JPH06187634A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH06187634A JPH06187634A JP35612792A JP35612792A JPH06187634A JP H06187634 A JPH06187634 A JP H06187634A JP 35612792 A JP35612792 A JP 35612792A JP 35612792 A JP35612792 A JP 35612792A JP H06187634 A JPH06187634 A JP H06187634A
- Authority
- JP
- Japan
- Prior art keywords
- protective layer
- magnetic
- layer
- recording medium
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011241 protective layer Substances 0.000 claims abstract description 52
- 239000010410 layer Substances 0.000 claims abstract description 42
- 150000002500 ions Chemical class 0.000 claims abstract description 32
- 238000005468 ion implantation Methods 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims description 9
- 239000010408 film Substances 0.000 description 17
- 239000000758 substrate Substances 0.000 description 13
- 230000001133 acceleration Effects 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000002344 surface layer Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 230000003068 static effect Effects 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000011651 chromium Substances 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 230000000051 modifying effect Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001941 electron spectroscopy Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、磁気記録媒体に関す
る。さらに詳しくは、磁気ディスクドライブ装置等の磁
気記録装置に用いられる磁気記録媒体に関する。FIELD OF THE INVENTION The present invention relates to a magnetic recording medium. More specifically, the present invention relates to a magnetic recording medium used in a magnetic recording device such as a magnetic disk drive device.
【０００２】[0002]
【従来の技術】近年、コンピューターの補助記録装置と
して用いられる磁気記録装置は、表面に磁性層が形成さ
れたディスク状あるいはドラム状の磁気記録媒体を備
え、この磁気記録媒体の磁性層を磁化させて情報を記録
するものである。2. Description of the Related Art In recent years, a magnetic recording device used as an auxiliary recording device for a computer has a disk-shaped or drum-shaped magnetic recording medium having a magnetic layer formed on the surface thereof and magnetizes the magnetic layer of the magnetic recording medium. To record information.
【０００３】磁気記録媒体の基本構造は、ディスク状の
ものを例にとると、一般に、アルミニウム合金をニッケ
ル−リン（Ｎｉ−Ｐ）合金等で被覆してなるディスク状
の基板上にＣｏ−Ｎｉ−Ｃｒ合金等からなる磁性層を形
成してなる。そして、このような磁気記録媒体を備えた
磁気記録装置においては、一般にいわゆるＣＳＳ（Ｃｏ
ｎｔａｃｔ Ｓｔａｒｔ Ｓｔｏｐ）方式と呼ばれる記
録・再生動作が行われる。The basic structure of a magnetic recording medium is, for example, a disk-shaped one, and generally, a Co-Ni is formed on a disk-shaped substrate formed by coating an aluminum alloy with a nickel-phosphorus (Ni-P) alloy or the like. A magnetic layer made of —Cr alloy or the like is formed. Further, in a magnetic recording device provided with such a magnetic recording medium, a so-called CSS (Co
A recording / reproducing operation called an ntact start stop method is performed.
【０００４】すなわち、操作開始時に磁気ヘッドと磁気
記録媒体面とを接触状態でセットした後、磁気記録媒体
に所要の回転を与えることにより磁気ヘッドを僅かなが
ら浮上させ、磁気ヘッドと磁気記録媒体面との間に空気
層分の空間を作り、この状態で記録・再生動作がなされ
るものである。そして、記録・再生動作を終了して磁気
記録媒体面の回転を止めると、両者は再び接触状態に戻
る。That is, after the magnetic head and the surface of the magnetic recording medium are set in contact with each other at the start of the operation, the magnetic head is slightly levitated by applying a required rotation to the magnetic recording medium, and the magnetic head and the surface of the magnetic recording medium are slightly floated. A space corresponding to the air layer is formed between and, and the recording / reproducing operation is performed in this state. Then, when the recording / reproducing operation is ended and the rotation of the magnetic recording medium surface is stopped, the both return to the contact state again.
【０００５】このように、磁気記録装置においては磁気
ヘッドと磁気記録媒体との離隔・接触サイクルが繰り返
され、次第に磁気記録媒体面が摩耗したり傷が付いたり
する。このため、磁性層の上に保護層を設け、磁気ヘッ
ドとの接触等による摩耗を防止するようにしている。ま
た、耐摩耗性を向上するために、前記保護層の上にさら
にフロロカーボン系の液体潤滑剤等からなる潤滑層を設
ける場合もある。As described above, in the magnetic recording apparatus, the separation / contact cycle between the magnetic head and the magnetic recording medium is repeated, and the surface of the magnetic recording medium is gradually worn or damaged. Therefore, a protective layer is provided on the magnetic layer to prevent abrasion due to contact with the magnetic head or the like. Further, in order to improve wear resistance, a lubricating layer made of a fluorocarbon liquid lubricant or the like may be further provided on the protective layer.
【０００６】従って、保護層は前述したような磁気ヘッ
ドとの接触に耐える耐摩耗性が求められ、また磁性層を
腐食から守る防食性をも有していることが必要である。
このような特性を実現する保護層として、例えば炭化膜
が実用化されている（特公昭６０−２３４０６号公報参
照）。Therefore, the protective layer is required to have abrasion resistance to withstand the contact with the magnetic head as described above, and it is also necessary to have anticorrosion property to protect the magnetic layer from corrosion.
For example, a carbide film has been put into practical use as a protective layer that realizes such characteristics (see Japanese Patent Publication No. 60-23406).
【０００７】[0007]
【発明が解決しようとする課題】近年、コンピューター
により処理する情報量の増加とともに大容量の磁気記録
装置が要求されるようになり、これに伴って磁気記録装
置に用いる磁気記録媒体も高記録密度化が求められてい
る。従って、このような要求を満たす高記録密度の磁気
記録媒体の開発が今後の課題となっている。In recent years, as the amount of information processed by a computer has increased, a large-capacity magnetic recording device has been demanded, and accordingly, a magnetic recording medium used in the magnetic recording device has a high recording density. Is required. Therefore, the development of a magnetic recording medium having a high recording density that meets such requirements is a future subject.
【０００８】このような磁気記録媒体の高記録密度化を
実現するには、記録・再生動作時における磁気ヘッドと
磁気記録媒体の磁性層との距離をできるだけ小さくする
必要がある。その方法としては、保護層の薄膜化や磁気
ヘッドの低浮上化があるが、磁気ヘッドの低浮上化は極
めて困難である。このため、保護層をいかに薄膜化する
かが問題となる。特に、上述した近年の高密度記録媒体
に対する社会的要求の高まりに応じるためには、保護層
の著しい薄膜化を避けて通ることはできない。In order to increase the recording density of such a magnetic recording medium, it is necessary to minimize the distance between the magnetic head and the magnetic layer of the magnetic recording medium during the recording / reproducing operation. As a method therefor, there is a thinning of the protective layer and a low flying height of the magnetic head, but it is extremely difficult to reduce the flying height of the magnetic head. Therefore, how to thin the protective layer becomes a problem. In particular, in order to meet the increasing social demands for the above-mentioned recent high-density recording media, it is inevitable to avoid a significant thinning of the protective layer.
【０００９】しかし、従来のスパッタ法による炭化膜
は、ある程度以上の膜厚がなければ十分な耐摩耗性や耐
食性を発揮することができない。すなわち、このような
炭化膜を保護層とするする場合、膜厚が少なくとも３０
ｎｍ以上なければ耐久性（耐摩耗性、耐食性）を十分に
保証することはできない。However, the conventional carbonized film formed by the sputtering method cannot exhibit sufficient wear resistance and corrosion resistance unless the film thickness is greater than a certain level. That is, when such a carbonized film is used as the protective layer, the film thickness is at least 30.
If it is not more than nm, the durability (wear resistance, corrosion resistance) cannot be sufficiently guaranteed.
【００１０】[0010]
【発明の目的】そこで本発明は、上記のような問題点を
解決するためになされたものであり、極めて薄い膜厚で
も耐摩耗性が良く、且つ剥離を生じさせない硬質保護層
を有し、高密度化を実現するとともに信頼性の高い磁気
記録媒体を提供することを目的とする。SUMMARY OF THE INVENTION Therefore, the present invention has been made to solve the above problems, and has a hard protective layer which is excellent in abrasion resistance even at an extremely thin film thickness and does not cause peeling, An object of the present invention is to provide a highly reliable magnetic recording medium that realizes high density.
【００１１】[0011]
【課題を解決するための手段】本発明の磁気記録媒体
は、下地体の上に形成された磁性層の表面に、イオン注
入法によりイオンを該磁性層表面に注入して該磁性層表
面を硬化させることにより得られた保護層を設けたこと
を特徴とする。In the magnetic recording medium of the present invention, ions are injected into the surface of the magnetic layer formed on the underlayer by an ion implantation method so that the surface of the magnetic layer is removed. A protective layer obtained by curing is provided.
【００１２】ここで、前記磁性層に注入するイオンは、
Ｃ、Ｎ、Ｏから選ばれた少なくとも１種の元素のイオン
が望ましい。また、前記保護層の厚さは１〜２０ｎｍで
あるのが望ましい。Here, the ions implanted into the magnetic layer are
Ions of at least one element selected from C, N and O are desirable. The thickness of the protective layer is preferably 1 to 20 nm.
【００１３】また、前記保護層のイオン注入によるドー
ズ量は、１．０×１０16〜３．０×１０18個／ｃｍ2の
範囲であるのが望ましい。The dose of the protective layer by ion implantation is preferably in the range of 1.0 × 10 16 to 3.0 × 10 18 pieces / cm 2 .
【００１４】ここでいうドーズ量（Ｄ）とは、基板表面
に打込まれた単位面積当りのイオン数（個／ｃｍ2）で
あり、基板にイオン電流Ｉでｔ秒間注入された総電荷を
素電荷Ｑ（１．６×１０-19Ｃ／イオン）と照射された
面積Ｓ（ｃｍ2）で割って算出される。すなわち、Ｄ＝
（Ｉ×ｔ）／（Ｑ×Ｓ）で表される。The dose amount (D) referred to here is the number of ions (units / cm 2 ) per unit area implanted on the surface of the substrate, and is the total charge injected into the substrate for t seconds with an ion current I. It is calculated by dividing by the elementary charge Q (1.6 × 10 −19 C / ion) and the irradiated area S (cm 2 ). That is, D =
It is represented by (I × t) / (Q × S).
【００１５】次に、本発明をさらに詳細に説明する。本
発明で使用する下地体は、例えばディスク状のアルミニ
ウム合金基板の表面にＮｉＰ合金及びクロム（Ｃｒ）等
をスパッタ、真空蒸着、メッキ等により被覆したものを
用いることができる。その上に形成される磁性層は、例
えばメッキ法によるＣｏＣｒＮｉ合金層やスパッタ法に
よるＣｏＣｒＴａ合金層等からなる。Next, the present invention will be described in more detail. The base used in the present invention may be, for example, a disk-shaped aluminum alloy substrate whose surface is coated with NiP alloy, chromium (Cr), or the like by sputtering, vacuum deposition, plating, or the like. The magnetic layer formed thereon is, for example, a CoCrNi alloy layer formed by plating or a CoCrTa alloy layer formed by sputtering.
【００１６】本発明における保護層は、イオン注入法に
より磁性層にイオンを注入して磁性層の表面を硬化させ
て形成する。注入するイオンとしては、磁性層表面が硬
化して保護層としての機能を発揮し得るように改質する
効果がある限り、いかなるイオンも用いることができ
る。その中でも特に、Ｃ、Ｎ、Ｏから選ばれた少なくと
も１種の元素のイオンを用いるのが好ましい。例えば、
Ｃ+、Ｃ2+、Ｎ+、Ｏ+、Ｏ2+等である。また、前述の元
素の中から選ばれた２種以上の元素のイオンを組み合わ
せて用いてもよい。The protective layer in the present invention is formed by implanting ions into the magnetic layer by an ion implantation method to cure the surface of the magnetic layer. As the ions to be implanted, any ion can be used as long as it has an effect of modifying the surface of the magnetic layer so as to be hardened and exhibit the function as a protective layer. Among them, it is particularly preferable to use ions of at least one element selected from C, N and O. For example,
C + , C2 + , N + , O + , O2 + and the like. Further, ions of two or more kinds of elements selected from the above-mentioned elements may be used in combination.
【００１７】保護層に注入されたイオンは中性となる
が、イオンの注入量は改質効果が十分現れる程度であれ
ばよい。また、保護層の厚さは従来のスパッタ法による
炭化膜に比べて極めて薄くてよく、１〜２０ｎｍ程度の
膜厚でよい。このような膜厚の保護層は、イオンの種
類、イオン注入の加速電圧、注入時間等の条件を変える
ことにより、磁性膜面に注入されるドーズ量を１．０×
１０16〜３．０×１０18個／ｃｍ2に制御することによ
って得ることができる。イオンの注入時間はイオンの種
類、加速電圧によっても異なるが、数分〜数十時間行わ
れる。Although the ions implanted into the protective layer are neutral, the amount of ions implanted may be such that the modifying effect is sufficiently exhibited. Further, the thickness of the protective layer may be extremely thin as compared with the conventional carbonized film formed by the sputtering method, and may be about 1 to 20 nm. In the protective layer having such a film thickness, the dose amount injected into the magnetic film surface is 1.0 × by changing the conditions such as the type of ions, the acceleration voltage of ion implantation, and the implantation time.
It can be obtained by controlling to 10 16 to 3.0 × 10 18 pieces / cm 2 . The ion implantation time varies depending on the type of ion and the acceleration voltage, but is several minutes to several tens of hours.
【００１８】[0018]
【作用】イオン注入と呼ばれる表面層改質処理は、高速
の物質ビームであるイオンビームを表面から目的深さま
で打ち込み、表面層に新しい機能を付加する技術であ
る。すなわち、数十ｋＶから数百ｋＶに加速したイオン
を固体表面に打ち込むことによって表面層を改質し、表
面層の耐摩耗性や耐食性を向上させることができるもの
である。この時、イオン電流や加速度を制御することに
より、改質層の膜厚を任意に制御することができる。ま
た、質量分析器を用いて必要なイオン種のみを選択注入
することができ、高純度の注入が可能である。Operation: The surface layer modification treatment called ion implantation is a technique of implanting a high-speed material beam, an ion beam, from the surface to a target depth to add a new function to the surface layer. That is, it is possible to modify the surface layer by implanting ions accelerated from several tens kV to several hundreds kV into the solid surface to improve the wear resistance and corrosion resistance of the surface layer. At this time, the film thickness of the modified layer can be arbitrarily controlled by controlling the ion current and the acceleration. Further, only a necessary ion species can be selectively injected by using a mass spectrometer, and high-purity injection is possible.
【００１９】本発明は、このイオン注入技術を磁気記録
媒体の保護層形成に応用したものである。すなわち、例
えば磁性層にＣ、Ｎ、Ｏ等の元素のイオンを注入する
と、その表面層には磁性層の構成元素と注入イオン種と
によって炭化膜、窒化膜、酸化膜等が形成されてその表
面硬度が増加し、保護層の役目を果すようになる。つま
り磁性層の表面が一定深さまで硬質化し、耐摩耗性の優
れた保護層が形成される。The present invention applies this ion implantation technique to the formation of a protective layer of a magnetic recording medium. That is, for example, when ions of elements such as C, N, and O are implanted into the magnetic layer, a carbide film, a nitride film, an oxide film, etc. are formed on the surface layer by the constituent elements of the magnetic layer and the implanted ion species. The surface hardness increases, and it comes to serve as a protective layer. That is, the surface of the magnetic layer is hardened to a certain depth, and a protective layer having excellent wear resistance is formed.
【００２０】また、イオン注入によって表面層がアモル
ファス化するとともにピンホールが消滅し、極めて緻密
性の高い保護層が得られる。従って、得られた保護層は
耐食性にも優れている。そして、このようにイオン注入
によって形成された保護層の厚さは２０ｎｍ以下と極め
て薄いにも関わらず、従来のスパッタ法による炭化膜か
らなる厚い保護層と同等以上の耐摩耗性・耐食性を発揮
する。Further, the ion implantation causes the surface layer to become amorphous and the pinholes to disappear, so that a protective layer having an extremely high density can be obtained. Therefore, the obtained protective layer also has excellent corrosion resistance. Even though the thickness of the protective layer thus formed by ion implantation is as thin as 20 nm or less, it exhibits wear resistance and corrosion resistance equal to or higher than that of a thick protective layer made of a carbide film by the conventional sputtering method. To do.
【００２１】[0021]
【実施例】以下、本発明の実施例について詳細に説明す
る。 ［実施例１］図１は、本発明の磁気記録媒体の一実施例
を示す部分断面図である。本実施例の磁気記録媒体１０
においては、下地体１１の上に磁性層１２が形成されて
おり、さらにその上に保護層１３が形成されている。な
お、図示はしないが、必要に応じて潤滑層で保護層１３
の表面を覆っても良い。EXAMPLES Examples of the present invention will be described in detail below. [Embodiment 1] FIG. 1 is a partial sectional view showing an embodiment of the magnetic recording medium of the present invention. Magnetic recording medium 10 of the present embodiment
In, the magnetic layer 12 is formed on the underlayer 11, and the protective layer 13 is further formed on the magnetic layer 12. Although not shown, a protective layer 13 may be used as a lubricating layer if necessary.
You may cover the surface of.
【００２２】下地体１１は、ディスク状のアルミニウム
合金基板１１ａ上にメッキ法によりＮｉ−Ｐ合金層１１
ｂを形成した後、これを表面研磨して得た。この下地体
１１の上に、スパッタ法でＣｏ−Ｎｉ−Ｃｒ合金層を１
００ｎｍ（１０００オングストローム）堆積させること
により磁性層１２を形成した。The underlayer 11 is formed by plating a Ni-P alloy layer 11 on a disk-shaped aluminum alloy substrate 11a.
After b was formed, it was obtained by surface polishing. A Co—Ni—Cr alloy layer 1 is sputtered on the underlayer 11.
The magnetic layer 12 was formed by depositing 00 nm (1000 angstrom).
【００２３】保護層１３は、Ｃ+を用いて形成した。す
なわち、磁性層１２で被覆された下地体１１（基板）を
イオン注入装置にセットし、１５０℃に該基板を保持し
た状態で、イオンの加速電圧１００ｋＶで１．５時間Ｃ
+をイオン注入し、３×１０17個／ｃｍ2のドーズ量の保
護層を得た。The protective layer 13 was formed using C + . That is, the underlayer 11 (substrate) coated with the magnetic layer 12 was set in an ion implantation apparatus, and the substrate was held at 150 ° C., and the ion acceleration voltage was 100 kV for 1.5 hours.
+ Ions are implanted to give a protective layer of 3 × 10 1 7 pieces / cm 2 dose.
【００２４】保護層１３の厚みは、ＥＳＣＡ（Ｅｌｅｃ
ｔｒｏｎ Ｓｐｅｃｔｒｏｓｃｏｐｙ ｏｆ Ｃｈｅｍ
ｉｃａｌ Ａｎａｌｙｓｉｓ）を採用し、表面をＡｒイ
オンエッチングしながらＣの結合エネルギーの強度変化
により求めた。その結果、磁性層１２の表面から深さ約
１５ｎｍまで硬化していることが分かり、この厚さの保
護層１３が形成されていることが確認できた。The thickness of the protective layer 13 is ESCA (Elec
tron Spectroscopy of Chem
It was determined by the intensity change of the C binding energy while Ar ion etching was performed on the surface. As a result, it was found that the magnetic layer 12 was hardened to a depth of about 15 nm from the surface, and it was confirmed that the protective layer 13 having this thickness was formed.
【００２５】［実施例２］実施例１と同様に、下地体１
１の上に磁性層１２及び保護層１３が順次形成された磁
気記録媒体１０を用い、その上に保護層１３を形成し
た。保護層１３は、Ｎ+を用いて形成した。すなわち、
磁性層１２で被覆された下地体１１（基板）をイオン注
入装置にセットし、１５０℃に該基板を保持した状態
で、イオンの加速電圧７０ｋＶで１０分間Ｎ+をイオン
注入し、３×１０16個／ｃｍ2のドーズ量の保護層を得
た。[Embodiment 2] As in Embodiment 1, the base member 1
The magnetic recording medium 10 in which the magnetic layer 12 and the protective layer 13 were sequentially formed on 1 was used, and the protective layer 13 was formed thereon. The protective layer 13 was formed using N + . That is,
The underlayer 11 (substrate) covered with the magnetic layer 12 was set in an ion implantation apparatus, and while maintaining the substrate at 150 ° C., N + ions were implanted at an ion acceleration voltage of 70 kV for 10 minutes to obtain 3 × 10 3. A protective layer with a dose of 16 / cm 2 was obtained.
【００２６】保護層１３の厚みは、ＥＳＣＡによりＮの
結合エネルギーの強度変化から求めた。その結果、磁性
層１２の表面から深さ約１２ｎｍまで保護層１３が形成
されていることが確認できた。The thickness of the protective layer 13 was obtained by ESCA from the change in the strength of N binding energy. As a result, it was confirmed that the protective layer 13 was formed from the surface of the magnetic layer 12 to a depth of about 12 nm.
【００２７】［実施例３］実施例１と同様に、下地体１
１の上に磁性層１２及び保護層１３が順次形成された磁
気記録媒体１０を用い、その上に保護層１３を形成し
た。保護層１３は、Ｏ+を用いて形成した。すなわち、
磁性層１２で被覆された下地体１１（基板）をイオン注
入装置にセットし、１５０℃に該基板を保持した状態
で、イオンの加速電圧５０ｋＶで３時間Ｏ+をイオン注
入し、３×１０18個／ｃｍ2のドーズ量の保護層を得
た。[Embodiment 3] As in Embodiment 1, the base 1
The magnetic recording medium 10 in which the magnetic layer 12 and the protective layer 13 were sequentially formed on 1 was used, and the protective layer 13 was formed thereon. The protective layer 13 was formed using O + . That is,
The underlayer 11 (substrate) coated with the magnetic layer 12 was set in an ion implantation apparatus, and while maintaining the substrate at 150 ° C., ion implantation of O + was carried out at an ion acceleration voltage of 50 kV for 3 hours to obtain 3 × 10 3. A protective layer with a dose of 18 / cm 2 was obtained.
【００２８】保護層１３の厚みは、ＥＳＣＡによりＯの
結合エネルギーの強度変化から求めた。その結果、磁性
層１２の表面から深さ約１０ｎｍまで保護層１３が形成
されていることが確認できた。The thickness of the protective layer 13 was obtained by ESCA from the intensity change of the O binding energy. As a result, it was confirmed that the protective layer 13 was formed from the surface of the magnetic layer 12 to a depth of about 10 nm.
【００２９】［比較例］比較例として、実施例１で用い
たのと同じ磁性層が形成された基板を用い、その磁性層
上にＤ．Ｃ．マグネトロンスパッタ法を用いてＣをスパ
ッタリングした。スパッタの条件は、放電電力の密度
０．５Ｗ／ｃｍ3、Ａｒガス圧２ｍｔｏｒｒ、基板とタ
ーゲットの間隔７．５ｃｍで行った。このようにして、
厚さが１５ｎｍの炭化膜を得た。[Comparative Example] As a comparative example, a substrate on which the same magnetic layer as that used in Example 1 was formed was used, and D. C. C was sputtered using a magnetron sputtering method. The sputtering conditions were such that the discharge power density was 0.5 W / cm 3 , the Ar gas pressure was 2 mtorr, and the distance between the substrate and the target was 7.5 cm. In this way
A carbonized film having a thickness of 15 nm was obtained.
【００３０】次に、実施例１、２、３及び比較例の磁気
記録媒体の保護層を評価するために、前述したＣＳＳ方
式による記録・再生動作時に行われる磁気ヘッドと磁気
記録媒体との離隔・接触サイクルを模したＣＳＳ試験を
行った。具体的には、磁気記録媒体をスピンスタンドに
取り付け、１回のサイクルは、磁気ヘッドと磁気記録媒
体面とを接触状態でセットした後、２秒間でディスクの
回転数を０ｒｐｍから３６００ｒｐｍまで上昇させた
後、そのままの状態を３秒間保持し、その後２秒間で回
転数を下げて停止させた。Next, in order to evaluate the protective layers of the magnetic recording media of Examples 1, 2, 3 and Comparative Example, the separation between the magnetic head and the magnetic recording media performed during the recording / reproducing operation by the above-mentioned CSS method. -A CSS test simulating a contact cycle was performed. Specifically, the magnetic recording medium was attached to a spin stand, and one cycle was to set the magnetic head and the surface of the magnetic recording medium in contact with each other and then increase the number of revolutions of the disk from 0 rpm to 3600 rpm in 2 seconds. After that, the state was kept as it was for 3 seconds, and then the number of rotations was lowered and stopped for 2 seconds.
【００３１】上記ＣＳＳ試験を１万回行った後、磁気記
録媒体面の傷の発生の有無を観察するとともに静止摩擦
係数を測定した。表１にその試験結果を示す。After performing the CSS test 10,000 times, the presence or absence of scratches on the surface of the magnetic recording medium was observed and the static friction coefficient was measured. Table 1 shows the test results.
【００３２】[0032]
【表１】 サンプル 膜厚（ｎｍ） 傷の発生 静止摩擦係数 実施例１ 約１５ なし ０．４ 実施例２ 約１２ なし ０．４ 実施例３ 約１０ なし ０．４ 比較例 約１５ あり ０．８[Table 1] Sample film thickness (nm) Generation of scratches Static friction coefficient Example 1 About 15 None 0.4 Example 2 About 12 None 0.4 Example 3 About 10 None 0.4 Comparative Example About 15 Yes 0. 8
【００３３】表１から分かるように、実施例１の磁気記
録媒体は、ＣＳＳ試験を１万回行った後も傷の発生は見
られず、静止摩擦係数も０．４と小さかった。また、実
施例２、３についても同様であった。一方、比較例の磁
気記録媒体は、ＣＳＳ試験を５０００回行った後に傷の
発生が認められ、ここで試験を中止した。また、この時
点で保護膜の剥離も生じており、静止摩擦係数も０．８
と高かった。このように、実施例の磁気記録媒体の保護
膜の耐久性が極めて優れていることが確認できた。As can be seen from Table 1, in the magnetic recording medium of Example 1, no scratch was observed even after the CSS test was performed 10,000 times, and the static friction coefficient was as small as 0.4. The same applies to Examples 2 and 3. On the other hand, the magnetic recording medium of the comparative example was found to have scratches after the CSS test was performed 5000 times, and the test was stopped here. At this point, the protective film was peeled off, and the coefficient of static friction was 0.8.
It was high. Thus, it was confirmed that the durability of the protective film of the magnetic recording medium of the example was extremely excellent.
【００３４】[0034]
【発明の効果】以上説明したように本発明によれば、比
較的薄い膜厚で耐摩耗性が良く、且つ剥離を生じない硬
質な保護層を得ることができたので、磁気記録媒体の記
録密度及び信頼性の向上を実現することができた。As described above, according to the present invention, it is possible to obtain a hard protective layer having a relatively thin film thickness, good wear resistance, and no peeling. Therefore, recording on a magnetic recording medium is possible. Improvements in density and reliability could be realized.
【図１】本発明の実施例に係る磁気媒体の部分断面図で
ある。FIG. 1 is a partial cross-sectional view of a magnetic medium according to an embodiment of the present invention.
１０ 磁気記録媒体 １１ 下地体 １２ 磁性層 １３ 保護層 10 Magnetic Recording Medium 11 Underlayer 12 Magnetic Layer 13 Protective Layer
Claims (4)
に、イオン注入法によりイオンを該磁性層表面に注入し
て該磁性層表面を硬化させることにより得られた保護層
を設けたことを特徴とする磁気記録媒体。1. A protective layer obtained by injecting ions into the surface of the magnetic layer by an ion implantation method to cure the surface of the magnetic layer is provided on the surface of the magnetic layer formed on the underlayer. A magnetic recording medium characterized by the above.
なくとも１種の元素のイオンである請求項１に記載の磁
気記録媒体。2. The magnetic recording medium according to claim 1, wherein the ions are ions of at least one element selected from C, N and O.
請求項１又は請求項２に記載の磁気記録媒体。3. The magnetic recording medium according to claim 1, wherein the protective layer has a thickness of 1 to 20 nm.
が１．０×１０16〜３．０×１０18個／ｃｍ2である請
求項１ないし請求項３に記載の磁気記録媒体。4. The magnetic recording medium according to claim 1, wherein the protective layer has a dose amount of 1.0 × 10 16 to 3.0 × 10 18 ions / cm 2 by ion implantation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35612792A JPH06187634A (en) | 1992-12-17 | 1992-12-17 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35612792A JPH06187634A (en) | 1992-12-17 | 1992-12-17 | Magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06187634A true JPH06187634A (en) | 1994-07-08 |
Family
ID=18447473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35612792A Pending JPH06187634A (en) | 1992-12-17 | 1992-12-17 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06187634A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8569761B2 (en) | 2010-07-14 | 2013-10-29 | Samsung Display Co., Ltd. | Organic light emitting display device |
-
1992
- 1992-12-17 JP JP35612792A patent/JPH06187634A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8569761B2 (en) | 2010-07-14 | 2013-10-29 | Samsung Display Co., Ltd. | Organic light emitting display device |
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