JPH06281925A - Manufacture of liquid crystal display panel - Google Patents

Abstract

(57) [Summary] [Object] To provide a method for manufacturing a liquid crystal panel, which enables high definition, improves image quality of a color liquid crystal display or the like, and improves production efficiency. A step of forming an insulating film or a black matrix on the active matrix substrate other than the display transparent electrode portion by applying an insulating resist or an insulating black resist on the active matrix substrate, and then exposing and developing the resist, and This substrate is dipped in a micelle electrolytic solution, only the active matrix driving element is driven, a potential of 0.1 to 1.5 V is applied to the display transparent electrode portion, and electrolysis is performed for each RGB color, and the display transparent electrode portion is applied. A method of manufacturing a liquid crystal display panel, which comprises a step of peeling and stacking the dye layers of respective colors to form a dye pattern.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal display panel. For more details, see PCs, word processors,
Color TVs such as wall-mounted TVs, pocket LCD TVs, liquid crystal projectors, aurora vision, solid-state image sensor (CCD), audio, vehicle-mounted instrument panel, clock, calculator, VCR, fax machine, communication device,
The present invention relates to a method for manufacturing a liquid crystal display panel having a transparent substrate (active matrix substrate) equipped with an active matrix driving element, which can be suitably used for a color display for display of games, measuring instruments and the like.

[0002]

2. Description of the Related Art Generally, an active matrix color liquid crystal display panel is constructed by combining an active matrix substrate and a color filter substrate.
In this case, alignment accuracy is required, which is a cause of reducing the yield. As a method for preventing this, forming a color filter on an active matrix substrate is disclosed (Japanese Patent Laid-Open No. 64-21481).
issue). In this case, it is difficult to drive the electrodeposition method because of the high electrolysis potential, and the dispersion method and the dyeing method
RGB alignment is required by photolithography, which is problematic in terms of workability. Therefore, the micelle electrolysis method, which has a low electrolysis potential, is preferable.

[0003]

However, when trying to solve the above problem by the micelle electrolysis method, first, even if an attempt is made to form a dye layer on the active matrix substrate, the dye layer reacts with a gate electrode or a source electrode having a high potential. Therefore, there is a problem that a film cannot be formed on a target display electrode portion.
On the active matrix substrate, a black display, that is, a normally black display is often obtained without applying a liquid crystal drive potential, and when there is a defect in the function of a thin film transistor (TFT), a metal insulated metal (MIM), or the like. , That pixel is always displayed in white, which is a very noticeable defect on a dark screen. Therefore, it is desired to easily correct this white defect portion. The present invention has been made in view of the above problems, enables high definition, and improves the image quality of a color liquid crystal display or the like,
Moreover, it is an object of the present invention to provide a method for manufacturing a liquid crystal panel capable of improving production efficiency (yield).

[0004]

According to the present invention, there is provided an active matrix substrate having an active matrix driving element and a display transparent electrode, and a method for manufacturing a liquid crystal display panel having a color filter formed on the substrate. A step of forming an insulating film or a black matrix by coating, exposing, and developing an insulating resist or an insulating black resist on an active matrix substrate other than the electrode portion, and immersing this substrate in a micelle electrolyte solution to form an active matrix. Only the driving element is driven, a potential of 0.1 to 1.5 V is applied to the display transparent electrode portion, electrolysis is performed for each color of RGB, and the dye layer of each color is separately laminated on the display transparent electrode portion. Provided is a method for manufacturing a liquid crystal display panel, the method including the step of forming a dye pattern.

Further, the active matrix driving element has a portion where a display state may become a white defect in at least a part of the element when the element is driven, and
When the dye layers are laminated to form a dye pattern, an electrolytic potential corresponding to each color of RGB is applied for each color to the active matrix driving element including a white defect portion to form the dye layers of all colors of RGB. Provided is a method of manufacturing a liquid crystal display panel in which a black defect is formed by stacking layers on the same portion.

Further, the active matrix substrate having the active matrix driving element is a thin film transistor (TFT) or thin film diode (TFD).
Alternatively, a method for manufacturing a liquid crystal display panel that is a metal insulated metal (MIM) substrate is provided.

The present invention will be specifically described below. 1. Formation of Insulating Film or Black Matrix Outline A liquid crystal display panel obtained by the present invention has an active matrix substrate provided with an active matrix driving element and a display transparent electrode. As this active matrix substrate, it is possible to use a normal insulating transparent substrate provided with a display transparent electrode made of a transparent conductive thin film and a driving element such as a TFT, MIM or TFD.

Here, the active matrix substrate will be described with reference to the attached drawings. FIG. 1A shows TF as a driving element.
It is a schematic plan view of an active matrix substrate having a T circuit, and FIG. 1B is a schematic cross-sectional view taken along the line AA. FIG. 2A is a schematic plan view of an active matrix substrate having a MIM circuit as a driving element.
(B) is the BB line outline sectional view. As shown in FIG. 1, a TFT circuit is a circuit that transmits a signal from a source electrode to a drain electrode by a semiconductor switch such as α-silicon. A display ITO is connected to the drain electrode, and drive control of the liquid crystal becomes possible. Switching is performed by the gate electrode. In this way, the transistor structure is formed using the field effect. Further, as shown in FIG. 2, the MIM circuit generally transmits a signal from the source electrode through the insulating film to the drain electrode. At this time, the structure utilizes the tunnel effect of metal / insulating film (insulated) / metal. Further, although not shown, the TFD circuit is configured such that an N-type semiconductor is connected to the source electrode and a P-type semiconductor is connected to the drain electrode, and the rectification effect of the diode (an effect that current flows when the reverse potential is higher than a certain level) is used. Has become.

A specific example of the process of the present invention for manufacturing a liquid crystal display panel using such an active matrix substrate will be described with reference to FIGS. First, the active matrix driving element 1 and the display transparent electrode 2 are formed on the substrate.
An active matrix substrate 10 including and is prepared (FIG. 5A). Next, a photocurable insulating resist or an insulating black resist 3 is applied (FIG. 5B). Next, exposure is performed using the mask 4 provided with the Cr film 5 having a predetermined shape (FIG. 5C). Next, development is performed, and on the active matrix substrate other than the display transparent electrode portion 2,
An insulating film or black matrix 3 is formed. next,
Red (R), green (G), and blue (B) are separately formed on the display transparent electrode portion 2 by a micelle electrolysis method to form a film (a dye layer is laminated) to form a dye pattern (Fig. 6 (a), (b), (c)).

Materials Used and Methods of Using Them Various materials used in the steps of the present invention and methods of using the same will be described in detail below. (A) Insulating Substrate The insulating substrate used in the present invention is not particularly limited,
A glass plate or a plastic plate can be used. Specifically, as the glass plate, low expansion glass (7059 manufactured by Corning Incorporated), non-alkali glass (NA4 manufactured by HOYA)
5), quartz glass, soda lime glass and the like. Examples of the plastic plate include polycarbonate, polyolefin, polyethylene terephthalate and the like. Of these, a glass plate is preferable, and a polished product thereof is particularly preferable, but a non-polished product may be used.

(A) Display transparent electrode As the display transparent electrode, a transparent conductive thin film can be mentioned. For example, a thin film of a metal or a conductor that is baser than the oxidation potential of the ferrocene derivative of the micelle agent can be used. Specifically, a mixed oxide of indium and tin (I
TO), tin dioxide, and transparent conductive polymers. Transmittance is 80% or more (thin film only), film thickness is 1
It is preferable that the sheet resistance is 000 to 2000Å and the sheet resistance is 500Ω / □ or less. The formation method is not particularly limited,
A sputtering method, an evaporation method, a CVD method, a coating method, a pyrosol method, or the like can be used. The above-mentioned transparent conductive thin film has a common electrode lead-out portion, and at least the display portion (the area where the black matrix exists and the area where the dye pattern of the color filter exists, that is, the color liquid crystal) Refers to the display area as a display.) Formed on the entire surface. In addition, the transparent conductive thin film and the conductive thin film may be patterned in the display unit by a photolithography method or the like through a predetermined mask into, for example, a strip shape or a skewered shape. This is used for the driving method of the MIM type and STN type liquid crystal color displays. In this case, patterning of the transparent conductive thin film is necessary, but at least the electrode extraction forming step is not necessary.

(C) Insulating Resist or Insulating Black Resist The insulating resist or the insulating black resist is used as a transparent display part of the conductive portion when a dye layer is laminated on an active matrix substrate as described later. It is used to contact only the electrode part with the micelle electrolyte and to cover and protect other conductive parts. Examples of the insulating resist include photocurable resist. Examples of the photocurable resist include acrylic and methacrylic acid derivatives and copolymers (binders) thereof, or a mixture thereof. An epoxy group, a siloxane group, or a polyimide precursor may be introduced into the acrylic or methacrylic acid derivative. Examples of the photoinitiator include triazine-based, acetophonone-based, benzyne-based, benzophenone-based, thioxanthone-based and the like. Examples of the dispersant include nonionic and ionic surfactants, organic pigment derivatives, polyester-based single products, and mixtures of two or more thereof. Examples of the solvent include cellosolve-based, cyclohexanone diethylene glycol ether and ester-based single products and mixtures of two or more thereof.

The black pigments include carbon black, titanium black and aniline black, and pigments and pigment mixtures (A) prepared by mixing at least two or more of them, and black, red, blue, green, purple and cyanine. Pseudo-black pigment mixture (B), and (A) and (B), which is a mixture of at least two of magenta organic pigments (mainly pigments used in the micellar electrolytic film-forming dye layer may be used) Can be mentioned. The photocurable resist cured product (insulating black resist) containing this black dye can also be used as a black matrix.

After mixing, dispersing, and filtering the above, patterning is performed by a photolithography method. That is, the resist is applied, an oxygen barrier film (polyvinyl alcohol) is applied if necessary, exposed (using a mask for forming a black matrix), developed, and post-baked. In some cases, it is not necessary to use a mask for forming a black matrix because the back surface of the substrate is exposed (back exposure). For example, when the RGB dye layer (dye pattern) is already formed, the RGB dye layer can be used as a mask for forming a black matrix. It is preferable that the optical purity is 2.0 or more (film thickness 3.0 μm), and the insulating property has a resistance value of 10 MΩ / □ or more. As specific product names, CK-2000 (manufactured by Fuji Hunt Electronics Technology Co., Ltd.), V-259 black (manufactured by Nippon Steel Co., Ltd.) and the like mixed with other organic pigment-dispersed resists (for example, Fuji Hunt Electronics Technology Co., Ltd. Manufactured by CR, CB, CG) and the like.

2. Lamination of Dye Layers by Micelle Electrolysis Method (Formation of Dye Pattern) Outline In the present invention, an active matrix substrate on which an insulating film or a black matrix is formed is dipped in a micelle electrolytic solution to drive only an active matrix driving element and display transparency. A potential of 0.1 to 1.5 V is applied to the electrode portion, electrolysis is performed for each color of RGB, and dye layers of each color are separately laminated on the display transparent electrode portion to form a dye pattern. Then, post-treatment is performed to form a protective layer. Also,
If necessary, a liquid crystal driving transparent conductive thin film may be further laminated.

Materials Used and Method of Using the Same (A) Micelle Electrolyte Solution The micelle electrolysis (dispersion) solution used in the present invention is R
A GB pigment or transparent particles and a surfactant such as a ferrocene derivative surfactant may be mixed and dispersed in an aqueous medium. Where red (R)
Examples of the pigment include perylene-based pigments, lake pigments, azo-based pigments, quinacridone-based pigments, anthraquinone-based pigments, anthracene-based pigments, isoindoline-based pigments and the like, and a mixture of at least two or more thereof. Green (G) pigments include halogen polysubstituted phthalocyanine pigments, halogen polysubstituted copper phthalocyanine pigments, azo pigments, disazo pigments, triphenylmethane basic dyes, isoindoline pigments, isoindolinone pigments, and the like. And a mixture of at least two or more. Examples of the blue (B) pigment include copper phthalocyanine-based pigments, indanthrone-based pigments, indophenol-based pigments, cyanine-based pigments, dioxazine-based pigments, and the like, and a mixture of at least two or more thereof. Examples of transparent particles include titania, alumina, silica, zinc oxide, hydrophobic titania, polysiloxane, and the like. The above pigment is formed into a film by the micelle electrolysis method.

As the conditions for the micelle electrolysis method, as described above, the dye (pigment) is dispersed in an aqueous medium using a surfactant (micellating agent) consisting of a ferrocene derivative to prepare a micelle dispersion. To do. Examples of the aqueous medium used in this case include various media such as water, a mixed solution of water and alcohol, a mixed solution of water and acetone. The above can be mentioned as typical examples of the micellizing agent (ferrocene derivative surfactant).

[0018]

[Chemical 1]

Further, as the ferrocene derivative, in addition to this, International Publication WO 89/0193, JP-A 1-4
It is possible to use those manufactured by the methods described in JP-A-5370, JP-A-1-226894, JP-A-2-83387, JP-A-2-250892, and the like. In the method of the present invention, one kind of the ferrocene derivative may be used as a surfactant (micelling agent), or two or more kinds thereof may be combined, and if desired, the ferrocene derivative and another surface active agent may be used. You may use it combining with an agent. Other surfactants include nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene fatty acid esters, polyoxyethylene alkylphenyl ethers, polyoxyethylene polyoxypropylene alkyl ethers, alkyl sulfates, and polyoxyethylenes. Examples thereof include cationic and anionic surfactants such as ethylene alkyl ether sulfate, alkyl trimethyl ammonium chloride, and fatty acid diethylaminoethylamide.

The micelle dispersion is prepared, for example, as follows. The ferrocene derivative, the other surfactant optionally used and the desired dye (pigment) are put in an aqueous medium and sufficiently stirred by a mechanical homogenizer, an ultrasonic homogenizer, a ball mill, a sand mill, a stirrer and the like. By this operation, the pigment acts as a surfactant to uniformly disperse or micelle in an aqueous medium,
It becomes a dispersion or micellar solution. The equilibrium concentration is 0.1
It is selected in the range of ˜2.8 mmol / liter. The concentration of the micellizing agent at this time is not particularly limited, but usually the total concentration of the ferrocene derivative and other surfactant optionally used is not less than the critical micelle concentration, preferably 0.1 mmol / liter to It is selected in the range of 1 mol / liter. On the other hand, the pigment concentration is usually selected in the range of 1 to 500 g / liter. In addition, a supporting salt (supporting electrolyte) can be added as necessary in order to adjust the electric conductivity of the aqueous medium. The amount of the supporting salt added may be in the range that does not prevent precipitation of the dispersed pigment, and is usually selected in the range of 0.05 to 10 mol / liter.

Electrolysis can be carried out without adding the supporting salt, but in this case, a highly pure thin film (dye layer) containing no supporting salt can be obtained. When a supporting salt is used, the type of the supporting salt is not particularly limited as long as it can control the electric conductivity of the aqueous medium without hindering the formation of micelles and the deposition of the pigment on the electrode.

Specifically, sulfates (lithium, potassium, sodium, etc.) which are widely used as supporting salts are generally used.
Rubidium, aluminum salts, etc., Acetates (lithium, potassium, sodium, rubidium, beryllium,
(Salts of magnesium, calcium, strontium, barium, aluminum, etc.), ammonium salts, and the like are preferable, for example, LiBr, KCl, Na ₂ S.
O _4, Li ₂ SO _4, and the like (NH ₄₎ BF _4.

In this way, three types of micelle dispersions in which the red dye (pigment), the green dye (pigment) and the blue dye (pigment) are dispersed are prepared. The micellar dispersion of mixed pigments may be prepared by adding the pigment to be mixed in an aqueous medium together with a micelle-forming agent once and dispersing it, or micellar a single pigment to be mixed in an aqueous medium. It may be prepared by adding together with the agent and mixing the respective micelle dispersions obtained by dispersion.

The micelle electrolysis film formation is performed, for example, as follows. The active matrix substrate on which the above-mentioned insulating film or black matrix is formed is inserted into any one of the above-mentioned micelle dispersions, and micelle electrolysis is performed by energizing the active matrix substrate, and a desired transparent conductive thin film on this substrate is formed. For example, the dye layer is formed in the shape of dots or stripes.

The electrolysis conditions may be appropriately selected according to various situations, but the liquid temperature is usually 0 to 90 ° C., preferably 20 to 70.
The temperature can be selected in the range of 0 ° C, and the voltage can be selected in the range of 0.03 to 1V, preferably 0.1 to 0.9V.
The current density is usually 10 mA / cm ² or less, and preferably 50 to 300 μA / cm ² can be selected.
When this electrolytic treatment is performed, the reaction according to the principle of the micelle electrolysis method proceeds. Focusing on the behavior of the Fe ion of the ferrocene derivative, the Fe ²⁺ of the ferrocene is F at the anode.
It becomes e ³⁺ , the micelles collapse, and the pigment particles are deposited on the anode (transparent conductive thin film). On the other hand, at the cathode, Fe ³⁺ oxidized at the anode is returned to the original micelle when it is reduced to Fe ²⁺ , so that the film forming operation can be repeated with the same solution.

The film thickness and transmittance of each dye layer are preferably set as follows. Red (R) has a film thickness of 0.5-
1.5 μm (transmittance 60% or more / 610 nm), green (G) has a film thickness of 0.5 to 1.5 μm (transmittance 60%
> / 545 nm) and blue (B) have a film thickness of 0.2 to
1.5 μm (transmittance of 60% or more / 460 nm). The transmittance depends on the air reference. Next, the dye layer formed by the micelle electrolysis treatment may be subjected to a post-treatment such as washing with a conductivity adjusting solution, washing with pure water, and electrolytic washing, followed by air-drying at room temperature or hot-water drying. Depending on 20
You may heat-process in the temperature range to 0 degreeC.

(B) Protective film The protective film can be formed, for example, by using the above-mentioned transparent photo-curable resist and transparent thermosetting resin agent as needed. When viewed from above the film surface of the color filter, patterning is performed by a photolithography method from the region where the black matrix is present to the entire surface area of the substrate to be thermally cured, and the entire surface area of the substrate is thermally cured without patterning. Either may be used (this photolithography method uses a mask for a protective film, except that
The same as in the case of the black dye-containing photocurable resist described above).

As the transparent thermosetting resin agent, a mixture of acryl and methacrylic acid derivative and its copolymer (binder), and epoxy group, siloxane group and polyimide precursor are introduced into the acryl and methacrylic acid derivative. I can list things. In this case, an alignment film material may be used. Examples of the solvent include cellosolve-based, cyclohexanone, diethylene glycol ether and ester-based single products and a mixture of two or more thereof.

After the above components are mixed and filtered, they are applied as a resist and cured by heat treatment. At this time, the coating is performed on at least the entire surface of the display portion with a roll coater or a spin coater, but it is possible to selectively print only the display portion with an offset printing machine to form the protective film. As a specific example, as the trade name, Optoma-SS726
5, JFR-8484, JSS-819, JSS715
(Japan Synthetic Rubber), OS-808 (Nagase Sangyo), LC2
001 (Sanyo Kasei) etc. can be mentioned.

Regarding the film thickness and the transmittance of the transparent thermosetting resin cured product, the film thickness is 0.1 to 4.0 μm and the transmittance is 90% or more /
It is preferably 460 nm. The transmittance depends on the air reference.

The film thickness can be controlled according to the film thickness of each dye layer by the viscosity of the transparent thermosetting resin agent, the rotation speed of spin coating, and the like.

(C) Liquid crystal driving transparent conductive thin film As the liquid crystal driving transparent conductive thin film, the same material and forming method as those of the transparent conductive thin film can be used.

[0033]

EXAMPLES The present invention will be described in more detail below with reference to examples. Production Examples 1 to 8 Dispersion Liquid Preparation Step Determination of Adsorption Amount of Surfactant To determine the amount of FPEG adsorbed to 15.65 g of perylene red in an aqueous solution, with the addition amount of perylene red being 15.65 g, 500 ml of pure water was determined. 15.65 g of perylene red in water, FPEG concentration of 2.0 mmol, Li
Br 10.4 g (0.1 mol) was added to each, and 1 liter
Pure water is further added so that Stir with a stirrer for 3 days to equilibrate well and let stand for 1 day. Then, it is centrifuged at 50,000 rpm to separate only the pigment. The supernatant liquid is subjected to metallic iron element analysis using ICP to measure the amount of adsorption. As a result, the amount of FPEG adsorbed on 15.65 g of perylene red (Wako Pure Chemical Industries, Ltd.) was 1.05 mmol, and the equilibrium concentration of the ferrocene derivative micelle agent FPEG was arbitrarily selected. FPE to obtain 0.46 mmol / l
G was added at a total of 1.51 mmol / l. In this way, the addition amount was determined. Preparation of Micelle Dispersion Liquid with Adjusted Equilibrium Concentration Next, in 1 l of pure water, 1.51 mmol (1.416) of ferrocene derivative micelle agent FPEG (Dojindo Kagaku) was actually added.
g), 0.1 mol (10.4) of LiBr (Wako Pure Chemical Industries)
g) and 15.65 g of perylene red (Wako Pure Chemical Industries, Ltd.) were added, and the micelle-forming agent FPEG was added in a total amount of 1.51 mmol / l, and the mixture was dispersed for 30 minutes with an ultrasonic homogenizer to obtain a dispersion liquid. Similarly, the pigments shown in Table 1 were prepared under the conditions shown in Table 1 to prepare R, G, and B pigment dispersions of Production Examples 2 to 8. LiBr (Wako Pure Chemical Industries) 0.1 mol /
1 (10.4 g) was added to give a concentration.

[0034]

[Table 1]

Example 1 Formation of transparent resin (insulating film) A photosensitive resist CT manufactured by Fuji Hunt Electronics Technology Co., Ltd. was used as a resist agent. TF shown in FIG.
A substrate provided with a T circuit was rotated at 10 rpm, and 30 cc of this resist agent was sprayed thereon. Next, the rotation speed of spin coating was set to 700 rpm, and a film was uniformly formed on the substrate. This substrate was prebaked at 80 ° C. for 15 minutes. Then, exposure was performed using a mask of a black matrix design (ITO display portion of TFT) while aligning with a high-pressure mercury lamp 2 kW aligner having an alignment function. A high-pressure mercury lamp of 2 kW was used as a light source. After taking a proximity gap of 70 μm and exposing it to 120 mJ / cm ² , Fuji Hunt CD (developer) was diluted with pure water by 4 times, and then 3 times.
It was developed for 0 seconds. Furthermore, rinse with pure water, 200 ° C, 1
It was post-baked for 00 minutes.

As the mixed dispersion micelle solution in the mixing / dispersion step R, the dispersion prepared in Preparation Example 1 and the dispersion prepared in Preparation Example 5 were dispersed with an ultrasonic homogenizer for 30 minutes, and then at a ratio of 9: 1. The respective liquids were mixed, and the mixed liquid was further dispersed with an ultrasonic homogenizer for 30 minutes. As the mixed dispersion micelle solution of G, the dispersion prepared in Preparation Example 4 and the dispersion prepared in Preparation Example 5 were dispersed with an ultrasonic homogenizer for 30 minutes, and then the respective solutions were mixed at a ratio of 6: 4. Then, the mixed solution was dispersed by an ultrasonic homogenizer for 30 minutes. B
As the mixed dispersion micelle solution of, the dispersion prepared in Production Example 7 and the dispersion prepared in Production Example 8 were dispersed for 30 minutes with an ultrasonic homogenizer, and then the respective solutions were mixed at a ratio of 7: 3, Further, the mixed solution was dispersed for 30 minutes with an ultrasonic homogenizer to obtain a mixed dispersed micelle solution of RGB.

Dye film manufacturing step The substrate provided with the TFT circuit was inserted into the R micelle solution, 25 V was applied to the gate of the R display pixel section, the gate was opened, and 0.8 V was applied as a signal potential, Constant-potential electrolysis was performed for 15 minutes to obtain a thin film of the color filter R only on the display part. Then, after washing with pure water, prebaking (120 ° C. × 10 minutes) was performed in an oven. Next, this substrate is
Of the above-mentioned micelle solution, 25V is similarly applied to the gate of the G display section, the gate is opened, and the signal potential is 0.4
V was applied and constant potential electrolysis was performed for 18 minutes to obtain a thin film of the color filter RG. After film formation, post-treatment was performed under the same conditions as the film formation of R. Finally, this substrate was inserted into the micelle solution of B, and similarly 25 V was applied to the gate of the B display section,
Open the gate, apply 0.7V as the signal potential, and
Constant-potential electrolysis was performed for 0 minutes to obtain a thin film of color filters RGB. After film formation, post-treatment was performed under the same conditions as the film formation of R. Thus, an RGB color filter dye thin film was obtained.

Evaluation Results The thin film was evaluated as follows. The level difference (difference between unevenness) of each pixel of RGB was measured with a Dick Tack (contact type film thickness meter) at a scanning distance of 10 mm (10 mm scan), and as a result, the level difference between colors was within 0.26 μm. The transmittance of the thin film was measured using an Otsuka Electronics MCPD spectrophotometer. The results are shown in Fig. 3. As shown in the measurement results, the spectral characteristics (RGB transmittance%) were also very excellent, and a color filter having a uniform film thickness was manufactured. Further, as a result of visual inspection, it was possible to obtain a good color filter without problems such as generation of coarse particles, color separation, and peeling of a thin film.

Production of Color Liquid Crystal Display Active matrix with color filter (TF)
T) The surface of the substrate was coated with a polyamic acid resin monomer using a dispenser. At this time, the substrate is 10 rpm
It was slowly rotated at the number of revolutions of, and was applied so as not to cause spots on the entire substrate. Further, it was rotated at 1,200 rpm for 1 minute to obtain a uniform thin film. Then, the polyamic acid resin monomer was cured at 180 ° C. for 1 hour to form a polyimide resin, which was then rubbed for orientation. After patterning the black matrix of Cr, the counter electrode is 100Ω / □
Polyamic acid resin monomer is spin-coated on a glass substrate on which ITO is patterned and vapor-deposited, and cured at 180 ° C. for 1 hour to form a polyimide resin, which is rubbed, and then glass beads are put between the color filter substrate and the adhesive. And sealed, and TN liquid crystal was vacuum-injected to complete the panel. The FPC was connected to a take-out electrode equipped with a driver IC, the polarizing plates were adhered to both surfaces, and then the active matrix (TFT) was activated to confirm good liquid crystal driving.

Example 2 Black Matrix Manufacturing Process As a black matrix forming resist agent, a color mosaic CK manufactured by Fuji Hunt Electronics Technology Co., Ltd.
The same CR, CG, and CB were mixed in 3: 1: 1: 1 parts by weight, respectively. The substrate having the MIM circuit shown in FIG. 2 is rotated at 10 rpm, and the resist agent 3 is applied on the substrate.
It was sprayed with 0 cc. Next, the spin speed of the spin coat is 700r.
pm, and a uniform film was formed on the substrate. This substrate is 80 ℃
It was prebaked for 15 minutes. And high pressure mercury lamp 2kW
While aligning with the exposure machine with the alignment function of, the design of Black Mat Cooks (IT of MIM
Exposure was performed using the mask of the display part). A high-pressure mercury lamp of 2 kW was used as a light source. A proximity gap of 70 μm was taken, 120 mJ / cm ² exposure was performed, and then development was performed with an alkaline developer. Then, Fuji Hunt CK (developing solution) was diluted with pure water 4 times and developed for 30 seconds. Further, it was rinsed with pure water and post-baked at 200 ° C. for 100 minutes.

As the mixed dispersion micelle solution in the mixing and dispersion step R, the dispersion prepared in Preparation Example 2 and the dispersion prepared in Preparation Example 6 were dispersed with an ultrasonic homogenizer for 30 minutes, respectively, and then at a ratio of 9: 1. The respective liquids were mixed, and the mixed liquid was further dispersed with an ultrasonic homogenizer for 30 minutes. As the mixed dispersion micelle solution of G, the dispersion prepared in Preparation Example 3 and the dispersion prepared in Preparation Example 6 were dispersed with an ultrasonic homogenizer for 30 minutes, and then mixed at a ratio of 7: 3. Then, the mixed solution was dispersed by an ultrasonic homogenizer for 30 minutes. B
As the mixed dispersion micelle solution of, the dispersion prepared in Production Example 7 and the dispersion prepared in Production Example 8 were dispersed for 30 minutes by an ultrasonic homogenizer, and then the respective solutions were mixed at a ratio of 8: 2, Further, the mixed solution was dispersed for 30 minutes with an ultrasonic homogenizer to obtain a mixed dispersed micelle solution of RGB.

Dye film manufacturing step The MIM substrate was inserted into the R micelle solution, 0.5 V was applied as the signal potential of the R display pixel section, and constant potential electrolysis was performed for 20 minutes to remove the thin film of the color filter R. Obtained only on the display. Then, after washing with pure water, prebaking (120 ° C. × 10 minutes) was performed in an oven. Next, this substrate is
Was inserted into the above micelle solution, and similarly, the potential of the G display portion was subjected to constant potential electrolysis at 0.5 V for 15 minutes to obtain a thin film of the color filter RG. After film formation, post-treatment was performed under the same conditions as the film formation of R. Finally, this substrate was inserted into the B micelle solution, and similarly, as the signal potential of the B display section,
Constant-voltage electrolysis was performed at 0.5 V for 12 minutes to obtain a thin film of color filters RGB. After film formation, post-treatment was performed under the same conditions as the film formation of R. Thus, an RGB color filter dye thin film was obtained.

Formation of Protective Film The dye thin film substrate was set on a spin coater, and JSS-7265 (JSR) was applied as a flat film agent using a dispenser. At this time, the substrate was slowly rotated at a rotation speed of 10 rpm, and coating was performed so that spots did not occur on the entire substrate. Further, it was rotated at 1,200 rpm for 1 minute to obtain a uniform thin film. Then, it was baked at 220 ° C. for 1 hour to be cured. Thus, the protective film was formed.

Evaluation Results The thin film was evaluated as follows. The step difference (difference between unevenness) of each pixel of RGB was measured with a Dick Tack (contact type film thickness meter) at a scanning distance of 10 mm (10 mm scan), and as a result, the step difference between colors was within 0.18 μm. The transmittance of the thin film was measured using an Otsuka Electronics MCPD spectrophotometer. The results are shown in Fig. 4. As shown in the measurement results, the spectral characteristics (RGB transmittance%) were also very excellent, and a color filter having a uniform film thickness was manufactured. Further, as a result of visual inspection, it was possible to obtain a good color filter without problems such as generation of coarse particles, color separation, and peeling of a thin film.

Production of Color Liquid Crystal Display The active matrix with color filter (MI
M) A polyamic acid resin monomer was applied to the surface of the substrate using a dispenser. At this time, the substrate is 10 rpm
It was slowly rotated at the number of revolutions of, and was applied so as not to cause spots on the entire substrate. Further, it was rotated at 1,200 rpm for 1 minute to obtain a uniform thin film. Then, the polyamic acid resin monomer was cured at 180 ° C. for 1 hour to form a polyimide resin, which was then rubbed for orientation. Counter electrode is 10Ω / □
ITO is laminated and a glass substrate patterned on the stripe is spin-coated with a polyamic acid resin monomer and cured at 180 ° C. for 1 hour to form a polyimide resin,
After rubbing, glass beads were placed between the color filter substrate and the color filter substrate, sealed with an adhesive, and TN liquid crystal was vacuum-injected to complete a panel. After connecting the extraction electrode equipped with the driver IC to the FPC and adhering the polarizing plates to both sides, activate the active matrix (MIM),
Good liquid crystal driving was confirmed.

[0046]

According to the present invention, the liquid crystal display panel can be made high-definition, the image quality of a color liquid crystal display or the like can be improved, and it is not necessary to use a method having a large number of steps such as vacuum injection. Since it does not exist, a simple and efficient liquid crystal display panel can be manufactured. In addition, it becomes possible to blacken the white defects of the active matrix substrate to make them inconspicuous. That is, since the potential is always applied to the white defect portion of the normally black active matrix (TFT, MIM) regardless of whether or not it is driven, the liquid crystal remains in a white state as it is driven. By utilizing the property that a potential is applied at all times of this driving element, and repeating the three colors of RGB and film formation according to the present invention, the white defect element has a RGB defect even though no pixel is selected. Since the film is formed three times, it becomes black and can be made inconspicuous as a defect. On the other hand, a normal element is formed with only one color of RGB by one pixel as described above. Thus, at the same time when the RGB color filter is manufactured, white defects in the display portion of the active matrix element can be blackened to make the defects inconspicuous.

[Brief description of drawings]

FIG. 1a is a schematic plan view showing the structure of a TFT circuit, and FIG. 1b is a schematic sectional view taken along the line AA.

FIG. 2a is a schematic plan view showing the configuration of the MIM circuit, and FIG. 2b is a schematic sectional view taken along line BB thereof.

FIG. 3 is an explanatory diagram showing spectral characteristics (transmittance) of an embodiment of the liquid crystal display panel of the present invention.

FIG. 4 is an explanatory diagram showing spectral characteristics (transmittance) of another embodiment of the liquid crystal display panel of the present invention.

FIG. 5 is a schematic cross-sectional view showing a manufacturing process of the liquid crystal display panel of the present invention.

FIG. 6 is a schematic cross-sectional view showing a manufacturing process of a liquid crystal display panel of the present invention.

[Explanation of symbols]

1 ... Active matrix drive element 2 ... Display transparent electrode (ITO for display) 3 ... Insulating resist or insulating black resist (insulating film or black matrix) 4 ... Mask 5 ... Chrome film on mask 6 ... Micelle electrolysis method red film (R) Dye layer 7 ... Micelle electrolysis film-forming red (G) dye layer 8 ... Micelle electrolysis film-forming red (B) dye layer 10 ... Active matrix substrate

Claims (3)

[Claims] 1. An active matrix substrate having an active matrix driving element and a display transparent electrode, and a method of manufacturing a liquid crystal display panel having a color filter formed on the substrate, wherein an insulating resist or an insulating material is provided on the active matrix substrate. Black resist is applied, and then exposed and developed to form an insulating film or a black matrix on the active matrix substrate other than the display transparent electrode portion, and this substrate is immersed in a micelle electrolytic solution to form an active matrix. Only the driving element is driven, a potential of 0.1 to 1.5 V is applied to the display transparent electrode portion, electrolysis is performed for each color of RGB, and the dye layer of each color is separately laminated on the display transparent electrode portion. A method for manufacturing a liquid crystal display panel, comprising: forming a dye pattern. 2. The active matrix driving element has a part where at least a part thereof may have a white defect in a display state when the element is driven, and the dye layers are laminated to form a dye pattern. When performing, R is applied to the active matrix driving element including the white defect portion.
Apply the electrolytic potential corresponding to each color of GB for each color,
The method for manufacturing a liquid crystal display panel according to claim 1, wherein the dye layers of all colors of RGB are laminated on the same portion to form a black defect. 3. The active matrix substrate provided with the active matrix driving element is a thin film transistor (TFT), a thin film diode (TFD) or a metal insulated metal (MIM) substrate. A method for manufacturing the liquid crystal display panel described.