JPH06503209A - 凹面状基板のための方法及び装置 - Google Patents

凹面状基板のための方法及び装置

Info

Publication number: JPH06503209A
Authority: JP; Japan
Prior art keywords: substrate; base; target material; concave; mask
Prior art date: 1991-03-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP4509669A

Other languages

English (en)

Japanese (ja)

Inventor

クルック，トーマス・エム

ポドゴルスキイ，セオドア・ジェイ

Original Assignee

ハネウエル・インコーポレーテッド

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-03-07

Filing date

1992-02-27

Publication date

1994-04-07

1992-02-27 Application filed by ハネウエル・インコーポレーテッド filed Critical ハネウエル・インコーポレーテッド

1994-04-07 Publication of JPH06503209A publication Critical patent/JPH06503209A/ja

Status Pending legal-status Critical Current

Links

239000000758 substrate Substances 0.000 title claims description 65
238000000034 method Methods 0.000 title claims description 37
239000000463 material Substances 0.000 claims description 26
239000013077 target material Substances 0.000 claims description 19
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
238000000151 deposition Methods 0.000 claims description 11
230000003287 optical effect Effects 0.000 claims description 11
238000004519 manufacturing process Methods 0.000 claims description 10
238000010884 ion-beam technique Methods 0.000 claims description 7
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 5
239000010408 film Substances 0.000 claims description 5
239000012528 membrane Substances 0.000 claims description 5
239000012788 optical film Substances 0.000 claims description 5
239000000377 silicon dioxide Substances 0.000 claims description 5
239000000126 substance Substances 0.000 claims description 5
239000000919 ceramic Substances 0.000 claims description 4
235000012239 silicon dioxide Nutrition 0.000 claims description 3
239000004408 titanium dioxide Substances 0.000 claims description 2
230000015572 biosynthetic process Effects 0.000 claims 3
238000004544 sputter deposition Methods 0.000 claims 3
241000723368 Conium Species 0.000 claims 1
230000000903 blocking effect Effects 0.000 claims 1
229910010293 ceramic material Inorganic materials 0.000 claims 1
230000001678 irradiating effect Effects 0.000 claims 1
239000004005 microsphere Substances 0.000 claims 1
MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
230000008021 deposition Effects 0.000 description 4
229910000831 Steel Inorganic materials 0.000 description 3
230000000694 effects Effects 0.000 description 3
229910052751 metal Inorganic materials 0.000 description 3
239000002184 metal Substances 0.000 description 3
239000010959 steel Substances 0.000 description 3
238000007740 vapor deposition Methods 0.000 description 3
239000006095 Cer-Vit Substances 0.000 description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
239000011248 coating agent Substances 0.000 description 2
238000000576 coating method Methods 0.000 description 2
238000005530 etching Methods 0.000 description 2
239000003292 glue Substances 0.000 description 2
238000001659 ion-beam spectroscopy Methods 0.000 description 2
RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
101100481787 Mus musculus Tob1 gene Proteins 0.000 description 1
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
241000190021 Zelkova Species 0.000 description 1
239000006094 Zerodur Substances 0.000 description 1
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
238000007792 addition Methods 0.000 description 1
238000003491 array Methods 0.000 description 1
238000000429 assembly Methods 0.000 description 1
230000000712 assembly Effects 0.000 description 1
239000011324 bead Substances 0.000 description 1
239000013078 crystal Substances 0.000 description 1
229910002026 crystalline silica Inorganic materials 0.000 description 1
238000000313 electron-beam-induced deposition Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
239000005350 fused silica glass Substances 0.000 description 1
239000011521 glass Substances 0.000 description 1
238000007737 ion beam deposition Methods 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
230000008018 melting Effects 0.000 description 1
238000002844 melting Methods 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
230000005855 radiation Effects 0.000 description 1
238000002310 reflectometry Methods 0.000 description 1
150000004760 silicates Chemical class 0.000 description 1
239000005361 soda-lime glass Substances 0.000 description 1
239000004575 stone Substances 0.000 description 1
239000010936 titanium Substances 0.000 description 1
229910052719 titanium Inorganic materials 0.000 description 1
OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
229910052726 zirconium Inorganic materials 0.000 description 1

Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
- G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only

Landscapes

Chemical & Material Sciences (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Lasers (AREA)

JP4509669A 1991-03-07 1992-02-27 凹面状基板のための方法及び装置 Pending JPH06503209A (ja)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US66613591A	1991-03-07	1991-03-07
US666,135		1991-03-07
PCT/US1992/001484 WO1992016014A2 (fr)	1991-03-07	1992-02-27	Procede de production de substrats concaves et dispositif conçu a cet effet

Publications (1)

Publication Number	Publication Date
JPH06503209A true JPH06503209A (ja)	1994-04-07

Family

ID=24672969

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP4509669A Pending JPH06503209A (ja)	1991-03-07	1992-02-27	凹面状基板のための方法及び装置

Country Status (2)

Country	Link
JP (1)	JPH06503209A (fr)
WO (1)	WO1992016014A2 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6197164B1 (en) *	1997-10-10	2001-03-06	International Business Machines Corporation	Method and apparatus to improve the uniformity of ion beam deposited films in an ion beam sputtering system
US6086727A (en) *	1998-06-05	2000-07-11	International Business Machines Corporation	Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system
US6783635B2 (en)	1999-12-09	2004-08-31	International Business Machines Corporation	Spin valve sensor free layer structure with a cobalt based layer that promotes magnetic stability and high magnetoresistance
DE102006024068A1 (de) *	2006-05-23	2007-11-29	Oerlikon Leybold Vacuum Gmbh	Beschichtungsanlage

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
FR1545890A (fr) *	1967-10-05	1968-11-15	Centre Nat Rech Scient	Perfectionnements aux procédés et dispositifs de projection de molécules et aux supports revêtus par les molécules ainsi projetées
GB1265834A (fr) *	1969-10-13	1972-03-08
US3900585A (en) *	1972-02-12	1975-08-19	Agency Ind Science Techn	Method for control of ionization electrostatic plating
USRE32849E (en) *	1978-04-13	1989-01-31	Litton Systems, Inc.	Method for fabricating multi-layer optical films
IT1224870B (it) *	1988-08-03	1990-10-24	Enea	Specchi per laser a riflettanza vaprocedimento per la produzione di riabile lungo il raggio

1992
- 1992-02-27 JP JP4509669A patent/JPH06503209A/ja active Pending
- 1992-02-27 WO PCT/US1992/001484 patent/WO1992016014A2/fr not_active Ceased

Also Published As

Publication number	Publication date
WO1992016014A2 (fr)	1992-09-17
WO1992016014A3 (fr)	1992-10-29

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