーブン装置3
14を含むものである。タクトシステムによって一枚当
て順次送られてくるめっき物109(ラック102)
を、ラックの回動・水平化装置313が受取りラック1
02ごとめっき物109を水平化してはオーブン装置3
14内の搬送手段315に受渡して乾燥処理を施し、取
り出し部307(取り出し装置400)で取り出して行
くものである。The post-treatment unit 306 is a neutralization / cleaning treatment tank 31.
2, rack rotation / leveling device 313, oven device 3
14 is included. Plated product 109 (rack 102) sent one by one by the tact system
The rack rotation / leveling device 313 receives the
Oven device 3 by leveling the plated product 109 with 02
It is delivered to the conveying means 315 in the unit 14, dried, and taken out by the take-out unit 307 (take-out device 400).
【0026】「取り出し装置400について」取り出し
装置400は、エレベータ401、シフト装置402と
リフト403から主に構成される。オーブン装置314
内の搬送手段315に受渡されて乾燥処理が施されため
っき物109は、一枚当て逐次エレベータ401上に取
り出され所定枚数(例えば300枚)積載されると、そ
れが1ユニットとして扱われ、シフト装置402で図1
の右方へと移送される。そこでリフト403の受け棚状
のバー404が下から1ユニット全部をすくい上げ上方
へと移送し、作業者が適宜取り出すことになる。[About take-out device 400] The take-out device 400 is mainly composed of an elevator 401, a shift device 402 and a lift 403. Oven equipment 314
The plated product 109 that has been delivered to the transport means 315 inside and subjected to the drying process is taken out one by one on the elevator 401 and loaded a predetermined number (for example, 300), and it is treated as one unit, The shift device 402 shown in FIG.
To the right of. Then, the receiving rack-shaped bar 404 of the lift 403 picks up one unit from the bottom and transfers it to the upper side, and the worker takes it out appropriately.
【0027】「ラックの後処理装置500について」こ
のラックの後処理装置500はオーブン装置314の上
方に位置し、めっき装置300の後処理部306でラッ
ク102がその回動・水平化装置313によってめっき
物109をオーブン装置314内の搬送手段315に受
渡したことにより、いわば空になった状態になると、そ
の空のラック102を受入れるものである。ラックの後
処理装置500では、ラック102の特にめっき液中に
浸された可動アーム115に付いためっき(半田)の剥
離処理が行われる。[Regarding the post-treatment device 500 of the rack] The post-treatment device 500 of this rack is located above the oven device 314, and the rack 102 is rotated and leveled by the post-treatment part 306 of the plating device 300. When the plated product 109 is transferred to the transporting means 315 in the oven device 314, so to speak, when it becomes empty, the empty rack 102 is received. In the rack post-treatment device 500, the plating (solder) of the rack 102, particularly the movable arm 115 immersed in the plating solution, is removed.
【0028】「ラックの復帰装置600について」めっ
きの剥離処理が施された後で、ラック102はスタート
部112へと再び送り返される。このために一対で並行
に配されたエンドレスチェーン601にフック602が
多数設けられ、各一対のフック602が一つのラック1
02を受取りめっき装置300の上を今度は図1で左方
へと吊り下げたまま移送してスタート部112へと復帰
せしめるものである。[Regarding the Rack Return Device 600] After the plating is stripped, the rack 102 is sent back to the start unit 112. For this reason, a large number of hooks 602 are provided on a pair of endless chains 601 arranged in parallel, and each pair of hooks 602 is included in one rack 1.
02 is received and transferred on the plating apparatus 300 while being hung to the left in FIG. 1 and returned to the start unit 112.
【0029】[0029]
【発明の効果】以上説明したごとく本発明に係るめっき
物の供給装置によれば多くの効果が期待できるものであ
り、そのうちの主な効果を列挙すれば、(1)めっき物
を一枚当て扱うものとし、めっき装置内でめっき物を横
長垂直状の状態で保持できるから、本めっき処理に際し
めっき装置内に入れためっき物にアノードを配置する場
合、アノードを横長垂直状にしためっき物のめっき面に
直ぐ間近で対向して配置できてめっき効率の向上が期待
されるものであり、また(2)タクトシステム採用の搬
送装置の使用を前提とし、めっき装置に一定間隔で複数
のラックをそれもめっき物を横長で略垂直状態にしてあ
てがうものにして、多数のラックに逐次効率よくめっき
物を一枚あて供給できるものであり、(3)めっき物供
給の際に予め水平状態で積載されている多数枚のめっき
物を一枚当て取上げては、そのつど水平状態にしたラッ
クへ水平状態でめっき物を受渡し供給できるから取扱い
易く、しかもめっき物を受渡したあとは先に水平状態と
していたラックを垂直状態の姿勢に復帰させるので搬送
し易いものである等の効果がある。EFFECTS OF THE INVENTION As described above, the plated material supply apparatus according to the present invention can be expected to have many effects. The main effects are listed as follows: (1) One plated material is applied. Since the plated product can be held in a horizontally long vertical state in the plating device, when arranging the anode in the plated product placed in the plating device during the main plating process, the plated product in which the anode is horizontally long vertically is used. It is expected to improve the plating efficiency because it can be placed immediately opposite to the plating surface, and (2) it is premised on the use of a transfer device that employs a tact system, and multiple racks can be installed in the plating device at regular intervals. It is also one in which the plated product is horizontally long and is placed in a substantially vertical state, so that one plated product can be sequentially and efficiently supplied to a number of racks. (3) When the plated product is supplied horizontally Picking up a large number of plated products that are loaded in one state allows the plated products to be delivered and supplied in a horizontal state to a rack that is in a horizontal state each time. Since the rack which has been in the horizontal state is returned to the posture in the vertical state, there is an effect that it can be easily transported.
【0030】[0030]
【図1】めっきシステムの全体説明図。FIG. 1 is an overall explanatory view of a plating system.
【図2】めっき装置を示す概略側面図。FIG. 2 is a schematic side view showing a plating apparatus.
【図3】めっき物の供給装置を示す図1中の矢示A方向
より見た側面図。FIG. 3 is a side view showing a device for supplying a plated product, as viewed in the direction of arrow A in FIG.
【図4】めっき物の供給装置を示す図3中の矢示B方向
より見た側面図。FIG. 4 is a side view showing a device for supplying a plated product, as viewed in the direction of arrow B in FIG. 3.
【図5】ラック用開閉手段を示す図4中の矢示C方向よ
り見た平面図。5 is a plan view showing the rack opening / closing means as viewed in the direction of arrow C in FIG. 4. FIG.
【図6】ラックを示す図1中の矢示D方向より見た側面
図。FIG. 6 is a side view showing the rack as seen from the direction of the arrow D in FIG. 1.
【図7】ラックを示す図6中の矢示E方向より見た側面
図。FIG. 7 is a side view of the rack as viewed in the direction of arrow E in FIG.
【図8】めっき装置およびラックの復帰装置を示す図2
中の矢示F、F方向より見た側面図。FIG. 8 is a view showing a plating device and a rack restoring device.
The side view seen from the arrow F and the F direction in the inside.
【図9】めっき物の取り出し装置の拡大側面図。FIG. 9 is an enlarged side view of a device for taking out plated products.
【符号の説明】 100 めっき物の供給装置 101 取上げ搬送手段 102 ラック 103 スイングプレート 104 ラック用開閉手段 109 めっき物 112 めっき物搬送ラインのスタート部 113 ロッド 115 可動アーム 200 めっき物の搬送装置 300 めっき装置 400 取り出し装置 500 ラックの後処理装置 600 ラックの復帰装置[Explanation of Codes] 100 Plating Material Supply Device 101 Pickup / Conveying Means 102 Rack 103 Swing Plate 104 Rack Opening / Closing Means 109 Plating Product 112 Starting Point of Plating Product Conveying Line 113 Rod 115 Movable Arm 200 Plating Product Conveying Device 300 Plating Device 400 removal device 500 rack post-treatment device 600 rack restoration device
フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 // B65G 47/91 A 8010−3F Continuation of front page (51) Int.Cl. 5 Identification number Office reference number FI technical display location // B65G 47/91 A 8010-3F
Claims (2)
き物を一枚あて取上げてめっき物搬送ラインのスタート
部へ運びめっき物を水平状態のまま落下させる取上げ搬
送手段と、 陰極電流を通電自在とするロッドに、その長手交差方向
に突出させて、固定・可動の両アームを各々配し、固定
・可動の両アームにはめっき物を少なくとも三点支持す
るためのピンを先端で向き合わせた位置に各々備え、そ
して可動アームをロッドに対し回動自在とし且つ可動ア
ームのピンを固定アームのピンに向けて押し付ける付勢
手段を可動アームに設けためっき物搬送用のラックと、 垂直状態の上記ラックに対し下方より旋回して押し当た
り、ラックを上に載せた状態でラックごと水平状態を維
持し、ラックによるめっき物の受取完了後は復帰旋回し
てラックが自重で垂直状態になることを許すスイングプ
レートと、 そして、水平状態となっているスイングプレート上のラ
ックに対しその付勢手段に逆らって可動アームを開放方
向へ回動させ、スイングプレート上で且つ固定・可動両
アームのピン間に水平状態のめっき物を受け入れさせて
後に可動アームの閉鎖方向への回動を許すラック用開閉
手段と、から成るめっき物の供給装置。1. A pick-up and transport means for picking up one strip-shaped plated product which is placed in advance in a horizontal state and carrying it to the start portion of the plated product transport line and dropping the plated product in a horizontal state, and a cathode current. Both fixed and movable arms are arranged by projecting in the direction intersecting the length of the rod that can be energized, and both fixed and movable arms face with pins for supporting at least three points of plated products at their tips. A rack for transporting plated products, which is provided in each of the combined positions, and in which the movable arm is rotatable with respect to the rod and the biasing means for pressing the pin of the movable arm toward the pin of the fixed arm is provided on the movable arm, Rotate from below to push against the rack in the above state, keep the rack horizontal with the rack placed on top, and return to the rack after receiving the plated product by the rack. The swing plate that allows it to be in a vertical state by its own weight, and with respect to the rack on the swing plate in a horizontal state, the movable arm is rotated in the opening direction against the biasing means, Further, there is provided a plated material supply device comprising: a rack opening / closing means for allowing the plated material in a horizontal state to be received between the pins of both the fixed and movable arms and allowing the movable arm to rotate in the closing direction later.
面には、固定アームのピン受入用凹部と、可動アームの
開閉動作によるピンの移動軌跡に相応させた湾曲状の可
動アームのピン受入用凹部とが設けてある請求項1記載
のめっき物の供給装置。2. A pin receiving concave portion of a fixed arm and a curved pin receiving concave portion of a movable arm corresponding to a locus of movement of the pin due to opening / closing operation of the movable arm, on a pressing surface of the swing plate against the rack. The plated material supply apparatus according to claim 1, further comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31444092A JPH06151677A (en) | 1992-10-30 | 1992-10-30 | Plated article supply device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31444092A JPH06151677A (en) | 1992-10-30 | 1992-10-30 | Plated article supply device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06151677A true JPH06151677A (en) | 1994-05-31 |
Family
ID=18053385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31444092A Pending JPH06151677A (en) | 1992-10-30 | 1992-10-30 | Plated article supply device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06151677A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150270151A1 (en) * | 2014-03-24 | 2015-09-24 | Ebara Corporation | Substrate processing apparatus and substrate tranfser method |
| JP2015179747A (en) * | 2014-03-19 | 2015-10-08 | 株式会社荏原製作所 | Wet processing equipment |
| US9728435B2 (en) | 2010-10-21 | 2017-08-08 | Ebara Corporation | Plating apparatus and plating method |
-
1992
- 1992-10-30 JP JP31444092A patent/JPH06151677A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9728435B2 (en) | 2010-10-21 | 2017-08-08 | Ebara Corporation | Plating apparatus and plating method |
| US9984910B2 (en) | 2010-10-21 | 2018-05-29 | Ebara Corporation | Plating apparatus and plating method |
| US9991145B2 (en) | 2010-10-21 | 2018-06-05 | Ebara Corporation | Plating apparatus and plating method |
| JP2015179747A (en) * | 2014-03-19 | 2015-10-08 | 株式会社荏原製作所 | Wet processing equipment |
| US20150270151A1 (en) * | 2014-03-24 | 2015-09-24 | Ebara Corporation | Substrate processing apparatus and substrate tranfser method |
| KR20150110303A (en) * | 2014-03-24 | 2015-10-02 | 가부시키가이샤 에바라 세이사꾸쇼 | Substrate processing apparatus and substrate transfer method |
| US9786532B2 (en) * | 2014-03-24 | 2017-10-10 | Ebara Corporation | Substrate processing apparatus and method of transferring a substrate |
| US10141211B2 (en) | 2014-03-24 | 2018-11-27 | Ebara Corporation | Substrate processing apparatus and substrate transfer method |
| KR20200043327A (en) * | 2014-03-24 | 2020-04-27 | 가부시키가이샤 에바라 세이사꾸쇼 | Substrate processing apparatus and substrate transfer method |
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