JPH06255155A - Thermal head and its manufacture - Google Patents
Thermal head and its manufactureInfo
- Publication number
- JPH06255155A JPH06255155A JP4246193A JP4246193A JPH06255155A JP H06255155 A JPH06255155 A JP H06255155A JP 4246193 A JP4246193 A JP 4246193A JP 4246193 A JP4246193 A JP 4246193A JP H06255155 A JPH06255155 A JP H06255155A
- Authority
- JP
- Japan
- Prior art keywords
- common electrode
- electrode
- individual
- individual electrode
- thermal head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims description 33
- 238000010304 firing Methods 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 6
- 238000009966 trimming Methods 0.000 abstract description 17
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052737 gold Inorganic materials 0.000 abstract description 6
- 239000010931 gold Substances 0.000 abstract description 6
- 239000006185 dispersion Substances 0.000 abstract 1
- 238000000137 annealing Methods 0.000 description 7
- 238000012937 correction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
Landscapes
- Electronic Switches (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は複数の発熱抵抗体を主走
査方向に並設したサーマルヘッドに関するもので、特に
高画質記録を狙ったプリンタ等に対応できるサーマルヘ
ッドに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thermal head in which a plurality of heating resistors are arranged in parallel in the main scanning direction, and more particularly to a thermal head applicable to a printer or the like aiming at high quality recording.
【0002】[0002]
【従来の技術】従来、厚膜型帯状サーマルヘッドは基板
上に交互にひきだされる電極3,4と、電極3,4を接
続するよう主走査方向に配設する発熱抵抗体6と、表面
を被覆するオ−バ−グレ−ズ層2とを有する(図12参
照)。電極4の一方の端部は共通電極5に接続され、共
通電極5と、例えば個別電極3cに通電した場合、発熱
抵抗体6のB部分が発熱し、発熱抵抗体6のB部分に接
触する感熱紙を発色させるものである。この時の感熱紙
の記録濃度は、サ−マクヘッドの発熱抵抗体の1ビット
当たりの発熱量により左右されるため、発熱ビットに抵
抗値のばらつきがあると、各ビット毎の発熱量が異な
り、印字濃度にムラを発生させる原因となった。2. Description of the Related Art Conventionally, a thick film type thermal head has electrodes 3 and 4 which are alternately drawn on a substrate, and a heating resistor 6 which is arranged in the main scanning direction so as to connect the electrodes 3 and 4. And an overglaze layer 2 covering the surface (see FIG. 12). One end of the electrode 4 is connected to the common electrode 5, and when the common electrode 5 and, for example, the individual electrode 3c are energized, the B portion of the heating resistor 6 generates heat and contacts the B portion of the heating resistor 6. The color of the thermal paper. Since the recording density of the thermal paper at this time depends on the heat generation amount per bit of the heating resistor of the thermal head, if the resistance value varies among the heating bits, the heat generation amount for each bit is different. This caused uneven printing density.
【0003】そこで、従来より高画質対応のサーマルヘ
ッドを製作する場合、発熱抵抗体6に高電荷パルスをか
けて抵抗値を修正している。例えば、共通電極5と電極
3c間にパルスをかけて抵抗値を修正する場合、電極4
cと電極3cとの間の発熱体部bと電極3cと電極4d
との間の発熱体部b’とが同時に抵抗値の修正が行われ
る。このように、1つのビットずつ抵抗値の修正を行っ
たとき、発熱体部b,b’を合成した抵抗としては精度
良く抵抗値を合わせることができるが、発熱体部bと発
熱体部b’の抵抗値は同じ値にならない。従ってビット
毎の抵抗値測定においては抵抗値ばらつきが、例えば最
高ばらつきで1%以内に入っても、実際には同一ビット
内の抵抗体部b,b’の抵抗値のばらつきのための、同
一ビット内の印字濃度むらが生じる結果にもなってい
た。Therefore, when a thermal head having a high image quality is manufactured, a resistance value is corrected by applying a high charge pulse to the heating resistor 6. For example, when a pulse is applied between the common electrode 5 and the electrode 3c to correct the resistance value, the electrode 4
c between the electrode 3c and the heating element b, the electrode 3c and the electrode 4d
The resistance value of the heating element portion b ′ between and is simultaneously corrected. As described above, when the resistance value is corrected bit by bit, the resistance values can be accurately matched as the combined resistance of the heating element parts b and b ′. The resistance values of 'are not the same. Therefore, in the resistance value measurement for each bit, even if the resistance variation is within 1% due to the maximum variation, the resistance values of the resistor parts b and b ′ in the same bit are actually the same because of the variation. This also resulted in uneven print density within the bit.
【0004】そこで、同一ビット内の抵抗値ばらつきを
なくすトリミング(抵抗値の修正)方式(特開昭63−
59555号公報、特開平2−72969号公報参照)
をおこなうために図13に示すような交互にひきだされ
る電極30,40の共通電極40側の電極を個別(40
a,40b,40c・・・40f)に分離して形成して
いる。この場合のトリミングは、例えば電極40cと電
極30cとの間、電極40dと電極30cとの間に、そ
れぞれ別々にパルスをかけることができるため、発熱体
部b、b’は独立に抵抗値修正ができる。そして、全ビ
ットの修正が終了した後、共通電極40側の各電極を通
電ペ−スト等の電導物質を印刷、焼成して連結し、接続
している。Therefore, a trimming (correction of resistance value) method for eliminating variation in resistance value in the same bit (Japanese Patent Laid-Open No. 63-
(See Japanese Patent Publication No. 59555, Japanese Patent Laid-Open No. 2-72969)
In order to perform the above, the electrodes on the common electrode 40 side of the electrodes 30 and 40 alternately drawn as shown in FIG.
a, 40b, 40c ... 40f) are formed separately. In the trimming in this case, for example, a pulse can be separately applied between the electrode 40c and the electrode 30c and between the electrode 40d and the electrode 30c, so that the resistance values of the heating elements b and b'are independently adjusted. You can Then, after the correction of all the bits is completed, each electrode on the side of the common electrode 40 is printed and fired with an electrically conductive material such as a current-carrying paste to be connected and connected.
【0005】[0005]
【発明が解決しようとする課題】しかし、トリミング処
理後に共通電極側に接続材を印刷、焼成して接続部を形
成する場合、焼成工程においてトリミングで抑えられた
抵抗値ばらつきが再び広がってしまう不都合が発生し
た。本出願人はパルストリミング処理後のサ−マルヘッ
ドにおけるアニ−ル温度に対する発熱抵抗体の抵抗値ば
らつきの変化を実験した。抵抗値のばらつきの変化率は
アニ−ル後のばらつき幅とトリミング後のばらつき幅と
の差を求めて表した。そして、焼成時間を30分とし、
実験温度は100℃から700℃まで100℃毎に測定
した。その結果を図11のグラフで示す。このグラフは
横軸にアニール温度を示し、縦軸には抵抗値ばらつきの
変化率(抵抗値ばらつき=アニール後の抵抗値ばらつき
(SIGMA)−トリミング後の抵抗値ばらつき(SI
GMA))を示している。この結果からみると、アニ−
ル温度が高いほど抵抗値の変化率が高く、アニ−ル後の
抵抗値ばらつきが広がっていることがわかる。そして、
アニ−ル温度を200℃以下とすると、トリミング後と
アニ−ル後の抵抗値のばらつきはほとんど変化しないと
いうことも判明した。However, when the connecting material is printed and fired on the common electrode side after the trimming process to form the connecting portion, the resistance value variation suppressed by the trimming in the firing process is widened again. There has occurred. The applicant experimented with the variation of the resistance value variation of the heating resistor with respect to the annealing temperature in the thermal head after the pulse trimming process. The change rate of the variation in resistance value was expressed by obtaining the difference between the variation width after annealing and the variation width after trimming. Then, the firing time is set to 30 minutes,
The experimental temperature was measured from 100 ° C to 700 ° C at every 100 ° C. The results are shown in the graph of FIG. In this graph, the horizontal axis represents the annealing temperature, and the vertical axis represents the rate of change in resistance value variation (resistance value variation = resistance value variation after annealing (SIGMA) -resistance value variation after trimming (SI
GMA)) is shown. From this result,
It can be seen that the higher the annealing temperature, the higher the rate of change of the resistance value, and the wider the variation of the resistance value after annealing. And
It was also found that when the anneal temperature was set to 200 ° C. or less, the variation in the resistance value after trimming and after anneal hardly changed.
【0006】この実験結果から、この発明はサ−マルヘ
ッド作成時におけるトリミング後の操作温度を200℃
以下とすることによって、ハ−フ(半)ビットトリミン
グにより揃えた抵抗値の変動を阻止することにより、抵
抗値ばらつきの極めて少ない帯状サーマルヘッドを提供
するものである。From the results of this experiment, according to the present invention, the operating temperature after trimming at the time of making the thermal head is 200.degree.
By the following, it is possible to provide a belt-shaped thermal head with extremely small variation in resistance value by preventing the variation in resistance value that is aligned by the half (half) bit trimming.
【0007】[0007]
【課題を解決するための手段】この発明のサ−マルヘッ
ドは、絶縁基板上の主走査方向に延設される帯状の共通
電極本体部と、絶縁基板上の複走査方向に共通電極本体
部から隔離されて延設されるIC側に連絡可能な複数の
個別電極と、共通電極本体部に連絡可能な複数の個別電
極とを有する個別電極と、複数の個別電極上または電極
下に帯状に主走査方向に形成した発熱抵抗体と、個別電
極と発熱抵抗体と共通電極本体部との上面に間隙部を除
いて被覆するオ−バ−グレ−ズと、共通電極本体部と共
通電極本体部に連絡可能な個別電極との間に配設される
導電体よりなる接続部と、接続部の上部に形成したシ−
ル部とを備え、接続部およびシ−ル部は焼成温度が20
0℃以下で焼成可能な素材で形成されている構成を具備
する。SUMMARY OF THE INVENTION A thermal head according to the present invention comprises a strip-shaped common electrode body extending on the insulating substrate in the main scanning direction and a common electrode body extending in the multiple scanning direction on the insulating substrate. An individual electrode having a plurality of individual electrodes that can be connected to the IC side that are separated and extended, and a plurality of individual electrodes that can be connected to the common electrode body, and a strip-shaped main electrode above or below the plurality of individual electrodes A heating resistor formed in the scanning direction, an overglaze covering the upper surfaces of the individual electrodes, the heating resistor and the common electrode body except for the gap, and the common electrode body and the common electrode body A connection part made of a conductor disposed between an individual electrode that can be connected to the sheet and a shield formed on the connection part.
And a connecting part and a seal part have a firing temperature of 20.
It has a structure made of a material that can be fired at 0 ° C. or lower.
【0008】本発明のサ−マルヘッドの製造方法は、主
走査方向に延設する帯状の共通電極本体部およびこの本
体部から離れ副走査方向に延設する多数の個別電極とを
基板上に形成する工程と、個別電極を接続して主走査方
向に沿って延びる帯状の発熱抵抗体を形成する工程と、
個別電極の一端部と共通電極本体部の一端部とに沿って
間隙部を設けて個別電極、発熱抵抗体、共通電極本体部
の上面にオ−バ−グレ−ズを形成する工程と、個別電極
とそれと隣り合った個別電極間にパルスをかけて半ビッ
ト毎に発熱抵抗体の抵抗値の修正を行なう工程と、共通
電極本体部と共通電極本体部に連絡する個別電極とを接
続する接続部を印刷後焼成温度を200℃以下で焼成し
て形成する工程と、接続部の上面にシ−ル部を印刷後焼
成温度を200℃以下で焼成して形成する工程とを具備
する。In the method for manufacturing a thermal head according to the present invention, a strip-shaped common electrode body portion extending in the main scanning direction and a large number of individual electrodes extending from the body portion in the sub-scanning direction are formed on the substrate. And a step of connecting the individual electrodes to form a strip-shaped heating resistor extending along the main scanning direction,
Forming a gap along one end of the individual electrode and one end of the common electrode body to form an overglaze on the upper surface of the individual electrode, the heating resistor, and the common electrode body; Connection for connecting the common electrode body and the individual electrode connected to the common electrode body with the process of applying a pulse between the electrode and the adjacent individual electrode to correct the resistance value of the heating resistor for each half bit And a step of forming the seal portion on the upper surface of the connection portion by baking after printing at a baking temperature of 200 ° C. or less.
【0009】[0009]
【作用】サ−マルヘッドを構成する個別電極と共通電極
本体とを接続する接続部はオ−バ−グレ−ズの間隙部に
沿って形成することによって、確実に個別電極と共通電
極とを一体化することができる。また、接続部および接
続部の上面に形成するシ−ル部を焼成温度を200℃以
下で焼成可能な素材で構成しているので、発熱抵抗体の
抵抗値の修正作業(トリミング)の後の焼成温度を低く
することができる。そして、発熱抵抗体のトリミング後
の焼成による抵抗値変動を極めて少なくすることによ
り、帯状抵抗体の同一ビット内の2つの発熱部の抵抗値
のばらつきの少ない高画質対応の帯状サーマルヘッドを
製造できる。The connecting portion for connecting the individual electrode constituting the thermal head and the common electrode body is formed along the gap of the overglaze, so that the individual electrode and the common electrode are surely integrated. Can be converted. Further, since the connecting portion and the seal portion formed on the upper surface of the connecting portion are made of a material capable of being fired at a firing temperature of 200 ° C. or less, the resistance value of the heating resistor can be corrected (trimmed) after the work. The firing temperature can be lowered. Then, by extremely reducing the resistance value variation due to firing after trimming the heating resistor, it is possible to manufacture a belt-shaped thermal head corresponding to high image quality in which the resistance values of the two heating portions in the same bit of the belt-shaped resistor have less variation. .
【0010】[0010]
【実施例】以下、図面を参照して本発明の実施例の詳細
を説明する。図1は本発明によるサーマルヘッドの模式
図、図2は図1の線AーAからの断面図、図3から図1
0はサ−マルヘッドの製造工程説明図である。まず、サ
−マルヘッドの構成を工程順に説明する。 第1工程 基板上に金パターンを形成する(図3、図
4参照)。セラミック基板60の部分グレ−ズ62を覆
うようにMOD金膜を形成し、フォトリソエッチングに
より、主走査方向である方向Xに沿って延びる帯状の共
通電極本体部76と、この本体部76から離れ副走査方
向である方向Yに延設する多数の共通電極側個別電極7
4と、この共通電極側個別電極76の先端とその先端を
千鳥状に配置し、IC側に延設する多数のIC側個別電
極72の金パターンを形成する。Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 is a schematic view of a thermal head according to the present invention, FIG. 2 is a sectional view taken along line AA of FIG. 1, and FIGS.
Reference numeral 0 is an explanatory view of the manufacturing process of the thermal head. First, the structure of the thermal head will be described in the order of steps. First Step A gold pattern is formed on a substrate (see FIGS. 3 and 4). A MOD gold film is formed so as to cover the partial glaze 62 of the ceramic substrate 60, and a strip-shaped common electrode main body portion 76 extending along the direction X which is the main scanning direction is separated by photolithography etching. A large number of common electrode side individual electrodes 7 extending in the sub scanning direction Y.
4 and the tips of the common electrode side individual electrodes 76 and the tips thereof are arranged in a staggered manner to form a gold pattern of a large number of IC side individual electrodes 72 extending to the IC side.
【0011】第2工程 基板の金パタ−ン上に帯状抵
抗体を形成する(図5、図6参照)。金パターンの上に
ネガレジストをスピンコートし、抵抗体を形成すべき位
置、すなわち、共通電極側個別電極74とIC側個別電
極72とが交互に重なった部分にフォトリソエッチング
により開口部を形成する。次にその開口部に抵抗体ペー
ストを印刷で埋め込み乾燥後ラッピングを施し表面を平
坦化し焼成する。この焼成においてレジストは焼去さ
れ、共通電極側個別電極74とIC側個別電極72とが
交互に重なった部分に、電極74と電極72とを連続す
るように、主走査方向に延びる帯状の抵抗体80が形成
される。Second step A band-shaped resistor is formed on the gold pattern of the substrate (see FIGS. 5 and 6). A negative resist is spin-coated on the gold pattern, and an opening is formed by photolithographic etching at a position where a resistor is to be formed, that is, a portion where the common electrode side individual electrode 74 and the IC side individual electrode 72 are alternately overlapped. . Next, a resistor paste is embedded in the opening by printing, dried, lapped to flatten the surface and baked. In this baking, the resist is burned off, and a strip-shaped resistor extending in the main scanning direction is formed so that the electrode 74 and the electrode 72 are continuous at the portion where the common electrode side individual electrode 74 and the IC side individual electrode 72 are alternately overlapped. A body 80 is formed.
【0012】第3工程 オーバーグレーズ層を形成す
る(図7、図8参照)。オーバーグレーズ90は、間隙
部95を隔てて個別電極側オ−バ−グレ−ズ92と共通
電極本体側オ−バ−グレ−ズ94とを有し、印刷、焼成
によって形成される。個別電極側オ−バ−グレ−ズ92
はIC側個別電極72と抵抗体80を被覆し、さらに共
通電極側個別電極74の共通電極本体部76側の個別電
極端部742を除いた全面に形成される。共通電極本体
側オ−バ−グレ−ズ94は共通電極本体部76上のIC
側個別電極72側の共通電極端部762を除いた部分で
あって、個別電極側オ−バ−グレ−ズ92から間隙部9
5の距離を隔てて、共通電極本体部76上面に形成され
る。間隙部95は個別電極側オ−バ−グレ−ズ92と共
通電極本体側オ−バ−グレ−ズ94間のオ−バ−グレ−
ズが存在しない部分であって、個別電極端部742と共
通電極端部762とを有している。Third step: An overglaze layer is formed (see FIGS. 7 and 8). The overglaze 90 has an individual electrode side overglaze 92 and a common electrode main body side overglaze 94 with a gap 95 therebetween, and is formed by printing and firing. Individual electrode side over glaze 92
Is formed on the entire surface of the common electrode side individual electrode 74 except for the individual electrode end portion 742 of the common electrode main body portion 76 side, which covers the IC side individual electrode 72 and the resistor 80. The common electrode body side overglaze 94 is an IC on the common electrode body portion 76.
The part other than the common electrode end 762 on the side individual electrode 72 side, from the individual electrode side overglaze 92 to the gap 9
The common electrode body 76 is formed on the upper surface of the common electrode body 76 with a distance of 5. The gap 95 is between the individual electrode side overglaze 92 and the common electrode body side overglaze 94.
It is a portion where there are no scratches and has an individual electrode end portion 742 and a common electrode end portion 762.
【0013】第4工程 パルストリミングを施す(図
7、図8参照)。トリミングは共通電極側個別電極74
と、隣合ったIC側個別電極72との間にパルスをかけ
て半ビットごとに行なう。このとき、共通電極側個別電
極74側の間隙部95内の個別電極端部742は電極パ
ッドとしてプロ−バの探針を接触させる。例えば、共通
電極側個別電極74aとIC側個別電極72a間に電圧
をかけ、抵抗体b部分をトリミングし、次に共通電極側
個別電極74bとIC側個別電極72aとの間に電圧を
かけ、抵抗体b’部分をトリミングする。Fourth Step Pulse trimming is performed (see FIGS. 7 and 8). Trimming is performed on the common electrode side individual electrode 74
Then, a pulse is applied between the adjacent IC-side individual electrodes 72 for every half bit. At this time, the individual electrode end portion 742 in the gap portion 95 on the common electrode side individual electrode 74 side contacts the probe of the prober as an electrode pad. For example, a voltage is applied between the common electrode side individual electrode 74a and the IC side individual electrode 72a to trim the resistor b portion, and then a voltage is applied between the common electrode side individual electrode 74b and the IC side individual electrode 72a. The resistor b'part is trimmed.
【0014】第5工程 オ−バ−グレ−ズの間隙部
に、共通電極側個別電極と共通電極本体部との接続部を
形成する(図9、図10参照)。接続部100はオ−バ
−グレ−ズが形成されていない、個別電極端部742と
共通電極端部762上に形成した間隙部95内にエポキ
シメラミン系の銀エポキシ樹脂を印刷し、焼成して形成
する。このときの焼成は焼成温度180℃とし、30分
焼成した。個別電極端部742と共通電極端部762は
接続部100を介して接続され、共通電極側個別電極7
4と共通電極本体76が一体となる。Fifth step A connecting portion between the common electrode side individual electrode and the common electrode main body portion is formed in the gap of the overglaze (see FIGS. 9 and 10). The connection part 100 is printed with an epoxymelamine-based silver epoxy resin in the gap 95 formed on the individual electrode end 742 and the common electrode end 762 without overglazing, and baked. To form. Firing at this time was performed at a firing temperature of 180 ° C. for 30 minutes. The individual electrode end portion 742 and the common electrode end portion 762 are connected via the connection portion 100, and the common electrode side individual electrode 7
4 and the common electrode body 76 are integrated.
【0015】第6工程 接続部をシールして、サ−マ
ルヘッドを形成する(図1、図2参照)。シール部11
0はフェノール樹脂の印刷、焼成により接続部100上
に形成される。この焼成温度は180℃、焼成時間は3
0分間とした。以上のように構成したサ−マルヘッド
は、焼成温度を180℃で焼成が達成できる素材、エポ
キシメラミン系の銀エポキシ樹脂およびフエノ−ル樹脂
を用いて接続部100およびシ−ル部110を形成して
いるので、抵抗値をトリミングした後の、第5工程、第
6工程における焼成作業において、200℃以下の焼成
温度で作業でき、焼成後のサ−マルヘッドの発熱抵抗体
の抵抗値をトリミング時の抵抗値に維持させることがで
きる。Sixth step The connecting portion is sealed to form a thermal head (see FIGS. 1 and 2). Seal part 11
0 is formed on the connection part 100 by printing and baking a phenol resin. The firing temperature is 180 ° C and the firing time is 3
It was set to 0 minutes. In the thermal head configured as described above, the connection portion 100 and the seal portion 110 are formed by using a material capable of achieving firing at a firing temperature of 180 ° C., an epoxy melamine-based silver epoxy resin and a phenol resin. Therefore, in the firing work in the fifth step and the sixth step after trimming the resistance value, it is possible to work at a firing temperature of 200 ° C. or less, and the resistance value of the heating resistor of the thermal head after firing is trimmed. Can be maintained at the resistance value of.
【0016】この実施例のサ−マルヘッドの製造方法
は、オ−バ−グレ−ズ92,94間隙部95内に導電性
の素材を充填して焼成することにより確実に個別電極7
4と共通電極本体部76とを通電可能に一体化すること
ができる。さらに、発熱抵抗体の抵抗値を修正した後の
サ−マルヘッドは高温での処理がなされないので、トリ
ミング後の抵抗値ばらつきの増大がほとんどなく、製造
されたサ−マルヘッドはきわめて抵抗値ばらつきの少な
い高画質に対応するサーマルヘッドを実現することがで
きた。In the method of manufacturing the thermal head of this embodiment, the individual electrodes 7 are surely filled by filling the gaps 95 of the overglades 92 and 94 with a conductive material and firing it.
4 and the common electrode body 76 can be integrated so as to be able to conduct electricity. Furthermore, since the thermal head after the resistance value of the heating resistor is corrected is not processed at high temperature, the variation in the resistance value after trimming hardly increases, and the manufactured thermal head has an extremely large variation in the resistance value. We were able to realize a thermal head that is compatible with low image quality.
【0017】[0017]
【発明の効果】本発明の帯状の発熱抵抗体を有するサ−
マルヘッドは、発熱抵抗体の抵抗値の修正を半ビットご
とにできるので、発熱抵抗体の同一ビット内の2つの発
熱部の抵抗値のばらつきがない。しかも接続部およびシ
−ル部は低温(200℃以下)で焼成可能な素材で構成
されているので、サ−マルヘッドの構成途上における発
熱抵抗体の抵抗値の変動がなく、パルストリミングで修
正した抵抗値が維持され、高階調性を満足する、高画質
に対応できるサ−マルヘッドである。Advantageous Effects of Invention A server having a strip-shaped heating resistor of the present invention
Since the Mullhead can correct the resistance value of the heating resistor for each half bit, there is no variation in the resistance value of the two heating portions in the same bit of the heating resistor. Moreover, since the connecting portion and the seal portion are made of a material that can be fired at a low temperature (200 ° C. or less), there is no change in the resistance value of the heating resistor during the construction of the thermal head, and the correction is performed by pulse trimming. It is a thermal head that can maintain high resistance and satisfy high gradation, and can be used for high image quality.
【0018】本発明のサ−マルヘッドの製造方法は、発
熱抵抗体の半ビット毎の抵抗値の修正工程で抵抗体全体
および同一ビット内の抵抗値のばらつきを修正した後、
接続部形成工程、およびシ−ル部形成工程で高温処理を
しないので、半ビット毎の抵抗値の修正工程で修正した
抵抗体全体および同一ビット内の抵抗値が維持でき、抵
抗値ばらつきの拡大を生じさせない製造方法であって、
抵抗値のばらつきのないサーマルヘッドを得ることがで
きる。また、共通電極の形成においては、オ−バ−グレ
−ズの間隙部内で導電性の素材を焼成するのみで確実に
個別電極と共通電極本体部とを通電可能に一体化するこ
とができる。According to the method of manufacturing a thermal head of the present invention, after the variation of the resistance value of the entire heating element and the variation of the resistance value in the same bit are corrected in the step of correcting the resistance value of each half bit of the heating resistor,
Since high temperature processing is not performed in the connection part formation process and the seal part formation process, the resistance value of the entire resistor and the resistance value in the same bit corrected in the correction process of the resistance value for each half bit can be maintained, and the variation in resistance value can be expanded. A manufacturing method that does not cause
It is possible to obtain a thermal head having no variation in resistance value. Further, in forming the common electrode, the individual electrode and the common electrode main body can be surely integrated so as to be able to conduct electricity only by firing the conductive material in the gap of the overglaze.
【図1】 本発明によるサ−マルヘッドの上面説明図。FIG. 1 is a top view of a thermal head according to the present invention.
【図2】 図1の線A−A断面図。FIG. 2 is a sectional view taken along line AA of FIG.
【図3】 第1工程の説明図。FIG. 3 is an explanatory diagram of a first step.
【図4】 図3の線A−A断面図。4 is a sectional view taken along line AA of FIG.
【図5】 第2工程の説明図。FIG. 5 is an explanatory diagram of a second step.
【図6】 図3の線A−A断面図。6 is a sectional view taken along line AA of FIG.
【図7】 第3工程、第4工程の説明図。FIG. 7 is an explanatory diagram of a third step and a fourth step.
【図8】 図7の線A−A断面図。8 is a cross-sectional view taken along the line AA of FIG.
【図9】 第5工程の説明図。FIG. 9 is an explanatory diagram of a fifth step.
【図10】 図9の線A−A断面図。10 is a cross-sectional view taken along the line AA of FIG.
【図11】 アニ−ル温度による抵抗値のばらつき変化
率を表すグラフ。FIG. 11 is a graph showing the rate of change in resistance value variation with annealing temperature.
【図12】 従来のサ−マルヘッドの説明図。FIG. 12 is an explanatory view of a conventional thermal head.
【図13】 従来のサ−マルヘッドの説明図。FIG. 13 is an explanatory view of a conventional thermal head.
60 セラミック基板、72 IC側個別電極、74
共通電極側個別電極、76 共通電極本体部、80 帯
状抵抗体、92,94 オーバーグレーズ、100 接
続部、110 シール部。60 ceramic substrate, 72 IC side individual electrode, 74
Common electrode side individual electrode, 76 common electrode main body, 80 strip resistors, 92, 94 overglaze, 100 connection part, 110 seal part.
Claims (2)
の共通電極本体部と、共通電極本体部から隔離した位置
に、絶縁基板上の複走査方向に延設した複数の個別電極
と、複数の個別電極上または電極下に帯状に主走査方向
に形成した発熱抵抗体と、オ−バ−グレ−ズが存在しな
い間隙部を備え、個別電極、発熱抵抗体、共通電極本体
部の上面に形成するオ−バ−グレ−ズと、オ−バ−グレ
−ズの間隙部に配設される導電体よりなる接続部と、接
続部の上部に形成したシ−ル部とを備えたサ−マルヘッ
ドであって、 前記個別電極はIC側に連絡可能な複数の個別電極と、
共通電極本体部に連絡可能な複数の個別電極とを有し、
前記間隙部は共通電極本体部に連絡可能な個別電極の共
通電極本体部側の端部と、共通電極本体部の個別電極側
の端部を含んで配設されると共に、前記接続部およびシ
−ル部は焼成温度が200℃以下で焼成可能な素材で形
成されていることを特徴とするサ−マルヘッド。1. A strip-shaped common electrode body portion extending in the main scanning direction on an insulating substrate, and a plurality of individual electrodes extending in the multiple scanning direction on the insulating substrate at positions separated from the common electrode body portion. , A plurality of individual electrodes, or a heating resistor formed in a strip shape in the main scanning direction below or below the electrode, and a gap portion in which there is no overglaze are provided. An overglaze formed on the upper surface, a connecting portion made of a conductor disposed in a gap between the overglaze, and a seal portion formed on the upper portion of the connecting portion. A thermal head, wherein the individual electrodes are a plurality of individual electrodes that can communicate with the IC side,
Having a plurality of individual electrodes that can communicate with the common electrode body,
The gap portion is disposed so as to include an end portion on the common electrode body portion side of the individual electrode that can communicate with the common electrode body portion, and an end portion on the individual electrode side of the common electrode body portion. -The thermal head is characterized by being formed of a material capable of firing at a firing temperature of 200 ° C or less.
体部およびこの本体部から隔離して副走査方向に延設す
る複数の個別電極とを基板上に形成する工程と、個別電
極を接続して主走査方向に沿って延びる帯状の発熱抵抗
体を形成する工程と、個別電極の共通電極本体部側の端
部と、共通電極本体部の個別電極側の端部との間にオ−
バ−グレ−ズが存在しない間隙部を設け、個別電極、発
熱抵抗体、共通電極本体部の上面にオ−バ−グレ−ズを
形成する工程と、個別電極とそれと隣り合った個別電極
間にパルスをかけて半ビット毎に発熱抵抗体の抵抗値の
修正を行なう工程と、オ−バ−グレ−ズの間隙部に導電
材を配設して、共通電極本体部と個別電極とを接続する
接続部を形成する工程と、接続部の上面にシ−ル部を形
成する工程とを備え、 接続部とシ−ル部は低温焼成可能な素材で形成されると
共に、焼成温度を200℃以下としたサーマルヘッドの
製造方法。2. A step of forming, on a substrate, a strip-shaped common electrode main body extending in the main scanning direction and a plurality of individual electrodes isolated from the main body and extending in the sub-scanning direction; Between the step of connecting and forming a strip-shaped heating resistor extending along the main scanning direction, and between the end of the individual electrode on the side of the common electrode main body and the end of the common electrode on the side of the individual electrode. −
A step of forming an overglaze on the upper surface of the individual electrode, the heating resistor, and the common electrode main body by providing a gap portion in which there is no overglaze, and between the individual electrode and the adjacent individual electrode Pulse is applied to each half bit to modify the resistance value of the heating resistor, and a conductive material is placed in the gap of the overglaze to separate the common electrode body and individual electrodes. The method includes a step of forming a connecting portion to be connected and a step of forming a seal portion on the upper surface of the connecting portion. The connecting portion and the seal portion are made of a material that can be fired at a low temperature, and the firing temperature is 200 A method of manufacturing a thermal head at a temperature of ℃ or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4246193A JPH06255155A (en) | 1993-03-03 | 1993-03-03 | Thermal head and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4246193A JPH06255155A (en) | 1993-03-03 | 1993-03-03 | Thermal head and its manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06255155A true JPH06255155A (en) | 1994-09-13 |
Family
ID=12636717
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4246193A Pending JPH06255155A (en) | 1993-03-03 | 1993-03-03 | Thermal head and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06255155A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010036459A (en) * | 2008-08-05 | 2010-02-18 | Ricoh Co Ltd | Idle discharge receiving device, holding device, droplet discharging device, and image forming device |
-
1993
- 1993-03-03 JP JP4246193A patent/JPH06255155A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010036459A (en) * | 2008-08-05 | 2010-02-18 | Ricoh Co Ltd | Idle discharge receiving device, holding device, droplet discharging device, and image forming device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2005025877A1 (en) | Thermal printhead and method for manufacturing same | |
| JPH06255155A (en) | Thermal head and its manufacture | |
| EP0342243B1 (en) | Thermal head | |
| US6424367B1 (en) | Thick-film thermal printhead | |
| US7843475B2 (en) | Thermal print head and method for manufacturing the same | |
| JPH07108694A (en) | Thermal head, and printer using the head | |
| JPH0550630A (en) | Thermal head and manufacture thereof | |
| JPH0751362B2 (en) | Thermal head | |
| JPH0419155A (en) | Thick film type thermal head | |
| CN217415272U (en) | Heating substrate for thermal printing head with uniform printing concentration | |
| JPH0532297Y2 (en) | ||
| JPH07101091A (en) | Thermal head | |
| JPH0725174B2 (en) | Method for manufacturing thick film type thermal head | |
| JP2965339B2 (en) | Manufacturing method of thermal head | |
| JPH01286864A (en) | Thermal head | |
| JPS63267568A (en) | Method of manufacturing thermal head | |
| JPS6292411A (en) | Manufacture of thick film thermal head | |
| JPH06106756A (en) | Thermal head and manufacture thereof | |
| JP2613304B2 (en) | Thick film type thermal head | |
| JPS6292414A (en) | Manufacture of thick film thermal head | |
| JPH0717070B2 (en) | Thermal head | |
| JPH01146761A (en) | Thick film line type thermal head | |
| JPH07304198A (en) | Thermal print head and manufacture thereof | |
| JPH09314881A (en) | Thermal printing head | |
| JPH0473161A (en) | Thick film thermal head |