JPH0638419Y2 - Substrate heating device for plasma CVD device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION Industrial Field The present invention relates to improvement of a substrate heating device in a loading chamber of a plasma CVD (chemical vapor deposition) device.

Prior art An in-line plasma CVD apparatus has a loading chamber (material preparation chamber), a process chamber (reaction chamber) and an unloading chamber (material removal chamber) that are connected in series in this order, and the substrate has this special atmosphere. Introduced into each of the groups, the predetermined processing is performed within the takt time. Particularly in the loading chimba, it is necessary to evacuate the inside of the chimba and heat the substrate from room temperature to about 400 ° C. within this limited tact time.
Due to this rapid heating, an infrared lamp heater has conventionally been installed in the chamber as shown in FIG.

Problems to be Solved by the Invention According to this conventional heating method, in the case of a double-row board, infrared rays are projected on one side of these boards, so that the board is on one side and the other side. There was a temperature difference from the side surface, and the substrate was warped due to rapid heating (shown in FIG. 3 '), which hindered film formation in the next step.

It is an object of the present invention to solve the above problems and to provide a heating device capable of uniformly heating both surfaces so that the substrate does not warp because it does not hinder film formation.

Means for Solving the Problems In order to achieve the above object, the structure of the present invention is as follows. A cart is allowed to travel on a guide rail provided in the loading chamber, and a pair of substrates are placed on the cart in an upright state in parallel in a vertical plane parallel to the traveling direction. In order to heat the other side surface, one row of bar-shaped infrared lamp heaters are provided on the chamber side wall side and one row is provided on the substrate facing surface side, and at least the heater on the substrate facing surface side is hung from above. The heater support member is supported via a holder, and the heater support member is provided with a plurality of holder insertion holes vertically, and a temperature detector for detecting the temperature at that position in the upper part of the chamber, and the temperature detector. A temperature setter that receives a temperature signal from the detector and outputs an electric signal according to the difference between the temperature and the set temperature, and an electric signal from the setter that adjusts the current from the power supply to the heater That the temperature regulating device comprising a power controller is that are provided.

With respect to the substrate which is erected on the cart and is conveyed, the infrared lamp heaters provided on both sides of the substrate heat the substrate so that both sides of the substrate are heated to substantially the same temperature. Then, the temperature of the heater is adjusted by the temperature adjusting device.

Embodiment Hereinafter, the present invention will be described based on an embodiment shown in the drawings.

1 and 2, in a loading chimba (hereinafter referred to as a chimba) 1, a cart 2 can travel on a guide rail 5 provided in the chimba via carrier wheels 2a. The cart 2 has a pair of substrates 3,
3 are placed in parallel upright.

A heater 4 is installed in the chimney 1 along the substrates 3, 3. Therefore, according to the present invention, the heater 4 is arranged on one side (the side wall of the chamber) of the substrates 3 and 3 and the one side heater row 4a.
And the other side heater array 4b arranged on the other side of the substrates 3 and 3 (substrate facing surface side). Each heater array is composed of a plurality of straight rod-shaped infrared heater tubes 41 arranged vertically in parallel. As shown in FIGS. 4 and 5, these heater tubes 41 are supported by a heater support member 6 suspended from above via a holder 7, and a large number of holders vertically inserted into the support member 6. The hole 6a is provided so that the mounting position of the heater tube 41 can be changed. Electric current is supplied to each of the heater tubes 41 through the main power supply line 8 and the branch line 8a.

As shown in FIG. 2, the heater 4 is a temperature adjusting device using a thermocouple (thermocouple) 11 installed on the upper part of the chain 1.
The current is adjusted by 10. That is, the temperature control device 10
Is a temperature detector 11 for detecting the temperature, as shown in FIG.
And a temperature setter 13 which outputs an electric signal according to the difference between the temperature and the set temperature by receiving the temperature signal from the detector, and a power source 15 to the heater 4 which receives the electric signal from the setter.
Power controller 14 for adjusting the supply current of

The temperature adjusting device 10 may be provided for each heater row so that the temperature can be adjusted for each row.

On the other hand, the temperature distribution in each row is adjusted by changing the insertion position of the holder 7 into the holder insertion hole 6a and changing the heater tube interval.

In the above, when the heater 4 is energized by the power source 15, the heater rows 4a and 4b are even in the rows and generate substantially the same amount of heat between the rows, and the inside of the chimney 1 is maintained at the set temperature. It Therefore, each of the substrates 3 and 3 receives uniform radiant heat from both sides and can be heated without bending as in the conventional case.

The rod-shaped heater tube 41 may have a linear shape, a circular shape, or a meandering shape.

Effect As described above, the present invention installs heaters using infrared lamps on one side and the other side of each board for a double-row board conveyed upright in the loading chamber. The substrate is heated from both sides, and a temperature detector for detecting the temperature at the position is provided in the upper part of the chamber, and an electric power is received according to the difference between the temperature and the set temperature by receiving the temperature signal from the temperature detector. There was provided a temperature adjusting device including a temperature setting device that outputs a signal and a power controller that receives an electric signal from the setting device and adjusts a current from a power source to the heater. Therefore, the substrate does not deform even if it is rapidly heated in a short time. Therefore, the subsequent plasma
It has no adverse effect on the CVD process. The temperature of the heater is adjusted by the adjusting device.

Moreover, the cart is allowed to travel on a guide rail provided in the loading chamber, and a pair of substrates are placed on the cart in an upright state in parallel in a vertical plane parallel to the traveling direction. In order to heat the side surface and the other side surface, one row of rod-shaped infrared lamp heaters are provided on the chamber side wall side and one row is provided on the substrate facing surface side, and at least the heater on the substrate facing surface side hangs down from above. The heater support member is supported via a holder, and the heater support member is provided with a large number of holder insertion holes vertically.

Therefore, the heat of the heater on the side wall of one chamber is shielded by one substrate and hardly affects the other substrate. Therefore, temperature control is easy. Further, since the opposing surface side heater is in one row and its mounting position can be changed, the uniformity of the heating state in this heater row can be adjusted.

[Brief description of drawings]

FIG. 1 is a front view showing an embodiment of the present invention, FIG. 2 is a side view, FIG. 3 is a front view of a conventional heating device, FIG. 4 is an enlarged front view of essential parts, and FIG. 5 is FIG. FIG. 6 is a block diagram of the temperature control device. 1 ... Loading chain, 2 ... Cart, 3 ... Substrate, 4 ... Heater, 41 ... Heater tube, 5 ... Guide rail, 6 ... Heater support member, 7 ... Holder, 10 ... Temperature control device

Claims (1)

[Scope of utility model registration request] 1. A cart is allowed to travel on a guide rail provided in a loading chamber, and a pair of substrates are mounted on the cart in an upright state in parallel in a vertical plane parallel to the traveling direction. In order to heat one side surface and the other side surface of the substrate, one row of rod-shaped infrared lamp heaters are provided on the side wall of the chamber, and one row of rod-shaped infrared lamp heaters are provided on the side of the substrate facing surface. A heater support member hung from above is supported via a holder, and the heater support member is provided with a plurality of holder insertion holes at the top and bottom, and a temperature detector for detecting the temperature at that position in the upper part of the chamber. And a temperature setter that receives an electric signal from the temperature detector and outputs an electric signal according to the difference between the temperature and the set temperature, and an electric signal from the setter to supply electric power to the heater. Substrate heating apparatus of a plasma CVD apparatus characterized by temperature control device comprising a power controller for adjusting the flow is provided.