JPH0694995B2 - Liquid Flow Dispersion Device for Plate Type Heat Exchanger - Google Patents
Liquid Flow Dispersion Device for Plate Type Heat ExchangerInfo
- Publication number
- JPH0694995B2 JPH0694995B2 JP17419691A JP17419691A JPH0694995B2 JP H0694995 B2 JPH0694995 B2 JP H0694995B2 JP 17419691 A JP17419691 A JP 17419691A JP 17419691 A JP17419691 A JP 17419691A JP H0694995 B2 JPH0694995 B2 JP H0694995B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- heat transfer
- evaporation
- axial direction
- transfer plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F9/00—Casings; Header boxes; Auxiliary supports for elements; Auxiliary members within casings
- F28F9/02—Header boxes; End plates
- F28F9/026—Header boxes; End plates with static flow control means, e.g. with means for uniformly distributing heat exchange media into conduits
- F28F9/027—Header boxes; End plates with static flow control means, e.g. with means for uniformly distributing heat exchange media into conduits in the form of distribution pipes
- F28F9/0273—Header boxes; End plates with static flow control means, e.g. with means for uniformly distributing heat exchange media into conduits in the form of distribution pipes with multiple holes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F27/00—Control arrangements or safety devices specially adapted for heat-exchange or heat-transfer apparatus
- F28F27/02—Control arrangements or safety devices specially adapted for heat-exchange or heat-transfer apparatus for controlling the distribution of heat-exchange media between different channels
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Details Of Heat-Exchange And Heat-Transfer (AREA)
- Heat-Exchange Devices With Radiators And Conduit Assemblies (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、液流下型プレート式熱
交換器、例えば飲食品や薬品等の濃縮に利用される液流
下型プレート式蒸発器の液分散装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid-flow-down plate heat exchanger, for example, a liquid-dispersion device for a liquid-flow-down plate evaporator used for concentrating food and beverages, chemicals and the like.
【0002】[0002]
【従来の技術】一般に、飲食品や薬品等の濃縮には液流
下型プレート式蒸発器が使用されている。この液流下型
プレート式蒸発器の一例として、例えば特公昭60−4820
2号公報に記載のものを図6乃至図10に基づいて説明す
る。2. Description of the Related Art Generally, a liquid flow-down plate type evaporator is used for concentrating food and drinks, chemicals and the like. As an example of this liquid flow-down type plate evaporator, for example, Japanese Patent Publication No. 60-4820
The one described in Japanese Patent Publication No. 2 will be described with reference to FIGS.
【0003】まず、この液流下型プレート式熱交換器は
図6および図7示すように、対向配置されたスタンドフ
レーム1とエンドフレーム2との間に、所定枚数の伝熱
プレート3,3…をシール形状を異にする2種類のガス
ケット4および5を交互に介在させた状態で積層挟持す
ることにより、処理液の流れる蒸発空間Aとスチームの
流れる加熱空間Bとを交互に配置して形成している。
尚、説明の便宜上、蒸発空間Aを形成するガスケット4
を蒸発空間用ガスケットと称し、加熱空間Bを形成する
ガスケット5を加熱空間用ガスケットと称す。First, as shown in FIGS. 6 and 7, this liquid flow-down plate type heat exchanger has a predetermined number of heat transfer plates 3, 3, ... Between a stand frame 1 and an end frame 2 which are arranged opposite to each other. By laminating and sandwiching two kinds of gaskets 4 and 5 having different seal shapes alternately, to form an evaporation space A in which a processing liquid flows and a heating space B in which steam flows alternately. is doing.
For convenience of explanation, the gasket 4 forming the evaporation space A
Is referred to as an evaporation space gasket, and the gasket 5 forming the heating space B is referred to as a heating space gasket.
【0004】上記伝熱プレート3は、図8および図9に
示すように、中央上端部に処理液の流入口(液入口)6
を形成し、この液入口6の両側上端部に幅方向に延びる
オーバーフロー堰7,7を形成している。また、伝熱プ
レート3は、底部両側に分割された濃縮液および蒸発ベ
ーパの流出口(第1出口)8,8を形成し、上記液入口
6と第1出口8,8との間でプレート中央に、複数に分
割されたスチームの流入口(スチーム入口)9,9,9
とスチームドレンおよび非凝縮性ガスの流出口(第2出
口)10を形成している。更に、伝熱プレート3は、上記
液入口6、スチーム入口9,9,9並びに第2出口10に
て左右に分割されたプレート表面に、処理液或いはスチ
ームの流下方向に沿って液分配部11,11、蒸発開始部1
2,12並びに蒸発部13,13が形成されている。上記液分
配部11には、オーバーフロー堰7と対応させて処理液を
伝熱プレート3の伝熱幅全域に均一に分配させる補助手
段として多数の横溝14,14…が形成してある。上記蒸発
開始部12には、上記液分配部11と連なり、上記と同様
に、処理液を伝熱プレート3の伝熱幅全域に均一に分配
させるとともに、裏面側において供給されるスチームを
も伝熱幅全域に均一に分配させる補助手段として多数の
横溝15,15…が形成してある。蒸発部13には、蒸発開始
部12と連なり、蒸発開始部12で均一に分配された処理液
或いはスチームをその均一分配状態を乱すことなく底部
の第1出口8に流下させ、かつ、伝熱促進、強度増加な
らびに投影面積に対する実質伝熱面積の増加等を目的と
して多数の縦溝16,16…が形成してある。尚、伝熱プレ
ート3の液入口6、第1出口8,8、スチーム入口9,
9,9並びに第2出口10にそれぞれ対応するように、上
記スタンドフレーム1に処理液の供給口17、濃縮液およ
び蒸発ベーパの排出口18,18、スチームの供給口19,1
9,19並びにスチームドレンおよび非凝縮性ガスの排出
口20が形成してある。As shown in FIGS. 8 and 9, the heat transfer plate 3 has a processing liquid inlet (liquid inlet) 6 at the center upper end.
And overflow weirs 7, 7 extending in the width direction are formed at both upper ends of the liquid inlet 6. Further, the heat transfer plate 3 forms outlets (first outlets) 8 and 8 for the concentrated liquid and the vaporized vapor which are divided on both sides of the bottom, and the plate is provided between the liquid inlet 6 and the first outlets 8 and 8. In the center, steam inlets (steam inlets) 9, 9
And an outlet (second outlet) 10 for the steam drain and the non-condensable gas. Further, the heat transfer plate 3 has a liquid distributor 11 along the flow-down direction of the treatment liquid or steam on the plate surface divided into left and right by the liquid inlet 6, the steam inlets 9, 9, 9 and the second outlet 10. , 11 、 Evaporation start part 1
2, 12 and evaporation parts 13, 13 are formed. A large number of lateral grooves 14, 14 ... Are formed in the liquid distribution section 11 as auxiliary means corresponding to the overflow weir 7 and for uniformly distributing the processing liquid over the entire heat transfer width of the heat transfer plate 3. The evaporation starter 12 is connected to the liquid distributor 11 to uniformly distribute the treatment liquid over the entire heat transfer width of the heat transfer plate 3 and also to transfer the steam supplied on the back surface side. A large number of lateral grooves 15, 15 ... Are formed as an auxiliary means for uniformly distributing the heat across the entire width. The evaporation part 13 is connected to the evaporation start part 12 to allow the treatment liquid or steam uniformly distributed in the evaporation start part 12 to flow down to the bottom first outlet 8 without disturbing the uniform distribution state, and to transfer heat. A large number of vertical grooves 16, 16 ... Are formed for the purpose of promoting, increasing the strength, and increasing the actual heat transfer area with respect to the projected area. In addition, the liquid inlet 6, the first outlets 8, 8 of the heat transfer plate 3, the steam inlet 9,
9, 9 and the second outlet 10, respectively, so that the processing liquid supply port 17, the concentrated liquid and evaporative vapor discharge ports 18, 18 and the steam supply ports 19, 1 are provided to the stand frame 1 respectively.
9, 19 and steam drain and non-condensable gas outlets 20 are formed.
【0005】上記蒸発空間用ガスケット4は、図8に示
すように、伝熱プレート3のオーバーフロー堰7,7お
よび第1出口8,8を含み液分配部11,11、蒸発開始部
12,12並びに蒸発部13,13の周囲を取り囲むメインシー
ル部4aと、液入口6を囲繞する第1サブシール部4b
と、スチーム入口9,9,9を囲繞する第2サブシール
部4cと、第2出口10を囲繞する第3サブシール部4d
とからなり、この蒸発空間用ガスケット4を伝熱プレー
ト3に設けることによりオーバーフロー堰7,7から流
入する処理液が液分配部11,11および蒸発開始部12,12
を通って蒸発部13,13を流下し、その間で蒸発させられ
ることによって濃縮液や蒸発ベーパとなって第1出口
8,8から流出するように構成されている。As shown in FIG. 8, the evaporation space gasket 4 includes the overflow weirs 7 and 7 of the heat transfer plate 3 and the first outlets 8 and 8, and the liquid distribution portions 11 and 11 and the evaporation start portion.
A main seal portion 4a surrounding the peripheries 12 and 12 and the evaporation portions 13 and 13, and a first sub-seal portion 4b surrounding the liquid inlet 6.
And a second sub-seal part 4c surrounding the steam inlet 9, 9, 9 and a third sub-seal part 4d surrounding the second outlet 10.
By providing the evaporation space gasket 4 on the heat transfer plate 3, the processing liquid flowing in from the overflow weirs 7, 7 is distributed to the liquid distribution parts 11, 11 and the evaporation start parts 12, 12
The evaporators 13 and 13 are made to flow down through it, and are evaporated during that time to become concentrated liquid or evaporation vapor and flow out from the first outlets 8 and 8.
【0006】一方、加熱空間用ガスケット5は、図9に
示すように、伝熱プレート3のオーバーフロー堰7,7
および第1出口8,8を含み液分配部11、蒸発開始部12
並びに蒸発部13の周囲を取り囲むメインシール部5a
と、液入口6およびオーバーフロー堰7,7を囲繞し、
かつ、液入口6とオーバーフロー堰7,7との間にもぐ
りオリフィス21,21を形成する第1サブシール部5b
と、第1出口8,8を囲繞する第2サブシール部5c
と、スチーム入口9,9,9を囲繞し、かつ、その最上
部のスチーム入口9の上部両側に上端開口部22,22を形
成する第3サブシール部5dと、第2出口10を囲繞し、
かつ、この第2出口10の下部両側に下端開口部23,23を
形成する第4サブシール部5eとからなる。従って、上
記加熱空間用ガスケット5を伝熱プレート3に設けるこ
とにより液入口6から流入する処理液は、図10に示すよ
うに、もぐりオリフィス21,21を通って液分配部11,11
の最下部へ流れ込み、ここで充満しながら上昇して上端
のオーバーフロー堰7,7から隣接する蒸発空間Aへ流
入する。一方、スチーム入口9,9,9から流入するス
チームは、処理液と混合することなく上端開口部22,22
を通って加熱空間Bの蒸発開始部12,12および蒸発部1
3,13を流下し、その間に蒸発開始部12,12および蒸発
部13,13を加熱することによって蒸発空間Aの蒸発開始
部12,13および蒸発部13,13を流下する処理液を蒸発さ
せる。そして、スチームは、この後、スチームドレンお
よび非凝縮性ガスとなって第2出口10から流出する。On the other hand, as shown in FIG. 9, the heating space gasket 5 includes the overflow weirs 7, 7 of the heat transfer plate 3.
And a liquid distribution part 11 including the first outlets 8 and 8, an evaporation start part 12
And a main seal portion 5a surrounding the evaporation portion 13
And surrounding the liquid inlet 6 and the overflow weirs 7, 7.
Moreover, the first sub-seal portion 5b which forms the boring orifices 21, 21 between the liquid inlet 6 and the overflow weirs 7, 7.
And a second sub-seal portion 5c surrounding the first outlets 8,8
And surrounds the steam inlets 9, 9, 9, and surrounds the second outlet 10 and the third sub-seal portion 5d forming the upper end openings 22, 22 on both upper sides of the uppermost steam inlet 9,
Further, it is composed of a fourth sub-seal portion 5e forming lower end openings 23, 23 on both sides of the lower portion of the second outlet 10. Therefore, by providing the heating space gasket 5 on the heat transfer plate 3, the processing liquid flowing in from the liquid inlet 6 passes through the hollow orifices 21 and 21 and the liquid distribution portions 11 and 11 as shown in FIG.
Flows into the lowermost part of the column, rises while being filled there, and flows into the adjacent evaporation space A from the overflow weirs 7, 7 at the upper end. On the other hand, the steam flowing in through the steam inlets 9, 9, 9 does not mix with the treatment liquid, and the upper end openings 22, 22
Through the evaporation space 12 and the evaporation part 1 of the heating space B
3 and 13 are made to flow down, and the evaporation start parts 12 and 12 and the evaporation parts 13 and 13 are heated in the meantime to evaporate the treatment liquid flowing down the evaporation start parts 12 and 13 and the evaporation parts 13 and 13 of the evaporation space A. . Then, the steam then becomes steam drain and non-condensable gas and flows out from the second outlet 10.
【0007】液流下型プレート式熱蒸発器は上記構成か
らなり、次にその作用について説明する。The liquid flow-down plate type thermal evaporator has the above-mentioned structure, and its operation will be described below.
【0008】スタンドフレーム1の処理液供給口17に処
理液を供給し、スチーム供給口19,19,19にスチームを
供給する。すると、処理液は伝熱プレート3の液入口6
からもぐりオリフィス21,21を通って液分配部11,11の
最下部へ流れ込み、ここで圧力緩和され、横溝14,14…
に案内されて水平に拡散されながら充満上昇し、伝熱プ
レート3の上端部に成形されたオーバーフロー堰7,7
に達し、ここから均一な液膜厚さで伝熱プレート3の伝
熱幅全域に亘ってオーバーフローし、隣接する蒸発空間
Aに流入する。処理液は、ここで横溝14,14…によって
更に幅方向に拡散され、伝熱プレート3の伝熱幅全域に
亘って拡散された状態で蒸発開始部12,12および蒸発部
13,13を流下する。The processing liquid is supplied to the processing liquid supply port 17 of the stand frame 1, and the steam is supplied to the steam supply ports 19, 19, 19. Then, the processing liquid is supplied to the liquid inlet 6 of the heat transfer plate 3.
It flows through the muffled orifices 21 and 21 to the lowermost part of the liquid distribution parts 11 and 11, where the pressure is relieved and the lateral grooves 14 and 14 ...
The overflow weirs 7, 7 formed on the upper end portion of the heat transfer plate 3 while being guided by the
From there, it overflows over the entire heat transfer width of the heat transfer plate 3 with a uniform liquid film thickness, and flows into the adjacent evaporation space A. Here, the treatment liquid is further diffused in the width direction by the lateral grooves 14, 14, ... In the state where the treatment liquid is diffused over the entire heat transfer width of the heat transfer plate 3, the evaporation start parts 12, 12 and the evaporation part.
Flow down 13,13.
【0009】一方、スチームは伝熱プレート3のスチー
ム入口9,9,9から加熱空間用ガスケット5の第3サ
ブシール部5dにより形成された上端開口部22,22を通
って加熱空間Bの蒸発開始部12,12へ流れ込み、横溝1
5,15…で伝熱プレート3の伝熱幅全域に亘って拡散さ
れ、蒸発部13,13へ流下する。On the other hand, steam begins to evaporate in the heating space B from the steam inlets 9, 9, 9 of the heat transfer plate 3 through the upper end openings 22, 22 formed by the third sub-seal portion 5d of the heating space gasket 5. Flowed into parts 12 and 12, lateral groove 1
At 5, 15, ... Diffuse over the entire heat transfer width of the heat transfer plate 3, and flow down to the evaporation sections 13, 13.
【0010】これにより、伝熱プレート3の蒸発空間A
側の蒸発開始部12,12および蒸発部13,13を流下する処
理液と、伝熱プレート3の加熱空間B側の蒸発開始部1
2,12および蒸発部12,13を流下するスチームとが、伝
熱プレート3を介して熱交換を行い、蒸発空間A側で生
じた濃縮液と蒸発ベーパは、伝熱プレート3の第1出口
8,8から流出してスタンドフレーム1の排出口18,18
から排出され、その後、気水分離されて濃縮液として取
出される。蒸発ベーパは次の加熱に利用される。一方、
加熱空間B側で生じたスチームドレンと非凝縮性ガス
は、加熱空間用ガスケット5の第4サブシール部5eの
下端開口部23,23を通って第2出口10に流入し、その
後、スタンドフレーム1の排出口20から系外に排出され
る。As a result, the evaporation space A of the heat transfer plate 3
Side evaporation starting parts 12, 12 and the processing liquid flowing down the evaporation parts 13, 13 and the evaporation starting part 1 on the heating space B side of the heat transfer plate 3
2, 12 and the steam flowing down the evaporators 12, 13 exchange heat via the heat transfer plate 3, and the concentrated liquid and the evaporation vapor generated on the evaporation space A side are the first outlet of the heat transfer plate 3. 8 and 8 flow out from the stand frame 1 outlet 18,18
And then separated into steam and water and taken out as a concentrated liquid. The evaporation vapor is used for the next heating. on the other hand,
The steam drain and the non-condensable gas generated on the heating space B side flow into the second outlet 10 through the lower end openings 23, 23 of the fourth sub-seal portion 5e of the heating space gasket 5, and then the stand frame 1 Is discharged to the outside of the system from the discharge port 20 of.
【0011】このようにして、スタンドフレーム1の処
理液供給口に連続して処理液を供給され、また、スチー
ム供給口に連続してスチームを供給させることによっ
て、伝熱プレート3の蒸発空間A側の蒸発部13,13を流
下する処理液と、伝熱プレート3の加熱空間B側の蒸発
部13,13を流下するスチームとの間で熱交換が行われ、
所定濃度に濃縮された濃縮液が取出される。In this way, the treatment liquid is continuously supplied to the treatment liquid supply port of the stand frame 1 and the steam is continuously supplied to the steam supply port, whereby the evaporation space A of the heat transfer plate 3 is Heat is exchanged between the processing liquid flowing down the evaporation parts 13, 13 on the side and the steam flowing down the evaporation parts 13, 13 on the heating space B side of the heat transfer plate 3,
The concentrated liquid concentrated to a predetermined concentration is taken out.
【0012】上記液流下型プレート式蒸発器では、処理
液を伝熱プレート3の蒸発空間A側に直接供給せず、伝
熱プレート3の液入口6からもぐりオリフィス21,21を
通って伝熱プレート3の加熱空間B側の液分配部11,11
の最下部へ流入させ、ここで加熱空間用ガスケット5の
第1サブシール部5bによって処理液の流下を阻止し、
横溝13,13…により案内させて拡散させながら処理液を
充満上昇させている。そして、もぐりオリフィス21,21
からオーバーフロー堰7,7までの高さを上昇する間に
処理液は、伝熱プレート3の伝熱幅全域に亘って拡散さ
れ、この後、オーバーフロー堰7,7によって一定の液
膜厚さを維持した状態でオーバーフローし、伝熱プレー
ト3の蒸発空間A側の液分配部11,11の上端へ全幅に亘
って拡散されたまま供給される。更に、処理液は伝熱プ
レート3の蒸発空間A側の液分配部11,11および蒸発開
始部12,12を流下する際に、横溝14,14…および15,15
…によって伝熱幅全域に拡散されるので、伝熱プレート
3の蒸発空間A側の蒸発開始部12,12の下縁において
は、伝熱面の全幅に亘って均一な液膜厚さを持つように
拡散されている。In the liquid flow-down type plate evaporator, the processing liquid is not directly supplied to the evaporation space A side of the heat transfer plate 3, but heat is transferred from the liquid inlet 6 of the heat transfer plate 3 through the gouge orifices 21 and 21. Liquid distribution parts 11, 11 on the heating space B side of the plate 3
Flow into the lowermost part of the heating space, where the first sub-seal portion 5b of the heating space gasket 5 prevents the processing liquid from flowing down,
The treatment liquid is filled and raised while being guided by the lateral grooves 13, 13 ... And the muzzle orifices 21, 21
The processing liquid is diffused over the entire heat transfer width of the heat transfer plate 3 while increasing the height from the overflow weirs 7, 7 to a certain liquid film thickness by the overflow weirs 7, 7. In a maintained state, it overflows and is supplied to the upper ends of the liquid distributors 11, 11 on the evaporation space A side of the heat transfer plate 3 while being diffused over the entire width. Further, when the treatment liquid flows down through the liquid distribution parts 11, 11 and the evaporation start parts 12, 12 on the evaporation space A side of the heat transfer plate 3, the lateral grooves 14, 14 ... And 15, 15
The heat transfer plate 3 has a uniform liquid film thickness over the entire width of the heat transfer surface at the lower edges of the evaporation start portions 12, 12 on the evaporation space A side of the heat transfer plate 3 because it is diffused over the entire heat transfer width. Has been spread.
【0013】一方、スチームも伝熱プレート3のスチー
ム入口9,9,9から上端開口部22,22を通って伝熱プ
レート3の加熱空間B側の蒸発開始部12,12へ供給され
ると、横溝14,14…によって伝熱幅全域に拡散されるの
で、伝熱プレート3の加熱空間B側の蒸発開始部12,12
の下縁においては、伝熱面の全幅にわたって均一なスチ
ーム膜厚さを持つように拡散されている。On the other hand, when steam is also supplied from the steam inlets 9, 9, 9 of the heat transfer plate 3 through the upper end openings 22, 22, to the evaporation start parts 12, 12 of the heat transfer plate 3 on the heating space B side. , The lateral grooves 14, 14 are diffused over the entire heat transfer width, so that the evaporation start portions 12, 12 on the heating space B side of the heat transfer plate 3
At the lower edge of the heat transfer surface, it is diffused so as to have a uniform steam film thickness over the entire width of the heat transfer surface.
【0014】この結果、伝熱プレート3の蒸発空間A側
の蒸発部13,13を流下する処理液と、伝熱プレート3の
加熱空間B側の蒸発部13,13を流下するスチームとは、
伝熱面の全幅に亘って均一に拡散される。この均一拡散
作用は、縦溝16,16…によって持続される。このように
して広い伝熱面積と高い伝熱係数が確保されるため、処
理速度が早くなるとともに熱交換効率が高くなる。As a result, the treatment liquid flowing down the evaporation parts 13, 13 of the heat transfer plate 3 on the evaporation space A side and the steam flowing down the evaporation parts 13, 13 of the heat transfer plate 3 on the heating space B side are
The heat is uniformly spread over the entire width of the heat transfer surface. This uniform diffusion action is sustained by the flutes 16, 16. In this way, a large heat transfer area and a high heat transfer coefficient are ensured, so that the processing speed becomes faster and the heat exchange efficiency becomes higher.
【0015】ところで、上記液流下型プレート式蒸発器
においては、スタンドフレーム1の供給口17へ供給され
る処理液が、所定枚数の伝熱プレート3,3…を2種類
のガスケット4および5を交互に介在して積層すること
によりそれぞれの伝熱プレート3の液入口6同士が連通
してスタンドフレーム1とエンドフレーム2の間に形成
された液供給通路24の全長に亘って均一に流れ、それぞ
れの蒸発空間Aへ均等な流量比で分散されることが重要
である。即ち、処理液がそれぞれの蒸発空間Aに均等な
流量比で分散されないと、処理液の供給が少ない蒸発空
間Aで伝熱プレート3の表面への処理液の焼付きや汚れ
等が生じて処理液が汚染され、製品の品質に悪影響が及
ぼされるから、これを防止するために操業を停止して液
流下型プレート式蒸発器を分解し、伝熱プレート3を洗
浄して焼付きや汚れ等を除去しなければならず、生産性
の低下や省力化の阻害等の問題が発生する。In the liquid flow-down type plate evaporator, the processing liquid supplied to the supply port 17 of the stand frame 1 has a predetermined number of heat transfer plates 3, 3, ... By alternately interposing and stacking, the liquid inlets 6 of the respective heat transfer plates 3 communicate with each other and flow uniformly over the entire length of the liquid supply passage 24 formed between the stand frame 1 and the end frame 2, It is important that the respective evaporation spaces A are dispersed at a uniform flow rate. That is, unless the treatment liquid is dispersed in the respective evaporation spaces A at a uniform flow rate, the treatment liquid may be burned or soiled on the surface of the heat transfer plate 3 in the evaporation space A where the supply of the treatment liquid is small. Since the liquid is contaminated and adversely affects the quality of the product, in order to prevent this, the operation is stopped, the liquid flow down type plate evaporator is disassembled, and the heat transfer plate 3 is washed to cause seizure or dirt. Must be removed, which causes problems such as reduction in productivity and inhibition of labor saving.
【0016】そこで、本出願人は処理液をそれぞれの蒸
発空間Aへ均等な流量比で分散するための提案を、特願
昭61−44382号(特開昭62−202994号公報参照)におい
て既に出願している。これは、図11に示すように、それ
ぞれの伝熱プレート3の液入口6同士が連通して成形さ
れた液供給通路24内に、中空円筒状の液分散ノズル25を
位置決め状態で嵌挿固着するとともに、この液分散ノズ
ル25の円筒状周壁面に軸線方向に沿って多数の細孔26,
26…を穿設している。従って、スタンドフレーム1の供
給口17へ処理液を供給すると、この処理液は液分散ノズ
ル25内に流入して液分散ノズル26の周壁面に穿設された
細孔26,26…を通って均等な流量比状態で液供給通路24
に押出され、その後、それぞれの伝熱プレート3の液入
口6からもぐりオリフィス21,21、液分配部11,11、オ
ーバーフロー堰7,7を通ってそれぞれの蒸発空間Aに
供給される。尚、上記液分散ノズル25の周壁面に穿設さ
れた細孔26,26…の孔径と穿設ピッチを処理液の種類や
単位時間当り流量、伝熱プレート3の液入口6の大きさ
に応じて選定することによって、液分散ノズル25の軸線
方向に沿う処理液の流量を調節し、これによって処理液
をそれぞれの蒸発空間Aへ均等な流量比で分散する。Therefore, the applicant of the present invention has already proposed in Japanese Patent Application No. 61-44382 (Japanese Patent Application Laid-Open No. 62-202994) a proposal for dispersing the treatment liquid in each evaporation space A at a uniform flow rate ratio. I am applying. As shown in FIG. 11, a hollow cylindrical liquid dispersion nozzle 25 is fitted and fixed in a positioned state in a liquid supply passage 24 formed by communicating the liquid inlets 6 of the respective heat transfer plates 3 with each other. In addition, a large number of pores 26 are formed along the axial direction on the cylindrical peripheral wall surface of the liquid dispersion nozzle 25.
26 ... has been drilled. Therefore, when the processing liquid is supplied to the supply port 17 of the stand frame 1, the processing liquid flows into the liquid dispersion nozzle 25 and passes through the pores 26, 26 ... Liquid supply passage 24 with an even flow ratio
And then supplied from the liquid inlets 6 of the respective heat transfer plates 3 to the respective evaporation spaces A through the escape orifices 21, 21, the liquid distributors 11, 11, and the overflow weirs 7, 7. In addition, the hole diameter and the hole pitch of the fine holes 26, 26 formed on the peripheral wall surface of the liquid dispersion nozzle 25 are set according to the type of the processing liquid, the flow rate per unit time, and the size of the liquid inlet 6 of the heat transfer plate 3. Depending on the selection, the flow rate of the processing liquid along the axial direction of the liquid dispersion nozzle 25 is adjusted, whereby the processing liquid is dispersed in each evaporation space A at a uniform flow rate ratio.
【0017】[0017]
【発明が解決しようとする課題】ところで、従来の液流
下型プレート式蒸発器では、処理液をそれぞれの蒸発空
間Aへ均等な流量比で分散する目的で、液供給通路24内
に周壁面に軸方向に沿って多数の細孔26,26…を穿設し
てなる中空円筒状の液分散ノズル25が嵌挿固着されてい
るため、伝熱プレート3の積層枚数を増減したり、増締
により液供給通路24の寸法が変化する場合、液分散ノズ
ル25を液供給通路24の寸法に対応したものに取替える必
要があり、液分散ノズル25の取替え作業に時間および手
間を要するとともに、寸法の異なる液分散ノズル25をい
くつも用意する必要があり、それだけコストが嵩むとと
もに、それぞれの液分散ノズル25をストックするための
スペースを必要する等の問題があった。By the way, in the conventional liquid flow-down type plate evaporator, in order to disperse the treatment liquid into the respective evaporation spaces A at a uniform flow rate, the liquid supply passage 24 is provided with a peripheral wall surface. Since a hollow cylindrical liquid dispersion nozzle 25 having a large number of pores 26, 26 formed along the axial direction is fitted and fixed, the number of laminated heat transfer plates 3 can be increased or decreased, or tightened. When the size of the liquid supply passage 24 changes due to, it is necessary to replace the liquid dispersion nozzle 25 with one that corresponds to the size of the liquid supply passage 24, and it takes time and labor to replace the liquid dispersion nozzle 25, and It is necessary to prepare a number of different liquid dispersion nozzles 25, which increases costs and requires a space for stocking each liquid dispersion nozzle 25.
【0018】[0018]
【課題を解決するための手段】本発明は上記課題を解決
するため、処理液の出入口および熱媒体の出入口を有す
る伝熱プレートを、シール構造を異にする2種類のガス
ケットを交互に介在して所定枚数積層することにより各
伝熱プレート間に処理液が流れる空間と熱媒体が流れる
空間を交互に配設してなる液流下型プレート式熱交換器
を構成し、この液流下型プレート式熱交換器のそれぞれ
の伝熱プレートの処理液の入口同士が連通して形成され
た処理液の供給通路内に、周壁面に軸線方向に沿う全域
に亘って多数の細孔を穿設してなる液分散ノズルを位置
決め状態で嵌挿固着した液流下型プレート式熱交換器の
液分散装置において、上記液分散ノズルが、周壁面に軸
線方向に沿う全域に亘って多数の細孔を穿設し、かつ、
外周面に軸線方向に沿ってガイド棒を固設したスライド
パイプと、同じく周壁面に軸線方向に沿う全域に亘って
多数の細孔を穿設し、かつ、内周面に上記スライドパイ
プの外径と同じ内径を有するフランジを突設するととも
に、このフランジに上記スライドパイプのガイド棒と対
向して切欠きを有する固定パイプとからなり、上記スラ
イドパイプを上記固定パイプ内に、スライドパイプのガ
イド棒を固定パイプの切欠きに嵌入させた状態でスライ
ド自在に嵌挿した液流下型プレート式熱交換器の液分散
装置を提供する。In order to solve the above-mentioned problems, the present invention has a heat transfer plate having an inlet / outlet of a treatment liquid and an inlet / outlet of a heat medium, in which two kinds of gaskets having different sealing structures are alternately interposed. A liquid flow-down plate type heat exchanger is constructed by stacking a predetermined number of layers by alternately arranging the space through which the processing liquid flows and the space through which the heat medium flows between the heat transfer plates. A large number of pores are formed on the peripheral wall surface along the axial direction in the processing liquid supply passage formed by the inlets of the processing liquid of the respective heat transfer plates of the heat exchanger communicating with each other. In the liquid dispersion device of the liquid flow-down type plate heat exchanger in which the liquid dispersion nozzle is fitted and fixed in a positioned state, the liquid dispersion nozzle has a large number of pores formed on the peripheral wall surface along the entire axial direction. And
A slide pipe in which a guide rod is fixedly mounted along the axial direction on the outer peripheral surface, and a large number of pores formed on the peripheral wall along the entire axial direction, and an outer surface of the slide pipe on the inner peripheral surface. A flange having a same inner diameter as that of the projection is provided, and a fixed pipe having a notch facing the guide rod of the slide pipe is provided on the flange, and the slide pipe is inserted into the fixed pipe to guide the slide pipe. (EN) Provided is a liquid dispersion device of a liquid flow-down type plate heat exchanger in which a rod is slidably inserted in a notch of a fixed pipe.
【0019】[0019]
【作用】本発明の液流下型プレート式熱交換器によれ
ば、伝熱プレートの積層枚数の増減や増締等により処理
液の液供給通路の寸法が変化する場合には、液分散ノズ
ルのスライドパイプを固定パイプの軸線方向に沿ってス
ライドして当該液分散ノズルを伸縮させる。According to the liquid flow-down plate type heat exchanger of the present invention, when the size of the liquid supply passage of the processing liquid changes due to increase or decrease in the number of stacked heat transfer plates or tightening, The slide pipe is slid along the axial direction of the fixed pipe to expand and contract the liquid dispersion nozzle.
【0020】[0020]
【実施例】以下、本発明を液流下型プレート式蒸発器に
適用した一実施例を図1〜図5に基づいて説明する。
尚、従来技術を示す図6〜図11と同一の構成部材には同
一の符号を付し、重複する事項に関しては説明を省略す
る。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment in which the present invention is applied to a liquid flow-down type plate evaporator will be described below with reference to FIGS.
6 to 11 showing the prior art, the same reference numerals are given to the same components, and the description of the overlapping matters will be omitted.
【0021】図1において、27は処理液をそれぞれの蒸
発空間Aへ均等な流量比で分散するための伸縮式液分散
ノズルで、所定枚数の伝熱プレート3,3…の液入口
6,6…同士が連通して形成された液供給通路24内に位
置決め状態で嵌挿固着されている。In FIG. 1, 27 is a telescopic liquid dispersion nozzle for dispersing the processing liquid into each evaporation space A at a uniform flow rate, and liquid inlets 6, 6 of a predetermined number of heat transfer plates 3, 3. ... are fixedly fitted and fixed in a liquid supply passage 24 formed by communicating with each other.
【0022】上記伸縮式液分散ノズル27は、図2に示す
ように、円筒状周壁面に軸線方向に沿う全域に亘って多
数の細孔28,28…を穿設した中空円筒状の固定パイプ29
と、同じく円筒状周壁面に軸線方向に沿う全域に亘って
多数の細孔30,30…を穿設した有底円筒状のスライドパ
イプ31とからなり、上記固定パイプ29をその一端をスタ
ンドフレーム1に固着して液供給通路24内に位置決め状
態で嵌挿固着するとともに、この固定パイプ29内に上記
スライドパイプ31をスライド自在に嵌挿することによ
り、スタンドフレーム1とエンドフレーム2の間の伝熱
フレーム3,3…の積層枚数の変化に応じて伸縮できる
ように構成されている。上記固定パイプ29の細孔28,28
…およびスライドパイプ31の細孔30,30…は、図3およ
び図4に示すように、周壁面下部に左右にそれぞれ所定
の開き角度で2列に整列して所定のピッチで穿設されて
おり、その孔径および穿設ピッチを処理液の種類や単位
時間当り流量、伝熱プレート3の液入口6の大きさに応
じて設定することによって、液分散ノズル27の軸線方向
に沿う処理液の流量を調整する。As shown in FIG. 2, the telescopic liquid dispersion nozzle 27 is a hollow cylindrical fixed pipe in which a large number of pores 28, 28 ... Are bored on the entire circumferential wall surface along the axial direction. 29
And a bottomed cylindrical slide pipe 31 in which a large number of pores 30, 30 ... Are bored all over the cylindrical peripheral wall surface along the axial direction, and the fixed pipe 29 is connected to a stand frame at one end thereof. 1 is fixedly fitted into the liquid supply passage 24 while being fitted and fixed in the liquid supply passage 24, and the slide pipe 31 is slidably fitted and inserted into the fixed pipe 29 so that the space between the stand frame 1 and the end frame 2 is The heat transfer frames 3, 3 ... Can be expanded and contracted according to the number of laminated layers. Pores 28, 28 of the fixed pipe 29
, And the pores 30, 30 of the slide pipe 31, as shown in FIGS. 3 and 4, are formed in two rows on the lower part of the peripheral wall at a predetermined opening angle and at a predetermined pitch. By setting the hole diameter and the drilling pitch according to the type of the processing liquid, the flow rate per unit time, and the size of the liquid inlet 6 of the heat transfer plate 3, the processing liquid along the axial direction of the liquid dispersion nozzle 27 can be set. Adjust the flow rate.
【0023】また、上記伸縮式液分散ノズル27は、スラ
イドパイプ31の外周面に軸線方向に沿ってガイド棒32が
固設し、また、固定パイプ29の内周面にスライドパイプ
31の外径と同じ内径を有するフランジ33が突設するとと
もに、このフランジ33にスライドパイプ31のガイド棒32
と対応してV字状の切欠き34を形成してあり、スライド
パイプ31を固定パイプ29内に、スライドパイプ31のガイ
ド棒32を固定パイプ29の切欠き34に嵌入させた状態で嵌
挿することにより、スライドパイプ31がその周方向に回
転することなく固定パイプ29の軸線方向に沿ってスライ
ドするように構成されている。In the telescopic liquid dispersion nozzle 27, a guide rod 32 is fixedly mounted on the outer peripheral surface of a slide pipe 31 along the axial direction, and a slide pipe is mounted on the inner peripheral surface of a fixed pipe 29.
A flange 33 having the same inner diameter as the outer diameter of 31 is projected, and the guide rod 32 of the slide pipe 31 is attached to this flange 33.
A V-shaped notch 34 is formed in correspondence with the slide pipe 31 in the fixed pipe 29, and the guide rod 32 of the slide pipe 31 is fitted in the notch 34 in the fixed pipe 29. By doing so, the slide pipe 31 is configured to slide along the axial direction of the fixed pipe 29 without rotating in the circumferential direction.
【0024】上記構成において、スタンドフレーム1の
供給口へ処理液17を供給すると、この処理液は液分散ノ
ズル27の固定パイプ29およびスライドパイプ31内に流入
して固定パイプ29およびスライドパイプ31の周壁面に穿
設された細孔28,28…および30,30…を通って均等な流
量比状態で液供給通路24内に押出され、その後、それぞ
れの伝熱プレート3の液入口6からもぐりオリフィス2
1,21、液分配部11,11、オーバーフロー堰7,7を通
ってそれぞれの蒸発空間Aに供給される。In the above structure, when the processing liquid 17 is supplied to the supply port of the stand frame 1, this processing liquid flows into the fixed pipe 29 and the slide pipe 31 of the liquid dispersion nozzle 27 and the fixed pipe 29 and the slide pipe 31. It is extruded into the liquid supply passage 24 through the pores 28, 28 ... And 30, 30 ... Perforated on the peripheral wall surface at a uniform flow ratio state, and then it is slipped from the liquid inlet 6 of each heat transfer plate 3. Orifice 2
It is supplied to each evaporation space A through 1, 21, the liquid distribution parts 11, 11, and the overflow weirs 7, 7.
【0025】ところで、本発明では、液分散ノズル27の
スライドパイプ31を固定パイプ29の軸線方向に沿ってス
ライドして当該液分散ノズル27を伸縮させることによ
り、スタンドフレーム1とエンドフレーム2の間に積層
挟持された伝熱プレート3の積層枚数の増減や増締等に
よる液供給通路24の寸法の変化に対応することができ
る。この時、スライドパイプ31は固定パイプ29のフラン
ジ33に形成された切欠き34にガイド棒32が嵌合されてい
るため、その周方向に回転することなく固定パイプ29の
軸線方向にスライドし、これにより液分散ノズル27の軸
線方向の全長に亘り処理液を同じ条件で流出できで均等
な流量比を維持することができる。By the way, in the present invention, the slide pipe 31 of the liquid dispersion nozzle 27 is slid along the axial direction of the fixed pipe 29 to expand and contract the liquid dispersion nozzle 27, so that between the stand frame 1 and the end frame 2. It is possible to cope with a change in the size of the liquid supply passage 24 due to an increase or decrease in the number of layers of the heat transfer plates 3 sandwiched and sandwiched between the two and the tightening. At this time, since the slide pipe 31 is fitted with the guide rod 32 in the notch 34 formed in the flange 33 of the fixed pipe 29, the slide pipe 31 slides in the axial direction of the fixed pipe 29 without rotating in the circumferential direction, As a result, the treatment liquid can flow out under the same condition over the entire length of the liquid dispersion nozzle 27 in the axial direction, and a uniform flow ratio can be maintained.
【0026】[0026]
【発明の効果】本発明は以上説明したように、周壁面に
多数の細孔を穿設した中空円筒状の固定パイプに、同じ
く周壁面に多数の細孔を穿設した有底円筒状のスライド
パイプをスライド自在に嵌挿してなる伸縮可能な液分散
ノズルを使用することによって、伝熱プレートの積層枚
数の増減や増締等による処理液の液供給通路の寸法の変
化に対応することができ、これにより従来のように液分
散ノズルの取替え作業を行う必要がなく、稼働効率の向
上並びに作業の省力化が図れる。As described above, according to the present invention, a hollow cylindrical fixed pipe having a large number of pores formed on its peripheral wall surface has a bottomed cylindrical shape having a large number of pores formed on its peripheral wall surface. By using an expandable liquid dispersion nozzle that is slidably fitted with a slide pipe, it is possible to respond to changes in the size of the liquid supply passage for the processing liquid due to increase or decrease in the number of laminated heat transfer plates or tightening. As a result, it is not necessary to replace the liquid dispersion nozzle as in the conventional case, and it is possible to improve operating efficiency and save labor.
【図1】本発明の液流下型プレート式熱交換器の液分散
装置の一実施例を示す概略縦断面図である。FIG. 1 is a schematic longitudinal sectional view showing an embodiment of a liquid dispersion device of a liquid flow-down plate heat exchanger of the present invention.
【図2】伸縮式液分散ノズルの詳細を示す縦断面図であ
る。FIG. 2 is a vertical cross-sectional view showing details of a telescopic liquid dispersion nozzle.
【図3】図2のA−A線における断面図である。3 is a cross-sectional view taken along the line AA of FIG.
【図4】図2のB−B線における断面図である。FIG. 4 is a sectional view taken along line BB in FIG.
【図5】図2のC−C線における断面図である。5 is a cross-sectional view taken along the line CC of FIG.
【図6】液流下型プレート式熱蒸発器の概略縦断面図で
ある。FIG. 6 is a schematic vertical sectional view of a liquid flow-down plate type thermal evaporator.
【図7】液流下型プレート式熱蒸発器の分解斜視図であ
る。FIG. 7 is an exploded perspective view of a liquid flow-down plate type heat evaporator.
【図8】蒸発空間用ガスケットを装着した伝熱プレート
の正面図である。FIG. 8 is a front view of a heat transfer plate equipped with a gasket for evaporation space.
【図9】加熱空間用ガスケットを装着した伝熱プレート
の正面図である。FIG. 9 is a front view of a heat transfer plate fitted with a heating space gasket.
【図10】処理液の流下状態を示す液流下型プレート式
蒸発器上部の縦断面図である。FIG. 10 is a vertical cross-sectional view of an upper part of a liquid flow-down plate type evaporator showing a flow-down state of a processing liquid.
【図11】従来の液分散装置を用いた液流下型プレート
式熱交換器の概略縦断面図である。FIG. 11 is a schematic vertical cross-sectional view of a liquid flow-down type plate heat exchanger using a conventional liquid dispersion device.
1 スタンドフレーム 2 エンドフレーム 3 伝熱プレート 4 蒸発空間用ガスケット 5 加熱空間用ガスケット A 蒸発空間 B 加熱空間 6 液入口 7 オーバーフロー堰 8 第1出口 9 スチーム入口 10 第2出口 27 伸縮式液分散ノズル 28 細孔 29 固定パイプ 30 細孔 31 スライドパイプ 32 ガイド棒 33 フランジ 34 切欠き 1 Stand Frame 2 End Frame 3 Heat Transfer Plate 4 Evaporation Space Gasket 5 Heating Space Gasket A Evaporation Space B Heating Space 6 Liquid Inlet 7 Overflow Weir 8 First Outlet 9 Steam Inlet 10 Second Outlet 27 Telescopic Liquid Dispersing Nozzle 28 Pore 29 Fixed pipe 30 Pore 31 Slide pipe 32 Guide rod 33 Flange 34 Notch
Claims (1)
有する伝熱プレートを、シール構造を異にする2種類の
ガスケットを交互に介在して所定枚数積層することによ
り各伝熱プレート間に処理液が流れる空間と熱媒体が流
れる空間を交互に配設してなる液流下型プレート式熱交
換器を構成し、この液流下型プレート式熱交換器のそれ
ぞれの伝熱プレートの処理液の入口同士が連通して形成
された処理液の供給通路内に、周壁面に軸線方向に沿う
全域に亘って多数の細孔を穿設してなる液分散ノズルを
位置決め状態で嵌挿固着した液流下型プレート式熱交換
器の液分散装置において、 上記液分散ノズルが、周壁面に軸線方向に沿う全域に亘
って多数の細孔を穿設し、かつ、外周面に軸線方向に沿
ってガイド棒を固設したスライドパイプと、同じく周壁
面に軸線方向に沿う全域に亘って多数の細孔を穿設し、
かつ、内周面に上記スライドパイプの外径と同じ内径を
有するフランジを突設するとともに、このフランジに上
記スライドパイプのガイド棒と対向して切欠きを有する
固定パイプとからなり、 上記スライドパイプを上記固定パイプ内に、スライドパ
イプのガイド棒を固定パイプの切欠きに嵌入させた状態
でスライド自在に嵌挿したことを特徴とする液流下型プ
レート式熱交換器の液分散装置。1. A heat transfer plate having a treatment liquid inlet / outlet and a heat medium inlet / outlet is disposed between a predetermined number of gaskets by alternately interposing two kinds of gaskets having different sealing structures. A liquid flow-down type plate heat exchanger is configured by alternately arranging a space in which a liquid flows and a space in which a heat medium flows, and an inlet of the processing liquid of each heat transfer plate of the liquid flow-down type plate heat exchanger. In the processing liquid supply passage formed by communicating with each other, a liquid distribution nozzle in which a large number of fine holes are bored on the peripheral wall surface along the axial direction is inserted and fixed in a positioned state. In the liquid dispersion device of a die plate type heat exchanger, the liquid dispersion nozzle has a large number of pores formed on the peripheral wall surface along the entire axial direction, and a guide rod on the outer peripheral surface along the axial direction. Same as the slide pipe fixed Over the entire area along the Ku peripheral wall surface in the axial direction is drilled a number of pores,
And, a flange having the same inner diameter as the outer diameter of the slide pipe is projectingly provided on the inner peripheral surface, and a fixed pipe having a notch facing the guide rod of the slide pipe is provided on the flange. And a guide rod of a slide pipe is slidably inserted into the fixed pipe in a state where the guide rod of the slide pipe is fitted into the notch of the fixed pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17419691A JPH0694995B2 (en) | 1991-07-15 | 1991-07-15 | Liquid Flow Dispersion Device for Plate Type Heat Exchanger |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17419691A JPH0694995B2 (en) | 1991-07-15 | 1991-07-15 | Liquid Flow Dispersion Device for Plate Type Heat Exchanger |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0526588A JPH0526588A (en) | 1993-02-02 |
| JPH0694995B2 true JPH0694995B2 (en) | 1994-11-24 |
Family
ID=15974407
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17419691A Expired - Lifetime JPH0694995B2 (en) | 1991-07-15 | 1991-07-15 | Liquid Flow Dispersion Device for Plate Type Heat Exchanger |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0694995B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108571908A (en) * | 2018-03-30 | 2018-09-25 | 上海理工大学 | Plate heat exchanger |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3596642B2 (en) * | 1996-05-14 | 2004-12-02 | 株式会社ササクラ | Plate type fresh water generator |
| JP3879032B2 (en) * | 1997-03-27 | 2007-02-07 | 三菱電機株式会社 | Cooling system |
| JP4568973B2 (en) * | 2000-08-10 | 2010-10-27 | ダイキン工業株式会社 | Plate type heat exchanger |
| NO320779B1 (en) | 2004-06-14 | 2006-01-30 | Inst Energiteknik | Innlopsinnretning |
| SE529808C2 (en) * | 2006-04-06 | 2007-11-27 | Alfa Laval Corp Ab | plate heat exchangers |
| JP6532193B2 (en) * | 2014-05-20 | 2019-06-19 | 国立大学法人 東京大学 | Surface flow down concentration apparatus and surface flow down concentration method |
| JP6785408B2 (en) * | 2016-10-21 | 2020-11-18 | パナソニックIpマネジメント株式会社 | Heat exchanger and refrigeration system using it |
| JP6785409B2 (en) * | 2016-10-21 | 2020-11-18 | パナソニックIpマネジメント株式会社 | Heat exchanger and refrigeration system using it |
| CN114210078B (en) * | 2021-11-23 | 2025-05-09 | 三原欣川食品机械设备有限公司 | A plate evaporator |
| CN116697792A (en) * | 2023-05-31 | 2023-09-05 | 珠海科创储能科技有限公司 | A phase change energy storage plate heat exchanger |
-
1991
- 1991-07-15 JP JP17419691A patent/JPH0694995B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108571908A (en) * | 2018-03-30 | 2018-09-25 | 上海理工大学 | Plate heat exchanger |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0526588A (en) | 1993-02-02 |
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