JPH0630242Y2 - ▲ Ro ▼ Passing device - Google Patents
▲ Ro ▼ Passing deviceInfo
- Publication number
- JPH0630242Y2 JPH0630242Y2 JP12125790U JP12125790U JPH0630242Y2 JP H0630242 Y2 JPH0630242 Y2 JP H0630242Y2 JP 12125790 U JP12125790 U JP 12125790U JP 12125790 U JP12125790 U JP 12125790U JP H0630242 Y2 JPH0630242 Y2 JP H0630242Y2
- Authority
- JP
- Japan
- Prior art keywords
- support layer
- overlayer
- upward flow
- tank
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 238000005406 washing Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- 239000008187 granular material Substances 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 description 14
- RHZUVFJBSILHOK-UHFFFAOYSA-N anthracen-1-ylmethanolate Chemical compound C1=CC=C2C=C3C(C[O-])=CC=CC3=CC2=C1 RHZUVFJBSILHOK-UHFFFAOYSA-N 0.000 description 2
- 239000003830 anthracite Substances 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Description
【考案の詳細な説明】 〔産業上の利用分野〕 本考案は、粒状支持材を充填した支持層で粒状材を充
填した過層を支持した型式の過装置に関し、特に上
向流による過層の洗浄時に支持層の局部的浮陸現象を
防止することができる過装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a type of overpass device that supports an overlayer filled with a granular support material by a support layer filled with a granular support material, and more particularly, an overflow device by upflow. The present invention relates to an excess device capable of preventing a localized floating phenomenon of a support layer during cleaning.
〔従来の技術〕 各種水処理用の過装置の代表的な例としては、第3図
に示すように、槽1内底部に集水室2が形成され、集水
室2の上部には砂利等の粒状支持材を充填した支持層3
が設けられ、この支持層3上に砂,アンスラサイトその
他の粒状材を充填した過層4が支持されている。[Prior Art] As a typical example of an excess device for various water treatments, as shown in FIG. 3, a water collecting chamber 2 is formed at the bottom of the tank 1, and gravel is provided above the water collecting chamber 2. Support layer 3 filled with a granular support material such as
Is provided, and the overlayer 4 filled with sand, anthracite, and other granular materials is supported on the support layer 3.
そして、過すべき原水は過層4に下向流で供給さ
れ、過層4で濁質分が捕捉されたのち支持層3を経た
過水は集水室2に集水され過水渠5から流出する。Then, the raw water to be passed is supplied to the overlayer 4 in a downward flow, and after the suspended matter is captured in the overlayer 4, the overflow through the support layer 3 is collected in the water collection chamber 2 and flows out from the overdrain 5. To do.
このような過を継続する間に、原水中の濁質分が過
層4に蓄積され、その過抵抗が所定値まで増大した時
には、過層4の洗浄を行う必要がある。過層4の洗
浄には、得られた過水又は他の洗浄水を集水室2内に
圧入すると、洗浄水は上向きに支持層3を通過、分散し
て均一な上向流となり、過層4をゆるめて粒状材を
浮動状態とし、捕捉されている濁質分を伴って上部に設
けられている洗浄排水トラフ6に越流し、槽1外に排出
される。When the suspended matter in the raw water is accumulated in the overlayer 4 while continuing such an excess, and the overresistance increases to a predetermined value, the overlayer 4 needs to be washed. To wash the overlayer 4, when the obtained overwater or other washing water is pressed into the water collection chamber 2, the washing water passes upward through the support layer 3 and is dispersed to form a uniform upward flow. The layer 4 is loosened to make the particulate material float, and the suspended particulate matter is carried over to the cleaning drainage trough 6 provided at the upper portion and discharged to the outside of the tank 1.
ところで、このような上向流による洗浄では上向流速に
制限があり、あまり高速にすると支持層3を浮動させる
いわゆる浮陸現象が生じ、支持されている過層4の粒
状材が支持層3中に入り込み、その後過が不均一に
なる等、過機能に重大な障害を及ぼす。一方、上向流
速が低速すぎると、当然のことながら過層4をゆるめ
ることができず、洗浄不良となる。従って、洗浄時の上
向流速には、集水室2の構造にもよるが、或る適正な範
囲がある。By the way, in such cleaning by the upward flow, the upward flow velocity is limited, and if the speed is too high, a so-called landing phenomenon that causes the support layer 3 to float occurs, and the granular material of the supported overlayer 4 becomes the support layer 3. It gets into the inside of the body, and after that, it causes a serious disorder in hyperfunction, such as unevenness in the body. On the other hand, if the upward flow velocity is too low, the overlayer 4 cannot be loosened as a matter of course, resulting in poor cleaning. Therefore, the upward flow velocity at the time of cleaning has a certain appropriate range, although it depends on the structure of the water collection chamber 2.
しかしながら、従来の過装置では、支持層3の水平断
面積は過層4の水平断面積と同一であり、洗浄時の上
向流速が適正範囲内であっても、支持層3における支持
材同士の空隙率が槽壁付近と槽中央付近では異なり、洗
浄時の上向流速に差異が生じ、槽壁に沿った上向流は槽
壁に阻止されて槽壁に沿った部分の支持層3を浮動さ
せ、局部的に浮陸現象を生ずることが多かった。However, in the conventional passing device, the horizontal cross-sectional area of the support layer 3 is the same as the horizontal cross-sectional area of the overlayer 4, and even if the upward flow velocity during cleaning is within the proper range, the support materials in the support layer 3 are The porosity of the difference between the vicinity of the tank wall and the vicinity of the center of the tank causes a difference in the upward flow velocity at the time of cleaning, and the upward flow along the tank wall is blocked by the tank wall, and the support layer 3 in the portion along the tank wall is It often caused local floating phenomena.
本考案は、このような過層の上向流洗浄において、支
持層の局部的浮陸現象を防止し、過機能を損なうこと
がない構造簡単な過装置を提供することを目的とする
ものである。An object of the present invention is to provide an over-apparatus having a simple structure which prevents a localized landing phenomenon of a support layer and does not impair over-function in such an up-flow washing of an over-layer. is there.
本考案は、槽内に粒状支持材を充填した支持層を設け、
該支持層上に粒状材を充填した過層を支持し、該
過層の洗浄を下方から洗浄水を導入して上向流で行うよ
うにした過装置において、前記支持層内の槽壁部分に
おいても上向流の分散を均一にするように、支持層外周
部を槽壁内に膨出せしめたことを特徴とする過装置で
ある。The present invention provides a support layer filled with a granular support material in a tank,
A tank wall portion in the support layer, in which an overlayer filled with a granular material is supported on the support layer, and washing of the overlayer is performed in an upward flow by introducing wash water from below. In the above apparatus, the outer peripheral portion of the support layer is bulged into the tank wall so that the upward flow is uniformly dispersed.
本考案の過装置では、従来装置と同様に、下向流ある
いは上向流による過が行われるが、過層を上向流洗
浄する際には過層を支持する支持層の浮動が防止さ
れ、支持層の局部的浮陸現象を生じることがない。In the overpass device of the present invention, as in the conventional device, the downflow or the upflow is performed, but during the upflow cleaning of the overlayer, the floating of the support layer supporting the overlayer is prevented. , The local floating phenomenon of the supporting layer does not occur.
即ち、過層洗浄時に所定の流速で上向きに流れる洗浄
水の大部分は、支持層によって分散され、槽壁に沿った
上向流も、第2矢印で示すように、支持材同士の空隙率
が一定に形成されており、かつ支持層の膨出部に入り込
んで充分に分散されるため、洗浄時の槽内の流速分布を
均一にし、所定範囲内の上向流速における支持層の槽壁
付近の局部的浮陸現象はみられず、洗浄後の過機能に
支障をきたすことがない。That is, most of the washing water that flows upward at a predetermined flow rate during overlayer cleaning is dispersed by the support layer, and the upward flow along the tank wall also causes the porosity between the support materials as shown by the second arrow. Is uniformly formed, and enters the bulging portion of the support layer and is sufficiently dispersed, so that the flow velocity distribution in the bath at the time of cleaning is made uniform, and the bath wall of the support layer at an upward flow velocity within a predetermined range. No local landing phenomenon was observed in the vicinity, and there is no hindrance to overfunctioning after washing.
本考案の一実施例を図面を参照して説明すれば、第1図
は本考案の過装置の断面図で、槽1内底部には集水室
2が形成され、集水室2の上部には砂利その他の粒状支
持材を充填した支持層13が設けられ、支持層13上に
は、砂,アンスラサイト等の粒状材を充填した過層
4が支持されている。また、集水室2には過水渠5が
連通し、槽1内上方部には過層4の洗浄後、濁質分を
伴う洗浄排水を排出するための洗浄排水トラフ6が設け
られている。An embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view of a filtration device according to the present invention, in which a water collecting chamber 2 is formed at the bottom of the tank 1 and an upper part of the water collecting chamber 2. Is provided with a support layer 13 filled with a granular support material such as gravel, and an overlayer 4 filled with a granular material such as sand or anthracite is supported on the support layer 13. In addition, the water collection chamber 2 is communicated with a permeate drain 5, and a cleaning drainage trough 6 for discharging the cleaning drainage accompanied by suspended matter is provided in the upper part of the tank 1 after cleaning the overlayer 4. .
さらに、前記支持層13は、従来のようにその水平断面
積が過層4の水平断面積と同一ではなく、洗浄時に支
持層13内の槽壁に沿う上向流の分散が槽壁によって阻
止されることがないように、槽壁内周に溝をつくり、こ
の溝の中にまで支持層13を膨出させ、支持層13の水
平断面積を過層4の水平断面積よりも広くすることに
より槽壁部分の空隙率を一定にしてある。この膨出部は
支持材粒径の5〜20倍、好ましくは50〜300mm程
度にすることが好ましい。Further, the horizontal cross-sectional area of the support layer 13 is not the same as the horizontal cross-sectional area of the overlayer 4 as in the prior art, and the tank wall prevents the upward flow along the tank wall in the support layer 13 during cleaning. A groove is formed on the inner circumference of the tank wall so that the support layer 13 is bulged into the groove so that the horizontal cross-sectional area of the support layer 13 is wider than that of the overlayer 4. As a result, the porosity of the tank wall is kept constant. The bulging portion is preferably 5 to 20 times the particle diameter of the support material, preferably about 50 to 300 mm.
従って、過層4の洗浄時に集水室2を経て上向きに流
れる洗浄水は、第2図の矢印で示すように、槽壁に沿う
流れは膨出部にも入り込んで充分に分散され、局部的な
支持層13の浮陸現象もなく、しかも槽内全体に均一な
上向流となって効果的な過層4の洗浄が行われる。Therefore, as shown by the arrow in FIG. 2, the washing water flowing upward through the water collecting chamber 2 during the washing of the overlayer 4 is sufficiently dispersed by the flow along the tank wall entering the bulging portion as well. The floating phenomenon of the supporting layer 13 does not occur, and the upper layer 4 is effectively washed with a uniform upward flow in the entire tank.
以上述べたように、本考案は、槽内に粒状支持材を充填
した支持層を設け、該支持層上に粒状材を充填した
過層を支持し、該過層の洗浄を下方から洗浄水を導入
して上向流で行うようにした過装置において、前記支
持層内の槽壁部分においても上向流の分散を均一にする
ように、支持層外周部を槽壁内に膨出せしめたことによ
り、従来の支持層の浮動を生じるような槽壁に沿う流速
の差異が解消され、槽内全体の上向流速分布は均一とな
り、支持層の槽壁付近の局部的浮陸現象は防止され、
過機能に支障を及ぼすことがない。As described above, the present invention provides the support layer filled with the granular support material in the tank, supports the overlayer filled with the granular material on the support layer, and cleans the overlayer from below with the washing water. In order to make the upward flow even in the tank wall portion in the support layer, the outer periphery of the support layer is bulged into the tank wall. As a result, the conventional difference in the flow velocity along the tank wall that causes floating of the support layer is eliminated, the upward flow velocity distribution in the entire tank becomes uniform, and the local floating phenomenon near the tank wall of the support layer is eliminated. Prevented,
Does not interfere with overfunction.
第1図は本考案の一実施例を示す縦断側面図、第2図は
本考案における槽壁部付近の上向流の流れ状態説明図、
第3図は過装置の従来例の縦断側面図である。 1…槽、2…集水室、3,13…支持層、4…過層、
5…過水渠、6…洗浄排水トラフ。FIG. 1 is a vertical side view showing an embodiment of the present invention, and FIG. 2 is an explanatory view of an upward flow state near a tank wall in the present invention,
FIG. 3 is a vertical cross-sectional side view of a conventional example of the excess device. 1 ... Tank, 2 ... Water collection chamber, 3, 13 ... Support layer, 4 ... Overlayer,
5 ... Superfluid, 6 ... Washing drainage trough.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 8925−4D B01D 29/08 Z ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location 8925-4D B01D 29/08 Z
Claims (1)
け、該支持層上に粒状材を充填した過層を支持し、
該過層の洗浄を下方から洗浄水を導入して上向流で行
うようにした過装置において、前記支持層内の槽壁部
分においても上向流の分散を均一にするように、支持層
外周部を層壁内に膨出せしめたことを特徴とする過装
置。1. A support layer filled with a granular support material is provided in a tank, and an overlayer filled with the granular material is supported on the support layer,
In a passing apparatus in which washing water is introduced from below to perform washing in an upward flow, a supporting layer is provided so that the upward flow is evenly distributed even in the tank wall portion in the supporting layer. An excess device in which the outer peripheral portion is bulged into the layer wall.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12125790U JPH0630242Y2 (en) | 1990-11-21 | 1990-11-21 | ▲ Ro ▼ Passing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12125790U JPH0630242Y2 (en) | 1990-11-21 | 1990-11-21 | ▲ Ro ▼ Passing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0478904U JPH0478904U (en) | 1992-07-09 |
| JPH0630242Y2 true JPH0630242Y2 (en) | 1994-08-17 |
Family
ID=31869121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12125790U Expired - Lifetime JPH0630242Y2 (en) | 1990-11-21 | 1990-11-21 | ▲ Ro ▼ Passing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0630242Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6333883B2 (en) | 2008-09-19 | 2018-05-30 | 株式会社半導体エネルギー研究所 | Display device |
-
1990
- 1990-11-21 JP JP12125790U patent/JPH0630242Y2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6333883B2 (en) | 2008-09-19 | 2018-05-30 | 株式会社半導体エネルギー研究所 | Display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0478904U (en) | 1992-07-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |