JPH06269748A - Washer - Google Patents

Abstract

(57) [Abstract] [Purpose] It is possible to remove organic contaminants and foreign contaminants in a single cleaning device while making the device compact, and to automate the cleaning device and perform high cleaning. [Structure] Substrate 1, which is an object to be cleaned, is successively horizontally conveyed by rollers 50 in one cleaning device main body 2. In this transport path, a cleaning shower unit 4 for removing organic contaminants, which uses a stock solution of a surfactant having a solubility in organic substances or a high-concentration solution as a cleaning solution, and the same cleaning solution as the above-mentioned surfactant are used. A cleaning brush 6 for removing foreign matter contaminants using a diluted low-concentration cleaning liquid is provided. The cleaning liquid may be a mixture of an oily medium and a surfactant. After a series of cleaning, the rinsing part 8 and the finishing part 9 are sent.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device for substrates, and more particularly to a cleaning device for dissolving organic contaminants such as glass substrates, silicon substrates and ceramic substrates and removing foreign contaminants.

[0002]

2. Description of the Related Art In the prior art, for example, JP-A-60-16
As described in Japanese Patent No. 8580, the cleaning process is performed with a cleaning liquid that dissolves organic contaminants on the substrate, and then the cleaning process is performed with a cleaning liquid that removes foreign substance contaminants on the substrate.

An example thereof is shown in FIG. In FIG. 2, the substrate 1 is stored in the cassette 14. The cassette 14 containing the substrate 1 is manually loaded into the loader 16 of the cleaning device 13a. The loaded cassette 14 is transported in the cassette transport direction 21 by a transport device (not shown), and the cassette 14 is first loaded and immersed in the dissolution tank 17 for the organic contaminant removal process.

Here, a chlorine-based organic solvent such as trichloroethane or a water-soluble organic medium such as organic amines or polyethers is used as a solution for removing organic contaminants. At this time, ultrasonic waves may be used together for the purpose of improving the solubility.

After the organic contaminants are dissolved in the dissolution tank 17,
The cassette 14 for storing the substrate 1 is continuously rinsed with the rinsing tank 18
Is thrown into. When the dissolution liquid in the dissolution tank 17 is trichloroethane, new trichloroethane is used as a rinse liquid for the purpose of rinsing the dissolved trichloroethane of the contaminant. Further, when the solution is a water-soluble medium such as an organic amine or polyether, pure water is used as the rinse solution. At this time, ultrasonic waves may be used together for the purpose of improving rinsability.

The cassette 14 which has been rinsed is washed by the cleaning unit 3
Then, the foreign matter contaminants of the substrate 1 are removed. When trichloroethane or the like is used in the rinsing bath 18, the trichloroethane on the substrate surface is replaced with a medium mixed with pure water in the next step. It is necessary to immerse and replace the substrate surface. Pure water or pure water containing a surfactant or the like is used as a cleaning liquid for removing foreign matter contaminants in the cleaning unit 30. As a cleaning method in this case, an impact force generated by ultrasonic waves or a frictional force generated by a brush can be used.

After the cleaning, the cassette 14 is used for the purpose of replacing the foreign matter existing in the cleaning liquid and the cleaning liquid with pure water.
Is conveyed to the rinsing section 31. At this time, ultrasonic waves may be used together for the purpose of improving rinsability.

The cassette 14 that has been rinsed is dried in the drying tank 19
Be transported to. When a solution is used as a medium for drying, alcohols such as isopropyl alcohol, which is replaced with pure water and has a faster drying rate than pure water, are used.
The substrate 1 in the cassette 14 can be dried by using these liquids as vapor. Cassette 14 after drying
Are conveyed to the unloader 20.

FIG. 3 shows these steps in two cleaning devices 1.
This is an example of using 3 and 12. In FIG. 3, the substrate 1 is stored in the cassette 14. The cassette 14 containing the substrate 1 is manually loaded into the loader 16 of the first cleaning device 13.

The loaded cassette 14 is transported in the cassette transport direction 21 by a transport device (not shown). The cassette 14 is put into the dissolution tank 17 and immersed in the solution to perform organic contaminant removal processing, and then rinsed in the rinse tank 18. Here, the processing performed in the dissolution layer 17 and the rinse tank 18 is the first conventional example. The same is done.

The cassette 14 which has been rinsed is dried in a drying tank 19
Be transported to. As a medium used for drying, when the solution and the rinse are trichloroethane, organic solvents such as trichloroethane and freon are used. When rinsing with pure water is performed, alcohols, such as isopropyl alcohol, which replaces pure water and has a faster drying rate than pure water are used. The substrate 1 in the cassette 14 can be dried by using these liquids as vapor. The dried cassette 14 is conveyed to the unloader 20. Through the above steps, organic contaminants are dissolved and removed.

The cassette 14 accommodating the substrate 1 that has been dissolved and removed is placed in the second cleaning device 12, and the foreign matter contaminant treatment described below is performed.

In the second cleaning device 12, the substrates 1 are taken out from the cassette 14 one by one by a carrying mechanism (not shown), and the substrates 1 are put into the cleaning device 12. The loaded substrate 1 is conveyed to the brush unit 6. Here, it is cleaned by removing foreign matter contaminants by the frictional force of the brush. As the cleaning liquid at this time, pure water and pure water containing a surfactant and having a reduced surface tension are used.

After the brush cleaning, the substrate 1 is transferred to the rinsing parts 7 and 8. In the rinsing section 8, the substrate 1 is rinsed with pure water, and is peeled off from the surface of the substrate 1 by the brush in the previous step to replace the foreign matter present in the liquid on the substrate 1 and the cleaning liquid used therewith with pure water. .

Further, the finishing section 9 receives finishing processing. As the finishing process, ultrasonic waves are added to the discharged pure water, and cleaning is performed to remove foreign matter contaminants on the substrate by the effect of the ultrasonic waves and running water. Further, the pure water supplied is also discharged for the purpose of removing foreign matters in the pure water remaining in these steps. Then, the pure water remaining on the substrate 1 is removed by high-speed air in the drying unit 10, and the substrate 1 is dried. In this configuration, since each sheet is horizontally conveyed and is carried out, it is easy to connect to the process device of the subsequent process.

Further, in the case where the integrated line is constructed by horizontal conveyance from the pre-process to the post-process, the apparatus having the construction shown in FIG. 4 may be used.

In FIG. 4, the substrate 1 is carried into the receiving portion 3 from the previous step. The carried-in substrate 1 is first subjected to an organic contaminant removal process by a cleaning liquid shower in the cleaning shower unit 4. As the cleaning liquid sprayed in the cleaning shower unit 4, a water-soluble organic medium such as organic amines or polyethers having a dissolving ability for organic contaminants is used. These cleaning liquids are used for the brush portion 6 in the subsequent cleaning process.
If it is mixed with the cleaning liquid used in step 1, the cleaning performance of the cleaning liquid of the brush part 6 may be adversely affected. Therefore, the cleaning liquid used in the cleaning shower unit 4 is removed.

Since the liquid supplied to the cleaning shower is water-soluble, rinsing with pure water is carried out as a removing method. To improve the rinsing property, the amount of the cleaning liquid on the substrate 1 is reduced. Is conveyed to the drainage section 5. Here, most of the cleaning liquid on the substrate 1 is removed by the flow velocity of the air blown at the liquid draining section 5. However, when the surface of the substrate is dried, stains may remain on the surface of the substrate. Therefore, it is necessary to remove the cleaning liquid to the extent that the surface of the substrate is not dried.

The substrate 1 whose cleaning liquid has been reduced by the liquid draining portion 5 receives a shower of pure water in the rinsing tanks 23 and 24. As a result, the cleaning liquid on the substrate 1 is removed and only pure water is present on the surface of the cleaning liquid. If this pure water is brought into a washing tank using a detergent in the next step, the concentration of the detergent will be reduced. Therefore, for the purpose of removing the pure water, the pure water is removed by the flow rate of air at the liquid draining section 25.

The substrate 1 from which pure water has been removed is conveyed to the brush section 6. Here, it is cleaned by removing foreign matter contaminants by the frictional force of the brush. As the cleaning liquid at this time, pure water and pure water containing a surfactant and having a reduced surface tension are used.

After cleaning with a brush, the brush is peeled off from the surface of the substrate 1 and transferred to the rinsing parts 7 and 8 for the purpose of replacing the contaminants existing in the liquid on the substrate 1 and the cleaning liquid used therewith with pure water. To be done. Here, it is rinsed with pure water.

Further, the finishing section 9 receives finishing processing. As the processing of the finishing section, ultrasonic waves are added to the discharged pure water, and cleaning is performed to remove foreign matter contaminants on the substrate by the effect of the ultrasonic waves and running water. Further, the pure water supplied is also discharged for the purpose of removing foreign matters in the pure water remaining in these steps. Then, the pure water remaining on the substrate 1 is removed by high-speed air in the drying unit 10, and the substrate 1 is dried.

The organic contaminants and foreign contaminants have been removed by such steps.

As another conventional example, for example,
As disclosed in Japanese Unexamined Patent Publication No. 1-27123, after cleaning an object to be cleaned by immersing it in a cleaning chemical solution, immersing the cleaning object in a diluted chemical solution obtained by diluting the same chemical solution as the cleaning chemical solution with water, After that, the article to be cleaned is rinsed by immersing it in water so that the cleaning chemical solution can be removed well.

[0025]

In such a conventional technique, when removing (dissolving) organic contaminants and removing foreign contaminants, two different types of cleaning liquids are used, and therefore, the respective cleaning liquids are used. It is necessary to prevent the adverse effects of mixing. Therefore, a double rinsing and drying process is required for the part that dissolves organic contaminants and rinses them, and the part that should be dried, and the part that removes foreign matter contaminants and rinses and dries them. As a result, the length of the entire device increases, and the size of the entire device tends to increase. Furthermore, the installation space of the cleaning device becomes large, and the amount of investment in the clean room increases.

Further, from the viewpoint of global environmental safety, it is no longer possible to use trichloroethane or freon as a dissolution medium and a drying medium, and it is necessary to change to another means. Further, when isopropyl alcohol is used as the drying medium, this medium is flammable, and therefore safety measures against ignition and explosion are required.

An object of the present invention is to improve such problems and enable removal of organic contaminants and foreign contaminants with a single compact cleaning device having a short overall length.

[0028]

In order to achieve the above-mentioned object, the present invention basically comprises a cleaning unit for removing organic substances adhering to a substrate, which is an object to be cleaned, by melting in the apparatus main body, and the substrate. In the cleaning device for performing a series of cleaning, including a cleaning unit for removing foreign matter attached to the cleaning solution, the cleaning solution used for the series of cleaning is the same type of cleaning solution and it is preferable to use the cleaning solution for dissolving the organic matter as the undiluted solution or A cleaning apparatus is proposed in which a cleaning solution having a high concentration and used in the cleaning unit for removing the foreign matter is set to be a diluted cleaning solution having a low concentration (this is a first problem solving means).

Here, the most suitable cleaning liquid is a liquid having a surfactant capable of dissolving organic contaminants or a mixture of an oily medium and a surfactant.

Further, as a cleaning device related to this, a transfer means for sequentially transferring horizontally a substrate as an object to be cleaned is provided in one cleaning device main body, and an interface having a solubility to organic substances as a cleaning liquid is provided in this transfer path. A cleaning shower unit for removing organic contaminants (which corresponds to the cleaning unit for dissolving organic contaminants of the first problem solving means) using an undiluted solution or a high concentration of an activator, and the surfactant as a cleaning solution. And a cleaning brush for removing foreign matter contaminants using a low-concentration surfactant diluted with the same thing (corresponding to a cleaning unit for removing foreign matter contaminants of the first problem solving means). Instead of this, a cleaning shower unit for removing organic contaminants using a stock solution of a liquid obtained by mixing a surfactant in an oily medium or a high concentration solution (the first problem) Solution A cleaning brush for dissolving organic contaminants) and a cleaning brush for removing foreign contaminants using a liquid obtained by diluting the same mixed liquid as the cleaning liquid (remote contaminant removal of the first problem solving means) (Corresponding to a cleaning unit for) is provided (this is a third problem solving means).

[0031]

OPERATION OF THE FIRST PROBLEM SOLUTION MEANS ... According to the above configuration, the cleaning liquid for dissolving (removing) organic contaminants and the cleaning unit for removing foreign matter are of the same type, and the former one is used. Since it uses an undiluted solution or a high-concentration cleaning solution, it acts as a solvent that dissolves organic contaminants, and the latter uses a diluted low-concentration solution, so the cleaning solution component is the surface of the diluted solution (pure water). The tension can be reduced to effectively remove the foreign matter. Examples of the same type of cleaning liquid that functions to remove such organic contaminants and foreign contaminants include, for example, a surfactant having the ability to dissolve organic contaminants or a liquid obtained by mixing a surfactant with an oil medium. .

As described above, by using the same type of cleaning liquid for the processing steps of dissolving (removing) organic contaminants and removing foreign matter contaminants, the problem when the cleaning liquid is mixed with pure water is solved. On the other hand, it is possible to deal with it by controlling the concentration thereof, and it is not necessary to consider adverse effects such as deterioration of cleaning power due to mixing of different kinds of liquids when two kinds of cleaning liquids are used. Steps such as rinsing and drying between the contaminant removing step (for example, rinsing tank 18 as shown in FIG. 2, rinsing tank 18 as shown in FIG. 3, drying tank 1
9, rinse tanks 23 and 24 as shown in FIG. 4, draining section 25)
Can be omitted, and the total length of the device can be shortened accordingly.

Although the organic contaminants are removed by dissolution as described above, the cleaning unit used for this purpose is as follows.
Washing shower (for example, shower pressure is about 1 to several kgf / cm ² ), immersion, ultrasonic wave for immersion (for example, frequency 20-40 kH)
z) is added, and there are dipping tanks with stirring and heating devices. On the other hand, as a cleaning unit for removing foreign matter, a cleaning brush, a device to which ultrasonic waves are added to the immersion (for example, 20 to 40 k
Hz) etc.

Of these, the second and third means for solving the problems described below use a cleaning shower section as a cleaning section for dissolving organic contaminants, and a cleaning brush section as a cleaning section for removing foreign contaminants. Used.

Operation of the second means for solving the problems: The substrates are sequentially conveyed horizontally one by one, and the shower power and the cleaning liquid (a stock solution of a surfactant having an ability to dissolve organic substances or a high concentration solution) are used in the cleaning shower section. ), The organic contaminants are dissolved (removed), and the foreign substances are removed by the synergistic action of the cleaning brush and the low-concentration cleaning liquid of the surfactant. Of these, a stock solution or a high-concentration agent, such as a surfactant used in the washing shower section, acts as a solvent by dissolving organic contaminants, and at a low concentration, the surface of a diluting solution (pure water) for removing foreign contaminants. Acts as a surfactant to reduce tension. One example of the liquid corresponding to this is a polyether-based substance, which will be described in Examples.

In this way, organic contaminants and foreign contaminants can be removed by one compact cleaning device as in the first problem solving means.

Further, since the so-called single-wafer cleaning method of cleaning the substrates one by one is adopted in the means for solving the problem, the cleaning capacity is higher than that of the conventional immersion method using the cassette shown in FIG. 2 and FIG. In addition, since the substrates can be delivered to and from the cleaning device before and after the cleaning device one by one, the system line can be automated.

That is, in the conventional example shown in FIGS. 2 and 3, since a plurality of substrates 1 to be cleaned are stored in the cassette 14 and collectively processed, the flow of the cleaning liquid between the respective substrates is poor,
High cleanliness cannot be obtained because problems such as movement of foreign matter contaminants between substrates and reattachment occur, and the cleanliness of individual substrates tends to be non-uniform. Further, since the cassette is used, dirt may easily adhere to the cleaned substrate 1 from the cassette 14, and the original purpose of cleaning may not be achieved. Further, in the case of an apparatus that performs processing one by one in the pre-process and the post-process, it is necessary to take out the substrates housed in this cassette one by one. For that purpose, a take-out mechanism and human work for arranging the cassette in the mechanism are involved, so that the apparatus cost and the labor cost become a problem. Similarly, since a cassette is used, a place for storing the cassette is needed. Since these operations are usually carried out in a clean room, it is necessary to invest in a place necessary for storage, which leads to an increase in the amount of investment, but this problem solving means addresses these problems. be able to.

Operation of Third Problem Solving Means ... This problem solving means also operates similarly to the second problem solving means. Here, as the cleaning liquid used for the cleaning shower section and the cleaning brush section,
Oily media mixed with a surfactant having different concentrations are used. Of these, the stock solution of the above-mentioned mixed liquid used in the washing shower part or a high-concentration liquid is an oily medium depending on the surfactant. Are dispersed and dissolved in water. Therefore, at high concentrations, the oily medium in this liquid dissolves and removes organic contaminants. And with the cleaning brush,
Although a liquid having the same low concentration as the liquid used for the washing shower is used, the surfactant in the liquid lowers the surface tension of water, which acts as removal of contaminants. When cleaning is performed using this liquid, it is possible to rinse with water as a means for removing this liquid from the surface of the object to be cleaned.

[0040]

Embodiments of the present invention will be described with reference to FIGS. 1 and 5 to 8.

FIG. 1A is a plan view of a cleaning apparatus according to an embodiment of the present invention, and FIG. 1B is a front view thereof.

In FIG. 1, reference numeral 2 is a main body of the cleaning device, and the main body 2 has a receiving part 3, a cleaning shower part 4, a draining part 5, a cleaning brush part 6, rinsing parts 7, 8 and a finishing part 9 in order from the receiving side.
The cleaning device is configured by providing the drying unit 10 and the transporting roller 50 serving as a unit that sequentially transports the substrates 1 as the objects to be cleaned horizontally to each of these units.

The receiving unit 3 receives the substrates 1 one by one, and when the cleaning liquid from the cleaning shower unit 4 in the subsequent process flows into the tank of the receiving unit 3, the cleaning liquid is received and is transferred to the cleaning shower unit 4 in the subsequent process. It has a function to return.

The cleaning shower unit 4 is for removing organic contaminants of the substrate 1 by dissolution, and shower nozzles 34 are provided above and below the path of the substrate 1 which passes through. Further, it has a cleaning liquid tank, a pump and a filter (not shown), and the cleaning liquid is sprayed from the shower nozzle 34 via these tank, pump and filter. The cleaning liquid used in the cleaning shower unit 4 is a polyether-based surfactant stock solution or a high-concentration solution (in this embodiment, the stock solution is used). This polyether material is
As it dissolves many organic substances and contains many oxygen atoms in its molecular chain, it has high hydrophilicity with water, and acts as a solvent that dissolves organic substances at high concentrations and as a surfactant that lowers the surface tension of water at low concentrations. To do.

A heater is provided in the cleaning liquid tank,
The cleaning liquid has a function of heating, the heated cleaning liquid is sprayed from the nozzle 34 onto the substrate 1, and the discharged cleaning liquid is collected in the cleaning tank. The cleaning liquid tank is provided with a liquid meter, and the cleaning liquid is supplied from the stock solution supply tank 33 shown in FIG. 8 when the amount of the liquid in the cleaning liquid tank decreases. Stock solution supply tank 3
3 is provided with a heater, has a function of heating the stock solution, and is provided with a liquid quantity meter to issue a warning requesting replenishment when the quantity of the solution in the stock solution supply tank 33 decreases. It has a function.

The liquid draining section 5 is provided with an air knife 35. A filter is provided in a path for supplying air to the air knife 35, and has a function of removing foreign matter in the air. In addition, a regulator and a flow meter are provided in this path and have a function of adjusting the flow rate of the supplied air.
The air knife 35 has a structure for discharging the supplied air from a narrow slit. The cleaning liquid wiped off by the air discharged here is collected in the tank of the cleaning shower unit 4.

The cleaning brush portion 6 is for removing foreign matter contaminants adhering to the substrate 1, and brushes 36 are provided above and below the passage of the substrate 1. The cleaning brush unit 6 is provided with a cleaning liquid tank, a pump, and a filter, which are not shown. The cleaning liquid tank is provided with a heater and has a function of heating the cleaning liquid. The cleaning liquid in the tank passes through the filter by the force of the pump and is directed from the nozzle (not shown) provided in the brush portion 6 to the brush. Has a function of discharging the cleaning liquid, and the discharged cleaning liquid is collected in the above tank. The cleaning liquid used for the cleaning brush portion 6 is a low-concentration cleaning liquid obtained by diluting a polyether-based surfactant with pure water. The cleaning liquid tank has a function of detecting the cleaning liquid concentration, and when the cleaning liquid concentration increases, the cleaning liquid is diluted. A function of supplying pure water for the purpose is provided. Further, the cleaning liquid tank of the cleaning brush section 6 is provided with a liquid meter, and when the amount of the liquid in the cleaning liquid tank decreases, the cleaning liquid is supplied from the detergent mixing tank 32 shown in FIG. .

A heater is provided in the detergent mixing tank 32 and has a function of heating the cleaning liquid. The detergent blending tank 32 is provided with a liquid meter, and the detergent blending tank 3
When the amount of liquid in 2 decreases, it has the function of receiving the undiluted solution from the undiluted solution supply tank 33 and mixing it with pure water.

Pure water shower nozzles 37 are provided above and below the passage of the substrate 1 in the rinse sections 7 and 8. The rinsing section 7 has a pure water tank, a pump and a filter (not shown), and has a function of discharging the pure water in the tank from the pure water shower nozzle 37 via the pump and the filter. The pure water discharged is collected in the above tank. The pure water tank of the rinsing section 8 is provided with an overflow port, and has a function of flowing out overflow water in the rinsing section 8 to the pure water tank of the rinsing section 7. An overflow port is provided in the deionized water tank of the rinsing section 7, and the overflow water in the rinsing section 7 has a function of flowing out to a drainage path not shown in the figure.

The finishing section 9 has an ultrasonic spray nozzle 38.
Also, a pure water shower nozzle 39 is provided. The finisher 9 has a pure water tank, a pump, and a filter, which are not shown, and this pump has a function of discharging the pure water in the tank from the ultrasonic spray nozzle 38 through the filter. The pure water discharged is collected in the above tank. The pure water tank is provided with an overflow port, and has a function of flowing out overflow water in the finishing section 9 to the pure water tank in the rinsing section 8. The ultrasonic spray nozzle 38 is provided with an ultrasonic vibrator (not shown) so that ultrasonic waves can be added to the pure water to be discharged. As an example of the frequency of this ultrasonic wave, 1 MHz
Is used. Pure water is supplied to the pure water shower nozzle 39 through a path not shown in the figure. A filter is provided in this path and has a function of removing foreign matter in pure water.

The drying section 10 is provided with an air knife 40. A filter is provided in a path for supplying air to the air knife 40, and has a function of removing foreign matters in the air. In addition, a regulator and a flow meter are provided in this path and have a function of adjusting the flow rate of the supplied air.
The air knife 40 has a structure for discharging the supplied air from a narrow slit.

According to this embodiment, the substrate 1 is transported in the transport direction 11 from the previous process and is introduced into the receiving portion 3.
The substrate 1 is transported from the receiving unit 3 to the cleaning shower unit 4 by the transport mechanism 50 in the apparatus 2. The cleaning shower unit 4 sprays the heated cleaning liquid onto the substrate 1. As the cleaning liquid at this time, a polyether-based surfactant is used as an example as described above. This cleaning liquid is temporarily referred to as detergent A, and a conventionally used cleaning liquid, for example, a sulfonic acid type surfactant is temporarily referred to as detergent B. Detergent A
5 and the solubility of the wax of detergent B are shown in FIG. This wax is an example of organic pollutants, and although it does not represent all organic pollutants, it can be used as an evaluation example of dissolution and removability. The sample used for evaluation is
Wax having a diameter of 10 mm and a thickness of 0.5 mm was adhered to a prepared glass. 50 ° C for each washing solution
The sample was immersed in the solution for 3 minutes by heating, and its dissolution and removability was evaluated. For reference, 1,1,1-trichloroethane, which is often used as a solvent for dissolving waxes, was also evaluated.

With the stock solution of detergent A (concentration: 100%), dissolution removal performance was obtained, but with detergent B, dissolution removal was not possible. Further, since the solubility of the detergent A is reduced by diluting it, it is necessary to use the undiluted solution or a high concentration close to it when removing these organic contaminants. The substrate 1 from which the cleaning liquid has been sprayed and the organic contaminants have been removed is conveyed to the liquid draining section 5.

Air is blown from the air knife 35 to the substrate 1 at the liquid draining portion 5, and most of the cleaning liquid on the substrate 1 is blown off by the flow of the air. At this time, if the amount of air is large, the substrate 1 itself will be dried, and this will cause dry bleeding. Therefore, it is necessary to appropriately adjust the amount of air required for the thin cleaning liquid to remain on the substrate 1. The substrate 1 from which the cleaning liquid has been removed is conveyed to the cleaning brush section 6.

In the cleaning brush section 6, a diluted cleaning liquid, for example, 10% detergent A is discharged onto the brush, and the substrate 1 is scrubbed and cleaned by the brush. In the scrub cleaning, it is important to allow the cleaning liquid to penetrate between the foreign matter attached to the substrate 1 and the substrate 1 to reduce the attractive force acting between the foreign matter and the substrate 1. The permeability of the cleaning liquid is evaluated by the surface tension of the cleaning liquid. The relationship between the concentrations of detergent A and detergent B and the surface tension is shown in FIG. Both detergents have a concentration of 1%
Above, the surface tension is 30 to 35 dyn / cm, and it can be evaluated that the permeability of the cleaning liquid is sufficient. The cleaning liquid may be heated in order to improve the cleaning property. The substrate 1 from which the contaminants have been removed by the cleaning liquid and the scrubbing of the brush is conveyed to the rinsing section 7 with the cleaning liquid attached.

In the rinsing section 7, the heated pure water is discharged from the pure water shower nozzle 37 to dissolve and remove the cleaning liquid adhering to the substrate 1. Therefore, the liquid remaining on the substrate becomes a liquid containing the cleaning liquid. To remove this liquid,
The substrate 1 is conveyed to the rinsing section 8. A similar pure water shower is also received in the rinsing part 8, but the cleaning liquid brought in is very small, and therefore when it is conveyed from the rinsing part 8 to the finisher 9 in the next step, it is considered that the cleaning liquid is not attached to the surface thereof. Become.

In the finishing section 9, pure water to which ultrasonic waves have been applied by the ultrasonic spray 38 is discharged onto the substrate 1. The pure water permeates between the foreign matter on the surface of the substrate 1 and the substrate 1 by the force of acceleration generated by the ultrasonic vibration, and removes the foreign matter. The removed foreign matter is suspended in pure water on the substrate 1. In order to remove this pure water, rinsing is performed with pure water discharged from the pure water shower 39. The rinsed substrate 1 is the drying unit 1.
Transported to 0.

In the drying section 10, the pure water on the substrate 1 is completely removed by the high speed air blown from the air knife 40. The substrate 1 that has been dried is transported in the transport direction 11 and is unloaded to the apparatus for the next step.

FIG. 7 shows the cleaning effect of the cleaning apparatus of this embodiment and the conventional cleaning apparatus. The organic substance removability was evaluated by the wettability when pure water was removed from the substrate. The foreign matter removability was evaluated by irradiating the substrate with laser light and detecting the scattered state of the light. In order to obtain cleanliness by the conventional technique, it was necessary to combine trichloroethane and detergent B and the like, but the present invention makes it possible to obtain cleanliness with one kind.

In addition, since the removal of organic contaminants and the removal of foreign matter contaminants are carried out horizontally in each apparatus within one apparatus 2, it is easy to transfer the substrates between the front and rear apparatuses, and a series of automation of the process is performed. In addition, since the same type of cleaning liquid is used for removing organic contaminants and foreign substance contaminants, rinsing and drying processes between the organic contaminant removing process and the foreign substance contaminant removing process can be performed. It can be omitted, and the total length of the device can be shortened accordingly.

Further, since it is not necessary to use a chlorine-based compound such as trichloroethane, it is possible to prevent adverse effects on the global environment. Further, since a combustible material such as isopropyl alcohol is not used, there is an effect that it is not necessary to take measures against dangers such as ignition and explosion.

In the above cleaning solution, a polyether type surfactant is used as a base, but in addition to this, an oily medium such as a terpene type substance mixed with a surfactant is also used as a base. The effect can be obtained.

[0063]

According to the present invention, in the first means for solving the problems, since the same type of cleaning liquid is used in the organic contaminant removing step and the foreign matter contaminant removing step, it is possible to omit the rinsing step and the like between them. It is possible to remove organic contaminants and foreign contaminants in a single device having a shorter overall length than before.

In the second and third problem solving means, in addition to the same effect as the first problem solving means, since each substrate can be horizontally conveyed in a series of cleaning processes, it is possible to perform the same with the front and rear devices. Substrates can be easily delivered, process lines can be automated, and high cleaning can be performed.

[Brief description of drawings]

FIG. 1A is a plan view of a cleaning apparatus according to an embodiment of the present invention, and FIG. 1B is a front view showing the same in a transparent manner.

FIG. 2 is a front view showing an example of a conventional cleaning device in a partially transparent manner.

FIG. 3 is a front view showing another example of a conventional cleaning device, partially transparently shown.

FIG. 4 is a front view showing another example of a conventional cleaning device, partially transparently shown.

FIG. 5 is a diagram showing the ability to dissolve an organic substance (wax) when the cleaning liquid used in the cleaning device of the above-described embodiment and the cleaning liquid used in the conventional cleaning device are used.

FIG. 6 is a diagram showing the relationship between the concentration and the surface tension of the cleaning liquid used in the cleaning device of the above-described embodiment and an example of the cleaning liquid used in the conventional cleaning device.

FIG. 7 is a diagram showing cleaning effects of the cleaning device of the above-described embodiment and a conventional cleaning device.

FIG. 8 is a diagram showing the cleaning apparatus of the above embodiment and a mechanism for supplying a cleaning liquid to the cleaning apparatus.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Substrate, 2 ... Cleaning device main body, 3 ... Receiving part, 4 ... Cleaning shower part, 5 ... Draining part, 6 ... Cleaning brush part, 7, 8 ... Rinse part, 9 ... Finishing part, 10 ... Drying part, 11 ... Transport direction, 27 ... Detergent A surface tension, 28 ... Detergent B surface tension, 32 ... Detergent preparation tank, 33 ... Undiluted solution supply tank, 3
4 ... Washing shower nozzle, 35 ... Air knife, 36 ... Brush, 37 ... Pure water shower nozzle, 38 ... Ultrasonic spray nozzle, 39 ... Pure water shower nozzle, 40 ... Air knife

Claims (7)

[Claims] 1. A series of cleaning is performed by providing a cleaning unit for removing organic substances adhered to a substrate, which is an object to be cleaned, by melting, and a cleaning unit for removing foreign matters adhered to the substrate, in the apparatus main body. In the cleaning apparatus, the cleaning liquid used for the series of cleaning is the same type of cleaning liquid and the one used in the cleaning part for dissolving the organic matter is a stock solution or a high-concentration diluted cleaning liquid used in the cleaning part for removing the foreign matter A cleaning device characterized in that 2. The cleaning apparatus according to claim 1, wherein the cleaning liquid is a liquid having a surfactant having an ability to dissolve organic contaminants or an oily medium mixed with the surfactant. 3. A single cleaning apparatus main body is provided with a transporting means for sequentially horizontally transporting a substrate to be cleaned, and in this transporting path, a stock solution of a surfactant having a solubility to organic substances or a high-concentration solution is used as a cleaning solution. A cleaning shower unit for removing organic contaminants, and a cleaning brush unit for removing foreign matter contaminants using a low-concentration surfactant diluted with the same surfactant as the cleaning liquid. Cleaning device characterized by. 4. A cleaning device main body is provided with a transfer means for sequentially transferring a substrate as an object to be cleaned horizontally, and in this transfer path, an undiluted solution or a high concentration of a liquid obtained by mixing a surfactant with an oily medium as a cleaning liquid. A cleaning shower part for removing organic contaminants using the same, and a cleaning brush part for removing foreign contaminants using a liquid obtained by diluting the same mixed liquid as the cleaning liquid. apparatus. 5. The cleaning according to claim 1, wherein the cleaning device main body is provided with a rinsing portion as a post-treatment for dissolving organic substances and removing foreign substances on the substrate. apparatus. 6. The finisher according to claim 1, wherein the cleaning device main body has a structure in which pure water to which ultrasonic waves have been applied by an ultrasonic spray nozzle is sprayed onto the substrate after the rinsing portion. A cleaning device characterized by being provided. 7. The cleaning apparatus according to claim 1, further comprising means for adjusting the same cleaning liquid to have different concentrations and sending the adjusted cleaning liquid to the cleaning unit.