JPH0695162A - Optical modulation element - Google Patents

Optical modulation element

Info

Publication number
JPH0695162A
JPH0695162A JP21659091A JP21659091A JPH0695162A JP H0695162 A JPH0695162 A JP H0695162A JP 21659091 A JP21659091 A JP 21659091A JP 21659091 A JP21659091 A JP 21659091A JP H0695162 A JPH0695162 A JP H0695162A
Authority
JP
Japan
Prior art keywords
liquid crystal
electrode
crystal layer
electrodes
fine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21659091A
Other languages
Japanese (ja)
Other versions
JP3270075B2 (en
Inventor
Shigeru Morokawa
滋 諸川
Yasushi Suzuki
康 鈴木
Nobuyuki Hashimoto
信幸 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP21659091A priority Critical patent/JP3270075B2/en
Publication of JPH0695162A publication Critical patent/JPH0695162A/en
Application granted granted Critical
Publication of JP3270075B2 publication Critical patent/JP3270075B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To form the patterns of the optical wave front modulation element to be electrically controlled in real time with high reliability by using liquid crystal diffraction elements by reducing the thickness of liquid crystals and controlling fine electric field distribution for forming fine diffraction patterns. CONSTITUTION:Titanium oxide, tin oxide, indium oxide or the mixture composed thereof is used for transparent electrodes 14, 16 formed on the surfaces of transparent substrates 12, 18 consisting of glass, sapphire, rock crystals, plastics, etc. W<=H and W<=S are attained when the thickness of the liquid crystal layers is designate as 11, the width of the electrodes as 13, an inter- electrode spacing as 15, an inter-substrate spacing as H, an electrode width as W and the spacing distance from a grounding electrode as S. The extremely fine setting of the position accuracy of the patterns formed by the liquid crystal elements is, therefore, possible, if the W is made finer, i.e., at W<<H. The control of the liquid crystal layers of the inter-electrode spacing regions by utilizing the bleeding of the electric lines of force from the electrodes with respect to the inter-electrode spacings is possible by setting at W<=S. Further, the smooth connection of the electric fields of the inter-electrode spacings to the electric fields right under the adjacent electrodes is possible.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光波面の変調を行う空間
光変調素子に関し、さらに詳しくは微細電極液晶素子型
の空間光変調素子の構造と駆動に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spatial light modulator for modulating a light wavefront, and more particularly to a structure and driving of a spatial light modulator of a fine electrode liquid crystal device type.

【0002】[0002]

【従来の技術】従来、光波面を時間的に固定して制御す
るには写真法による回折板や機械加工による回折格子あ
るいは光学レンズが広く用いられ、時間的に変化する制
御には音響光学素子やPLZTなどの透明圧電素子が用
いられて来た。光波面の時間固定的な制御には充分な時
間を掛けて作成された精密な固定の光波面変調素子が利
用出来るが、動画に対しては光波面変調素子のパタン更
新時間が数十mSec以下と速い事が必要である。映画
のように事前に撮影しておいた多数のホログラムを機械
的に切り替えて動画に見せる事は出来るが、実際の動画
を撮影・再生する実時間画面更新に適した素子・技術
は、今の所存在しないと考えられてた。これに対して、
動く回折格子の検討が種々なされたが、満足のいくもの
はなかった。例えば、油膜上に電子ビ−ムでパタンを形
成しその膜厚を制御する光波面の位相変調素子は真空管
や排気系など大がかりになり、油膜の寿命も短く、使い
難い。スメクチック液晶をレ−ザビ−ムで走査するシス
テムでは、分解能数μmまで可能であるが、熱的書き込
みであるために熱伝導や熱平衡に時間が掛かり、1画面
の描画に1秒程度を要し、速度が不十分である。
2. Description of the Related Art Conventionally, a photographic diffraction plate, a diffraction grating by machining, or an optical lens has been widely used for temporally fixed control of a light wave front, and an acousto-optical element for temporally controlled control. Transparent piezoelectric elements such as and PLZT have been used. A precise fixed optical wavefront modulation element created by taking sufficient time can be used for time-fixed control of the optical wavefront, but for moving pictures, the pattern update time of the optical wavefront modulation element is tens of msec or less. And need to be fast. Although it is possible to mechanically switch many holograms that were taken in advance like a movie and show them as a movie, the elements and technology suitable for real-time screen updating that captures and reproduces the actual movie are It was thought to not exist. On the contrary,
Various studies have been done on moving diffraction gratings, but none have been satisfactory. For example, a phase modulator for a light wave front that forms a pattern on an oil film by an electron beam and controls the film thickness is bulky such as a vacuum tube or an exhaust system, and the life of the oil film is short, making it difficult to use. In a system that scans a smectic liquid crystal with a laser beam, resolution up to several μm is possible, but since it is thermal writing, it takes time for heat conduction and thermal equilibrium, and it takes about 1 second to draw one screen. , Speed is insufficient.

【0003】液晶テレビやパソコンの表示用に開発が進
められた液晶ビデオ表示素子は動画対応であるため、応
答速度が20mSec〜50mSecと小さい。応答速
度と画素密度から見ると表示用液晶素子は有力な素子で
あり、過去においても回折素子としての可能性の検討が
行われている。しかし液晶画素の実際上の寸法限界の見
積もりでは下限が数十μmと見なされ、液晶層の厚みが
5μmのSTN(ス−パ−ツイスト:捩じり角が例えば
120度〜270度の液晶素子)では画素電極幅と画素
電極隙間の最小寸法が各々5μm、即ち画素ピッチ10
μm程度が限界であり、強誘電液晶素子でも4μm程度
であって、100〜250(本/mm)の分解能であ
り、これ以上の高分解能の要求は液晶層の厚み限界から
見て無理と考えられていた。
Since the liquid crystal video display device developed for the display of liquid crystal televisions and personal computers is compatible with moving images, the response speed is as small as 20 mSec to 50 mSec. The liquid crystal element for display is a powerful element in terms of response speed and pixel density, and its possibility as a diffraction element has been studied in the past. However, in the estimation of the practical size limit of the liquid crystal pixel, the lower limit is considered to be several tens of μm, and the liquid crystal layer has a thickness of 5 μm for STN (super twist: a liquid crystal element having a twist angle of 120 to 270 degrees, for example). ), The pixel electrode width and the minimum dimension of the pixel electrode gap are each 5 μm, that is, the pixel pitch 10
The limit is about μm, and even the ferroelectric liquid crystal element is about 4 μm, and the resolution is 100 to 250 (lines / mm), and it is considered impossible to request a higher resolution than the limit of the thickness of the liquid crystal layer. It was being done.

【0004】本発明においては、液晶層厚よりも微細な
画素および画素隙間を組み合わせて形成される微細合成
電界により、液晶分子群を場所の関数として精密に制御
し、形成すべき回折パタンの形状精度・位置精度を正確
に実現する方法を提示する。また、この素子構造を達成
するに必要な液晶セル構造・配向・材料、および本発明
の回折素子の特徴を生かした応用の例を示す。
In the present invention, the shape of the diffractive pattern to be formed is controlled by precisely controlling the liquid crystal molecule group as a function of location by a fine synthetic electric field formed by combining pixels finer than the liquid crystal layer thickness and pixel gaps. We will present a method to accurately achieve precision and position accuracy. In addition, examples of liquid crystal cell structure / orientation / materials necessary for achieving this element structure, and application examples utilizing the characteristics of the diffraction element of the present invention will be shown.

【0005】以下図面により前記従来の光波面変調素
子、および従来の液晶表示素子の構造を説明する。従
来、パソコンやワ−ドプロセッサ−に用いられていた液
晶表示素子の画素の大きさは、1個の画素を人の目で1
点として識別出来る事を前提に画素寸法を決定してい
た。従って人間の明視距離約25cmにおける識別可能
な画素寸法として液晶素子の画素の寸法は250μm〜
350μm、また画素の隙間は開口率を80%以上確保
出来かつ製造歩留を高くするため、画素寸法の約10%
すなわち25〜35μmに設定された。ビデオ画像の再
生においては画素自体を識別する必要はなく、かえって
画素が目立たない方が見易いため、画素寸法100μm
〜200μmの素子が用いられた。ビデオカメラの撮影
モニタ−に用いる液晶ビュ−ファインダ−や投影型表示
装置の液晶素子では光学的拡大が行われるため、画素寸
法30μmで画素隙間5〜8μmのものが試作されてい
る。これらは分解能が数十本/1mmであり、回折素子
に用いるには分解能不足である。しかも、画素寸法を小
さくすると画素の開口率は寸法比の2乗で小になる。従
来の設計思想に拠れば、液晶層の厚が5μmの時開口率
を50%以上確保するため画素電極幅・寸法を18μm
・電極隙間を6μmとすると分解能は約40本/mmと
なり、ホログラフィ−に使えるレベルすなわち数百本/
mm〜数千本/mmには、はるかに及ばない。さらに電
極ピッチの縮小を行う場合には画素の開口率が急速に減
少し、数十本/mm以上の分解能は現実的ではないと考
えられ、さらなる高分解能の追及は諦められていた。
The structures of the conventional optical wavefront modulation element and the conventional liquid crystal display element will be described below with reference to the drawings. Conventionally, the pixel size of a liquid crystal display device used in a personal computer or a word processor is one pixel per human eye.
The pixel size was determined on the assumption that it can be identified as a point. Therefore, the pixel size of the liquid crystal element is 250 μm or less as a distinguishable pixel size at a human visual distance of about 25 cm.
350 μm, and the gap between the pixels is approximately 10% of the pixel size in order to secure an aperture ratio of 80% or more and to increase the manufacturing yield.
That is, it was set to 25 to 35 μm. When reproducing a video image, it is not necessary to identify the pixel itself, and it is easier to see if the pixel is not conspicuous. Therefore, the pixel size is 100 μm.
A device of ˜200 μm was used. Since a liquid crystal viewfinder used for a photographing monitor of a video camera and a liquid crystal element of a projection type display device are optically enlarged, a prototype having a pixel size of 30 μm and a pixel gap of 5 to 8 μm has been produced. These have a resolution of several tens of lines / 1 mm, which is insufficient for use in a diffraction element. Moreover, when the pixel size is reduced, the aperture ratio of the pixel is reduced by the square of the size ratio. According to the conventional design concept, when the liquid crystal layer thickness is 5 μm, the pixel electrode width / dimension is 18 μm in order to secure the aperture ratio of 50% or more.
・ When the electrode gap is 6 μm, the resolution is about 40 lines / mm, which is a level usable for holography, that is, several hundred lines / mm.
It is far below mm to several thousand lines / mm. Further, when the electrode pitch is reduced, the aperture ratio of pixels is rapidly reduced, and it is considered that a resolution of several tens of lines / mm or more is not realistic, and further higher resolution has been abandoned.

【0006】[0006]

【発明が解決しようとする課題】本発明が解決しようと
する課題は、実時間で電子的に制御する光波面変調素子
のパタン形成を、液晶回折素子を用い高精度で実現する
事である。より具体的には、 a) 回折パタ−ンの空間周波数雑音成分を抑圧した精
密変調パタンの形成、および、液晶厚みの程度以下の微
小寸法領域の変調パタ−ンの形成。 b) 回折パタ−ンの位置誤差を抑圧した精密なパタン
位置精度の実現。 c) 微細回折パタン形成の場合の開口率の低下の回
避。 である。
SUMMARY OF THE INVENTION The problem to be solved by the present invention is to realize the pattern formation of an optical wavefront modulation element which is electronically controlled in real time with high accuracy by using a liquid crystal diffraction element. More specifically, a) Formation of a precise modulation pattern in which the spatial frequency noise component of the diffraction pattern is suppressed, and formation of a modulation pattern in a minute dimension region equal to or less than the liquid crystal thickness. b) Realization of precise pattern position accuracy by suppressing the position error of the diffraction pattern. c) Avoiding a decrease in aperture ratio when forming a fine diffraction pattern. Is.

【0007】[0007]

【課題を解決するための手段】上記課題解決のため、本
発明においては液晶層の厚みを薄くするだけでなく、微
細な回折パタン形成のための微細な電界分布の制御を行
う。このための電極構造および駆動方法を明らかにす
る。従来の液晶駆動の考え方では、液晶駆動の透明電極
の直下の液晶層を電気的に駆動しようとする。したがっ
て画素電極の寸法が画素寸法と等しいと認識されてお
り、電極と電極の横方向の隙間は、電気的に制御されな
い無駄領域、あるいは画素の開口率を下げる額縁領域と
して取り扱われた。このような観点に立つと、電極寸法
の減少は開口率の低下をもたらす事になり、これが画素
ピッチの下限を与える事になる。すなわち画素電極形成
の考え方は『画面表示装置』としてまず画素が認識出来
る大きさを持つ事から出発していた。この点から、画素
寸法に対して10%以下であれば電極隙間が大きい程加
工が楽になる利点があるとされ、さらに、孤立画素を独
立に制御出来る事を条件に画素を設計しており、画素の
隙間の存在を無意識の前提条件として『制御放棄の領
域』=『OFF(電界=0)の領域』=『避けられぬ無
駄領域』として考えていた。また画素電極形成の場合の
電極隙間距離=加工限界寸法=数μmと見なしていた。
上記『電極隙間寸法』は大型のパソコン用液晶表示装置
で〜20μm、小型のTV用液晶素子で5〜15μm程
度である。その結果、液晶素子を表示装置以外に空間変
調素子として設計する場合のピッチの下限寸法は、液晶
層厚みと同程度の画素隙間+同程度の電極寸法すなわち
10μmピッチ以上となり、さらにこの場合の開口率は
25%以下になると考えられていた。従って10μm以
下のさらに小型の液晶素子は開口率の低下から現実的で
ないと見なされていた。一方、ホログラムの再生を例と
して考察すると、再生画像の位置精度はホログラムの位
置精度に依存し、再生像の精密な位置設定が必要な場
合、ホログラムの回折パタン自体の位置精度が必要な事
になる。ホログラムの回折パタンの空間周波数は参照光
と物体光の交差角の正弦関数として減少する。従ってこ
の交差角度を小にする事で回折パタンのピッチは大きく
出来る。しかしこのピッチ寸法と回折パタンの位置寸法
精度は本質的に独立であり、許容される回折パタンの位
置誤差は回折パタンの空間周波数の半波長距離よりも状
況によっては遥かに微小の場合がある。ここで液晶素子
を用いてホログラムを形成し画像を再生する場合を考え
て見る。画素形成の観点からすると、物体光と参照光の
交差角を小さくして回折パタンのピッチを荒くする方が
楽になる。再生パタンの位置を正確に再生するには微細
な画素を必要とする。しかも液晶層の厚みよりも寸法の
小さい電極にしても隙間が一定のままでは開口率が低下
し、極端に光利用効率が低下する。物体の立体像を鮮明
に表示しようとすると回折パタンを精密に作成し、回折
素子の面積も十分な大きさにしなければならない。回折
パタンを精密に作成するには回折パタンのピッチよりも
回折パタン形成用の電極自体を微細にしてパタンを正確
に再現する必要がある。以上述べたごとく、鮮明な立体
画像を正確な位置に再生するためには、回折パタンのピ
ッチと独立に、パタンの精密な形状再生・精密な位置再
生が必要であり、そのためには画素のピッチと独立に液
晶層の厚み以下の微小寸法の微細画素が必要になる。上
記要求は一見実現不可能に見えるが、以下の実施により
実現可能となる。工夫の第一は、電極の隙間の直下の液
晶層の制御である。従来この領域は電極で制御する事を
放棄された領域であるが、これの駆動を可能にする事を
考える。駆動電極の寸法を小さくしていくと、電気力線
の周辺部へのはみ出し割合が増える。液晶層の厚みに比
較して電極寸法が小さい場合にこの効果は大きく利いて
来る。電極隙間寸法を最小限の一定値とした場合、電極
寸法の比率は同等以下の寸法まで縮小する事が出来る
が、この場合の隙間の占める割合は寸法比の2乗で利
き、電極面積よりも大きくなる。しかし、このような構
造にする事により、画素形成のための電極ピッチ寸法を
最小限に小さく出来る。
In order to solve the above problems, in the present invention, not only the liquid crystal layer is made thin, but also a fine electric field distribution is controlled to form a fine diffraction pattern. The electrode structure and driving method for this purpose will be clarified. According to the conventional concept of driving a liquid crystal, the liquid crystal layer immediately below the transparent electrode for driving the liquid crystal is electrically driven. Therefore, it is recognized that the size of the pixel electrode is equal to the pixel size, and the lateral gap between the electrodes is treated as a dead region that is not electrically controlled or a frame region that reduces the aperture ratio of the pixel. From this point of view, the reduction of the electrode size leads to the reduction of the aperture ratio, which gives the lower limit of the pixel pitch. That is, the concept of forming the pixel electrode started from the fact that the pixel had a recognizable size as a "screen display device". From this point, if the size of the pixel is 10% or less, it is said that there is an advantage that the larger the electrode gap is, the easier the processing becomes. Furthermore, the pixel is designed under the condition that the isolated pixel can be controlled independently. The existence of a gap between pixels was considered as an unconscious precondition as "abandonment of control" = "OFF (electric field = 0) area" = "unavoidable waste area". Further, the electrode gap distance in the case of forming the pixel electrode = processing limit size = several μm.
The "electrode gap size" is about 20 .mu.m for a large-sized personal computer liquid crystal display device and about 5 to 15 .mu.m for a small TV liquid crystal device. As a result, when the liquid crystal element is designed as a spatial modulation element other than the display device, the lower limit of the pitch is the pixel gap of the liquid crystal layer thickness + the electrode dimension of the same degree, that is, the pitch of 10 μm or more. The rate was thought to be 25% or less. Therefore, a smaller liquid crystal element having a size of 10 μm or less has been regarded as unrealistic because of a reduction in aperture ratio. On the other hand, considering reproduction of a hologram as an example, the positional accuracy of the reproduced image depends on the positional accuracy of the hologram, and when precise position setting of the reproduced image is necessary, the positional accuracy of the hologram diffraction pattern itself is necessary. Become. The spatial frequency of the hologram diffraction pattern decreases as a sine function of the crossing angle between the reference light and the object light. Therefore, the pitch of the diffraction pattern can be increased by reducing the intersection angle. However, the pitch dimension and the positional accuracy of the diffraction pattern are essentially independent, and the allowable positional error of the diffraction pattern may be much smaller than the half wavelength distance of the spatial frequency of the diffraction pattern depending on the situation. Here, consider the case where a hologram is formed using a liquid crystal element to reproduce an image. From the viewpoint of pixel formation, it is easier to reduce the crossing angle between the object light and the reference light to roughen the pitch of the diffraction pattern. Fine pixels are required to accurately reproduce the position of the reproduction pattern. Moreover, even if the electrode has a smaller dimension than the thickness of the liquid crystal layer, the aperture ratio is reduced and the light utilization efficiency is extremely reduced if the gap remains constant. In order to clearly display a three-dimensional image of an object, the diffraction pattern must be precisely created and the area of the diffractive element must be large enough. In order to create a diffraction pattern with precision, it is necessary to make the electrode itself for forming a diffraction pattern finer than the pitch of the diffraction pattern to accurately reproduce the pattern. As described above, in order to reproduce a clear stereoscopic image at an accurate position, it is necessary to reproduce the precise shape and precise position of the pattern independently of the pitch of the diffraction pattern. Independently of the above, a fine pixel having a fine dimension less than the thickness of the liquid crystal layer is required. Although the above requirement seems to be unrealizable at first glance, it can be realized by the following implementation. The first measure is to control the liquid crystal layer immediately below the gap between the electrodes. Conventionally, this area has been abandoned to be controlled by the electrodes, but it is considered to enable driving of this area. As the size of the drive electrode is reduced, the rate of protrusion of the lines of electric force to the peripheral portion increases. This effect is greatly advantageous when the electrode size is small compared to the thickness of the liquid crystal layer. When the electrode gap size is set to the minimum fixed value, the ratio of the electrode size can be reduced to the same size or less, but the ratio of the gap in this case is the square of the size ratio, which is better than the electrode area. growing. However, with such a structure, the electrode pitch dimension for pixel formation can be minimized.

【0008】[0008]

【作用】この微細画素電極群が液晶分子群を駆動する状
況において電極の形成する電界が周囲に及ぼす影響は重
ね合わせの原理を用いて考える事が出来、電極隙間の直
下の電界分布は、周囲の多数の電極の個々に形成する電
界のベクトル和によって制御される。このような状態で
画素の1個だけをON(点灯状態)、周囲の画素をOF
F(消灯状態)としようとして駆動した場合、このON
にすべき画素は周囲のOFF電界に引っ張られてOFF
電界に埋没し、点灯状態にならない。しかし、これらの
電極を隣接して複数個連結してON動作させると、ON
電極群領域は電界が重ね合わされて点灯状態に出来る。
すなわち、液晶層厚みよりも微細な電極と電極隙間を備
えた電極群で形成される画素を複数個隣接連結駆動する
事によって、回折パタン形成の最小ピッチは液晶層厚の
限界を越えなくとも、そのパタンの形成位置およびパタ
ン形成を液晶層厚よりも細かな尺度で設定する事が可能
になる。微細電極が隣接して等しい電位にある場合に電
極隙間は両方の電界の重なりとなり電極隙間近傍の電極
下の等電位面同志を滑らかに接続するように接続等電位
面が形成される。液晶分子層は細分化された電極の連結
駆動効果により、画素電極群と隙間を含めた合成電界に
よって隙間なく駆動され、開口率の問題が解決される。
もう1つの効果は、コントラストを分解能に振り分ける
効果である。電極幅と隙間を微細化する事により、電極
カバ−面積の液晶面積に対する比率は減少するが、電極
隙間領域を含めた駆動のために電気力線は広がって液晶
駆動面積比率が向上し、その代わり電束密度すなわち電
界の強さが弱まる。電界強度を向上するには電極への印
加電圧を増加すれば良いが、電極の個々の電位に制御さ
れた合成電界の空間変調された値の比率は電圧増強で改
善されない。上記微細構造電極の電極電位を電極毎に交
互にON/OFFとなるように設定し、電極寸法を液晶
層厚みの100倍以上の非常に大の段階(W段階とす
る)から同程度の段階(M段階とする)、さらに厚みの
1/100の段階(N段階とする)まで変化させて見
る。W段階での電極中央直下の電界強度は、液晶層を挟
む電極に印加した電圧Vを液晶層の厚みdで除した値
(V/d)に略等しい。この場合の電界強度を相対値で
1とし、変調係数を1とする。ON画素の中央直下の電
界をEon,OFF画素の中央直下の電界をEoffと
するとき隙間の中央直下の電界は0であり、液晶面積全
体での平均電界は(Eon+0+Eoff+0)/4に
なる。極端な微細画素であるNの段階において、液晶駆
動電界は上記W段階で交互に配列されていたEonと、
隙間の電界0とEoffの重なりの結果、空間的な電極
構造の影響はほとんど完全に消えてしまい、均一な(E
on+Eoff)/4の値になっている。M段階では、
液晶層に対する電極構造の影響は充分に残っており、電
界の空間変調が行われている。但し、隣合った電極の影
響を受け、画素の周辺電界は互いに隣の電界に引っ張ら
れる。MとNの中間の段階(MN段階とする)では、電
界は空間的な変調を受けるが、EonとEoffの引っ
張り合いの結果変調率が低下する。この変調率の低下は
液晶分子制御による変調素子のコントラストの低下を意
味する。MN段階で微細化された電極を複数連結してM
段階と同寸法の画素領域を作成してみる。M段階の状態
と同様な画素領域の空間配置とし、M段階の隙間電極領
域に相当する部分の電界分布はM段階と等しくなるよう
に微細画素各部の電界を設定する。このようにMN段階
の微細画素構造をもちいて近似したM段階をM´段階と
する。M段階の電極構造で形成される電界の空間変調パ
タンPmは形成されるパタンの最小分解能が液晶層の厚
み程度であるが、M´段階で作成されたパタンPm´は
実際に液晶層の厚みdよりも小さいMN段階の微細画素
の寸法で微細に形状・位置をトリミングする事が出来る
ので、M段階のパタンPmに分解能で優る。逆にM´段
階の合成画素は面積の約数十%の電極隙間を内在してい
るので、これらが実際の電極で埋め尽くされているM段
階の電界は弱められており、結局Pm´はPmパタンに
比較して分解能は高いもののコントラストが低下する、
しかし、コントラストよりも分解能を重視する用途には
適した構造であり、特に液晶素子で回折パタンを形成す
る場合には有効である。
The effect of the electric field formed by the electrodes on the surroundings when the fine pixel electrode group drives the liquid crystal molecule group can be considered by using the principle of superposition, and the electric field distribution immediately below the electrode gap is Is controlled by the vector sum of the electric fields formed individually by the multiple electrodes of In such a state, only one pixel is turned on (lighting state), and surrounding pixels are turned off.
If you try to drive it to F (light off state), this ON
The pixel to be turned off is pulled off by the surrounding OFF electric field.
It is buried in the electric field and does not light up. However, if a plurality of these electrodes are adjacently connected and turned on,
The electrode group region can be turned on by overlapping electric fields.
That is, by driving a plurality of pixels formed by an electrode group having electrodes and electrode gaps finer than the liquid crystal layer thickness adjacent to each other, the minimum pitch of diffraction pattern formation does not exceed the liquid crystal layer thickness limit. It becomes possible to set the pattern formation position and the pattern formation on a finer scale than the liquid crystal layer thickness. When the fine electrodes are adjacent to each other and have the same potential, the electrode gap becomes an overlap between both electric fields, and a connection equipotential surface is formed so as to smoothly connect the equipotential surfaces under the electrode near the electrode gap. The liquid crystal molecular layer is driven by the combined electric field including the pixel electrode group and the gap due to the coupling drive effect of the subdivided electrodes, and the problem of the aperture ratio is solved.
Another effect is that the contrast is distributed to the resolution. By making the electrode width and the gap finer, the ratio of the electrode cover area to the liquid crystal area is reduced, but the electric force lines are widened for driving including the electrode gap area, and the liquid crystal drive area ratio is improved. Instead, the electric flux density, that is, the strength of the electric field is weakened. The electric field strength can be improved by increasing the voltage applied to the electrodes, but the ratio of the spatially modulated values of the composite electric field controlled to the individual electric potentials of the electrodes is not improved by the voltage enhancement. The electrode potential of the fine structure electrode is set to be turned ON / OFF alternately for each electrode, and the electrode dimension is set from a very large stage (W stage) of 100 times or more the liquid crystal layer thickness to a similar stage. (It is set as M steps), and further, it is changed to a step of 1/100 of the thickness (which is set as N steps). The electric field intensity immediately below the center of the electrodes at the W stage is approximately equal to the value (V / d) obtained by dividing the voltage V applied to the electrodes sandwiching the liquid crystal layer by the thickness d of the liquid crystal layer. In this case, the electric field strength is set to a relative value of 1, and the modulation coefficient is set to 1. When the electric field right under the center of the ON pixel is Eon and the electric field right under the center of the OFF pixel is Eoff, the electric field right under the center of the gap is 0, and the average electric field in the entire liquid crystal area is (Eon + 0 + Eoff + 0) / 4. At N stages, which are extremely fine pixels, the liquid crystal driving electric field and Eon, which are alternately arranged at the W stage,
As a result of the overlap of the electric field 0 and Eoff in the gap, the effect of the spatial electrode structure disappears almost completely, and a uniform (E
on + Eoff) / 4. In M stage,
The effect of the electrode structure on the liquid crystal layer remains sufficiently, and the electric field is spatially modulated. However, due to the influence of the adjacent electrodes, the peripheral electric fields of the pixel are pulled by the electric fields adjacent to each other. In the intermediate stage between M and N (MN stage), the electric field undergoes spatial modulation, but the modulation rate decreases as a result of the tension between Eon and Eoff. This decrease in the modulation factor means a decrease in the contrast of the modulation element by controlling the liquid crystal molecules. Multiple electrodes miniaturized at the MN stage are connected to form M
Create a pixel area with the same dimensions as the stage. The spatial arrangement of the pixel regions is similar to that in the M-stage state, and the electric field of each part of the fine pixel is set so that the electric field distribution in the portion corresponding to the M-stage gap electrode region becomes equal to the M-stage. The M stage approximated by using the fine pixel structure of the MN stage is referred to as M ′ stage. In the spatial modulation pattern Pm of the electric field formed by the M-stage electrode structure, the minimum resolution of the formed pattern is about the thickness of the liquid crystal layer, but the pattern Pm 'created in the M ′ stage is actually the thickness of the liquid crystal layer. Since the shape and position can be finely trimmed with the size of the fine pixel in the MN stage smaller than d, the resolution is superior to the pattern Pm in the M stage. On the contrary, since the M′-stage composite pixel has an electrode gap of about several tens of percent of the area, the M-stage electric field filled with actual electrodes is weakened, and Pm ′ is eventually Although the resolution is higher than the Pm pattern, the contrast is reduced,
However, the structure is suitable for applications in which resolution is more important than contrast, and is particularly effective when forming a diffraction pattern with a liquid crystal element.

【0009】[0009]

【第1実施例】以下に実施例に基き本発明の詳細を説明
する。図1は本発明の第1実施例で微細電極構成の液晶
素子の構造図である。12・18は透明基板であって通
常はガラス、必要に応じてサファイヤ・水晶・プラスチ
ックの基板が用いられる。14・16は透明基板の表面
に形成された透明電極であって酸化チタン・酸化錫・酸
化インジュウムあるいはその混合物が用いられる。11
は液晶層厚、13は電極巾、15は電極隙間であり、基
板間隔をH、電極幅をW、隣接電極との隙間距離をSと
すると、 W≦H・・・・・・・・・・・・・・・・・・・・・・・・1.1 W≦S・・・・・・・・・・・・・・・・・・・・・・・・1.2 となっている。Wを微細にする事すなわちW<<Hで液
晶素子の形成するパタンの位置精度を非常に微細に設定
出来るようになる。W≦Sとする事で、電極隙間に対し
て電極からの電気力線のはみ出しを利用した、電極隙間
領域の液晶層の制御が可能になる。通常の液晶素子構造
では電極隙間が広いため、隙間部分の電界が弱くなり液
晶層は駆動されずに放置される。条件1.1と1.2を
両立させる事により電極隙間の電界を隣り合った電極直
下の電界となめらかに連結出来る。上記1.1を導入す
る最大の目的は、回折素子のパタン位置精度の達成であ
る。図2、図3はパタン位置精度向上の効果を説明する
ための図であって、21は透明絶縁体で構成される上基
板、29は下基板、23・28は上記基板表面に形成さ
れる透明電極、24・26は図2における等電位面の断
面、34・36は図3における等電位面の断面である。
図2と図3は同一液晶素子を示しており、相違点は電極
の印加電圧パタンである。ON電位の位置が横方向に1
電極分だけシフトしており、当然ながら等電位線が同じ
く1電極分だけシフトしている。すなわち、電界パタン
の分解能は液晶層の厚みが限界を与えるが、パタンの位
置精度自体は液晶層厚みとは独立に微細電極のピッチで
定められ、これは液晶層厚みよりも微細に設定出来る。
[First Embodiment] The present invention will be described in detail below with reference to embodiments. 1 is a structural diagram of a liquid crystal device having a fine electrode structure according to a first embodiment of the present invention. 12 and 18 are transparent substrates, which are usually made of glass, and if necessary, sapphire / crystal / plastic substrates. Reference numerals 14 and 16 are transparent electrodes formed on the surface of the transparent substrate, and titanium oxide, tin oxide, indium oxide, or a mixture thereof is used. 11
Is the liquid crystal layer thickness, 13 is the electrode width, and 15 is the electrode gap, where W ≦ H ..., Where H is the substrate gap, W is the electrode gap, and S is the gap distance between adjacent electrodes.・ ・ ・ ・ ・ ・ ・ ・ 1.1 W ≤ S ・ ・ ・ ・ ・ ・ ・ ・ 1.2 ing. When W is made fine, that is, when W << H, the positional accuracy of the pattern formed by the liquid crystal element can be set extremely finely. By setting W ≦ S, it becomes possible to control the liquid crystal layer in the electrode gap region by utilizing the protrusion of the lines of electric force from the electrode with respect to the electrode gap. Since the electrode gap is wide in a normal liquid crystal element structure, the electric field in the gap is weakened and the liquid crystal layer is left undriven. By satisfying both conditions 1.1 and 1.2, the electric field in the electrode gap can be smoothly connected to the electric field immediately below the adjacent electrodes. The main purpose of introducing the above 1.1 is to achieve the pattern position accuracy of the diffraction element. 2 and 3 are views for explaining the effect of improving the pattern position accuracy, in which 21 is an upper substrate made of a transparent insulator, 29 is a lower substrate, and 23 and 28 are formed on the substrate surface. Transparent electrodes, 24 and 26 are cross sections of the equipotential surface in FIG. 2, and 34 and 36 are cross sections of the equipotential surface in FIG.
2 and 3 show the same liquid crystal device, and the difference is the applied voltage pattern of the electrodes. The position of ON potential is 1 in the horizontal direction
The electrodes are shifted by the amount corresponding to the electrodes, and the equipotential lines are naturally shifted by the amount corresponding to one electrode. That is, although the resolution of the electric field pattern is limited by the thickness of the liquid crystal layer, the positional accuracy of the pattern itself is determined by the pitch of the fine electrodes independently of the thickness of the liquid crystal layer, which can be set finer than the thickness of the liquid crystal layer.

【第2実施例】図4は上記条件1.1と条件1.2を連
立させる場合の微細画素群における横電界効果を説明す
るための図である。図4は同一の液晶層厚で電極寸法と
電極隙間を変化させており、その場合の電界分布の様相
を示す。図4の(A)の状態において、42・43は従
来寸法の画素電極部、41は電極部42のONの場合の
画素形状である。電極直下の部分42の電界は、場所に
よらず一定均一で、周辺部のみ僅かに弱くなっている。
45は同一液晶厚み同一印加電圧の条件で電極隙間を保
存したまま電極寸法を縮めた場合(B)の電極部形状で
あって、44は電極部45がONの場合の画素形状、4
6は画素隙間である。隙間を一定にしたまま電極寸法を
詰めたため、電極直下の面積の全体面積に対する割合す
なわち開口率は条件(A)から条件(B)にする事によ
り大幅に減少する。さらに極部形状42に対して画素4
1の形状は周辺部の電界が弱まるためにONの範囲は電
極よりも小さくなる。条件(B)における電極部形状4
5に対する画素44の面積減少の比率は、条件(A)に
おける電極部形状42に対する画素41の面積減少の比
率よりも大きい。
[Second Embodiment] FIG. 4 is a diagram for explaining a lateral electric field effect in a fine pixel group when conditions 1.1 and 1.2 are simultaneous. FIG. 4 shows the aspect of the electric field distribution in the case where the electrode size and the electrode gap are changed with the same liquid crystal layer thickness. In the state of FIG. 4A, 42 and 43 are pixel electrode portions having a conventional size, and 41 is a pixel shape when the electrode portion 42 is ON. The electric field in the portion 42 immediately below the electrodes is uniform and constant regardless of the location, and only the peripheral portion is slightly weakened.
Reference numeral 45 represents the shape of the electrode portion when the electrode size is reduced (B) while maintaining the electrode gap under the condition of the same liquid crystal thickness and the same applied voltage, and 44 represents the pixel shape when the electrode portion 45 is ON, 4
6 is a pixel gap. Since the electrode size is reduced while keeping the gap constant, the ratio of the area directly under the electrode to the entire area, that is, the aperture ratio is significantly reduced by changing the condition (A) to the condition (B). Further, for the pole shape 42, the pixel 4
In the case of the shape of No. 1, the ON range is smaller than that of the electrode because the electric field in the peripheral portion is weakened. Electrode part shape 4 under condition (B)
The area reduction ratio of the pixel 44 with respect to 5 is larger than the area reduction ratio of the pixel 41 with respect to the electrode shape 42 under the condition (A).

【第3実施例】図11は微細画素電極と隙間の構造で、
画素の連結駆動の場合の電界分布を示す。図11におい
て、1101・1109は上及び下側の電極基板で、1
102は共通タイミング電極、1103・1104・1
105・1106・1107・1108・1109・1
110・1111・1112は、下基板の表面に形成さ
れたセグメント電極である。大きい寸法のセグメント電
極1103・1104と対向電極1102との間には、
それぞれOFF電圧・ON電圧が印加され、残りの電極
1105・1106・1107にはON電圧、1108
・1106・にはOFF電圧が印加されている。等電位
線の様子から明らかなように、隣接微細画素電極の電位
が等しい場合にはその隙間の電界が滑らかに連結され
る。
[Third Embodiment] FIG. 11 shows a structure of a fine pixel electrode and a gap.
7 shows an electric field distribution in the case of pixel connection driving. In FIG. 11, reference numerals 1101 and 1109 denote upper and lower electrode substrates, respectively.
102 is a common timing electrode 1103, 1104-1
105/1106/1107/1108/1109/1
110, 1111, and 1112 are segment electrodes formed on the surface of the lower substrate. Between the large-sized segment electrodes 1103 and 1104 and the counter electrode 1102,
The OFF voltage and the ON voltage are applied to the remaining electrodes 1105, 1106, and 1107, respectively.
An OFF voltage is applied to 1106. As is clear from the state of the equipotential lines, when the potentials of the adjacent fine pixel electrodes are equal, the electric field in the gap is smoothly connected.

【第4実施例】図5は画素の寸法と形成されるパタンの
位置精度、および空間雑音成分を説明するための図であ
る。図5において、511・512は荒い画素電極、5
21・522は荒い画素で本来形成されるべきパタンで
ある。531・532は微細電極を示し、541・54
2は微細画素電極で形成されるべきパタンを示す。空間
雑音成分は、形成されるべきパタンと色付けされた画素
部分との差異がこれに相当する。画素の微細化により空
間雑音成分が減少するが、同時にパタンの位置が画素電
極のピッチで自在に設定出来る事が判る。荒い画素51
1・512のピッチは形成すべきパタンの幅および間隔
と同程度であるが、これではなめらかなパタン521・
522の再現が困難である。微細画素531・532の
場合、同様なパタン541・542の再現が可能であ
り、画素電極微細化が高精度なホログラム回折パタンの
再現などに有効な事が判る。
Fourth Embodiment FIG. 5 is a diagram for explaining the pixel size, the positional accuracy of the formed pattern, and the spatial noise component. In FIG. 5, 511 and 512 are rough pixel electrodes and 5
Reference numerals 21 and 522 are patterns that should be originally formed with rough pixels. 531 and 532 are fine electrodes, and 541 and 54 are
Reference numeral 2 indicates a pattern to be formed by the fine pixel electrode. The spatial noise component corresponds to the difference between the pattern to be formed and the colored pixel portion. Although spatial noise components are reduced due to the miniaturization of pixels, it can be seen that the position of the pattern can be set freely by the pitch of the pixel electrodes. Rough pixel 51
The pitch of 1.512 is similar to the width and spacing of the pattern to be formed, but with this, a smooth pattern 521.
It is difficult to reproduce 522. In the case of the fine pixels 531 and 532, similar patterns 541 and 542 can be reproduced, and it can be seen that miniaturization of the pixel electrodes is effective for highly accurate hologram diffraction pattern reproduction.

【第5実施例】図9は埋め込み電極に2端子スイッチン
グ素子を組み合わせた構造、図10は図9の配線構造を
示す図である。図9において、91は上基板、99は下
基板、96は上側電極、94は下側電極、98は金属埋
め込み配線、97はスイッチング素子を兼用した電極と
配線の接続構造である。基坂91・99は透明硝子基板
で、電極96は透明電極、98はアルミニウムやタンタ
ル等の金属配線である。埋め込み金属配線の形成のため
にはガラス基坂を沸酸HFを用いてエッチングし、金属
薄膜形成後その表面に酸化被膜あるいは有機薄膜による
薄い絶縁被膜を形成する。その上を絶縁物質で覆って基
板表面の平坦化を行い、絶縁物質にコンタクト穴を開
け、透明電極に薄い絶縁被膜を介して接続している。図
10において、106は埋め込み金属線であり、104
は絶縁被膜・108は平坦化のための充填用絶縁物質、
102は透明電極である。電極102は金属でも透明電
極でも可能である。充填物質108は特に微細構造液晶
素子の基板平坦化に必要である。絶縁膜104は酸化タ
ンタルや酸化アルミニウムや有機膜が使用できる。金属
電極106と、絶縁膜104と、電極108とでMIM
(金属/絶縁物/金属)構造を形成し、2端子スイッチ
ング素子として機能する。すなわちしきい電圧電圧以下
では電流を流さず、それを越えると電流を急に流す。こ
の作用により駆動のクロスト−クを抑圧出来る。パッシ
ブの埋め込み電極構造は、電極102と絶縁薄膜104
とコンタクトホ−ルを除いた構造である。アクティブス
イッチング型構造よりも単純でより微細な構造に向く。
[Fifth Embodiment] FIG. 9 is a diagram showing a structure in which a two-terminal switching element is combined with an embedded electrode, and FIG. 10 is a diagram showing the wiring structure of FIG. In FIG. 9, reference numeral 91 is an upper substrate, 99 is a lower substrate, 96 is an upper electrode, 94 is a lower electrode, 98 is a metal-embedded wiring, and 97 is a connection structure of an electrode also serving as a switching element and a wiring. The bases 91 and 99 are transparent glass substrates, the electrodes 96 are transparent electrodes, and 98 is metal wiring such as aluminum or tantalum. In order to form the buried metal wiring, the glass substrate is etched with hydrofluoric acid HF, and after forming the metal thin film, an oxide film or a thin insulating film made of an organic thin film is formed on the surface. The surface of the substrate is flattened by covering it with an insulating material, a contact hole is opened in the insulating material, and the transparent electrode is connected through a thin insulating film. In FIG. 10, reference numeral 106 denotes a buried metal wire, and 104
Is an insulating film. 108 is a filling insulating material for flattening.
102 is a transparent electrode. The electrode 102 can be a metal or a transparent electrode. The filling material 108 is particularly necessary for flattening the substrate of the fine structure liquid crystal device. As the insulating film 104, tantalum oxide, aluminum oxide, or an organic film can be used. MIM with metal electrode 106, insulating film 104, and electrode 108
It forms a (metal / insulator / metal) structure and functions as a two-terminal switching element. That is, the current does not flow below the threshold voltage, and the current flows suddenly above the threshold voltage. Due to this action, drive crosstalk can be suppressed. The passive embedded electrode structure has an electrode 102 and an insulating thin film 104.
The contact hole is removed. Suitable for simpler and finer structures than active switching structures.

【第6実施例】図6は本液晶光変調素子を電子制御のリ
アルタイム回折素子として用い、レ−ザ光の進行方向の
制御と集光作用を行わせた実施例を示す。ホログラフィ
ックスキャナとして、回転円盤にホログラムを焼き付
け、円盤を回転することによりレ−ザ光を走査する方式
があったが、この円盤の回転を液晶ホログラムパタンの
電子制御によるパタン変形移動で、機械的可動部なしの
光走査が可能になる。理論上は1枚の変調素子で機能を
果たすが、複数枚数組み合わせる事で光の偏向角度を広
くし、光利用効率を向上する事が出来る。図6に置い
て、62はレ−ザ光源、64・66は光ビ−ムを拡大平
行にするレンズを含む光学系、68・69は本発明の光
変調素子、63・64は液晶光変調素子の駆動信号源お
よび駆動回路を含む制御回路、61は光の収束点であ
る。レ−ザ62はガスレ−ザでも半導体レ−ザでも良い
が、半導体レ−ザが体積が小さく有効である。液晶光変
調素子68・69は制御回路63・64の信号により電
子的に制御され、レ−ザ光は向きと集光がんされる。光
の収束点に感熱紙や感熱リボンと紙を配置し、2次元的
に光を走査し集光制御すれば光感熱プリンタになる。同
様にして光の収束点61に光記録媒体を配置すれば、光
ディスクメモリや光カ−ドへの完全固体化の書き込み読
みだし機構になる。従来構造の様にレンズ66と変調素
子68の間にビ−ムスプリッタを置いて戻り光を検出す
れば光記録媒体読取りが出来る。いずれの場合も従来回
転鏡や振動鏡で機械的に走査してきた機構を機械可動部
なしの完全固体化或いは部分固体化が達成され、システ
ムの体積・重量・応答速度の点で従来に比較して優れた
ものになる。液晶光変調素子は液晶素子による光の位相
変調・強度変調・偏向面の回転変調の種々の側面・ある
いはこれらの組み合わせを利用出来る。
[Sixth Embodiment] FIG. 6 shows an embodiment in which the present liquid crystal light modulation element is used as an electronically controlled real-time diffractive element to control the traveling direction of laser light and perform a condensing action. As a holographic scanner, there was a method of printing a hologram on a rotating disk and scanning the laser light by rotating the disk, but this disk rotation is mechanically changed by pattern deformation movement by electronic control of the liquid crystal hologram pattern. Optical scanning is possible without moving parts. Theoretically, one modulation element fulfills the function, but by combining a plurality of modulation elements, the deflection angle of light can be widened and the light utilization efficiency can be improved. In FIG. 6, reference numeral 62 is a laser light source, 64 and 66 are optical systems including a lens for expanding and collimating an optical beam, 68 and 69 are light modulating elements of the present invention, and 63 and 64 are liquid crystal light modulation. A control circuit including a drive signal source and a drive circuit for the element, and 61 is a convergence point of light. The laser 62 may be a gas laser or a semiconductor laser, but the semiconductor laser is effective because of its small volume. The liquid crystal light modulation elements 68 and 69 are electronically controlled by the signals of the control circuits 63 and 64, and the laser light is directed and focused. If a thermal paper or a thermal ribbon and a paper are arranged at the light converging point and the light is two-dimensionally scanned and the light is condensed and controlled, the printer becomes a thermal printer. Similarly, if an optical recording medium is arranged at the light converging point 61, it becomes a writing / reading mechanism for completely solidifying the optical disk memory or the optical card. As in the conventional structure, if a beam splitter is placed between the lens 66 and the modulation element 68 and the returning light is detected, the optical recording medium can be read. In any case, the mechanism that has been mechanically scanned by a rotating mirror or a vibrating mirror can be completely solidified or partially solidified without mechanical moving parts, and compared with the conventional one in terms of system volume, weight and response speed. And become excellent. The liquid crystal light modulation element can utilize various aspects of phase modulation / intensity modulation of light by the liquid crystal element, rotation modulation of the deflecting surface, or a combination thereof.

【第7実施例】図7は図6に用いる光変調素子のパタン
位置移動を説明するためのものである。図7において、
75・76は液晶光変調素子、73・74は液晶素子で
形成された回折パタン例、75・76はマスキングパタ
ン、71・72は入射光である。図6のレンズ66から
出た入射光71は回折パタン73で回折され、さらにそ
の回折光が素子76の入射光72となり、パタン74で
回折集光され61に至る。
[Seventh Embodiment] FIG. 7 is for explaining the pattern position movement of the optical modulator used in FIG. In FIG.
75 and 76 are liquid crystal light modulation elements, 73 and 74 are examples of diffraction patterns formed by liquid crystal elements, 75 and 76 are masking patterns, and 71 and 72 are incident lights. The incident light 71 emitted from the lens 66 of FIG. 6 is diffracted by the diffraction pattern 73, and the diffracted light becomes incident light 72 of the element 76, which is diffracted and condensed by the pattern 74 and reaches 61.

【第8実施例】図12は本発明の液晶素子を用いた立体
テレビのシステム構成例を示している。1210はレ−
ザ光源、1240はビ−ムスプリッタ−、1242・1
244・1246は鏡、1212・1213・1214
は撮像装置、1216は信号合成装置1218は伝送
路、1220は本発明による光変調装置、1222はレ
−ザ光源1224は液晶素子による空間フィルタ−であ
る。レ−ザ光源から出た光はビ−ムスプリッタ1240
で分割された後物体に照射され、一方では鏡1242・
1244・1246で反射されて参照光となって撮像装
置1212・1213・1214の内部の素子に導かれ
る。複数のホログラムが撮像素子の上に形成されるが、
その結果を複合化する。必要に応じて空間フィルタ−を
用いて余計な迷光をカットする。これも液晶を用いる事
で電子制御が可能になり、使用状況に応じた柔軟な対応
が可能になる。複数の撮像素子の使用は、立体視の視野
角拡大にもカラー情報採集にも有効であり、図面では1
個しか示していないが、再生用の光変調素子も複数並列
使用して再生画像の視野角改善や色彩付与に有効利用で
きる。図8は立体撮像における精細度向上のためのマル
チ撮像素子の画素対応を示し810はビ−ムスプリッ
タ、812は撮像素子で画素Aの組、814は撮像素子
で、画素Bの組からなる画面を採集し、816は両者A
・Bを組み合わせた画像である。ビ−ムスプリッタで分
けた画像から僅かに異なる画素位置の画像812と、8
14を安価な撮像素子で採集し、画像デ−タの重ね合わ
せからより高精細度の画像816を合成して画像の再生
に利用する。
Eighth Embodiment FIG. 12 shows a system configuration example of a stereoscopic television using the liquid crystal element of the present invention. 1210 is
The light source, 1240 is a beam splitter, 1242.1
244 and 1246 are mirrors and 1212, 1213 and 1214
Is an image pickup device, 1216 is a signal synthesizing device 1218 is a transmission line, 1220 is an optical modulator according to the present invention, 1222 is a laser light source 1224 is a spatial filter using a liquid crystal element. The light emitted from the laser light source is the beam splitter 1240.
The object is irradiated after being divided by the mirror, while the mirror 1242
The light is reflected by 1244 and 1246 and becomes reference light, which is guided to elements inside the image pickup devices 1212, 1213, and 1214. Multiple holograms are formed on the image sensor,
Combine the results. If necessary, a spatial filter is used to cut off extra stray light. This can also be electronically controlled by using a liquid crystal, and it is possible to flexibly respond to the usage situation. The use of a plurality of image pickup elements is effective for expanding the viewing angle for stereoscopic viewing and collecting color information.
Although only one is shown, a plurality of light modulators for reproduction can be used in parallel and can be effectively used for improving the viewing angle of reproduced images and imparting colors. FIG. 8 shows pixel correspondence of a multi-imaging device for improving the definition in stereoscopic imaging. 810 is a beam splitter, 812 is an imaging device and a set of pixels A, and 814 is an imaging device and a screen composed of a set of pixels B. 816 are both A
The image is a combination of B. An image 812 with slightly different pixel positions from the image divided by the beam splitter,
14 is collected by an inexpensive image pickup device, a high-definition image 816 is synthesized by superimposing image data, and used for image reproduction.

【発明の効果】【The invention's effect】

(1)本発明の効果は第1に電極を微細化する事により
高い開口率を実現したことである。図4の条件(C)
は、条件(B)の電極寸法をさらに小にしたもので、電
極の食われがほぼ100%になるほどにし、かつ微細画
素電極の隙間を詰めた構造である。電気力線は横方向に
膨らみ、その分だけ電極直下の電界が弱くなっているが
電極隙間の部分の電界は周囲の電界のベクトル和になっ
ているので、周囲すべての電極が『ON』の場合は隙間
の部分の電界も『ON』に近接し、周囲すべての電極が
『OFF』の場合は隙間の部分の電界も『OFF』に近
接する。すなわち、電極の隙間部分は寸法が大きい場合
に電界強度=0であったものが、隙間距離を縮める事に
より電界を印加出来るようになる。電気力線の膨らみで
弱くなった電界も、印加電圧を増強する事で補強出来
る。その結果電極の食われで100%近く食われていた
電極直下の液晶をONにする事が出来、さらに印加電圧
を上乗せして増強する事により画素を膨らませて連結
し、電極隙間の液晶を駆動出来るようになる。その結
果、微細画素液晶素子の致命的欠点と目されていた開口
率低下の問題は開口率向上の方向で解決出来る。これは
本来不必要と考えられた液晶層厚よりも微細な画素の複
数連結駆動の効果である。 (2)本発明の第2の重要な効果として、図4の画素形
成電極条件(C)において、駆動条件として隣接する複
数の画素群を連結して駆動する事の可能性を示したこと
である。微細画素1個を個別駆動しても駆動の効果は少
ししか発揮されない。が図4に示したごとくの微細画素
を連結することにより48にしめす隙間領域を含めて、
周囲の電極群全体がOFFとなる効果を与えることがで
きた。この領域の液晶層は結果として連続したOFF領
域を形成している。またこれとは逆に電極49はONで
あり、近傍の隙間48を含めて連結したON領域画素4
7を形成する事もできた。 (3)第3に液晶光変調素子を実現するには、画素の微
細化と変調率の向上が必要であったが、電極の幅を極端
に狭くした埋め込み配線型の構造をとることにより、画
素の微細化の具体的な方法と構造が提供できるようにな
った。このとき導電性を確保するため金属線を用いる構
造も意味がある。この場合、金属線は光を通さないか
ら、液晶層の変調は専ら電極隙間の電界を利用して行え
る。このような構造は、強誘電性液晶を用いた場合に特
に有効である。なんとなれば、強い自発分極を持つ液晶
素子になるから、分子の方向切り替えに際しては大電流
を流す必要があるからである。液晶光変調素子を実現す
るには微細画素を多数マトリクス配置して駆動する必要
があるが、ス−パ−ツイスト(STN)構造や強誘電性
液晶素子(FLC)を利用した高性能の空間光変調素子
が提供できるようになったことも特筆すべき効果といえ
る。なぜなら強誘電性液晶素子は、液晶層厚みを1.5
μm以下で駆動でき、画素微細化の有力な候補であり、
また、コントラストの向上を考えるとアクティブスイッ
チング素子との組み合わせで画素を選択駆動する構造も
有効となるからである。
(1) The effect of the present invention is that, firstly, a high aperture ratio is realized by miniaturizing the electrodes. Condition (C) of FIG.
In the condition (B), the electrode size is further reduced, and the structure is such that the erosion of the electrode is almost 100% and the gaps of the fine pixel electrodes are filled. The lines of electric force swell in the lateral direction, and the electric field directly below the electrodes is weakened by that amount, but the electric field in the electrode gap is the vector sum of the surrounding electric fields, so all the surrounding electrodes are "ON". In this case, the electric field in the gap is also close to "ON", and when all the surrounding electrodes are "OFF", the electric field in the gap is also close to "OFF". That is, the electric field strength = 0 when the size of the electrode gap is large, but the electric field can be applied by reducing the gap distance. The electric field weakened by the swelling of the lines of electric force can be reinforced by increasing the applied voltage. As a result, it is possible to turn on the liquid crystal directly below the electrode, which was almost 100% eaten by the electrode's erosion, and further increase the applied voltage to expand and connect the pixels to drive the liquid crystal in the electrode gap. become able to do. As a result, the problem of lowering the aperture ratio, which has been regarded as a fatal defect of the fine pixel liquid crystal element, can be solved by improving the aperture ratio. This is an effect of multiple connection driving of pixels finer than the liquid crystal layer thickness originally considered unnecessary. (2) As a second important effect of the present invention, in the pixel forming electrode condition (C) of FIG. 4, it is possible to drive by connecting a plurality of adjacent pixel groups as a driving condition. is there. Even if one fine pixel is individually driven, the driving effect is little exhibited. Includes a gap area defined by 48 by connecting fine pixels as shown in FIG.
It was possible to give the effect that the entire surrounding electrode group was turned off. The liquid crystal layer in this region consequently forms a continuous OFF region. On the contrary, the electrode 49 is ON, and the ON region pixel 4 connected including the gap 48 in the vicinity is connected.
It was possible to form 7. (3) Third, in order to realize a liquid crystal light modulation element, it was necessary to miniaturize pixels and improve the modulation rate. However, by adopting a buried wiring type structure in which the width of the electrode is extremely narrowed, It is now possible to provide a specific method and structure for pixel miniaturization. At this time, a structure using a metal wire for ensuring conductivity is also meaningful. In this case, since the metal wire does not transmit light, the liquid crystal layer can be modulated exclusively by using the electric field in the electrode gap. Such a structure is particularly effective when a ferroelectric liquid crystal is used. This is because the liquid crystal element has a strong spontaneous polarization, and a large current must be passed when switching the direction of molecules. In order to realize a liquid crystal light modulation element, it is necessary to arrange a large number of fine pixels in a matrix to drive it, but high-performance spatial light using a super twist (STN) structure or a ferroelectric liquid crystal element (FLC). It can be said that the modulator element can be provided is a remarkable effect. Because the ferroelectric liquid crystal element has a liquid crystal layer thickness of 1.5.
It can be driven at less than μm and is a strong candidate for pixel miniaturization.
Further, in consideration of improvement in contrast, a structure in which pixels are selectively driven in combination with an active switching element is also effective.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例を示す説明図で、液晶素子の構
成図である。
FIG. 1 is an explanatory diagram showing an embodiment of the present invention, which is a configuration diagram of a liquid crystal element.

【図2】本発明の実施例を示す説明図で、電界分布図で
ある。
FIG. 2 is an explanatory diagram showing an embodiment of the present invention and is an electric field distribution diagram.

【図3】本発明の実施例を示す説明図で、電界分布図で
ある。
FIG. 3 is an explanatory diagram showing an example of the present invention, and is an electric field distribution diagram.

【図4】本発明の実施例を示す説明図で、横電界効果を
示す図である。
FIG. 4 is an explanatory diagram showing an example of the present invention and is a diagram showing a lateral electric field effect.

【図5】本発明の実施例を示す説明図で、微細画素の位
置精度と図形誤差を示す。
FIG. 5 is an explanatory view showing an embodiment of the present invention, showing the positional accuracy of fine pixels and the figure error.

【図6】本発明の実施例を示す説明図で、液晶光走査機
構の実施例を示す。
FIG. 6 is an explanatory view showing an embodiment of the present invention, showing an embodiment of a liquid crystal optical scanning mechanism.

【図7】本発明の実施例を示す説明図で、複数連係使用
液晶光回折素子のパタンを示す。
FIG. 7 is an explanatory view showing an embodiment of the present invention, showing a pattern of a liquid crystal light diffraction element using a plurality of links.

【図8】本発明の実施例を示す説明図で、凹凸電極構造
を示す。
FIG. 8 is an explanatory view showing an embodiment of the present invention, showing a concavo-convex electrode structure.

【図9】本発明の実施例を示す説明図で、アクテイブ液
晶素子電極基板の構造を示す。
FIG. 9 is an explanatory view showing an embodiment of the present invention, showing a structure of an active liquid crystal element electrode substrate.

【図10】本発明の実施例を示す説明図で、アクテイブ
液晶素子電極基板の断面を示す。
FIG. 10 is an explanatory view showing an embodiment of the present invention, showing a cross section of an active liquid crystal element electrode substrate.

【図11】本発明の実施例を示す説明図で、電界分布図
である。
FIG. 11 is an explanatory diagram showing an example of the present invention and is an electric field distribution diagram.

【図12】本発明の実施例を示す説明図で、撮像伝送再
生システムを示す。
FIG. 12 is an explanatory diagram showing an embodiment of the present invention, showing an imaging transmission / reproduction system.

【符号の説明】[Explanation of symbols]

12上電極基板 14上電極 16下電極 18下電極基板 12 upper electrode substrate 14 upper electrode 16 lower electrode 18 lower electrode substrate

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】 縞目状に配置された微細電極群を備え対
向配置された一対の透明基板と、これらに挟持された液
晶層からなり、該微細電極は隣接電極を複数個連結して
電圧を印加し、該複数隣接微小電極に囲まれた電極隙間
領域は該連結印加畤の横電界で電極直下領域と同時に駆
動する事により、連続した空間変調パタンを形成する事
を特徴とする光変調素子。
1. A pair of transparent substrates provided with a group of fine electrodes arranged in a striped pattern and opposed to each other, and a liquid crystal layer sandwiched between the transparent substrates. The fine electrodes are formed by connecting a plurality of adjacent electrodes. Is applied, and the electrode gap region surrounded by the plurality of adjacent microelectrodes is driven simultaneously with the region directly below the electrode by the lateral electric field of the connection application ridge, thereby forming a continuous spatial modulation pattern. element.
【請求項2】 該微細電極の幅は該液晶層の厚みよりも
小としたことを特徴とする請求項1に記載の光電変調素
子。
2. The photoelectric modulation element according to claim 1, wherein the width of the fine electrode is smaller than the thickness of the liquid crystal layer.
【請求項3】 微細電極は短冊状透明電極であり、透明
絶縁基板上に形成され、該基板に挟持された液晶層はマ
トリクス配置の複数の画素に区画され、該液晶層の厚み
よりも短い電極幅および電極間隙により、該隣接画素を
複数連結駆動して空間変調パタンを形成する事を特徴と
する請求項1に記載の光変調素子。
3. The fine electrodes are strip-shaped transparent electrodes, which are formed on a transparent insulating substrate, and the liquid crystal layer sandwiched between the substrates is divided into a plurality of pixels arranged in a matrix and is shorter than the thickness of the liquid crystal layer. The light modulation element according to claim 1, wherein a plurality of the adjacent pixels are connected and driven to form a spatial modulation pattern depending on the electrode width and the electrode gap.
【請求項4】 微細電極は線状金属電極であり、透明絶
縁基板表面に形成され、該基板に挟持された液晶層はマ
トリクス配置の複数の画素に区画され、該電極の幅およ
び隙間は該液晶層の厚みよりも小であり、該液晶層を挟
持する電極により形成される画素を複数連結駆動する事
により空間変調パタンを形成する構造の請求項1に記載
の光変調素子。
4. The fine electrode is a linear metal electrode, is formed on the surface of a transparent insulating substrate, and the liquid crystal layer sandwiched by the substrate is divided into a plurality of pixels arranged in a matrix, and the width and gap of the electrode are The light modulation element according to claim 1, wherein the spatial modulation pattern is formed by driving a plurality of pixels which are smaller than the thickness of the liquid crystal layer and which are formed by electrodes sandwiching the liquid crystal layer.
【請求項5】 微細電極は線状電極であり、該電極は透
明絶縁基板表面に線状電極の中心軸高さを周期的に波状
に場所の関数として変化させて形成され、該基板に挟持
された液晶層はマトリクス配置の複数の画素に区画さ
れ、該電極の幅および隙間は該液晶層の厚みよりも小で
あり、該液晶層を挟持する電極により形成される画素を
複数連結駆動する事により空間変調パタンを形成する構
造の請求項1に記載の光変調素子。
5. The fine electrode is a linear electrode, and the electrode is formed on the surface of a transparent insulating substrate by periodically changing the height of the central axis of the linear electrode in a wavy manner as a function of location, and sandwiching the substrate. The divided liquid crystal layer is divided into a plurality of pixels arranged in a matrix, the width and gap of the electrodes are smaller than the thickness of the liquid crystal layer, and a plurality of pixels formed by electrodes sandwiching the liquid crystal layer are connected and driven. The light modulation element according to claim 1, wherein the light modulation element has a structure that forms a spatial modulation pattern.
【請求項6】 微細電極に挟持された液晶層は基板に対
して一定配向させた捩じれネマティック構造を備えた事
を特徴とする請求項1に記載の光変調素子。
6. The light modulation element according to claim 1, wherein the liquid crystal layer sandwiched between the fine electrodes has a twisted nematic structure in which the liquid crystal layer is oriented in a constant direction with respect to the substrate.
【請求項7】 微細電極に挟持された液晶は強誘電体液
晶であり、該液晶を基板に対して一定配向させた構造を
備えた事を特徴とする請求項1に記載の光変調素子。
7. The light modulation element according to claim 1, wherein the liquid crystal sandwiched between the fine electrodes is a ferroelectric liquid crystal, and the liquid crystal has a structure in which the liquid crystal is aligned in a certain direction with respect to the substrate.
【請求項8】 微細電極に挟持された液晶は強誘電体液
晶であり、該液晶を基板に対して一定配向させ、液晶層
厚みより微細な電極および電極隙間群により液晶層内部
に3次元的に制御される電界を利用して強誘電液晶層の
分子配向状態制御を行う事を特徴とする請求項1に記載
の光変調素子。
8. The liquid crystal sandwiched between the fine electrodes is a ferroelectric liquid crystal, the liquid crystal is aligned in a certain direction with respect to the substrate, and three-dimensionally inside the liquid crystal layer by electrodes and electrode gap groups finer than the liquid crystal layer thickness. 2. The light modulation element according to claim 1, wherein the molecular alignment state of the ferroelectric liquid crystal layer is controlled by utilizing the electric field controlled by the above.
【請求項9】 該液晶は反強誘電体液晶であり、微細電
極に挟持された液晶は反強誘電体液晶であり、該液晶を
基板に対して一定配向させ、液晶層厚みより微細な電極
および電極隙間群により液晶層内部に3次元的に制御さ
れる電界を利用して該反誘電液晶層の分子配向状態制御
を行う事を特徴とする請求項1に記載の光変調素子。
9. The liquid crystal is an antiferroelectric liquid crystal, and the liquid crystal sandwiched between fine electrodes is an antiferroelectric liquid crystal, and the liquid crystal is aligned in a certain direction with respect to a substrate, and an electrode finer than a liquid crystal layer thickness. 2. The light modulation element according to claim 1, wherein the electric field that is three-dimensionally controlled inside the liquid crystal layer by the electrode gap group is used to control the molecular orientation state of the anti-dielectric liquid crystal layer.
【請求項10】 該液晶素子は各微細電極毎にスイッチ
ング素子を設けたアクティブアドレッシング型液晶素子
であり、基板に埋め込まれた金属配線と絶縁体薄膜を介
して微細電極に接続される2端子スイッチング素子構造
である事を特徴とする請求項1に記載の光変調素子。
10. The liquid crystal element is an active addressing type liquid crystal element in which a switching element is provided for each fine electrode, and two-terminal switching connected to the fine electrode via a metal wiring embedded in a substrate and an insulator thin film. The light modulation element according to claim 1, which has an element structure.
【請求項11】 微細電極が形成された透明絶縁基板と
これらに挟持された液晶層とからなり、該液晶層はマト
リクス配置の複数の画素に区画され、該電極の幅および
隙間は該液晶層の厚みよりも短く、該液晶層を挟持する
電極により形成される画素を複数連結駆動する光変調素
子を、複数枚重ね合わせ、該複数個の光変調素子を相等
しい電気信号で駆動する構造を特徴とする請求項1に記
載の光変調素子。
11. A transparent insulating substrate having fine electrodes formed thereon and a liquid crystal layer sandwiched therebetween, the liquid crystal layer being partitioned into a plurality of pixels arranged in a matrix, and the width and gap of the electrodes are the liquid crystal layer. Of a plurality of light modulation elements that are shorter than the thickness of the liquid crystal layer and drive a plurality of pixels formed by electrodes sandwiching the liquid crystal layer, and drive the plurality of light modulation elements with equal electrical signals. The light modulation element according to claim 1, wherein the light modulation element is a light modulation element.
【請求項12】 微細電極が形成された透明絶縁基板と
これらに挟持された液晶層とからなり、該液晶層はマト
リクス配置の複数の画素に区画され、該電極の幅は該液
晶層の厚みよりも短く、該液晶層を挟持する電極により
形成される画素を複数連結駆動する光変調素子を、複数
枚重ね、互いに異なる電気信号で駆動する事により光波
面の空間変調パタンを3次元的に形成する構造を特徴と
する請求項1に記載の光変調素子。
12. A transparent insulating substrate having fine electrodes formed thereon and a liquid crystal layer sandwiched therebetween, the liquid crystal layer being divided into a plurality of pixels arranged in a matrix, and the width of the electrode is the thickness of the liquid crystal layer. Shorter than the above, by stacking a plurality of light modulation elements for driving a plurality of pixels formed by electrodes sandwiching the liquid crystal layer, and driving them with different electric signals, the spatial modulation pattern of the light wave front is three-dimensionally The light modulation element according to claim 1, wherein the light modulation element is formed.
JP21659091A 1991-08-02 1991-08-02 Light modulation element Expired - Fee Related JP3270075B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21659091A JP3270075B2 (en) 1991-08-02 1991-08-02 Light modulation element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21659091A JP3270075B2 (en) 1991-08-02 1991-08-02 Light modulation element

Publications (2)

Publication Number Publication Date
JPH0695162A true JPH0695162A (en) 1994-04-08
JP3270075B2 JP3270075B2 (en) 2002-04-02

Family

ID=16690807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21659091A Expired - Fee Related JP3270075B2 (en) 1991-08-02 1991-08-02 Light modulation element

Country Status (1)

Country Link
JP (1) JP3270075B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000089364A (en) * 1998-09-09 2000-03-31 Seiko Epson Corp Light modulation device and projection display device using the light modulation device
JP2004101704A (en) * 2002-09-06 2004-04-02 Ricoh Co Ltd Optical path shift element
JP2012088722A (en) * 2011-11-30 2012-05-10 Asahi Glass Co Ltd Optical deflector and optical scanner

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000089364A (en) * 1998-09-09 2000-03-31 Seiko Epson Corp Light modulation device and projection display device using the light modulation device
JP2004101704A (en) * 2002-09-06 2004-04-02 Ricoh Co Ltd Optical path shift element
JP2012088722A (en) * 2011-11-30 2012-05-10 Asahi Glass Co Ltd Optical deflector and optical scanner

Also Published As

Publication number Publication date
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