JPH0633466B2 - Surface-treated steel sheet for electronic device parts with excellent rust resistance, whisker resistance, and solderability - Google Patents
Surface-treated steel sheet for electronic device parts with excellent rust resistance, whisker resistance, and solderabilityInfo
- Publication number
- JPH0633466B2 JPH0633466B2 JP1092075A JP9207589A JPH0633466B2 JP H0633466 B2 JPH0633466 B2 JP H0633466B2 JP 1092075 A JP1092075 A JP 1092075A JP 9207589 A JP9207589 A JP 9207589A JP H0633466 B2 JPH0633466 B2 JP H0633466B2
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Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は電気製品の電子部品及びシールド材やフレーム
として使用され、耐食性、耐ホイスカー性、半田性等の
性能に優れた特性を有する電子機器部品用表面処理鋼板
に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial field of application) The present invention is used as an electronic component for electric products, a shield material, and a frame, and has an excellent electronic performance such as corrosion resistance, whisker resistance, and solderability. The present invention relates to a surface-treated steel sheet for parts.
(従来の技術) 一般に電気製品の電子部品並びにシールド材、フレーム
等に使用される表面処理鋼板としては半田付けの要求さ
れないものに対しては電気亜鉛メッキ鋼板が、半田用途
にはブリキ、ターンシートが使用されている。また、一
部加工の厳しいものや溶接されるものに対しては部品の
加工後に鉛−錫やNiメッキを行った鋼板が使用されてい
る。このように電子部品用の表面処理鋼板は既存のメッ
キ鋼板を用途別に使い分けをしている状態であり、特殊
な用途に対しては部品に加工後バレルメッキ等の手法に
より後めっきしているものもある。(Prior Art) Electroplated galvanized steel sheets are generally used for electronic parts of electric products, shield materials, frames, etc. that are not required to be soldered, and tin plates and turn sheets are used for soldering. Is used. Further, for some of the ones that are severely worked or those that are welded, a steel plate plated with lead-tin or nickel after the parts are worked is used. In this way, the surface-treated steel sheets for electronic parts are in a state where the existing plated steel sheets are used properly according to the application, and for special applications, the parts are post-plated by a method such as barrel plating after processing. There is also.
近年、電気製品の小型化により電子部品の間隔が狭まり
亜鉛メッキ層及び錫メッキ層から成長した針状の単結晶
(ホイスカー)による回路短絡や絶縁層の破壊等の問題
が発明している。このようなホイスカーの発生防止につ
いては合金メッキ化(特公昭58−2598号公報、特公昭55
-12192号公報、特開昭49-129号公報等)ならびにメッキ
後の後処理(特公昭56-47955号公報、特公昭56-47956号
公報、特開昭59−143089号公報、特開昭62-77481号公報
等)方法が従来より提唱されている。しかしながら、こ
れらの方法は合金メッキ化や後処理による工程増及びコ
ストアップのために殆ど実用化されていないのが実情で
ある。In recent years, due to the miniaturization of electric products, the distance between electronic components is narrowed, and problems such as short circuits and breakdown of insulating layers due to needle-shaped single crystals (whiskers) grown from zinc-plated layers and tin-plated layers have been invented. To prevent the occurrence of such whiskers, alloy plating (Japanese Patent Publication No. 58-2598, Japanese Patent Publication No. 55) is used.
-12192, JP-A-49-129, etc.) and post-treatment after plating (JP-B-56-47955, JP-B-56-47956, JP-A-59-143089, JP-A-59-143089) 62-77481, etc.) has been proposed. However, in reality, these methods have hardly been put into practical use because of the increase in the number of steps and cost increase due to alloy plating and post-treatment.
また、コストダウンの点からでも特に部品加工後の後メ
ッキの省略が必須であり、プレメッキされた表面処理鋼
板提供の強い要請がある。Further, from the viewpoint of cost reduction, it is indispensable to omit post-plating after processing the parts, and there is a strong demand for providing a pre-plated surface-treated steel sheet.
(発明が解決しようとする課題) 以上述べたように電子部品用途としては耐ホイスカー
性、半田性、耐食性を同時に満足する表面処理鋼板が求
められている。(Problems to be Solved by the Invention) As described above, surface-treated steel sheets that simultaneously satisfy whisker resistance, solderability, and corrosion resistance are required for electronic parts.
(課題を解決するための手段及び作用) 以下、本発明について詳細に述べる。本発明は現在電子
部品用途として使用されている亜鉛メッキ鋼板(以下E
Gと略す)とブリキの両方の特性(EG:Znの耐食性、
ブリキ:Snの耐食性、半田性)を満足しつつ、更に耐ホ
イスカー性にも優れるものである。これらの目的を達成
するため、ZnめっきをSnメッキ層上に適当量施し、耐食
性、半田性に優れた通常のブリキより耐食性および耐ホ
イスカー性に優れたSn−Zn合金メッキとし、また、メッ
キ被膜の均一性を向上させるNi下地メッキを施した後、
加熱拡散処理を行い、表層から順にSn−Zn,Sn−Ni,Zn
−Ni合金を主体とする合金皮膜を形成し、更に、その合
金皮膜上にオキサイドクロムのみよりなるクロメート皮
膜を形成することにより可能とした。第3図および第4
図に本発明によるメッキ層の構造概念図とGDS(グロ
ー放電発光分光分析)による実際の分析結果を示す。(Means and Actions for Solving the Problems) Hereinafter, the present invention will be described in detail. The present invention is a galvanized steel sheet (hereinafter referred to as E
Both G (abbreviated as G) and tin characteristics (EG: Zn corrosion resistance,
Tin plate: Corrosion resistance and solderability of Sn) are satisfied, and whisker resistance is also excellent. In order to achieve these objects, Zn plating is applied on the Sn plating layer in an appropriate amount to form Sn-Zn alloy plating that is superior in corrosion resistance and whisker resistance to normal tinplate, which has excellent corrosion resistance and solderability. After applying Ni undercoat to improve the uniformity of
Heat diffusion treatment is performed, and from the surface layer, Sn-Zn, Sn-Ni, Zn
This is made possible by forming an alloy film mainly composed of -Ni alloy and then forming a chromate film consisting only of oxide chromium on the alloy film. 3 and 4
The figure shows a conceptual diagram of the structure of the plating layer according to the present invention and an actual analysis result by GDS (Glow Discharge Optical Emission Spectroscopy).
以下、本発明の請求の範囲に述べた限定範囲について説
明する。Hereinafter, the limited range described in the claims of the present invention will be described.
まず、最初にNi量の限定範囲についてであるが、Niメッ
キの目的は前述したようにメッキ皮膜の均一性を向上さ
せるための下地メッキとしての効果がある。従って、Ni
下地メッキとしての効果を十分に発揮するには鋼板の表
面をある程度均一に被覆する必要があるため最低限0.1g
/m2が下限である。また、上限については付着量が増加
するに従って耐食性も良くなるが、当然、コストアップ
につながるためその上限を10.0g/m2に限定する。First, regarding the limited range of the amount of Ni, the purpose of Ni plating is to have an effect as a base plating for improving the uniformity of the plating film as described above. Therefore, Ni
To fully exert the effect of undercoating, it is necessary to coat the surface of the steel plate evenly to a certain extent.
/ m 2 is the lower limit. Regarding the upper limit, the corrosion resistance becomes better as the amount of adhesion increases, but naturally the cost increases, so the upper limit is limited to 10.0 g / m 2 .
次にSn量の限定範囲について述べる。Snメッキは本発明
の基本となるメッキであるが前述したように下地Niメッ
キ量によって耐食性が変化するためNiメッキの多い場合
については微量のSnメッキ量と微量Znの組み合わせで要
求される耐食性を満足する場合があるが、半田性の点か
らSnメッキ量の下限は 3.0 g/m2とする。また、上限に
ついてはコストとの関係から12.0g/m2に限定する。Next, the limited range of the Sn content will be described. Although Sn plating is the plating that is the basis of the present invention, as described above, the corrosion resistance changes depending on the base Ni plating amount, so when there is a large amount of Ni plating, the corrosion resistance required by a combination of a small amount of Sn plating amount and a small amount of Zn is required. Although it may be satisfied, the lower limit of Sn plating amount is 3.0 g / m 2 from the viewpoint of solderability. Also, the upper limit is limited to 12.0 g / m 2 in consideration of cost.
次にZnメッキ量の限定範囲について述べる。Znメッキ量
については本発明の場合、特許請求の範囲に示したよう
に熱拡散後の合金層の形成に関係が深いため、特にSnメ
ッキ量との割合で限定する。Next, the limited range of the Zn plating amount will be described. In the case of the present invention, the amount of Zn plating is closely related to the formation of the alloy layer after thermal diffusion as described in the claims, and therefore is limited to the ratio with the amount of Sn plating.
第1図は先に述べた限定範囲内の下地Niメッキ量 0.1〜
10g/m2におけるSnメッキ量 3.0〜12g/m2に対するZnの割
合と錆発生率の関係の一例を示す。図のようにZn量の割
合の増加にしたがってSST 48時間後の赤錆発生は減少
し、Zn比率5〜25%で赤錆の発生は見られなくなる。
Zn=25%を越えると今度は逆に白錆の発生が見られる
ようになり、Zn=90%以上ではZnメッキに近づくため
白錆の発生がかなり増加する。第2図も第1図と同様の
付着量範囲のSn、NiメッキについてSn/Zn比率とホイス
カーの発生との関係の一例を示すものである。図のよう
に亜鉛の割合が高くなるにしたがってホイスカーの発生
は減少してゆき、Zn比率10%以上でホイスカーの発生
は見られなくなる。しかしながらZn比率が80%を超え
ると今度はZnメッキに近づくためまたホイスカーが発生
するようになる。Fig. 1 shows the amount of Ni plating on the base Ni within the limited range mentioned above.
For Sn plating amount 3.0~12g / m 2 in 10 g / m 2 shows an example of the relationship between the ratio and the rust occurrence rate of Zn. As shown in the figure, the generation of red rust decreased after 48 hours of SST as the proportion of Zn increased, and the generation of red rust disappeared at a Zn ratio of 5 to 25%.
On the other hand, when Zn exceeds 25%, the occurrence of white rust is observed, and when Zn = 90% or more, the occurrence of white rust considerably increases because it approaches Zn plating. FIG. 2 also shows an example of the relationship between the Sn / Zn ratio and the generation of whiskers for Sn and Ni plating in the same deposit amount range as in FIG. As shown in the figure, the generation of whiskers decreases as the proportion of zinc increases, and the generation of whiskers disappears when the Zn ratio is 10% or more. However, if the Zn ratio exceeds 80%, whiskers will be generated again because it approaches Zn plating this time.
以上、Znメッキの限定範囲については耐錆性、耐ホイス
カー性の点からSnメッキ量の10〜25%に限定され
る。As described above, the limited range of Zn plating is limited to 10 to 25% of the Sn plating amount from the viewpoint of rust resistance and whisker resistance.
加熱処理の条件、方法についてはSn〜Zn間の拡散は常温
でも起こるものであるが、工業的に生産するためには短
時間で行うことが必要であり、その場合の一般的な条件
は加熱温度 150℃〜400 ℃、加熱速度も数℃/SEC〜数百
℃/SECの範囲である。Regarding the heat treatment conditions and method, diffusion between Sn and Zn occurs even at room temperature, but it is necessary to perform it in a short time for industrial production, in which case the general condition is heating. The temperature is 150 ℃ ~ 400 ℃, the heating rate is also in the range of several ℃ / SEC ~ several hundred ℃ / SEC.
また、加熱方法についても電気およびガスによる加熱
炉、通電抵抗加熱、高周波誘導加熱あるいはこれらの組
み合わせがあり、本発明では特に限定しない。The heating method may be a heating furnace using electricity and gas, electric resistance resistance heating, high frequency induction heating or a combination thereof, and is not particularly limited in the present invention.
最後にクロメート皮膜に関する限定であるが、本発明に
類似する特開昭63−266089号公報のものとはその用途と
ともに大きく異なるものである。本発明は電子部品用途
であるために半田性が要求され、特に、小型電子部品に
ついては溶融半田槽上に短時間浸漬するものであり、例
えばクロム酸を主体とする浴を用いるクロメート処理方
法を無電解方式にして合金皮膜上に形成するクロメート
皮膜を金属Cr換算で20mg/m2までのオキサイドクロム
のみよりなるものとすることにより半田性を確保したこ
とに特徴がある。このオキサイドクロムのみよりなるク
ロメート被膜の量は金属Cr換算で1mg/m2以上であれば
耐食性も良好であり、上・下限を1mg/m2に限定する。Lastly, regarding the chromate coating, it is significantly different from the one disclosed in JP-A-63-266089, which is similar to the present invention, in the use thereof. Since the present invention is used for electronic parts, solderability is required, and particularly for small electronic parts, it is a short-time immersion in a molten solder bath. For example, a chromate treatment method using a bath mainly containing chromic acid is used. It is characterized in that the chromate film formed on the alloy film by the electroless method is composed of only oxide chromium up to 20 mg / m 2 in terms of metal Cr, thereby ensuring solderability. If the amount of the chromate film made of only oxide chromium is 1 mg / m 2 or more in terms of metal Cr, the corrosion resistance is good, and the upper and lower limits are limited to 1 mg / m 2 .
(実施例) 以下、実施例に基づいて本発明の内容を説明する。(Examples) Hereinafter, the contents of the present invention will be described based on Examples.
実施例−1 通常の方法で冷間圧延、および焼鈍された低炭素冷延鋼
板に通常の方法で脱脂・酸洗を行った後、順に(1) に示
す処理条件でNiメッキ、(2) に示す処理条件でSnメッ
キ、(3) に示す条件でZnメッキを施した。各メッキの付
着量は第1表中に示す。そして引き続いて通電抵抗加熱
方式によって鋼板表面温度 250〜 350℃で 0.5秒以上の
加熱処理を大気中で実施し、メッキ層表層にSn−Zn二元
合金、メッキ層内部にZn−Ni,Sn−Ni二元合金並びにFe
−Sn合金を形成させた。更に(4) に示す条件でクロメー
ト処理を施した後、各種評価試験に供した。Example 1 After degreasing and pickling the low carbon cold-rolled steel sheet cold-rolled by a normal method and annealed by a normal method, Ni plating was sequentially performed under the treatment conditions shown in (1), (2) Sn plating was performed under the treatment conditions shown in (3) and Zn plating was performed under the conditions shown in (3). The adhesion amount of each plating is shown in Table 1. Then, the steel sheet surface temperature of 250 to 350 ° C was subjected to heat treatment for 0.5 seconds or more in the atmosphere by the electric resistance heating method, and the Sn-Zn binary alloy was applied to the surface of the plating layer and Zn-Ni, Sn- was applied to the inside of the plating layer. Ni binary alloy and Fe
-Sn alloy was formed. Further, after chromate treatment under the conditions shown in (4), it was subjected to various evaluation tests.
(1) Niメッキ 浴条件 NiSO4・7H2O: 200〜 300g/ NiCl2・6H2O: 0〜 50g/ H3BO3 : 40g/ メッキ条件 浴温度 :40〜50℃ 電流密度 : 5〜30A/dm2 (2) Snメッキ 浴条件 硫酸錫 :20〜30g/ フェノ-ルスルフォン酸:20〜30g/ エトキシ化α-ナフト-ルスルフォン 酸: 2〜3g/ メッキ条件 浴温度 :35〜45℃ 電流密度 : 2〜30A/dm2 (3) Znメッキ 浴条件 ZnSO4・7H2O: 200〜 400g/ Na2SO4 : 50〜 150g/ メッキ条件 浴温度 :40〜50℃ 電流密度 : 5〜30A/dm2 (4) クロメート処理 浴条件 CrO3 :50〜 100g/ H2SO4 : 0 処理条件 浴温度 :40〜50℃ 電流密度 : 0A/dm2 (浸漬のみ5秒程度) 実施例−2 実施例−1においてクロメート処理条件として実施例−
1の(4) に替えて下記に示す(5) とした実施例であり、
その他の項目は実施例−1と同じである。(1) Ni plating bath conditions NiSO 4 · 7H 2 O: 200~ 300g / NiCl 2 · 6H 2 O: 0~ 50g / H 3 BO 3: 40g / plating conditions bath temperature: 40 to 50 ° C. Current density: 5 30A / dm 2 (2) Sn plating bath conditions Tin sulphate: 20-30g / phenol-sulphonic acid: 20-30g / ethoxylated α-naphtho-sulphonic acid: 2-3g / plating conditions Bath temperature: 35-45 ° C Current density: 2~30A / dm 2 (3) Zn plating bath conditions ZnSO 4 · 7H 2 O: 200~ 400g / Na 2 SO 4: 50~ 150g / plating conditions bath temperature: 40 to 50 ° C. current density: 5~30A / dm 2 (4) Chromate treatment Bath condition CrO 3 : 50 to 100 g / H 2 SO 4 : 0 Treatment condition Bath temperature: 40 to 50 ° C Current density: 0 A / dm 2 (immersion only for about 5 seconds) Example-2 In Example-1, the conditions for chromate treatment are as follows:
It is an embodiment in which (4) of 1 is replaced by (5) shown below,
Other items are the same as in Example-1.
(5) クロメート処理 浴条件 CrO3 :50〜 100g/ Na2SiF6 : 0.1〜10.0g/ 処理条件 浴温度 :40〜50℃ 電流密度 : 0 A/dm2 (浸漬のみ5秒程度) 比較例−1 実施例−1においてクロメート処理条件として実施例−
1の(4) に替えて下記に示す(6) とした実施例であり、
その他の項目は実施例−1と同じである。(5) Chromate treatment Bath conditions CrO 3 : 50 to 100 g / Na 2 SiF 6 : 0.1 to 10.0 g / treatment conditions Bath temperature: 40 to 50 ° C Current density: 0 A / dm 2 (immersion only for about 5 seconds) Comparative example -1 Example as chromate treatment conditions in Example-1
It is an example in which (6) shown below is substituted for (4) of 1,
Other items are the same as in Example-1.
(6) クロメート処理 浴条件 CrO3 :50〜 100g/ H2SO4 : 0.1〜 1.0g/ Na2SiF6 : 0.1〜10.0g/ メッキ条件 浴温度 :40〜50℃ 電流密度 :20〜100A/dm2 Cr付着量 :21〜100mg/m2 比較例−2 片面当りのSnメッキ量が 2.8g/m2、表面に施したクロメ
ート被膜量が全Cr量として金属Cr換算で8mg/m2(オキ
サイドCr量8mg/m2)の電気メッキブリキ(#25ブリ
キと称す) 比較例−2 片面当りのSnメッキ量が 5.6g/m2、表面に施したクロメ
ート被膜量が全Cr量として金属Cr換算で8mg/m2(オキ
サイドCr量8mg/m2)の電気メッキブリキ(#50ブリ
キと称す) 比較例−4 片面当りのSnメッキ量が11.2g/m2、表面に施したクロメ
ート被膜量が全Cr量として金属Cr換算で8mg/m2(オキ
サイドCr量8mg/m2)の電気メッキブリキ(#100 ブリ
キと称す) 比較例−5 片面当りのZnメッキ量が20.5g/m2、表面に施したクロメ
ート被膜量が全Cr量として金属Cr換算で70mg/m2(オ
キサイドCr量70mg/m2)の電気亜鉛メッキ鋼板(EG20
と称す) 比較例−6 片面当りのNiメッキ量が30.0g/m2、電気ニッケルメッキ
鋼板 以上、本発明実施例、比較例を以下に示す(a)〜(e) の
評価テストに供し、特性を比較した。(6) Chromate treatment Bath conditions CrO 3 : 50-100 g / H 2 SO 4 : 0.1-1.0 g / Na 2 SiF 6 : 0.1-10.0 g / Plating conditions Bath temperature: 40-50 ° C Current density: 20-100A / dm 2 Cr adhesion amount: 21 to 100 mg / m 2 Comparative example-2 Sn plating amount per one surface is 2.8 g / m 2 , and chromate coating amount applied to the surface is 8 mg / m 2 (as total Cr amount in terms of metallic Cr) Electroplated tinplate with oxide Cr amount of 8 mg / m 2 (referred to as # 25 tinplate) Comparative Example-2 Sn plating amount per one side is 5.6 g / m 2 , and chromate coating amount applied on the surface is metallic Cr as the total Cr amount. 8 mg / m 2 (oxide Cr amount 8 mg / m 2 ) of electroplated tin plate (referred to as # 50 tin plate) Comparative Example-4 11.2 g / m 2 Sn plating amount per one side, amount of chromate film applied on the surface Zn but of electroplating (referred to as # 100 tinplate) tin Comparative example -5 per one side of the metal Cr converted at 8 mg / m 2 (oxide Cr amount 8 mg / m 2) as the total amount of Cr Tsu · The amount of 20.5 g / m 2, the chromate film amount was applied to the surface of electro-galvanized steel sheet metal Cr converted at 70 mg / m 2 (oxide Cr amount 70 mg / m 2) as the total amount of Cr (EG20
Comparative Example-6 Ni plating amount per one side is 30.0 g / m 2 , electric nickel plated steel plate As described above, Examples of the present invention and Comparative Examples were subjected to the evaluation tests of (a) to (e) below, The characteristics were compared.
(a) 塩水噴霧サイクルテスト 耐錆性を調査するため供試材を打ち抜き加工して塩水噴
霧のサイクルテストを行った。塩水噴霧サイクルテスト
は5%食塩水を35℃で8時間スプレーした後16時間
休止するサイクルを3サイクル行った。評価は目視にて
行い、評価基準は◎赤錆、白錆発生無し、○赤錆、白錆
微小発生、△赤錆発生小または白錆発生中、×赤錆発生
中または白錆発生大、××赤錆発生大とした。(a) Salt spray cycle test In order to investigate rust resistance, the test material was punched and subjected to a salt spray cycle test. The salt spray cycle test was carried out by spraying 5% saline solution at 35 ° C. for 8 hours and then resting for 16 hours for 3 cycles. The evaluation is performed visually, and the evaluation criteria are: ◎ no red rust, white rust, ○ red rust, small white rust, △ small red rust or small white rust, × red rust or large white rust, × × red rust Big
(b) 耐湿テスト 耐湿テストは供試材をそのまま60℃、90%RHの雰囲気中
で 240時間経時させた。評価は目視にて行ない、評価基
準は○赤錆、白錆、変色、黒錆発生無し、△赤錆、白
錆、黒錆発生無し、変色あり、×赤錆、白錆、変色、黒
錆発生ありとした。(b) Humidity resistance test For the humidity resistance test, the test material was aged for 240 hours in an atmosphere of 60 ° C and 90% RH as it was. Evaluation is performed visually, and the evaluation criteria are: ○ red rust, white rust, discoloration, black rust does not occur, △ red rust, white rust, black rust does not occur, discoloration, × red rust, white rust, discoloration, black rust occurrence did.
(c) 耐ホイスカーテスト 耐ホイスカーテストは供試材をφ100 ×30mmの円筒絞り
加工を行った後に、耐湿テスト同様の60℃、90%RHの雰
囲気中で3〜6ヶ月経時させた。評価は目視および走査
型電子顕微鏡にて行ない、評価基準は○ホイスカー発生
無し、×ホイスカー発生ありとした。(c) Whisker resistance test In the whisker resistance test, the test material was subjected to a cylindrical drawing of φ100 x 30 mm, and then aged for 3 to 6 months in the same atmosphere of 60 ° C and 90% RH as in the humidity resistance test. The evaluation was carried out visually and with a scanning electron microscope, and the evaluation criteria were ○ no whisker generation and x whisker generation.
(d) 半田濡れ性テスト 半田濡れ性テストは半田メニスカスの時間変化を記録す
る装置を用いてJIS規定のH63A半田およびフラックス
を使用し、供試材は前処理を行った後、濡れ性を試験し
た。評価は濡れ時間が3秒以内で濡れ面積が95%以上
であるものを○、それ以外のものを×とした。(d) Solder wettability test The solder wettability test uses a device that records the time change of the solder meniscus using JIS-specified H63A solder and flux, and the test material is tested for wettability after pretreatment. did. In the evaluation, those having a wetting time of 3 seconds or less and having a wetting area of 95% or more were evaluated as ◯, and other samples were evaluated as x.
(e) 半田広がりテスト 半田広がりテストはJIS規定のフラックス入りのH63A
半田を使用し、供試材は前処理エージングを行った後、
規定された温度(200〜230 ℃)に保持しその上に規定量
の半田を乗せ、規定時間後(約20秒)の半田の広がり
径を測定した。評価は広がり直径で規定以上であるもの
を○、それ以下のものを×とした。(e) Solder spread test Solder spread test is H63A containing JIS standard flux.
After using solder and pre-treatment aging of the test material,
The solder was held at a specified temperature (200 to 230 ° C.), a specified amount of solder was placed thereon, and the spread diameter of the solder was measured after a specified time (about 20 seconds). In the evaluation, those having a spread diameter greater than or equal to the regulation were rated as ◯, and those less than that were rated as x.
以上、テスト結果を第1表にまとめて示した。The test results are summarized in Table 1 above.
(発明の効果) 以上述べたように本発明は電子部品用途としての耐食
性、耐ホイスカー性、半田性等にバランス良く優れた性
能を有するものである。この発明により低コストの電子
部品用表面処理鋼板の供給を可能とするものである。 (Effects of the Invention) As described above, the present invention has excellent performance in a well-balanced manner in corrosion resistance, whisker resistance, solderability, etc. for use in electronic parts. This invention makes it possible to supply a low-cost surface-treated steel sheet for electronic parts.
第1図はSnメッキ量に対するZnの割合と錆発生率の関係
の一例を示す図、第2図はSn/Zn比率とホイスカーの発
生との関係の一例を示す図、第3図は本発明により得ら
れる電子部品用表面処理鋼板のメッキ層概念図を示す
図、第4図は第3図に示したメッキ層の表層からの断面
方向の各元素分布をGDSによって解析した図である。FIG. 1 is a diagram showing an example of the relationship between the ratio of Zn to the Sn plating amount and the rust occurrence rate, FIG. 2 is a diagram showing an example of the relationship between the Sn / Zn ratio and the occurrence of whiskers, and FIG. 3 is the present invention. FIG. 4 is a diagram showing a conceptual diagram of a plating layer of the surface-treated steel sheet for electronic parts obtained by the above, and FIG. 4 is a diagram in which the distribution of each element in the cross-sectional direction from the surface layer of the plating layer shown in FIG. 3 is analyzed by GDS.
Claims (1)
g/m2のNiメッキ、3.0 〜12.0 g/m2のSnメッキ、更に該
Snメッキ量の10〜25%のZnメッキを施した後、加熱
処理によって該メッキ層を合金化させて形成した、Sn−
Zn,Zn−Ni,Sn−Ni,Fe−Ni合金を主体とする合金皮膜
を有し、この合金皮膜上に金属Cr換算で1〜20mg/m2
のオキサイドクロムのみよりなるクロメート皮膜を有す
ることを特徴とする耐錆性、耐ホイスカー性並びに半田
性に優れた電子機器部品用表面処理鋼板。1. A surface of a steel sheet, in the order of 0.1 to 10.0 from the steel sheet side.
g / m 2 Ni plating, 3.0-12.0 g / m 2 Sn plating,
After applying 10 to 25% of the Sn plating amount of Zn plating, the plating layer is alloyed by heat treatment to form Sn-
It has an alloy film mainly composed of Zn, Zn-Ni, Sn-Ni and Fe-Ni alloys, and 1 to 20 mg / m 2 in terms of metallic Cr on this alloy film.
A surface-treated steel sheet for electronic device parts having excellent rust resistance, whisker resistance, and solderability, characterized by having a chromate film consisting only of oxide chromium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1092075A JPH0633466B2 (en) | 1989-04-12 | 1989-04-12 | Surface-treated steel sheet for electronic device parts with excellent rust resistance, whisker resistance, and solderability |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1092075A JPH0633466B2 (en) | 1989-04-12 | 1989-04-12 | Surface-treated steel sheet for electronic device parts with excellent rust resistance, whisker resistance, and solderability |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02270970A JPH02270970A (en) | 1990-11-06 |
| JPH0633466B2 true JPH0633466B2 (en) | 1994-05-02 |
Family
ID=14044335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1092075A Expired - Lifetime JPH0633466B2 (en) | 1989-04-12 | 1989-04-12 | Surface-treated steel sheet for electronic device parts with excellent rust resistance, whisker resistance, and solderability |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0633466B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3908912B2 (en) | 2001-02-22 | 2007-04-25 | 新日本製鐵株式会社 | Surface-treated steel sheet for environmentally friendly electronic components with excellent solder wettability, rust resistance, and whisker resistance |
| DE10251658B4 (en) * | 2002-11-01 | 2005-08-25 | Atotech Deutschland Gmbh | Method for connecting microstructured component layers suitable for the production of microstructure components and microstructured component |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0653957B2 (en) * | 1986-12-23 | 1994-07-20 | 新日本製鐵株式会社 | Method for manufacturing surface-treated steel sheet |
-
1989
- 1989-04-12 JP JP1092075A patent/JPH0633466B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02270970A (en) | 1990-11-06 |
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