JPH0629882B2 - Multilayer film mirror - Google Patents
Multilayer film mirrorInfo
- Publication number
- JPH0629882B2 JPH0629882B2 JP61085661A JP8566186A JPH0629882B2 JP H0629882 B2 JPH0629882 B2 JP H0629882B2 JP 61085661 A JP61085661 A JP 61085661A JP 8566186 A JP8566186 A JP 8566186A JP H0629882 B2 JPH0629882 B2 JP H0629882B2
- Authority
- JP
- Japan
- Prior art keywords
- multilayer film
- film
- zns
- sio
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010408 film Substances 0.000 claims description 42
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 7
- 230000001681 protective effect Effects 0.000 claims description 6
- 238000010304 firing Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000012808 vapor phase Substances 0.000 claims 1
- 238000011156 evaluation Methods 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Optical Elements Other Than Lenses (AREA)
- Optical Filters (AREA)
- Projection Apparatus (AREA)
Description
【発明の詳細な説明】 〔発明の目的〕 （産業上の利用分野） 本発明は投光照明等に使用される多層膜反射鏡、特に冷
光鏡を基体とし耐熱性、耐湿性にすぐれた多層膜反射鏡
に関する。DETAILED DESCRIPTION OF THE INVENTION Object of the Invention (Industrial field of application) The present invention is a multilayer film reflecting mirror used for floodlighting and the like, particularly a multilayer film having a cold light mirror as a substrate and having excellent heat resistance and moisture resistance. Membrane reflector.
（従来の技術） 冷光鏡を基体とする多層膜反射鏡は、投映器、店舗用照
明、医療用照明等の光源に多く使用されているが、可視
光をできるだけ反射し、長波長の赤外域を透過させて、
照明された物体を熱線によって加熱することを少なく
し、かつ光源からの熱線が多層膜を通過する際には、吸
収によって基板が加熱されない特長をもっている。この
多層膜反射鏡は、反射基板上に高屈折率材料の薄膜と低
屈折率材料の薄膜とを交互に積層して多層膜が形成さ
れ、積層される物質の屈折率の比が大きければそれだけ
高い反射率と広い反射帯を有するものである。一般にZn
SとMgF2との薄膜を交互に積層させたZnS-MgF2交互層、
またはZnSとSiO2との薄膜を交互に積層させたZnS-SiO2
交互層が反射鏡の多層膜として採用されている。(Prior Art) A multi-layer film reflecting mirror based on a cold-light mirror is often used as a light source for projectors, store lighting, medical lighting, etc., but it reflects visible light as much as possible and has a long wavelength infrared region. Through
The feature is that the illuminated object is less heated by the heat ray, and when the heat ray from the light source passes through the multilayer film, the substrate is not heated by absorption. This multilayer film reflecting mirror is formed by alternately stacking thin films of a high refractive index material and a thin film of a low refractive index material on a reflecting substrate to form a multilayer film, and if the ratio of the refractive index of the stacked substances is large, it is that much. It has a high reflectance and a wide reflection band. Zn in general
ZnS-MgF 2 alternating layers of alternating thin films of S and MgF 2 ,
Or ZnS-SiO 2 with ZnS and a thin film of SiO 2 are stacked alternately
Alternating layers are adopted as the multilayer film of the reflecting mirror.
ZnS-MgF2交互層またはZnS-SiO2交互層を被着した多層膜
反射鏡について、ランプ点灯時および高温多湿の雰囲気
に放置した時の膜の剥離発生時間を１表に示す。ランプ
点灯による熱負荷は300℃および350℃であり、高温多湿
の雰囲気は温度50℃、湿度90％の雰囲気に反射鏡を放置
した場合である。Table 1 shows the film peeling occurrence time when the lamp was turned on and when the film was left in a high temperature and high humidity atmosphere for the multilayer film mirror having the ZnS-MgF 2 alternating layer or the ZnS-SiO 2 alternating layer deposited thereon. The heat load due to lamp lighting is 300 ° C and 350 ° C, and the high temperature and high humidity atmosphere is the case where the reflecting mirror is left in an atmosphere of temperature 50 ° C and humidity 90%.
ZnS-MgF2系の多層膜は、耐湿性はすぐれているが耐熱性
に劣るため、比較的熱負荷が低く、長寿命である光源た
とえば低出力・長寿命型ハロゲンランプに適用されてい
る。またZnS-SiO2系の多層膜は、耐熱性はすぐれている
が耐湿性に劣るため、熱負荷が高く、短寿命である光源
たとえば高出力・短寿命型ハロゲンランプに適用されて
いる。 The ZnS-MgF 2 -based multilayer film has excellent moisture resistance but is inferior in heat resistance, so that it is applied to a light source having a relatively low heat load and a long life, such as a halogen lamp having a low output and a long life. Further, the ZnS-SiO 2 -based multilayer film has excellent heat resistance but is inferior in moisture resistance, so that it is applied to a light source having a high heat load and a short life, for example, a high-power / short-life type halogen lamp.
（発明が解決しようとする問題点） 従来の多層膜反射鏡は、その多層膜が耐熱性、耐湿性の
いずれかの特性で欠点を有するため、光源の性能に応じ
て適当するものを選択して使用しなければならなかっ
た。しかるに、光源の高出力化、長寿命化が進むにつれ
て、ZnS-MgF2系およびZnS-SiO2系の多層膜について、そ
の耐熱性、耐湿性を強化することが要望されるようにな
った。(Problems to be Solved by the Invention) In a conventional multilayer-film reflective mirror, since the multilayer film has a defect in either heat resistance or moisture resistance, an appropriate one should be selected according to the performance of the light source. Had to use. However, as the output of the light source has been increased and the life of the light source has been extended, it has been required to enhance the heat resistance and moisture resistance of the ZnS-MgF 2 -based and ZnS-SiO 2 -based multilayer films.
本発明は、上記事情を考慮してなされたもので、反射面
にZnS-SiO2系の多層膜を積層し、その上面に保護膜を被
着した後焼成処理することにより、耐熱性および耐湿性
にすぐれた多層膜反射鏡を提供することを目的とする。The present invention has been made in consideration of the above circumstances, and heat resistance and moisture resistance are obtained by laminating a multilayer film of ZnS-SiO 2 on the reflecting surface and applying a protective film on the upper surface of the multilayer film, followed by baking treatment. It is an object of the present invention to provide a multilayer film reflecting mirror having excellent properties.
（問題点を解決するための手段と作用） 本発明は、反射基板上にZnSとSiO2との薄膜を交互に積
層させ、このZnS-SiO2交互層の上面に保護膜を被着させ
た後、450〜520℃の温度で焼成処理した多層膜反射鏡で
ある。この多層膜反射鏡について、焼成温度が多層膜の
耐熱性および耐湿性におよぼす影響を第２表に示す。表
中、耐熱性は温度３５０℃の電気炉中に放置した場合、
また耐湿性は温度50℃、湿度90％の雰囲気中に放置した
場合の膜の剥離発生時間で示してある。(Means and Actions for Solving Problems) In the present invention, thin films of ZnS and SiO 2 are alternately laminated on a reflective substrate, and a protective film is deposited on the upper surface of this ZnS-SiO 2 alternating layer. After that, it is a multilayer reflecting mirror that has been baked at a temperature of 450 to 520 ° C. Table 2 shows the influence of the firing temperature on the heat resistance and moisture resistance of the multilayer film reflecting mirror. In the table, the heat resistance is shown when left in an electric furnace at a temperature of 350 ° C.
Moisture resistance is indicated by the film peeling occurrence time when the film is left in an atmosphere of a temperature of 50 ° C. and a humidity of 90%.
第２表から明らかなように、530℃以上で焼成処理した
ものは、加熱によって膜が劣化し、膜と基板との適正な
付着応力がくずれて早期に剥離が発生した。450℃以上
の焼成温度ではSiO2層がち密に構成され耐湿性が向上し
ているが、440℃以下で焼成処理したものは、ZnS-MgF2
系の多層膜に比べ耐湿性が劣っている。450〜520℃の温
度域で焼成処理したものは、耐熱性、耐湿性ともに要件
を満している。すなわち、適当な温度で焼成処理するこ
とにより、耐熱性を損うことなく耐湿性を改善すること
ができるものである。 As is clear from Table 2, in the case where the film was baked at 530 ° C. or higher, the film was deteriorated by heating, and the appropriate adhesive stress between the film and the substrate was broken, and peeling occurred early. At a firing temperature of 450 ° C or higher, the SiO 2 layer is densely formed and has improved moisture resistance, but the one fired at 440 ° C or lower is ZnS-MgF 2
Moisture resistance is inferior to that of multi-layered films. Those that have been fired in the temperature range of 450 to 520 ° C meet the requirements for both heat resistance and moisture resistance. That is, the moisture resistance can be improved without impairing the heat resistance by performing the baking treatment at an appropriate temperature.
（実施例） 本発明の詳細を図示の実施例により説明する。(Examples) Details of the present invention will be described with reference to illustrated examples.
(1)は反射体、たとえば硬質ガラスからなるハロゲンラ
ンプ用反射鏡であり、その一面を拡開させた回転放物状
の凹面(2)を形成している。(3)は凹面(2)の中心に位置
するように装着された光源、たとえばハロゲンランプで
ある。(4)は凹面(2)に被着された多層膜で、ZnS-SiO2構
成の22層からなる光学膜厚1/4λの交互層（λ1〜13＝60
0nm、λ14〜22＝450nm）である。すなわち、ZnSからな
る高屈折率材料を(H)とし、SiO2からなる低屈折率材料
を(L)とした場合、この(H)と(L)とを交互に６回計12層
被着し、さらに(H)を１層付加して計13層とし、さらに
(L)と(H)とを交互に４回計８層を積層被着し、その最上
層に保護膜として(L)を２層被着させたものである。こ
の保護膜の存在により、その後の焼成処理によってもZn
S層が酸化して白濁したり、劣化して耐久性を損なった
りすることが防止される。そして、これら被膜の形成は
すべて真空蒸着によって行なわれる。蒸着条件は真空度
５×10-4〜１×10-4Torr、基板温度150〜200℃、蒸発源
エレクトロビームである。Reference numeral (1) is a reflector, for example, a reflecting mirror for a halogen lamp, which is made of hard glass, and has a concave surface (2) of a paraboloid of revolution formed by expanding one surface thereof. Reference numeral (3) is a light source, such as a halogen lamp, mounted so as to be located at the center of the concave surface (2). (4) is a multilayer film that is deposited on the concave surface (2), alternating layers having an optical thickness of 1 / 4.lamda consisting 22 layers of ZnS-SiO 2 configuration (lambda 1 to 13 = 60
0 nm, λ 14-22 = 450 nm). That is, when the high refractive index material made of ZnS is (H) and the low refractive index material made of SiO 2 is (L), this (H) and (L) are alternately deposited six times for a total of 12 layers. Then, one layer of (H) was added to make a total of 13 layers.
(L) and (H) are alternately laminated four times for a total of eight layers, and two layers of (L) are applied as a protective film on the uppermost layer. Due to the presence of this protective film, the Zn
It is possible to prevent the S layer from being oxidized and opaque, or from being deteriorated and impairing the durability. The formation of these coatings is all performed by vacuum evaporation. The vapor deposition conditions are a vacuum degree of 5 × 10 −4 to 1 × 10 −4 Torr, a substrate temperature of 150 to 200 ° C., and an evaporation source electron beam.
このように構成された多層膜反射鏡において、350℃か
ら600℃まで10℃毎の温度でそれぞれ１時間の焼成処理
を行なったものについて、耐熱性および耐湿性の評価を
行なった。この評価には次の方式を採用し、評価結果を
第３表に示す。The multilayer film reflecting mirror thus configured was evaluated for heat resistance and humidity resistance after being subjected to a baking treatment at a temperature of 10 ° C. from 350 ° C. to 600 ° C. for 1 hour. The following method was adopted for this evaluation, and the evaluation results are shown in Table 3.
耐熱性……温度350℃の電気炉中に放置し、膜の剥離発
生時間を調査する。Heat resistance …… Leave it in an electric furnace at a temperature of 350 ° C and investigate the film peeling occurrence time.
耐湿性……温度50℃、湿度90％の雰囲気中に放置し、膜
の剥離発生時間を調査する。Moisture resistance: Leave the film in an atmosphere with a temperature of 50 ° C and a humidity of 90%, and investigate the film peeling occurrence time.
第３表において、450〜520℃の温度で焼成処理したもの
は、耐熱性および耐湿性ともにすぐれていることが認め
られる。 In Table 3, it can be seen that those heat-treated at a temperature of 450 to 520 ° C have excellent heat resistance and moisture resistance.
次に、焼成時間による多層膜の耐熱性および耐湿性の評
価結果を第４表に示す。評価方法は第３表の場合と同様
である。Next, Table 4 shows the evaluation results of the heat resistance and moisture resistance of the multilayer film depending on the firing time. The evaluation method is the same as in Table 3.
第４表から多層膜の耐熱性および耐湿性は、その焼成時
間の長短によって影響されないことが確認された。 From Table 4, it was confirmed that the heat resistance and moisture resistance of the multilayer film were not affected by the length of the firing time.
以上のように本発明は、反射基板上にZnSとSiO2との薄
膜を交互に積層させ、このZnS-SiO2交互層の上面に保護
膜を被着させた後、450520℃の温度で焼成処理した多層
膜反射鏡であり、ZnS-SiO2系の多層膜の耐熱性を損うこ
となく耐湿性を向上させることができたもので、高出
力、長寿命の光源に十分適合し得るものである。また、
高温多湿の悪条件における長期間の保管も可能となっ
た。As described above, the present invention alternately stacks thin films of ZnS and SiO 2 on a reflective substrate, deposits a protective film on the upper surface of this ZnS-SiO 2 alternating layer, and then fires at a temperature of 450520 ° C. A treated multilayer reflector that has improved moisture resistance without impairing the heat resistance of the ZnS-SiO 2 -based multilayer film, and is sufficiently compatible with a high-power, long-life light source. Is. Also,
It has become possible to store it for a long period of time under adverse conditions of high temperature and high humidity.
図面は本 の実施例を示す断面図である。 １……反射体、２……凹面、３……光源、４……多層
膜。The drawings are sectional views showing an embodiment of the present invention. 1 ... Reflector, 2 ... Concave surface, 3 ... Light source, 4 ... Multilayer film.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｇ０２Ｂ 5/28 7348−2Ｋ Ｇ０３Ｂ 21/14 Ａ 7316−2Ｋ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI Technical display location G02B 5/28 7348-2K G03B 21/14 A 7316-2K
Claims (1)
ＳｉＯ２との薄膜を交互に積層させ、このＺｎＳ−Ｓｉ
Ｏ２交互層に焼成処理を施す前に前記交互層の上面にＺ
ｎＳ層の酸化を防止するＳｉＯ２保護膜を被着させて、
450〜520℃の温度で焼成処理した多層膜反射鏡。1. A thin film of ZnS and SiO 2 is alternately laminated on a reflective substrate by a vapor phase film forming method, and this ZnS-Si is formed.
Before subjecting the O 2 alternate layer to a firing treatment, a Z
By depositing a SiO 2 protective film that prevents the oxidation of the nS layer,
A multilayer film mirror that has been baked at a temperature of 450-520 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61085661A JPH0629882B2 (en) | 1986-04-14 | 1986-04-14 | Multilayer film mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61085661A JPH0629882B2 (en) | 1986-04-14 | 1986-04-14 | Multilayer film mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62240903A JPS62240903A (en) | 1987-10-21 |
| JPH0629882B2 true JPH0629882B2 (en) | 1994-04-20 |
Family
ID=13865008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61085661A Expired - Lifetime JPH0629882B2 (en) | 1986-04-14 | 1986-04-14 | Multilayer film mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0629882B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2724563B2 (en) * | 1990-01-14 | 1998-03-09 | 株式会社堀場製作所 | Multilayer interference filter |
| JPH0434503A (en) * | 1990-05-31 | 1992-02-05 | Toshiba Glass Co Ltd | multilayer reflector |
| JPH04253001A (en) * | 1991-01-30 | 1992-09-08 | Seikosha Co Ltd | Infrared reflection mirror |
| JPH04267202A (en) * | 1991-02-21 | 1992-09-22 | Horiba Ltd | Multi-layer film interference filter |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6042445B2 (en) * | 1977-10-05 | 1985-09-21 | キヤノン株式会社 | Multilayer thin film optical system |
| JPS5689703A (en) * | 1979-12-24 | 1981-07-21 | Agency Of Ind Science & Technol | Manufacture of reflecting mirror for high output laser |
| JPS57161809A (en) * | 1981-03-31 | 1982-10-05 | Nippon Soda Co Ltd | Manufacture of multilayered film |
| JPS6066202A (en) * | 1983-09-20 | 1985-04-16 | Agency Of Ind Science & Technol | Reflection mirror for laser |
-
1986
- 1986-04-14 JP JP61085661A patent/JPH0629882B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62240903A (en) | 1987-10-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2000352612A (en) | Multilayer filter | |
| JP2691651B2 (en) | Reflector | |
| JP3031625B2 (en) | Heat ray absorbing reflector | |
| JP2566634B2 (en) | Multi-layer antireflection film | |
| US5142197A (en) | Light interference film and lamp | |
| JP2928784B2 (en) | Multilayer reflector | |
| JPS62240903A (en) | Multi-layered reflection mirror | |
| JP3054663B2 (en) | Multilayer reflector | |
| JPS63159811A (en) | Reflecting mirror consisting of multi-layered films and its production | |
| JPS61190853A (en) | Incandescent bulb | |
| JPS6177018A (en) | filter | |
| JP2971773B2 (en) | Multilayer film | |
| JP2687243B2 (en) | Multilayer optical interference film | |
| JPS6188449A (en) | Protective film for reflector | |
| JP2754516B2 (en) | Silicon dioxide thin film | |
| JP2778784B2 (en) | Multilayer reflector for light source | |
| JP3102959B2 (en) | High durability thin film | |
| JPH0139163B2 (en) | ||
| JP3110131B2 (en) | High durability thin film | |
| JP2602033B2 (en) | Incandescent light bulb with infrared reflection filter | |
| JPH0469883B2 (en) | ||
| JPS6042445B2 (en) | Multilayer thin film optical system | |
| JPH0375600A (en) | Multi layered film reflecting mirror | |
| JPH01161301A (en) | Production of reflecting mirror of multilayered film | |
| JPH05254886A (en) | Protecting film for reflector |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |