JPH0686448B2 - Process for producing 2 ', 3'-dideoxycytidine derivative - Google Patents
Process for producing 2 ', 3'-dideoxycytidine derivativeInfo
- Publication number
- JPH0686448B2 JPH0686448B2 JP62117924A JP11792487A JPH0686448B2 JP H0686448 B2 JPH0686448 B2 JP H0686448B2 JP 62117924 A JP62117924 A JP 62117924A JP 11792487 A JP11792487 A JP 11792487A JP H0686448 B2 JPH0686448 B2 JP H0686448B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- solvent
- compound
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- WREGKURFCTUGRC-POYBYMJQSA-N Zalcitabine Chemical class O=C1N=C(N)C=CN1[C@@H]1O[C@H](CO)CC1 WREGKURFCTUGRC-POYBYMJQSA-N 0.000 title claims description 11
- 238000000034 method Methods 0.000 title claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 31
- 125000006239 protecting group Chemical group 0.000 claims description 18
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 16
- 125000003277 amino group Chemical group 0.000 claims description 15
- 239000003153 chemical reaction reagent Substances 0.000 claims description 8
- 230000002140 halogenating effect Effects 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 238000002955 isolation Methods 0.000 claims description 4
- -1 isobutyryl Chemical group 0.000 description 75
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 45
- 239000002904 solvent Substances 0.000 description 25
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 125000003118 aryl group Chemical group 0.000 description 16
- 125000003545 alkoxy group Chemical group 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 125000002252 acyl group Chemical group 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 10
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 7
- 125000005129 aryl carbonyl group Chemical group 0.000 description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 239000005457 ice water Substances 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 230000035484 reaction time Effects 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 125000004849 alkoxymethyl group Chemical group 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000005098 aryl alkoxy carbonyl group Chemical group 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PBFATPYEUBCWJS-GXTWGEPZSA-N [(2s,5r)-5-(2,4-dioxopyrimidin-1-yl)oxolan-2-yl]methyl benzoate Chemical compound N1([C@H]2CC[C@H](O2)COC(=O)C=2C=CC=CC=2)C=CC(=O)NC1=O PBFATPYEUBCWJS-GXTWGEPZSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 125000005092 alkenyloxycarbonyl group Chemical group 0.000 description 2
- 125000005103 alkyl silyl group Chemical group 0.000 description 2
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 239000012452 mother liquor Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000002342 ribonucleoside Substances 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 2
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 2
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 2
- 125000004632 tetrahydrothiopyranyl group Chemical group S1C(CCCC1)* 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229960000523 zalcitabine Drugs 0.000 description 2
- OGFAWKRXZLGJSK-UHFFFAOYSA-N 1-(2,4-dihydroxyphenyl)-2-(4-nitrophenyl)ethanone Chemical compound OC1=CC(O)=CC=C1C(=O)CC1=CC=C([N+]([O-])=O)C=C1 OGFAWKRXZLGJSK-UHFFFAOYSA-N 0.000 description 1
- UTQNKKSJPHTPBS-UHFFFAOYSA-N 2,2,2-trichloroethanone Chemical group ClC(Cl)(Cl)[C]=O UTQNKKSJPHTPBS-UHFFFAOYSA-N 0.000 description 1
- 125000004797 2,2,2-trichloroethoxy group Chemical group ClC(CO*)(Cl)Cl 0.000 description 1
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 1
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 1
- GOJUJUVQIVIZAV-UHFFFAOYSA-N 2-amino-4,6-dichloropyrimidine-5-carbaldehyde Chemical group NC1=NC(Cl)=C(C=O)C(Cl)=N1 GOJUJUVQIVIZAV-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- IQHSSYROJYPFDV-UHFFFAOYSA-N 2-bromo-1,3-dichloro-5-(trifluoromethyl)benzene Chemical group FC(F)(F)C1=CC(Cl)=C(Br)C(Cl)=C1 IQHSSYROJYPFDV-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006281 4-bromobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Br)C([H])([H])* 0.000 description 1
- 125000000242 4-chlorobenzoyl group Chemical group ClC1=CC=C(C(=O)*)C=C1 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 125000004217 4-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1OC([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- 125000006181 4-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])C([H])([H])* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 208000030507 AIDS Diseases 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XVZXOLOFWKSDSR-UHFFFAOYSA-N Cc1cc(C)c([C]=O)c(C)c1 Chemical group Cc1cc(C)c([C]=O)c(C)c1 XVZXOLOFWKSDSR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- VIZQREHVDDPWOK-UHFFFAOYSA-N IP(I)(I)=O Chemical compound IP(I)(I)=O VIZQREHVDDPWOK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- PHSPJQZRQAJPPF-UHFFFAOYSA-N N-alpha-Methylhistamine Chemical compound CNCCC1=CN=CN1 PHSPJQZRQAJPPF-UHFFFAOYSA-N 0.000 description 1
- 239000002262 Schiff base Substances 0.000 description 1
- 150000004753 Schiff bases Chemical class 0.000 description 1
- PZAGQUOSOTUKEC-UHFFFAOYSA-N acetic acid;sulfuric acid Chemical compound CC(O)=O.OS(O)(=O)=O PZAGQUOSOTUKEC-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910052977 alkali metal sulfide Inorganic materials 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 125000004702 alkoxy alkyl carbonyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000002102 aryl alkyloxo group Chemical group 0.000 description 1
- CBHOOMGKXCMKIR-UHFFFAOYSA-N azane;methanol Chemical compound N.OC CBHOOMGKXCMKIR-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000010531 catalytic reduction reaction Methods 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000000460 chlorine Chemical group 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000002668 chloroacetyl group Chemical group ClCC(=O)* 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- WGLUMOCWFMKWIL-UHFFFAOYSA-N dichloromethane;methanol Chemical compound OC.ClCCl WGLUMOCWFMKWIL-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 239000011630 iodine Chemical group 0.000 description 1
- 229910052740 iodine Chemical group 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000005929 isobutyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])OC(*)=O 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000000400 lauroyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000006502 nitrobenzyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000002801 octanoyl group Chemical group C(CCCCCCC)(=O)* 0.000 description 1
- 150000007530 organic bases Chemical group 0.000 description 1
- 125000006505 p-cyanobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C#N)C([H])([H])* 0.000 description 1
- 125000003232 p-nitrobenzoyl group Chemical group [N+](=O)([O-])C1=CC=C(C(=O)*)C=C1 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001312 palmitoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- NCCBCEHAGCSKEA-UHFFFAOYSA-N pentaiodo-$l^{5}-phosphane Chemical compound IP(I)(I)(I)I NCCBCEHAGCSKEA-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- PZHNNJXWQYFUTD-UHFFFAOYSA-N phosphorus triiodide Chemical compound IP(I)I PZHNNJXWQYFUTD-UHFFFAOYSA-N 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 125000004591 piperonyl group Chemical group C(C1=CC=2OCOC2C=C1)* 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- DPLVEEXVKBWGHE-UHFFFAOYSA-N potassium sulfide Chemical compound [S-2].[K+].[K+] DPLVEEXVKBWGHE-UHFFFAOYSA-N 0.000 description 1
- 238000000039 preparative column chromatography Methods 0.000 description 1
- 238000012746 preparative thin layer chromatography Methods 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- 125000003696 stearoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003461 sulfonyl halides Chemical class 0.000 description 1
- FWMUJAIKEJWSSY-UHFFFAOYSA-N sulfur dichloride Chemical compound ClSCl FWMUJAIKEJWSSY-UHFFFAOYSA-N 0.000 description 1
- NBNBICNWNFQDDD-UHFFFAOYSA-N sulfuryl dibromide Chemical compound BrS(Br)(=O)=O NBNBICNWNFQDDD-UHFFFAOYSA-N 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- TWPVZKPFIMFABN-UHFFFAOYSA-N sulfuryl diiodide Chemical compound IS(I)(=O)=O TWPVZKPFIMFABN-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- 125000004192 tetrahydrofuran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004187 tetrahydropyran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 229940124597 therapeutic agent Drugs 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Saccharide Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
Description
【発明の詳細な説明】 〔目的〕 本発明は、エイズ治療薬として有用である2′,3′‐ジ
デオキシシチジン誘導体の優れた製法に関する。DETAILED DESCRIPTION OF THE INVENTION [Object] The present invention relates to an excellent method for producing a 2 ′, 3′-dideoxycytidine derivative useful as a therapeutic agent for AIDS.
<従来の技術> 従来、2′,3′‐ジデオキシシチジン誘導体を、リボヌ
クレオシド類から合成する方法としては、ホルビツツら
の方法(ジヤーナル・オブ・オーガニツク・ケミストリ
ー,32,817(1969))が知られているが、最終の還元工
程において副生成物ができるため生成物の単離が困難で
あり、大量合成に向いていない。<Prior Art> Conventionally, 2 ', 3'-dideoxycytidine derivative, as a method for synthesizing the ribonucleosides include, Horubitsutsu et al. (Journal Of Oganitsuku Chemistry, 32, 817 (1969)) is known However, since a by-product is formed in the final reduction step, it is difficult to isolate the product and it is not suitable for large-scale synthesis.
<当該発明が解決しようとする問題点> 本発明者らは、リボヌクレオシド類を原料とした2′,
3′‐ジデオキシシチジン誘導体の合成について、長年
に亘り鋭意研究を行つた結果、本発明の方法が、収率性
及び単離の簡便性の面において、優れていることを見い
出し、本発明を完成した。<Problems to be Solved by the Present Invention> The inventors of the present invention have used 2 ', which uses ribonucleosides as a raw material.
As a result of intensive research over many years on the synthesis of the 3'-dideoxycytidine derivative, the method of the present invention was found to be excellent in terms of yield and isolation, and the present invention was completed. did.
本発明の2′,3′‐ジデオキシシチジン誘導体の製法
は、次式に示すように、 (式中、R1及びR2は同一又は異なつて、保護されていて
もよい水酸基又は置換された水酸基を示し、Xはハロゲ
ン原子を示し、Yは保護されていてもよいアミノ基又は
置換されたアミノ基を示す。) 式(I)を有する化合物を、式YHを有する化合物(式
中、Yは前記と同意義を示す。)と反応させ、所望によ
り、保護基を除去することを特徴とする式(II)で表わ
される2′,3′‐ジデオキシシチジン誘導体の製法又
は、次式に示すように、 (式中、R1,R2及びYは前記と同意義を示す。)式(II
I)を有する化合物と、ハロゲン化試薬とを反応させ、
次いで、生成物を単離し、又は単離することなく、式YH
を有する化合物(式中、Yは前記と同意義を示す。)と
反応させ、所望により、保護基を除去することを特徴と
する式(II)で表わされる2′,3′‐ジデオキシシチジ
ン誘導体の製法である。The method for producing the 2 ', 3'-dideoxycytidine derivative of the present invention is as shown in the following formula: (In the formula, R 1 and R 2 are the same or different and each represents an optionally protected hydroxyl group or a substituted hydroxyl group, X is a halogen atom, and Y is an optionally protected amino group or a substituted hydroxyl group. A compound having the formula (I) is reacted with a compound having the formula YH (wherein Y has the same meaning as defined above), and if desired, the protecting group is removed. Or a process for producing a 2 ', 3'-dideoxycytidine derivative represented by the formula (II) or as shown in the following formula: (In the formula, R 1 , R 2 and Y have the same meanings as described above.) Formula (II
Reacting the compound having I) with a halogenating reagent,
The product is then isolated with or without isolation of the formula YH
A 2 ′, 3′-dideoxycytidine derivative represented by the formula (II), which comprises reacting with a compound having the formula (wherein Y has the same meaning as defined above) and, if desired, removing a protecting group. Is a manufacturing method.
上記式中、 Xで定義された「ハロゲン原子」とは、弗素、塩素、臭
素又は沃素を示す。In the above formula, the "halogen atom" defined by X represents fluorine, chlorine, bromine or iodine.
R1及びR2で定義された「保護されていてもよい水酸基」
の保護基としては、反応における保護基を示し、例え
ば、ホルミル、アセチル、プロピオニル、ブチリル、イ
ソブチリル、ペンタノイル、ピバロイル、バレリル、イ
ソバレリル、オクタノイル、ラウロイル、パルミトイ
ル、ステアロイルのようなアルキルカルボニル基、クロ
ロアセチル、ジクロロアセチル、トリクロロアセチル、
トリフルオロアセチルのようなハロゲン化アルキルカル
ボニル基、トメキシアセチルのような低級アルコキシア
ルキルカルボニル基、(E)‐2-メチル‐2-ブテノイル
のような不飽和アルキルカルボニル基等の脂肪族アシル
基;ベンゾイル、α‐ナフトイル、β‐ナフトイルのよ
うなアリールカルボニル基、2-ブロモベンゾイル、4-ク
ロロベンゾイルのようなハロゲン化アリールカルボニル
基、2,4,6-トリメチルベンゾイル、4-トルオイルのよう
な低級アルキル化アリールカルボニル基、4-アニソイル
のような低級アルコキシ化アリールカルボニル基、4-ニ
トロベンゾイル、2-ニトロベンゾイルのようなニトロ化
アリールカルボニル基、2-(メトキシカルボニル)ベン
ゾイルのような低級アルコキシカルボニル化アリールカ
ルボニル基、4-フエニルベンンゾイルのようなアリール
化アリールカルボニル基等の芳香族アシル基;テトラヒ
ドロピラン‐2-イル、3-ブロモテトラヒドロピラン‐2-
イル、4-メトキシテトラヒドロピラン‐4-イル、テトラ
ヒドロチオピラン‐2-イル、4-メトキシテトラヒドロチ
オピラン‐4-イルのようなテトラヒドロピラニル又はテ
トラヒドロチオピラニル基;テトラヒドロフラン‐2-イ
ル、テトラヒドロチオフラン‐2-イルのようなテトラヒ
ドロフラニル又はテトラヒドロチオフラニル基;トリメ
チルシリル、トリエチルシリル、イソプロピルジメチル
シリル、t-ブチルジメチルシリル、メチルジイソプロピ
ルシリル、メチルジ‐t-ブチルシリル、トリイソプロピ
ルシリルのようなトリ低級アルキルシリル基、ジフエニ
ルメチルシリル、ジフエニルブチルシリル、ジフエニル
イソプロピルシリル、フエニルジイソプロピルシリルの
ような1乃至2個のアリール基で置換されたトリ低級ア
ルキルシリル基等のシリル基;メトキシメチル、1,1-ジ
メチル‐1-メトキシメチル、エトキシメチル、プロポキ
シメチル、イソプロポキシメチル、ブトキシメチル、t-
ブトキシメチルのような低級アルコキシメチル基、2-メ
トキシエトキシメチルのような低級アルコキシ化低級ア
ルコキシメチル基、2,2,2-トリクロロエトキシメチル、
ビス(2-クロロエトキシ)メチルのようなハロゲン化低
級アルコキシメチル等のアルコキシメチル基;1-エトキ
シエチル、1-メチル‐1-メトキシエチル、1-(イソプロ
ポキシ)エチルのような低級アルコキシ化エチル基、2,
2,2-トリクロロエチルのようなハロゲン化エチル基、2-
(フエニルゼレニル)エチルのようなアリールゼレニル
化エチル基等の置換エチル基;ベンジル、フエネチル、
3-フエニルプロピル、α‐ナフチルメチル、β‐ナフチ
ルメチル、ジフエニルメチル、トリフエニルメチル、α
‐ナフチルジフエニルメチル、9-アンスリルメチルのよ
うな1乃至3個のアリール基で置換された低級アルキル
基、4-メチルベンジル、2,4,6-トリメチルベンジル、3,
4,5-トリメチルベンジル、4-メトキシベンジル、4-メト
キシフエニルジフエニルメチル、2-ニトロベンジル、4-
ニトロベンジル、4-クロロベンジル、4-ブロモベンジ
ル、4-シアノベンジル、4-シアノベンジルジフエニルメ
チル、ビス(2-ニトロフエニル)メチル、ピペロニルの
ような低級アルキル、低級アルコキシ、ニトロ、ハロゲ
ン、シアノ基でアリール環が置換された1乃至3個のア
リール基で置換された低級アルキル基等のアラルキル
基;メトキシカルボニル、エトキシカルボニル、t-ブト
キシカルボニル、イソブトキシカルボニルのような低級
アルコキシカルボニル基、2,2,2-トリクロロエトキシカ
ルボニル、2-トリメチルシリルエトキシカルボニルのよ
うなハロゲン又はトリ低級アルキルシリル基で置換され
た低級アルコキシカルボニル基等のアルコキシカルボニ
ル基;ビニルオキシカルボニル、アリルオキシカルボニ
ルのようなアルケニルオキシカルボニル基;ベンジルオ
キシカルボニル、4-メトキシベンジルオキシカルボニ
ル、3,4-ジメトキシベンジルオキシカルボニル、2-ニト
ロベンジルオキシカルボニル、4-ニトロベンジルオキシ
カルボニルのような、1乃至2個の低級アルコキシ又は
ニトロ基でアリール環が置換されていてもよいアラルキ
ルオキシカルボニル基のような反応における保護基を挙
げることができ、好適には、脂肪族アシル基及び芳香族
アシル基である。“An optionally protected hydroxyl group” defined by R 1 and R 2
The protecting group of represents a protecting group in the reaction, for example, formyl, acetyl, propionyl, butyryl, isobutyryl, pentanoyl, pivaloyl, valeryl, isovaleryl, octanoyl, lauroyl, palmitoyl, alkylcarbonyl group such as stearoyl, chloroacetyl, Dichloroacetyl, trichloroacetyl,
Aliphatic acyl groups such as halogenated alkylcarbonyl groups such as trifluoroacetyl, lower alkoxyalkylcarbonyl groups such as tomexacetyl, unsaturated alkylcarbonyl groups such as (E) -2-methyl-2-butenoyl; Arylcarbonyl groups such as benzoyl, α-naphthoyl, β-naphthoyl, halogenated arylcarbonyl groups such as 2-bromobenzoyl, 4-chlorobenzoyl, lower such as 2,4,6-trimethylbenzoyl, 4-toluoyl Alkylated arylcarbonyl group, lower alkoxylated arylcarbonyl group such as 4-anisoyl, nitrated arylcarbonyl group such as 4-nitrobenzoyl and 2-nitrobenzoyl, lower alkoxycarbonyl such as 2- (methoxycarbonyl) benzoyl Arylcarbonyl group, 4-phenylben Aromatic acyl groups such as arylated arylcarbonyl group such as benzoyl; tetrahydropyran-2-yl, 3-bromo-tetrahydropyran-2
A tetrahydropyranyl or tetrahydrothiopyranyl group such as yl, 4-methoxytetrahydropyran-4-yl, tetrahydrothiopyran-2-yl, 4-methoxytetrahydrothiopyran-4-yl; tetrahydrofuran-2-yl, tetrahydro A tetrahydrofuranyl or tetrahydrothiofuranyl group such as thiofuran-2-yl; a trihydrofuranyl group such as trimethylsilyl, triethylsilyl, isopropyldimethylsilyl, t-butyldimethylsilyl, methyldiisopropylsilyl, methyldi-t-butylsilyl, triisopropylsilyl Silyl such as lower alkylsilyl group, triphenylalkylsilyl group substituted with 1 or 2 aryl groups such as diphenylmethylsilyl, diphenylbutylsilyl, diphenylisopropylsilyl, and phenyldiisopropylsilyl. Group; methoxymethyl, 1,1-dimethyl-1-methoxymethyl, ethoxymethyl, propoxymethyl, iso-propoxymethyl, butoxymethyl, t-
Lower alkoxymethyl group such as butoxymethyl, lower alkoxylated lower alkoxymethyl group such as 2-methoxyethoxymethyl, 2,2,2-trichloroethoxymethyl,
Alkoxymethyl groups such as halogenated lower alkoxymethyl such as bis (2-chloroethoxy) methyl; lower alkoxylated ethyl such as 1-ethoxyethyl, 1-methyl-1-methoxyethyl, 1- (isopropoxy) ethyl Base, 2,
Halogenated ethyl group such as 2,2-trichloroethyl, 2-
A substituted ethyl group such as an arylzenylated ethyl group such as (phenylenyl) ethyl; benzyl, phenethyl,
3-phenylpropyl, α-naphthylmethyl, β-naphthylmethyl, diphenylmethyl, triphenylmethyl, α
-Lower alkyl groups substituted with 1 to 3 aryl groups such as naphthyldiphenylmethyl, 9-anthrylmethyl, 4-methylbenzyl, 2,4,6-trimethylbenzyl, 3,
4,5-Trimethylbenzyl, 4-methoxybenzyl, 4-methoxyphenyldiphenylmethyl, 2-nitrobenzyl, 4-
Lower alkyl such as nitrobenzyl, 4-chlorobenzyl, 4-bromobenzyl, 4-cyanobenzyl, 4-cyanobenzyldiphenylmethyl, bis (2-nitrophenyl) methyl, piperonyl, lower alkoxy, nitro, halogen, cyano group An aralkyl group such as a lower alkyl group substituted by 1 to 3 aryl groups in which the aryl ring is substituted with; a lower alkoxycarbonyl group such as methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, isobutoxycarbonyl, 2, Alkoxycarbonyl groups such as halogen such as 2,2-trichloroethoxycarbonyl and 2-trimethylsilylethoxycarbonyl or lower alkoxycarbonyl groups substituted with tri-lower alkylsilyl groups; alkenyloxy such as vinyloxycarbonyl and allyloxycarbonyl Rubonyl group; 1 to 2 lower alkoxy or nitro groups such as benzyloxycarbonyl, 4-methoxybenzyloxycarbonyl, 3,4-dimethoxybenzyloxycarbonyl, 2-nitrobenzyloxycarbonyl, 4-nitrobenzyloxycarbonyl And a protecting group in the reaction such as an aralkyloxycarbonyl group in which the aryl ring may be substituted may be mentioned, and an aliphatic acyl group and an aromatic acyl group are preferable.
R1及びR2で定義された「置換された水酸基」の置換基と
しては、例えば、メチル、エチル、プロピル、イソプロ
ピル、ブチル、イソブチル、s-ブチル、t-ブチル、ペン
チル、ヘキシルのような炭素数1乃至6個の低級アルキ
ル基又はフエニル、4-トリル、4-メトキシフエニル、4-
クロロフエニル、α若しくはβ‐ナフチルのような低級
アルキル、低級アルコキシ、ハロゲン原子で置換されて
いてもよいアリール基を挙げることができる。Examples of the substituent of the “substituted hydroxyl group” defined by R 1 and R 2 include carbon such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, pentyl and hexyl. Number 1 to 6 lower alkyl group or phenyl, 4-tolyl, 4-methoxyphenyl, 4-
Mention may be made of lower alkyl such as chlorophenyl, α- or β-naphthyl, lower alkoxy, aryl groups optionally substituted by halogen atoms.
Yで定義された「保護されていてもよいアミノ基」と
は、下記の保護基が1又は2個アミノ基を保護していて
もよい基を示し、該保護基としては、通常アミノ基の保
護基として使用するものであれば限定はないが、好適に
は、例えば、前記脂肪族アシル基;前記芳香族アシル
基;前記アルコキシカルボニル基;前記アルケニルオキ
シカルボニル基;前記「1乃至2個の低級アルコキシ又
はニトロ基でアリール環が置換されていてもよいアラル
キルオキシカルボニル基」;前記シリル基;前記アラル
キル基;又はN,N-ジメチルアミノメチレン、ベンジリデ
ン、4-メトキシベンジリデン、4-ニトロベンジリデン、
サリシリデン、5-クロロサリシリデン、ジフエニルメチ
レン、(5-クロロ‐2-ヒドロキシフエニル)フエニルメ
チレンのようなシツフ塩基を形成する置換されたメチレ
ン基を挙げることができ、さらに好適にはアラルキル基
である。The "optionally protected amino group" defined by Y is a group in which the following protecting group may protect one or two amino groups, and the protecting group is usually an amino group. There is no limitation as long as it is used as a protecting group, but preferably, for example, the above-mentioned aliphatic acyl group; the above-mentioned aromatic acyl group; the above-mentioned alkoxycarbonyl group; the above-mentioned alkenyloxycarbonyl group; An aralkyloxycarbonyl group in which the aryl ring may be substituted with a lower alkoxy or nitro group; the silyl group; the aralkyl group; or N, N-dimethylaminomethylene, benzylidene, 4-methoxybenzylidene, 4-nitrobenzylidene,
Examples thereof include a substituted methylene group forming a Schiff base such as salicylidene, 5-chlorosalicylidene, diphenylmethylene and (5-chloro-2-hydroxyphenyl) phenylmethylene, and more preferably It is an aralkyl group.
Yで定義された「置換されたアミノ基」とは、下記の置
換基が1又は2個アミノ基を置換している基を示し、該
置換基としては、例えば前記低級アルキル基;前記低級
アルコキシ基、2-メトキシエトキシのような低級アルコ
キシ化低級アルコキシ基、2,2,2-トリクロロエトキシの
ようなハロゲン化低級アルコキシ基等のアルコキシ基;
ベンジルオキシ、フエネチルオキシ、3-フエニルプロポ
キシ、α‐ナフチルメトキシ、β−ナフチルメトキシ、
ジフエニルメトキシ、トリフエニルメトキシ、α‐ナフ
チルジフエニルメトキシ、9-アンスリルメトキシのよう
な1乃至3個のアリール基で置換された低級アルコキシ
基、4-メチルベンジルオキシ、2,4,6-トリメチルベンジ
ルオキシ、3,4,5-トリメチルベンジルオキシ、4-メトキ
シベンジルオキシ、4-メトキシフエニルジフエニルメト
キシ、2-ニトロベンジルオキシ、4-ニトロベンジルオキ
シ、4-クロロベンジルオキシ、4-ブロモベンジルオキ
シ、4-シアノベンジルオキシ、4-シアノベンジルジフエ
ニルメトキシ、ビス(2-ニトロフエニル)メトキシ、ピ
ペロニルオキシのような低級アルキル、低級アルコキ
シ、ニトロ、ハロゲン、シアノ基でアリール環が置換さ
れた1乃至3個のアリール基で置換された低級アルコキ
シ基等のアラルキルオキシ基;水酸基;ヒドロキシメチ
ル、2-ヒドロキシエチル、3-ヒドロキシプロピルのよう
なヒドロキシ置換低級アルキル基;2-アミノエチル、3-
アミノプロピルのようなアミノ置換アルキル基又は前記
「低級アルキル、低級アルコキシ、ハロゲンで置換され
ていてもよいアリール基」を挙げることができ、好適に
は低級アルキル基である。The “substituted amino group” defined by Y means a group in which the following substituent substitutes 1 or 2 amino groups, and examples of the substituent include the above lower alkyl group and the above lower alkoxy. Groups, lower alkoxylated lower alkoxy groups such as 2-methoxyethoxy, halogenated lower alkoxy groups such as 2,2,2-trichloroethoxy, and other alkoxy groups;
Benzyloxy, phenethyloxy, 3-phenylpropoxy, α-naphthylmethoxy, β-naphthylmethoxy,
Lower alkoxy group substituted with 1 to 3 aryl groups such as diphenylmethoxy, triphenylmethoxy, α-naphthyldiphenylmethoxy, 9-anthrylmethoxy, 4-methylbenzyloxy, 2,4,6- Trimethylbenzyloxy, 3,4,5-trimethylbenzyloxy, 4-methoxybenzyloxy, 4-methoxyphenyldiphenylmethoxy, 2-nitrobenzyloxy, 4-nitrobenzyloxy, 4-chlorobenzyloxy, 4-bromo 1 to 1 in which the aryl ring is substituted with lower alkyl such as benzyloxy, 4-cyanobenzyloxy, 4-cyanobenzyldiphenylmethoxy, bis (2-nitrophenyl) methoxy, piperonyloxy, lower alkoxy, nitro, halogen, cyano group Aralkyloxy groups such as lower alkoxy groups substituted with 3 aryl groups; hydroxy ; Hydroxymethyl, 2-hydroxyethyl, hydroxy-substituted lower alkyl groups such as 3-hydroxypropyl; 2-aminoethyl, 3-
Examples thereof include amino-substituted alkyl groups such as aminopropyl and the above-mentioned "lower alkyl, lower alkoxy, aryl group optionally substituted by halogen", and lower alkyl groups are preferable.
「ハロゲン化試薬」とは、例えば、スルフエニルクロリ
ド、スルフエニルブロミド、スルフエニルアイオダイド
のようなスルフエニルハライド類、スルホニルクロリ
ド、スルホニルブロミド、スルホニルアイダイドのよう
なスルホニルハライド類、三塩化燐、三臭化燐、三沃化
燐のような三ハロゲン化燐類、五塩化燐、五臭化燐、五
沃化燐のような五ハロゲン化燐類又はオキシ塩化燐、オ
キシ臭化燐、オキシ沃化燐のようなオキシハロゲン化燐
類を挙げることができ、好適には、オキシハロゲン化燐
類である。第1工程は、化合物(I)とアミン化合物と
を溶媒中で反応させ、所望により、アミノ基の保護基又
は/及び水酸基の保護基を除去することにより、4位の
ハロゲン原子を、式Yを有する基に置換した化合物(I
I)を製造する工程である。The "halogenating reagent" is, for example, sulfenyl chloride, sulfenyl bromide, sulfenyl halides such as sulfenyl iodide, sulfonyl chloride, sulfonyl bromide, sulfonyl halides such as sulfonyl iodide, Phosphorus trihalides such as phosphorus trichloride, phosphorus tribromide, phosphorus triiodide, phosphorus pentahalides such as phosphorus pentachloride, phosphorus pentabromide, phosphorus pentaiodide or phosphorus oxychloride, oxyodor Phosphorus oxyhalides such as phosphorus oxychloride and phosphorus oxyiodide can be mentioned, and phosphorus oxyhalides are preferable. In the first step, the compound (I) is reacted with an amine compound in a solvent and, if desired, the amino-protecting group and / or the hydroxyl-protecting group is removed, so that the halogen atom at the 4-position is converted to the formula Y A compound substituted with a group having
This is the process of manufacturing I).
反応溶媒は、反応を阻害しないものであれば特に限定は
ないが、好適にはクロロホルム、ジクロルメタンのよう
なハロゲン化炭化水素類、メタノール、エタノールのよ
うな低級アルコール類、N,N-ジメチルホルムアミド、N,
N-ジメチルアセトアミドのようなアミド類又はジメチル
スルホキシド、ヘキサメチルホスホロアミド、トリエチ
ルホスフエートのような極性溶媒類が用いられる。The reaction solvent is not particularly limited as long as it does not inhibit the reaction, but preferably chloroform, halogenated hydrocarbons such as dichloromethane, lower alcohols such as methanol and ethanol, N, N-dimethylformamide, N,
Amides such as N-dimethylacetamide or polar solvents such as dimethylsulfoxide, hexamethylphosphoramide, triethylphosphate are used.
反応温度は、用いる原料、溶媒及び試薬により異なる
が、通常は−10℃〜100℃で、好適には0℃〜50℃で実
施される。The reaction temperature will differ depending on the starting materials, solvent and reagents used, but is usually −10 ° C. to 100 ° C., and preferably 0 ° C. to 50 ° C.
反応時間は、用いる原料、溶媒、試薬及び反応時間によ
り異なるが、通常1時間乃至4日間であり、好適には4
時間乃至3日間である。The reaction time will differ depending on the starting materials, solvent, reagents and reaction time used, but is usually 1 hour to 4 days, and preferably 4
Time to 3 days.
所望の工程である保護基の除去反応はその種類によつて
異なるが、一般にこの分野の技術において周知の方法に
よつて以下の様に実施される。The desired step, the reaction of removing the protecting group, varies depending on its type, but is generally carried out as follows by a method well known in the art.
水酸基又は/及びアミノ基の保護基が、シリル基である
場合は、保護基の除去は、弗化テトラブチルアンモニウ
ムのような弗素アニオンを生成する化合物で処理するこ
とにより実施することができる。使用される溶媒として
は特に限定はないが、テトラヒドロフラン、ジオキサン
のようなエーテル類が好適である。反応は好適には、室
温付近において10乃至18時間処理することによつて行わ
れる。When the protecting group for the hydroxyl group and / or amino group is a silyl group, the protecting group can be removed by treating with a compound that produces a fluorine anion such as tetrabutylammonium fluoride. The solvent used is not particularly limited, but ethers such as tetrahydrofuran and dioxane are preferable. The reaction is preferably carried out by treating at around room temperature for 10 to 18 hours.
水酸基又は/及びアミノ基の保護基が、アラルキルオキ
シカルボニル基又はアラルキル基である場合には、還元
剤と接触させることにより除去することができる。例え
ば、パラジウム炭素、白金のような触媒を用い、常温に
て接触還元を行うか、または硫化ナトリウム、硫化カリ
ウムのようなアルカリ金属硫化物を使用して実施され
る。反応は溶媒の存在下で行われ、使用される溶媒とし
ては本反応に関与しないものであれば特に限定はない
が、メタノール、エタノールのようなアルコール類、テ
トラヒドロフラン、ジオキサンのようなエーテル類また
は酢酸のような脂肪酸およびこれらの有機溶媒と水との
混合溶媒が好適である。反応温度は通常、0℃乃至室温
付近であり、反応時間は原料化合物および還元剤の種類
によつて異なるが、通常は5分乃至12時間である。When the protective group for the hydroxyl group and / or the amino group is an aralkyloxycarbonyl group or an aralkyl group, it can be removed by bringing it into contact with a reducing agent. For example, catalytic reduction is carried out at room temperature using a catalyst such as palladium carbon or platinum, or an alkali metal sulfide such as sodium sulfide or potassium sulfide is used. The reaction is carried out in the presence of a solvent, and the solvent used is not particularly limited as long as it does not participate in this reaction, but alcohols such as methanol and ethanol, ethers such as tetrahydrofuran and dioxane, or acetic acid. Fatty acids such as and mixed solvents of these organic solvents and water are preferred. The reaction temperature is usually from 0 ° C. to room temperature, and the reaction time is usually from 5 minutes to 12 hours, varying depending on the kinds of the raw material compounds and the reducing agent.
水酸基又は/及びアミノ基の保護基が、脂肪族アシル
基、芳香族アシル基又はアルコキシカルボニル基である
場合には、水性溶媒の存在下に塩基で処理することにか
り除去することができる。使用される溶媒としては通常
の加水分解反応の使用されるものであれば特に限定はな
く、水、メタノール、エタノール、n−プロパノールの
ようなアルコール類、テトラヒドロフラン、ジオキサン
のようなエーテル類又はこれらの混合溶媒が好適であ
る。塩基としては、化合物の他の部分に影響を与えない
ものであれば特に限定はないが、好適には炭酸ナトリウ
ム、炭酸カリウムのようなアルカリ金属炭酸塩、水酸化
ナトリウム、水酸化カリウムのようなアルカリ金属水酸
化物、溶媒として用いたアルコールのアルカリ金属アル
コキシド類又は濃アンモニア−メタノールを用いて実施
される。好適な反応条件としては、アルコール類中で当
該アルコールのアルカリ金属塩と反応させるものであ
る。反応温度は特に限定はないが、副反応を抑制するた
めに0℃乃至150℃付近が好適である。反応時間は原料
化合物の種類および反応温度などにより異なるが、通常
5分乃至10時間である。When the protective group for the hydroxyl group and / or the amino group is an aliphatic acyl group, an aromatic acyl group or an alkoxycarbonyl group, it can be removed by treatment with a base in the presence of an aqueous solvent. The solvent to be used is not particularly limited as long as it is used in a usual hydrolysis reaction, and water, alcohols such as methanol, ethanol and n-propanol, ethers such as tetrahydrofuran and dioxane, or these Mixed solvents are preferred. The base is not particularly limited as long as it does not affect other parts of the compound, but it is preferably an alkali metal carbonate such as sodium carbonate or potassium carbonate, sodium hydroxide or potassium hydroxide. It is carried out using an alkali metal hydroxide, an alkali metal alkoxide of alcohol used as a solvent, or concentrated ammonia-methanol. Suitable reaction conditions are to react with an alkali metal salt of the alcohol in an alcohol. Although the reaction temperature is not particularly limited, it is preferably 0 ° C. to 150 ° C. in order to suppress side reactions. The reaction time varies depending on the kind of the raw material compound and the reaction temperature, but is usually 5 minutes to 10 hours.
水酸基又は/及びアミノ基の保護基が、アルコキシメチ
ル基、テトラヒドロピラニル又はテトラヒドロチオピラ
ニル基、テトラヒドロフラニル又はテトラヒドロチオフ
ラニル基又は置換されたエチル基である場合には、溶媒
中、酸で処理することにより、除去することができる。
使用される酸としては、好適には塩酸、酢酸‐硫酸、ト
シル酸などである。溶媒としては、本反応に関与しない
ものであれば特に限定はないが、メタノール、エタノー
ルのようなアルコール類、テトラヒドロフラン、ジオキ
サンのようなエーテル類またはこれらの有機溶媒と水と
の混合溶媒が好適である。反応温度は通常0℃乃至50℃
で実施され、反応時間は原料化合物および酸の種類によ
つて異なるが、通常10分乃至18時間である。When the protective group for the hydroxyl group and / or the amino group is an alkoxymethyl group, a tetrahydropyranyl or a tetrahydrothiopyranyl group, a tetrahydrofuranyl or a tetrahydrothiofuranyl group or a substituted ethyl group, it is treated with an acid in a solvent. It can be removed by treatment.
The acid used is preferably hydrochloric acid, acetic acid-sulfuric acid, tosylic acid or the like. The solvent is not particularly limited as long as it does not participate in this reaction, but alcohols such as methanol and ethanol, tetrahydrofuran, ethers such as dioxane or a mixed solvent of these organic solvents and water is preferable. is there. Reaction temperature is usually 0 ℃ to 50 ℃
The reaction time is usually 10 minutes to 18 hours, though it varies depending on the kind of the raw material compound and the acid.
水酸基又は/及びアミノ基の保護基がアルケニルオキシ
カルボニル基である場合は、通常、前記水酸基の保護基
が低級脂肪族アシル基、芳香族アシル基またはアルコキ
シカルボニル基である場合の除去反応の条件と同様にし
て塩基と処理することにより脱離させることができる。
なおアリルオキシカルボニルの場合は、特にパラジウム
およびトリフエニルホスフインあるいはニツケルテトラ
カルボニルを使用して除去する方法が簡便で、副反応が
少なく実施することができる。When the protective group for the hydroxyl group and / or the amino group is an alkenyloxycarbonyl group, usually, the removal reaction conditions when the protective group for the hydroxyl group is a lower aliphatic acyl group, an aromatic acyl group or an alkoxycarbonyl group and Similarly, it can be eliminated by treating with a base.
In the case of allyloxycarbonyl, a method of removing it particularly using palladium and triphenylphosphine or nickel tetracarbonyl is simple and can be carried out with few side reactions.
反応終了後、目的化合物は常法に従つて反応混合物から
単離することができる。例えば、再結晶、分取用薄層ク
ロマトグラフイー、カラムクロマトグラフイー等により
精製して、純品を得ることができる。After completion of the reaction, the target compound can be isolated from the reaction mixture by a conventional method. For example, a pure product can be obtained by purification by recrystallization, preparative thin-layer chromatography, column chromatography, or the like.
第2工程は、本庄らの方法(ケミカル・フアーマシユー
テイカル・ブルテイン,18,554(1970))に従つて製造
される2′,3′‐ジデオキシウリジン化合物(III)
と、溶媒の存在下又は非存在下に、脱酸剤及びハロゲン
化試薬とを反応させ、次いで、生成物を単離し、又は単
離することなく、アミン化合物と反応させ、所望によ
り、第1工程の所望の工程の記載に準じて脱保護するこ
とにより、2′,3′‐ジデオキシシチジン誘導体(II)
を製造する工程である。The second step is the 2 ', 3'-dideoxyuridine compound (III) produced according to the method of Honjo et al. (Chemical Pharmaceutical Brutein, 18 , 554 (1970)).
With a deoxidizing agent and a halogenating reagent in the presence or absence of a solvent, and then the product is isolated or, without isolation, is reacted with an amine compound, optionally with a first By deprotecting according to the description of the desired step, a 2 ', 3'-dideoxycytidine derivative (II)
Is a process of manufacturing.
溶媒を使用する場合の反応溶媒としては、反応を阻害し
ないものであれば特に限定はないが、好適には、酢酸エ
チル、プロピオン酸エチルのようなエステル類又はジク
ロルメタン、クロロホルムのようなハロゲン化炭化水素
類である。The reaction solvent in the case of using a solvent is not particularly limited as long as it does not inhibit the reaction, but is preferably an ester such as ethyl acetate or ethyl propionate, or a halogenated carbonic acid such as dichloromethane or chloroform. It is hydrogen.
使用される脱酸剤としては、有機塩基であれば、特に限
定はないが、好適には、ジエチルアニリン、ジメチルア
ニリンのような芳香族第三級アミン類又はトリエチルア
ミンのようなトリ低級アルキルアミン類である。The deoxidizing agent used is not particularly limited as long as it is an organic base, but it is preferable to use aromatic tertiary amines such as diethylaniline and dimethylaniline or tri-lower alkylamines such as triethylamine. Is.
反応温度は、原料、溶媒の有無、使用溶媒の種類及び使
用するハロゲン化試薬により異なるが、通常は30℃乃至
200℃で、好適には、反応液の沸点で行われる。The reaction temperature will differ depending on the raw materials, the presence or absence of solvent, the type of solvent used and the halogenating reagent used, but it is usually from 30 ° C to
It is carried out at 200 ° C., preferably at the boiling point of the reaction liquid.
反応時間は、原料、溶媒の有無、使用溶媒の種類、使用
するハロゲン化試薬及び反応温度により異なるが、通
常、10分乃至5時間であり、好適には20分乃至4時間で
ある。The reaction time varies depending on the raw materials, the presence or absence of a solvent, the type of solvent used, the halogenating reagent used and the reaction temperature, but is usually 10 minutes to 5 hours, and preferably 20 minutes to 4 hours.
反応終了後、本反応の目的化合物は常法に従つて、反応
混合物から採取される。例えば、反応混合物に水と混和
しない有機溶媒を加え、水洗後、溶剤を留去することに
よつて得られる。得られた目的化合物は必要ならば、常
法、例えば再結晶、再沈殿又はクロマトグラフイー等に
よつて更に精製できる。After completion of the reaction, the target compound of this reaction is collected from the reaction mixture according to a conventional method. For example, it can be obtained by adding an organic solvent immiscible with water to the reaction mixture, washing with water and distilling off the solvent. The obtained target compound can be further purified, if necessary, by a conventional method such as recrystallization, reprecipitation or chromatography.
以下に実施例をあげて、更に詳しく述べる。Hereinafter, the present invention will be described in more detail with reference to examples.
実施例1 2′,3′‐ジデオキシシチジン オキシ塩化リン26.5mlに、ジエチルアニリン4.4mlを加
え、還流5分後、放冷し、この溶液を5′‐o-ベンゾイ
ル‐2′,3′‐ジデオキシウリジン3.0gを酢酸エチル2
6.5mlに懸濁した溶液に加えると直ちに溶けた。還流23
分後、溶媒を留去し、酢酸エチル100ml、氷水100mlを加
えて溶かし、酢酸エチル層を分取後、氷水100mlで2回
洗浄した。さらに氷水を含む5%炭酸水素ナトリウム水
溶液100mlで洗浄後、氷水100mlで2回洗浄した後、酢酸
エチル層を無水硫酸マグネシウムで乾燥後、去し、溶
媒を留去して、4-クロロ‐5′‐o-ベンゾイル‐2′,
3′‐ジデオキシウリジンを得た。上記化合物を乾燥ク
ロロホルム180mlに溶かし、−10〜−15℃に冷却し、乾
燥アンモニアガスを1時間導通した。密栓をして室温に
3日間放置後、溶媒を留去すると、粗製5′‐o-ベンゾ
イル‐2′,3′‐ジデオキシシチジンが得られた。この
化合物をさらに、乾燥メタノール70mlに溶かし28%ナト
リウムメチラート溶液1.8mlを加えて、10分間還流を行
つた。溶媒を留去して、酢酸エチル50mlと水50mlに溶か
し、水層を分取し、更に酢酸エチル50mlで2回洗浄し
た。各酢酸エチル層を水30mlで順次逆抽出した後、水層
を合せて、一規定塩酸でpH7.0とした後に、CHP20P(ハ
イポーラスポリマー75〜150μ:三菱ケミカル社製)300
mlを詰めたカラムに通し、水で溶出した。表記化合物を
含む部分を濃縮し、凍結乾燥して1.1gの表記化合物を得
た。(54.9%)エタノール60mlで再結晶すると0.876g
(43.7%)が得られた。さらに母液を濃縮し、エタノー
ル10mlから結晶化させて第二結晶として、0.17gを得、
合せて1.046g(52.2%)の表記化合物を得た。なおここ
で得られた表記目的化合物の諸性質は前記ホルビツツら
の報告している化合物に完全に一致した。Example 1 2 ', 3'-dideoxycytidine To 26.5 ml of phosphorus oxychloride, 4.4 ml of diethylaniline was added, and the mixture was refluxed for 5 minutes and then allowed to cool. This solution was mixed with 3.0 g of 5'-o-benzoyl-2 ', 3'-dideoxyuridine and ethyl acetate
When added to a solution suspended in 6.5 ml, it immediately dissolved. Reflux 23
After the minutes, the solvent was distilled off, and 100 ml of ethyl acetate and 100 ml of ice water were added to dissolve it. The ethyl acetate layer was separated and washed twice with 100 ml of ice water. Further, after washing with 100 ml of a 5% sodium hydrogen carbonate aqueous solution containing ice water, and then washing twice with 100 ml of ice water, the ethyl acetate layer was dried over anhydrous magnesium sulfate and then removed, the solvent was distilled off, and 4-chloro-5 '-O-benzoyl-2',
3'-dideoxyuridine was obtained. The above compound was dissolved in 180 ml of dry chloroform, cooled to -10 to -15 ° C, and dried ammonia gas was passed for 1 hour. After sealing and leaving at room temperature for 3 days, the solvent was distilled off to obtain crude 5'-o-benzoyl-2 ', 3'-dideoxycytidine. This compound was further dissolved in 70 ml of dry methanol, 1.8 ml of 28% sodium methylate solution was added, and the mixture was refluxed for 10 minutes. The solvent was distilled off, the residue was dissolved in 50 ml of ethyl acetate and 50 ml of water, the aqueous layer was separated, and washed twice with 50 ml of ethyl acetate. After sequentially back-extracting each ethyl acetate layer with 30 ml of water, the aqueous layers were combined and adjusted to pH 7.0 with 1N hydrochloric acid, and then CHP20P (high-porous polymer 75 to 150 μ: manufactured by Mitsubishi Chemical Corporation) 300
It was passed through a column packed with ml and eluted with water. The portion containing the title compound was concentrated and freeze-dried to obtain 1.1 g of the title compound. (54.9%) 0.876 g when recrystallized with 60 ml of ethanol
(43.7%) was obtained. The mother liquor was further concentrated and crystallized from 10 ml of ethanol to obtain 0.17 g of second crystals,
A total of 1.046 g (52.2%) of the title compound was obtained. The properties of the target compound thus obtained were completely in agreement with those of the compound reported by Horbits et al.
実施例2 4-クロロ‐5′‐o-ベンゾイル‐2′,3′‐
ジデオキシウリジン 窒素気流下にオキシ塩化リン0.93mlとジエチルアニリン
1.59ml、酢酸エチル10mlの混液に、5′‐o-ベンゾイル
‐2′,3′‐ジデオキシウリジン316mgを加えて、加熱
還流100分行つた。溶媒を留去し、残留物に酢酸エチル2
0mlと氷水20mlを加え、酢酸エチル層を分取後、氷を含
む希塩酸水溶液、氷を含む炭酸水素ナトリウム水溶液、
氷水各15mlで順次洗浄後、酢酸エチル層を無水硫酸マグ
ネシウムで乾燥後、去して、溶媒を留去した。残留物
をシリカゲルクロマトで分離精製し(1%メタノール‐
塩化メチレン溶液)、250mg(74.5%)の表記化合物を
得た。Example 2 4-chloro-5'-o-benzoyl-2 ', 3'-
Dideoxyuridine 0.93 ml of phosphorus oxychloride and diethylaniline under nitrogen stream
To a mixed solution of 1.59 ml and 10 ml of ethyl acetate, 316 mg of 5'-o-benzoyl-2 ', 3'-dideoxyuridine was added, and the mixture was heated under reflux for 100 minutes. The solvent was distilled off, and ethyl acetate was added to the residue.
After adding 0 ml and 20 ml of ice water and collecting the ethyl acetate layer, dilute hydrochloric acid aqueous solution containing ice, sodium hydrogen carbonate aqueous solution containing ice,
After successively washing with 15 ml of ice water each time, the ethyl acetate layer was dried over anhydrous magnesium sulfate and then removed, and the solvent was distilled off. The residue was separated and purified by silica gel chromatography (1% methanol-
Methylene chloride solution), 250 mg (74.5%) of the title compound were obtained.
NMRスペクトル(δin CDCl3):7.4〜8.3(6H,m,6-H,フ
エニル)、6.21(1H,d,J=7.0cps,5-H)、6.00(1H,q,J
=2.6,1′−H)、4.3〜4.7(3H,m,4′,5′−H)、1.7
〜2.8(4H,m,2′,3′−H) 実施例3 2′,3′‐ジデオキシシチジン 実施例2の化合物250mgを乾燥クロロホルム20mlに溶か
し、−10〜−15℃に冷却して、乾燥アンモニアガスを15
分間導通した。密栓をして、室温に3日間放置した。溶
媒を留去すると、粗製5′‐o-ベンゾイル‐2′,3′‐
ジデオキシシチジンが得られた。この化合物を乾燥メタ
ノール10mlに溶かし、28%ナトリウムメチラート溶液0.
15mlを加え、10分間還流を行った。溶媒を留去して、酢
酸エチル10mlと水10mlに溶かし、水層を分散し、更に酢
酸エチル10mlで2回洗浄した。各酢酸エチル層を水5ml
で、順次逆抽出した。水層を合せて、一規定塩酸でpH7.
0とした後に、CHP-20P 40mlを詰めたカラムに通し、水
で溶出した。表記化合物を含む部分を濃縮し、凍結乾燥
して130mg(82.6%)の表記化合物を得た。エタノール4
mlで結晶化させ109mg(69.3%)が得られた。さらに母
液を濃縮してエタノール1mlで結晶化させて第二結晶と
して9mgを得、合せて118mg(75.3%)の表記目的化合物
を得た。なおここに得られた表記目的化合物の諸性質は
実施例1で得られた化合物と一致した。 NMR spectrum (δ in CDCl 3 ): 7.4 to 8.3 (6H, m, 6-H, phenyl), 6.21 (1H, d, J = 7.0cps, 5-H), 6.00 (1H, q, J)
= 2.6,1'-H), 4.3 to 4.7 (3H, m, 4 ', 5'-H), 1.7
~ 2.8 (4H, m, 2 ', 3'-H) Example 3 2', 3'-dideoxycytidine 250 mg of the compound of Example 2 was dissolved in 20 ml of dry chloroform, cooled to -10 to -15 ° C, and dried ammonia gas was added to 15 ml.
It was connected for a minute. The container was tightly closed and left at room temperature for 3 days. Removal of the solvent gave crude 5'-o-benzoyl-2 ', 3'-
Dideoxycytidine was obtained. This compound was dissolved in 10 ml of dry methanol, and a 28% sodium methylate solution of 0.
15 ml was added and refluxed for 10 minutes. The solvent was distilled off, the residue was dissolved in 10 ml of ethyl acetate and 10 ml of water, the aqueous layer was dispersed, and further washed twice with 10 ml of ethyl acetate. 5 ml of water for each ethyl acetate layer
Then, back extraction was carried out sequentially. Combine the aqueous layers and adjust to pH 7 with 1N hydrochloric acid.
After setting to 0, it was passed through a column packed with 40 ml of CHP-20P and eluted with water. The portion containing the title compound was concentrated and freeze-dried to obtain 130 mg (82.6%) of the title compound. Ethanol 4
Crystallization with ml gave 109 mg (69.3%). Further, the mother liquor was concentrated and crystallized with 1 ml of ethanol to obtain 9 mg of a second crystal, and 118 mg (75.3%) of the desired compound was obtained in total. The properties of the notational target compound obtained here were in agreement with those of the compound obtained in Example 1.
Claims (2)
もよい水酸基又は置換された水酸基を示す。)を有する
化合物を、式YHを有する化合物(式中、Yは保護されて
いてもよいアミノ基又は置換されたアミノ基を示す。)
と反応させ、所望により、保護基を除去することを特徴
とする 一般式 (式中、Yは前記と同意義を示し、R2はR1と同様の基を
示す。)で表わされる2′,3′‐ジデオキシシチジン誘
導体の製法。1. A general formula (Wherein, X represents a halogen atom, R 1 represents a hydroxyl group which may be protected or a substituted hydroxyl group), and a compound having the formula YH (wherein Y is protected) Is an amino group or a substituted amino group.)
A general formula characterized by reacting with and optionally removing a protecting group (In the formula, Y has the same meaning as described above and R 2 represents the same group as R 1. ) A process for producing a 2 ′, 3′-dideoxycytidine derivative represented by the formula:
た水酸基を示す。)を有する化合物と、ハロゲン化試薬
とを反応させ、次いで、生成物を単離し、又は単離する
ことなく、式YHを有する化合物(式中、Yは保護されて
いてもよいアミノ基又は置換されたアミノ基を示す。)
と反応させ、所望により保護基を除去することを特徴と
する 一般式 (式中、Yは前記と同意義を示し、R2はR1と同様の基を
示す。)で表わされる2′,3′‐ジデオキシシチジン誘
導体の製法。2. General formula (Wherein, R 1 represents an optionally protected hydroxyl group or a substituted hydroxyl group) is reacted with a halogenating reagent, and then the product is isolated or without isolation. A compound having the formula YH, wherein Y represents an optionally protected amino group or a substituted amino group.
A general formula characterized by reacting with and optionally removing a protecting group (In the formula, Y has the same meaning as described above and R 2 represents the same group as R 1. ) A process for producing a 2 ′, 3′-dideoxycytidine derivative represented by the formula:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62117924A JPH0686448B2 (en) | 1987-05-14 | 1987-05-14 | Process for producing 2 ', 3'-dideoxycytidine derivative |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62117924A JPH0686448B2 (en) | 1987-05-14 | 1987-05-14 | Process for producing 2 ', 3'-dideoxycytidine derivative |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63284193A JPS63284193A (en) | 1988-11-21 |
| JPH0686448B2 true JPH0686448B2 (en) | 1994-11-02 |
Family
ID=14723560
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62117924A Expired - Fee Related JPH0686448B2 (en) | 1987-05-14 | 1987-05-14 | Process for producing 2 ', 3'-dideoxycytidine derivative |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0686448B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07147851A (en) * | 1993-11-30 | 1995-06-13 | Kajima Corp | Water supply system for potted plants |
-
1987
- 1987-05-14 JP JP62117924A patent/JPH0686448B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07147851A (en) * | 1993-11-30 | 1995-06-13 | Kajima Corp | Water supply system for potted plants |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63284193A (en) | 1988-11-21 |
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