JPH0661017A - Semiconductor porcelain composition and method for producing the same - Google Patents
Semiconductor porcelain composition and method for producing the sameInfo
- Publication number
- JPH0661017A JPH0661017A JP4211589A JP21158992A JPH0661017A JP H0661017 A JPH0661017 A JP H0661017A JP 4211589 A JP4211589 A JP 4211589A JP 21158992 A JP21158992 A JP 21158992A JP H0661017 A JPH0661017 A JP H0661017A
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- varistor
- voltage
- mol
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- composition
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Abstract
(57)【要約】
【構成】 結晶粒内が Sr1-x-yCaxBayTizNbwCuuO3 (式
中、x,y,z,w及びuはそれぞれ、0.001≦x
≦0.250、0.001≦y≦0.250、0.99
00<z<1.3000、0.0001≦w≦0.01
00、0.0001≦u≦0.0100の範囲の値で、
かつz+w>1.0000の範囲の値)で示される組成
を有し、結晶粒界層近傍にさらにアルカリ金属が含まれ
ていることを特徴とする半導体磁器組成物。
【効果】 容量性バリスタに要求される大きい電圧非直
線係数α、低いバリスタ電圧、大きい絶縁抵抗、大きい
比誘電率及び小さい誘電損失の5つ条件を満足する半導
体磁器組成物及びその製造方法を提供し、その組成物か
ら製作された容量性バリスタは、高周波に対応した電
気、電子機器等に搭載される電気回路に使用することが
できる。(57) Abstract: [configuration] crystal grains Sr 1-xy Ca x Ba y Ti z Nb w Cu u O 3 ( wherein, x, y, z, respectively w and u, 0.001 ≦ x
≤ 0.250, 0.001 ≤ y ≤ 0.250, 0.99
00 <z <1.3000, 0.0001 ≦ w ≦ 0.01
00, a value in the range of 0.0001 ≦ u ≦ 0.0100,
And a composition represented by z + w> 1.0000), and further containing an alkali metal in the vicinity of the crystal grain boundary layer. [Effect] Provided are a semiconductor porcelain composition satisfying the five requirements of a large voltage non-linearity coefficient α, a low varistor voltage, a large insulation resistance, a large relative dielectric constant and a small dielectric loss required for a capacitive varistor, and a method for producing the same. However, the capacitive varistor manufactured from the composition can be used in an electric circuit mounted on electric and electronic devices corresponding to high frequency.
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体磁器組成物及びそ
の製造方法、より詳細には電子機器等において発生する
ノイズ、パルス、静電気等から電子部品及び電気回路を
保護するために利用される容量性バリスタを構成するた
めの半導体磁器組成物及びその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor porcelain composition and a method for producing the same, more specifically, a capacitor used to protect electronic components and electric circuits from noise, pulses, static electricity, etc. generated in electronic devices and the like. Relates to a semiconductor porcelain composition for forming a conductive varistor and a method for producing the same.
【0002】[0002]
【従来の技術】近年、コンピュータ及びOA機器等の情
報処理装置の普及にともない、これらデジタル機器が発
生するノイズによるIC、トランジスタ等の半導体部品
等の誤動作が問題となっている。また、半導体部品はサ
ージ、パルス、静電気等の高電圧で破壊され易いという
欠点があるので、電子回路バリスタ素子を組み込んで各
々の部品を保護することが行なわれている。2. Description of the Related Art In recent years, with the spread of information processing devices such as computers and OA devices, malfunctions of semiconductor parts such as ICs and transistors due to noise generated by these digital devices have become a problem. Further, since semiconductor parts have a drawback that they are easily destroyed by high voltage such as surge, pulse, static electricity, etc., electronic parts varistor elements are incorporated to protect each part.
【0003】バリスタとは印加電圧により抵抗値が非直
線的に変化する機能素子であり、その電圧−電流特性
は、A varistor is a functional element whose resistance value changes non-linearly according to the applied voltage, and its voltage-current characteristic is
【0004】[0004]
【数1】 [Equation 1]
【0005】で表わされる。ここでIは素子を流れる電
流値、Kはバリスタ固有係数、Vはバリスタ素子両端に
かかる電圧値、αは非直線性を示す係数(電圧非直線係
数)である。It is represented by Here, I is a current value flowing through the element, K is a varistor intrinsic coefficient, V is a voltage value applied across the varistor element, and α is a coefficient indicating non-linearity (voltage non-linear coefficient).
【0006】バリスタの評価は電圧非直線係数αで表わ
され、電圧非直線係数αが大きければ、それに伴いバリ
スタ効果も大きくなる。SiC系バリスタの電圧非直線
係数αは3から7、ZnO系バリスタの電圧非直線係数
αは50から100にもなる。しかし、SiC、ZnO
系等の従来のバリスタは静電容量が低いために、高周波
成分を持つノイズを殆ど吸収することができなかった。
他方、セラミックコンデンサの静電容量は、ZnO系バ
リスタの10倍から20倍程度と高く、このため前記ノ
イズ等の吸収、除去に利用されている。逆に高電圧には
弱くサージ等により破壊されるといった欠点を有してい
た。そこでZnO系バリスタとコンデンサを組み合わせ
て並列回路を構成し、コンデンサに高周波ノイズを吸収
させる一方バリスタで高電圧を吸収、除去することが行
われていたが、これは電子機器の小型化に反し、実装面
で非常に不利であった。そこで、1つの素子でコンデン
サ特性及びバリスタ特性の両機能を有する複合機能素子
として容量性バリスタが開発され、実用化されている。
容量性バリスタにはSrTiO3 系(特開昭56−36
103号公報)、Sr1-x Bax TiO3 系(特開昭5
9−92503号公報)等がある。これらの容量性バリ
スタは、Srを主成分とし、副成分として半導体化剤で
あるNb、Y、W、Ta、Dy等、電圧非直線係数改善
剤としてCu、Co、Mn、Ni、V等、焼結助剤であ
るSi、Al、B等を組み合わせて添加したものを還元
雰囲気中で焼成して磁器焼結体を得た後、この磁器焼結
体の結晶粒界に絶縁層を形成するために拡散物質として
Na化合物とB2 O3 、Sb2O3 、Bi2 O3 、Ti
O2 、MoO3 WO3 等が用いられている(特開昭61
−131501号公報)。また、半導体磁器コンデンサ
はSr1-x Cax TiO3 にNbあるいはMnを添加
し、結晶粒界にBi、Cu、Naを拡散させた組成物が
ある。The evaluation of the varistor is represented by the voltage non-linear coefficient α, and the larger the voltage non-linear coefficient α, the greater the varistor effect. The voltage nonlinear coefficient α of the SiC varistor is 3 to 7, and the voltage nonlinear coefficient α of the ZnO varistor is 50 to 100. However, SiC, ZnO
Since the conventional varistor such as a system has a low electrostatic capacity, it has hardly been able to absorb noise having a high frequency component.
On the other hand, the capacitance of the ceramic capacitor is as high as 10 to 20 times that of the ZnO-based varistor, and is therefore used for absorbing and removing the noise and the like. On the contrary, it had a defect that it was weak against high voltage and was destroyed by surges. Therefore, a ZnO-based varistor and a capacitor are combined to form a parallel circuit, and the capacitor absorbs high-frequency noise while the varistor absorbs and removes a high voltage, which is contrary to the miniaturization of electronic devices. It was extremely disadvantageous in terms of mounting. Therefore, a capacitive varistor has been developed and put into practical use as a multi-functional element having one element having both functions of a capacitor characteristic and a varistor characteristic.
For the capacitive varistor, SrTiO 3 system (JP-A-56-36) is used.
No. 103), Sr 1-x Ba x TiO 3 system (Japanese Patent Laid-Open No. Sho 5).
9-95203) and the like. These capacitive varistors have Sr as a main component, Nb, Y, W, Ta, Dy, etc., which are semiconducting agents as sub-components, Cu, Co, Mn, Ni, V, etc., as a voltage nonlinear coefficient improving agent, A sintering aid is added in combination with Si, Al, B, etc., is fired in a reducing atmosphere to obtain a porcelain sintered body, and then an insulating layer is formed at a crystal grain boundary of the porcelain sintered body. For this purpose, Na compounds and B 2 O 3 , Sb 2 O 3 , Bi 2 O 3 and Ti are used as diffusion substances.
O 2 , MoO 3 WO 3 and the like are used (Japanese Patent Laid-Open Publication No. 61-61160).
No. 131501). In addition, the semiconductor ceramic capacitor has a composition in which Nb or Mn is added to Sr 1-x Ca x TiO 3 and Bi, Cu, and Na are diffused in the crystal grain boundaries.
【0007】[0007]
【発明が解決しようとする課題】上記したような従来の
SrTiO3 系容量性バリスタは、バリスタ特性とコン
デンサ特性の両方の機能を持つ複合機能素子であり、か
つ小型であるという特徴をもつため、IC及びLSI等
が組み込まれる小型電子機器の保護に適している。しか
し、近年の半導体部品は動作電圧が低くなったと同時の
従来の半導体部品では破壊されなかった比較的低電圧の
パルス、静電気等で破壊されることがあり、そのような
半導体部品を有する高周波電子回路を保護する容量性バ
リスタとしては、より大きい電圧非直線係数α、低いバ
リスタ電圧及び大きい絶縁抵抗を有し、かつコンデンサ
として大きい比誘電率、小さい誘電損失を有するものが
望まれている。The conventional SrTiO 3 -based capacitive varistor as described above is a multi-functional element having both functions of varistor characteristics and capacitor characteristics, and is characterized by being small in size. It is suitable for protecting small electronic devices that incorporate ICs and LSIs. However, semiconductor components in recent years may be destroyed by relatively low-voltage pulses, static electricity, etc., which were not destroyed by conventional semiconductor components at the same time when the operating voltage became low. As a capacitive varistor for protecting a circuit, one having a larger voltage non-linearity coefficient α, a lower varistor voltage and a larger insulation resistance, and a capacitor having a large relative dielectric constant and a small dielectric loss is desired.
【0008】これまで、大きい比誘電率でかつ低いバリ
スタ電圧特性を得るためには、素体の肉厚を薄くする
か、あるいは結晶粒径を大きくするかのいずれかの方法
がとられていた。しかし、素体の肉厚を薄くする方法で
は強度が低下し、さらに絶縁抵抗が低下して素子が電気
的に破壊され易くなるために限界がある。また、結晶粒
径を大きくする方法では焼成時に異常粒が成長して均一
な結晶粒径が得られないので、電圧非直線係数αが低下
し、素子が電気的に破壊され易くなるという課題があっ
た。Up to now, in order to obtain a large relative dielectric constant and a low varistor voltage characteristic, either the wall thickness of the element body or the crystal grain size is increased. . However, the method of reducing the thickness of the element body has a limit because the strength is lowered, the insulation resistance is lowered, and the element is easily electrically broken. Further, in the method of increasing the crystal grain size, since abnormal grains grow during firing and a uniform crystal grain size cannot be obtained, the voltage non-linearity coefficient α decreases, and there is a problem that the element is easily broken electrically. there were.
【0009】本発明は上記した課題に鑑み発明さたもの
であって、低電圧で動作する半導体部品を搭載した高周
波電子・電子機器等に使用する容量性バリスタに要求さ
れる、大きい電圧非直線係数α、低いバリスタ電圧、大
きい絶縁抵抗、大きい比誘電率及び小さい誘電損失の5
つの条件を満足する容量性バリスタ用半導体磁器組成物
及びその製造方法を提供することを目的としている。The present invention has been made in view of the above problems, and it is a large voltage non-linearity required for a capacitive varistor used for high frequency electronic / electronic equipment etc. equipped with a semiconductor component operating at a low voltage. 5 with coefficient α, low varistor voltage, large insulation resistance, large relative permittivity and small dielectric loss
An object of the present invention is to provide a semiconductor porcelain composition for a capacitive varistor that satisfies one of the two conditions and a method for producing the same.
【0010】[0010]
【課題を解決するための手段】上記課題を解決するため
に鋭意研究した結果、ABO3 で示されるペロブスカイ
ト型の結晶構造を有する半導体磁器は、非化学量論組成
比([A]/[B]比)の極僅かな変動により電圧非直
線係数α、バリスタ電圧、絶縁抵抗、比誘電率及び誘電
損失が変化するという知見が得られた。本発明は上記目
的を達成するために、前記知見に基づいてなされた発明
であって、課題を解決するために本発明に係る半導体磁
器組成物は、結晶粒内が Sr1-x-yCaxBayTizNbwCuuO3
(式中、x,y,z,w及びuはそれぞれ、0.001
≦x≦0.250、0.001≦y≦0.250、0.
9900<z<1.3000、0.0001≦w≦0.
0100、0.0001≦u≦0.0100の範囲の値
で、かつz+w>1.0000の範囲の値)で示される
組成を有し、結晶粒界層近傍にさらにアルカリ金属が含
まれていることを特徴としている。As a result of earnest research to solve the above problems, a semiconductor ceramic having a perovskite type crystal structure represented by ABO 3 has a non-stoichiometric composition ratio ([A] / [B ] It was found that the voltage non-linearity coefficient α, varistor voltage, insulation resistance, relative permittivity and dielectric loss change due to a slight variation in the ratio. In order to achieve the above-mentioned object, the present invention is an invention made based on the above-mentioned findings, and in order to solve the problem, the semiconductor porcelain composition according to the present invention has an Sr 1-xy Ca x Ba y Ti z Nb w Cu u O 3
(In the formula, x, y, z, w, and u are each 0.001
≤ x ≤ 0.250, 0.001 ≤ y ≤ 0.250, 0.
9900 <z <1.3000, 0.0001 ≦ w ≦ 0.
0100, a value in the range of 0.0001 ≦ u ≦ 0.0100 and a value in the range of z + w> 1.0000), and an alkali metal is further included near the grain boundary layer. It is characterized by that.
【0011】また、上記の半導体磁器組成物の製造方法
においては、SrCO3 、CaCO3 及びBaCO3 の合計量が10
0.00molに対して、TiO2を99.00〜130.
00mol、Nb2O5 を0.01〜1.01molの範囲
内の量で、かつ前記TiO2と前記Nb2O5 の合計が100m
olを超える量と、CuO を0.01mol〜1.00m
olの量の比で混合して半導体化焼成を行い、焼成後の
焼結体にアルカリ金属が含まれている金属酸化物を塗布
し、粒界絶縁化焼成することを特徴としている。Further, in the above-mentioned method for producing a semiconductor porcelain composition, the total amount of SrCO 3 , CaCO 3 and BaCO 3 is 10%.
With respect to 0.00 mol, TiO 2 is from 99.00 to 130.
00 mol, Nb 2 O 5 in an amount in the range of 0.01 to 1.01 mol, and the total of TiO 2 and Nb 2 O 5 is 100 m.
ol and 0.01 mol to 1.00 m of CuO
It is characterized in that the mixture is mixed at a ratio of the amount of ol to carry out semiconducting firing, and a metal oxide containing an alkali metal is applied to the sintered body after firing and grain boundary insulating firing is performed.
【0012】[0012]
【作用】半導体磁器組成物は、還元雰囲気中における半
導体化焼成工程で結晶粒内が半導体化され、かつ結晶粒
の成長が行われ、粒界絶縁化焼成工程で結晶粒内への金
属酸化物の熱拡散及び結晶粒界の形成が同時に行われ
て、粒界層を形成する。In the semiconductor porcelain composition, the inside of the crystal grains is made into a semiconductor in the step of semiconducting firing in a reducing atmosphere, and the crystal grains are grown. Thermal diffusion and formation of crystal grain boundaries are simultaneously performed to form a grain boundary layer.
【0013】一般に、還元雰囲気焼成により得られる半
導体磁器は、異常粒成長が生じ易く混粒組織になりやす
いので電流の流れる方向の結晶粒界数が場所によって異
なる傾向があり、各結晶粒界層の厚さや組成分布にばら
つきを生じ易い。そこで、主成分の磁器材料と粒界絶縁
化のための金属酸化物を組み合わせることによって、大
きい電圧非直線係数α、低いバリスタ電圧、大きい絶縁
抵抗、大きい比誘電率及び小さい誘電損失の5つの条件
を満足する容量性バリスタ用半導体磁器組成物を実現し
た。Generally, in a semiconductor ceramic obtained by firing in a reducing atmosphere, abnormal grain growth is likely to occur and a mixed grain structure is likely to occur, so that the number of crystal grain boundaries in the direction of current flow tends to vary depending on the location. Variations in the thickness and composition distribution of the Therefore, by combining a main component porcelain material and a metal oxide for grain boundary insulation, five conditions of a large voltage nonlinear coefficient α, a low varistor voltage, a large insulation resistance, a large relative permittivity and a small dielectric loss are set. A semiconductor porcelain composition for a capacitive varistor that satisfies the above requirements has been realized.
【0014】各成分を請求範囲のように限定したのは、
Sr1-x-yCaxBayTizNbwCuuO3 のxの値が、0.001≦
x≦0.250の範囲外では、誘電損失が大きくなる。
一方、yの値が、0.001未満では、絶縁抵抗が小さ
くなり、yの値が0.250を超えると電圧非直線係数
αが小さくなる。zの値が0.9900以下では比誘電
率が小さくなり、zの値が1.3000以上では絶縁抵
抗と電圧非直線係数が小さくなる。wの値が0.000
1未満ではバリスタ電圧が高く、さらに誘電損失も大き
くなり、wの値が0.0101を超えると絶縁抵抗が小
さくなる。uの値が0.0001未満では絶縁抵抗が小
さくなり、uの値が0.0200を超えると誘電損失が
大きくなる。また、z+wの値を限定したのは、z+w
の値が1.0000以下では誘電損失が大きく、さらに
電圧非直線係数が小さくなるからである。さらに、アル
カリ金属は粒内に拡散して高抵抗の拡散層を形成し、電
圧非直線係数αの改善に寄与する。The limitation of each component as in the claims is that
The value of Sr 1-xy Ca x Ba y Ti z Nb w Cu u O 3 of x, 0.001 ≦
The dielectric loss becomes large outside the range of x ≦ 0.250.
On the other hand, when the value of y is less than 0.001, the insulation resistance becomes small, and when the value of y exceeds 0.250, the voltage nonlinear coefficient α becomes small. When the value of z is 0.9900 or less, the relative dielectric constant is small, and when the value of z is 1.3000 or more, the insulation resistance and the voltage non-linearity coefficient are small. The value of w is 0.000
If it is less than 1, the varistor voltage is high and the dielectric loss is large, and if the value of w exceeds 0.0101, the insulation resistance is small. When the value of u is less than 0.0001, the insulation resistance becomes small, and when the value of u exceeds 0.0200, the dielectric loss becomes large. In addition, the value of z + w is limited to z + w
When the value of is less than 1.0000, the dielectric loss is large and the voltage nonlinearity coefficient is small. Further, the alkali metal diffuses in the grains to form a high resistance diffusion layer, which contributes to the improvement of the voltage nonlinear coefficient α.
【0015】[0015]
【実施例】以下、本発明に係る半導体磁器組成物及びそ
の製造方法の実施例を説明する。EXAMPLES Examples of the semiconductor ceramic composition and the method for producing the same according to the present invention will be described below.
【0016】まず、セラミックス合成のための原料とし
てSrCO3、 CaCO3、 BaCO3、 TiO2、Nb2O5、CuO を表1に
示した割合で調合を行う。また、SiO2またはAl2O3 から
選ばれた1種または2種を適当量加える。調合は各原料
を正確に秤量し、適量の玉石、分散剤、純水とともにポ
ットミル内で24時間混合を行う。混合されたスラリー
状の原料を脱水乾燥させ、解砕する。この解砕粉を例え
ばジルコニア製の焼成ルツボ内に移し、1100℃で仮
焼合成を行う。所定の固溶体が合成されていることをX
線解析、組成分析等で確認した。First, SrCO 3 , CaCO 3 , BaCO 3, TiO 2 , Nb 2 O 5 and CuO are mixed at the ratios shown in Table 1 as raw materials for ceramics synthesis. Further, one or two kinds selected from SiO 2 or Al 2 O 3 is added in an appropriate amount. For the compounding, each raw material is accurately weighed and mixed with an appropriate amount of boulders, a dispersant, and pure water in a pot mill for 24 hours. The mixed slurry-like raw materials are dehydrated and dried and crushed. The crushed powder is transferred into a firing crucible made of, for example, zirconia, and calcination synthesis is performed at 1100 ° C. X that the prescribed solid solution has been synthesized
It was confirmed by line analysis and composition analysis.
【0017】次に仮焼合成粉を解砕し、1.0μm前後
の均一粉に整粒する。この粉末に有機バインダー等を添
加して直径10mm,厚み500μmの円板形状に加圧成
形し、1000℃で脱脂する。この脱脂体を例えばアル
ミナ製の焼成ルツボに充てんし、還元雰囲気中で半導体
化焼成し、半導体化した焼結体を得る。半導体化焼成
は、水素1〜15%、窒素85〜99%の混合ガス雰囲
気中で1380〜1550℃の温度範囲内で2.0〜
8.0時間焼成する。次に得られた焼結体を十分洗浄し
た後、表面に粒界絶縁化のための金属酸化物ペーストを
塗布し、乾燥する。ここで、金属酸化物ペーストは、Li
2CO3を含む組成物を混練ペースト状にしたものを使用
し、その塗布量は焼結体1gあたり20〜100 mg程度と
する。金属酸化物ペーストが塗布された焼結体を大気中
にて950〜1300℃の温度範囲内で0.5〜4.0
時間焼成し、焼結体の粒界が絶縁化され半導体磁器組成
物を得る。Next, the calcined synthetic powder is crushed and sized to a uniform powder of about 1.0 μm. An organic binder or the like is added to this powder, which is pressure-molded into a disk shape having a diameter of 10 mm and a thickness of 500 μm, and degreased at 1000 ° C. The degreased body is filled in, for example, a firing crucible made of alumina, and is semiconducting and firing in a reducing atmosphere to obtain a semiconducting sintered body. The semiconducting firing is performed in a temperature range of 1380 to 1550 ° C. in a mixed gas atmosphere of 1 to 15% hydrogen and 85 to 99% nitrogen, and
Bake for 8.0 hours. Next, after thoroughly washing the obtained sintered body, a metal oxide paste for insulating the grain boundaries is applied to the surface and dried. Here, the metal oxide paste is Li
A composition containing 2 CO 3 in the form of a kneading paste is used, and the coating amount is about 20 to 100 mg per 1 g of the sintered body. The sintered body to which the metal oxide paste is applied is 0.5 to 4.0 in the temperature range of 950 to 1300 ° C. in the atmosphere.
After firing for a time, the grain boundaries of the sintered body are insulated to obtain a semiconductor ceramic composition.
【0018】さらに前記半導体磁器組成物の特性を調べ
るために、その両面に銀ペーストを塗布し、800℃の
温度で焼き付けを行ない、電極を形成して素子を完成す
る。Further, in order to examine the characteristics of the semiconductor porcelain composition, silver paste is applied to both surfaces thereof and baked at a temperature of 800 ° C. to form electrodes to complete the device.
【0019】完成した半導体磁器組成物の評価は、次の
ように行なった。The evaluation of the completed semiconductor porcelain composition was performed as follows.
【0020】電気的特性は、見かけの比誘電率εapp 、
誘電損失DF(%)をインピ−ダンスアナライザで,絶
縁抵抗IR(Ω)は直流定電圧電源を用いて評価した。
見かけの比誘電率εapp はAC1kHz、印加電圧 1V
で測定した静電容量の値と素子の寸法から算出した値で
ある。誘電損失DF(%)は、AC1kHz、印加電圧
1Vで測定した値である。また、絶縁抵抗IR(Ω)は
半導体磁器組成物の両面の電極間に直流電圧25Vを印加
し、1分間に流れる電流を測定し、その値から算出した
値である。電圧非直線係数α及びバリスタ電圧V1mA は
1Vから100Vまで5V毎に1秒間電圧を印加したと
きの電流を測定して得られた電流−電圧曲線から計算し
た。The electrical characteristics are the apparent relative permittivity ε app ,
The dielectric loss DF (%) was evaluated with an impedance analyzer, and the insulation resistance IR (Ω) was evaluated with a DC constant voltage power supply.
Apparent relative permittivity ε app is AC1kHz, applied voltage 1V
It is a value calculated from the capacitance value measured in step 1 and the dimensions of the element. The dielectric loss DF (%) is a value measured at AC 1 kHz and applied voltage 1V. The insulation resistance IR (Ω) is a value calculated by applying a DC voltage of 25 V between the electrodes on both sides of the semiconductor porcelain composition, measuring the current flowing for 1 minute, and calculating the value. The voltage non-linearity coefficient α and the varistor voltage V 1mA were calculated from the current-voltage curve obtained by measuring the current when a voltage was applied every 5 V for 1 second from 1 V to 100 V.
【0021】[0021]
【表1】 [Table 1]
【0022】[0022]
【表1の2】 [2 in Table 1]
【0023】[0023]
【表1の3】 [3 in Table 1]
【0024】[0024]
【表1の4】 [4 in Table 1]
【0025】[0025]
【表1の5】 [5 in Table 1]
【0026】[0026]
【表1の6】 [6 in Table 1]
【0027】表1の電気的特性のデータは、同一ロット
から半導体磁器組成物を無作為に100個取り出し、そ
れらの平均値を示している。表1から明らかなように、
本発明に係る半導体磁器組成物及びその製造方法によれ
ば、見かけの比誘電率εappが1.0×104 以上で、
かつ、絶縁抵抗IRが3.0×106 Ω以上、さらに、
誘電損失DFの値も1.5%以下であるのでコンデンサ
として機能を満たしていることが確認できた。The data on the electrical characteristics in Table 1 show the average value of 100 randomly taken semiconductor porcelain compositions from the same lot. As is clear from Table 1,
According to the semiconductor porcelain composition and the method for producing the same according to the present invention, the apparent relative permittivity ε app is 1.0 × 10 4 or more,
Moreover, the insulation resistance IR is 3.0 × 10 6 Ω or more,
Since the value of the dielectric loss DF is also 1.5% or less, it was confirmed that the function as a capacitor was satisfied.
【0028】また、バリスタ特性は、電圧非直線係数α
が10以上であり、バリスタ電圧V 1mA は100V以
下、絶縁耐圧はDC200V以上であった。尚、実施例
では金属酸化物としてLi2CO3を含む組成物を混練ぺース
ト状にした金属酸化物ペーストを使用したが、アルカリ
金属(K、Na、Rb等)が含まれている化合物または
混合物を含む金属酸化物であればよい。The varistor characteristic has a voltage nonlinear coefficient α
Is 10 or more, and the varistor voltage V 1mA Is 100V or more
The lower withstand voltage was DC 200 V or higher. Example
Then as a metal oxide, Li2CO3Kneading composition containing
I used a metal oxide paste in the shape of a tongue
A compound containing a metal (K, Na, Rb, etc.) or
Any metal oxide containing a mixture may be used.
【0029】[0029]
【発明の効果】以上詳述したように本発明に係る半導体
磁器組成物にあっては、結晶粒内が Sr1-x-yCaxBayTizN
bwCuuO3 (式中、x,y,z,w及びuはそれぞれ、
0.001≦x≦0.250、0.001≦y≦0.2
50、0.9900<z<1.3000、0.0001
≦w≦0.0101、0.0001≦u≦0.0100
の範囲の値で、かつz+w>1.0000の範囲の値)
で示される組成を有し、結晶粒界層近傍にさらにアルカ
リ金属が含まれているので、大きい電圧非直線係数α、
低いバリスタ電圧、大きい絶縁抵抗、大きい比誘電率及
び小さい誘電損失の5つ条件を満足する容量性バリスタ
用半導体磁器組成物が得られる。As described above in detail, in the semiconductor ceramic composition according to the present invention, the inside of the crystal grains is Sr 1-xy Ca x Ba y Ti z N
b w Cu u O 3 (where x, y, z, w and u are respectively
0.001 ≤ x ≤ 0.250, 0.001 ≤ y ≤ 0.2
50, 0.9900 <z <1.3000, 0.0001
≦ w ≦ 0.0101, 0.0001 ≦ u ≦ 0.0100
Value in the range of z + w> 1.0000)
Since it has a composition shown by and further contains an alkali metal in the vicinity of the grain boundary layer, a large voltage nonlinear coefficient α,
A semiconductor porcelain composition for a capacitive varistor satisfying the five conditions of low varistor voltage, high insulation resistance, high relative permittivity and low dielectric loss can be obtained.
【0030】また、上記記載の半導体磁器組成物の製造
方法において、SrCO3 とCaCO3 及びBaCO3 の合計量が1
00.00molに対して、TiO2を99.00〜13
0.00mol、Nb2O5 を0.01mol〜1.01m
olの範囲内の量で、かつ前記TiO2と前記Nb2O5 の合計
が100molを超える量と、CuO を0.01mol〜
1.00molの量の比で混合して半導体化焼成を行
い、焼成後の焼結体にアルカリ金属が含まれている金属
酸化物を塗布し、粒界絶縁化焼成するので、従来プロセ
スを損なうことなく、コンデンサ特性とバリスタ特性と
の双方に優れた半導体磁器組成物を製造することができ
る。Further, in the above-mentioned method for producing a semiconductor porcelain composition, the total amount of SrCO 3 , CaCO 3 and BaCO 3 is 1
With respect to 00.00 mol, TiO 2 is 99.00 to 13
0.00 mol, 0.01 mol to 1.01 m of Nb 2 O 5
and an amount within the range of ol, in which the total amount of TiO 2 and Nb 2 O 5 exceeds 100 mol, and CuO is 0.01 mol to
The mixture is mixed at a ratio of 1.00 mol to perform semiconductor firing, and the sintered body after firing is coated with a metal oxide containing an alkali metal and subjected to grain boundary insulation firing, which impairs the conventional process. Without this, it is possible to manufacture a semiconductor porcelain composition having both excellent capacitor characteristics and varistor characteristics.
【0031】従って、本発明は容量性バリスタに要求さ
れる大きい電圧非直線係数α、低いバリスタ電圧、大き
い絶縁抵抗、大きい比誘電率及び小さい誘電損失の5つ
の条件を満足する半導体磁器組成物及びその製造方法を
提供し、その組成物から製作された容量性バリスタは、
高周波に対応した電気、電子機器等に搭載される電気回
路に使用することができる。Therefore, the present invention provides a semiconductor porcelain composition and a semiconductor porcelain composition which satisfy the five requirements of a large voltage non-linearity coefficient α, a low varistor voltage, a large insulation resistance, a large relative dielectric constant and a small dielectric loss required for a capacitive varistor. A capacitive varistor, which provides the manufacturing method and is made from the composition,
It can be used for electric circuits that are mounted on electric and electronic devices that support high frequencies.
Claims (2)
(式中、x,y,z,w及びuはそれぞれ、0.001
≦x≦0.250、0.001≦y≦0.250、0.
9900<z<1.3000、0.0001≦w≦0.
0101、0.0001≦u≦0.0100の範囲の値
で、かつ、z+w>1.0000の範囲の値)で示され
る組成を有し、結晶粒界層近傍にさらにアルカリ金属が
含まれていることを特徴とする半導体磁器組成物。1. The crystal grains are Sr 1-xy Ca x Ba y Ti z Nb w Cu u O 3
(In the formula, x, y, z, w, and u are each 0.001
≤ x ≤ 0.250, 0.001 ≤ y ≤ 0.250, 0.
9900 <z <1.3000, 0.0001 ≦ w ≦ 0.
0101, 0.0001 ≦ u ≦ 0.0100, and z + w> 1.0000), and further contains an alkali metal near the crystal grain boundary layer. A semiconductor porcelain composition characterized by being present.
00.00molに対して、TiO2を99.00〜13
0.00mol、Nb2O5 を0.01〜1.01molの
範囲内の量で、かつ前記TiO2と前記Nb2O5 の合計が10
0molを超える量と、CuO を0.01mol〜1.0
0molの量の比で混合して半導体化焼成を行い、焼成
後の焼結体にアルカリ金属が含まれている金属酸化物を
塗布し、粒界絶縁化焼成することを特徴とする請求項1
記載の半導体磁器組成物の製造方法。2. The total amount of SrCO 3 , CaCO 3 and BaCO 3 is 1
With respect to 00.00 mol, TiO 2 is 99.00 to 13
0.00 mol, Nb 2 O 5 in an amount within the range of 0.01 to 1.01 mol, and the total of TiO 2 and Nb 2 O 5 is 10
If the amount exceeds 0 mol and CuO is 0.01 mol to 1.0
2. The mixture is mixed in an amount ratio of 0 mol to perform semiconducting firing, the metal oxide containing an alkali metal is applied to the fired sintered body, and the grain boundary insulating firing is performed.
A method for producing the semiconductor porcelain composition described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4211589A JP2713040B2 (en) | 1992-08-07 | 1992-08-07 | Semiconductor porcelain composition and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4211589A JP2713040B2 (en) | 1992-08-07 | 1992-08-07 | Semiconductor porcelain composition and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0661017A true JPH0661017A (en) | 1994-03-04 |
| JP2713040B2 JP2713040B2 (en) | 1998-02-16 |
Family
ID=16608272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4211589A Expired - Fee Related JP2713040B2 (en) | 1992-08-07 | 1992-08-07 | Semiconductor porcelain composition and method for producing the same |
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| Country | Link |
|---|---|
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2006927A2 (en) | 2007-06-20 | 2008-12-24 | Canon Kabushiki Kaisha | Piezoelectric material |
-
1992
- 1992-08-07 JP JP4211589A patent/JP2713040B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2006927A2 (en) | 2007-06-20 | 2008-12-24 | Canon Kabushiki Kaisha | Piezoelectric material |
| US8480918B2 (en) | 2007-06-20 | 2013-07-09 | Canon Kabushiki Kaisha | Piezoelectric material |
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| Publication number | Publication date |
|---|---|
| JP2713040B2 (en) | 1998-02-16 |
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