JPH0621414A - Solid-state image sensing device and its manufacture thereof - Google Patents

Solid-state image sensing device and its manufacture thereof

Info

Publication number
JPH0621414A
JPH0621414A JP4203115A JP20311592A JPH0621414A JP H0621414 A JPH0621414 A JP H0621414A JP 4203115 A JP4203115 A JP 4203115A JP 20311592 A JP20311592 A JP 20311592A JP H0621414 A JPH0621414 A JP H0621414A
Authority
JP
Japan
Prior art keywords
solid
state image
bonding wire
imaging device
lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4203115A
Other languages
Japanese (ja)
Inventor
Hideo Yamanaka
英雄 山中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP4203115A priority Critical patent/JPH0621414A/en
Publication of JPH0621414A publication Critical patent/JPH0621414A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink

Landscapes

  • Solid State Image Pick-Up Elements (AREA)

Abstract

PURPOSE:To provide a high-reliability solid-state image sensing device, in which a distinct picture can be obtained, and its manufacture. CONSTITUTION:In a solid-state image sensing device 1 in which a solid-state image sensing element 10 and lead 3 are wired by a bonding wire 6 in a space comprising the solid-state image sensing element 10 mounted in the recess 21 of a base 2 and a cover 5 attached via frame 4 with predetermined height, at least the bonding wire 6 is surrounded by a sealing compound 7 in the part other than that above effective picture elements 11 in the space. In the manufacture of the image sensing device, a predetermined quantity of the sealing compound 7 is applied to the rear face side of the cover 5, the bonding wire 6 is embedded in the sealing compound 7, and the cover 5 is attached onto the frame 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、基台と蓋との間に形成
される空間内に固体撮像素子とボンディングワイヤーが
封止された固体撮像装置とその製造方法に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state image pickup device in which a solid-state image pickup device and a bonding wire are sealed in a space formed between a base and a lid, and a method for manufacturing the same.

【0002】[0002]

【従来の技術】CCD等の固体撮像素子を用いたエリア
センサーやリニアセンサーは、セラミックスやプラスチ
ックを用いた中空パッケージ内にこの固体撮像素子を密
封状態で収納したもので、外部から湿気やゴミ等が侵入
しない構造となっている。このような中空パッケージを
用いたエリアセンサーやリニアセンサー等の固体撮像装
置を図4の断面図に基づいて説明する。すなわち、この
固体撮像装置1は、略中央の凹部21に固体撮像素子1
0が搭載された基台2と、基台2の周縁部から外側に向
けて延出する状態に、例えば低融点ガラスにて取り付け
られたリード3と、このリード3上の枠4を介して取り
付けられたガラス等から成る透明な蓋5とから構成され
たものである。
2. Description of the Related Art An area sensor or a linear sensor using a solid-state image sensor such as a CCD is a hollow package made of ceramics or plastic in which the solid-state image sensor is housed in a sealed state. Has a structure that does not enter. A solid-state imaging device such as an area sensor or a linear sensor using such a hollow package will be described based on the sectional view of FIG. That is, this solid-state image pickup device 1 has the solid-state image pickup element 1 in the substantially central recess 21.
0 is mounted, a lead 3 attached with, for example, low-melting glass in a state of extending outward from the peripheral edge of the base 2, and a frame 4 on the lead 3 The transparent lid 5 made of glass or the like is attached.

【0003】蓋5は枠4の切り欠き部分に嵌め込まれた
もので、低融点ガラスや熱硬化性樹脂等から成る封止剤
7により接着されている。枠4に取り付けられた蓋5と
基台2の凹部21との間には密封状態の空間が形成さ
れ、その空間内で固体撮像素子10とリード3とがボン
ディングワイヤー6により配線されている。このため、
空間内に配置された固体撮像素子10とリード3の一
部、およびボンディングワイヤー6は外部の湿気やゴミ
等から保護されている。
The lid 5 is fitted in the notch of the frame 4, and is adhered by a sealant 7 made of low melting point glass or thermosetting resin. A sealed space is formed between the lid 5 attached to the frame 4 and the recess 21 of the base 2, and the solid-state imaging device 10 and the lead 3 are wired by the bonding wire 6 in the space. For this reason,
The solid-state image sensor 10 and a part of the lead 3 and the bonding wire 6 arranged in the space are protected from external moisture and dust.

【0004】この固体撮像装置1の製造方法は、先ず基
台2の凹部21内に固体撮像素子10を銀ペーストのエ
ポキシ系接着剤等により接着し、この固体撮像素子10
と基台2の周縁部に設けられたリード3とをボンディン
グワイヤー6にて配線する。次いで、このリード3上に
所定高さの枠4を取り付け、さらにこの枠4上にガラス
等の蓋5を封止剤7にて接着する。その後、所定の温度
に加熱処理することで封止剤7を完全に硬化させて固体
撮像素子10とボンディングワイヤー6およびリード3
の一部を空間内に密封する。このように製造された固体
撮像装置1は、蓋5を通して外部の光を取り込み、固体
撮像素子10上に形成された有効画素11にてこの光を
受光する。そして、固体撮像素子10内で所定の電気信
号に変換し、これをボンディングワイヤー6を介してリ
ード3に伝達している。
In the method of manufacturing the solid-state image pickup device 1, first, the solid-state image pickup device 10 is bonded in the recess 21 of the base 2 with an epoxy adhesive of silver paste or the like, and the solid-state image pickup device 10 is manufactured.
The lead 3 provided on the peripheral portion of the base 2 is wired by the bonding wire 6. Then, a frame 4 having a predetermined height is attached on the lead 3, and a lid 5 made of glass or the like is bonded onto the frame 4 with a sealant 7. Then, the encapsulant 7 is completely cured by heat treatment at a predetermined temperature, and the solid-state imaging device 10, the bonding wire 6, and the lead 3 are
A part of is sealed in the space. The solid-state imaging device 1 manufactured in this manner takes in external light through the lid 5, and the effective pixels 11 formed on the solid-state imaging element 10 receive this light. Then, it is converted into a predetermined electric signal in the solid-state imaging device 10, and this is transmitted to the lead 3 via the bonding wire 6.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、このよ
うな固体撮像装置とその製造方法には、次のような問題
がある。すなわち、空間内に配置されたボンディングワ
イヤーは金ワイヤー等から成るため入射光の乱反射が発
生し、固体撮像素子の画像にフレア等の悪影響を起こし
てしまう。また、蓋や枠、およびリードの取り付けとし
て低融点ガラスを用いる場合には、この低融点ガラスか
ら放射されるα線による結晶欠陥に起因する画像欠陥を
引き起こし、固体撮像装置の性能低下を招くことにな
る。さらに、空間内でシリコンダストやセラミックスの
ゴミ等が散乱し、固体撮像素子に付着して画像に悪影響
を及ぼすことになる。
However, such a solid-state image pickup device and its manufacturing method have the following problems. That is, since the bonding wire arranged in the space is made of a gold wire or the like, diffuse reflection of incident light occurs, which causes an adverse effect such as flare on the image of the solid-state imaging device. Further, when a low melting point glass is used for attaching the lid, the frame, and the leads, an image defect caused by a crystal defect due to α rays emitted from the low melting point glass may be caused, and the performance of the solid-state imaging device may be deteriorated. become. Furthermore, silicon dust, ceramic dust, and the like are scattered in the space and adhere to the solid-state imaging device, which adversely affects the image.

【0006】また、透光性のエポキシ樹脂等により固体
撮像素子を一体封止する固体撮像装置の製造方法がある
が、製造時における金型離型剤の汚れや樹脂のヒケによ
る表面くもり等の欠陥を除去するため、その表面を鏡面
研磨する必要がある。しかも、樹脂中に異物が混入する
のを防ぐため、製造装置の高度なクリーン化等が必要と
なり、固体撮像装置のコストアップにつながる。さら
に、樹脂にて一体封止して硬化する際に、固体撮像素子
と樹脂との界面剥離やパッケージクラック等が発生しや
すく、耐熱性、耐衝撃性および耐湿性等の信頼性が不十
分になってしまう。また、色フィルター上に樹脂製のオ
ンチップマイクロレンズが設けてある場合、透光性のエ
ポキシ系樹脂によってレンズ効果がなくなるので感度低
下の問題がある。よって、本発明は鮮明な画像が得ら
れ、しかも信頼性の高い固体撮像装置とその製造方法を
提供することを目的とする。
There is also a method of manufacturing a solid-state image pickup device in which a solid-state image pickup element is integrally sealed with a translucent epoxy resin or the like. The surface needs to be mirror-polished to remove the defects. Moreover, in order to prevent foreign matter from being mixed into the resin, it is necessary to make the manufacturing apparatus highly clean, which leads to an increase in the cost of the solid-state imaging device. Furthermore, when the resin is integrally sealed and cured, interface peeling between the solid-state image sensor and the resin and package cracks are likely to occur, resulting in insufficient reliability such as heat resistance, impact resistance and moisture resistance. turn into. Further, when a resin-made on-chip microlens is provided on the color filter, the lens effect is lost due to the translucent epoxy resin, which causes a problem of sensitivity deterioration. Therefore, an object of the present invention is to provide a solid-state image pickup device which can obtain a clear image and has high reliability, and a manufacturing method thereof.

【0007】[0007]

【課題を解決するための手段】本発明は、このような課
題を解決するために成された固体撮像装置とその製造方
法である。すなわち、この固体撮像装置は、基台の略中
央に設けられた凹部内に固体撮像素子を搭載し、この基
台の周縁部から外側に向けてリードを取り付け、このリ
ード上に所定高さの枠を介して蓋を取り付けることで凹
部との間に空間を形成し、この空間内で固体撮像素子と
リードとをボンディングワイヤーにて配線したもので、
この空間内のうち、固体撮像素子の有効画素上方を除く
部分において、少なくともボンディングワイヤーを包囲
する状態に封止剤を設けたものである。しかも、この封
止剤内に遮光剤を含ませたものである。
SUMMARY OF THE INVENTION The present invention is a solid-state image pickup device and a method of manufacturing the same, which have been made to solve such problems. That is, in this solid-state image pickup device, a solid-state image pickup element is mounted in a concave portion provided in a substantially central portion of a base, and leads are attached from a peripheral portion of the base to the outside, and a lead having a predetermined height is mounted on the lead. A space is formed between the recess by attaching the lid via the frame, and the solid-state image sensor and the lead are wired by a bonding wire in the space.
In this space, a sealant is provided in a portion surrounding at least the bonding wire in a portion of the solid-state image pickup device other than above the effective pixels. Moreover, a light blocking agent is included in this sealing agent.

【0008】また、この固体撮像装置の製造方法は、先
ず、基台の略中央部に設けられた凹部内に固体撮像素子
を接続し、この基台上の周縁部に取り付けられたリード
と固体撮像素子とをボンディングワイヤーにて配線す
る。次いで、蓋の裏面側の周縁部に所定量の封止剤を塗
布し、この封止剤にてボンディングワイヤーを埋め込む
とともに、この蓋を所定高さの枠上に取り付けるもので
ある。
Further, in the method of manufacturing the solid-state image pickup device, first, a solid-state image pickup element is connected to a recess provided in a substantially central portion of the base, and a lead attached to a peripheral portion of the base and a solid state. The image pickup device is connected with a bonding wire. Next, a predetermined amount of sealant is applied to the peripheral portion on the back surface side of the lid, the bonding wire is embedded in the sealant, and the lid is mounted on a frame having a predetermined height.

【0009】[0009]

【作用】空間内に配置された固体撮像素子の有効画素上
方以外の部分で、ボンディングワイヤーを封止剤にて包
囲しているため、ボンディングワイヤーに当たる光が低
減するとともに、ボンディングワイヤーから有効画素に
到達する反射光が減少することになる。この封止剤内に
遮光剤を含むことで、特に固体撮像素子の有効画素上方
以外からの光を遮断するため、必要な光だけが固体撮像
素子に到達することになる。また、空間内に設けられた
封止剤により、固体撮像素子の有効画素上方以外の空間
に散乱しているゴミを封止することになるため、このゴ
ミが有効画素に付着しなくなる。
[Function] Since the bonding wire is surrounded by the encapsulant at a portion other than above the effective pixel of the solid-state image sensor arranged in the space, the light hitting the bonding wire is reduced and the bonding wire is changed to the effective pixel. The reflected light that arrives will be reduced. By including a light blocking agent in the encapsulant, light from other than above the effective pixels of the solid-state image sensor is blocked, so that only necessary light reaches the solid-state image sensor. Further, since the sealant provided in the space seals the dust scattered in the space other than above the effective pixels of the solid-state image sensor, the dust does not adhere to the effective pixels.

【0010】また、固体撮像装置の製造方法として、蓋
の裏面側の周縁部に塗布した所定量の封止剤によりボン
ディングワイヤーを埋め込むとともに、この蓋を枠上に
取り付けることで、蓋の取り付けと同時にボンディング
ワイヤーを封止剤にて包囲することができる。
In addition, as a method of manufacturing a solid-state image pickup device, a bonding wire is embedded by a predetermined amount of a sealing agent applied to the peripheral portion on the back surface side of the lid, and the lid is mounted on a frame to attach the lid. At the same time, the bonding wire can be surrounded by the sealant.

【0011】[0011]

【実施例】以下に、本発明の固体撮像装置とその製造方
法を図に基づいて説明する。先ず、本発明の固体撮像装
置について説明する。図1は、本発明の固体撮像装置1
を説明する断面図である。この固体撮像装置1は、基台
2の略中央部に設けられた凹部21と、基台2上の枠4
を介して取り付けられた蓋5との間に空間が構成された
中空パッケージから成るもので、この空間内に固体撮像
素子10が配置されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The solid-state image pickup device of the present invention and its manufacturing method will be described below with reference to the drawings. First, the solid-state imaging device of the present invention will be described. FIG. 1 shows a solid-state imaging device 1 according to the present invention.
It is sectional drawing explaining. The solid-state imaging device 1 includes a recess 21 provided in a substantially central portion of a base 2 and a frame 4 on the base 2.
It is composed of a hollow package in which a space is formed between the lid 5 and the lid 5, and the solid-state image sensor 10 is arranged in this space.

【0012】セラミックスやプラスチック等から成る基
台2は、その略中央の凹部21内に固体撮像素子10が
接続されており、基台2の周縁部から外側に向けて42
アロイや銅材等からなるリード3が取り付けられてい
る。このリード3と固体撮像素子10とが先に述べた空
間内でボンディングワイヤー6を介して電気的に接続さ
れている。このリード3上には所定高さの枠4が取り付
けられ、この枠4の切り欠き部分にガラス等から成る蓋
5が嵌め込まれている。枠4と蓋5との接続には、例え
ばエポキシ系樹脂から成る封止剤7が用いられており、
蓋5と凹部21との間の空間内を密封状態にしている。
しかも、この封止剤7は固体撮像素子10の有効画素1
1上方の空間以外の部分にも充填されており、その部分
のボンディングワイヤー6を包囲する状態に設けられて
いる。
The base 2 made of ceramics, plastics or the like has the solid-state image pickup device 10 connected in a recess 21 at the substantially central portion thereof, and the solid-state image pickup device 10 extends outward from the peripheral edge of the base 2.
A lead 3 made of alloy or copper material is attached. The lead 3 and the solid-state image sensor 10 are electrically connected to each other through the bonding wire 6 in the space described above. A frame 4 having a predetermined height is attached on the lead 3, and a lid 5 made of glass or the like is fitted into a cutout portion of the frame 4. A sealant 7 made of, for example, an epoxy resin is used to connect the frame 4 and the lid 5,
The space between the lid 5 and the recess 21 is hermetically sealed.
Moreover, this sealant 7 is the effective pixel 1 of the solid-state image sensor 10.
The space other than the space above 1 is filled, and the bonding wire 6 in that part is surrounded.

【0013】すなわち、固体撮像素子10の有効画素領
域に対応する部分には封止剤7が設けられていないた
め、外部からの光は蓋5の有効画素領域に対応する部分
のみから入射して、固体撮像素子10の有効画素11に
取り込まれることになる。さらに、ボンディングワイヤ
ー6自体の断線や接触に対する保護となるとともに、ボ
ンディングワイヤー6による反射光がこの封止剤7にて
遮断され、有効画素11に到達しにくくなる。特に、こ
の封止剤7に黒色の顔料等からなる遮光剤を含ませえて
おくことで、ボンディングワイヤー6による反射光や、
他の部分から侵入する不要な光を積極的に遮断すること
ができる。
That is, since the encapsulant 7 is not provided in the portion of the solid-state image pickup device 10 corresponding to the effective pixel region, light from the outside is incident only from the portion of the lid 5 corresponding to the effective pixel region. , Will be taken into the effective pixel 11 of the solid-state image sensor 10. Furthermore, the bonding wire 6 itself is protected against disconnection and contact, and the light reflected by the bonding wire 6 is blocked by the sealing agent 7, and it becomes difficult to reach the effective pixel 11. In particular, when the sealing agent 7 contains a light-shielding agent made of a black pigment or the like, light reflected by the bonding wire 6 or
It is possible to positively block unnecessary light that enters from other portions.

【0014】また、封止剤7は、ボンディングワイヤー
6を包囲するとともに、その下方の固体撮像素子10の
側面まで覆う状態にしてもよい。すなわち、固体撮像素
子10の側面には、固体撮像素子10の切り出しの際に
発生したシリコンダストや切削屑等のゴミが多く付着し
ているため、このように固体撮像素子10の側面を封止
剤7で覆うことで、空間内にこれらのゴミが散乱するの
を防ぐことができる。
The sealing agent 7 may surround the bonding wire 6 and cover the side surface of the solid-state image pickup device 10 below the bonding wire 6. That is, since a large amount of dust such as silicon dust and cutting dust generated when the solid-state image sensor 10 is cut out adheres to the side surface of the solid-state image sensor 10, the side surface of the solid-state image sensor 10 is thus sealed. By covering with the agent 7, it is possible to prevent these dusts from scattering in the space.

【0015】次に、本発明の固体撮像装置の製造方法に
ついて図2〜図3の断面図に基づいて工程順に説明す
る。先ず、搭載工程として図2に示すように、基台2の
凹部21内に固体撮像素子10を搭載する。固体撮像素
子10の厚さは例えば400〜450μm程度であり、
固体撮像素子10の上面と基台2に取り付けたリード3
の上面とがほぼ一致するか、又はわずかに固体撮像素子
10の上面の方が低い状態に搭載する。リード3および
枠4は予め低融点ガラス等により基台2周縁部に取り付
けられており、基台2の外側に延出するリード3のアウ
ターリード表面に錫(Sn)等のメッキが施してある。
また、リード3のインナーリード表面には例えばアルミ
ニウムクラッド層を形成してある。そして、この固体撮
像素子10とリード3のインナーリードとを金ワイヤー
等から成るボンディングワイヤー6を用いて例えば熱圧
着法により接続する。
Next, a method of manufacturing the solid-state image pickup device of the present invention will be described in the order of steps based on the sectional views of FIGS. First, as a mounting step, as shown in FIG. 2, the solid-state imaging device 10 is mounted in the recess 21 of the base 2. The solid-state image sensor 10 has a thickness of, for example, about 400 to 450 μm,
Leads 3 attached to the upper surface of the solid-state imaging device 10 and the base 2.
The top surface of the solid-state imaging device 10 is mounted on the solid-state imaging device 10 such that the top surface of the solid-state imaging device 10 is substantially aligned with the top surface of the solid state imaging device. The leads 3 and the frame 4 are previously attached to the peripheral portion of the base 2 by low melting glass or the like, and the outer lead surfaces of the leads 3 extending to the outside of the base 2 are plated with tin (Sn) or the like. .
Further, for example, an aluminum clad layer is formed on the inner lead surface of the lead 3. Then, the solid-state image pickup device 10 and the inner lead of the lead 3 are connected to each other by a thermocompression bonding method using a bonding wire 6 made of a gold wire or the like.

【0016】なお、枠4に設けられた切り欠き部4aの
高さで、後述する蓋5と固体撮像素子10との隙間、ま
た蓋5とボンディングワイヤー6との隙間が決まるが、
配線するボンディングワイヤー6のループ高さに応じて
決定すればよい。
The height of the cutout portion 4a provided in the frame 4 determines the gap between the lid 5 and the solid-state image pickup device 10 and the gap between the lid 5 and the bonding wire 6 which will be described later.
It may be determined according to the loop height of the bonding wire 6 to be wired.

【0017】次いで、蓋の取り付け工程として図3に示
すように、ガラス等から成る蓋5の裏面側のうち、固体
撮像素子10の有効画素領域に対応する部分以外の所定
の領域に樹脂シーラー等の封止剤7を塗布し、蓋5を枠
4の切り欠き部4a上に取り付ける。樹脂シーラーから
成る封止剤7は、例えば熱硬化性樹脂に硬化剤を添加し
て半硬化状にしたもので、必要に応じて黒色の顔料等の
遮光剤を含ませておく。
Next, as shown in FIG. 3 as a step of attaching the lid, a resin sealer or the like is provided on a predetermined area other than the portion corresponding to the effective pixel area of the solid-state image pickup device 10 on the back surface side of the lid 5 made of glass or the like. The sealant 7 is applied, and the lid 5 is attached on the notch 4 a of the frame 4. The sealant 7 made of a resin sealer is, for example, a thermosetting resin added with a curing agent to be semi-cured, and a light-shielding agent such as a black pigment is included as necessary.

【0018】この封止剤7が裏面側に塗布された蓋5を
枠4上に加熱しながら押圧することで、蓋5と枠4との
間に封止剤7が密着するとともに、空間内に膨出し(図
中二点鎖線)ボンディングワイヤー6を包囲することに
なる。このため、蓋5の裏面側に塗布する封止剤7の量
と場所、および粘度等を調節して、有効画素11上方の
空間内に入り込まないようにするとともに、ボンディン
グワイヤー6が変形しすぎてワイヤータッチやチップシ
ョートしないようにする。
By pressing the lid 5 coated with the sealant 7 on the back surface side onto the frame 4 while heating, the sealant 7 is brought into close contact between the lid 5 and the frame 4 and the space 5 The swelling (two-dot chain line in the figure) surrounds the bonding wire 6. Therefore, the amount and location of the sealant 7 applied to the back surface side of the lid 5, the viscosity, etc. are adjusted so as not to enter the space above the effective pixel 11, and the bonding wire 6 is excessively deformed. Do not touch the wire or short the tip.

【0019】この調節の一例として、半硬化状の封止剤
7を用い、蓋5裏面側で有効画素領域と対応する部分以
外に200〜300μmの厚さで塗布する。この厚さ
は、先に述べた蓋5と固体撮像素子10との隙間よりも
わずかに厚いもので、ボンディングワイヤー6を完全に
包囲することができる値である。また、必要に応じてこ
の厚さ等を調節し、固体撮像素子10の側面側を封止剤
7にて覆う状態にしてもよい。なお、封止剤7の塗布の
際、蓋5の4隅に空間内のガス抜きのための隙間を設け
た状態に塗布するのが望ましい。
As an example of this adjustment, a semi-cured sealant 7 is used and is applied to a thickness of 200 to 300 μm on the back surface side of the lid 5 except the portion corresponding to the effective pixel region. This thickness is slightly thicker than the gap between the lid 5 and the solid-state imaging device 10 described above, and is a value that can completely surround the bonding wire 6. In addition, the thickness and the like may be adjusted as necessary so that the side surface of the solid-state imaging device 10 is covered with the sealant 7. When the sealing agent 7 is applied, it is desirable that the sealing agent 7 is applied in a state where gaps for degassing the space are provided at the four corners of the lid 5.

【0020】このように、加熱しながら押圧することで
蓋5を取り付けるとともに、ボンディングワイヤー6を
封止剤7にて包囲することで固体撮像素子10を密封状
態にした固体撮像装置1を製造する。このような製造方
法により、固体撮像素子10の有効画素領域上に異物が
なく、さらに、空間内にシリコンダスト等のゴミが散乱
しない固体撮像装置1となるとともに、中空パッケージ
により高感度特性、耐熱性、耐衝撃性、および耐湿性等
を十分得る事ができる。
Thus, the lid 5 is attached by heating and pressing, and the solid-state image pickup device 1 in which the solid-state image pickup device 10 is sealed by surrounding the bonding wire 6 with the sealant 7 is manufactured. . With such a manufacturing method, there is no foreign substance on the effective pixel area of the solid-state imaging device 10, and the solid-state imaging device 1 in which dust such as silicon dust does not scatter in the space is obtained, and the hollow package has high sensitivity characteristics and heat resistance. The property, impact resistance, moisture resistance and the like can be sufficiently obtained.

【0021】[0021]

【発明の効果】以上説明したように、本発明の固体撮像
装置とその製造方法によれば、次のような効果がある。
すなわち、この固体撮像装置によればボンディングワイ
ヤーが封止剤にて包囲されているため、ボンディングワ
イヤーの保護となるとともに、金ワイヤー等を用いた場
合であっても入射光の乱反射が固体撮像素子に侵入する
ことがない。したがって、フレア等の画像の悪影響がな
く、信頼性の高い固体撮像装置となる。また、この封止
剤により、リード等の取り付けに用いた低融点ガラスか
ら放射されるα線が固体撮像素子に到達する量を減少で
きるため、画像欠陥の低減を図ることが可能となる。さ
らに、シリコンダスト等のゴミが散乱して固体撮像素子
の有効画素に付着することがないため、高品質の鮮明な
画像を得ることができる。
As described above, the solid-state image pickup device of the present invention and the method of manufacturing the same have the following effects.
That is, according to this solid-state imaging device, since the bonding wire is surrounded by the encapsulant, the bonding wire is protected and, even when a gold wire or the like is used, irregular reflection of incident light causes a solid-state imaging device. Never break into. Therefore, the solid-state imaging device has high reliability without adverse effects of images such as flare. Further, this sealing agent can reduce the amount of α rays emitted from the low-melting glass used for attaching the leads and the like to reach the solid-state image pickup element, so that image defects can be reduced. Furthermore, since dust such as silicon dust does not scatter and adhere to the effective pixels of the solid-state image sensor, a high-quality clear image can be obtained.

【0022】また、この固体撮像装置の製造方法によれ
ば、蓋の取り付けとともにボンディングワイヤーや固体
撮像素子の側面を封止剤にて包囲することができるた
め、固体撮像素子の有効画素領域にゴミ等が散乱しない
固体撮像装置を容易に製造できる。このため、製造装置
の高度なクリーン化等を必要とせず、固体撮像装置のコ
ストダウンを図ることが可能となる。さらに、色フィル
ター上のオンチップマイクロレンズの感度アップ効果を
損なうことのない高性能の鮮明な画像を得ることができ
る。しかも、中空パッケージの耐熱性や耐衝撃性および
耐湿性等の信頼性を十分得ることができる固体撮像装置
となる。
Further, according to the method of manufacturing the solid-state image pickup device, since the bonding wire and the side surface of the solid-state image pickup device can be surrounded by the sealant together with the attachment of the lid, dust is collected in the effective pixel area of the solid-state image pickup device. It is possible to easily manufacture a solid-state imaging device in which, for example, no scattering occurs. For this reason, it is possible to reduce the cost of the solid-state imaging device without requiring the manufacturing device to be highly cleaned. Furthermore, a high-performance clear image can be obtained without impairing the sensitivity increasing effect of the on-chip microlenses on the color filter. Moreover, the solid-state image pickup device can sufficiently obtain the reliability such as heat resistance, impact resistance, and moisture resistance of the hollow package.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の固体撮像装置を説明する断面図であ
る。
FIG. 1 is a cross-sectional view illustrating a solid-state imaging device of the present invention.

【図2】枠の取り付け工程を説明する断面図である。FIG. 2 is a cross-sectional view illustrating a frame attaching process.

【図3】蓋の取り付け工程を説明する断面図である。FIG. 3 is a cross-sectional view illustrating a lid attaching process.

【図4】従来例を説明する断面図である。FIG. 4 is a sectional view illustrating a conventional example.

【符号の説明】[Explanation of symbols]

1 固体撮像装置 2 基台 3 リード 4 枠 5 蓋 6 ボンディングワイヤー 7 封止剤 10 固体撮像素子 11 有効画素 21 凹部 1 Solid-State Imaging Device 2 Base 3 Lead 4 Frame 5 Lid 6 Bonding Wire 7 Sealant 10 Solid-state Imaging Device 11 Effective Pixel 21 Recess

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 略中央の凹部内に固体撮像素子が搭載さ
れた基台と、 前記基台の周縁部から外側に向けて取り付けられたリー
ドと、 前記リード上に所定高さの枠を介して取り付けられ、前
記凹部との間に空間を形成する蓋と、 前記空間内で、前記固体撮像素子と前記リードとを配線
するボンディングワイヤーとから成る固体撮像装置であ
って、 前記空間内のうち、前記固体撮像素子の有効画素上方を
除く部分において、少なくとも前記ボンディングワイヤ
ーを包囲する状態に封止剤が設けられていることを特徴
とする固体撮像装置。
1. A base on which a solid-state imaging device is mounted in a recess in a substantially central portion, leads attached outward from a peripheral portion of the base, and a frame having a predetermined height above the leads. A solid-state imaging device comprising: a lid that is attached to form a space between the solid-state imaging device and the lead; and a bonding wire that connects the solid-state imaging device and the lead in the space. A solid-state image pickup device, wherein a sealant is provided at least in a state of surrounding the bonding wire in a portion of the solid-state image pickup element except a portion above an effective pixel.
【請求項2】 前記封止剤内に遮光剤が含まれているこ
とを特徴とする請求項1記載の固体撮像装置。
2. The solid-state imaging device according to claim 1, wherein a light blocking agent is included in the sealing agent.
【請求項3】 所定高さの枠が取り付けられた基台の略
中央部に固体撮像素子を接続してボンディングワイヤー
にて配線した後、前記枠上に蓋を取り付けて成る固体撮
像装置の製造方法において、 先ず、前記基台の略中央部に設けられた凹部内に前記固
体撮像素子を接続し、前記基台上の周縁部に取り付けら
れたリードと前記固体撮像素子とをボンディングワイヤ
ーにて配線する工程と、 前記蓋の裏面側の周縁部に所定量の封止剤を塗布して、
該封止剤にて前記ボンディングワイヤーを埋め込むとと
もに、前記蓋を前記枠上に取り付ける工程とから成るこ
とを特徴とする固体撮像装置の製造方法。
3. A solid-state image pickup device comprising a solid-state image pickup device connected to a substantially central portion of a base to which a frame having a predetermined height is attached, wired with bonding wires, and a lid attached to the frame. In the method, first, the solid-state imaging device is connected to a recess provided in substantially the center of the base, and a lead attached to a peripheral portion of the base and the solid-state imaging device are bonded by a bonding wire. Wiring step, applying a predetermined amount of the sealing agent to the peripheral portion of the back side of the lid,
Embedding the bonding wire with the sealant and attaching the lid on the frame.
JP4203115A 1992-07-06 1992-07-06 Solid-state image sensing device and its manufacture thereof Pending JPH0621414A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4203115A JPH0621414A (en) 1992-07-06 1992-07-06 Solid-state image sensing device and its manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4203115A JPH0621414A (en) 1992-07-06 1992-07-06 Solid-state image sensing device and its manufacture thereof

Publications (1)

Publication Number Publication Date
JPH0621414A true JPH0621414A (en) 1994-01-28

Family

ID=16468653

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4203115A Pending JPH0621414A (en) 1992-07-06 1992-07-06 Solid-state image sensing device and its manufacture thereof

Country Status (1)

Country Link
JP (1) JPH0621414A (en)

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US5818094A (en) * 1995-01-20 1998-10-06 Kyocera Corporation Package for housing a semiconductor element
JP2001257334A (en) * 2000-03-10 2001-09-21 Olympus Optical Co Ltd Solid-state imaging device and manufacturing method thereof
US6399995B1 (en) * 1996-01-17 2002-06-04 Sony Corporation Solid state image sensing device
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JP2007142194A (en) * 2005-11-18 2007-06-07 Matsushita Electric Ind Co Ltd Solid-state imaging device
US7518157B2 (en) * 2003-11-08 2009-04-14 Dr. Johannes Heidenhain Gmbh Optoelectronic component assembly
US7759708B2 (en) 2006-05-17 2010-07-20 Sony Corporation Solid-state imaging apparatus
US7939360B2 (en) 2008-02-12 2011-05-10 Sony Corporation Semiconductor device and manufacturing method therefor
JP2011198852A (en) * 2010-03-17 2011-10-06 Fujifilm Corp Photoelectric conversion film-stacked solid-state imaging device without microlens, method of manufacturing the same, and imaging apparatus
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Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5818094A (en) * 1995-01-20 1998-10-06 Kyocera Corporation Package for housing a semiconductor element
US6399995B1 (en) * 1996-01-17 2002-06-04 Sony Corporation Solid state image sensing device
JP2001257334A (en) * 2000-03-10 2001-09-21 Olympus Optical Co Ltd Solid-state imaging device and manufacturing method thereof
CN1314125C (en) * 2003-03-28 2007-05-02 夏普株式会社 Module for optical apparatus and its mfg. method
US7112864B2 (en) 2003-03-28 2006-09-26 Sharp Kabushiki Kaisha Module for optical device, and manufacturing method therefor
US7518157B2 (en) * 2003-11-08 2009-04-14 Dr. Johannes Heidenhain Gmbh Optoelectronic component assembly
JP2005167243A (en) * 2003-12-02 2005-06-23 Samsung Electronics Co Ltd Wiring substrate and solid-state imaging semiconductor device using the same
JP2005294495A (en) * 2004-03-31 2005-10-20 Matsushita Electric Ind Co Ltd Solid-state imaging device and manufacturing method thereof
JP2006278726A (en) * 2005-03-29 2006-10-12 Sharp Corp Semiconductor device module and manufacturing method of semiconductor device module
KR100753896B1 (en) * 2005-03-29 2007-09-03 샤프 가부시키가이샤 Semiconductor device module and manufacturing method of semiconductor device module
EP1708269A1 (en) * 2005-03-29 2006-10-04 Sharp Kabushiki Kaisha Semiconductor device module and manufacturing method of semiconductor device module
US7521790B2 (en) 2005-03-29 2009-04-21 Sharp Kabushiki Kaisha Semiconductor device module and manufacturing method of semiconductor device module
JP2007142194A (en) * 2005-11-18 2007-06-07 Matsushita Electric Ind Co Ltd Solid-state imaging device
US7759708B2 (en) 2006-05-17 2010-07-20 Sony Corporation Solid-state imaging apparatus
US7939360B2 (en) 2008-02-12 2011-05-10 Sony Corporation Semiconductor device and manufacturing method therefor
JP2011198852A (en) * 2010-03-17 2011-10-06 Fujifilm Corp Photoelectric conversion film-stacked solid-state imaging device without microlens, method of manufacturing the same, and imaging apparatus
JP2014142644A (en) * 2014-02-12 2014-08-07 Semiconductor Energy Lab Co Ltd Semiconductor device
US11417693B2 (en) 2015-06-18 2022-08-16 Sony Corporation Module, method for manufacturing module, and electronic device

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