JPH0618580Y2 - Rotating disk used for surface modification device of solid particles - Google Patents
Rotating disk used for surface modification device of solid particlesInfo
- Publication number
- JPH0618580Y2 JPH0618580Y2 JP8850690U JP8850690U JPH0618580Y2 JP H0618580 Y2 JPH0618580 Y2 JP H0618580Y2 JP 8850690 U JP8850690 U JP 8850690U JP 8850690 U JP8850690 U JP 8850690U JP H0618580 Y2 JPH0618580 Y2 JP H0618580Y2
- Authority
- JP
- Japan
- Prior art keywords
- impact
- particles
- solid particles
- rotating disk
- rotary disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002245 particle Substances 0.000 title claims description 67
- 239000007787 solid Substances 0.000 title claims description 24
- 230000004048 modification Effects 0.000 title description 5
- 238000012986 modification Methods 0.000 title description 5
- 238000002407 reforming Methods 0.000 claims description 8
- 230000003100 immobilizing effect Effects 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 3
- 239000002994 raw material Substances 0.000 description 16
- 230000002093 peripheral effect Effects 0.000 description 10
- 239000010419 fine particle Substances 0.000 description 9
- 239000000843 powder Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000007599 discharging Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- LGLOITKZTDVGOE-UHFFFAOYSA-N boranylidynemolybdenum Chemical compound [Mo]#B LGLOITKZTDVGOE-UHFFFAOYSA-N 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000007771 core particle Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Glanulating (AREA)
Description
【考案の詳細な説明】 a.産業上の利用分野 本考案は、衝撃式打撃手段を用いた固体粒子の表面改質
処理、あるいは固体粒子の球形化処理を行なう装置にお
いて、該処理装置の衝撃室内に配置され、高速で回転
し、粒子を分散しながら固体粒子に衝撃打撃力を与え、
上記処理を効率よく行なうことができる回転盤に関す
る。Detailed Description of the Invention a. INDUSTRIAL APPLICABILITY The present invention is an apparatus for performing a surface modification treatment of solid particles or a spheroidization treatment of solid particles using an impact type impacting means, which is placed in an impact chamber of the treatment apparatus and rotates at high speed. , Giving impact impact force to solid particles while dispersing particles,
The present invention relates to a turntable capable of efficiently performing the above processing.
b.従来の技術 従来、固体粒子の固結防止、変色変質防止、分散性の向
上、流動性の改善、有用(高価)物質の少量化等を目的
として、核となる固体粒子(以下、母粒子という)の表
面に該固体粒子よりも小さな微粒子(以下、子粒子とい
う)を機械的手段により強制的に埋設、固着または造膜
させて固定化し、極めて短時間のうちに均一で安定した
母粒子の表面改質を行う固体粒子の表面改質装置、ある
いは固体粒子の固着防止、分散性の向上、流動性の改善
等を目的とした金属等の不定形固体粒子を球形処理する
装置としては、例えば特開昭62-83029号公報等に記載さ
れたものがある。b. Conventional technology Conventionally, for the purpose of preventing solid particles from solidifying, preventing discoloration and alteration, improving dispersibility, improving fluidity, reducing the amount of useful (expensive) substances, etc., solid core particles (hereinafter referred to as mother particles) ), The fine particles smaller than the solid particles (hereinafter referred to as “child particles”) are forcibly embedded, fixed or formed into a film by a mechanical means to be fixed, and a uniform and stable mother particle is formed within an extremely short time. Examples of a solid particle surface reforming device for surface modification, or a device for spherically treating amorphous solid particles such as metal for the purpose of preventing sticking of solid particles, improving dispersibility, improving fluidity, etc. There is one described in JP-A-62-83029.
前記固体粒子の表面改質装置、あるいは固体粒子の球形
化処理装置(以下、両装置を単に処理装置という)を、
第4図及び第5図に示す。同図において、101はケーシ
ング、102は前カバー、103は衝突リングである。これら
各部材に囲まれて粉体の衝撃室104が形成される。この
衝撃室104の中に、高速回転する回転盤105があり、該回
転盤105は回転軸106にナット107により固定されてい
る。The solid particle surface modification device or the solid particle spheroidizing device (hereinafter, both devices are simply referred to as a processing device),
Shown in FIGS. 4 and 5. In the figure, 101 is a casing, 102 is a front cover, and 103 is a collision ring. Surrounded by these members, a powder impact chamber 104 is formed. A rotary disk 105 that rotates at high speed is provided in the impact chamber 104, and the rotary disk 105 is fixed to a rotary shaft 106 by a nut 107.
また、108は原料投入管、109は原料投入ホッパー、110
は原料投入バルブ、111は循環回路で、該循環回路111は
前記衝突リング103の一部に開口する循環口112から前カ
バー102の中央を貫通して衝撃室104に連通している。11
3は衝突リング103の一部を切欠いて設けた改質粉体排出
用の開閉弁、114は開閉弁の弁軸、115は改質粉体排出用
シュートである。Further, 108 is a raw material feeding pipe, 109 is a raw material feeding hopper, 110
Is a raw material feeding valve, 111 is a circulation circuit, and the circulation circuit 111 communicates with the impact chamber 104 from a circulation port 112 opened in a part of the collision ring 103 through the center of the front cover 102. 11
Reference numeral 3 is an opening / closing valve for discharging the reforming powder, which is provided by cutting out a part of the collision ring 103, 114 is a valve shaft of the opening / closing valve, and 115 is a reforming powder discharging chute.
この処理装置において、衝撃室104内で高速で回転する
前記回転盤105は、第5図に示すように、その側面には
略直方体(羽根型)あるいは柱状の衝撃ピン116が、該
回転盤105の回転中心を中心にして放射状に取付けられ
ている。このような形状の回転盤105が高速で回転する
ことにより、処理装置内に気流の流れが生じ、該処理装
置内に投入された固体粒子群は、分散されながら衝撃ピ
ンや衝突リングの衝撃作用を受け、各種処理が行われ
る。In this processing apparatus, the turntable 105, which rotates at high speed in the impact chamber 104, has a substantially rectangular parallelepiped (blade-shaped) or columnar impact pin 116 on its side surface, as shown in FIG. It is mounted radially around the center of rotation of. By rotating the turntable 105 having such a shape at a high speed, an air flow is generated in the processing apparatus, and the solid particle group put into the processing apparatus is dispersed and the impact action of the impact pin or the collision ring is generated. Then, various processes are performed.
c.考案が解決しようとする課題 前記従来型の処理装置において、衝撃室内に配設され、
粒子に衝撃作用を与える回転盤105は、衝撃ピン106の形
状が略長方体(あるいは柱状)で、回転盤105の回転中
心を中心にして放射状に取付けられているので、原料投
入ホッパー109から衝撃室104に投入された被処理物は、
高速回転する回転盤105に取付けられた衝撃ピン116の衝
撃作用を受けた後、該衝撃ピン116の回転方向に面した
平面に沿って外周方向に移動し、衝突リング103に垂直
に衝突することによって強力な衝撃作用を受ける構造に
なっていた。そのため、以下に示す問題点があった。c. DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention In the conventional processing apparatus, the processing apparatus is disposed in the impact chamber,
In the rotary disc 105 that gives impact to the particles, the shape of the impact pin 106 is a substantially rectangular parallelepiped (or a column), and since the rotary disc 105 is mounted radially around the rotation center of the rotary disc 105, the raw material feeding hopper 109 The object to be processed thrown into the impact chamber 104 is
After being impacted by an impact pin 116 attached to a rotating disc 105 rotating at a high speed, the impact pin 116 moves in an outer peripheral direction along a plane facing the rotation direction of the impact pin 116 and collides vertically with the impact ring 103. It was designed to be subjected to a strong impact by. Therefore, there are the following problems.
不定形微粒子を球形化処理する場合は、球形化されな
がら時間と共に粉砕が進み、平均粒子径が小さくなる。When the irregular-shaped fine particles are spheroidized, the pulverization proceeds with time while being spheronized, and the average particle diameter becomes smaller.
母粒子の表面に子粒子を埋設又は固着させて固定化処
理する場合において、特にセラミックスに金属を固定化
する場合、回転盤の外周速度が速いと母粒子であるセラ
ミックスが粉砕されてしまい、また外周速度が遅いと子
粒子である金属が母粒子の表面に固定化されにくいた
め、固定化処理の効率が非常に悪かった。When immobilizing the child particles by embedding or fixing them on the surface of the mother particles, particularly when fixing the metal to the ceramics, the ceramics as the mother particles are crushed when the outer peripheral speed of the rotating disk is high, and When the peripheral velocity is low, the metal as a child particle is hard to be immobilized on the surface of the mother particle, so that the efficiency of the immobilization treatment is very poor.
本考案は、前記従来技術の課題に鑑みてなされたもの
で、固体粒子の表面改質処理、あるいは固体粒子の球形
化処理を効率よく行うことができる固体粒子の処理装
置、詳しくは、上記処理装置の衝撃室内に配置され、高
速で回転し、上記改質を効率よく行うことができる回転
盤を提供することを目的とする。The present invention has been made in view of the above-mentioned problems of the prior art, and is a solid particle treatment device capable of efficiently performing surface modification treatment of solid particles or spheroidization treatment of solid particles, more specifically, the above treatment. An object of the present invention is to provide a turntable which is disposed in the impact chamber of the apparatus, rotates at a high speed, and can efficiently perform the above reforming.
d.課題を解決するための手段 本考案は前記目的に添い、固体粒子の表面に他の物資を
固定化、成膜化して該固定粒子の表面を改質する気流中
衝撃式の表面改質装置、あるいは固体粒子の球形化処理
装置に用いられ、側面に間隔を置いて周設された衝撃ピ
ンを備えてなる回転盤において、該衝撃ピンを曲面を有
する柱状体で形成し、その曲面を回転盤の回転方向に向
け、かつ外方に傾斜して配置した回転盤とすることによ
って、前記課題を解消した。d. Means for Solving the Problems The present invention has been achieved in accordance with the above-mentioned object, and a surface reforming device of an air current impact type that modifies the surface of solid particles by immobilizing other substances on the surface of the solid particles to form a film, Alternatively, in a rotating disk used for a spheroidizing apparatus for solid particles and provided with impact pins circumferentially provided at intervals on the side surface, the impact pin is formed of a columnar body having a curved surface, and the curved surface is formed on the rotating disk. The above-mentioned problem is solved by providing a rotating disk that is arranged in the direction of rotation of and is inclined outward.
本考案に係る回転盤によって粉砕を極力抑えた不定形微
粒子の球形化処理を行うことが可能となり、さらに回転
盤の外周速度が低くても固定化ができ、また外周速度が
高くても母粒子を粉砕することなく、固定化処理ができ
るようになった。The rotating disk according to the present invention makes it possible to perform spheroidizing treatment of irregularly shaped fine particles with crushing suppressed as much as possible. Further, even if the peripheral speed of the rotating disk is low, it can be fixed, and even if the peripheral speed is high, mother particles It became possible to perform the immobilization treatment without crushing.
e.実施例 以下、本考案の実施例について図面を参照しながら詳細
に説明する。e. Embodiment Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings.
第1図〜第3図は本考案に係る回転盤を用いた固体粒子
の処理装置の1実施例である。1 to 3 show an embodiment of a solid particle processing apparatus using a rotating disk according to the present invention.
第1図において、1はケーシング、2は前カバー、3は
衝突リング、4は衝撃室、5は回転盤、6は回転軸、7
はナット、8は原料投入管、9は原料投入ホッパー、10
は原料投入バルブ、11は循環回路、12は循環口、13は開
閉弁、14は開閉弁の弁軸、15は改質粉体排出用シュート
であり、前記回転盤5を除き、前記従来装置のものと同
一構成からなっている。In FIG. 1, 1 is a casing, 2 is a front cover, 3 is a collision ring, 4 is an impact chamber, 5 is a rotary disk, 6 is a rotary shaft, and 7 is a rotary shaft.
Is a nut, 8 is a raw material feeding pipe, 9 is a raw material feeding hopper, 10
Is a raw material charging valve, 11 is a circulation circuit, 12 is a circulation port, 13 is an opening / closing valve, 14 is a valve shaft of the opening / closing valve, and 15 is a reforming powder discharge chute. It has the same structure as that of.
回転盤5は、第2図及び第3図に示すように、その側面
に略半円柱状の衝撃ピン16を、所定の間隔を置いて複数
個図示のように放射状に分散配置してある。この衝撃ピ
ン16は回転方向に面する曲面部16aと、背面部16bとを備
え、図の実施例では背面部16bは平面として、断面では
半円の弦となるように構成してある。そして、この曲面
部16aを回転盤5の回転方向に向け、かつ外方に傾斜し
て配置してある。なお、この背面部16bは断面が曲面、
平面、またはこれらの組合せの面で形成してもよく、さ
らにこれらの面が凹面に、あるいは突面となるように形
成してもよい。すなわち任意の形状とし、処理上支障と
ならず、かつ処理上効果的な形状のものを採用すること
ができる。As shown in FIGS. 2 and 3, the turntable 5 has a plurality of substantially semi-cylindrical impact pins 16 on its side surface at predetermined intervals in a radially dispersed arrangement as shown. The impact pin 16 is provided with a curved surface portion 16a facing the rotational direction and a back surface portion 16b. In the illustrated embodiment, the back surface portion 16b is a flat surface and has a semicircular chord in cross section. The curved surface portion 16a is arranged so as to face the rotation direction of the turntable 5 and be inclined outward. The back surface 16b has a curved cross section,
It may be formed by a plane surface or a surface of a combination thereof, and further, these surfaces may be formed as a concave surface or a convex surface. That is, it is possible to adopt an arbitrary shape that does not hinder processing and is effective in processing.
また曲面部16aの曲面は、円弧のように一定の曲率のも
のが好ましく、また異なる曲率のものを連続させて組合
せてもよい。Further, the curved surface of the curved surface portion 16a preferably has a constant curvature such as an arc, or may have different curvatures continuously combined.
第2図に示す態様では、衝撃ピン16の背面部16bを形成
する弦の中点Pと回転盤5の中心0とを結ぶ直線と、弦
とのなす傾斜角θは、0°<θ<90°の範囲とし、好ま
しくは15<θ<60°としてある。なお、このような角度
関係で配置されることを衝撃ピンが後退翼の位置にある
という。In the embodiment shown in FIG. 2, the inclination angle θ formed by the straight line connecting the midpoint P of the chord forming the back surface 16b of the impact pin 16 and the center 0 of the turntable 5 is 0 ° <θ < The range is 90 °, and preferably 15 <θ <60 °. In addition, it is said that the impact pin is located at the position of the retracted wing when the impact pin is arranged in such an angular relationship.
なお、この弦の部分は曲面部16aの両端を直線で結ぶ架
空の線であってもよく、実質的に衝撃ピンの背面部16b
を形成する壁面でなくともよい。The chord portion may be an imaginary line that connects both ends of the curved surface portion 16a with a straight line, and substantially the back surface portion 16b of the impact pin is provided.
It does not have to be a wall surface that forms the.
次に前記構成からなる回転盤を備えた装置を用いて実際
に固定粒子を処理した場合の具体的な2つの例について
説明する。Next, two specific examples of the case where the fixed particles are actually processed by using the apparatus provided with the rotating disk having the above-mentioned structure will be described.
例1 まず、第1図に示す装置において、改質粉体排出用の開
閉弁13を閉鎖した状態としておき、駆動手段によって回
転軸6を駆動し、回転盤5を、外周速度50〜150m/sで回
転させる。これによって回転盤5の外周の側面に周設さ
れた衝撃ピン16の回転に伴って、急激な空気の流れが生
じ、この気流の流れの遠心力に基づくファン効果によっ
て、衝撃室4に開口する循環口12から循環回路11を巡っ
て前カバー2の中心部付近に戻る気流の循環流れ、すな
わち完全な自己循環の流れが形成される。この際発生す
る単位時間当りの循環風量は多量であるため、短時間の
うちに莫大な回数の空気流循環サイクルが形成される。Example 1 First, in the apparatus shown in FIG. 1, the open / close valve 13 for discharging the reformed powder is kept closed, the rotary shaft 6 is driven by the driving means, and the rotary disk 5 is rotated at an outer peripheral speed of 50 to 150 m / m. Rotate with s. As a result, a sudden air flow is generated with the rotation of the impact pin 16 provided on the outer peripheral side surface of the turntable 5, and the air is opened to the impact chamber 4 by the fan effect based on the centrifugal force of this air flow. A circulation flow of the airflow that returns from the circulation port 12 to the vicinity of the central portion of the front cover 2 through the circulation circuit 11, that is, a complete self-circulation flow is formed. Since the amount of circulating air per unit time generated at this time is large, an enormous number of air flow circulation cycles are formed in a short time.
次に、原料投入バルブ10を開け、予め秤量しておいて一
定量の金属不定形微粒子を原料投入ホッパー9に投入
し、原料投入管8を通して短時間に装置内に供給し、投
入終了と同時に該原料投入バルブ10を閉じる。衝撃室4
に投入された粒子群は、高速回転する回転盤5の多数の
衝撃ピン16の衝撃作用を受けた後、該衝撃ピン16の曲面
部16aに沿って該曲面上を転がりながら外周方向に移動
し、次第に狭くなる曲面部16aと衝突リング3との間で
圧縮力、摩擦力を主体とする作用を受ける。そして、前
記循環ガスの流れに同伴して、粒子群は循環回路11を循
環して再び衝撃室4に戻り、再度同様の作用を受ける。Next, the raw material feeding valve 10 is opened, and a predetermined amount of metal irregular-shaped fine particles is fed into the raw material feeding hopper 9 and fed into the apparatus through the raw material feeding pipe 8 in a short time. The raw material feeding valve 10 is closed. Impact chamber 4
After being impacted by a large number of impact pins 16 of the rotating disk 5 that rotates at a high speed, the particle group thrown into is moved along the curved surface portion 16a of the impact pin 16 in the outer peripheral direction while rolling on the curved surface. Between the gradually narrowing curved surface portion 16a and the collision ring 3 is mainly subjected to the action of compressive force and frictional force. Then, accompanying the flow of the circulating gas, the particle group circulates in the circulation circuit 11 and returns to the impact chamber 4 again, and is subjected to the same action again.
このようにして、短時間の内に繰り返し衝撃作用および
圧縮力、摩擦を主体とする作用を受け、不定形だった微
粒子は次第に球形になっていく。この球形化処理に要す
る時間は、数秒から数分の単位である。In this way, the irregularly shaped fine particles gradually become spherical due to repeated impacts, compression forces, and friction mainly in a short time. The time required for this spheroidizing process is from a few seconds to a few minutes.
以上の球形化処理が終了した後は、改質粉体排出用の開
閉弁13を開き、排出する。球形化処理された微粒子は、
それ自身に作用している遠心力により、短時間で衝撃室
4及び循環回路11から排出され、シュート15を通ってサ
イクロン及びバッグフィルター(共に図示せず)等の粉
末捕集装置に誘導され、そこで捕集される。After the above spheroidizing process is completed, the on-off valve 13 for discharging the modified powder is opened and discharged. The spheroidized particles are
Due to the centrifugal force acting on itself, it is discharged from the impact chamber 4 and the circulation circuit 11 in a short time, guided through a chute 15 to a powder collecting device such as a cyclone and a bag filter (both not shown), It is collected there.
傾斜各θ=30°、直径が230mmの前記第2図及び第3図
に示す本考案の回転盤を用いて、該回転盤の外周速度90
m/secで、平均粒子径x50=134μmのステンレス不定形
微粒子を球形化処理した結果を第1表に示し、従来の回
転盤を有する処理装置を用いて行った結果と比較した。
同表において、x25/x75とは、累積体積分布の25%粒
子径と75%粒子径との比で、粒子の粒度分布の広がりを
示す数値である。この数値が1に近づくほど粒度分布が
狭く、均一な粒子径の粒子に近いことを示す。なお、原
料のステンレス不定形微粒子の平均粒子径は135μmで
あるが、同体積球相当径は90〜100μmであると考えら
れる。Using the turntable of the present invention shown in FIGS. 2 and 3 each having an inclination of θ = 30 ° and a diameter of 230 mm, the peripheral speed of the turntable is 90.
Table 1 shows the results of spheroidizing the stainless amorphous particles having an average particle size of x50 = 134 μm at m / sec. The results are compared with the results obtained by using a conventional processing device having a rotating disk.
In the table, x25 / x75 is a ratio between the 25% particle size and the 75% particle size of the cumulative volume distribution, and is a numerical value showing the spread of the particle size distribution of the particles. The closer the value is to 1, the narrower the particle size distribution, and the closer the particles are to particles having a uniform particle size. The average particle diameter of the raw material stainless amorphous particles is 135 μm, and the equivalent spherical equivalent diameter is considered to be 90 to 100 μm.
粒度分布の測定は、原料については標準篩で、球形化処
理品についてはレーザー光回折散乱粒度分布測定装置
(セイシン企業(株)製、PRO-7000S)で行った。The particle size distribution was measured using a standard sieve for the raw material and a laser light diffraction scattering particle size distribution measuring device (PRO-7000S manufactured by Seishin Enterprise Co., Ltd.) for the spheroidized product.
また、第6図に粒子構造の走査形電子顕微鏡(SEM)写真
を示した。同図において、(a)は処理前の原料、(b),
(c),(d)は従来型の回転盤で球形化処理した処理品のSE
M写真で、処理時間は各々2min、4min、7minである。ま
た、同図の(e),(f),(g)は本考案の回転盤で球形化処
理した処理品のSEM写真で、処理時間は同様に各々2mi
n、4min、7minである。Further, FIG. 6 shows a scanning electron microscope (SEM) photograph of the grain structure. In the figure, (a) is the raw material before treatment, (b),
(c) and (d) are SEs of processed products that have been spheroidized with a conventional turntable.
In the M photograph, the processing time is 2 min, 4 min, and 7 min, respectively. In addition, (e), (f), and (g) of the same figure are SEM photographs of the processed products spherically processed by the rotating disk of the present invention, and the processing time is 2 mi each.
n, 4min, 7min.
どちらの回転盤を用いても、処理時間と共に平均粒子径
は小さくなってはいるが、その変化は従来型の方が大き
い。さらに、x25/x75の数値も、従来型の方が大きく
なっていることから、従来型の回転盤を有する処理装置
おいては、不定形微粒子は球形化されるとはいうもの
の、そのかなりの量が粉砕されていることがわかる。第
6図のSEM写真からも従来型の回転盤を用いた方がより
粉砕され、細かくなっていることがわかる。The average particle size decreases with the processing time regardless of which rotating disk is used, but the change is larger in the conventional type. Further, the numerical value of x25 / x75 is also larger in the conventional type, and therefore, in the processing apparatus having the conventional rotating disk, although the irregular fine particles are spheroidized, it is considerably large. It can be seen that the quantity is crushed. From the SEM photograph shown in Fig. 6, it can be seen that the conventional rotary disk is more crushed and finer.
例2 次に、同装置を用いて、セラミックス粒子の表面に他の
金属微粒子を固定化して、母材金属の耐摩耗性を向上さ
せるための複合化溶射粉を製造する他の例について説明
する。 Example 2 Next, another example of producing composite thermal spray powder for improving wear resistance of a base metal by immobilizing other metal fine particles on the surface of ceramic particles using the same apparatus will be described. .
平均粒子径40μmの不定形(凹凸状)ホウ化モリブデン
粒子の表面に平均粒子径0.3μmニッケル微粒子をあら
かじめミキサー等で付着させたオーダードミクスチャー
を同装置に投入し、回転盤の周速度を変えて固定化処理
を行った。SEMで観察した固定化処理状況を第2表に示
した。Change the peripheral speed of the turntable by putting an ordered mixture in which nickel fine particles with an average particle size of 0.3 μm have been attached in advance on the surface of molybdenum boride particles with an average particle diameter of 40 μm by using a mixer. Immobilization treatment was performed. Table 2 shows the status of immobilization treatment observed by SEM.
同表に示したように、従来型の回転盤を使用した場合
は、低速域においては固定化が不良であり、高速域にお
いては母粒子(ホウ化モリブデン粒子)のほとんどが粉
砕されていた。一方本考案の回転盤を使用した場合は、
低速域においても固定化は良好で、高速域においては母
粒子の粉砕はほとんど確認されず、また固定化も良好で
あった。なお、本考案の回転盤を使用した場合は、母粒
子表面の凹部にまで子粒子を良好に固定化していた。 As shown in the table, when the conventional rotary disk was used, immobilization was poor in the low speed range, and most of the mother particles (molybdenum boride particles) were crushed in the high speed range. On the other hand, when using the turntable of the present invention,
The immobilization was good even in the low speed range, the pulverization of the mother particles was hardly confirmed in the high speed range, and the immobilization was also good. When the rotating disk of the present invention was used, the child particles were well fixed even in the recesses on the surface of the mother particles.
f.本考案の効果 本考案の回転盤を使用した固体粒子の処理装置を用いる
ことにより、下記に示す効果が生じた。f. Effects of the Invention The following effects are produced by using the solid particle processing apparatus using the rotating disk of the invention.
衝撃ピンの曲面部と衝突リングとの間で圧縮力、摩擦
力を主体とする作用を受けることにより、粉砕を極力抑
えた不定形微粒子の球形化処理を行うことができるよう
になった。By subjecting the curved surface of the impact pin and the collision ring mainly to the compressive force and the frictional force, it has become possible to perform the spheroidizing treatment of the irregular fine particles with the crushing suppressed as much as possible.
特に、衝撃ピンを後退翼の位置にすることにより、粒子
群を分散する力は変わらず、粒子に直接作用する衝撃力
は従来のものより弱くなり、その代わり圧縮力・摩擦力
は従来型のものに比べて大きくなったので、各種処理を
効率よく行うことができるようになった。In particular, by placing the impact pin at the position of the swept wing, the force that disperses the particle group does not change, the impact force that directly acts on the particles becomes weaker than the conventional one, and instead the compression force / friction force is the same as the conventional type. Since it is larger than the ones, various processing can be performed efficiently.
第1図は本考案に係る回転盤を装着した表面改質装置の
断面説明図、第2図及び第3図は同回転盤の平面図と斜
視図、第4図は従来の表面改質装置の断面説明図、第5
図は第4図の装置に用いられている従来の回転盤の斜視
図、第6図は固体粒子の粒子構造の走査形電子顕微鏡写
真を示し、同図(a)は処理前もの、同図(b),(c),(d)は
従来の回転盤で処理したもの、同図(e),(f),(g)は本
考案に係る回転盤で処理した場合を夫々示す。 1……ケーシング、2……前カバー、 3……衝突リング、4……衝撃室、 5……回転盤、8……原料投入管、 9……原料投入ホッパー、11……循環回路、 16……衝撃ピン、16a……曲面部。FIG. 1 is a cross-sectional explanatory view of a surface reforming apparatus equipped with a rotary disk according to the present invention, FIGS. 2 and 3 are plan and perspective views of the rotary disk, and FIG. 4 is a conventional surface modifying apparatus. Explanatory drawing of No. 5,
The figure is a perspective view of a conventional rotary disk used in the apparatus of FIG. 4, and FIG. 6 is a scanning electron micrograph of the particle structure of solid particles. (b), (c) and (d) show the case of processing with a conventional turntable, and (e), (f) and (g) of the same figure show the case of treating with the turntable according to the present invention. 1 ... Casing, 2 ... Front cover, 3 ... Collision ring, 4 ... Impact chamber, 5 ... Rotating plate, 8 ... Raw material feeding pipe, 9 ... Raw material feeding hopper, 11 ... Circulation circuit, 16 …… Impact pin, 16a …… Curved part.
Claims (3)
化して該固定粒子の表面を改質する気流中衝撃式の表面
改質装置、あるいは固体粒子の球形化処理装置に用いら
れ、側面に間隔を置いて周設された衝撃ピンを備えてな
る回転盤において、該衝撃ピンを曲面を有する柱状体で
形成し、その曲面を回転盤の回転方向に向け、かつ外方
に傾斜して配置したことを特徴とする回転盤。1. A surface reforming device of an impact in an air current for immobilizing another substance on the surface of solid particles to form a film to modify the surface of the fixed particles, or a spheroidizing device for solid particles. A rotary disk provided with impact pins circumferentially provided at intervals on the side surface, the impact pin is formed of a columnar body having a curved surface, and the curved surface is directed in the rotation direction of the rotary disk and outwardly. A turntable characterized by being placed at an angle.
ていることを特徴とする実用新案登録請求の範囲第1項
記載の回転盤。2. The rotary disk according to claim 1, wherein the impact pin is mounted at the position of the swept wing.
特徴とする実用新案登録請求の範囲第1項記載の回転
盤。3. The rotary disk according to claim 1, wherein the columnar body is a substantially semi-cylindrical body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8850690U JPH0618580Y2 (en) | 1990-08-24 | 1990-08-24 | Rotating disk used for surface modification device of solid particles |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8850690U JPH0618580Y2 (en) | 1990-08-24 | 1990-08-24 | Rotating disk used for surface modification device of solid particles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0445538U JPH0445538U (en) | 1992-04-17 |
| JPH0618580Y2 true JPH0618580Y2 (en) | 1994-05-18 |
Family
ID=31821774
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8850690U Expired - Lifetime JPH0618580Y2 (en) | 1990-08-24 | 1990-08-24 | Rotating disk used for surface modification device of solid particles |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0618580Y2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5797358B2 (en) * | 2013-06-20 | 2015-10-21 | 株式会社奈良機械製作所 | Powder processing equipment |
| JP6409789B2 (en) * | 2016-01-22 | 2018-10-24 | トヨタ自動車株式会社 | Wet powder manufacturing apparatus and wet powder manufacturing method |
-
1990
- 1990-08-24 JP JP8850690U patent/JPH0618580Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0445538U (en) | 1992-04-17 |
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