JPH0668147B2 - 薄膜記憶ディスクおよび方法 - Google Patents

薄膜記憶ディスクおよび方法

Info

Publication number
JPH0668147B2
JPH0668147B2 JP61501389A JP50138986A JPH0668147B2 JP H0668147 B2 JPH0668147 B2 JP H0668147B2 JP 61501389 A JP61501389 A JP 61501389A JP 50138986 A JP50138986 A JP 50138986A JP H0668147 B2 JPH0668147 B2 JP H0668147B2
Authority
JP
Japan
Prior art keywords
substrate
target
deposit
baffle
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61501389A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62501978A (ja
Inventor
エイチ． エルターキー，アテフ
シー． プライス，リツク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TORIMEDEIA CORP
Original Assignee
TORIMEDEIA CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/706,737 external-priority patent/US4604179A/en
Priority claimed from US06/814,229 external-priority patent/US4816127A/en
Application filed by TORIMEDEIA CORP filed Critical TORIMEDEIA CORP
Publication of JPS62501978A publication Critical patent/JPS62501978A/ja
Publication of JPH0668147B2 publication Critical patent/JPH0668147B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP61501389A 1985-02-28 1986-02-26 薄膜記憶ディスクおよび方法 Expired - Lifetime JPH0668147B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US06/706,737 US4604179A (en) 1985-02-28 1985-02-28 Sputtering-system baffle
US706737 1985-12-27
US06/814,229 US4816127A (en) 1984-11-15 1985-12-27 Method of producing thin-film storage disk
US814229 1985-12-27
PCT/US1986/000414 WO1986005214A1 (en) 1985-02-28 1986-02-26 Thin-film storage disk and method

Publications (2)

Publication Number Publication Date
JPS62501978A JPS62501978A (ja) 1987-08-06
JPH0668147B2 true JPH0668147B2 (ja) 1994-08-31

Family

ID=27107747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61501389A Expired - Lifetime JPH0668147B2 (ja) 1985-02-28 1986-02-26 薄膜記憶ディスクおよび方法

Country Status (4)

Country Link
EP (1) EP0213191A4 (de)
JP (1) JPH0668147B2 (de)
CA (1) CA1261465A (de)
WO (1) WO1986005214A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0222459A3 (de) * 1985-11-15 1989-08-23 Komag, Inc. Roboterartiges Plattenhandhabungssystem und Methode
JPH0827927B2 (ja) * 1987-07-09 1996-03-21 富士通株式会社 磁気記録媒体

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1511664A (fr) * 1966-12-23 1968-02-02 Commissariat Energie Atomique Couches minces à fort champ coercitif
US3904503A (en) * 1974-05-31 1975-09-09 Western Electric Co Depositing material on a substrate using a shield
JPS57109127A (en) * 1980-12-05 1982-07-07 Matsushita Electric Ind Co Ltd Magnetic recording medium
US4381453A (en) * 1980-12-31 1983-04-26 International Business Machines Corporation System and method for deflecting and focusing a broad ion beam
CA1155798A (en) * 1981-03-30 1983-10-25 Shmuel Maniv Reactive deposition method and apparatus
US4362611A (en) * 1981-07-27 1982-12-07 International Business Machines Corporation Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
US4416759A (en) * 1981-11-27 1983-11-22 Varian Associates, Inc. Sputter system incorporating an improved blocking shield for contouring the thickness of sputter coated layers
US4552820A (en) * 1984-04-25 1985-11-12 Lin Data Corporation Disc media

Also Published As

Publication number Publication date
WO1986005214A1 (en) 1986-09-12
JPS62501978A (ja) 1987-08-06
EP0213191A1 (de) 1987-03-11
EP0213191A4 (de) 1988-04-27
CA1261465A (en) 1989-09-26

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