JPH0675110A - Production of black matrix substrate - Google Patents

Abstract

(57) [Abstract] [Purpose] A black matrix substrate with high dimensional accuracy and excellent light-shielding properties that can be used in flat displays such as liquid crystal displays, imagers such as CCDs, or color filters such as color sensors at low cost. Provided is a manufacturing method capable of manufacturing. [Structure] A photosensitive resist layer containing a hydrophilic resin is formed on a transparent substrate, and the photosensitive resist layer is exposed and developed through a photomask having a black matrix pattern to form a relief on the transparent substrate. After forming and subjecting this transparent substrate to heat treatment, the relief is brought into contact with an aqueous solution of a metal compound serving as a catalyst for electroless plating and washed with water.
It is dried to a catalyst-containing relief, and then the catalyst-containing relief is brought into contact with an electroless plating solution to form a black relief having a black matrix pattern.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a black matrix substrate, and more particularly to a method for manufacturing a black matrix substrate having high dimensional accuracy and excellent light-shielding property.

[0002]

2. Description of the Related Art In recent years, monochrome or color liquid crystal displays have been attracting attention as flat displays. The liquid crystal display includes an active matrix system and a simple matrix system for controlling the three primary colors, and a color filter is used in each system. In the liquid crystal display, the constituent pixel portions have three primary colors (R, G, B), and the electrical switching of the liquid crystal controls the transmission of each light of the three primary colors to perform color display.

This color filter is formed by forming each colored layer, a protective layer and a transparent electrode layer on a transparent substrate. Then, in order to improve the coloring effect and the display contrast, a pattern (black matrix) having a light-shielding property is formed at the boundary portion of each pixel of R, G and B of the colored layer. Further, in an active matrix type liquid crystal display, since a thin film transistor (TFT) is used as a switching element, it is necessary to suppress light leak current. Therefore, the black matrix is required to have a high light-shielding property.

Conventionally, as the black matrix, a vapor-deposited chrome thin film is photo-etched to form a relief, a hydrophilic resin relief is dyed, a relief formed using a photosensitive solution in which a black pigment is dispersed, and a black electrodeposition. Some were formed by electrodeposition of paint, some were formed by printing, and the like.

[0005]

However, although the above-mentioned relief formed by photoetching the vapor-deposited chromium thin film has high dimensional accuracy, it requires a vacuum film-forming step such as vapor deposition or sputtering, and the manufacturing process. The manufacturing cost is high because of the complicated structure, and it is necessary to suppress the reflectance of chrome in order to increase the display contrast under strong external light. Therefore, the manufacturing cost is further increased. Had to do. Further, the method using the photosensitive resist in which the above black dye or pigment is dispersed,
Although the manufacturing cost is low, there is a problem in that a high quality black matrix cannot be obtained because the photoprocess is likely to be insufficient due to the black color of the photosensitive resist, and it is difficult to obtain sufficient light shielding properties. Further, in the black matrix formation by the above-mentioned printing method, although the manufacturing cost can be reduced, there is a problem that the dimensional accuracy is low.

The present invention has been made in view of the above circumstances, and has a high dimensional accuracy and can be used for a flat display such as a liquid crystal display, an imager such as a CCD, or a color filter such as a color sensor. An object of the present invention is to provide a manufacturing method capable of manufacturing a black matrix substrate having excellent properties at low cost.

[0007]

In order to achieve such an object, the present invention provides a photosensitive resist layer containing a hydrophilic resin formed on a transparent substrate through a photomask having a black matrix pattern. After exposing and developing, a relief is formed on the transparent substrate, the transparent substrate is heat-treated, and then an aqueous solution of a metal compound that serves as a catalyst for electroless plating is brought into contact with the relief, washed with water and dried to contain a catalyst. A relief was formed, and then the catalyst-containing relief was brought into contact with an electroless plating solution to form a black relief having a black matrix pattern.

[0008]

Function: The relief for the black matrix formed on the transparent substrate is electroless plated to deposit and grow the metal. Prior to this electroless plating, the transparent substrate on which the relief is formed is first subjected to heat treatment. When the relief is applied, the dry state of the relief becomes uniform, and the aqueous solution of the metal compound, which serves as a catalyst for electroless plating, uniformly penetrates into the relief. The hydrogen gas generated as a side reaction during electrolytic plating can be controlled. As a result, the metal particles are substantially uniformly deposited on the entire relief, and the relief adheres to the transparent substrate in a good state without floating or peeling. The formed black matrix substrate has high optical density and low reflectance and good dimensional accuracy. Further, since a vacuum process or the like is unnecessary, the manufacturing cost can be reduced.

[0009]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view showing an example of an active matrix type liquid crystal display (LCD) using a black matrix substrate manufactured according to the present invention, and FIG. 2 is a schematic sectional view of the same. 1 and 2, the LCD 1 has a color filter 10 and a transparent glass substrate 20 which are opposed to each other with a sealing material 30 in between, and a thickness of about 5 to 1 made of twisted nematic (TN) liquid crystal between them.
A liquid crystal layer 40 having a thickness of about 0 μm is formed, and polarizing plates 50 and 5 are provided outside the color filter 10 and the transparent glass substrate 20.
1 is provided and configured.

FIG. 3 is an enlarged partial sectional view of the color filter 10. In FIG. 3, the color filter 10 comprises a black relief (black matrix) 14 on a transparent substrate 13.
Forming a black matrix substrate 12 and a black matrix 14 of the black matrix substrate 12.
The colored layer 16 formed between them, and the protective layer 18 provided so as to cover the black matrix 14 and the colored layer 16.
And a transparent electrode 19. The color filter 10 is arranged such that the transparent electrode 19 is located on the liquid crystal layer 40 side. The colored layer 16 is the red pattern 16
It is composed of R, green pattern 16G, and blue pattern 16B, and the array of each colored pattern is a mosaic array as shown in FIG. The arrangement of the coloring pattern is not limited to this, and may be a triangular arrangement, a stripe arrangement, or the like.

Display electrodes 22 are provided on the transparent glass substrate 20 so as to correspond to the colored patterns 16R, 16G and 16B, and each display electrode 22 has a thin film transistor (TFT) 24. Further, a scanning line (gate electrode busbar) 26a and a data line 26b are arranged between the respective display electrodes 22 so as to correspond to the black matrix 14.

In the LCD 1 as described above, each of the colored patterns 16R, 16G and 16B constitutes a pixel, and the display electrode corresponding to each pixel is turned on and off in a state where the illumination light is irradiated from the polarizing plate 51 side. The layer 40 operates as a shutter, and light is transmitted through each pixel of the colored patterns 16R, 16G, and 16B to perform color display.

The transparent substrate 13 of the black matrix substrate 12 constituting the color filter 10 is a rigid material such as quartz glass, low expansion glass or soda lime glass, or a transparent resin film, an optical resin plate or the like. It is possible to use a flexible material having such flexibility. Among them, Corning 7059 glass is a material with a small coefficient of thermal expansion, has excellent dimensional stability and workability in high-temperature heat treatment, and is a non-alkali glass that does not contain an alkali component in the glass. It is suitable for a matrix type LCD color filter.

An example of manufacturing the black matrix substrate 12 according to the present invention will be described with reference to FIG. First, a photosensitive resist containing a hydrophilic resin is applied on the transparent substrate 13 to form a photosensitive resist layer 3 having a thickness of about 0.1 to 5.0 μm (FIG. 4 (A)). Next, the photosensitive resist layer 3 is exposed through the photomask 9 for black matrix (FIG. 4 (B)). Then, the exposed photosensitive resist layer 3 is developed to form a relief 4 having a pattern for a black matrix (FIG. 4C). Next, the transparent substrate 13 is heat-treated (100 to 200 ° C., 5
(For about 30 minutes), an aqueous solution of a metal compound serving as a catalyst for electroless plating is sprayed onto the relief 4 and washed with water to obtain a catalyst-containing relief 5 (FIG. 4 (D)). Then, the catalyst-containing relief 4 on the transparent substrate 13 is brought into contact with an electroless plating solution to form a black relief, and the black relief is subjected to a hardening treatment by heating or coating with a hardening agent to form a black matrix 14. (Fig. 4
(E)).

As described above, in the present invention, the relief for the black matrix formed on the transparent substrate is subjected to electroless plating to deposit and grow the metal in the relief. Prior to this electroless plating, First, the transparent substrate on which the relief is formed is subjected to heat treatment, and then an aqueous solution of a metal compound serving as a catalyst for electroless plating is applied to the relief. That is, the heat treatment improves the adhesion between the relief 4 and the transparent substrate 13, and
The relief 4 becomes a uniform dry state, and the aqueous solution of the metal compound serving as a catalyst for electroless plating uniformly penetrates into the relief 4 to form the catalyst-containing relief 5. Therefore, the subsequent electroless plating causes the metal particles to be substantially uniformly deposited on the entire catalyst-containing relief 5, so that partial deposition or abnormal deposition can be prevented. Furthermore, the resin contained in the photosensitive resist is crystallized by the heat treatment temperature. On the other hand, the metal compound aqueous solution and the plating solution, which serve as a catalyst for electroless plating, have the property of easily permeating into the amorphous portion of the resin but not easily into the crystalline portion. Therefore, the catalyst content of the catalyst-containing relief 5 can be controlled by controlling the heat treatment conditions and appropriately setting the crystallinity of the resin forming the relief 4. Then, by suppressing the catalyst content of the catalyst-containing relief 5 to a low level, that is, by increasing the heat treatment temperature, it is possible to delay the plating reaction during electroless plating and suppress the hydrogen generation rate. It is possible to prevent the catalyst-containing relief 5 from floating, peeling, and the like due to hydrogen generation which is a side reaction. However, if the heat treatment temperature is raised too high, crystallization of the resin proceeds as described above, and plating unevenness occurs in which plating does not partially deposit after plating. Further, when the heat treatment is not performed or the heat treatment temperature is low, the adhesion between the relief and the transparent substrate decreases, and the film floats or peels off. Therefore, it is necessary to set the heat treatment temperature so that the crystallization of the resin does not proceed too much while improving the adhesion between the relief and the transparent substrate. The conditions of the heat treatment in the present invention are 80 to 130 ° C. and 5 to
It can be appropriately set within the range of 60 minutes. Further, by spray-coating an aqueous solution of a metal compound serving as a catalyst for electroless plating on the relief, the metal compound can be impregnated only on the relief surface, and the metal compound can be impregnated on the end face and back side of the resist. Can be prevented.

Examples of the photosensitive resist used in the present invention include natural proteins such as gelatin, casein, glue and ovalbumin, carboxymethyl cellulose, polyvinyl alcohol, polyacrylic acid, polyacrylamide, polyvinylpyrrolidone, polyethylene oxide and maleic anhydride. For the copolymer and a mixture of one or more hydrophilic resins such as carboxylic acid modified products or sulfonic acid modified products of the above resins, for example, a diazonium compound having a diazo group and paraformaldehyde Reaction product diazo resin, azide compound having azido group, cinnamic acid condensation resin obtained by condensing cinnamic acid with polyvinyl alcohol, resin using stilbazolium salt, photocurable photosensitive group such as ammonium dichromate Have It may be mentioned those obtained by imparting photosensitivity by adding one. Needless to say, the photosensitive group is not limited to the above photocurable photosensitive group. As described above, since the photosensitive resin contains the hydrophilic resin, the electroless plating solution penetrates into the catalyst-containing relief 5 when the catalyst-containing relief 5 comes into contact with the electroless plating solution as described above. This facilitates the deposition of metal particles in the catalyst-containing relief 5 uniformly. Therefore, the formed black matrix 14 has sufficient blackness and low reflectance, and the problem of reflection by the metal layer in the conventional chromium thin film formation can be solved.

As the metal compound used as a catalyst for electroless plating used in the present invention, for example, chlorides such as palladium, gold, silver, platinum and copper, water-soluble salts such as nitrates, and complex compounds are used. In particular, in the present invention, it is possible to control the heat treatment conditions as described above to appropriately set the crystallinity of the resin forming the relief 4 and to control the catalyst content of the catalyst-containing relief 5. , The activator solution for electroless plating that is commercially available as an aqueous solution,
Alternatively, it may be diluted before use. When such a metal compound is contained in the photosensitive resist as described above, it is preferably contained in an amount of about 0.00001 to 0.001% by weight.

The electroless plating solution is a reducing agent such as hypophosphorous acid, sodium hypophosphite, sodium borohydride, N-dimethylamine borane, borazine derivative, hydrazine and formalin, and nickel, cobalt,
Water-soluble reducible heavy metal salts such as iron, copper, and chromium, basic compounds such as caustic soda and ammonium hydroxide that improve plating rate, reduction efficiency, etc., pH adjusting agents such as inorganic acids and organic acids, and quenching agents. Buffer agents represented by alkali salts of oxycarboxylic acids such as sodium acid and sodium acetate, boric acid, carbonic acid, organic acids and inorganic acids, complexing agents for the stability of heavy metal ions, and reaction accelerators An electroless plating solution containing a stabilizer, a surfactant, and the like is used.

Two or more electroless plating solutions may be used in combination. For example, first, using an electroless plating solution containing a boron-based reducing agent such as sodium borohydride, which easily forms a nucleus (for example, a palladium nucleus when palladium is used as a metal compound serving as a catalyst for electroless plating), Next, an electroless plating solution containing a hypophosphorous acid-based reducing agent having a high metal deposition rate can be used.

Black matrix substrate 1 as described above
The formation of the colored layer 16 including the red pattern 16R, the green pattern 16G, and the blue pattern 16B between the two black matrices 14 can be performed by various known methods such as a dyeing method, a dispersion method, a printing method, and an electrodeposition method. it can.

A protective layer 18 provided so as to cover the black matrix 14 and the colored layer 16 of the color filter 10.
Is for smoothing the surface of the color filter 10, improving reliability,
Also, the purpose is to prevent contamination of the liquid crystal layer 40 and the like, and can be formed using a transparent resin such as an acrylic resin, an epoxy resin, a polyimide resin, or a transparent inorganic compound such as silicon dioxide. . The thickness of the protective layer is preferably about 0.5 to 50 μm.

As the transparent common electrode 19, for example, an indium tin oxide (ITO) film can be used. IT
The O film can be formed by a known method such as a vapor deposition method and a sputtering method, and the thickness is preferably about 200 to 2000 Å.

Next, the present invention will be described in more detail with reference to experimental examples. (Experimental Example 1) 7059 glass (thickness = 1.1 mm) manufactured by Corning Incorporated was used as a transparent substrate, and a photosensitive resist having the following composition was applied on the transparent substrate by a spin coating method (rotation speed = 1600 rpm). Then, it was dried at 70 ° C. for 5 minutes to form a photosensitive resist layer (thickness = 0.6 μm).

Composition of photosensitive resist: 4.5% aqueous solution of polyvinyl alcohol (Gosenal T-330 manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) 1,000 parts by weight 5% aqueous solution of diazo resin (D-011 manufactured by Shinko Giken) 57.1 parts by weight Next, the photosensitive resist layer was exposed through a photomask for black matrix (line width = 20 μm). The light source for exposure was a super high pressure mercury lamp of 2 kW and 10
Irradiated for 2 seconds. After that, spray development is performed using water at room temperature and air drying is performed to obtain a line width 2 for the black matrix.
A 0 μm relief was formed.

Next, this transparent substrate was subjected to heat treatment at 90 ° C. for 30 minutes, and then an aqueous palladium chloride solution (Red Schumer made by Nippon Kanigen) was spray-coated on the relief, washed with water and drained to obtain the above relief. A relief containing a catalyst was used.

Thereafter, the transparent substrate is immersed in a nickel plating solution (Nickel plating solution Top Chemialoy B-1 manufactured by Okuno Pharmaceutical Co., Ltd.) at 30 ° C. containing a boron-based reducing agent for 4 minutes, washed with water and dried to obtain a black relief (black matrix). Was formed.

When the optical density D of this black relief and the reflectance R at a wavelength of 555 nm were measured, D ≧
3.3, R ≦ 5%, and the close contact state between the black relief and the glass substrate was good with no floating or peeling observed. From this, it was found that the black relief (black matrix) formed by the present invention has sufficient optical density and low reflectance as a black matrix for a color filter. (Experimental Example 2) A black relief (black matrix) was formed in the same manner as in Experimental Example 1 except that the heat treatment conditions were 130 ° C. and 30 minutes.

The optical density D of this black relief and the reflectance R at a wavelength of 555 nm were measured, and D ≧
3.0, R ≦ 5%, and the adhesion state between the black relief and the glass substrate was good with no floating or peeling. From this, it was found that the black relief (black matrix) formed by the present invention has an optical density and a low reflectance that can be used as a black matrix for a color filter. However, comparing the black reliefs (black matrix) formed in Experimental Example 1 and Experimental Example 2, it became clear that the characteristics of the black relief (black matrix) are determined depending on how the heat treatment conditions are set. Comparative Example 1 After forming a relief for a black matrix having a line width of 20 μm on the transparent substrate in the same manner as in Experimental Example 1, first, the transparent substrate was dipped in an aqueous solution of palladium chloride (Nihon Kanzen Red Sumer) for 10 seconds. After washing with water and draining, heat treatment at 150 ° C for 30 minutes,
The above relief was used as a catalyst-containing relief.

Then, the transparent substrate was dipped in a nickel plating solution (nickel plating solution Top Chemialoy B-1 manufactured by Okuno Seiyaku Co., Ltd.) at 30 ° C. containing a boron-based reducing agent for 4 minutes, washed with water and dried to obtain a black relief as a comparative example. (Black matrix) was formed.

When the optical density D of this black relief and the reflectance R at a wavelength of 555 nm were measured, D =
2.5 to 3.0, R ≦ 5%, and the contact state between the black relief and the glass substrate was good with no floating, peeling, etc., but was good on the outer peripheral portion other than the pixel portion. The unevenness that the plating did not deposit was observed. From this, the black relief (black matrix) of the comparative example is the black relief (black matrix) formed according to the present invention.
It was found that the appearance and the optical density were inferior when used as a black matrix for a color filter as compared with. (Comparative Example 2) The same as Comparative Example 1 except that the heat treatment condition was 70 ° C for 30 minutes, and the immersion time in the nickel plating solution (Nickel plating solution Top Chemialoy B-1 manufactured by Okuno Seiyaku) was 4 minutes. Then, a black relief (black matrix) as a comparative example was formed.

When the optical density D and the reflectance R of this black relief were measured, it was D ≧ 3.0R ≦ 5%, but the close contact state between the black relief and the glass substrate was floating,
Peeling was observed and it could not be used as a black matrix for a color filter. (Comparative Example 3) The heat treatment conditions were 180 ° C. and 30 minutes,
The immersion time in the nickel plating solution (Nickel plating solution Top Chemialoy B-1 manufactured by Okuno Seiyaku) was set to 4 minutes,
The same procedure as in Comparative Example 1 was performed. In the relief in this case, the plating precipitation reaction did not occur.

Experimental Examples 1 and 2 and Comparative Examples 1 to 3 described above.
The results are summarized in Table 1 below.

[0033]

[Table 1] (Comparative Example 4) 7059 glass (thickness = 1.1 mm) manufactured by Corning Incorporated was used as a transparent substrate, one surface of this substrate was immersed in hydrofluoric acid to etch the glass, and the substrate surface was pretreated. did.

Then, after tin ions were adsorbed on the treated surface of the substrate with stannous chloride and hydrochloric acid, the substrate was washed with water and dried, immersed in an aqueous palladium chloride solution in the same manner as in Comparative Example 1, washed with water and dried, and the treated surface was treated. Electroless plating is performed on the entire surface of the substrate, and a photosensitive resist layer is formed in the same manner as in Experimental Example 1.
It was developed. After that, the substrate was immersed in a mixed solution of ceric ammonium nitrate and perchloric acid to etch only nickel on the exposed nickel portion, and then the resist film was dissolved and peeled with ammonia water to form a black matrix. In this black matrix, nickel was deposited only on the surface and metallic luster was observed.

Next, a color filter was prepared by forming a colored layer, a protective layer and a transparent electrode on each of the above black matrix substrates (Samples 1, 2 and Comparative Samples 1, 3, 4).
To form the colored layer, first, on the black matrix layer,
A red photosensitive resin (MR-G manufactured by The Inktech Co., Ltd.) by a spin coating method (rotation speed = 1200 rpm)
(R)) was applied. After that, it is dried (prebaked) under the condition of 70 ° C. for 30 minutes, and the red photosensitive resin layer (film thickness =
1.2 μm) was formed.

Next, in a region of the red photosensitive resin layer where red pixels are to be formed, a photomask for red pixels (line width =
After aligning (100 μm), exposure was performed through this photomask. The exposure apparatus used was a proximity exposure apparatus manufactured by Dainippon Screen Co., Ltd., and the exposure amount was 150 mJ / cm ² . After that, shower development (development time = 60 seconds) is performed using water at room temperature, and then,
A heat treatment (post-baking) was performed at 150 ° C. for 30 minutes to form red pixels.

The same steps were repeated to form a colored layer composed of red pixels, green pixels and blue pixels. The conditions for producing each pixel were in accordance with the conditions shown in Table 2 below.

[0038]

[Table 2] Next, in order to form the protective layer, a coating liquid having the composition shown below was applied onto the colored layer by spin coating (rotation speed = 1500 rpm) (film thickness = 2.0 μm).

(Composition of coating liquid for forming protective layer) Photo-curable acrylate oligomer (o-cresol novolac epoxy acrylate (molecular weight 1500 to 2000)) 35 parts by weight Cresol novolac type epoxy resin 15 parts by weight Functionally polymerizable monomer (dipentaerythritol hexaacrylate (DPHA manufactured by Nippon Kayaku)) 50 parts by weight Polymerization initiator (Irgacure manufactured by Ciba Geigy) 2 parts by weight Epoxy curing agent (UVE1014 manufactured by General Electric) 2 By weight: Ethyl cellosolve acetate: 200 parts by weight And, for this coating film, an exposure amount of 150 mJ was used by using a proximity exposure device manufactured by Dainippon Screen Co., Ltd.
The whole surface was exposed at / cm ² . After that, the substrate is
It was immersed in 1,2,2-tetrachloroethane for 1 minute to remove only the uncured portion of the coating film to form a protective film.

Further, a 0.4 μm thick indium tin oxide (ITO) film was formed on the protective film by a sputtering method.
A film was formed to form a transparent electrode, and a color filter was obtained. Further, the colored layer was formed by the printing method as described below to prepare a color filter. That is, plate depth 6 μm, width 110
The following ink compositions S-1, S-2, and S-3 were formed in this order between the black matrices on the black matrix substrate by an intaglio offset printing method using a plate having a stripe-shaped recess of μm and a silicone blanket. Printed in 11 for blue, green and red respectively
A stripe pattern having a width of 0 μm was formed by printing. Then, the ink composition was thermally cured by heating the substrate at 200 ° C. for 30 minutes to obtain a colored layer having a thickness of 2 to 3 μm.

Composition of varnish Polyester acrylate resin (Aronix M-7100, Toagosei Kagaku Kogyo KK) 70 parts by weight Diallyl phthalate prepolymer 30 parts by weight Composition of ink composition (S-1) varnish 100 Parts by weight ・ Pigment (Rionol Blue ES) (Toyo Ink Mfg. Co., Ltd., CI Pigment Blue 15: 6) ... 15.5 parts by weight ・ Pigment (Rionogen Violet RL) (Toyo Ink Mfg. Co., Ltd., CI Pigment) Violet 23) ... 4 parts by weight Composition of ink composition (S-2) -Varnish ... 100 parts by weight-Pigment (Rionol Green 2YS) (CIPigmentGreen 36 manufactured by Toyo Ink Mfg. Co., Ltd.) 22 parts by weight-Pigment ( Seika Fast Yellow 2700) (Dainichiseika Color & Chemicals Mfg. Co., Ltd., CI Pigment Yellow 83) ... 7.5 parts by weight ink composition (S-3) composition varnish ... 100-fold Part-Pigment (Chromophtal red A3B) (Ciba Geigy Co., CI Pigment Red 177) 32 parts by weight-Pigment (Seika Fast Yellow 2700) (Dainichi Seika Chemicals Co., Ltd., C..Pigment Yellow 83) ... 8 parts by weight Next, a protective layer and a transparent electrode were formed as described above to obtain a color filter.

Of the color filters created in this way,
The samples prepared using the black matrix substrates of Samples 1 and 2 exhibited a high coloring effect and display contrast when used in a color liquid crystal display. However, the comparative samples 1, 3, and 4 prepared using the black matrix substrate had insufficient coloring effect and display contrast when used in a color liquid crystal display.

[0043]

As described above in detail, the black relief (black matrix) formed according to the present invention has a high optical density, a low reflectance, and a high dimensional accuracy, and is formed with a transparent substrate. Adhesion is also good, and a black matrix substrate provided with such a black relief (black matrix) can form a color filter with high reliability and high contrast, and does not require a vacuum process or the like. Therefore, the manufacturing cost can be reduced.

[Brief description of drawings]

FIG. 1 is a perspective view showing an example of an active matrix liquid crystal display using a color filter manufactured according to the present invention.

FIG. 2 is a schematic sectional view of the liquid crystal display shown in FIG.

FIG. 3 is an enlarged partial sectional view of a color filter used in the liquid crystal display shown in FIG.

FIG. 4 is a process chart for explaining a method of manufacturing a black matrix substrate according to the present invention.

[Explanation of symbols]

 3 ... Photosensitive resist layer 4 ... Relief 5 ... Catalyst containing relief 9 ... Black matrix photomask 10 ... Color filter 12 ... Black matrix substrate 13 ... Transparent substrate 14 ... Black matrix (black relief) 16 ... Colored layer 16R, 16G , 16B ... Coloring pattern

Claims (3)

[Claims] 1. A photosensitive resist layer containing a hydrophilic resin formed on a transparent substrate is exposed and developed through a photomask having a pattern for a black matrix to form a relief on the transparent substrate. After heat-treating the transparent substrate, an aqueous solution of a metal compound serving as a catalyst for electroless plating is brought into contact with the relief, washed with water to be a catalyst-containing relief, and then the catalyst-containing relief is brought into contact with an electroless plating solution. A black relief having a pattern for a black matrix is thereby formed to produce a black matrix substrate. 2. The condition of the heat treatment is 90 to 130 ° C.,
The method for producing a black matrix substrate according to claim 1, wherein the range is 5 to 60 minutes. 3. The method for producing a black matrix substrate according to claim 1, wherein the step of contacting the aqueous solution of the metal compound serving as a catalyst for the thermoelectrolytic plating is spray coating.